CN110673237B - 防止光斑变形的透镜及激光投影系统 - Google Patents
防止光斑变形的透镜及激光投影系统 Download PDFInfo
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- CN110673237B CN110673237B CN201910817976.0A CN201910817976A CN110673237B CN 110673237 B CN110673237 B CN 110673237B CN 201910817976 A CN201910817976 A CN 201910817976A CN 110673237 B CN110673237 B CN 110673237B
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- 238000005286 illumination Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 4
- 235000009537 plain noodles Nutrition 0.000 description 4
- 239000003086 colorant Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0955—Lenses
- G02B27/0961—Lens arrays
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
- G03B21/20—Lamp housings
- G03B21/2006—Lamp housings characterised by the light source
- G03B21/2033—LED or laser light sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
- G03B21/20—Lamp housings
- G03B21/208—Homogenising, shaping of the illumination light
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Projection Apparatus (AREA)
Abstract
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Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201910817976.0A CN110673237B (zh) | 2019-08-30 | 2019-08-30 | 防止光斑变形的透镜及激光投影系统 |
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CN201910817976.0A CN110673237B (zh) | 2019-08-30 | 2019-08-30 | 防止光斑变形的透镜及激光投影系统 |
Publications (2)
Publication Number | Publication Date |
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CN110673237A CN110673237A (zh) | 2020-01-10 |
CN110673237B true CN110673237B (zh) | 2022-02-18 |
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CN201910817976.0A Active CN110673237B (zh) | 2019-08-30 | 2019-08-30 | 防止光斑变形的透镜及激光投影系统 |
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CN (1) | CN110673237B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN114624946B (zh) * | 2020-12-10 | 2024-06-11 | 宁波舜宇车载光学技术有限公司 | 复眼透镜、投影系统及复眼透镜的制备方法 |
Citations (6)
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---|---|---|---|---|
JP2001185792A (ja) * | 1999-12-22 | 2001-07-06 | Ricoh Co Ltd | レーザー用光学素子 |
CN102305969A (zh) * | 2011-09-15 | 2012-01-04 | 中国科学院长春光学精密机械与物理研究所 | 实现半导体激光光束匀化的微光学元件 |
CN104704398A (zh) * | 2012-10-12 | 2015-06-10 | 佳能株式会社 | 成像光学系统和透镜阵列制造方法 |
CN105223765A (zh) * | 2012-12-19 | 2016-01-06 | 卡西欧计算机株式会社 | 可射出将干涉条纹的影响降低的光的光源装置以及采用该光源装置的投影仪 |
CN107664843A (zh) * | 2016-07-28 | 2018-02-06 | 林特琅普股份有限公司 | 照明装置和平视显示器装置 |
CN109827149A (zh) * | 2019-03-18 | 2019-05-31 | 广东烨嘉光电科技股份有限公司 | 一种矩形光斑的闪光灯透镜系统及其设计方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4089371B2 (ja) * | 2002-09-24 | 2008-05-28 | セイコーエプソン株式会社 | 透過型スクリーン及びリア型プロジェクタ |
DE10258215A1 (de) * | 2002-12-13 | 2004-07-22 | Hentze-Lissotschenko Patentverwaltungs Gmbh & Co.Kg | Vorrichtung zur Erfassung und Vorrichtung zur Wiedergabe von Bildinformationen eines Objektes |
JP2010181686A (ja) * | 2009-02-06 | 2010-08-19 | Oki Data Corp | レンズアレイ、ledヘッド、露光装置、画像形成装置および読取装置 |
KR101108732B1 (ko) * | 2009-11-03 | 2012-02-16 | 삼성전기주식회사 | 카메라 모듈용 렌즈 제조 방법 |
JP5683648B2 (ja) * | 2013-03-27 | 2015-03-11 | オムロンオートモーティブエレクトロニクス株式会社 | レーザレーダ装置 |
CN207230456U (zh) * | 2017-10-19 | 2018-04-13 | 佛山市升阳光学科技有限公司 | 一种光学透镜及应用其的口腔灯 |
-
2019
- 2019-08-30 CN CN201910817976.0A patent/CN110673237B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001185792A (ja) * | 1999-12-22 | 2001-07-06 | Ricoh Co Ltd | レーザー用光学素子 |
CN102305969A (zh) * | 2011-09-15 | 2012-01-04 | 中国科学院长春光学精密机械与物理研究所 | 实现半导体激光光束匀化的微光学元件 |
CN104704398A (zh) * | 2012-10-12 | 2015-06-10 | 佳能株式会社 | 成像光学系统和透镜阵列制造方法 |
CN105223765A (zh) * | 2012-12-19 | 2016-01-06 | 卡西欧计算机株式会社 | 可射出将干涉条纹的影响降低的光的光源装置以及采用该光源装置的投影仪 |
CN107664843A (zh) * | 2016-07-28 | 2018-02-06 | 林特琅普股份有限公司 | 照明装置和平视显示器装置 |
CN109827149A (zh) * | 2019-03-18 | 2019-05-31 | 广东烨嘉光电科技股份有限公司 | 一种矩形光斑的闪光灯透镜系统及其设计方法 |
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CN110673237A (zh) | 2020-01-10 |
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Effective date of registration: 20240122 Address after: 200000 1-2, 4, 1628 Li Zheng Road, Pudong New Area academy, Shanghai. Patentee after: SHANGHAI QINKUN INFORMATION TECHNOLOGY Co.,Ltd. Country or region after: China Address before: 523000 Zaoyi Industrial Zone, Dongcheng, Dongguan City, Guangdong Province Patentee before: DONGGUAN WANDE OPTOELECTRONICS TECHNOLOGY Co.,Ltd. Country or region before: China |
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Effective date of registration: 20240202 Address after: 100020 foreign enterprise service company, Chaoyang District, Beijing Patentee after: Yan Tao Country or region after: China Address before: 200000 1-2, 4, 1628 Li Zheng Road, Pudong New Area academy, Shanghai. Patentee before: SHANGHAI QINKUN INFORMATION TECHNOLOGY Co.,Ltd. Country or region before: China |
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