CN110791733B - Wear-resistant diffusion-resistant aluminum-chromium-titanium-nitrogen and aluminum oxide multilayer composite coating and preparation method thereof - Google Patents

Wear-resistant diffusion-resistant aluminum-chromium-titanium-nitrogen and aluminum oxide multilayer composite coating and preparation method thereof Download PDF

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CN110791733B
CN110791733B CN201910973794.2A CN201910973794A CN110791733B CN 110791733 B CN110791733 B CN 110791733B CN 201910973794 A CN201910973794 A CN 201910973794A CN 110791733 B CN110791733 B CN 110791733B
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CN110791733A (en
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鲜广
赵海波
鲜丽君
熊计
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Sichuan University
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/024Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025Metallic sublayers
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641Nitrides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/081Oxides of aluminium, magnesium or beryllium
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/083Oxides of refractory metals or yttrium

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  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
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  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention discloses a wear-resistant diffusion-resistant aluminum-chromium-titanium-nitrogen and aluminum oxide multilayer composite coating which is prepared from a CrAlTiZrY high-entropy alloy bonding layer, alpha-Cr2O3Oxide template layer, alpha-Al2O3The oxide diffusion-resistant layer and the AlCrTiN nitride wear-resistant layer are integrated, the four sublayers are arranged from inside to outside, and the total thickness of the coating is 1-3 mu m. The preparation method comprises the following steps: heating and ion etching the substrate, and depositing a CrAlTiZrY layer on the substrate by using an arc evaporation plating process; then using cathode arc ion plating process to continuously and sequentially deposit alpha-Cr2O3Layer, alpha-Al2O3A layer and an AlCrTiN layer. The synergistic effect of the aluminum-chromium-titanium-nitrogen coating and the aluminum oxide coating enables the coating to effectively block the internal and external diffusion of each element atom under the high-temperature working condition, and the coating has the advantages of good high-temperature wear resistance, simple preparation process, easy implementation and suitability for industrial production and application.

Description

Wear-resistant diffusion-resistant aluminum-chromium-titanium-nitrogen and aluminum oxide multilayer composite coating and preparation method thereof
Technical Field
The invention belongs to the technical field of surface coatings of cutting tools, and particularly relates to a wear-resistant diffusion-resistant aluminum-chromium-titanium-nitrogen and aluminum oxide multilayer composite coating and a preparation method thereof.
Background
The severe frictional wear between the surface of the cutting tool and the material being machined during cutting results in the tool being subjected to relatively high temperatures, especially temperatures of up to 1000 c or more under dry cutting conditions. For coated tools it is important whether the coating is wear resistant under high temperature conditions. It is found that as the working temperature rises, oxygen in the air accelerates to diffuse into the coating, and simultaneously, element atoms in the coating also strongly diffuse to the surface of the coating, when the working temperature of the nitride hard coating exceeds a certain temperature, the coating is oxidized, the nitride coating is converted into an oxide layer, in the conversion process, the coating is greatly applied to the interior of the coating due to expansion of coating crystal lattices, and is easy to peel off, and on the other hand, the converted oxide layer is loose in structure, low in hardness and not wear-resistant. Therefore, the problems of wear resistance and atomic diffusivity of the nitride hard coating under high-temperature cutting processing conditions need to be solved urgently.
Disclosure of Invention
The invention aims to overcome the problems in the prior art and provide a wear-resistant diffusion-resistant aluminum-chromium-titanium-nitrogen and aluminum oxide multilayer composite coating.
The invention also aims to provide a preparation method of the wear-resistant diffusion-resistant aluminum-chromium-titanium-nitrogen and aluminum oxide multilayer composite coating.
The wear-resistant diffusion-resistant aluminum-chromium-titanium-nitrogen and aluminum oxide multilayer composite coating is characterized in that the coating is an integral body formed by a high-entropy alloy bonding layer, an oxide template layer, an oxide diffusion-resistant layer and a nitride wear-resistant layer, the four sublayers are arranged from inside to outside, and the total thickness of the coating is 1-3 mu m.
Wherein, in the coating, the high-entropy alloy bonding layer is CraAlbTicZrdYeThe thickness of the film is 50-200 nm, wherein a + b + c + d + e =1, the ranges of a, b, c, d and e are 0.15-0.4.
Wherein, in the coating, the oxide template layer is alpha-Cr2O3The thickness is 150-300 nm; the oxide diffusion-resistant layer is alpha-Al2O3The thickness is 500-2000 nm; the nitride wear-resistant layer is AlCrTiN, and the thickness of the nitride wear-resistant layer is 300-500 nm.
The preparation method of the wear-resistant diffusion-resistant aluminum-chromium-titanium-nitrogen and aluminum oxide multilayer composite coating provided by the invention comprises the following steps:
A. loading the cleaned substrate material into a vacuum chamber of a coating device, vacuumizing and heating;
B. carrying out ion etching on the surface of the substrate;
C. preparing a high-entropy alloy bonding layer by using an arc evaporation process;
D. preparing an oxide template layer by using a cathodic arc coating process;
E. preparing an oxide diffusion-resistant layer by using a cathodic arc coating process;
F. and preparing the nitride wear-resistant layer by using a cathodic arc coating process.
In the step A, the back bottom is vacuumized to 0.03Pa or below, the auxiliary heating device of the furnace wall is opened to heat the substrate, and the rotating power supply of the frame is turned on to make the substrate rotate and revolve in the vacuum chamber until the temperature of the substrate reaches 380 ℃.
In the step B of the method, argon is introduced into the vacuum chamber, the flow of the argon is adjusted to ensure that the pressure intensity is 0.1-0.25 Pa, then a direct current bias voltage of-100 to-200V and a pulse bias voltage of-200 to-400V are applied to the substrate, and ionized Ar is utilized+And etching the surface of the substrate for 30-90 min.
In the step C of the method, the working pressure of the prepared high-entropy alloy bonding by the arc evaporation process is 0.1-0.2 Pa, the arc current passing through the evaporation crucible is 180-230A, and the material placed in the evaporation crucible is CraAlbTicZrdYeThe high-entropy alloy has a + b + c + d + e =1, the value ranges of a, b, c, d and e are 0.15-0.4, and the evaporation time is 5-10 min.
In the step D, the working gas for preparing the oxide template layer by the cathodic arc coating process is Ar + O2The working pressure is 1.5-3.5 Pa, the working target material is a Cr arc target, the target current is 50-100A, the bias voltage applied to the substrate is-30-80V, and the deposition time is 10-20 min.
In the step E, the working gas for preparing the oxide diffusion-resistant layer by the cathodic arc coating process is Ar + O2The working pressure is 1.0-3.0 Pa, the working target material is an Al arc target, the target current is 80-120A, the bias voltage applied to the substrate is-30-80V, and the deposition time is 40-150 min.
In the step F of the method, the working gas for preparing the nitride wear-resistant layer by the cathodic arc coating process is N2The working pressure is 1.5-3.5 Pa, the working target material is an AlCrTi alloy arc target, the target current is 80-120A, the bias voltage applied to the substrate is-30 to-80V, and the deposition time is 20-35 min.
Compared with the prior art, the invention has the following advantages:
1) the wear-resistant diffusion-resistant aluminum-chromium-titanium-nitrogen and aluminum oxide multilayer composite coating provided by the invention is composed of four sublayers with different functions and components, and firstly, compared with the traditional Cr and Ti pure metal bonding layer and TiAl alloy bonding layer, the high-entropy alloy bonding layer has higher obdurabilityThe adhesive can play a good role in bonding the cutter substrate material and the surface coating material, so that the coating and the substrate are firmly combined; next, alpha-Cr is used2O3The oxide template layer is beneficial to Al2O3According to alpha-Cr2O3The crystal structure epitaxial growth solves the problem of preparing alpha-Al by a physical vapor deposition method due to low temperature2O3The problem of difficulty; thirdly, alpha-Al2O3The oxide diffusion-resistant layer is combined with the AlCrTiN nitride wear-resistant layer, so that the problems of low high-temperature red hardness and insufficient wear resistance of a pure oxide coating and the problem of insufficient high-temperature diffusion resistance of a pure nitride coating are solved.
2) The invention provides a preparation method of a wear-resistant diffusion-resistant aluminum-chromium-titanium-nitrogen and aluminum oxide multilayer composite coating, which is a combined type ion plating process mainly based on cathode arc deposition and assisted by preparing a bonding layer through an evaporation plating process. Before coating, impurities adsorbed in the substrate material are released by heating, and meanwhile, the surface of the substrate is bombarded and etched by ionized Ar +, so that the combination of the coating and the substrate is enhanced; the high-entropy alloy material is evaporated by adopting an electric arc evaporation process, a high-entropy alloy bonding layer is deposited on the substrate, the bonding capacity of the coating and the substrate is further enhanced, the bonding layer is prepared by electric arc evaporation, the advantages of high deposition rate and almost unlimited size and shape of the evaporation raw material are that the evaporation raw material is weighed and then put into an evaporation crucible, and the bonding layer is deposited by adopting cathode electric arc ion plating, so that the evaporation raw material is required to be prepared into a target material with a certain shape and size; high ionization rate of particles and high ion energy in the process of cathode arc ion plating, and alpha-Al is easier to obtain than magnetron sputtering2O3. In the process of depositing the coating, the preparation of the multilayer composite coating is easy by switching different arc targets, and the operation process is simple and easy to master and control.
Detailed Description
The present invention is further illustrated by the following specific examples, but the present invention is not limited to the following examples.
Example 1
Mounting a clean cermet substratePutting the substrate into a vacuum chamber of a plasma enhanced composite ion coating system, opening an auxiliary heating device of a furnace wall to heat the substrate when the back bottom is vacuumized to 0.03Pa, and simultaneously opening a rotating power supply to enable the substrate to rotate ceaselessly until the temperature of the substrate reaches 380 ℃; introducing argon into the vacuum chamber, adjusting the flow of argon to ensure that the pressure is 0.15Pa, applying-200V DC bias and-400V pulse bias to the substrate, and utilizing ionized Ar+Etching the surface of the substrate for 90 min; closing substrate bias voltage and adjusting argon flow in sequence to ensure that working pressure is 0.1Pa, starting an evaporation plating main arc power supply to carry out evaporation coating, wherein the main arc current on a crucible is 220A, and evaporation raw material is Cr0.2Al0.2Ti0.2Zr0.2Y0.2Blocking, evaporating and depositing for 5 min; closing a main arc power supply, starting a Cr arc target, setting the target current to be 100A, introducing oxygen into the vacuum chamber, adjusting the flow of argon and oxygen to enable the working pressure to be 3.5Pa, applying bias voltage of-30V to the substrate, and depositing for 10 min; opening an Al arc target, setting the target current to be 120A, then closing a Cr arc target power supply, adjusting the gas flow, controlling the pressure to be 3.0Pa, adjusting the substrate bias voltage to be-40V, and coating for 70 min; starting the AlCrTi alloy arc target, setting the target current to be 95A, then closing the Al arc target power supply, introducing nitrogen, closing oxygen and argon, adjusting the gas flow, controlling the working pressure to be 2.5Pa, adjusting the substrate bias voltage to be-50V, and finishing the deposition for 30 min. The prepared wear-resistant diffusion-resistant aluminum-chromium-titanium-nitrogen and aluminum oxide multilayer composite coating consists of a CrAlTiZrY high-entropy alloy bonding layer and alpha-Cr2O3Oxide template layer, alpha-Al2O3The oxide diffusion-resistant layer and the AlCrTiN nitride wear-resistant layer are composed of four sublayers, the sublayers are firmly combined with each other and the coating is firmly combined with the substrate, and the coating has good diffusion-resistant performance and high-temperature wear-resistant performance under the high-temperature working condition.
Example 2
Loading a clean hard alloy substrate into a vacuum chamber of a plasma enhanced composite ion coating system, opening an auxiliary heating device of a furnace wall to heat the substrate when the back substrate is vacuumized to 0.03Pa, and simultaneously opening a rotating power supply to enable the substrate to rotate ceaselessly until the substrate is heated to the temperature of 0.03PaThe temperature of the substrate reaches 380 ℃; introducing argon into the vacuum chamber, adjusting the flow of argon to ensure that the pressure is 0.18Pa, applying-200V DC bias and-400V pulse bias to the substrate, and utilizing ionized Ar+Etching the surface of the substrate for 45 min; closing substrate bias voltage and adjusting argon flow in sequence to ensure that working pressure is 0.18Pa, starting an evaporation plating main arc power supply to carry out evaporation coating, wherein the main arc current on a crucible is 195A, and evaporation raw material is Cr0.4Al0.15Ti0.15Zr0.15Y0.15Blocking, evaporating and depositing for 10 min; closing a main arc power supply, starting a Cr arc target, setting the target current to be 70A, introducing oxygen into the vacuum chamber, adjusting the flow of argon and oxygen to enable the working pressure to be 1.5Pa, applying bias voltage of-80V to the substrate, and depositing for 15 min; starting an Al arc target, setting the target current to be 120A, then closing a Cr arc target power supply, adjusting the gas flow, controlling the pressure to be 3.0Pa, and continuously coating the film for 40min with the substrate bias voltage kept unchanged; and starting the AlCrTi alloy arc target, setting the target current to be 80A, then closing an Al arc target power supply, introducing nitrogen, closing oxygen and argon, adjusting the gas flow, controlling the working pressure to be 1.5Pa, continuously keeping the substrate bias voltage unchanged, and finishing the deposition for 20 min. The prepared wear-resistant diffusion-resistant aluminum-chromium-titanium-nitrogen and aluminum oxide multilayer composite coating consists of a CrAlTiZrY high-entropy alloy bonding layer and alpha-Cr2O3Oxide template layer, alpha-Al2O3The oxide diffusion-resistant layer and the AlCrTiN nitride wear-resistant layer are composed of four sublayers, the sublayers are firmly combined with each other and the coating is firmly combined with the substrate, and the coating has good diffusion-resistant performance and high-temperature wear-resistant performance under the high-temperature working condition.
Example 3
Loading a clean metal ceramic substrate into a vacuum chamber of a plasma enhanced composite ion coating system, opening an auxiliary heating device of a furnace wall to heat the substrate when the back substrate is vacuumized to 0.03Pa, and simultaneously opening a rotating power supply to enable the substrate to rotate ceaselessly until the temperature of the substrate reaches 380 ℃; introducing argon into the vacuum chamber, adjusting the flow of argon to ensure that the pressure is 0.1Pa, applying-200V DC bias and-400V pulse bias to the substrate, and utilizing ionized Ar+Para radicalEtching the bottom surface for 60 min; closing substrate bias voltage and adjusting argon flow in sequence to ensure that the working pressure is 0.15Pa, starting an evaporation plating main arc power supply to carry out evaporation coating, wherein the main arc current on a crucible is 185A, and the evaporation raw material is Cr0.2Al0.2Ti0.2Zr0.2Y0.2Blocking, evaporating and depositing for 10 min; closing a main arc power supply, starting a Cr arc target, setting the target current to be 70A, introducing oxygen into the vacuum chamber, adjusting the flow of argon and oxygen to enable the working pressure to be 2.5Pa, applying bias voltage of-50V to the substrate, and depositing for 10 min; starting an Al arc target, setting the target current to be 80A, then closing a Cr arc target power supply, keeping the working pressure and the substrate bias voltage unchanged, and continuing to deposit for 120 min; starting the AlCrTi alloy arc target, setting the target current to be 100A, then closing an Al arc target power supply, introducing nitrogen, closing oxygen and argon, adjusting the gas flow, controlling the working pressure to be 2.0Pa, continuously keeping the substrate bias voltage unchanged, and ending the deposition for 30 min. The prepared wear-resistant diffusion-resistant aluminum-chromium-titanium-nitrogen and aluminum oxide multilayer composite coating consists of a CrAlTiZrY high-entropy alloy bonding layer and alpha-Cr2O3Oxide template layer, alpha-Al2O3The oxide diffusion-resistant layer and the AlCrTiN nitride wear-resistant layer are composed of four sublayers, the sublayers are firmly combined with each other and the coating is firmly combined with the substrate, and the coating has good diffusion-resistant performance and high-temperature wear-resistant performance under the high-temperature working condition.
Example 4
Putting a clean hard alloy substrate into a vacuum chamber of a plasma enhanced composite ion coating system, opening an auxiliary heating device of a furnace wall to heat the substrate when the back substrate is vacuumized to 0.03Pa, and simultaneously opening a rotating power supply to enable the substrate to rotate ceaselessly until the temperature of the substrate reaches 380 ℃; introducing argon into the vacuum chamber, adjusting the flow of argon to ensure that the pressure is 0.25Pa, applying-200V DC bias and-350V pulse bias to the substrate, and utilizing ionized Ar+Etching the surface of the substrate for 30 min; closing substrate bias voltage and adjusting argon flow in sequence to ensure that working pressure is 0.2Pa, starting an evaporation plating main arc power supply to carry out evaporation coating, wherein the main arc current on a crucible is 210A, and evaporation raw material is Cr0.2Al0.2Ti0.2Zr0.2Y0.2Blocking, evaporating and depositing for 7 min; closing a main arc power supply, starting a Cr arc target, setting the target current to be 80A, introducing oxygen into the vacuum chamber, adjusting the flow of argon and oxygen to enable the working pressure to be 3.0Pa, applying a bias voltage of-80V to the substrate, and depositing for 15 min; starting an Al arc target, setting the target current to be 90A, then closing a Cr arc target power supply, adjusting the gas flow, controlling the pressure to be 2.5Pa, and keeping the substrate bias constant to continue depositing for 150 min; and starting the AlCrTi alloy arc target, setting the target current to be 120A, then closing an Al arc target power supply, introducing nitrogen, closing oxygen and argon, adjusting the gas flow, controlling the working pressure to be 2.6Pa, continuously keeping the substrate bias voltage unchanged, and finishing the deposition for 20 min. The prepared wear-resistant diffusion-resistant aluminum-chromium-titanium-nitrogen and aluminum oxide multilayer composite coating consists of a CrAlTiZrY high-entropy alloy bonding layer and alpha-Cr2O3Oxide template layer, alpha-Al2O3The oxide diffusion-resistant layer and the AlCrTiN nitride wear-resistant layer are composed of four sublayers, the sublayers are firmly combined with each other and the coating is firmly combined with the substrate, and the coating has good diffusion-resistant performance and high-temperature wear-resistant performance under the high-temperature working condition.

Claims (2)

1. The wear-resistant diffusion-resistant aluminum-chromium-titanium-nitrogen and aluminum oxide multilayer composite coating is characterized in that the coating is an integral body formed by a high-entropy alloy bonding layer, an oxide template layer, an oxide diffusion-resistant layer and a nitride wear-resistant layer, the four sublayers are arranged from inside to outside, and the total thickness of the coating is 1-3 mu m; the high-entropy alloy bonding layer is CraAlbTicZrdYeA + b + c + d + e =1, the value ranges of a, b, c, d and e are 0.15-0.4, and the thickness is 50-200 nm; the oxide template layer is alpha-Cr2O3The thickness is 150-300 nm; the oxide diffusion-resistant layer is alpha-Al2O3The thickness is 500-2000 nm; the nitride wear-resistant layer is AlCrTiN, and the thickness of the nitride wear-resistant layer is 300-500 nm.
2. The preparation method of the wear-resistant diffusion-resistant aluminum-chromium-titanium-nitrogen and aluminum oxide multilayer composite coating of claim 1, characterized by comprising the following steps:
A. loading a clean substrate material into a vacuum chamber of coating equipment, vacuumizing and heating, wherein the vacuumizing and heating are to firstly vacuumize the back bottom to 0.03Pa or below, opening an auxiliary heating device of a furnace wall to heat the substrate, and simultaneously opening a rack rotating power supply to enable the substrate to perform rotation and revolution motion in the vacuum chamber until the temperature of the substrate reaches 380 ℃;
B. performing ion etching on the surface of the substrate, wherein the ion etching is to introduce argon into a vacuum chamber, adjust the flow of the argon to ensure that the pressure is 0.1-0.25 Pa, apply-100 to-200V of direct current bias and-200 to-400V of pulse bias to the substrate, and utilize ionized Ar+Etching the surface of the substrate for 30-90 min;
C. the high-entropy alloy bonding layer is prepared by an arc evaporation process, the working pressure of the high-entropy alloy bonding prepared by the arc evaporation process is 0.1-0.2 Pa, the arc current passing through an evaporation crucible is 180-220A, and a material placed in the evaporation crucible is CraAlbTicZrdYeThe alloy with high entropy, a + b + c + d + e =1, the value ranges of a, b, c, d and e are 0.15-0.4, and the evaporation time is 5-10 min;
D. preparing an oxide template layer by using a cathodic arc coating process, wherein the working gas for preparing the oxide template layer by using the cathodic arc coating process is Ar + O2The working pressure is 1.5-3.5 Pa, the working target material is a Cr arc target, the target current is 50-100A, the bias voltage applied to the substrate is-30-80V, and the deposition time is 10-20 min;
E. preparing an oxide diffusion-resistant layer by using a cathodic arc coating process, wherein the working gas for preparing the oxide diffusion-resistant layer by using the cathodic arc coating process is Ar + O2The working pressure is 1.0-3.0 Pa, the working target material is an Al arc target, the target current is 80-120A, the bias voltage applied to the substrate is-30-80V, and the deposition time is 40-150 min;
F. preparing the nitride wear-resistant layer by using a cathodic arc coating process, wherein the working gas for preparing the nitride wear-resistant layer by using the cathodic arc coating process is N2The working pressure is 1.5-3.5Pa, the working target material is an AlCrTi alloy arc target, the target current is 80-120A, the bias voltage applied to the substrate is-30 to-80V, and the deposition time is 20-35 min.
CN201910973794.2A 2019-10-14 2019-10-14 Wear-resistant diffusion-resistant aluminum-chromium-titanium-nitrogen and aluminum oxide multilayer composite coating and preparation method thereof Active CN110791733B (en)

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