CN110667269A - Photosensitive seal material structure and production method thereof - Google Patents
Photosensitive seal material structure and production method thereof Download PDFInfo
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- CN110667269A CN110667269A CN201910574202.XA CN201910574202A CN110667269A CN 110667269 A CN110667269 A CN 110667269A CN 201910574202 A CN201910574202 A CN 201910574202A CN 110667269 A CN110667269 A CN 110667269A
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- ink
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- seal material
- photosensitive
- photosensitive seal
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41K—STAMPS; STAMPING OR NUMBERING APPARATUS OR DEVICES
- B41K1/00—Portable hand-operated devices without means for supporting or locating the articles to be stamped, i.e. hand stamps; Inking devices or other accessories therefor
- B41K1/36—Details
- B41K1/38—Inking devices; Stamping surfaces
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- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Abstract
The invention discloses a photosensitive seal material structure, and technically aims to provide a systematic technical scheme for controlling the ink injection amount of a photosensitive seal material, and a production method of the photosensitive seal material, which reduces soluble filler and improves the ink injection speed of the material in production. The photosensitive seal material is provided with an ink outlet layer, and the ink seepage speed of the ink outlet layer is as follows: 0.25-0.35 mL/s; the production method of the photosensitive seal material comprises the following steps: melting 1-30% of soluble filler, mixing with other non-melted soluble filler and resin, banburying, molding, dissolving filler, cleaning and drying. The invention has high stamping definition without ink shortage; the production method of the invention can achieve the good technical effects of reducing the filling, good material fluidity and high aperture ratio; is suitable for the field of stamp material production.
Description
Technical Field
The invention relates to a photosensitive seal material, in particular to a photosensitive seal material structure with clear seal and a production method thereof.
Background
In the prior art, a photosensitive seal material adopts a single-layer or double-layer structure to complete stamping, the single-layer structure generally achieves a balance between ink injection speed and definition, the ink injection speed is high to prevent the situation of ink shortage during stamping, and the ink injection speed is controlled well to prevent the situation of poor definition of the edge of the seal caused by excessive ink injection during stamping. The double-layer seal material generally adopts a mode of arranging an ink injection layer and an ink outlet layer to solve the problems of ink shortage prevention and seal definition. In the prior art, a technical problem of systematically controlling the ink seepage amount is not solved.
Disclosure of Invention
The invention aims to overcome the technical problems that in the prior art, the seal material does not have a systematic scheme for solving the problems of ink shortage and definition in the ink injection speed control technology; therefore, the photosensitive seal material structure for controlling the ink injection amount of the photosensitive seal material is provided, and the production method of the photosensitive seal material is capable of improving the ink injection speed of the material while reducing the soluble filler.
In order to achieve the technical purpose, the technical scheme of the invention is as follows:
a photosensitive seal material structure adopts a single-layer photosensitive seal material, and the hardness of the photosensitive seal material is Shore hardness 45-75C.
Further, the ink absorption amount of the photosensitive seal material is 0.5 ml-0.7 ml/cm3。
Further, the ink absorption amount of the photosensitive seal material is 0.55 ml-0.60 ml/cm3。
Further, the ink absorption amount of the photosensitive seal material is 0.57 ml-0.58ml/cm3。
Further, the ink-permeating speed of the photosensitive stamp material is 0.25-0.35 mL/s.
Further, the compression amount of the photosensitive stamp material during stamping is as follows: 0.40-0.5 ml/cm3。
The invention also provides another photosensitive seal material structure, which adopts a double-layer photosensitive seal material, wherein the photosensitive seal material is provided with an ink permeating layer and an ink stagnating layer.
Further, the ink absorption amount of the ink-permeable layer is 0.75ml-0.90 ml/cm3(ii) a The ink absorption amount of the ink-retention layer is 0.5-0.7 ml/cm3。
Further, the ink absorption amount of the ink-permeable layer is 0.917 ml/cm3(ii) a The ink absorption amount of the ink stagnation layer is 0.596ml/cm3。
The invention also provides another photosensitive seal material structure, which adopts a double-layer photosensitive seal material, and an ink outlet layer is arranged on the photosensitive seal material.
Further, the ink bleeding speed of the ink outlet layer is as follows: 0.25-0.35 mL/s.
Further, the ink absorption amount of the ink outlet layer is as follows: 0.9ml/cm3And the compression amount of the ink outlet layer during stamping is as follows: 0.45 ml/cm3。
Further, at least one high-hardness layer and one low-hardness layer are arranged on the ink outlet layer, the high-hardness layer is Shore hardness 40C-62C, and the low-hardness layer is Shore hardness 30C-40C; the aperture of the open pore is 10-40 microns.
Furthermore, the ink outlet layer at least realizes the adjustment of the pore size of the open pore by adjusting the mesh number of the soluble filler sieve, and the mesh number of the soluble filler sieve is 200-1000 meshes.
Further, the ink outlet layer controls the ink bleeding speed by adjusting the density of the soluble filler.
Further, the ink outlet layer controls the ink bleeding speed by adjusting the particle size of the soluble filler.
The invention also provides a production method of the photosensitive seal material, which is characterized by comprising the following steps: the method comprises the following steps: melting 1-30% of soluble filler, mixing with the rest non-melted soluble filler and resin, banburying, molding, dissolving the filler, cleaning and drying to form linear through holes.
The beneficial technical effects of the invention are as follows: by adopting the technical scheme of the invention, the hardness, the permeability and the ink seepage speed can achieve the best stamping effect, and the stamping definition is high while ink is not lacked; the production method of the invention can achieve the good technical effects of reducing the filling, good material fluidity and high aperture ratio. The inventor finds that the resin hardness of the ink layer raw material is improved, the flowing speed of the upper stamp-pad ink is not influenced, the phenomenon of ink shortage is guaranteed, the amount of the extruded stamp-pad ink can be reduced, and the definition is improved.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Drawings
FIG. 1 is a schematic structural view of a photosensitive stamp material employing a single layer according to the present invention;
FIG. 2 is a schematic structural view of the present invention employing a double layer of photosensitive stamp material;
FIG. 3 is a schematic view of another embodiment of the present invention employing a dual layer photosensitive stamp material;
FIG. 4 is a process flow diagram of a method of producing the photosensitive stamp material of the present invention.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are illustrative and intended to be illustrative of the invention and are not to be construed as limiting the invention.
Example 1
A photosensitive seal material structure is shown in figure 1, a single-layer photosensitive seal material 1 is adopted, and the hardness of the photosensitive seal material 1 is Shore hardness 45C, 55C and 75C.
Example 2
A photosensitive seal material structure is shown in figure 1, and adopts a single-layer photosensitive seal material 1, the hardness of the photosensitive seal material 1 is Shore hardness 45C, and the ink absorption amount of the photosensitive seal material 1 is 0.5 ml/cm3、0.55 ml/cm3、0.57 ml/cm3、0.575 ml/cm3、0.58ml/cm3、0.59ml/cm3、0.60 ml/cm3、0.7 ml/cm3。
Example 3
A photosensitive seal material structure is shown in figure 1, and adopts a single-layer photosensitive seal material 1, the hardness of the photosensitive seal material 1 is Shore hardness 55C, and the ink absorption amount of the photosensitive seal material 1 is 0.5 ml/cm3、0.55 ml/cm3、0.57 ml/cm3、0.575 ml/cm3、0.58ml/cm3、0.59ml/cm3、0.60 ml/cm3、0.7 ml/cm3。
Example 4
A photosensitive seal material structure adopts a single-layer photosensitive seal material, the hardness of the photosensitive seal material is Shore hardness 75C, and the ink absorption amount of the photosensitive seal material is 0.5 ml/cm3、0.55 ml/cm3、0.57 ml/cm3、0.575 ml/cm3、0.58ml/cm3、0.59ml/cm3、0.60 ml/cm3、0.7 ml/cm3。
Example 5
The utility model provides a photosensitive seal material structure, adopts the photosensitive seal material of individual layer, and the hardness of photosensitive seal material is shore hardness 45C, and the ink seepage speed of photosensitive seal material is: 0.25 mL/s, 0.3 mL/s, 0.35 mL/s.
Example 6
The utility model provides a photosensitive seal material structure, adopts the photosensitive seal material of individual layer, and the hardness of photosensitive seal material is shore hardness 55C, and the ink seepage speed of photosensitive seal material is: 0.25 mL/s, 0.3 mL/s, 0.35 mL/s.
Example 7
The utility model provides a photosensitive seal material structure, adopts the photosensitive seal material of individual layer, and the hardness of photosensitive seal material is shore hardness 75C, and the ink seepage speed of photosensitive seal material is: 0.25 mL/s, 0.3 mL/s, 0.35 mL/s.
Example 8
The utility model provides a photosensitive seal material structure, adopts the photosensitive seal material of individual layer, and the hardness of photosensitive seal material is shore hardness 45C, and the decrement when the stamp is: 0.40ml/cm3、0.45ml/cm3、0.5ml/cm3。
Example 9
The utility model provides a photosensitive seal material structure, adopts the photosensitive seal material of individual layer, and the hardness of photosensitive seal material is shore hardness 55C, and the decrement when the stamp is: 0.40ml/cm3、0.45ml/cm3、0.5ml/cm3。
Example 10
The utility model provides a photosensitive seal material structure, adopts the photosensitive seal material of individual layer, and the hardness of photosensitive seal material is shore hardness 75C, and the decrement when the stamp is: 0.40ml/cm3、0.45ml/cm3、0.5ml/cm3。
Example 11
The utility model provides a photosensitive seal material structure, adopts the photosensitive seal material of individual layer, and the hardness of photosensitive seal material is shore hardness 45C, 55C, 75C, and the decrement when the stamp is: 0.40ml/cm3、0.45ml/cm3、0.5ml/cm3(ii) a The ink permeation speed of the photosensitive seal material is as follows: 0.25 mL/s, 0.3 mL/s, 0.35 mL/s; the ink absorption amount of the photosensitive seal material is 0.5 ml/cm3、0.55ml/cm3、0.57 ml/cm3、0.575 ml/cm3、0.58ml/cm3、0.59ml/cm3、0.60 ml/cm3、0.7 ml/cm3。
Example 12
A photosensitive seal material structure adopts single-layer photosensitive seal material, when the hardness of the photosensitive seal material is 3.75 times of that of common material, the ink absorption amount of the photosensitive seal material is 0.683ml/cm3。
Example 13
A photosensitive seal material structure adopts a double-layer photosensitive seal material, as shown in figure 2, namely, an ink-permeating layer 11 and an ink-stagnating layer 12 are arranged on the photosensitive seal material.
Example 14
This example is different from example 13 in that the ink absorption amount of the ink-permeable layer 11 was 0.75 ml/cm3(ii) a The ink absorption amount of the ink-retaining layer 12 was 0.5 ml/cm3。
Example 15
This example is different from example 13 in that the ink absorption amount of the ink-permeable layer was 0.88 ml/cm3The ink absorption amount of the ink-retention layer is 0.58ml/cm3。
Example 16
This example is different from example 13 in that the ink absorption amount of the ink-permeable layer was 0.90 ml/cm3The ink absorption amount of the ink-retention layer is 0.7 ml/cm3。
Example 17
This example is different from example 13 in that the ink absorption amount of the ink-permeable layer was 0.917 ml/cm3The ink absorption amount of the ink accumulation layer is 0.596ml/cm3。
Example 18
A photosensitive seal material structure adopts a double-layer photosensitive seal material, as shown in figure 3, an ink outlet layer 13 is arranged on the photosensitive seal material.
Example 19
The present example differs from example 18 in that the ink bleeding speed of the ink-discharging layer is 0.25 mL/s, and this ink bleeding speed can be achieved by adjusting the particle size of the soluble filler 14, or by adjusting the density of the soluble filler.
Example 20
The present example differs from example 18 in that the ink bleeding speed of the ink-discharging layer is 0.30 mL/s, which can be achieved by adjusting the particle size of the soluble filler 14, or by adjusting the density of the soluble filler.
Example 21
The present example differs from example 18 in that the ink bleeding speed of the ink-discharging layer was 0.35mL/s, and this ink bleeding speed was achieved by adjusting the particle size of the soluble filler, or by adjusting the density of the soluble filler.
Example 22
The utility model provides a photosensitive seal material structure, adopts double-deck photosensitive seal material, is equipped with one deck black layer on the photosensitive seal material, and black layer's ink absorption volume is: 0.9ml/cm3The compression amount of the ink-out layer during stamping is as follows: 0.45 ml/cm3。
Example 23
A photosensitive seal material structure adopts a double-layer photosensitive seal material, wherein an ink outlet layer is arranged on the photosensitive seal material, at least one high-hardness layer and one low-hardness layer are arranged on the ink outlet layer, the high-hardness layer has Shore hardness of 40C, 45C and 62C, and the low-hardness layer has Shore hardness of 30C and 40C; the pore size of the open pore is 10 microns to 40 microns, preferably 10 microns, 20 microns, 30 microns and 40 microns.
Example 24
The difference between this embodiment and embodiment 23 is that the ink outlet layer can adjust the size of the open pore by adjusting the mesh number of the soluble filler sieve, and the mesh number of the soluble filler sieve is 200-1000 meshes, preferably 200 meshes, 600 meshes, 800 meshes, 1000 meshes.
Example 25
A method for producing a photosensitive stamp material, as shown in FIG. 4, comprises the following steps: melting 1% of the soluble filler, mixing with the rest of the non-melted 99% soluble filler and resin, banburying, molding, dissolving the filler, cleaning and drying to form the linear through hole.
Example 26
A production method of a photosensitive seal material comprises the following steps: and melting 15% of the soluble filler, mixing with the rest of non-melted 85% soluble filler and resin, banburying, molding, dissolving the filler, cleaning and drying to form the linear through hole.
Example 27
A production method of a photosensitive seal material comprises the following steps: and melting 30% of the soluble filler, mixing with the rest of non-melted 70% of the soluble filler and resin, banburying, forming, dissolving the filler, cleaning and drying to form the linear through hole.
The inventor finds that the resin hardness of the ink layer raw material is improved, the flowing speed of the upper stamp-pad ink is not influenced, the phenomenon of ink shortage is guaranteed, the amount of the extruded stamp-pad ink can be reduced, and the definition is improved. Therefore, the permeability and the ink seepage speed of the technical scheme of the invention can achieve the best stamping effect, and the stamping definition is high while ink is not lacked; the production method of the photosensitive seal material can achieve the good technical effects of reducing the filling material, good material fluidity and high aperture ratio, and is a prominent technical improvement in the field.
Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention, and that variations, modifications, substitutions and alterations can be made in the above embodiments by those of ordinary skill in the art without departing from the principle and spirit of the present invention. The scope of the invention is defined by the appended claims and their full range of equivalents.
Claims (10)
1. A photosensitive seal material structure is characterized in that: a single-layer photosensitive stamp material is adopted, and the hardness of the photosensitive stamp material is Shore hardness 45C-75C.
2. The photosensitive stamp material structure of claim 1, wherein: the ink absorption amount of the photosensitive seal material is 0.5 ml-0.7 ml/cm3。
3. The photosensitive stamp material structure of claim 1, wherein: the ink permeation speed of the photosensitive seal material is 0.25-0.35 ml/s.
4. The photosensitive stamp material structure of claim 1, wherein: the compression amount of the photosensitive seal material during stamping is as follows: 0.40-0.5 ml/cm3。
5. A material structure of a photosensitive seal is disclosed,the method is characterized in that: adopting a double-layer photosensitive seal material, wherein the photosensitive seal material is provided with an ink permeating layer and an ink stagnating layer; the ink absorption amount of the ink permeating layer is 0.75ml-0.90 ml/cm3(ii) a The ink absorption amount of the ink-retention layer is 0.5-0.7 ml/cm3。
6. A photosensitive seal material structure is characterized in that: the method is characterized in that a double-layer photosensitive seal material is adopted, an ink outlet layer is arranged on the photosensitive seal material, and the ink permeating speed of the ink outlet layer is as follows: 0.25-0.35 mL/s.
7. The photosensitive stamp material structure of claim 6, wherein: the ink absorption amount of the ink outlet layer is as follows: 0.9ml/cm3And the compression amount of the ink outlet layer during stamping is as follows: 0.45 ml/cm3。
8. The photosensitive stamp material structure of claim 6, wherein: the ink outlet layer is provided with at least one high-hardness layer and one low-hardness layer, the high-hardness layer is Shore hardness 40C-62C, and the low-hardness layer is Shore hardness 30C-40C; the aperture of the open pore is 10-40 microns.
9. The photosensitive stamp material structure of claim 6, wherein: the ink outlet layer at least realizes the adjustment of the pore size of the open pore by adjusting the mesh number of the soluble filler sieve, and the mesh number of the soluble filler sieve is 200-1000 meshes.
10. The photosensitive stamp material structure of claim 10, wherein: the ink-out layer controls the ink-bleeding speed by adjusting the density of the soluble filler.
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| CN201910574202.XA CN110667269A (en) | 2019-06-28 | 2019-06-28 | Photosensitive seal material structure and production method thereof |
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| CN201910574202.XA CN110667269A (en) | 2019-06-28 | 2019-06-28 | Photosensitive seal material structure and production method thereof |
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