CN110732805A - Cleaning-free soldering flux for high-density assembly parts and preparation method thereof - Google Patents

Cleaning-free soldering flux for high-density assembly parts and preparation method thereof Download PDF

Info

Publication number
CN110732805A
CN110732805A CN201811204961.9A CN201811204961A CN110732805A CN 110732805 A CN110732805 A CN 110732805A CN 201811204961 A CN201811204961 A CN 201811204961A CN 110732805 A CN110732805 A CN 110732805A
Authority
CN
China
Prior art keywords
parts
soldering flux
mixing
corrosion inhibitor
stirring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
CN201811204961.9A
Other languages
Chinese (zh)
Inventor
詹建朝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jiaxing University
Original Assignee
Jiaxing University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jiaxing University filed Critical Jiaxing University
Priority to CN201811204961.9A priority Critical patent/CN110732805A/en
Publication of CN110732805A publication Critical patent/CN110732805A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/36Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
    • B23K35/362Selection of compositions of fluxes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/36Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
    • B23K35/3612Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with organic compounds as principal constituents

Abstract

The invention provides a cleaning-free soldering flux for high-density assembly parts and a preparation method thereof, wherein the cleaning-free soldering flux comprises the following components in parts by weight: 4-9 parts of mercaptoethanol, 7-11 parts of an active agent, 30-40 parts of a film forming agent, 1-3 parts of potassium dichromate, 6-10 parts of a surfactant, 1-4 parts of zinc dihydrogen phosphate, 2.7-4.5 parts of sodium molybdate, 3-6 parts of triethanolamine, 5-11 parts of a corrosion inhibitor, 13-17 parts of ethylene glycol butyl ether, 8-12 parts of 1, 4-butanediol and 75-95 parts of deionized water. The soldering flux prepared by the invention has stable property, no delamination, good spreadability and low corrosivity, and can meet the requirements of industrial application.

Description

Cleaning-free soldering flux for high-density assembly parts and preparation method thereof
Technical Field
The invention relates to the field of soldering flux, in particular to a cleaning-free soldering flux for high-density assembly parts and a preparation method thereof.
Background
The invention provides no-clean soldering flux for high-density assembly parts and a preparation method thereof, wherein the obtained soldering flux has stable property, good spreadability and low corrosivity, and can meet the requirements of industrial application.
Disclosure of Invention
The technical problem to be solved is as follows:
the invention aims to provide kinds of no-clean soldering flux for high-density assembly parts and a preparation method thereof, and the obtained soldering flux has stable property, no delamination, good spreadability and low corrosivity and can meet the requirements of industrial application.
The technical scheme is as follows:
the invention provides a cleaning-free soldering flux for high-density assembly parts, which comprises the following components in parts by weight:
4-9 parts of mercaptoethanol,
7-11 parts of an active agent,
30-40 parts of film-forming agent,
1-3 parts of potassium dichromate,
6-10 parts of surfactant,
1-4 parts of zinc dihydrogen phosphate,
2.7 to 4.5 portions of sodium molybdate,
3-6 parts of triethanolamine,
5-11 parts of corrosion inhibitor,
13-17 parts of ethylene glycol butyl ether,
8-12 parts of 1, 4-butanediol,
75-95 parts of deionized water.
Preferably, the cleaning-free soldering flux for the high-density assembly part is prepared by mixing ammonium succinate, DL-malic acid and anhydrous citric acid according to the weight ratio of 2:1: 3.
Preferably, the cleaning-free soldering flux for the high-density assembly part is prepared by mixing alkylphenol ethoxylates, fatty alcohol polyoxyethylene sodium sulfonate and sucrose ester according to the ratio of 1.1:2: 2.6.
Preferably, the cleaning-free soldering flux for the high-density assembly part is prepared by mixing aluminum chloride and potassium fluoride according to a ratio of 2: 0.8.
Preferably, the high-density assembly part is a no-clean soldering flux, and the film forming agent is organosilicon modified acrylic resin.
The invention also provides a preparation method of the cleaning-free soldering flux for the high-density assembly part, which comprises the following preparation steps:
(1) mixing 7-11 parts of an active agent and 30-40 parts of a film forming agent uniformly, heating to 60 ℃, stirring for 30min, reducing the temperature to 40 ℃, adding 75-95 parts of deionized water, 6-10 parts of a surfactant, 13-17 parts of butyl cellosolve and 8-12 parts of 1, 4-butanediol, and stirring for 20min until the mixture is uniformly mixed;
(2) and (2) continuously adding 4-9 parts of mercaptoethanol, 1-3 parts of potassium dichromate, 2.7-4.5 parts of sodium molybdate and 5-11 parts of corrosion inhibitor into the mixed solution obtained in the step (1), stirring for 20min, cooling to room temperature, adding 3-6 parts of triethanolamine and 1-4 parts of zinc phosphate, and mixing for 40min to obtain the zinc phosphate corrosion inhibitor.
Has the advantages that:
(1) the soldering flux prepared by the invention has stable property, no delamination, good spreadability and low corrosivity, and can meet the requirements of industrial application.
(2) The mercaptoethanol is added in the corrosion inhibitor, so that the corrosion inhibitor can be adsorbed to the surface of metal to form an ordered self-assembled film, and a good corrosion inhibition effect is achieved.
(3) The addition of the components with the slow release effect can play a good protection role and reduce the corrosion of the residues after welding on elements.
(4) The invention selects the ethylene glycol monobutyl ether and the 1, 4-butanediol to be compounded as the solvent, has proper viscosity, ensures that all components can be uniformly dispersed, and can play a good role in protecting the welding surface.
Detailed Description
The following examples are presented to enable one of ordinary skill in the art to more fully understand the present invention and are not intended to limit the invention in any way.
Example 1
(1) Uniformly mixing 11 parts of an active agent and 30 parts of organic silicon modified acrylic resin, heating to 60 ℃, stirring for 30min, reducing the temperature to 40 ℃, adding 95 parts of deionized water, 6 parts of a surfactant, 17 parts of butyl cellosolve and 8 parts of 1, 4-butanediol, and stirring for 20min until uniformly mixing;
(2) and (2) continuously adding 9 parts of mercaptoethanol, 1 part of potassium dichromate, 4.5 parts of sodium molybdate and 5 parts of corrosion inhibitor into the mixed solution obtained in the step (1), stirring for 20min, cooling to room temperature, adding 6 parts of triethanolamine and 1 part of zinc dihydrogen phosphate, and mixing for 40min to obtain the zinc phosphate corrosion inhibitor.
The active agent is prepared by mixing ammonium succinate, DL-malic acid and anhydrous citric acid according to the weight ratio of 2:1: 3; the surfactant is formed by mixing alkylphenol polyoxyethylene, fatty alcohol polyoxyethylene sodium sulfonate and sucrose ester according to the ratio of 1.1:2: 2.6; the corrosion inhibitor is prepared by mixing aluminum chloride and potassium fluoride according to the ratio of 2: 0.8.
Example 2
(1) Mixing 7 parts of an active agent and 40 parts of organic silicon modified acrylic resin uniformly, heating to 60 ℃, stirring for 30min, reducing the temperature to 40 ℃, adding 75 parts of deionized water, 10 parts of a surfactant, 13 parts of butyl cellosolve and 12 parts of 1, 4-butanediol, and stirring for 20min until the mixture is uniformly mixed;
(2) and (2) continuously adding 4 parts of mercaptoethanol, 3 parts of potassium dichromate, 2.7 parts of sodium molybdate and 11 parts of corrosion inhibitor into the mixed solution obtained in the step (1), stirring for 20min, cooling to room temperature, adding 3 parts of triethanolamine and 4 parts of zinc dihydrogen phosphate, and mixing for 40min to obtain the zinc phosphate corrosion inhibitor.
The active agent is prepared by mixing ammonium succinate, DL-malic acid and anhydrous citric acid according to the weight ratio of 2:1: 3; the surfactant is formed by mixing alkylphenol polyoxyethylene, fatty alcohol polyoxyethylene sodium sulfonate and sucrose ester according to the ratio of 1.1:2: 2.6; the corrosion inhibitor is prepared by mixing aluminum chloride and potassium fluoride according to the ratio of 2: 0.8.
Example 3
(1) Mixing 10 parts of an active agent and 34 parts of organic silicon modified acrylic resin uniformly, heating to 60 ℃, stirring for 30min, reducing the temperature to 40 ℃, adding 90 parts of deionized water, 7 parts of a surfactant, 16 parts of butyl cellosolve and 9 parts of 1, 4-butanediol, and stirring for 20min until the mixture is uniformly mixed;
(2) and (2) continuously adding 8 parts of mercaptoethanol, 1.5 parts of potassium dichromate, 3.8 parts of sodium molybdate and 6 parts of corrosion inhibitor into the mixed solution obtained in the step (1), stirring for 20min, cooling to room temperature, adding 5 parts of triethanolamine and 2 parts of zinc dihydrogen phosphate, and mixing for 40min to obtain the zinc phosphate.
The active agent is prepared by mixing ammonium succinate, DL-malic acid and anhydrous citric acid according to the weight ratio of 2:1: 3; the surfactant is formed by mixing alkylphenol polyoxyethylene, fatty alcohol polyoxyethylene sodium sulfonate and sucrose ester according to the ratio of 1.1:2: 2.6; the corrosion inhibitor is prepared by mixing aluminum chloride and potassium fluoride according to the ratio of 2: 0.8.
Example 4
(1) Mixing 8 parts of an active agent and 36 parts of organic silicon modified acrylic resin uniformly, heating to 60 ℃, stirring for 30min, reducing the temperature to 40 ℃, adding 80 parts of deionized water, 9 parts of a surfactant, 14 parts of butyl cellosolve and 11 parts of 1, 4-butanediol, and stirring for 20min until the mixture is uniformly mixed;
(2) and (2) continuously adding 5 parts of mercaptoethanol, 2.5 parts of potassium dichromate, 3.4 parts of sodium molybdate and 10 parts of corrosion inhibitor into the mixed solution obtained in the step (1), stirring for 20min, cooling to room temperature, adding 4 parts of triethanolamine and 3 parts of zinc dihydrogen phosphate, and mixing for 40min to obtain the zinc phosphate.
The active agent is prepared by mixing ammonium succinate, DL-malic acid and anhydrous citric acid according to the weight ratio of 2:1: 3; the surfactant is formed by mixing alkylphenol polyoxyethylene, fatty alcohol polyoxyethylene sodium sulfonate and sucrose ester according to the ratio of 1.1:2: 2.6; the corrosion inhibitor is prepared by mixing aluminum chloride and potassium fluoride according to the ratio of 2: 0.8.
Example 5
(1) Mixing 9 parts of an active agent and 35 parts of organic silicon modified acrylic resin uniformly, heating to 60 ℃, stirring for 30min, reducing the temperature to 40 ℃, adding 85 parts of deionized water, 8 parts of a surfactant, 15 parts of butyl cellosolve and 10 parts of 1, 4-butanediol, and stirring for 20min until the mixture is uniformly mixed;
(2) and (2) continuously adding 6.5 parts of mercaptoethanol, 2 parts of potassium dichromate, 3.6 parts of sodium molybdate and 8 parts of corrosion inhibitor into the mixed solution obtained in the step (1), stirring for 20min, cooling to room temperature, adding 4.5 parts of triethanolamine and 2.5 parts of zinc dihydrogen phosphate, and mixing for 40min to obtain the zinc phosphate.
The active agent is prepared by mixing ammonium succinate, DL-malic acid and anhydrous citric acid according to the weight ratio of 2:1: 3; the surfactant is formed by mixing alkylphenol polyoxyethylene, fatty alcohol polyoxyethylene sodium sulfonate and sucrose ester according to the ratio of 1.1:2: 2.6; the corrosion inhibitor is prepared by mixing aluminum chloride and potassium fluoride according to the ratio of 2: 0.8.
Comparative example 1
This comparative example differs from example 1 in the active agent. Specifically, the method comprises the following steps:
(1) uniformly mixing 11 parts of an active agent and 30 parts of organic silicon modified acrylic resin, heating to 60 ℃, stirring for 30min, reducing the temperature to 40 ℃, adding 95 parts of deionized water, 6 parts of a surfactant, 17 parts of butyl cellosolve and 8 parts of 1, 4-butanediol, and stirring for 20min until uniformly mixing;
(2) and (2) continuously adding 9 parts of mercaptoethanol, 1 part of potassium dichromate, 4.5 parts of sodium molybdate and 5 parts of corrosion inhibitor into the mixed solution obtained in the step (1), stirring for 20min, cooling to room temperature, adding 6 parts of triethanolamine and 1 part of zinc dihydrogen phosphate, and mixing for 40min to obtain the zinc phosphate corrosion inhibitor.
The active agent is prepared by mixing ammonium succinate, DL-malic acid and anhydrous citric acid according to the weight ratio of 3:2: 2; the surfactant is formed by mixing alkylphenol polyoxyethylene, fatty alcohol polyoxyethylene sodium sulfonate and sucrose ester according to the ratio of 1.1:2: 2.6; the corrosion inhibitor is prepared by mixing aluminum chloride and potassium fluoride according to the ratio of 2: 0.8.
Comparative example 2
This comparative example differs from example 1 in that it does not contain a corrosion inhibitor. Specifically, the method comprises the following steps:
(1) uniformly mixing 11 parts of an active agent and 30 parts of organic silicon modified acrylic resin, heating to 60 ℃, stirring for 30min, reducing the temperature to 40 ℃, adding 95 parts of deionized water, 6 parts of a surfactant, 17 parts of butyl cellosolve and 8 parts of 1, 4-butanediol, and stirring for 20min until uniformly mixing;
(2) and (2) continuously adding 9 parts of mercaptoethanol, 1 part of potassium dichromate, 4.5 parts of sodium molybdate and 5 parts of corrosion inhibitor into the mixed solution obtained in the step (1), stirring for 20min, cooling to room temperature, adding 6 parts of triethanolamine and 1 part of zinc dihydrogen phosphate, and mixing for 40min to obtain the zinc phosphate corrosion inhibitor.
The active agent is prepared by mixing ammonium succinate, DL-malic acid and anhydrous citric acid according to the weight ratio of 2:1: 3; the surfactant is prepared by mixing alkylphenol polyoxyethylene, fatty alcohol polyoxyethylene sodium sulfonate and sucrose ester according to the ratio of 1.1:2: 2.6.
The no-clean fluxes prepared in examples 1 to 5 and comparative examples 1 to 2, which were applied to high-density assembled parts, were subjected to a performance test using an SWB-2 wetting force meter for a wetting performance test.
Appearance, physical stability test: stirring the soldering flux for a few minutes, then sealing and freezing to 6 ℃, keeping for 1 hour, observing whether layered crystals are separated out or not, judging that the surface is qualified if the phenomena do not occur, then exposing the soldering flux in a 45 ℃ oven, keeping for 1 hour, observing whether the layer is separated out or not, and judging that the surface is qualified if the layer is not separated out.
And (3) a corrosion test adopts a weight loss measurement method, a copper sheet and Sn3Ag2.8Cu solder are respectively immersed in the soldering flux, 10% of water is added, the water bath at 50 ℃ is carried out, the treatment is carried out for 40h, 80h and 130h respectively, the treated copper sheet is taken out, cleaned and dried, and the initial weight of the copper sheet is weighed. As a result, weight loss per unit area (mg/cm)2) And (4) showing.
The test results are given in the following table:
TABLE 1
TABLE 2
Figure BDA0001830993900000062
According to test results, the cleaning-free soldering flux applied to high-density assembled parts, prepared by the method, has the advantages of good stability, good wetting effect and low corrosivity, and can meet the use requirements. The formula in example 5 is the best formula in the invention, and the soldering flux prepared according to the formula in example 5 has the advantages of 0.76s of wetting time, 6.87mN of wetting force and lower corrosiveness to copper sheets and Sn3Ag2.8Cu solders.
From the test results of comparative example 1 and example 1, it can be seen that H in the carboxyl group of the organic acid+Neutralization reaction with copper oxide to generate weak acid salts, which can be dissolved in generated water, thereby enabling better contact between the solder ball and the copper and good wetting between the soldering flux and the copper plate, when the ratio of butanediamine, DL-malic acid and anhydrous citric acid is 2:1:3, the wetting property of the soldering flux is best, and the corrosion is low, as measured by comparative example 2 and example 2Test results show that the aluminum chloride and the potassium fluoride are added, so that potassium, fluorine and nitrogen elements exist on the surface of the device, the oxide on the surface of the device can be stripped, a compact film is formed, and the surface of the device is not oxidized.

Claims (6)

1. The cleaning-free soldering flux for the high-density assembly part is characterized by comprising the following components in parts by weight:
4-9 parts of mercaptoethanol,
7-11 parts of an active agent,
30-40 parts of film-forming agent,
1-3 parts of potassium dichromate,
6-10 parts of surfactant,
1-4 parts of zinc dihydrogen phosphate,
2.7 to 4.5 portions of sodium molybdate,
3-6 parts of triethanolamine,
5-11 parts of corrosion inhibitor,
13-17 parts of ethylene glycol butyl ether,
8-12 parts of 1, 4-butanediol,
75-95 parts of deionized water.
2. The no-clean flux for high-density assembly parts according to claim 1, wherein the active agent is a mixture of ammonium succinate, DL-malic acid and anhydrous citric acid in a weight ratio of 2:1: 3.
3. The no-clean soldering flux for high-density assembly parts according to claim 1, wherein the surfactant is prepared by mixing alkylphenol ethoxylate, sodium fatty alcohol polyoxyethylene sulfonate and sucrose ester according to a ratio of 1.1:2: 2.6.
4. The no-clean flux for high-density assembled parts according to claim 1, wherein the corrosion inhibitor is a mixture of aluminum chloride and potassium fluoride in a ratio of 2: 0.8.
5. The no-clean flux for high-density assembled parts according to claim 1, wherein the film-forming agent is silicone modified acrylic resin.
6. The preparation method of the cleaning-free soldering flux for the high-density assembly part is characterized by comprising the following preparation steps of:
(1) mixing 7-11 parts of an active agent and 30-40 parts of a film forming agent uniformly, heating to 60 ℃, stirring for 30min, reducing the temperature to 40 ℃, adding 75-95 parts of deionized water, 6-10 parts of a surfactant, 13-17 parts of butyl cellosolve and 8-12 parts of 1, 4-butanediol, and stirring for 20min until the mixture is uniformly mixed;
(2) and (2) continuously adding 4-9 parts of mercaptoethanol, 1-3 parts of potassium dichromate, 2.7-4.5 parts of sodium molybdate and 5-11 parts of corrosion inhibitor into the mixed solution obtained in the step (1), stirring for 20min, cooling to room temperature, adding 3-6 parts of triethanolamine and 1-4 parts of zinc phosphate, and mixing for 40min to obtain the zinc phosphate corrosion inhibitor.
CN201811204961.9A 2018-10-16 2018-10-16 Cleaning-free soldering flux for high-density assembly parts and preparation method thereof Withdrawn CN110732805A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201811204961.9A CN110732805A (en) 2018-10-16 2018-10-16 Cleaning-free soldering flux for high-density assembly parts and preparation method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201811204961.9A CN110732805A (en) 2018-10-16 2018-10-16 Cleaning-free soldering flux for high-density assembly parts and preparation method thereof

Publications (1)

Publication Number Publication Date
CN110732805A true CN110732805A (en) 2020-01-31

Family

ID=69236617

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201811204961.9A Withdrawn CN110732805A (en) 2018-10-16 2018-10-16 Cleaning-free soldering flux for high-density assembly parts and preparation method thereof

Country Status (1)

Country Link
CN (1) CN110732805A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112743259A (en) * 2021-01-25 2021-05-04 苏州柯仕达电子材料有限公司 Cleaning-free soldering flux

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102350599A (en) * 2011-08-25 2012-02-15 华南理工大学 Halogen-free high-impedance water-based washing-free scaling powder as well as preparation method and application thereof
CN102357748A (en) * 2011-10-18 2012-02-22 苏州之侨新材料科技有限公司 Halogen-and-rosin-free antibacterial no-clean soldering flux for lead-free solder
CN103612031A (en) * 2013-11-14 2014-03-05 无锡市斯威克科技有限公司 Pre-coating flux for photovoltaic solder strips
CN103785974A (en) * 2014-02-20 2014-05-14 苏州龙腾万里化工科技有限公司 Water-based halogen-free resin-free antimicrobial no-clean soldering flux
CN103785975A (en) * 2014-02-20 2014-05-14 苏州龙腾万里化工科技有限公司 Soldering flux for improving corrosion inhibition
CN107962317A (en) * 2017-10-31 2018-04-27 常州菲胜图自动化仪器有限公司 A kind of water base type scaling powder free of cleaning
CN107971654A (en) * 2017-11-24 2018-05-01 无锡盛雅生物科技有限公司佛山分公司 A kind of water-soluble flux and preparation method thereof

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102350599A (en) * 2011-08-25 2012-02-15 华南理工大学 Halogen-free high-impedance water-based washing-free scaling powder as well as preparation method and application thereof
CN102357748A (en) * 2011-10-18 2012-02-22 苏州之侨新材料科技有限公司 Halogen-and-rosin-free antibacterial no-clean soldering flux for lead-free solder
CN103612031A (en) * 2013-11-14 2014-03-05 无锡市斯威克科技有限公司 Pre-coating flux for photovoltaic solder strips
CN103785974A (en) * 2014-02-20 2014-05-14 苏州龙腾万里化工科技有限公司 Water-based halogen-free resin-free antimicrobial no-clean soldering flux
CN103785975A (en) * 2014-02-20 2014-05-14 苏州龙腾万里化工科技有限公司 Soldering flux for improving corrosion inhibition
CN107962317A (en) * 2017-10-31 2018-04-27 常州菲胜图自动化仪器有限公司 A kind of water base type scaling powder free of cleaning
CN107971654A (en) * 2017-11-24 2018-05-01 无锡盛雅生物科技有限公司佛山分公司 A kind of water-soluble flux and preparation method thereof

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
王大全: "《精细化工词典》", 30 June 1998, 化学工业出版社 *
韩国栋: "《电子工艺技术基础与实训》", 31 March 2011, 国防工业出版社 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112743259A (en) * 2021-01-25 2021-05-04 苏州柯仕达电子材料有限公司 Cleaning-free soldering flux

Similar Documents

Publication Publication Date Title
CN104607826B (en) Cleaning-free solid-state scaling powder for aluminum low-temperature soldering and preparing method
US5698503A (en) Stripping and cleaning composition
CN104858571B (en) A kind of stannum bismuth system lead-free tin cream halogen-free flux and preparation method thereof
CN104889596B (en) A kind of production technology of low-temperature lead-free tin cream and its weld-aiding cream
CN102357748A (en) Halogen-and-rosin-free antibacterial no-clean soldering flux for lead-free solder
CN103042319A (en) Water-base halogen-free no-clean scaling powder used for lead-free solder
CN105798482A (en) Halogen-free non-cleaning flux and preparation method thereof
KR20150085542A (en) Free flux compositions
CN114367762A (en) Solder alloy powder, low dielectric loss high reliability soldering paste and preparation method thereof
CN102581522A (en) Rosin-based flux for ZnSn-based lead free solder and preparation method thereof
CN109370809B (en) Low-foam water-based cleaning agent and cleaning method
CN110732805A (en) Cleaning-free soldering flux for high-density assembly parts and preparation method thereof
JP2008501861A (en) Improvement of corrosion resistance of tin surface
CN104060269A (en) Tin-stripping agent, preparation method of tin-stripping agent and tin-stripping method
CN102909493A (en) Soldering flux
KR20170068328A (en) Etchant composition, and method for etching
CN110328466B (en) Halogen-free cleaning-free soldering flux
CN104625483A (en) Low-residual and low-corrosivity aluminum soft soldering tin paste and manufacturing method thereof
CN102794581B (en) Steel no-clean welding flux and preparation method thereof
RU2463145C2 (en) Flux for low-temperature soldering
CN110644049A (en) Diamond wire polycrystalline silicon wafer texturing additive and diamond wire polycrystalline silicon wafer texturing etching liquid
CN109929521A (en) Coolant liquid is used in a kind of machining
CN110977250A (en) Soldering flux and preparation method thereof
CN107365521B (en) Water-soluble pre-flux, electronic substrate using same, and surface treatment method
CN115948746B (en) Al/Mo etching solution, and preparation method and application thereof

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
WW01 Invention patent application withdrawn after publication

Application publication date: 20200131

WW01 Invention patent application withdrawn after publication