CN110716320A - DOE optical path imaging system and photoetching machine - Google Patents

DOE optical path imaging system and photoetching machine Download PDF

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Publication number
CN110716320A
CN110716320A CN201911136255.XA CN201911136255A CN110716320A CN 110716320 A CN110716320 A CN 110716320A CN 201911136255 A CN201911136255 A CN 201911136255A CN 110716320 A CN110716320 A CN 110716320A
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light beam
doe
module
imaging system
optical path
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李铭
童立峰
赵彬
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Shanghai Huali Microelectronics Corp
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Shanghai Huali Microelectronics Corp
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
    • G02B27/4222—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant in projection exposure systems, e.g. photolithographic systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

The invention provides a DOE optical path imaging system which comprises a collimation module, an optical correction module, a DOE module and a convergence module, wherein the collimation module is used for collimating incident light and outputting a collimated light beam, the optical correction module receives the collimated light beam, corrects the collimated light beam and outputs a corrected light beam, the DOE module receives the corrected light beam, converts the corrected light beam into parallel light by using at least one diffraction optical element and outputs the parallel light, and the convergence module converges the light output by the DOE module and outputs an output light beam. Because the collimated light beam output by the collimating module has a certain divergence angle, the collimated light beam is corrected by the optical correction module, is deflected by the DOE module and is converged and output by the converging module, so that the divergence angle of the outgoing light beam output by the DOE optical path imaging system is reduced, the angular radius is reduced, and the defocusing problem can be improved. The invention also provides a photoetching machine which comprises the DOE optical path imaging system.

Description

DOE optical path imaging system and photoetching machine
Technical Field
The invention relates to the technical field of semiconductors, in particular to a DOE optical path imaging system and a photoetching machine.
Background
In semiconductor manufacturing, a photolithography machine is used to perform an exposure process, and particularly, patterns formed on various masks are transferred onto a substrate such as a wafer, a glass substrate, or the like coated with a photoresist. As the degree of integration of semiconductor devices on a substrate becomes higher and finer circuit patterns are required, the degree of attenuation loss of the exposure intensity and energy of a lithography machine affects the effect of pattern transfer.
In an existing DOE Optical path imaging system of a lithography machine, laser emitted by a light source is converted into parallel light through a collimating module, and then the parallel light is projected into a Diffraction Optical Element (DOE) group, and 75% -85% of incident light can be refracted to a designated position by using the Diffraction Optical Element.
In practical applications, however, in the DOE optical path imaging system of the above-mentioned lithography machine, the emergent light beam of the DOE optical path imaging system has a certain divergence angle, which results in a large emergent light spot, i.e. a defocusing problem. Therefore, there is still a need for an improved DOE optical path imaging system to reduce the divergence angle of the exiting beam and improve the defocus problem.
Disclosure of Invention
The invention provides a DOE optical path imaging system, which can reduce the divergence angle of an emergent beam of the DOE optical path imaging system, reduce the angular radius of the emergent beam and improve the defocusing problem. The invention further provides a photoetching machine.
In order to achieve the above object, the present invention provides a DOE optical path imaging system including:
the collimation module is used for collimating incident light and outputting collimated light beams;
the optical correction module is used for receiving the collimated light beam, correcting the collimated light beam and outputting a corrected light beam;
the DOE module is used for receiving the corrected light beam, converting the corrected light beam into parallel light by utilizing at least one diffractive optical element and outputting the parallel light;
and the convergence module is used for converging the light output by the DOE module and outputting an emergent light beam.
Optionally, the DOE module includes:
the first diffractive optical unit is used for receiving the corrected light beam and expanding the corrected light beam;
the second diffraction optical unit is used for receiving the output light beam of the first diffraction optical unit and enabling the light beam output by the first diffraction optical unit to be refracted and diffused outwards; and
and the third diffractive optical unit is used for receiving the output light beam of the second diffractive optical unit and converting the output light beam of the second diffractive optical unit into parallel light.
Optionally, the first diffractive optical unit is a lens group.
Optionally, the second diffractive optical element comprises a refractive lens.
Optionally, the third diffractive optical element is a compound lens.
Optionally, the optical correction module includes a schmitt correction plate, the schmitt correction plate has a plane and a curved surface opposite to each other, the plane is a side for receiving the incident light beam, and the curved surface is a side for outputting the corrected light beam.
Optionally, the plane of the schmitt correction plate for receiving the incident light beam is perpendicular to the incident light beam.
Optionally, the collimating module includes a collimating spherical mirror, the emergent light of the collimating spherical mirror enters the schmitt correction plate, and the schmitt correction plate does not shield the incident light and the emergent light of the collimating spherical mirror.
Optionally, the schmitt correction plate is made of optical quartz glass.
The invention also provides a photoetching machine, and the objective part of the photoetching machine comprises the DOE optical path imaging system.
The DOE optical path imaging system comprises a collimation module, an optical correction module, a DOE module and a convergence module, wherein the collimation module is used for collimating incident light and outputting a collimated light beam, the optical correction module receives the collimated light beam, corrects the collimated light beam and outputs a corrected light beam, the DOE module receives the corrected light beam, converts the corrected light beam into parallel light by using at least one diffractive optical element and outputs the parallel light beam, and the convergence module converges the light output by the DOE module and outputs an emergent light beam. Because the collimated light beam output by the collimating module has a certain divergence angle, the divergence angle of the collimated light beam is corrected by the optical correction module and the corrected light beam is output, the corrected light beam is reflected by the DOE module and converged by the convergence module for output, and the divergence angle of the obtained emergent light beam is reduced. The divergence of the emergent light beam output by the DOE optical path imaging system is reduced, and the angular radius of the emergent light beam is also reduced, so that the defocusing problem is improved.
The invention also provides a photoetching machine, wherein the objective lens part of the photoetching machine comprises the DOE optical path imaging system, so that the technical effect is the same as or similar to that of the DOE optical path imaging system.
Drawings
Fig. 1 is a schematic diagram of a DOE optical path imaging system according to an embodiment of the present invention.
Fig. 2 is a schematic diagram of a schmitt system.
FIG. 3 is a schematic diagram of a Schmitt system without a Schmitt correction plate disposed therein.
Fig. 4 is a schematic diagram illustrating a position of a schmitt correction plate in a DOE optical path imaging system according to an embodiment of the present invention.
Fig. 5 is a schematic optical path diagram of a half-schmitt system in an embodiment of the invention.
Description of reference numerals:
110-a collimating module; 111-a slit; 112-concave spherical mirror; 113-a collimating spherical mirror; 210-an optical correction module; 211-schmitt correction plate; 310-a first diffractive optical element; 320-a second diffractive optical element; 330-a third diffractive optical element; 410-convergence module.
Detailed Description
The DOE optical path imaging system and the lithography machine according to the present invention will be described in further detail with reference to the accompanying drawings and specific embodiments. The advantages and features of the present invention will become more apparent from the following description. It is to be noted that the drawings are in a very simplified form and are not to precise scale, which is merely for the purpose of facilitating and distinctly claiming the embodiments of the present invention.
The DOE optical path imaging system of the present invention includes at least one diffractive optical elements (hereinafter referred to as DOE). DOEs are a series of movable lenses in a lithography machine, and are characterized in that the DOEs can accurately control the light intensity distribution while keeping high diffraction efficiency, and are mainly used for generating light sources required by lithography. The DOEs are used in the DOE optical path imaging system to realize conventional illumination, and the conventional illumination with different sizes, namely different angular radii can be realized by adjusting the distance between the DOEs.
An embodiment of the present invention relates to a DOE optical path imaging system, including:
the collimation module is used for collimating incident light and outputting collimated light beams;
the optical correction module is used for receiving the collimated light beam, correcting the collimated light beam and outputting a corrected light beam;
the DOE module is used for receiving the corrected light beam, converting the corrected light beam into parallel light by utilizing at least one diffractive optical element and outputting the parallel light;
and the convergence module is used for converging the light output by the DOE module and outputting an emergent light beam.
Specifically, in this embodiment, the DOE module may include a first diffractive optical unit configured to receive the corrected light beam and expand the corrected light beam; and a second diffractive optical unit for receiving the output light beam of the first diffractive optical unit and deflecting and diffusing the light beam output from the first diffractive optical unit, and may further include a third diffractive optical unit for receiving the output light beam of the second diffractive optical unit and deflecting the output light beam of the second diffractive optical unit into parallel light.
Fig. 1 is a schematic diagram of a DOE optical path imaging system according to an embodiment of the present invention.
As shown in fig. 1, in the present embodiment, the DOE optical path imaging system includes a collimating module 110, an optical correction module 210, a first diffractive optical unit 310, a second diffractive optical unit 320, a third diffractive optical unit 330, and a converging module 410. The collimating module 110 is configured to collimate incident light and output a collimated light beam; the optical correction module 210 is configured to receive the collimated light beam, correct the collimated light beam, and output a corrected light beam; the first diffractive optical unit 310 is configured to receive the corrected light beam and expand the corrected light beam; the second diffractive optical element 320 is configured to receive the output light beam from the first diffractive optical element 310, and to deflect and diffuse the light beam output from the first diffractive optical element 310; the third diffractive optical element 330 is configured to receive the output beam of the second diffractive optical element 320 and to convert the output beam of the second diffractive optical element 320 into parallel light; the converging lens group 410 is configured to converge the light output from the third diffractive optical unit 330 and output an outgoing light beam. Because the collimated light beam output by the collimating module has a certain divergence angle, the divergence angle of the collimated light beam is corrected by the optical correction module and the corrected light beam is output, the corrected light beam is reflected by the DOE module and converged by the convergence module for output, and the divergence angle of the obtained emergent light beam is reduced. That is, the divergence angle of the outgoing light beam output by the DOE optical path imaging system is reduced, and the angular radius of the light beam is related to the divergence angle of the light beam, so that the angular radius of the outgoing light beam is also reduced as the divergence angle of the outgoing light beam is reduced, and the defocusing problem can be improved.
Alternatively, in this embodiment, the first diffractive optical element may be a lens group, the second diffractive optical element may include a refractive lens, and the third diffractive optical element may be a compound lens.
Optionally, in this embodiment, the optical correction module may include a schmitt correction plate. A Schmidt corrector plate (Schmidt concentrator plate) can be a lens used to correct spherical aberration generated by the spherical mirror of a reflective telescope, and the Schmidt corrector plate is thicker at the center and the edge. When the Schmidt correction plate is arranged at the front end of the telescope, the path of the light can be corrected on the path of the light, so that the light at the edge of the spherical mirror and the light at the paraxial region can be converged on the same point, namely, the spherical aberration is corrected. In this embodiment, the schmitt correction plate is used to correct the divergence angle of the collimated beam.
Specifically, in this embodiment, the schmitt correction plate may have a plane and a curved surface opposite to each other, where the plane may be a side receiving the incident light beam, and the curved surface may be a side outputting the corrected light beam, and the plane for receiving the incident light beam of the schmitt correction plate is perpendicular to the incident light beam.
Fig. 2 is a schematic diagram of a schmitt system. As shown in fig. 2, a complete schmitt system can be composed of a concave spherical mirror 112 and a schmitt corrector plate 211 placed at the center of curvature of the concave spherical mirror. FIG. 3 is a schematic diagram of a Schmitt system without a Schmitt correction plate disposed therein. As shown in fig. 3, when the schmitt correction plate 211 is not placed, the focal point of the paraxial ray convergence of the concave spherical mirror 112 is F, the focal point of the marginal ray convergence is M, and the third-order spherical aberration of the concave spherical mirror 112 is a line segment FM.
If there is a defocus amount Δ instead of the focal point of the paraxial ray, the third-order spherical aberration is represented as LAy'＝y2A/8 f- Δ; when the defocus amount Δ is set to 0, the third-order spherical aberration can be represented as LAy'＝y2(ii)/8 f, wherein f is the focal length of the schmitt correction plate in the schmitt system;
thus, the angular aberration can be expressed as the relation (1),
Figure BDA0002279673890000061
the wave surface difference is that the spherical wave passing through the actual optical system can deform because the actual optical system has aberration, the deformed actual wave surface is different from the ideal spherical wave, and the optical path difference between the two wave surfaces is called the wave surface difference;
the wave front difference can be expressed as relation (2),
Figure BDA0002279673890000062
the refractive index of the Schmitt correction plate is set to be n, the surface shape of the curved surface of the Schmitt correction plate can be expressed as a relational expression (3),
Figure BDA0002279673890000063
y0let a be Δ × 16f/y for the height from the central axis of the light incident on the edge of the schmidt correction plate (i.e., the paraxial light)0 2Then, then
Figure BDA0002279673890000064
Wherein a is a parameter related to defocus;
when the defocus amount is 0, a is 0, the surface shape of the curved surface of the schmitt correction plate can be expressed by the relation (4):
Figure BDA0002279673890000065
where (x, y) is the coordinates of a point on the curved surface in the plane of the vertical plane of the schmitt correction plate.
In this embodiment, the schmitt correction plate may be made of optical quartz glass, but in other embodiments, a schmitt correction plate made of other materials such as plastic may be selected. In this embodiment, the refractive index of the schmitt correction plate may select a corresponding value according to the wavelength of the incident light of the DOE optical path imaging system. As an example, when the wavelength of incident light of the DOE optical path imaging system is 185.41 μm, the refractive index n of the schmitt correction plate is equal to 1.57464; when the wavelength of incident light of the DOE optical path imaging system is 289.36 mu m, the refractive index n of the Schmitt correction plate is equal to 1.49098; when the wavelength of incident light of the DOE optical path imaging system is 193.53 μm, the refractive index n of the schmitt correction plate is equal to 1.56071.
Fig. 4 is a schematic diagram illustrating a position of a schmitt correction plate in a DOE optical path imaging system according to an embodiment of the present invention. As shown in fig. 4, in the present embodiment, the collimating module may include a collimating spherical mirror 113, and the collimating spherical mirror 113 receives the light beam incident from the slit 111. As an example, the DOE optical path imaging system is used in an objective part of a lithography machine, where a wavelength λ of incident light of the DOE optical path imaging system is 546.07nm, an incident angle of a light beam incident from a slit to a collimating spherical mirror is 11 degrees, a diameter of an output light beam after being turned by the collimating spherical mirror is 70mm, and a refractive index n of a schmitt correction plate is 1.46021, and according to the above relation (4), a surface shape of a curved surface of the schmitt correction plate applied in the DOE optical path imaging system of the present embodiment can be obtained as a relation (5):
x＝-2.515×10-9y4(5)，
wherein (x, y) is the coordinate of a point on the curved surface in the plane of the vertical plane of the schmitt correction plate.
With reference to fig. 4, in this embodiment, the schmitt correction plate 211 may be disposed in the optical path through which the outgoing light from the collimating spherical mirror passes, the outgoing light from the collimating spherical mirror enters from the plane of the schmitt correction plate 211, and after being corrected by the schmitt correction plate 211, the corrected light beam is output from the curved surface of the schmitt correction plate 211, where the plane of the schmitt correction plate 211 is perpendicular to the outgoing light from the collimating spherical mirror. In addition, in order to avoid blocking the incident light and the emergent light of the collimating spherical mirror, in this embodiment, a part of the schmitt system may be intercepted and applied to the optical path of the DOE optical path imaging system. Fig. 5 is a schematic optical path diagram of a half-schmitt system in an embodiment of the invention. As shown in fig. 5, the effective usage area of the schmitt correction plate is half of the whole schmitt correction plate, and does not block the incident light of the collimating spherical mirror (as shown in fig. 4). As an example, half of the schmitt correction plate, whose designed curved surface shape can be represented by the relation (5), is applied to the DOE optical path imaging system, and then the outgoing beam output by the DOE optical path imaging system is subjected to simulation analysis, so that it is known that the angular radius of the outgoing beam output by the DOE optical path imaging system provided with the schmitt correction plate is reduced by 55.37% compared with that of the outgoing beam output by the DOE optical path imaging system not provided with the schmitt correction plate.
The DOE optical path imaging system of this embodiment includes a collimation module, an optical correction module, a DOE module, and a convergence module, where the collimation module is configured to collimate incident light and output a collimated light beam, the optical correction module receives the collimated light beam and corrects the collimated light beam, and outputs a corrected light beam, the DOE module receives the corrected light beam, and converts the corrected light beam into parallel light by using at least one diffractive optical element and outputs the parallel light beam, and the convergence module converges light output by the DOE module and outputs an outgoing light beam. Because the collimated light beam output by the collimating module has a certain divergence angle, the divergence angle of the collimated light beam is corrected by the optical correction module and the corrected light beam is output, the corrected light beam is converted by the DOE module and is converged and output by the converging module, and the divergence angle of the obtained emergent light beam is reduced. The divergence of the emergent light beam output by the DOE optical path imaging system is reduced, and the angular radius of the emergent light beam is also reduced, so that the defocusing problem is improved.
The invention also provides a photoetching machine, wherein the objective lens part of the photoetching machine comprises the DOE optical path imaging system, and the DOE optical path imaging system can comprise a collimation module, an optical correction module, a DOE module and a convergence module. The lithography machine may further comprise an automatic alignment system, a mask transfer system, a frame damping system, a silicon wafer transfer system, etc. In the photoetching process, an emergent light beam emitted by a DOE light path imaging system of a photoetching machine irradiates a mask plate, and a pattern on the mask plate is copied to a substrate coated with photoresist. Because the collimated light beam output by the collimating module of the DOE optical path imaging system has a certain divergence angle, the divergence angle of the collimated light beam is corrected by the optical correction module and the corrected light beam is output, the corrected light beam is reflected by the DOE module and converged by the convergence module for output, the divergence of the output light beam output by the DOE optical path imaging system is reduced, namely the divergence angle of the output light beam irradiated on a mask plate in a photoetching machine is reduced, the angular radius of the output light beam can also be reduced, so that the defocusing problem is improved, and the effect of copying the graph on the mask plate onto the substrate coated with the photoresist is improved.
The above description is only for the purpose of describing the preferred embodiments of the present invention and is not intended to limit the scope of the claims of the present invention, and any person skilled in the art can make possible the variations and modifications of the technical solutions of the present invention using the methods and technical contents disclosed above without departing from the spirit and scope of the present invention, and therefore, any simple modification, equivalent change and modification made to the above embodiments according to the technical essence of the present invention belong to the protection scope of the technical solutions of the present invention.

Claims (10)

1. A DOE optical path imaging system, comprising:
the collimation module is used for collimating incident light and outputting collimated light beams;
the optical correction module is used for receiving the collimated light beam, correcting the collimated light beam and outputting a corrected light beam;
the DOE module is used for receiving the corrected light beam, converting the corrected light beam into parallel light by utilizing at least one diffractive optical element and outputting the parallel light;
and the convergence module is used for converging the light output by the DOE module and outputting an emergent light beam.
2. The DOE optical path imaging system according to claim 1, wherein the DOE module includes:
the first diffractive optical unit is used for receiving the corrected light beam and expanding the corrected light beam;
the second diffraction optical unit is used for receiving the output light beam of the first diffraction optical unit and enabling the light beam output by the first diffraction optical unit to be refracted and diffused outwards; and
and the third diffractive optical unit is used for receiving the output light beam of the second diffractive optical unit and converting the output light beam of the second diffractive optical unit into parallel light.
3. The DOE optical path imaging system according to claim 2, wherein the first diffractive optical unit is a lens group.
4. The DOE optical path imaging system according to claim 2, wherein the second diffractive optical unit includes a refractive lens.
5. The DOE optical path imaging system according to claim 2, wherein the third diffractive optical unit is a compound lens.
6. The DOE optical path imaging system of claim 1, wherein the optical correction module comprises a schmitt correction plate having opposite flat and curved surfaces, the flat surface being a side for receiving the incident light beam, and the curved surface being a side for outputting the corrected light beam.
7. The DOE optical path imaging system of claim 6, wherein the plane of the Schmitt correction plate for receiving an incident light beam is perpendicular to the incident light beam.
8. The DOE optical path imaging system according to claim 6, wherein the collimating module includes a collimating spherical mirror, the emergent light of the collimating spherical mirror is incident to the Schmitt correction plate, and the Schmitt correction plate DOEs not block the incident light and the emergent light of the collimating spherical mirror.
9. The DOE optical path imaging system according to claim 6, wherein the Schmidt correction plate is made of optical quartz glass.
10. A lithography machine, wherein the objective part of the lithography machine comprises the DOE optical path imaging system according to any one of claims 1 to 9.
CN201911136255.XA 2019-11-19 2019-11-19 DOE optical path imaging system and photoetching machine Pending CN110716320A (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103676498A (en) * 2013-11-18 2014-03-26 中国科学院上海光学精密机械研究所 Pupil shaping unit structure of lithography machine and design method for diffraction optical element of pupil shaping unit structure
CN103885297A (en) * 2014-03-04 2014-06-25 中国科学院上海光学精密机械研究所 Correcting method of lighting uniformity of photoetching machine exposure system
DE102017204312A1 (en) * 2016-05-30 2017-11-30 Carl Zeiss Smt Gmbh Optical wavelength filter component for a light beam
CN109298605A (en) * 2018-11-30 2019-02-01 上海华力微电子有限公司 Aberration correction system, litho machine and aberration correcting method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103676498A (en) * 2013-11-18 2014-03-26 中国科学院上海光学精密机械研究所 Pupil shaping unit structure of lithography machine and design method for diffraction optical element of pupil shaping unit structure
CN103885297A (en) * 2014-03-04 2014-06-25 中国科学院上海光学精密机械研究所 Correcting method of lighting uniformity of photoetching machine exposure system
DE102017204312A1 (en) * 2016-05-30 2017-11-30 Carl Zeiss Smt Gmbh Optical wavelength filter component for a light beam
CN109298605A (en) * 2018-11-30 2019-02-01 上海华力微电子有限公司 Aberration correction system, litho machine and aberration correcting method

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Application publication date: 20200121