CN110841973A - Cleaning and drying device for monocrystalline silicon wafers - Google Patents
Cleaning and drying device for monocrystalline silicon wafers Download PDFInfo
- Publication number
- CN110841973A CN110841973A CN201911051124.1A CN201911051124A CN110841973A CN 110841973 A CN110841973 A CN 110841973A CN 201911051124 A CN201911051124 A CN 201911051124A CN 110841973 A CN110841973 A CN 110841973A
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- China
- Prior art keywords
- cleaning pool
- chamber
- drying
- cleaning
- monocrystalline silicon
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
- B08B3/123—Cleaning travelling work, e.g. webs, articles on a conveyor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B15/00—Machines or apparatus for drying objects with progressive movement; Machines or apparatus with progressive movement for drying batches of material in compact form
- F26B15/10—Machines or apparatus for drying objects with progressive movement; Machines or apparatus with progressive movement for drying batches of material in compact form with movement in a path composed of one or more straight lines, e.g. compound, the movement being in alternate horizontal and vertical directions
- F26B15/12—Machines or apparatus for drying objects with progressive movement; Machines or apparatus with progressive movement for drying batches of material in compact form with movement in a path composed of one or more straight lines, e.g. compound, the movement being in alternate horizontal and vertical directions the lines being all horizontal or slightly inclined
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/001—Drying-air generating units, e.g. movable, independent of drying enclosure
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention discloses a cleaning and drying device for monocrystalline silicon wafers, which comprises a top, an infrared sensing device, a chemical cleaning pool, a physical cleaning pool and a drying chamber, wherein a wafer taking chamber, the chemical cleaning pool, the physical cleaning pool, the drying chamber and an encapsulating chamber are sequentially arranged below the top from left to right, the top comprises a top plate, a conveying device and a telescopic device, and the cleaning and drying processes of the silicon wafers are completed through the telescopic device and the infrared sensing device. The cleaning and drying device for the monocrystalline silicon wafer is simple in device and safe and stable in operation, the cleaning and drying process of the monocrystalline silicon wafer is completed at one time, the cleaning and drying efficiency is improved, and the better cleaning effect of the monocrystalline silicon wafer is achieved after the two cleaning modes are adopted.
Description
Technical Field
The invention relates to the field of monocrystalline silicon wafers, in particular to a cleaning and drying device for monocrystalline silicon wafers.
Background
Monocrystalline silicon is a relatively active non-metallic element, is an important component of crystal materials, and is in the front of the development of new materials. The silicon single crystal wafer is mainly used as a semiconductor material and used for solar photovoltaic power generation, heat supply and the like, and the silicon single crystal wafer needs to be cleaned frequently in the processing process.
The existing cleaning equipment is independent and needs to be cleaned in different modes on a plurality of pieces of equipment, so that the cleaning efficiency is low, and the production cost is high; the conveying device uses the air cylinder, and the stability and the safety are insufficient in the conveying process.
Disclosure of Invention
The invention aims to provide a cleaning and drying device for monocrystalline silicon wafers, which is used for solving the problems in the background technology.
In order to solve the technical problems, the invention adopts the technical scheme that: a cleaning and drying device for monocrystalline silicon wafers comprises a top, an infrared sensing device, a chemical cleaning pool, a physical cleaning pool and a drying chamber, wherein a wafer taking chamber, the chemical cleaning pool, the physical cleaning pool, the drying chamber and an encapsulating chamber are sequentially arranged below the top from left to right, and the wafer taking chamber, the chemical cleaning pool, the physical cleaning pool, the drying chamber and the encapsulating chamber are positioned on the same horizontal line; the top comprises a top plate, a conveying device and a telescopic device, the conveying device is arranged below the top plate and comprises two motors, two winding wheels and a conveying belt, the motors are respectively fixed at two ends of the top plate, the winding wheels are connected below each motor, and the conveying belt is sleeved and linked on the two winding wheels; the telescopic device is arranged on the conveyor belt and comprises a fixed shaft, two pulleys, a motor, a winding rope and a clamp, wherein the two pulleys are respectively sleeved on two sides of the fixed shaft; the infrared induction device comprises a signal transmitter and a signal receiver, two ends of the signal transmitter are horizontally arranged on the coiling rope above the clamp, and the signal receiver is arranged at the bottom of the inner sides of the sheet taking chamber, the chemical cleaning pool, the physical cleaning pool, the drying chamber and the packaging chamber; the inner side of the chemical cleaning pool is provided with an ultrasonic generator, and the outer side of the chemical cleaning pool is provided with a liquid inlet valve and a liquid outlet valve; a water inlet valve and a water discharge valve are arranged on the outer side of the physical cleaning pool; the right of the inner side of the drying chamber is provided with an air heater, and an air outlet of the air heater penetrates through the inside of the drying chamber.
Furthermore, a vibrator is arranged on a fixing clamp of the telescopic device.
Furthermore, a plurality of ultrasonic vibrators are arranged in an ultrasonic generator of the chemical cleaning pool.
Furthermore, an air deflector is arranged on the left side of the hot air blower of the drying chamber, and air holes are uniformly formed in the air deflector.
A cleaning and drying device for monocrystalline silicon wafers comprises the following working steps:
the invention has the following beneficial effects:
the cleaning and drying device for the monocrystalline silicon wafer is simple in device and safe and stable in operation, the cleaning and drying process of the monocrystalline silicon wafer is completed at one time, the cleaning and drying efficiency is improved, and the better cleaning effect of the monocrystalline silicon wafer is achieved after the monocrystalline silicon wafer is subjected to two cleaning modes.
Drawings
FIG. 1 is a schematic structural diagram of a cleaning and drying apparatus for monocrystalline silicon wafers according to the present invention.
Among them are: 1. a top plate; 21. a motor; 22. a winding wheel; 23. a conveyor belt; 31. a fixed shaft; 32. a pulley; 33. a motor; 34. rope rolling; 35. a clip; 41. a signal transmitter; 42. a signal receiver; 5. a film taking chamber; 6. a chemical cleaning tank; 61. an ultrasonic generator; 62. a liquid inlet valve; 63. a drain valve; 7. a physical cleaning pool; 71. a water inlet valve; 72. a drain valve; 8. a drying chamber; 81. a hot air blower; 82. an air deflector; 9. a packaging chamber; 10. a single crystal silicon wafer.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and specific preferred embodiments.
In the description of the present invention, it is to be understood that the terms "left side", "right side", "upper part", "lower part", etc., indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience of describing the present invention and simplifying the description, but do not indicate or imply that the referred device or element must have a specific orientation, be constructed in a specific orientation, and be operated, and that "first", "second", etc., do not represent an important degree of the component parts, and thus are not to be construed as limiting the present invention. The specific dimensions used in the present example are only for illustrating the technical solution and do not limit the scope of protection of the present invention.
As shown in fig. 1, a cleaning and drying device for monocrystalline silicon wafers comprises a top, an infrared sensing device, a chemical cleaning pool, a physical cleaning pool and a drying chamber, wherein a wafer taking chamber 5, a chemical cleaning pool 6, a physical cleaning pool 7, a drying chamber 8 and an encapsulating chamber 9 are sequentially arranged from left to right below the top, and the wafer taking chamber 5, the chemical cleaning pool 6, the physical cleaning pool 7, the drying chamber 8 and the encapsulating chamber 9 are positioned on the same horizontal line.
The top comprises a top plate 1, a conveying device and a telescopic device, the conveying device is arranged below the top plate and comprises two motors 21, two winding wheels 22 and a conveying belt 23, the motors 21 are respectively fixed at two ends of the top plate 1, the winding wheel 22 is connected below each motor 21, and the conveying belt 23 is linked on the two winding wheels 22 in a sleeving manner; the telescopic device is arranged on the conveyor belt 23 and comprises a fixed shaft 31, two pulleys 32, a motor 33, a rope winding 34 and a clamp 35, wherein the two pulleys 32 are respectively sleeved on two sides of the fixed shaft 31, the motor 33 is arranged at the center of the fixed shaft 31, the two pulleys 32 are communicated with the motor 33, the fixed shaft 31 is embedded on the conveyor belt, the rope winding 34 is clockwise wound on the pulleys 32, the upper end of the rope winding 34 is fixed on the pulleys 32, the clamp 35 is arranged at the lower end of the rope winding 34, a vibrator is arranged on the clamp 35, and the vibrator is connected with the motor 33 on the fixed shaft 31; the infrared sensing device comprises a signal emitter 41 and a signal receiver 42, two ends of the signal emitter 41 are horizontally arranged on the coiling rope 34 above the clamp 35, and the signal receiver 42 is arranged in the center of the bottom of the inner sides of the film taking chamber 5, the chemical cleaning pool 6, the physical cleaning pool 7, the drying chamber 8 and the packaging chamber 9; an ultrasonic generator 61 is arranged on the inner side of the chemical cleaning pool 6, a plurality of ultrasonic vibrators are arranged in the ultrasonic generator 61, and a liquid inlet valve 62 and a liquid outlet valve 63 are arranged on the outer side of the chemical cleaning pool and used for cleaning and replacing liquid medicine; a water inlet valve 71 and a water discharge valve 72 are arranged on the outer side of the physical cleaning pool 7 and used for changing water; the inboard right of drying chamber 8 is equipped with air heater 81, and the inside of drying chamber 8 is run through to the air outlet of air heater 82, and there is aviation baffle 82 in the left side of air heater 81, is equipped with evenly distributed's bleeder vent on the aviation baffle 82, wherein:
the liquid heights in the chemical cleaning pool 6 and the physical cleaning pool 7 are both larger than the height of the monocrystalline silicon wafer 10;
the signal transmitter 41 transmits the signal for the next time vertically, and the signal receiver 42 receives the signal vertically upward;
when the power supply is cut off, all the equipment stops working, the conveying device is in the original motionless state, the infrared sensing device is closed, the telescopic devices are all arranged at the leftmost end of the conveying belt 23, the rolling wheel 22 at the left end of the conveying belt 23 is contacted with the fixed shaft 31, the rolling rope 35 is all wound on the pulley 32 clockwise,
when the power is switched on, the transmission device, the telescopic device, the infrared sensor and the ultrasonic generator all start to work, when the rolling wheel 22 is contacted with the fixed shaft 31, the rolling wheel 22 rotates to drive the transmission belt 23 to move, the telescopic device is transmitted towards the other rolling wheel 22 until the other end of the fixed shaft 31 is contacted with the other rolling wheel 22, wherein when the pulley 32 on the telescopic device rotates, the rolling wheel 22 stops rotating, and the transmission belt 23 does not move.
The cleaning and drying device utilizing the monocrystalline silicon wafer comprises the following working steps:
the method comprises the following steps: starting power supplies of the conveying device, the telescopic device, the infrared sensor and the ultrasonic generator;
step two: when the telescopic device moves to the position above the material taking chamber, a signal receiver in the material taking chamber receives a signal transmitted by a signal transmitter right above the material taking chamber, the pulley starts to rotate anticlockwise, the winding wheel stops rotating, the winding rope extends downwards at the moment until the clamp completely enters the material taking chamber, the pulley starts to rotate clockwise after the clamp clamps two ends above the silicon wafer from the material taking chamber, the winding rope contracts upwards to the original state at the moment, the pulley stops rotating, the winding wheel continues to rotate, and the telescopic device continues to move rightwards;
step three: when the telescopic device moves to the position above the chemical cleaning pool, a signal receiver in the chemical cleaning pool receives a signal transmitted by a signal transmitter right above, the pulley starts to rotate anticlockwise, the winding wheel stops rotating, the winding rope extends downwards at the moment until the monocrystalline silicon wafer is completely immersed in liquid medicine in the chemical cleaning pool, the pulley stops rotating, the vibrator on the clamp drives the monocrystalline silicon wafer to vibrate in the chemical cleaning pool for 10s at the moment, ultrasonic waves emitted by the ultrasonic vibrator pass through the liquid medicine in the chemical cleaning pool through high-frequency vibration, dirt particles on the surface of the monocrystalline silicon wafer are scattered and dissolved in the liquid medicine, after the pulley stops rotating for 10s, the pulley starts to rotate clockwise, the winding rope contracts upwards to an original state, the pulley stops rotating, the winding wheel continues to rotate, and the telescopic device continues to move rightwards;
step four: when the telescopic device moves above the physical cleaning pool, a signal receiver in the physical cleaning pool receives a signal transmitted by a signal transmitter right above, the pulley starts to rotate anticlockwise, the winding wheel stops rotating, the winding rope extends downwards at the moment until the monocrystalline silicon piece is completely immersed in the liquid medicine in the chemical cleaning pool, the pulley stops rotating, the vibrator on the clamp drives the monocrystalline silicon piece to vibrate in the physical cleaning pool for 10s, the liquid medicine attached to the surface of the monocrystalline silicon piece is cleaned, after the pulley stops rotating for 10s, the pulley starts to rotate anticlockwise, the winding rope contracts upwards to the original state, the pulley stops rotating, the winding wheel continues rotating, and the telescopic device continues to move rightwards;
step five: when the telescopic device moves above the drying chamber, a signal receiver in the drying chamber receives a signal transmitted by a signal transmitter right above, the pulley starts to rotate anticlockwise, the winding wheel stops rotating, the winding rope extends downwards until the monocrystalline silicon wafer completely enters the drying chamber, the vibrator on the clamp drives the monocrystalline silicon wafer to vibrate in the drying chamber for 10s, the monocrystalline silicon wafer is dried by a hot air blower in the drying chamber, after the pulley stops rotating for 10s, the pulley starts to rotate anticlockwise, the winding rope contracts upwards to an original state, the pulley stops rotating, the winding wheel continues to rotate, and the telescopic device continues to move rightwards;
step six; when the telescopic device moves to the position above the packaging chamber, a signal receiver in the packaging chamber receives a signal transmitted by a signal transmitter right above the packaging chamber, the pulley starts to rotate anticlockwise, the winding wheel stops rotating, the winding rope extends downwards until the clamp completely enters the packaging chamber, the pulley starts to rotate clockwise after the clamp loosens the silicon wafer, the winding rope contracts upwards to an original state, the pulley stops rotating, the winding wheel continues to rotate, the telescopic device continues to move rightwards, and the silicon wafer is packaged in the packaging chamber;
step seven: when the right end of the fixed shaft is in contact with the winding wheel at the right end, the winding wheel starts to rotate in the opposite direction, the conveyor belt starts to move in the reverse direction, the conveyor belt conveys the telescopic device to the left end of the fixed shaft to be in contact with the winding wheel at the left end, and the second step is repeated.
Although the preferred embodiments of the present invention have been described in detail, the present invention is not limited to the details of the embodiments, and various equivalent modifications can be made within the technical spirit of the present invention, and the scope of the present invention is also within the scope of the present invention.
Claims (4)
1. The utility model provides a cleaning and drying device of monocrystalline silicon piece which characterized in that: the device comprises a top, an infrared sensing device, a chemical cleaning pool, a physical cleaning pool and a drying chamber, wherein a sheet taking chamber, the chemical cleaning pool, the physical cleaning pool, the drying chamber and a packaging chamber are sequentially arranged below the top from left to right, and the sheet taking chamber, the chemical cleaning pool, the physical cleaning pool, the drying chamber and the packaging chamber are positioned on the same horizontal line;
the top comprises a top plate, a conveying device and a telescopic device, the conveying device is arranged below the top plate and comprises two motors, two winding wheels and a conveying belt, the motors are respectively fixed at two ends of the top plate, the winding wheels are connected below each motor, and the conveying belt is sleeved and linked on the two winding wheels;
the telescopic device is arranged on the conveyor belt and comprises a fixed shaft, two pulleys, a motor, a winding rope and a clamp, the two pulleys are respectively sleeved on two sides of the fixed shaft, the motor is arranged at the center of the fixed shaft, the two pulleys are communicated with the motor, the fixed shaft is embedded on the conveyor belt, the winding rope is clockwise wound on the pulleys, the pulleys are fixed at the upper end of the winding rope, the clamp is arranged at the lower end of the winding rope,
the infrared sensing device comprises a signal transmitter and a signal receiver, two ends of the signal transmitter are horizontally arranged on the coiling rope above the clamp, and the signal receiver is arranged at the bottom of the inner sides of the sheet taking chamber, the chemical cleaning pool, the physical cleaning pool, the drying chamber and the packaging chamber;
the inner side of the chemical cleaning pool is provided with an ultrasonic generator, and the outer side of the chemical cleaning pool is provided with a liquid inlet valve and a liquid outlet valve;
a water inlet valve and a water discharge valve are arranged on the outer side of the physical cleaning pool;
the right of the inner side of the drying chamber is provided with an air heater, and an air outlet of the air heater penetrates through the inside of the drying chamber.
2. The cleaning and drying apparatus for the single crystal silicon wafer according to claim 1, characterized in that: and a vibrator is arranged on the fixing clamp of the telescopic device.
3. The cleaning and drying apparatus for the single crystal silicon wafer according to claim 1, characterized in that: and a plurality of ultrasonic vibrators are arranged in the ultrasonic generator of the chemical cleaning pool.
4. The cleaning and drying apparatus for the single crystal silicon wafer according to claim 1, characterized in that: and an air deflector is arranged on the left side of the hot air blower of the drying chamber, and air holes are uniformly formed in the air deflector.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911051124.1A CN110841973A (en) | 2019-10-31 | 2019-10-31 | Cleaning and drying device for monocrystalline silicon wafers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911051124.1A CN110841973A (en) | 2019-10-31 | 2019-10-31 | Cleaning and drying device for monocrystalline silicon wafers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110841973A true CN110841973A (en) | 2020-02-28 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201911051124.1A Pending CN110841973A (en) | 2019-10-31 | 2019-10-31 | Cleaning and drying device for monocrystalline silicon wafers |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110841973A (en) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5493887B2 (en) * | 2010-01-12 | 2014-05-14 | 信越半導体株式会社 | Single crystal block cleaning apparatus and cleaning method |
| CN106000995A (en) * | 2016-06-08 | 2016-10-12 | 西安印钞有限公司 | Automatic cleaning equipment of numbering machine |
| CN206474478U (en) * | 2017-01-16 | 2017-09-08 | 四川天强玻璃有限公司 | A kind of novel automatic glass washing device |
| CN206838659U (en) * | 2017-06-10 | 2018-01-05 | 福建鑫隆光伏科技有限公司 | A kind of drying integrated device of cleaning monocrystalline silicon |
| CN207188323U (en) * | 2017-09-08 | 2018-04-06 | 无锡帕尔弗工业设备科技有限公司 | A kind of positioning cleaning dry body being applied in cleaning machine |
| CN108480277A (en) * | 2018-04-10 | 2018-09-04 | 绍兴文理学院 | A kind of Wafer Cleaning drying unit |
| CN208903979U (en) * | 2018-10-24 | 2019-05-24 | 爱利彼半导体设备(中国)有限公司 | A kind of chemical-mechanical polisher cleaning, drying integrated apparatus |
-
2019
- 2019-10-31 CN CN201911051124.1A patent/CN110841973A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5493887B2 (en) * | 2010-01-12 | 2014-05-14 | 信越半導体株式会社 | Single crystal block cleaning apparatus and cleaning method |
| CN106000995A (en) * | 2016-06-08 | 2016-10-12 | 西安印钞有限公司 | Automatic cleaning equipment of numbering machine |
| CN206474478U (en) * | 2017-01-16 | 2017-09-08 | 四川天强玻璃有限公司 | A kind of novel automatic glass washing device |
| CN206838659U (en) * | 2017-06-10 | 2018-01-05 | 福建鑫隆光伏科技有限公司 | A kind of drying integrated device of cleaning monocrystalline silicon |
| CN207188323U (en) * | 2017-09-08 | 2018-04-06 | 无锡帕尔弗工业设备科技有限公司 | A kind of positioning cleaning dry body being applied in cleaning machine |
| CN108480277A (en) * | 2018-04-10 | 2018-09-04 | 绍兴文理学院 | A kind of Wafer Cleaning drying unit |
| CN208903979U (en) * | 2018-10-24 | 2019-05-24 | 爱利彼半导体设备(中国)有限公司 | A kind of chemical-mechanical polisher cleaning, drying integrated apparatus |
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| PB01 | Publication | ||
| PB01 | Publication | ||
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Application publication date: 20200228 |