CN110744953B - Work platform direction adjustment mechanism and drawing machine - Google Patents
Work platform direction adjustment mechanism and drawing machine Download PDFInfo
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- CN110744953B CN110744953B CN201910745178.1A CN201910745178A CN110744953B CN 110744953 B CN110744953 B CN 110744953B CN 201910745178 A CN201910745178 A CN 201910745178A CN 110744953 B CN110744953 B CN 110744953B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B43—WRITING OR DRAWING IMPLEMENTS; BUREAU ACCESSORIES
- B43L—ARTICLES FOR WRITING OR DRAWING UPON; WRITING OR DRAWING AIDS; ACCESSORIES FOR WRITING OR DRAWING
- B43L13/00—Drawing instruments, or writing or drawing appliances or accessories not otherwise provided for
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y30/00—Apparatus for additive manufacturing; Details thereof or accessories therefor
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Abstract
The invention discloses a guide adjusting mechanism of a working platform and a drawing machine. The working platform guiding and adjusting mechanism is positioned on the bases on two sides, a guiding mechanism which is arranged on the inner side of the base and used for transversely guiding the working platform, and an adjusting mechanism used for adjusting the position of the guiding mechanism. The drawing machine comprises a first traction mechanism, a second traction mechanism, a drawing mechanism capable of moving along the X-axis direction under the transmission of the first traction mechanism, a working platform which is positioned below the drawing mechanism and can move along the Y-axis direction under the transmission of the second traction mechanism, and a working platform guide adjusting mechanism for guiding the working platform in the Y-axis direction. The drawing machine provided by the invention realizes stable movement of the working platform through the first traction mechanism and the second traction mechanism, is suitable for different working platforms through the guide adjusting mechanism, and can avoid shaking caused by drawing driving through the guide adjusting mechanism, so that the whole device is more stable in the operation process.
Description
Technical Field
The invention relates to output equipment, in particular to a platform guiding and adjusting mechanism and a drawing machine.
Background
The 3D printing and drawing machine is an automatic printing and drawing mechanism. Under the control of computer instructions, computer languages are converted into control signals through a control interface, and movements of a printing mechanism or a drawing mechanism (such as a drawing pen) in different dimensional directions, pen lifting, pen dropping and the like are controlled, so that 3D printing or drawing of graphics, characters and the like is completed. In the working process of a 3D printer, a plotter and the like, the stable output and the printing/drawing with higher precision as far as possible need to be realized, but the traditional control plotter has the problems of poor precision, unstable output and the like.
Meanwhile, in the traditional mode, after the working platform is installed between two bases of a traditional drawing machine and a 3D printer, the model and the position of the working platform are relatively fixed. Namely, after the traditional plotter, the 3D printer and the like are assembled successfully, the working platform with the selected model is fixed, the position of the working platform is also fixed, and the adjustability is poor; when the adjustable platform is used for printing, drawing and/or writing, on one hand, the model of the platform is difficult to flexibly adjust according to the requirements of application occasions, namely, working platforms with different widths and thicknesses cannot be temporarily replaced or selected, and on the other hand, flexible and accurate adjustment is difficult to be carried out on slight width change caused by comprehensive reasons such as errors and tolerance existing in the manufacturing process of the working platforms or abrasion brought in the long-term use process. Overall, the selectable and/or adjustable types are limited to different degrees, which affects the stability and accuracy of the operation.
Meanwhile, some existing plotters, 3D printers and the like move along the X axis and the Y axis by drawing/driving the printing mechanism or the plotting mechanism on the XY plane, and the driving mechanism (which can also be a drawing mechanism) for driving the printing mechanism or the plotting mechanism to move along the X axis and the driving mechanism for driving the printing mechanism or the plotting mechanism to move along the Y axis occupy more or less effective printing/plotting space of the printing mechanism or the plotting mechanism in the X axis or the Y axis direction, respectively, and are complex in structure, large in size, high in cost and inconvenient to carry.
Disclosure of Invention
The purpose of the invention is as follows: the invention provides a drawing machine capable of realizing stable drawing and precision drawing. The invention also provides a guide adjusting mechanism of the working platform.
The technical scheme is as follows: the invention relates to a guide adjusting mechanism of a working platform, which comprises bases positioned on two sides, a guide mechanism which is arranged on the inner side of the base and used for transversely guiding the working platform, and an adjusting mechanism used for adjusting the position of the guide mechanism; the adjusting mechanism comprises a first adjusting mechanism used for adjusting the vertical relative position of the guide mechanism and a second adjusting mechanism used for adjusting the axial relative position of the guide mechanism.
Preferably, the adjusting mechanism comprises a first adjusting mechanism and a second adjusting mechanism, the first adjusting mechanism and the second adjusting mechanism are respectively arranged in the bases on two sides, and the second adjusting mechanism is at least arranged in the base on one side; and/or the adjusting mechanism is provided with a resetting mechanism for resetting the adjusting mechanism.
Preferably, the guide mechanism comprises at least one set of guide wheel assemblies arranged inside each base, and each guide wheel assembly comprises a first guide wheel and a second guide wheel, wherein the first guide wheels are vertically distributed, and the second guide wheels are positioned below the first guide wheels.
Preferably, the adjustment mechanism is provided with a central shaft for mounting the first guide wheel and the second guide wheel.
Preferably, each base inboard is provided with two sets of leading wheel subassemblies that are located the same height for the guiding mechanism who is located left and right sides base when being used for horizontal direction work platform, work platform is more stable.
Preferably, a first guide rail for limiting the vertical moving stroke of the first adjusting mechanism is arranged on the first adjusting mechanism; the adjusting mechanism is provided with a second guide rail which limits the axial moving stroke of the second adjusting mechanism.
The first adjusting mechanism may be a first adjusting mechanism a and a first adjusting mechanism B.
The first adjusting mechanism A comprises a first base plate A, a first guide rail A which is vertically arranged on the first base plate A and a first positioning device A for positioning the first base plate A;
the first substrate A is provided with a first central shaft for mounting the first guide wheel, and the second substrate A is provided with a second central shaft for mounting the second guide wheel.
The first adjusting mechanism B comprises two first base plates B which are arranged up and down and first base plates B which are respectively positioned above the two first base plates B1And a first substrate B positioned below2Is arranged on the first substrate B1On the first substrate B1Guided first guide rail B and for positioning first substrate B1The first positioning device B.
The first substrate B1A first central shaft for mounting a first guide wheel is arranged on the first base plate B2, and a second central shaft for mounting a second guide wheel is arranged on the first base plate B2.
The second adjusting mechanism comprises a vertically arranged second substrate, a first positioning hole arranged on the second substrate and used for fixing the first substrate A, and a second guide rail used for axially guiding the second substrate.
Preferably, the second substrate is provided with a second positioning hole for fixing the second substrate and the base.
Preferably, the adjusting mechanism is provided with a third substrate for fixing the second substrate, the third substrate extends axially, the third substrate is provided with a second guide rail extending axially, and the second substrate of the second adjusting mechanism is provided with a second positioning device for fixing the second substrate and the third substrate on the side fixed to the third substrate.
Preferably, the third base plate may be a side plate of the first base, or a base plate separately provided for the adjustment mechanism; the first base plate A extends transversely, a first central shaft fixed with the first guide wheel is arranged on one side surface of the first base plate A, the first guide wheel is fixed with the first central shaft through a shaft sleeve and can rotate around the first central shaft, and the first base plate A is provided with vertically distributed elongated or long-hole-shaped slots serving as a first guide rail A; the second substrate transversely extends, a first positioning hole is formed in the second substrate, the first positioning device A penetrates through the first guide rail A to fix the first substrate A on the second substrate, a second central shaft fixed with the second guide wheel is arranged on one side of the second substrate, the second guide wheel is fixed with the second central shaft through a shaft sleeve and can rotate around the second central shaft, a second positioning hole is formed in the side edge of the outer side of the second substrate, the second substrate is fixed on a third substrate extending in the axial direction, an axially-extending strip-shaped or long-hole-shaped second guide rail is arranged on the third substrate, the second positioning device penetrates through the second guide rail to adjust the axial position of the second substrate, and the third substrate is fixed with the second substrate through the second positioning hole.
The invention can be provided with a first adjusting mechanism A and a second adjusting mechanism in each of the left and right bases respectively to form an adjusting mechanism together. Furthermore, for convenience of distinction, the bases on the two sides are respectively a first base and a second base, the adjusting mechanism of the invention is a first adjusting mechanism A and a second adjusting mechanism which are arranged in the first base, and a first adjusting mechanism B is arranged in the second base.
A first substrate B in the second pedestal1A first guide wheel is fixed on the first central shaft through a shaft sleeve, and a first base plate B1Is provided with a vertically extending strip-shaped or long-hole-shaped first guide rail B and a first substrate B2A second guide wheel is fixed on the second central shaft through a shaft sleeve, and a first substrate B2Fixed with the second base, and a first base plate B is adjusted by a first guide rail B1After the vertical position, the first substrate B is placed1Is fixed with the second base.
Preferably, the adjusting mechanism is provided with a resetting mechanism for resetting the adjusting mechanism, and preferably, the resetting mechanism is installed inside the base.
Preferably, the left and right bases are provided with windows for fixing the adjusting positions, and the adjusting device is located inside the base.
The base comprises a shell, a cavity for accommodating the adjusting mechanism and the resetting mechanism is formed in the shell, and the shell comprises an inner shell and an outer shell which are arranged in parallel, and comprises a first shell positioned on the inner side of the base and a second shell positioned on the outer side of the base; the shell body further comprises a front shell body and a rear shell body which enclose a cavity.
The first shell is provided with a through hole for the guide wheel to pass through, the inner side of the second shell is provided with a first connecting end fixed with a reset mechanism, one end of the reset mechanism is fixed with the first connecting end, and the other end of the reset mechanism is fixed with the second substrate.
The invention provides a drawing machine which comprises a first traction mechanism, a second traction mechanism, a drawing mechanism capable of moving along the X-axis direction under the transmission of the first traction mechanism, a working platform positioned below the drawing mechanism and capable of moving along the Y-axis direction under the transmission of the second traction mechanism, and a working platform guide adjusting mechanism for guiding the working platform in the Y-axis direction.
Preferably, the second traction mechanism is a steering transmission device and comprises an axially extending toothed bar fixed on the work platform guide adjusting mechanism and a rack fixed at the middle axis of the work platform Y shaft.
Preferably, the rack bar is connected with the motor to realize the rotation of the rack bar.
Preferably, a notch for initial position identification is arranged on the working platform.
Preferably, the first traction mechanism is a synchronous belt connected with the drawing mechanism and a motor driving the synchronous belt to move longitudinally.
Preferably, the motor is a servo motor, a stepper motor or other form of motor.
Preferably, a motor driving the first traction mechanism and the second traction mechanism is arranged in a cavity formed by the shell.
Has the advantages that: (1) according to the guide adjusting mechanism of the working platform, the guide limiting installation of the two sides of the working platform can be realized through the guide mechanism of the guide adjusting mechanism of the working platform, the stability of the working platform during transverse movement is effectively enhanced, and the working precision is greatly improved; (2) the working platform guiding and adjusting mechanism can adjust the vertical and axial positions of the guiding mechanism through the adjusting mechanism, so that the guiding and adjusting mechanism can be flexibly suitable for working platforms with different thicknesses and/or different widths and the like and has the advantages of flexibility, easiness in use and wider application occasions; (3) the invention is provided with the resetting mechanism, so that the clearance between the guide mechanism and the adjusting mechanism which are adjusted by the adjusting mechanism can be effectively reduced/eliminated, namely, the slight clearance between the working platform and the guide mechanism is effectively reduced/eliminated, so that the working platform is more accurately adaptive to working platforms with different widths, and the processing precision is further improved; (4) according to the drawing machine provided by the invention, the axial displacement of the drawing mechanism is realized through the first traction mechanism, the transverse movement of the working platform is realized through the second traction mechanism, and the mode that the working platform is fixed and the drawing mechanism needs two sets of traction/driving mechanisms to respectively pull/drive to realize the axial movement and the transverse movement in the traditional drawing machine is replaced through the working platform capable of transversely and axially moving on the basis of the structure, so that the influence of the traction/driving mechanisms on the effective printing/drawing space of the drawing mechanism in the X-axis and/or Y-axis direction is effectively reduced, and the drawing machine is ingenious and reasonable in structure, small in size and low in cost; (5) based on the structure, the working platform is detachably connected with the drawing machine, the working platform is connected with the drawing machine only through the guide mechanisms on the two sides of the working platform, and the drawing machine can be detached when being carried, so that the volume of the drawing machine during storage, transportation or carrying is further reduced, and the drawing machine is convenient to store, carry, transport and the like; (6) the driven rack of the second traction mechanism is arranged in the middle of the working platform, and the drawing machine effectively avoids shaking caused by side driving through central driving, and can realize more stable transverse movement of the working platform.
Drawings
FIG. 1 is an exploded view of a first adjustment mechanism A and a second adjustment mechanism according to the present invention;
FIG. 2 is a schematic structural diagram of a first adjusting mechanism B according to the present invention;
FIG. 3 is a schematic side view of the adjustment mechanism of the present invention;
FIG. 4 is a schematic structural view of the relative position relationship between the adjusting mechanism and the guiding mechanism according to the present invention;
FIG. 5 is a cross-sectional view of a first base structure of the present invention;
FIG. 6 is a schematic view of a base structure according to the present invention;
FIG. 7 is a schematic structural view of a guiding and adjusting mechanism of the present invention;
FIG. 8 is a side cross-sectional view of a plotter according to the present invention;
FIG. 9 is a schematic diagram of a drawing platform according to the present invention;
FIG. 10 is a schematic perspective view of a plotter according to the present invention;
FIG. 11 is a front cross-sectional view of a plotter according to the present invention;
FIG. 12 is a schematic diagram of a right base mechanism of the drawing machine according to the present invention.
Detailed Description
The working platform, i.e. the operation platform or the processing platform, such as a drawing platform of a drawing machine or a printing platform of a three-dimensional printer, is described herein, and the working platform used in the following embodiments is a drawing platform.
Example 1: the invention relates to a guide adjusting mechanism of a working platform, which comprises bases positioned on two sides, a guide mechanism which is arranged on the inner side of the base and used for transversely guiding the working platform, and an adjusting mechanism used for adjusting the position of the guide mechanism; the adjusting mechanism comprises a first adjusting mechanism used for adjusting the vertical relative position of the guide mechanism and a second adjusting mechanism used for adjusting the axial relative position of the guide mechanism.
As shown in fig. 1, the adjusting mechanism 8 in the present embodiment is composed of a first adjusting mechanism a81 and a first adjusting mechanism B83, and a second adjusting mechanism 82.
The first adjustment mechanism a81 includes a first base plate a811, a vertically extending first guide rail a812 disposed on the first base plate a, and a first positioning device a 813; the first guide rail a812 is a vertically-distributed slot (i.e., an oblong or elongated hole) in the shape of a long hole on the first substrate a811, in this embodiment, the first positioning device a813 is a bolt with a nut, the width of the first guide rail a is smaller than the diameter of the nut and is matched with the diameter of the rod portion of the bolt, and the first positioning device a813 passes through the first guide rail a to fix the first adjusting mechanism 81 and the second adjusting mechanism.
The second adjusting mechanism 82 includes a second base plate 821, a first positioning hole 822 for fixing the first base plate a is provided on the second base plate 821 (the first positioning device a sequentially passes through the first guide rail a and the first positioning hole to fix the first adjusting mechanism a81 on the second adjusting mechanism), and the adjusting mechanism 8 is further provided with a second guide rail 823 for axially guiding the second base plate 821.
As shown in fig. 2, the first adjusting mechanism B83 includes two first substrates B arranged up and down, the first substrates B respectively located above1831 and a first substrate B located thereunder2832 disposed on the first substrate B1On the first substrate B1Guided first guide rail B833 and for positioning first substrate B1The first positioning device B834 and the first substrate B 2832 are fixed to the base.
As shown in fig. 3, the adjusting mechanism 8 includes a third base plate 84 fixed to a vertical side of the second base plate 821, the third base plate extends along the X-axis direction, the second guide rail 823 is an axially extending long-hole-shaped slot (i.e., an opening with an oblong shape or a long shape) formed on the third base plate 84, and the second base plate is fixed to the third base plate 84 through a second positioning device 825. The second positioning device 825 in this embodiment is a bolt with a nut, and the width of the second guide 823 is smaller than the diameter of the nut and matches the diameter of the shank of the bolt.
The second substrate 82 is provided with a second positioning hole 824 at a side fixed to the third substrate, and the second positioning device 825 fixes the second substrate to the third substrate through the second positioning hole, that is, the second positioning device sequentially passes through the second guide rail and the second positioning hole to fix the second adjusting mechanism 82 to other structures, such as the third substrate 84.
A protruding platform 826 is arranged below the side face, connected with the first substrate A, of the second substrate 82, the protruding height of the protruding platform 826 is the same as the thickness of the first substrate A, and therefore it is guaranteed that the adjusting mechanism formed after the first substrate A and the second substrate are assembled forms a plate structure with the same thickness.
As shown in fig. 4, the guide mechanism 7 of the present invention is composed of guide wheel assemblies 71 located inside the left and right bases, each guide wheel assembly 71 located opposite to each other on the left and right sides is composed of a first guide wheel 711 and a second guide wheel 712 located below the first guide wheel, and a track gap for accommodating the drawing platform is formed between the first guide wheel 711 and the second guide wheel 712. In the guiding mechanism that this embodiment provided simultaneously, the inboard of every base is provided with two sets of leading wheel subassemblies in front and back respectively, and two sets of leading wheel subassemblies are located same height for guiding mechanism on the base is being used for drawing platform horizontal guidance about being located, and drawing platform maintains at same level, and can obtain more stable lateral shifting.
In this embodiment, in order to adjust the guide mechanism 7 by the adjusting device 8, the first substrate a is provided with a first center shaft 85 for mounting the guide wheel, the second substrate a is provided with a second center shaft 86 for mounting the guide wheel, and the first substrate B is provided with a second center shaft 86 for mounting the guide wheel1A first central shaft 85 for mounting a first guide wheel is arranged on the first base plate B2Is provided with a second guide wheelSimilarly, in order to ensure horizontal guiding of the guide mechanism, the first central axes on both sides need to be at the same height, and the second central axes on both sides need to be at the same height.
In this embodiment, two sets of guide wheel assemblies are disposed on each base, so that the first substrate a and the first substrate B1The number and the positions of the first central shaft and the first guide wheels are matched, and the second substrate and the first substrate B are arranged2The number and the positions of the second central shaft and the second guide wheels are matched.
The first guide wheel 711 of the guide wheel assembly is fixed to the first center shaft 85 on both sides by a bearing, and the second guide wheel 712 is fixed to the second center shaft 86 on both sides by a bearing.
In this embodiment, the bases on both sides are the first base 34 and the second base 35, respectively. The adjusting mechanism may be a first adjusting mechanism a and a second fixing mechanism provided in each base. In fact, only the axial movement of one side of the guiding mechanism is needed to realize that the guiding mechanism accommodates drawing platforms with different lengths, so in this embodiment, the first adjusting mechanism a and the second adjusting mechanism are arranged in the first base, and only the first adjusting mechanism B is arranged in the second base.
The adjusting method of the guide mechanism 7 by the adjusting mechanism 8 comprises the following steps:
adjusting the vertical distance: the first substrate A811 moves up and down along the first guide rail A812, drives the first guide wheel fixed on the first substrate A to move up and down, and adjusts the first substrate B along the first guide rail B8331And a first substrate B2The distance between, realize the regulation of the interval between first leading wheel and the second leading wheel, can be applicable to the drawing platform of different thickness, adjust to suitable height after, be fixed in the first locating hole of second base plate with first base plate A811 through the shank of bolt portion of first positioner A813, the bolt tip of first positioner A813 is like the nut card in first guide rail A left and right sides, realizes the fixed of first base plate A and second base plate. Adjusting the first substrate B in the same way1And a first substrate B2By a first positioning meansPlacing the first substrate B1Is fixed with the second base.
Adjusting the axial distance: the second base plate 821 is axially moved along the second guide rail 823, because the first base plate a and the second base plate are fixed as a whole, at this time, the first guide wheel and the second guide wheel realize synchronous displacement in the axial direction, the distance between the guide wheel assemblies correspondingly arranged on the left and right can be adjusted, the adjustment of the axial position of the guide assembly is completed, after the guide assembly is adjusted to a proper position, the bolt rod part of the second positioning device 825 penetrates through the second guide rail to be connected with the second positioning hole, the bolt end part of the second positioning device 825 such as a nut is clamped on the upper side and the lower side of the second guide rail, and the fixation of the second base plate and the third base plate is completed.
As shown in fig. 6, the base 3 provided by the present invention is a first base and a second base located on the left and right sides of the plotter, the base includes a housing 31 and a base 32 for fixing the housing 31, the housing of the base encloses a cavity for accommodating the adjusting mechanism and the resetting mechanism, and the cavity is enclosed by the housing on the left and right sides and the housing located in front and at the back. The shells on the left and right sides of the base comprise a first shell 311 on the inner side and a second shell 312 on the outer side of the base, a first through hole 33 matched with the length of the first guide rail A is formed in the first shell 311, the first central shaft penetrates through the first through hole to be fixed with the corresponding first guide wheel, and meanwhile the vertical position adjustment of the guide wheel is not influenced. The base in this embodiment is provided with the windowing of conveniently adjusting the structural installation, and in addition, in order to simplify the structure, adjustment mechanism's third base plate is the procapsid of base, and the second guide rail is the elongated hole that sets up on the procapsid of base.
As shown in fig. 5, a reset mechanism is further disposed inside the base in this embodiment, and the reset mechanism in this embodiment includes a spring 9 whose two ends are abutted between the inner wall of the base and the second base. In this embodiment, a first connection end 91 for fixing and positioning the spring is disposed on the inner side surface of the second housing 312, a groove 92 for placing the spring is disposed on the second substrate 312, one end of the spring 9 is fixedly sleeved on the first connection end 91, the other end of the spring is limited and abutted against the bottom of the groove 92, when the adjusting mechanism 7 is mounted on a base, the adjusting mechanism is reset by the spring under the action of resilience of the spring in the resetting mechanism, the guide assembly mounted on the adjusting mechanism is reset simultaneously under the action of the resilience, and a gap between a component (such as a drawing platform) adjusted by the adjusting mechanism and the adjusting mechanism can be effectively reduced/eliminated, so that the adjusting mechanism is more flexible and accurate.
Likewise, a return mechanism may be installed in each base, and in the present embodiment, only the first base is selected to be installed with a return mechanism.
As shown in fig. 7, the guiding and adjusting mechanism of the working platform in this embodiment is composed of the following structures: the device comprises a first base, a second base, a first adjusting mechanism A and a second adjusting mechanism which are arranged in the first base, a first adjusting mechanism B which is arranged in the second base, and guide mechanisms positioned on two sides.
Example 2: as shown in fig. 8 to 12, the plotter according to the present invention includes the work platform guiding and adjusting mechanism described in embodiment 1, and further includes a first traction mechanism 4, a second traction mechanism 6, a plotting mechanism 1 movable in the X-axis direction by the transmission of the first traction mechanism, and a plotting platform 5 located below the plotting mechanism 1 and movable in the Y-axis direction by the transmission of the second traction mechanism. The work platform guiding and adjusting mechanism is used for guiding the drawing platform in the Y-axis direction.
As shown in fig. 8 and 9, the second traction mechanism 6 is a steering transmission device, and includes a rack bar 61 fixed on the base and extending axially and a rack 51 fixed on the middle axis of the Y axis of the drawing platform 5 and extending transversely, the step motor arranged in the base drives the rack bar 61 to rotate, and the rack bar 51 and the rack bar 61 are engaged to drive the drawing platform to move transversely. In order to achieve the lateral movement of the drawing platform 5, the drawing platform 5 is mounted in a track formed by a guide mechanism.
A horizontal connecting rod 2 is fixed on the inner sides of the left base and the right base, the drawing machine is further provided with a consumable rack 12, a consumable plate 11 arranged on the consumable rack, and a drawing mechanism 2 arranged on the horizontal connecting rod, the first traction mechanism 4 is a synchronous belt 41 in transmission connection with the drawing mechanism 2, and the drawing mechanism 2 moves horizontally along the connecting rod under the transmission of the first traction mechanism 4; the drawing platform 5 can move transversely through the second traction mechanism 6, and can move transversely more stably through the limiting and guiding of the guide mechanism 7; the notch 52 arranged on the drawing platform 5 can be used for positioning the initial position of the drawing platform to complete the zero adjustment of the drawing platform; the drawing machine can be used for drawing platforms with different thicknesses and widths through the adjustment of the adjusting mechanism 8, and is higher in universality and wider in practicability.
When the drawing platform is used, after the drawing platform is selected and installed at a corresponding position, the distance between each upper guide wheel and the lower guide wheel which corresponds to the upper guide wheel in the guide mechanism one by one can be adjusted through the first adjusting mechanism, so that the first adjusting mechanism is adaptive to the thickness of the selected drawing platform; and then adjust its second base plate and the relative position of base XZ plane outer wall (corresponding to aforementioned third base plate) that corresponds with it through above-mentioned second adjustment mechanism, make the width of the drawing platform that its adaptation was selected for use, general suitability is better on the one hand, and on the other hand has effectively reduced platform machining error, has effectively promoted the precision. Further through the effect of the resilient force of spring in the canceling release mechanical system, the clearance (including the work platform because of different model widths are different, or the width is the same but there is error/tolerance in the manufacturing process, or some micro-clearances that some micro-width changes that cause in the long-term use reasons such as wearing and tearing that bring in among the manufacturing process are changed etc.) between drawing platform and the adjustment mechanism has been reduced/eliminated more effectively to obtain the more accurate location of adjustment mechanism relative base position, with the width of the drawing platform that selects for use of more accurate adaptation, then add second positioner and realize that adjustment mechanism and base are fixed on this accurate position, thereby further eliminate the drawing platform and probably because of the machining error that the clearance brought, obtain better machining precision.
The drawing device is detachable in drawing and small in size, greatly reduces the processing requirement of the platform through adjustment of the guide wheels, avoids shaking caused by side driving through middle driving of the drawing platform, and is more stable.
It should be noted that, in the present invention, the axial direction is the X-axis direction, the horizontal direction is the Y-axis direction, and the vertical direction is the Z-axis direction in the coordinates of fig. 10, and this position definition is only for convenience of explaining the relative position relationship of each mechanism in the whole plotter.
Claims (6)
1. A guide adjusting mechanism of a working platform is characterized by comprising bases positioned on two sides, a guide mechanism which is arranged on the inner side of the base and used for transversely guiding the working platform, and an adjusting mechanism used for adjusting the position of the guide mechanism;
the adjusting mechanism comprises a first adjusting mechanism which is used for adjusting the vertical relative position of the guide mechanism and is arranged in the bases on the two sides, and a second adjusting mechanism which is used for adjusting the axial relative position of the guide mechanism and is at least arranged in the base on one side; the first adjusting mechanism comprises a first base plate, a first guide rail and a first positioning device, wherein the first guide rail is arranged on the first base plate, extends vertically and limits the vertical moving stroke of the first adjusting mechanism; the second adjusting mechanism comprises a second substrate, and the second substrate is provided with a first positioning hole for fixing the first substrate and a second guide rail for axially guiding the second substrate;
the guide mechanism comprises at least one group of guide wheel assemblies arranged on the inner side of each base, and each guide wheel assembly comprises a first guide wheel and a second guide wheel, wherein the first guide wheels are vertically distributed, and the second guide wheels are positioned below the first guide wheels.
2. Work platform guiding adjustment mechanism according to claim 1, characterized in that the adjustment mechanism is provided with a reset mechanism for resetting the adjustment mechanism.
3. The work platform guiding and adjusting mechanism as set forth in claim 1, wherein the first adjusting mechanism comprises a first adjusting mechanism a mounted in the base on one side and a first adjusting mechanism B mounted in the base on the other side; the first adjusting mechanism A comprises a first base plate A, a first guide rail A which is vertically arranged on the first base plate A and a first positioning device A for positioning the first base plate A; the first substrate A is provided with a first central shaft for mounting the first guide wheel, and the second substrate A is provided with a second central shaft for mounting the second guide wheel.
4. The guiding and adjusting mechanism for the working platform according to claim 3, wherein the first adjusting mechanism B comprises two first base plates B arranged up and down, and the first base plates B respectively positioned above the two first base plates B1And a first substrate B positioned below2Is arranged on the first substrate B1On the first substrate B1Guided first guide rail B and for positioning first substrate B1The first positioning device B.
5. A plotter, characterized by comprising a first traction mechanism, a second traction mechanism, a plotting mechanism which can move along the X-axis direction under the transmission of the first traction mechanism, a working platform which is positioned below the plotting mechanism and can move along the Y-axis direction under the transmission of the second traction mechanism, and a working platform guiding and adjusting mechanism as claimed in claim 1 for guiding the working platform along the Y-axis direction.
6. The plotter of claim 5, wherein the second traction mechanism is a steering gear comprising an axially extending rack fixed to the work platform guide adjustment mechanism and a rack fixed at the work platform Y-axis middle axis.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910745178.1A CN110744953B (en) | 2019-08-13 | 2019-08-13 | Work platform direction adjustment mechanism and drawing machine |
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|---|---|---|---|
| CN201910745178.1A CN110744953B (en) | 2019-08-13 | 2019-08-13 | Work platform direction adjustment mechanism and drawing machine |
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| CN110744953A CN110744953A (en) | 2020-02-04 |
| CN110744953B true CN110744953B (en) | 2021-07-13 |
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