CN110820038A - High-temperature alloy plasma electrochemical grinding device - Google Patents

High-temperature alloy plasma electrochemical grinding device Download PDF

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Publication number
CN110820038A
CN110820038A CN201911140945.2A CN201911140945A CN110820038A CN 110820038 A CN110820038 A CN 110820038A CN 201911140945 A CN201911140945 A CN 201911140945A CN 110820038 A CN110820038 A CN 110820038A
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China
Prior art keywords
cathode
grinding
spiral arc
drawing device
cavity
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CN201911140945.2A
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Chinese (zh)
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CN110820038B (en
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蒋永锋
易恬安
包晔峰
陈秉岩
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Changzhou Campus of Hohai University
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Changzhou Campus of Hohai University
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • C25F3/16Polishing
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Plasma Technology (AREA)

Abstract

The invention relates to a high-temperature alloy plasma electrochemical grinding device which comprises a cathode, wherein nanosecond pulse voltage is applied between the cathode and an alloy to be ground during working; the grinding brush comprises a brush head and a rotary table, wherein the brush head is arranged on the rotary table; the spiral arc-drawing device is used for connecting the cathode and the grinding brush, one end of the spiral arc-drawing device is connected with the cathode, and the other end of the spiral arc-drawing device is connected with the turntable; the water mist spraying device is used for generating and spraying deionized water mist; and the driving device is used for driving the cathode, the grinding brush and the spiral arc-drawing device to rotate around the central shaft. The grinding device has the advantages that the plasma flexible contact is realized, the micro convex points are firstly stripped and ground until the surface is smooth, and then the stripping and grinding are carried out on the micro high convex points.

Description

High-temperature alloy plasma electrochemical grinding device
Technical Field
The invention relates to an alloy grinding device, in particular to a high-temperature alloy plasma electrochemical grinding device.
Background
Delamination of the surface of the additive manufacturing superalloy may reduce the surface roughness of the workpiece. Common superalloy surface stripping processes include chemical stripping or electrochemical finishing and mechanical stripping, among others. While chemical stripping or electrochemical finishing is usually carried out in a hydrofluoric acid and nitric acid solution prepared according to a certain proportion, the production environment is severe, and the stainless steel composition is limited. Mechanical stripping also presents problems of excessive hardness in production environments and composition variations. Therefore, the method has the limitations of long treatment time, poor operation conditions, requirement of subsequent processing and the like and higher cost.
Disclosure of Invention
The invention provides a high-temperature alloy plasma electrochemical grinding device for solving the problem of poor operation conditions of a stripping method in the prior art, the device has the advantages that the plasma is in flexible contact, the microcosmic convex peaks are firstly stripped and ground until the surface is smooth, and then the microcosmic convex peaks are stripped and ground.
The technical scheme adopted by the invention is as follows: a high-temperature alloy plasma electrochemical grinding device comprises
A nanosecond pulse voltage is applied between the cathode and the alloy to be ground;
the grinding brush comprises a brush head and a rotary table, wherein the brush head is arranged on the rotary table;
the spiral arc-drawing device is used for connecting the cathode and the grinding brush, one end of the spiral arc-drawing device is connected with the cathode, and the other end of the spiral arc-drawing device is connected with the turntable;
the water mist spraying device is used for generating and spraying deionized water mist;
and the driving device is used for driving the cathode, the grinding brush and the spiral arc-drawing device to rotate around the central shaft.
Further, the spiral arc-drawing device is a spring, the spring is arranged between the cathode and the grinding brush through a screw rod, the spring is sleeved in the screw rod, the spring and the central shaft are coaxial, and the spring is made of metal materials.
Furthermore, the rotary table is a ceramic flange, the brush head is arranged on the ceramic flange, and the axis of the ceramic flange is coaxial with the central axis.
Furthermore, a jet orifice of the water mist spraying device is close to the brush head, and the water mist spraying device sprays the deionized water on the carbon fiber filaments.
Further, a shell is arranged outside the cathode, a first cavity and a second cavity are arranged in the shell, the cathode and the spiral arc-drawing device are arranged in the first cavity, cooling liquid flows in the second cavity, the second cavity is arranged on the periphery of the first cavity, and the second cavity is close to the outer wall of the shell.
Further, the cathode is a graphite rod or a tungsten rod.
The beneficial effects produced by the invention comprise: the grinding device has the advantages that the plasma flexible contact is realized, the microcosmic convex peaks are firstly stripped and ground until the surface is smooth, and then the stripping and grinding are carried out on the microcosmic high convex peaks.
Drawings
FIG. 1 is a schematic view of the apparatus of the present invention;
FIG. 2 is a top plan view of a brush head of the present invention;
in the figure, the device comprises a shell 1, a shell 2, a cathode 3, a spring 4, a stud 5, a flange 6, a carbon fiber wire 7, a first cavity 8, a second cavity 9, a water mist spraying device 10 and deionized water.
Detailed Description
The present invention is explained in further detail below with reference to the drawings and examples, but it should be understood that the scope of the present invention is not limited to the specific examples.
As shown in fig. 1-2, the high temperature alloy plasma electrochemical grinding device of the invention comprises a rotary feeding electrode structure, a shell and a water mist spraying device, wherein the rotary feeding electrode structure comprises a rotatable cathode, a spring and a brush head, the brush head comprises a ceramic flange and a carbon fiber wire, the tip of the cathode is connected with the spring and a ceramic ferrule through a stud, one end of the ceramic ferrule is connected with the stud, the other end of the ceramic ferrule is connected with the ceramic flange, the carbon fiber wire is distributed around the flange ring, and the cathode is driven by a servo motor to spirally rotate the feeding spring and the brush head to enable the brush head to be.
The distance between the cathode and the surface of the high-temperature alloy can be adjusted according to the length of a glow arc generated by cathode discharge and kept stable, the shell plays a role in protection, the outer wall of the shell is made of an insulating material, a first cavity and a second cavity are arranged in the protective shell, the cathode and the spiral arc-drawing device are arranged in the first cavity, cooling liquid flows in the second cavity and is used for cooling the temperature of the shell, the second cavity is arranged on the periphery of the first cavity, and the second cavity is close to the outer wall of the shell. The protective shell mainly comprises an integrated cooling and insulating structure; the deionized water supply system is provided with a sensor used for sensing the temperature and the pressure of the water mist, the deionized water supply system adjusts the temperature and the pressure of the water mist according to the temperature and the pressure data uploaded by the sensor so as to meet the requirement, the water mist spraying device sprays the water mist between the carbon fiber wire brush and the surface of the high-temperature alloy, the plasma electrochemical grinding is carried out on the surface of the alloy, and the spraying of the water mist is favorable for forming micro-arcs.
The device is designed aiming at the high-temperature alloy, namely the high-temperature alloy which is refractory and has high hardness, and the existing equipment is difficult to process and polish.
The use method of the device comprises the following steps:
the invention relates to a device for grinding a high-temperature alloy part, which comprises a shell, a cathode, a brush head, a motor, a driving motor, a spring, a brush head, a handle, a motor, a nano-second pulse voltage, a carbon fiber and a high-temperature alloy. The rotation speed and the feeding degree of the cathode are adjusted according to the roughness and the curvature of the surface of the high-temperature alloy piece in the process.
The above description is only a preferred embodiment of the present invention, and the present invention is not limited to the content of the embodiment. It will be apparent to those skilled in the art that various changes and modifications can be made within the technical scope of the present invention, and any changes and modifications made are within the protective scope of the present invention.

Claims (6)

1. A high-temperature alloy plasma electrochemical grinding device is characterized in that: comprises that
The nano-second pulse voltage is applied between the cathode and the alloy to be ground when the cathode works;
the grinding brush comprises a brush head and a rotary table, wherein the brush head is arranged on the rotary table;
the spiral arc-drawing device is used for connecting the cathode and the grinding brush, one end of the spiral arc-drawing device is connected with the cathode, and the other end of the spiral arc-drawing device is connected with the turntable;
the water mist spraying device is used for generating and spraying deionized water mist;
and the driving device is used for driving the cathode, the grinding brush and the spiral arc-drawing device to rotate around the central shaft.
2. A superalloy plasma electrochemical polishing apparatus as in claim 1, wherein: the spiral arc-drawing device is a spring, the spring is arranged between the cathode and the grinding brush through a screw rod, the spring is sleeved in the screw rod, and the screw rod, the spring and the central shaft are coaxial.
3. A superalloy plasma electrochemical polishing apparatus as in claim 1, wherein: the rotary table is a ceramic flange, the brush head is arranged on the ceramic flange, and the axis of the ceramic flange is coaxial with the central axis.
4. A superalloy plasma electrochemical polishing apparatus as in claim 1, wherein: and the spray opening of the water mist spraying device is close to the brush head, and the water mist spraying device sprays the deionized water onto the carbon fiber wires.
5. A superalloy plasma electrochemical polishing apparatus as in claim 1, wherein: the cathode and the spiral arc-drawing device are arranged in the first cavity, cooling liquid flows in the second cavity, the second cavity is arranged on the periphery of the first cavity, and the second cavity is close to the outer wall of the shell.
6. A superalloy plasma electrochemical polishing apparatus as in claim 1, wherein: the cathode is a graphite rod or a tungsten rod.
CN201911140945.2A 2019-11-20 2019-11-20 High-temperature alloy plasma electrochemical grinding device Active CN110820038B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201911140945.2A CN110820038B (en) 2019-11-20 2019-11-20 High-temperature alloy plasma electrochemical grinding device

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Application Number Priority Date Filing Date Title
CN201911140945.2A CN110820038B (en) 2019-11-20 2019-11-20 High-temperature alloy plasma electrochemical grinding device

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CN110820038A true CN110820038A (en) 2020-02-21
CN110820038B CN110820038B (en) 2021-09-17

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Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1247910A (en) * 1967-12-04 1971-09-29 Hammond Machinery Builders Inc Cleaning method and means for electro-chemical grinder
CN1388274A (en) * 2001-05-25 2003-01-01 环宇真空科技股份有限公司 Physiochemical electron beam polishing method
RU2003134218A (en) * 2003-11-25 2005-05-10 Государственное образовательное учреждение высшего профессионального образовани Самарский государственный технический университет (RU) METHOD OF COMBINED PROCESSING OF PARTS FROM ALUMINUM AND ITS ALLOYS
CN202878042U (en) * 2012-07-23 2013-04-17 辽宁科技大学 Finishing device suitable for nozzle parts
CN203901020U (en) * 2014-06-19 2014-10-29 华中科技大学 Polishing and machining device for metal surfaces
US20160031026A1 (en) * 2014-07-29 2016-02-04 Faraday Technology, Inc. Method and apparatus for pulsed electrochemical grinding
CN106569111A (en) * 2016-10-28 2017-04-19 桂林理工大学 Electromagnetic force generation method in electrical insulation film pulse voltage accelerated aging experiment
CN106591869A (en) * 2016-12-15 2017-04-26 河海大学常州校区 Stainless steel surface nanosecond pulse plasma stripping device and method
CN208762601U (en) * 2018-05-04 2019-04-19 李容焕 A kind of plasma electrolysis polishing grinding device
CN110004484A (en) * 2019-04-19 2019-07-12 西安理工大学 A kind of SiC single crystal plasma electrochemical polish apparatus and its polishing method

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1247910A (en) * 1967-12-04 1971-09-29 Hammond Machinery Builders Inc Cleaning method and means for electro-chemical grinder
CN1388274A (en) * 2001-05-25 2003-01-01 环宇真空科技股份有限公司 Physiochemical electron beam polishing method
RU2003134218A (en) * 2003-11-25 2005-05-10 Государственное образовательное учреждение высшего профессионального образовани Самарский государственный технический университет (RU) METHOD OF COMBINED PROCESSING OF PARTS FROM ALUMINUM AND ITS ALLOYS
CN202878042U (en) * 2012-07-23 2013-04-17 辽宁科技大学 Finishing device suitable for nozzle parts
CN203901020U (en) * 2014-06-19 2014-10-29 华中科技大学 Polishing and machining device for metal surfaces
US20160031026A1 (en) * 2014-07-29 2016-02-04 Faraday Technology, Inc. Method and apparatus for pulsed electrochemical grinding
CN106569111A (en) * 2016-10-28 2017-04-19 桂林理工大学 Electromagnetic force generation method in electrical insulation film pulse voltage accelerated aging experiment
CN106591869A (en) * 2016-12-15 2017-04-26 河海大学常州校区 Stainless steel surface nanosecond pulse plasma stripping device and method
CN208762601U (en) * 2018-05-04 2019-04-19 李容焕 A kind of plasma electrolysis polishing grinding device
CN110004484A (en) * 2019-04-19 2019-07-12 西安理工大学 A kind of SiC single crystal plasma electrochemical polish apparatus and its polishing method

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