CN110772955A - Composite photocatalytic oxidation reaction device for treating industrial waste gas - Google Patents

Composite photocatalytic oxidation reaction device for treating industrial waste gas Download PDF

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Publication number
CN110772955A
CN110772955A CN201911295040.2A CN201911295040A CN110772955A CN 110772955 A CN110772955 A CN 110772955A CN 201911295040 A CN201911295040 A CN 201911295040A CN 110772955 A CN110772955 A CN 110772955A
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photocatalytic
liquid
waste gas
industrial waste
solid phase
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CN201911295040.2A
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钱阵
戴军森
计杨
张婷婷
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Anhui Institute of Information Engineering
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Anhui Institute of Information Engineering
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/75—Multi-step processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86—Catalytic processes
    • B01D53/8678—Removing components of undefined structure
    • B01D53/8687—Organic components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2255/00—Catalysts
    • B01D2255/80—Type of catalytic reaction
    • B01D2255/802—Photocatalytic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/70—Organic compounds not provided for in groups B01D2257/00 - B01D2257/602
    • B01D2257/708—Volatile organic compounds V.O.C.'s

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  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Catalysts (AREA)

Abstract

The invention discloses a composite photocatalytic oxidation reaction device for treating industrial waste gas, which comprises a gas-solid phase photocatalytic reaction device and a liquid-solid phase photocatalytic reaction device; the gas-solid phase photocatalytic reaction equipment comprises an outer shell, a spring-shaped pipeline, a load-type semiconductor photocatalytic material and a light source, wherein the load-type semiconductor photocatalytic material is filled in the spring-shaped pipeline, and the spring-shaped pipeline and the light source are arranged in the outer shell; the liquid-solid phase photocatalytic reaction equipment comprises a container, a light source, liquid, a powder semiconductor photocatalytic material and a gas distributor; the light source and the liquid are arranged in the container, the gas distributor is arranged at the bottom of the container, and the powder semiconductor photocatalytic material is dispersed in the liquid; the spring-shaped pipeline is connected with the gas distributor through a glass pipeline between the bottom of the outer shell and the gas distributor. The composite photocatalytic oxidation reaction device has an excellent degradation effect.

Description

Composite photocatalytic oxidation reaction device for treating industrial waste gas
Technical Field
The invention relates to a photocatalytic oxidation reaction, in particular to a composite photocatalytic oxidation reaction device for treating industrial waste gas.
Background
The rapid development of economy poses serious environmental problems to humans, particularly the atmospheric environment in which humans live is severely polluted. The large emission of Volatile Organic Compounds (VOCs) is the main cause of atmospheric environmental pollution, and the compounds not only destroy the atmospheric environment, but also pollute the water environment and the soil environment. It is well known that most volatile organic compounds are toxic and even some compounds can induce disease with "tri-pathogenic" effects (carcinogenic, teratogenic, mutagenic). Therefore, the volatile organic compounds have seriously threatened the living environment of human beings, and the effective control of the emission of VOCs and the restoration of the polluted environment are one of the problems which need to be solved by human beings at present.
The semiconductor photocatalytic oxidation technology is a novel method which can degrade volatile organic pollutants at normal temperature and normal pressure and is developed in recent years, and the technology has the characteristics of low energy consumption, high pollutant removal efficiency, capability of degrading various organic pollutants, no secondary pollution and the like, so the photocatalytic oxidation technology has immeasurable application prospect in environmental treatment. The core of the photocatalytic oxidation technology is the preparation of semiconductor photocatalytic materials, and in the preparation process of the materials, small-sized semiconductor materials have higher photocatalytic activity, because the small-sized semiconductor materials have large specific surface area and are favorable for adsorbing organic pollutants. However, recycling of small-sized semiconductor materials must be considered in open systems, as the environmental hazards of unrecycled small-sized semiconductor materials may be greater, particularly nanopowder materials. In addition, when the photocatalytic oxidation technology is used for treating large-flow industrial waste gas, the semiconductor photocatalyst can not effectively and completely oxidize and degrade organic pollutants at one time due to the fact that the organic waste gas stays in the traditional photocatalytic oxidation equipment for a short time.
Disclosure of Invention
The invention aims to provide a composite photocatalytic oxidation reaction device for treating industrial waste gas, which deeply couples two photocatalytic oxidation technologies of gas-solid phase reaction and liquid-solid phase reaction in the same reaction equipment, overcomes the problem that the traditional equipment pollutes the environment after a powder photocatalyst falls off and disperses into the air along with the industrial waste gas in industrial application, greatly increases the retention time of the industrial waste gas in the photocatalytic oxidation equipment, and improves the contact area of the semiconductor photocatalyst and light.
In order to achieve the above object, the present invention provides a combined type photocatalytic oxidation reaction apparatus for treating industrial waste gas, comprising a gas-solid phase photocatalytic reaction device, a liquid-solid phase photocatalytic reaction device;
the gas-solid phase photocatalytic reaction equipment comprises an outer shell, a spring-shaped pipeline, a load-type semiconductor photocatalytic material and a light source, wherein the load-type semiconductor photocatalytic material is filled in the spring-shaped pipeline, and the spring-shaped pipeline and the light source are arranged in the outer shell;
the liquid-solid phase photocatalytic reaction equipment comprises a container, a light source, liquid, a powder semiconductor photocatalytic material and a gas distributor; the light source and the liquid are arranged in the container, the gas distributor is arranged at the bottom of the container, and the powder semiconductor photocatalytic material is dispersed in the liquid; the spring-shaped pipeline is connected with the gas distributor through a glass pipeline between the bottom of the outer shell and the gas distributor.
Preferably, the container is sleeved outside the gas-solid phase photocatalytic reaction device.
Preferably, the light source in the liquid-solid phase photocatalytic reaction apparatus is higher than the liquid level of the liquid.
Preferably, the light source is selected from the group consisting of high-pressure mercury lamps, low-pressure mercury lamps, xenon lamps, halogen lamps or LED lamps, with a power of 50-1000W and a wavelength in the range of 100-1200 nm.
Preferably, the "spring-shaped" conduit cross-sectional shape is selected from flat, square, triangular, circular or oval.
Preferably, the surface of the gas distributor is uniformly distributed with a plurality of vent pipes with holes, and the holes are in a shape selected from square, rectangle, triangle, circle or ellipse.
Preferably, the inner wall of the outer shell is adhered with a light reflection layer, and the reflectivity of the light reflection layer to light rays is more than 70%.
Preferably, the material of the outer shell is 304 stainless steel.
Preferably, the glass tube is selected from quartz glass, borosilicate glass or soda glass.
Preferably, the supported semiconductor photocatalytic material is selected from nano TiO supported on foamed nickel 2Nano ZnO and nano Fe 2O 3Or nano TiO supported on fiber non-woven fabric 2Nano ZnO and nano Fe 2O 3；
The liquid is selected from water, alkali solution, acid solution, and organic solvent; and/or
The powdered semiconductor photocatalytic material is selected from nano TiO 2Nano ZnO or nano Fe 2O 3。
In the above technical solutions, the present invention provides typical but non-limiting technical solutions as follows: (1) gas-solid phase photocatalytic reaction equipment: the organic waste gas passes through a spring-shaped pipeline, a loaded semiconductor photocatalytic material is arranged in the pipeline, and a light source for exciting a semiconductor is arranged outside the pipeline. Under the action of semiconductor photocatalytic material, most of organic compounds in organic waste gas are decomposed into small molecular organic matters or mineralized into CO 2And H 2O; (2) liquid-solid phase photocatalytic reaction equipment: and (2) allowing the organic waste gas left in the step (1) to enter a liquid pool through a gas distributor, wherein liquid and powder semiconductor photocatalytic materials are filled in the liquid pool, and light sources are uniformly distributed in the pool. The residual trace organic pollutant with low concentration can be dissolved in the liquid, the liquid contains the photocatalyst and is provided with the light source, so that the organic pollutant with low concentration dissolved in the liquid can be removed by the photocatalysis, and the aim of thoroughly purifying the organic waste gas is fulfilled. Wherein, the organic waste gas in the step (1) and the step (2) is complex industrial organic waste gas discharged by various factories, and the industrial organic waste gas needs to be dedusted or contains a small amount of dust.
When dustless industrial organic waste gas passes through the gas-solid phase photocatalytic reaction equipment, the semiconductor photocatalytic material is excited under the irradiation of light to generate photoelectron-hole pairs, the electrons and the holes have strong oxidation-reduction property,will oxidize and reduce the surrounding O 2Molecule and H 2Formation of superoxide radical (. O) by O molecule 2 －) And hydroxyl radical (OH) with high oxidation potential, which can degrade various organic pollutants in the organic waste gas in a nonselective oxidation way, most of the organic pollutants are completely degraded in the step, and the remaining low-concentration organic waste gas enters the liquid-solid phase photocatalytic reaction equipment. The micro organic pollutant with low concentration can be dissolved in the liquid pool, the liquid pool also contains the photocatalyst and is provided with the light source, so that the organic pollutant with low concentration dissolved in the liquid can be removed by the photocatalysis, and the aim of thoroughly purifying the organic waste gas is fulfilled. In addition, the supported photocatalyst used in the gas-solid phase photocatalytic reaction equipment partially falls off under the action of wind for a long time, and the fallen powder photocatalyst can enter a liquid pool to continuously participate in photocatalytic reaction without scattering into the air along with gas to pollute the environment.
Compared with the prior art, the invention has the following advantages and beneficial effects:
the device has simple structure and reasonable design, fully exerts the advantages of the photocatalytic oxidation technology, can continuously and dynamically process more complicated industrial organic waste gas, and can effectively mineralize organic pollutants into CO by using the gas-solid phase photocatalytic reaction device and the liquid-solid phase photocatalytic reaction device 2And H 2And O, the purpose of thoroughly removing organic pollution is achieved. The problems of restricting the industrial application of the photocatalytic oxidation technology are effectively solved, which can greatly promote the industrial application process of the photocatalytic oxidation technology. The device has a large popularization value and a considerable market prospect.
Additional features and advantages of the invention will be set forth in the detailed description which follows.
Drawings
The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the principles of the invention and not to limit the invention. In the drawings:
FIG. 1 is a schematic structural diagram of a preferred embodiment of a combined photocatalytic oxidation reaction device for treating industrial waste gas provided by the present invention;
FIG. 2 is a plan view of the gas-solid phase photocatalytic reaction apparatus 1 in FIG. 1;
FIG. 3 is a schematic diagram of the gas-solid phase photocatalytic reaction apparatus 1 in FIG. 1.
Description of the reference numerals
1. Gas-solid phase photocatalysis reaction equipment 2 and 'spring-shaped' pipeline
3. Supported semiconductor photocatalytic material 4, liquid-solid phase photocatalytic reaction device
5. Light source 6, liquid
7. Powder semiconductor photocatalytic material 8 and gas distributor
9. Outer casing
Detailed Description
The following detailed description of embodiments of the invention refers to the accompanying drawings. It should be understood that the detailed description and specific examples, while indicating the present invention, are given by way of illustration and explanation only, not limitation.
In the present invention, unless otherwise specified, the directional words "inside, outside" and the like included in a term merely represent the orientation of the term in a conventional use state or a colloquial meaning understood by those skilled in the art, and should not be construed as limiting the term.
The invention provides a composite photocatalytic oxidation reaction device for treating industrial waste gas, which comprises a gas-solid phase photocatalytic reaction device 1 and a liquid-solid phase photocatalytic reaction device 4, as shown in figure 1; the gas-solid phase photocatalytic reaction equipment 1 comprises an outer shell 9, a 'spring-shaped' pipeline 2, a loaded semiconductor photocatalytic material 3 and a light source 5, wherein the loaded semiconductor photocatalytic material 3 is filled in the 'spring-shaped' pipeline 2, and the 'spring-shaped' pipeline 2 and the light source 5 are arranged in the outer shell 9; the liquid-solid phase photocatalytic reaction equipment 4 comprises a container, a light source 5, liquid 6, a powder semiconductor photocatalytic material 7 and a gas distributor 8; the light source 5 and the liquid 6 are arranged in the container, the gas distributor 8 is arranged at the bottom of the container, and the powder semiconductor photocatalytic material 7 is dispersed in the liquid 6; the "spring-shaped" pipe 2 is connected to the gas distributor 8 via a glass pipe via the bottom of the outer casing 9.
Compared with the prior art, the invention has the following advantages and beneficial effects: the device has simple structure and reasonable design, fully exerts the advantages of the photocatalytic oxidation technology, can continuously and dynamically process more complicated industrial organic waste gas, and can effectively mineralize organic pollutants into CO by using the gas-solid phase photocatalytic reaction device and the liquid-solid phase photocatalytic reaction device 2And H 2And O, the purpose of thoroughly removing organic pollution is achieved. The problems of restricting the industrial application of the photocatalytic oxidation technology are effectively solved, which can greatly promote the industrial application process of the photocatalytic oxidation technology. The device has a large popularization value and a considerable market prospect.
In the present invention, the relative position between the gas-solid phase photocatalytic reaction apparatus 1 and the liquid-solid phase photocatalytic reaction apparatus 4 can be selected within a wide range, but in order to further improve the space utilization, it is preferable that the container be fitted outside the gas-solid phase photocatalytic reaction apparatus 1.
In the present invention, the installation position of the light source 5 can also be selected within a wide range, but in order to further improve the catalytic degradation efficiency, it is preferable that the light source 5 in the liquid-solid phase photocatalytic reaction apparatus 4 is higher than the liquid level of the liquid 6.
In the present invention, the specific kind and specification of the light source 5 can be selected within a wide range, but in order to further improve the photodegradation efficiency, it is preferable that the light source 5 is selected from a high-pressure mercury lamp, a low-pressure mercury lamp, a xenon lamp, a halogen lamp or an LED lamp, the power is 50-1000W, and the generated wavelength range is 100-1200 nm.
In the present invention, the structure and shape of the "spring-shaped" pipe 2 can be selected within a wide range, but in order to further improve the photodegradation efficiency. Preferably, the cross-sectional shape of the "spring-shaped" pipe 2 is selected from flat, square, triangular, circular or oval, more preferably flat. The design of the flat spring pipeline fully considers the flaky characteristics of the foamed nickel or fiber non-woven fabric carrier, greatly increases the contact area of the photocatalyst and light, and can effectively control the residence and reaction time of industrial organic waste gas on the photocatalyst, thereby influencing the removal effect of the organic waste gas. The flat spring pipeline effectively solves the problems of small contact area between the photocatalyst and light and short retention time of industrial organic waste gas on the photocatalyst, and also solves the problem of environmental pollution caused by the falling of the supported photocatalyst entering air along with gas.
In the present invention, the structure of the gas distributor 8 can be selected in a wide range, but in order to further enhance the photodegradation effect, it is preferable that the gas distributor 8 has an aeration pipe in which a plurality of holes are uniformly distributed on the surface thereof, and the shape of the holes is selected from a square, a rectangle, a triangle, a circle, or an ellipse. Thus, low concentrations of trace organic contaminants are dissolved in the liquid pool through the pores.
In the present invention, in order to further improve the photodegradation effect, it is preferable that a light reflection layer is attached to the inner wall of the outer case 9, and the light reflection layer has a reflectance of more than 70% with respect to light. The light intensity in the gas-solid phase photocatalytic reaction device 1 is increased through the light reflection layer, so that the degradation effect is improved.
In the present invention, the material of the outer case 9 can be selected within a wide range, but in order to further improve the service life of the outer case 9, it is preferable that the material of the outer case 9 is 304 stainless steel.
In the present invention, the material of the glass tube may be selected from a wide range, but in order to further improve the effect of the glass tube, it is preferable that the glass tube is selected from quartz glass, borosilicate glass, or soda glass.
In the present invention, the photocatalyst in the supported semiconductor photocatalytic material 3 and the powdered semiconductor photocatalytic material 7 are the same kind of nano material or different kinds of nano materials, but in order to improve the catalytic efficiency, it is preferable that the supported semiconductor photocatalytic material 3 is selected from nano TiO supported on foamed nickel 2Nano ZnO and nano Fe 2O 3Or nano TiO supported on fiber non-woven fabric 2Nano ZnO,Nano Fe 2O 3(ii) a The preparation method of the supported photocatalyst generally comprises an impregnation method, a precipitation method, a hydrothermal method and the like. More preferably, the powdered semiconductor photocatalytic material 7 is selected from nano-TiO 2Nano ZnO or nano Fe 2O 3。
Further, in the present invention, the kind of the liquid 6 may be selected within a wide range, but in order to enhance the dispersion effect, it is preferable that the liquid 6 is selected from water, alkali solution, acid solution, organic solvent.
The preferred embodiments of the present invention have been described in detail with reference to the accompanying drawings, however, the present invention is not limited to the specific details of the above embodiments, and various simple modifications can be made to the technical solution of the present invention within the technical idea of the present invention, and these simple modifications are within the protective scope of the present invention.
It should be noted that the various technical features described in the above embodiments can be combined in any suitable manner without contradiction, and the invention is not described in any way for the possible combinations in order to avoid unnecessary repetition.
In addition, any combination of the various embodiments of the present invention is also possible, and the same should be considered as the disclosure of the present invention as long as it does not depart from the spirit of the present invention.

Claims (10)

1. A composite photocatalytic oxidation reaction device for treating industrial waste gas is characterized by comprising a gas-solid phase photocatalytic reaction device (1) and a liquid-solid phase photocatalytic reaction device (4);
the gas-solid phase photocatalytic reaction equipment (1) comprises an outer shell (9), a spring-shaped pipeline (2), a load type semiconductor photocatalytic material (3) and a light source (5), wherein the load type semiconductor photocatalytic material (3) is filled in the spring-shaped pipeline (2), and the spring-shaped pipeline (2) and the light source (5) are arranged in the outer shell (9);
the liquid-solid phase photocatalytic reaction equipment (4) comprises a container, a light source (5), liquid (6), a powder semiconductor photocatalytic material (7) and a gas distributor (8); the light source (5) and the liquid (6) are arranged in the container, the gas distributor (8) is arranged at the bottom of the container, and the powder semiconductor photocatalytic material (7) is dispersed in the liquid (6); the spring-shaped pipeline (2) is connected with the gas distributor (8) through a glass pipeline through the bottom of the outer shell (9).
2. The combined photocatalytic oxidation reaction equipment for treating industrial waste gas according to claim 1, wherein the container is sleeved outside the gas-solid phase photocatalytic reaction equipment (1).
3. The combined photocatalytic oxidation reaction equipment for treating industrial waste gas according to claim 1, characterized in that the light source (5) in the liquid-solid phase photocatalytic reaction equipment (4) is higher than the liquid level of the liquid (6).
4. The combined type photocatalytic oxidation reaction equipment for treating industrial waste gas according to claim 1, wherein the light source (5) is selected from a high pressure mercury lamp, a low pressure mercury lamp, a xenon lamp, a halogen lamp or an LED lamp, the power is 50-1000W, and the generated wavelength range is 100-1200 nm.
5. The combined photocatalytic oxidation reaction equipment for treating industrial waste gas according to claim 1, characterized in that the cross-sectional shape of the "spring-shaped" pipe (2) is selected from flat, square, triangular, circular or oval.
6. The combined photocatalytic oxidation reaction equipment for treating industrial waste gas according to claim 1, characterized in that the surface of the gas distributor (8) is uniformly distributed with a plurality of vent pipes with holes, and the holes are selected from square, rectangle, triangle, circle or ellipse.
7. The combined type photocatalytic oxidation reaction equipment for treating industrial waste gas according to claim 1, characterized in that the inner wall of the outer shell (9) is adhered with a light reflecting layer, and the reflectivity of the light reflecting layer to light is more than 70%.
8. The combined photocatalytic oxidation reaction equipment for treating industrial waste gas according to claim 1, characterized in that the material of the outer shell (9) is 304 stainless steel.
9. The combined photocatalytic oxidation reaction equipment for treating industrial waste gas according to claim 1, wherein the glass pipe is selected from quartz glass, borosilicate glass or soda glass.
10. The combined photocatalytic oxidation reaction equipment for treating industrial waste gas according to claim 1, characterized in that the supported semiconductor photocatalytic material (3) is selected from nano TiO supported on foamed nickel 2Nano ZnO and nano Fe 2O 3Or nano TiO supported on fiber non-woven fabric 2Nano ZnO and nano Fe 2O 3；
The liquid (6) is selected from water, alkali liquor, acid liquor and organic solvent; and/or
The powder semiconductor photocatalytic material (7) is selected from nano TiO 2Nano ZnO or nano Fe 2O 3。
CN201911295040.2A 2019-12-16 2019-12-16 Composite photocatalytic oxidation reaction device for treating industrial waste gas Withdrawn CN110772955A (en)

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Application Number Priority Date Filing Date Title
CN201911295040.2A CN110772955A (en) 2019-12-16 2019-12-16 Composite photocatalytic oxidation reaction device for treating industrial waste gas

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115246682A (en) * 2021-04-27 2022-10-28 天津工业大学 Portable advanced oxidation water purification device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115246682A (en) * 2021-04-27 2022-10-28 天津工业大学 Portable advanced oxidation water purification device

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