CN110634928A - Display panel and display device - Google Patents

Display panel and display device Download PDF

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Publication number
CN110634928A
CN110634928A CN201910918367.4A CN201910918367A CN110634928A CN 110634928 A CN110634928 A CN 110634928A CN 201910918367 A CN201910918367 A CN 201910918367A CN 110634928 A CN110634928 A CN 110634928A
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China
Prior art keywords
groove
layer
area
grooves
display panel
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CN201910918367.4A
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Chinese (zh)
Inventor
乐琴
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Wuhan Tianma Microelectronics Co Ltd
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Wuhan Tianma Microelectronics Co Ltd
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Priority to CN201910918367.4A priority Critical patent/CN110634928A/en
Publication of CN110634928A publication Critical patent/CN110634928A/en
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/60OLEDs integrated with inorganic light-sensitive elements, e.g. with inorganic solar cells or inorganic photodiodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/60OLEDs integrated with inorganic light-sensitive elements, e.g. with inorganic solar cells or inorganic photodiodes
    • H10K59/65OLEDs integrated with inorganic image sensors

Abstract

The embodiment of the invention discloses a display panel and a display device. The display panel includes: the display area, the peripheral area and the through area are sequentially arranged from outside to inside, the peripheral area surrounds the through area, and the display area surrounds the peripheral area; further comprising: the substrate comprises a substrate base plate and a retaining wall positioned on one side of the substrate base plate, wherein the retaining wall is positioned in a peripheral area; a first through hole is formed in the substrate base plate in the penetrating region and penetrates through the substrate base plate; at least one first groove and at least one second groove are formed on the substrate base plate located in the peripheral area, and the first groove and the second groove surround the first through hole; the first groove and the second groove partially penetrate through the substrate base plate, and the depth of the first groove is larger than that of the second groove; at least one first groove is positioned on one side of the retaining wall close to the first through hole. The technical scheme provided by the embodiment of the invention can improve the water and oxygen blocking capability of the display panel.

Description

Display panel and display device
Technical Field
The embodiment of the invention relates to the technical field of display, in particular to a display panel and a display device.
Background
At present, an in-screen camera, namely a camera embedded in a display area, is a hotspot of research in the current display field, and is beneficial to improving the screen occupation ratio of a display screen.
The in-screen camera is provided with a hole in the display area to place the camera in the display area, but for the display panel, especially the cathode therein, the display effect is easily affected or the service life is shortened by the erosion of water vapor and/or oxygen. However, the holes are formed in the display region, so that the film layer in the display panel is exposed to air, and moisture or oxygen easily enters from the side walls of the holes, which may reduce the display effect of the display panel or shorten the lifetime of the display panel.
Disclosure of Invention
The embodiment of the invention provides a display panel and a display device, which are used for improving the water and oxygen blocking capability of the display panel.
In a first aspect, an embodiment of the present invention provides a display panel, including:
the display area, the peripheral area and the through area are sequentially arranged from outside to inside, the peripheral area surrounds the through area, and the display area surrounds the peripheral area; the display panel further includes:
the substrate comprises a substrate base plate and a retaining wall positioned on one side of the substrate base plate, wherein the retaining wall is positioned in a peripheral area;
a first through hole is formed in the substrate base plate in the penetrating region and penetrates through the substrate base plate; at least one first groove and at least one second groove are formed on the substrate base plate located in the peripheral area, and the first groove and the second groove surround the first through hole; the first groove and the second groove partially penetrate through the substrate base plate, and the depth of the first groove is larger than that of the second groove; at least one first groove is positioned on one side of the retaining wall close to the first through hole.
In a second aspect, an embodiment of the present invention further provides a display device, including the display panel provided in any embodiment of the present invention.
According to the display panel provided by the embodiment of the invention, the substrate base plate is provided with the at least one first groove and the at least one second groove which surround the first through hole, so that the organic light emitting layer formed on one side of the retaining wall, which is deviated from the substrate base plate, is disconnected at the position corresponding to the first groove and the position corresponding to the second groove, the path of water and oxygen invading into the display area is cut off at the position corresponding to the first groove and the position corresponding to the second groove, and the water and oxygen blocking capability of the display panel is improved. In addition, the degree of depth of first recess is greater than the degree of depth of second recess, set up the first recess that the separation ability is stronger in the one side that is close to water oxygen invasion source, be favorable to improving the possibility of cutting off organic light emitting layer near water oxygen invasion source department, the second recess that sets up the degree of depth is supplementary first recess and is blocked organic light emitting layer, both can improve the ability of separation organic light emitting layer, thereby improve the ability that prevents water oxygen from invading display panel from the lateral wall of through-hole, can prevent again that the substrate base plate 110 of peripheral zone PA from becoming thinner region too much owing to set up first recess 120, thereby reduce water oxygen and set up the possibility that the opposite face of first recess and second recess invades from the substrate base plate.
Drawings
Fig. 1 is a schematic structural diagram of a display panel according to an embodiment of the present invention;
FIG. 2 is a schematic cross-sectional view taken along line A-A' of FIG. 1;
FIG. 3 is a schematic view of another cross-sectional structure taken along line A-A' of FIG. 1;
FIG. 4 is a schematic structural diagram of a second groove not blocking an organic light emitting layer according to an embodiment of the present invention;
FIG. 5 is a schematic view of a further cross-sectional configuration taken along line A-A' of FIG. 1;
FIG. 6 is a schematic view of a further cross-sectional structure taken along line A-A' of FIG. 1;
FIG. 7 is a schematic view of a cross-sectional structure taken along line A-A' of FIG. 1;
FIG. 8 is a schematic view of another cross-sectional structure taken along line A-A' of FIG. 1;
FIG. 9 is a schematic view of a further cross-sectional configuration taken along line A-A' of FIG. 1;
FIG. 10 is a flow chart of forming a second groove and a first groove according to an embodiment of the present invention;
FIG. 11 is a schematic structural diagram illustrating a first protective layer and a first photoresist layer formed on one side of a substrate according to an embodiment of the present invention;
FIG. 12 is a schematic view of a structure after exposure and development of a first photoresist layer according to an embodiment of the present invention;
fig. 13 is a schematic structural diagram after etching the first protective layer according to an embodiment of the present invention;
FIG. 14 is a schematic diagram of a third via after formation according to an embodiment of the present invention;
FIG. 15 is a schematic diagram of a structure after forming a second groove according to an embodiment of the present invention;
FIG. 16 is a schematic structural diagram illustrating a structure after removing the first passivation layer and the first photoresist layer according to an embodiment of the present invention;
FIG. 17 is a schematic structural diagram illustrating a second protective layer and a second photoresist layer formed on one side of a substrate according to an embodiment of the present invention;
FIG. 18 is a schematic view of a structure after exposure and development of a second photoresist layer according to an embodiment of the present invention;
FIG. 19 is a schematic structural diagram illustrating a second protective layer after etching according to an embodiment of the present invention;
FIG. 20 is a schematic diagram illustrating a second via after being formed according to an embodiment of the present invention;
FIG. 21 is a schematic structural diagram illustrating a nail recess formed in accordance with an embodiment of the present invention;
FIG. 22 is a schematic structural diagram illustrating a structure after removing the second passivation layer and the second photoresist layer according to an embodiment of the present invention;
FIG. 23 is a schematic view of a structure of the region B in FIG. 1;
FIG. 24 is a schematic view of another structure of the region B in FIG. 1;
FIG. 25 is a schematic view of another structure of the region B in FIG. 1;
FIG. 26 is a schematic view of a further structure of the area B in FIG. 1;
FIG. 27 is a schematic view of a structure of the region B in FIG. 1;
FIG. 28 is a schematic view of another structure of the region B in FIG. 1;
FIG. 29 is a schematic view of another structure of the region B in FIG. 1;
FIG. 30 is a schematic view of a further structure of the area B in FIG. 1;
FIG. 31 is a schematic view of a structure of the region B in FIG. 1;
FIG. 32 is a schematic view of another structure of the region B in FIG. 1;
fig. 33 is a schematic plan view illustrating a display device according to an embodiment of the present invention;
FIG. 34 is a schematic cross-sectional view taken along line C-C' of FIG. 27;
fig. 35 is a schematic view of another cross-sectional structure taken along line C-C' of fig. 27.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.
Fig. 1 is a schematic structural diagram of a display panel according to an embodiment of the present invention. Fig. 2 is a schematic cross-sectional view taken along a-a' in fig. 1. Referring to fig. 1 and 2, the display panel includes: the display area DA, the peripheral area PA and the through area TA are sequentially arranged from outside to inside, the peripheral area PA surrounds the through area TA, and the display area DA surrounds the peripheral area PA; further comprising: a substrate base plate 110 and a retaining wall 20 positioned at one side of the substrate base plate 110, wherein the retaining wall 20 is positioned in a peripheral area PA; a first through hole 140 is formed in the substrate base plate 110 in the through region TA, and the first through hole 140 penetrates through the substrate base plate 110; at least one first groove 120 and at least one second groove 130 are formed on the substrate base plate 110 in the peripheral area PA, and the first through hole 140 is surrounded by the first groove 120 and the second groove 130; the first groove 120 and the second groove 130 both partially penetrate through the substrate base plate 110, and the depth of the first groove 120 is greater than that of the second groove 130; at least one nail recess 120 is formed on the retaining wall 20 on a side thereof adjacent to the first through hole 140.
The through area TA is reserved as an area where the sensor module is correspondingly placed, and the substrate base plate 110 located in the area and the film layer formed on the substrate base plate 110 can be removed together to form a through hole, specifically, the first through hole 140 on the substrate base plate 110 forms a part of the through hole; the sensor module can be arranged in the through hole, or the sensor module can be arranged in a corresponding area outside the through hole in a screen-down mode; or the sensor module may also be partially disposed in the through hole, and may be disposed according to actual requirements of the display panel and the manufacturing method thereof, which are not limited in the embodiments of the present invention.
The peripheral area PA is used for routing, and the sensor module is correspondingly disposed in the through area TA, so that the sensor module has a certain requirement on light transmittance (specific requirement can be set according to the type of the sensor module, which is not limited in the embodiment of the present invention), and thus the requirement on light transmittance in the area is high. Since the traces have a certain shielding effect on the light, the traces originally passing through the TA region need to be set away from the TA region, and the traces can be set in the PA region. Specifically, the peripheral area PA may include a routing setting area PA2 and a groove setting area PA1, the groove setting area PA1 surrounds the through area TA, the routing setting area PA2 surrounds the groove setting area PA1, the first groove 120, the second groove 130 and the retaining wall 20 are all disposed in the groove setting area PA1, and the routing setting is in the routing setting area PA 2.
An array of organic light emitting units is formed in the display area DA, and the organic light emitting units are used for emitting light to display a to-be-displayed picture.
The substrate base plate 110 has supporting and protecting functions on other film layers in the display panel, and then each film layer of the display panel is formed on the substrate base plate 110. For example, the substrate 110 may be a rigid substrate or a flexible substrate; wherein, the rigid substrate can be glass, and the flexible substrate can be polyimide; alternatively, the substrate base 110 may be other types of substrate base 110 known to those skilled in the art, and the embodiment of the invention is not limited thereto.
Specifically, due to the through-hole, the organic light emitting layer 30 formed later is exposed to the air at the sidewall of the through-hole, and external water and oxygen easily intrude from the sidewall of the through-hole and spread to the portion of the organic light emitting layer 30 located in the display area DA. The first groove 120 and the second groove 130 are arranged on the substrate 110, so that when the organic light emitting layer 30 is formed subsequently, the organic light emitting layer 30 corresponding to the positions of the first groove 120 and the second groove 130 sinks into the first groove 120 and the second groove 130 due to losing support, that is, the organic light emitting layer 30 is disconnected at the positions of the first groove 120 and the second groove 130. In this way, when water and oxygen intrude from the sidewall of the through-hole and spread toward the display area DA along the organic light emitting layer 30, the transmission of water and oxygen is blocked at the corresponding positions of the a groove 120 and the b groove 130, and the water and oxygen is prevented from continuing to spread toward the display area DA.
It can be understood that, the depth of the first recess 120 is deeper, i.e. the level difference between the plane of the first bottom surface U1 of the first recess 120 and the plane of the surface of the substrate 110 facing the retaining wall 20 is higher, and when the organic light emitting layer 30 is formed subsequently, the probability that the material of the organic light emitting layer 30 continuously adheres to the sidewall of the first recess 120 is lower, i.e. the portion of the organic light emitting layer 30 located on the side of the substrate 110 facing the retaining wall 20 is less likely to be connected to the portion of the organic light emitting layer 30 recessed into the bottom of the first recess 120, where the sidewall of the first recess 120 refers to the surface of the first recess 120 except the first bottom surface U1. In other words, the organic light emitting layer 30 is less likely to be broken at the nail groove 120, and the breaking capability of the nail groove 120 is stronger. By providing at least one first recess 120 on the side of the retaining wall 20 near the first through hole 140, it is possible to ensure that the transmission path of the water oxygen is blocked at a position near the source of the water oxygen invasion. Optionally, the depth of the nail groove 120 may be greater than 6.5um and less than 11 um. In addition, the depth of the first groove 120 is deeper, so that the contact area between the subsequently formed encapsulation layer 50 and the first groove 120 is larger, and the adhesive force between the substrate base plate 110 and the encapsulation layer 50 can be further improved.
It is understood that although the cutting ability of the nail groove 120 is strong, the thickness of the substrate base plate 110 becomes thinner at the position where the nail groove 120 is formed. When a plurality of first grooves 120 are formed on the substrate base plate 110, in the peripheral region, there are more regions with a thinner thickness on the substrate base plate 110, which may increase the possibility of water oxygen invading from the surface of the side of the substrate base plate 110 departing from the retaining wall 20, and in order to prevent this problem, the present application sets the second groove 130 with a shallower depth to cooperate with the first groove 120 with a deeper depth, so as to avoid the excessive regions with a thinner thickness on the substrate base plate 110, thereby ensuring the ability of the substrate base plate 120 to block water oxygen invading from the surface of the side of the substrate base plate 110 departing from the retaining wall 20. Optionally, the depth of the second groove 130 may be greater than 0um and less than 3.5 um.
According to the display panel provided by the embodiment of the invention, the at least one first groove 120 and the at least one second groove 130 surrounding the first through hole 140 are arranged on the substrate base plate 110, so that the organic light emitting layer 30 formed on the side of the retaining wall 20 away from the substrate base plate 110 subsequently can be cut off at the position corresponding to the first groove 120 and the position corresponding to the second groove 130, and the path of water and oxygen invading into the display area DA is cut off at the position corresponding to the first groove 120 and the position corresponding to the second groove 130, thereby being beneficial to improving the water and oxygen blocking capability of the display panel. In addition, the first groove 120 with strong blocking capability is arranged on one side close to the water and oxygen invasion source, so that the possibility of blocking the organic light-emitting layer 30 at the position close to the water and oxygen invasion source is improved, and the second groove 130 with shallow depth is arranged to assist the first groove 120 with deep depth to block the organic light-emitting layer 30, so that the capability of blocking the organic light-emitting layer 30 can be improved, and the capability of preventing water and oxygen from invading the display panel from the side wall of the through hole is improved; it is also possible to prevent an excessive area of the substrate base plate 110 in the peripheral area PA, which becomes thinner due to the provision of the first recess 120, and to reduce the possibility of water oxygen intrusion from the surface of the substrate base plate 110 on the side where the first recess 120 and the second recess 130 are not provided.
It should be noted that fig. 1 only exemplarily shows that the number of the through regions TA is one, and the through regions TA are circular and located at the upper right corner of the display panel, but do not constitute a limitation on the display panel provided by the embodiment of the present invention. In other embodiments, the number, shape and arrangement of the through regions TA in the display panel may also be set according to the actual requirements of the display panel, which is not limited in the embodiments of the present invention.
Based on the above technical solution, optionally, at least one first groove 120 and/or at least one second groove 130 are located on a side of the retaining wall 20 facing away from the first through hole 140. Fig. 2 exemplarily shows that a second groove 130 is formed on the side of the retaining wall 20 away from the first through hole 140, and an a-groove 120 is formed on the side of the retaining wall 20 close to the first through hole 140.
It will be appreciated that after the organic light emitting layer 30 is prepared, it is generally necessary to prepare a thin film encapsulation layer 50 to block water and oxygen. The thin film encapsulation layer 50 generally includes at least one organic layer and at least one inorganic layer, and due to the presence of the retaining wall 20, the organic layer in the thin film encapsulation layer 50 does not spread to the region between the retaining wall 20 and the first through hole 140, and therefore, the region between the retaining wall 20 and the first through hole 140 is a single inorganic layer or a stack of multiple inorganic layers, and the inorganic layer is generally brittle and is prone to crack, and if the inorganic layer in the region between the retaining wall 20 and the first through hole 140 cracks in a subsequent process, water and oxygen can intrude into the organic light emitting layer 30 at the position of the crack from the crack, that is, the first groove 120 or the second groove 130 between the retaining wall 20 and the first through hole 140 may possibly block failure. The first groove 120 and/or the second groove 130 disposed on the side of the retaining wall 20 away from the first through hole 140 may again block the transmission path of water and oxygen, that is, the first groove 120 (or the first groove 120 and the second groove 130) located on the retaining wall 20 near the first through hole 140 and the first groove 120 and/or the second groove 130 located on the retaining wall 20 far away from the first through hole 140 may play a role of double blocking the transmission path of water and oxygen, thereby improving the ability of the display panel to block water and oxygen.
For example, if the inorganic layer between the first recess 120 and the dam 20 is broken in fig. 2, the first recess 120 is failed to block, and water and oxygen may spread toward the display area DA. However, due to the presence of the second groove 130, the second groove 130 may block a transmission path of water and oxygen entering from a crack of the inorganic layer, so that the water and oxygen cannot spread toward the display area DA.
Based on the above technical solution, with reference to fig. 2, optionally, the first recess 120 includes a first bottom surface U1 located in the substrate base plate 110 and a first opening O1 located on a side surface of the substrate base plate 110 close to the retaining wall 20, and a covered area of the first bottom surface U1 is larger than an opening area of the first opening O1. Optionally, the second groove 130 includes a second bottom surface U2 located in the substrate base plate 110 and a second opening O2 on a side surface of the substrate base plate 110 close to the retaining wall 20, and a coverage area of the second bottom surface U2 is larger than an opening area of the second opening O2; the display panel further comprises an organic light emitting layer 30, wherein the organic light emitting layer 30 is located on a side of the retaining wall 20 facing away from the substrate base plate 110, and the organic light emitting layer 30 is disconnected at the corresponding positions of the first groove 120 and the second groove 130.
The covering area of the first bottom surface U1 is larger than the opening area of the first opening O1, and the covering area of the second bottom surface U2 is larger than the opening area of the second opening O2, so that the shapes of the first groove 120 and the second groove 130 are in an inverted T shape, when the organic light emitting layer 30 is formed subsequently, the organic light emitting layer 30 corresponding to the positions of the first groove 120 and the second groove 130 is not only unsupported, but also is not easy to adhere to the side walls of the first groove 120 and the second groove 130, so that the organic light emitting layer 30 is more easily sunk into the first groove 120 and the second groove 130 to be disconnected, the separation capability of the first groove 120 and the second groove 130 is favorably improved, and the possibility that the organic light emitting layer 30 cannot be separated due to adhesion at the corresponding positions of the first groove 120 and the second groove 130 is reduced.
Illustratively, referring to fig. 2, the organic light emitting layer 30 is broken at the corresponding positions of the a-groove 120 and the b-groove 130. Therefore, after the organic light emitting layer 30 in the through area TA is subsequently removed, even if a part of the cross section of the organic light emitting layer 30 is exposed at the cross section position of the through hole, when the water and oxygen invading from the cross section are transmitted to the positions of the first groove 120 and the second groove 130, the water and oxygen can not be continuously transmitted to the display area DA because the organic light emitting layer 30 is disconnected, so that the water and oxygen are prevented from invading into the display area DA, and the water and oxygen blocking capability of the display panel is further improved.
The organic light emitting layer 30 is a film layer related to the formation of the organic light emitting unit. For example, the organic light emitting layer 30 may include a cathode, an anode, and related functional film layers such as a carrier injection layer and a carrier transport layer between the cathode and the anode, which is not limited in this embodiment of the invention.
On the basis of the technical scheme, fig. 3 is another cross-sectional structure schematic diagram along a-a' in fig. 1. Optionally, in the first direction, the base substrate 110 includes a first plastic layer 111, a barrier layer 112, a second plastic layer 113, and a buffer layer 114, which are sequentially stacked; the first groove 120 penetrates through the buffer layer 114, the second plastic layer 113 and the barrier layer 112, and a first bottom surface U1 of the first groove 120 is located in the first plastic layer 111; the second groove 130 penetrates through the buffer layer 114, and a second bottom surface U2 of the second groove 130 is positioned in the second plastic layer 113; the first direction is a direction in which the substrate 110 is vertically directed to the retaining wall 20.
In the process of patterning the substrate base plate 110, the removal rate of the second plastic layer 113 is controlled to be greater than that of the buffer layer 114, so that the area of the second opening O2 of the second groove 130 in the cross-sectional structure of the second groove 130 formed is smaller than that of the second bottom U2 of the second groove 130, and the first groove 120 is similar to the second groove and is not described again.
For example, the material of the first plastic layer 111 and the second plastic layer 113 may include at least one of polyimide, polyethylene naphthalate, polyethylene terephthalate, and polycarbonate, which is not limited in this embodiment of the present invention. Compared to the glass substrate, the first plastic layer 111 and the second plastic layer 113 have relatively poor water and oxygen blocking capability, and to improve the water and oxygen blocking capability of the substrate 110, the barrier layer 112 may be formed of an inorganic material, and for example, the material of the barrier layer 112 may include at least one of silicon oxide, silicon nitride, and amorphous silicon, which is not limited in this embodiment of the present invention. As an example, the material of the buffer layer 114 may be an inorganic material, which is not limited in this embodiment of the invention. It is understood that the buffer layer 114 may not only serve to improve flatness and block water and oxygen, but also serve as a part of the structure constituting the a-grooves and the b-grooves.
It should be noted that, by disposing the second bottom surface U2 of the second recess 130 in the second plastic layer 113, the barrier layer 112 at the position corresponding to the second recess 130 is not damaged, so as to reduce the decrease of the water and oxygen blocking capability of the substrate 110 at the position corresponding to the second recess 130, and reduce the possibility that water and oxygen intrude into the organic light emitting layer 30 from the side of the substrate 110 away from the retaining wall 20.
In the above technical solution, with reference to fig. 3, optionally, the first groove 120 includes an upper groove and a lower groove, and the upper groove is located on a side of the lower groove close to the organic light emitting layer 30; along the first direction, the upper groove and the lower groove are communicated to form a first groove 120; the upper groove includes a first opening O1 and a third opening O3 located in the base substrate 110, and the lower groove includes a first bottom surface U1 and a fourth opening O4 located in the base substrate 110; wherein the third opening O3 and the fourth opening O4 coincide; the perpendicular projection of the first opening O1 on the first plane covers the perpendicular projection of the fourth opening O4 on the first plane; the first plane is the surface of the substrate base plate 110 far from the side of the retaining wall 20.
Specifically, in the process of forming the nail groove 120, an upper groove needs to be formed first and then a lower groove needs to be formed, and in the process of forming the lower groove, the first opening O1 and the third opening O3 of the upper groove may be enlarged, so that it is easy to finally present the situation that the area of the first opening O1 is larger than the area of the fourth opening O4, that is, the difficulty of the structure process of the nail groove 120 shown in fig. 3 is small.
It should be noted that, in the above technical solution, the formation manner of the first groove 120 and the second groove 130 may be laser etching, physical etching, chemical etching, or other patterning manners known in the art, and the embodiment of the present invention does not limit this.
On the basis of the above technical solution, with continuing reference to fig. 3, optionally, the first through hole 140 is adjacent to the nail groove 120.
Exemplarily, fig. 4 is a schematic structural diagram of a structure in which the second groove fails to block the organic light emitting layer according to an embodiment of the present invention. Referring to fig. 4, since the depth of the second recess 130 is shallow, i.e. the step difference between the plane of the second bottom surface U2 of the second recess 130 and the plane of the surface of the substrate 110 facing the retaining wall 20 is small, in the actual production preparation, due to the process fluctuation, the organic light emitting layer 30 may continuously adhere to the sidewall of the second recess 130, so that the portion of the organic light emitting layer 30 located on the side of the substrate 110 facing the retaining wall 20 is connected to the portion of the organic light emitting layer 30 recessed into the bottom of the second recess 130, i.e. the organic light emitting layer 30 cannot be disconnected at the position of the second recess 120. The sidewall of the b-groove 120 described herein refers to a surface of the b-groove 130 excluding the second bottom surface U2. Therefore, compared with the situation that the first through hole 140 is adjacent to the second groove 130, the arrangement of the first through hole 140 adjacent to the first groove 120 can ensure that the transmission path of water and oxygen is blocked at the source of water and oxygen invasion, and is beneficial to improving the water and oxygen blocking capacity of the display panel.
Specifically, the number of the first grooves 120, the number of the second grooves 130, and the arrangement of the first grooves 120 and the second grooves 130 between the first through holes 140 and the retaining wall 20 are various, and are not limited herein.
On the basis of the above technical solution, fig. 5 is a schematic view of another cross-sectional structure along a-a' in fig. 1. Optionally, at least two second grooves 130 are formed on the substrate base plate 110; two of the second grooves 130 are disposed on two sides of the retaining wall 20 and adjacent to the retaining wall 20.
Specifically, when the organic light emitting layer 30 is prepared, in the direction perpendicular to the substrate base plate 110, at the position of the retaining wall 20, the plane of the surface of the organic light emitting layer 30 on the side away from the substrate base plate 110 is S1, the vertical step difference between S1 and the second bottom surface U2 of the second groove 130 is H1, and the vertical step difference between S1 and the first bottom surface U1 of the first groove 120 is H2, and obviously, since the depth of the first groove 120 is greater than that of the second groove 130, H2 is greater than H1. Therefore, when a thin film encapsulation layer is subsequently formed on the side of the organic light emitting layer 30 away from the substrate 110, compared with the case where the first groove 120 is adjacent to the retaining wall 20, the thin film encapsulation layer needs to extend by the height H2 (from the top of the retaining wall 20 to the first bottom U1 of the first groove 120), the second groove 130 is adjacent to the retaining wall 20 in fig. 5, so that the thin film encapsulation layer only needs to extend by the height H1 (from the top of the retaining wall 20 to the second bottom U2 of the second groove 130), that is, the height that the thin film encapsulation layer needs to extend when the retaining wall 20 is adjacent to the second groove 130 is relatively low, the thin film encapsulation layer is relatively not prone to fracture, which is beneficial to reducing the probability of thin film encapsulation failure.
Based on the above technical solution, with continuing reference to fig. 5, alternatively, in the radial direction, on the side of the retaining wall 20 away from the first through hole 140, the distance between the first groove 120 or the second groove 130 adjacent to the retaining wall 20 and the retaining wall 20 is D1; on the side of the retaining wall 20 close to the first through hole 140, the distance between the first groove 120 or the second groove 130 adjacent to the retaining wall 20 and the retaining wall 20 is D2.
Wherein D1 is more than or equal to 12um and less than or equal to 34um, and D2 is more than or equal to 12um and less than or equal to 34 um; the radial direction is a direction in which the center of the through region TA points to any point on the boundary of the through region TA.
It should be noted that the first groove 120 and the second groove 130 are not disposed at a position that is less than 12um away from the retaining wall 20, so that the height at which the film encapsulation layer 50 needs to be spread is relatively low at the position of the retaining wall 20, and the film encapsulation layer is relatively not prone to fracture, which is beneficial to reducing the probability of film encapsulation failure and improving the encapsulation quality of the film encapsulation layer.
On the basis of the above technical solution, fig. 6 is a schematic view of another cross-sectional structure along a-a' in fig. 1. Optionally, a plurality of a grooves 120 and a plurality of b grooves 130 are formed on the substrate base plate 110; the a plurality of grooves 120 includes one first a groove 121, and the b plurality of grooves 130 includes two first b grooves 131; the first A groove 121 is adjacent to the first through hole 140, and the two first B grooves 131 are respectively disposed on two sides of the retaining wall 20 and adjacent to the retaining wall 20.
It should be noted that, by arranging the retaining wall 20 adjacent to the first second groove 131, the subsequently prepared film encapsulation layer is relatively not easy to break, which is beneficial to reducing the probability of film encapsulation failure and improving the encapsulation quality of the film encapsulation layer. In addition, the first through hole 140 is arranged adjacent to the first groove 120, so that the transmission path of water and oxygen can be cut off at the source of water vapor invasion.
With continued reference to fig. 6, optionally, the first plurality of recesses 120 further includes a second plurality of recesses 122, the second plurality of recesses 122 being located between the first recess 121 and the first second recess 131 located on the side of the retaining wall 20 adjacent to the first through hole 140.
It should be noted that, by providing the second recess 122 with a stronger partition capability between the first recess 121 and the first second recess 131 located on the side of the retaining wall 20 close to the first through hole 140, the overall partition capability of the display panel can be improved.
On the basis of the above technical solution, fig. 7 is a schematic sectional structure along a-a' in fig. 1. Optionally, the second grooves 130 further include a plurality of second grooves 132, and the second grooves 132 are located between the first grooves 121 and the first second grooves 131 located on the side of the retaining wall 20 close to the first through holes 140.
It should be noted that, the second concave groove 132 with a shallower depth is disposed between the first concave groove 121 and the first concave groove 131 located on the side of the retaining wall 20 close to the first through hole 140, that is, the second concave groove 131 with a shallower depth is disposed to assist the first concave groove 121 with a deeper depth to block the organic light emitting layer 30, which can improve the capability of blocking the organic light emitting layer 30, and further improve the capability of preventing water and oxygen from invading the display panel from the sidewall of the through hole; and the area of the substrate base plate 110 in the peripheral area PA, which becomes thinner due to the arrangement of the nail recess 120, can be prevented from being too much, thereby reducing the possibility of the water oxygen invading from the surface of the substrate base plate 110 on the side away from the retaining wall 20.
On the basis of the above technical solution, fig. 8 is another schematic sectional structure along a-a' in fig. 1. Optionally, the first plurality of grooves 120 further includes a second plurality of grooves 122, and the second plurality of grooves 130 further includes a second plurality of grooves 132; the second grooves 122 and the second grooves 132 are alternately arranged between the first grooves 121 and the first second grooves 131 on the side of the retaining wall 20 close to the first through hole 140.
It should be noted that, by disposing the second grooves 122 and the second grooves 132 alternately between the first grooves 121 and the first second grooves 131 on the side of the retaining wall 20 close to the first through hole 140, compared with the display panel shown in fig. 6, the possibility that water and oxygen enter the display panel from the side of the substrate 110 away from the retaining wall 20 can be reduced, and the water and oxygen blocking capability of the substrate 110 in the peripheral area PA can be improved; compared to the display panel shown in fig. 7, the blocking capability of the organic light emitting layer 30 can be improved, and the capability of preventing water and oxygen from entering the display panel from the side wall of the through hole can be further improved.
On the basis of the above technical solution, fig. 9 is a schematic view of another cross-sectional structure along a-a' in fig. 1. Referring to fig. 9, the display panel optionally further includes a driving circuit layer 40 between the base substrate 110 and the organic light emitting layer 30; wherein, in the area where the first groove 120 is located, a second through hole 410 is formed on the driving circuit layer 40, and the first groove 120 is communicated with the second through hole 410; in the area where the second groove 130 is located, a third through hole 420 is formed on the driving circuit layer 40, and the second groove 130 is communicated with the third through hole 420.
The driving circuit layer 40 may include functional film layers related to pixel driving circuits in the display panel, and the pixel driving circuits may include thin film transistors, storage capacitors, and other circuit elements known to those skilled in the art.
For example, in the case of a tft as a top gate structure, the driving circuit layer 40 may include an active layer, a gate insulating layer, a gate layer, an interlayer dielectric layer, a source/drain layer, a planarization layer, a layer where a pixel electrode is located, a pixel defining layer, a supporting pillar, and other layers known to those skilled in the art; when the tft has other structures, the driving circuit layer 40 may be changed to include other functional film layers related to the driving circuit known to those skilled in the art, and the functional film layers may be configured according to the actual requirements of the manufacturing method of the display panel, which is not limited in the embodiment of the invention.
It should be noted that, the second through hole 410 is communicated with the first groove 120, so that the falling height of the organic light emitting layer 30 can be increased, the organic light emitting layer 30 is more easily blocked at the position of the first groove 120, and the third through hole 420 is communicated with the second groove 130 in the same way. It can be seen that the second through hole 410 and the third through hole 420 are arranged on the driving circuit layer 40, the second through hole 410 is communicated with the first groove 120, and the third through hole 420 is communicated with the second groove 130, which is beneficial to reducing the possibility that the organic light emitting function layer cannot be blocked at the positions of the first groove 120 and the second groove 130, and improving the water and oxygen blocking capability of the display panel.
It should be noted that there are various methods for preparing the first recess 120 and the second recess 130, and a typical method for preparing the first recess 120 and the second recess 130 is described below, but the method for preparing the first recess 120 and the second recess 130 is not limited in the present application. Illustratively, fig. 10 is a flow chart of forming a second groove and a first groove according to an embodiment of the present invention. Referring to fig. 10, the method of preparing the second groove 130 and the first groove 120 is as follows:
s110, forming a first protective layer and a first photoresist layer on one side of the substrate.
For example, fig. 11 is a schematic structural diagram after a first protective layer and a first photoresist layer are formed on one side of a substrate according to an embodiment of the present invention. Referring to fig. 11, after forming the driving circuit layer 40 on one side of the base substrate, the first protective layer 71 and the first photoresist layer 81 are formed on one side of the driving circuit layer 40 facing away from the base substrate 110. Wherein, the retaining wall 20 is formed by two parts, one part of the retaining wall 20 and the pixel defining layer in the driving circuit layer 40 are made of the same material and formed by the same process, and the other part of the retaining wall 20 and the supporting pillar in the driving circuit layer 40 are made of the same material and formed by the same process, so that when the driving circuit layer 40 is prepared, the retaining wall 20 is also prepared at the same time.
And S120, exposing and developing the first photoresist layer.
Specifically, the first photoresist layer 81 is exposed and developed to pattern the first photoresist layer 81. For example, fig. 12 is a schematic structural diagram of the first photoresist layer after exposure and development according to the embodiment of the present invention, referring to fig. 12, the first photoresist layer 81 directly above the position where the second groove 130 needs to be disposed in the base substrate 110 is removed, and the first photoresist layer 81 directly above the position where the second groove 130 does not need to be disposed on the base substrate 110 is remained.
S130, etching the first protective layer.
Specifically, the first protection layer 71 may be etched by wet etching to transfer the pattern on the first photoresist layer 81 to the first protection layer 71. For example, fig. 13 is a schematic structural diagram after the first protection layer is etched according to an embodiment of the present invention, and optionally, the material of the first protection layer 71 may include indium zinc oxide. It should be noted that, in the subsequent process of etching the driving circuit layer 40 and the substrate 110, the first photoresist layer 81 may collapse, that is, the pattern on the first photoresist layer 81 may deform, so that the positions on the driving circuit layer 40 and the substrate 110 that should not be etched are etched away, that is, the etching positions on the driving circuit layer 40 and the substrate 110 are deviated. In the present application, the first protection layer 71 may continue to protect the driving circuit layer 40 and the substrate base 110 at positions that should not be etched after the first photoresist layer 81 is collapsed, so as to achieve precise etching of the driving circuit layer 40 and the substrate base 110.
And S140, etching the driving circuit layer to form a third through hole.
Specifically, the driving circuit layer 40 may be etched by dry etching to form the third via 420. Illustratively, fig. 14 is a schematic structural diagram after a third through hole is formed according to an embodiment of the present invention.
S150, etching the substrate base plate to form a second groove.
Specifically, the substrate base plate 110 may be etched by dry etching to form the second groove 130. Illustratively, fig. 15 is a schematic structural diagram after forming the second groove according to an embodiment of the present invention. It can be understood that, since the lateral etching speed of the buffer layer 114 is less than that of the second plastic layer 113, the width of the b-groove 130 formed at the buffer layer 114 is less than that of the b-groove 130 at the second plastic layer 113.
And S160, removing the first protective layer and the first photoresist layer.
Specifically, after the preparation of the second groove 130 is completed, the first protection layer 71 and the first photoresist layer 81 need to be removed to prepare for the subsequent preparation of the first groove 120. Illustratively, fig. 16 is a schematic structural diagram of a structure after removing the first protective layer and the first photoresist layer according to an embodiment of the present invention.
And S170, forming a second protective layer and a second photoresist layer on one side of the substrate base plate.
Exemplarily, fig. 17 is a schematic structural diagram after a second protective layer and a second photoresist layer are formed on one side of the substrate according to an embodiment of the present invention.
And S180, exposing and developing the second photoresist layer.
Specifically, the second photoresist layer 82 can be patterned by exposing and developing the second photoresist layer 82. For example, fig. 18 is a schematic structural diagram of the second photoresist layer 82 after exposure and development according to the embodiment of the present invention, referring to fig. 18, the second photoresist layer 82 directly above the position where the first recess 120 needs to be disposed on the substrate 110 is removed, and the second photoresist layer 82 directly above the position where the first recess 120 does not need to be disposed on the substrate 110 is remained.
And S190, etching the second protective layer.
Specifically, the second protection layer 72 may be etched by wet etching to transfer the pattern on the second photoresist layer 82 to the second protection layer 72. For example, fig. 19 is a schematic structural diagram after the second protection layer is etched according to an embodiment of the present invention, and optionally, the material of the second protection layer 72 may include indium zinc oxide. The function of the second passivation layer 72 is similar to that of the first passivation layer 71, and will not be described in detail here.
S210, etching the driving circuit layer to form a second through hole.
Specifically, the driving circuit layer 40 may be etched by dry etching to form the second via 410. For example, fig. 20 is a schematic structural diagram after forming the second through hole according to an embodiment of the present invention.
S220, etching the substrate base plate to form an A groove.
Specifically, the substrate 110 may be etched by dry etching to form the first recess 120. Exemplarily, fig. 21 is a schematic structural diagram after nail groove formation according to an embodiment of the present invention. It is understood that the lateral etching speed of the buffer layer 114 is less than that of the second plastic layer 113, and thus, the width of the nail groove 120 formed at the buffer layer 114 is less than that of the nail groove 120 at the second plastic layer 113. Similarly, the lateral etching speed of the barrier layer 112 is less than that of the first plastic layer 111, and thus, the width of the first recess 120 formed at the barrier layer 112 is less than that of the first recess 120 at the first plastic layer 111. In addition, in the process of forming the first recess 120, the upper portion of the base substrate 110 may be exposed to the etching atmosphere for a longer time than the lower portion of the base substrate 110. Accordingly, the width of the nail groove 120 may be reduced from the upper portion of the substrate base 110 to the lower portion of the substrate base 110. For example, the width of the nail groove 120 at the buffer layer 114 may be greater than the width of the nail groove 120 at the barrier layer 112. Further, the width of the first recess 120 at the second plastic layer 113 may be greater than the width of the first recess 120 at the first plastic layer 111.
And S230, removing the second protective layer and the second photoresist layer.
Illustratively, fig. 22 is a schematic structural diagram of a structure after removing the second protective layer and the second photoresist layer according to an embodiment of the present invention. Thus, the preparation of the first groove 120 and the second groove 130 is completed.
On the basis of the above technical solution, fig. 23 is a schematic structural diagram of a region B in fig. 1. Referring to fig. 23, optionally, the first recess 120 is a continuous recess structure disposed around the first through-hole 140; the second groove 130 is a continuous groove structure disposed around the first through hole 140.
It is understood that the first grooves 120 are a continuous groove structure, so that each first groove 120 can independently complete the partition of the organic light emitting layer 30 once, and the second grooves 130 are a continuous groove structure. The advantage of such an arrangement is that, compared with the case that the first groove 120 and/or the second groove 130 are discontinuous groove structures, each first groove 120 and/or the second groove 130 cannot independently complete the partition of the organic light emitting layer 30 once, which is beneficial to improving the partition times of the first groove 120 and the second groove 130 on the organic light emitting layer 30, and further improving the ability of the display panel to block water and oxygen.
It should be noted that fig. 23 only shows that the outline shapes of the first groove 120 and the second groove 130 are circular rings, and accordingly, the mask used for forming the first groove 120 and the second groove 130 has circular ring-shaped openings, but the display panel in the embodiment of the present application is not limited thereto. In other embodiments, the first and second grooves 120 and 130 may also be provided with a rectangular or elliptical outline shape, and accordingly, a mask plate used in forming the first and second grooves 120 and 130 may have a rectangular or elliptical annular opening. The outline shapes of the first groove 120 and the second groove 130 are not limited herein, and those skilled in the art can set the outline shapes according to the actual requirements of the display panel.
On the basis of the above technical solution, fig. 24 is another schematic structural diagram of the region B in fig. 1. Referring to fig. 24, optionally, the first recess 120 includes a plurality of first sub-recesses 1211 disposed at intervals, the plurality of first sub-recesses 1211 being disposed around the first through hole 140; the second groove 130 is a continuous groove structure disposed around the first through hole 140.
Specifically, the second groove 130 is a continuous groove structure, so that each second groove 130 can independently complete one-time partition of the organic light emitting layer 30. The first grooves 120 include a plurality of first sub-grooves 1211 arranged at intervals, so that the organic light emitting layer 30 is blocked at the corresponding positions of the first sub-grooves 1211, and the area between two adjacent first sub-grooves 1211 is not blocked, that is, the single first groove 120 cannot cut off the water and oxygen invasion path, however, the first grooves 120 are arranged such that the water and oxygen can spread towards the display area DA by bypassing the first sub-grooves 1211, that is, the arrangement of the first grooves 120 can prolong the transmission path of the water and oxygen after invading from the sidewall of the through area TA to spread towards the display area DA, and alleviate the problem of the water and oxygen spreading towards the display area DA.
On the basis of the above technical solution, fig. 25 is a schematic view of another structure of the region B in fig. 1. Referring to fig. 25, alternatively, the first recess 120 is a continuous recess structure disposed around the first through-hole 140; the second groove 130 includes a plurality of second sub-grooves 1311 disposed at intervals, and the plurality of second sub-grooves 1311 are disposed around the first through hole 140.
Specifically, the first grooves 120 are continuous grooves, so that each first groove 120 can independently complete the partition of the organic light emitting layer 30. The second recess 130 includes a plurality of second sub-recesses 1311 disposed at intervals, so that the organic light emitting layer 30 is blocked at a position corresponding to the second sub-recesses 1311, and an area between two adjacent second sub-recesses 1311 is not blocked, that is, a single second recess 130 cannot cut off a water and oxygen invasion path, however, the second recess 130 is disposed such that water and oxygen can spread toward the display area DA by bypassing the second sub-recesses 1311, that is, the second recess 130 is disposed such that a transmission path of water and oxygen after invading from a sidewall of the through area TA toward the display area is extended, and a problem of water and oxygen spreading toward the display area DA is alleviated.
With continued reference to fig. 24 and fig. 25, this configuration is advantageous in reducing the area occupied by the first groove 120 (the second groove 130), i.e., reducing the ratio of the thinned portion of the substrate 110 in the peripheral area PA to the peripheral area PA, improving the ability of the substrate 110 in the peripheral area PA to block water and oxygen, reducing the possibility of water and oxygen invading the display panel from the side of the substrate 110 away from the retaining wall 20, and further improving the ability of the display panel to block water and oxygen, compared to the case where each circle of the first groove 120 and each circle of the second groove 130 are in a continuous groove structure.
On the basis of the above technical solution, fig. 26 is a schematic structural view of a region B in fig. 1. Referring to fig. 26, optionally, the first recess 120 includes a plurality of first sub-recesses 1211 disposed at intervals, the plurality of first sub-recesses 1211 being disposed around the first through hole 140; the second groove 130 includes a plurality of second sub-grooves 1311 arranged at intervals, and the plurality of second sub-grooves 1311 are arranged around the first through hole 140; a perpendicular projection of each first sub-groove 1211 on a plane where the substrate base plate 110 is located is a first projection area, and an area between two adjacent first projection areas is a spacing area IA; the vertical projection of each second sub-groove 1311 on the plane of the substrate base plate 110 is a second projection area; in the radial direction, the second projection area covers at least the spacing area IA, wherein the radial direction is a direction in which the center of the through area TA points to any point on the boundary of the through area TA.
Here, in the radial direction, the second projection area at least covers the spacing area IA means that there is a predetermined plane, which is perpendicular to the radial direction, and the perpendicular projection of the second projection area on the predetermined plane covers the perpendicular projection of the spacing area IA on the predetermined plane.
Specifically, the first sub-grooves 1211 are spaced apart from each other, and the organic light emitting layer 30 is blocked at a position corresponding to the first sub-groove 1211, but the region between two adjacent first sub-grooves 1211 is not blocked, that is, a single first sub-groove 120 cannot cut off the water and oxygen invasion path, and similarly, a single second sub-groove 130 cannot cut off the water and oxygen invasion path. However, the arrangement of the first and second grooves 120 and 130 makes it necessary for water and oxygen to bypass the first and second sub-grooves 1211 and 1311 to spread toward the display area DA, that is, the arrangement of the first and second grooves 120 and 130 may extend a transmission path of water and oxygen, thereby alleviating the problem of water and oxygen spreading toward the display area DA. It is understood that the greater the number of the first and second grooves 120 and 120, the more advantageous the transmission path of the water oxygen invading from the sidewall of the through region TA to the display region is, i.e., the stronger the ability of blocking the water oxygen invading from the sidewall of the through region TA from spreading to the display region DA.
The advantage of setting up like this is that, compare in the case that every circle first recess 120 and/or every circle second recess 130 is continuous groove structure, be favorable to further reducing the area that first recess 120 and second recess 130 occupy, be favorable to further reducing substrate 110 in peripheral region PA by the proportion that the position accounted for peripheral region PA by the attenuate, be favorable to further improving the ability of substrate 110 separation water oxygen at peripheral region PA, reduce the possibility that water oxygen from substrate 110 deviates from barricade 20 one side and invade the display panel, and then improve the ability of display panel separation water oxygen.
It should be noted that fig. 24-26 only exemplarily show that the first sub-groove 1211 and the second sub-groove 1311 have circular arc-shaped outlines, and accordingly, a mask used for forming the first sub-groove 1211 and the second sub-groove 1311 has a circular arc-shaped opening, but the display panel in the embodiment of the present application is not limited thereto. In other embodiments, the first sub-groove 1211 and the second sub-groove 1311 may have a rectangular, wavy or zigzag contour shape, and accordingly, a mask used to form the first sub-groove 1211 and the second sub-groove 1311 may have a rectangular, wavy or zigzag opening, and the first sub-groove 1211 and the second sub-groove 1311 may have the same or different contour shapes. For example, fig. 27 is a schematic structural diagram of a region B in fig. 1, in which the outline shape of the first sub-groove 1211 is a rectangle, and the outline shape of the second sub-groove 1311 is a broken line. Illustratively, fig. 28 is another schematic structural diagram of the area B in fig. 1, wherein the contour of the first sub-groove 1211 is a zigzag line, and the contour of the second sub-groove 1311 is a wave. For example, fig. 29 is a schematic view of another structure in the area B in fig. 1, in which the contour of the first sub-groove 1211 is a circular arc, and the contour of the second sub-groove 1311 is a broken line. For example, fig. 30 is a schematic view of another structure in the area B of fig. 1, in which the contour of the first sub-groove 1211 is a broken line shape, and the contour of the second sub-groove 1311 is a circular arc shape. Illustratively, fig. 31 is a schematic diagram of a structure in a region B of fig. 1, wherein the contour of the first sub-groove 1211 is in a wave shape, and the contour of the second sub-groove 1311 is in a circular arc shape. Illustratively, fig. 32 is another schematic structural diagram of the area B in fig. 1, wherein the contour of the first sub-groove 1211 is a circular arc, and the contour of the second sub-groove 1311 is a wave. The outline shapes of the first sub-groove 1211 and the second sub-groove 1311 are not limited herein, and may be set by those skilled in the art according to actual requirements of the display panel.
It should be noted that fig. 23-32 only show an example, the peripheral area PA includes one first groove 120 and one second groove 130, but the present application is not limited thereto, and a person skilled in the art may set the number of the first grooves 120 and the second grooves 130 according to practical situations.
On the basis of the above technical solution, with continuing reference to fig. 2, fig. 3, and fig. 5 to fig. 9, optionally, the display panel further includes a thin film encapsulation layer 50, where the thin film encapsulation layer 50 includes at least one organic layer and at least one inorganic layer; the thin film encapsulation layer 50 covers the recess on the side of the retaining wall 20 away from the TA, the recess on the side of the retaining wall 20 away from the TA includes an a recess 120 and/or an b recess 130, at least one inorganic layer covers the recess on the side of the retaining wall 20 close to the TA, and the recess on the side of the retaining wall 20 close to the TA includes the a recess 120 and/or the b recess 130.
Specifically, the thin film encapsulation layer 50 covers all the grooves located on the side of the retaining wall 20 away from the through region TA, no matter whether the groove is the first groove 120 or the second groove 130; at least one inorganic layer covers all the grooves on the side of the retaining wall 20 close to the through region TA, whether the groove is the a groove 120 or the b groove 130. Thus, the film encapsulation layer 50 can completely cover the bottom and the side walls of the first groove 120 and the second groove 130, and prevent the side walls of the first groove 120 and the second groove 130 from being exposed in the air, thereby preventing external water and oxygen from invading from the side walls of the first groove 120 and the second groove 130 and spreading into the display area DA.
When the thin film encapsulation layer 50 is subsequently thin film encapsulated, the thin film encapsulation layer 50 usually includes at least one organic layer and at least one inorganic layer, and the retaining wall 20 can block the organic layer and the inorganic layer to prevent the increase of the frame size of the display panel caused by the extension effect of the organic layer. For example, the retaining wall 20 may include a first portion and a second portion stacked in a direction perpendicular to the substrate 110, the first portion is disposed on the same layer and made of the same material as the pixel defining layer in the display panel, and the second portion is disposed on the same layer and made of the same material as the supporting pillars in the display panel, or the retaining wall 20 may be of other structures known to those skilled in the art, which is not limited by the embodiment of the present invention.
For example, the material of the inorganic layer may be aluminum oxide, silicon nitride, silicon oxynitride, silicon carbide, titanium oxide, zirconium oxide, or zinc oxide, or other inorganic materials known to those skilled in the art, which is not limited by the embodiment of the present invention. The material of the organic layer may be polyimide, polyethylene terephthalate, polycarbonate, polyethylene, or polyacrylate, or other organic materials known to those skilled in the art, and the embodiment of the present invention is not limited thereto.
Optionally, the thin film encapsulation layer 50 may also cover the display area DA, which is advantageous in that the encapsulation of the display area DA and the encapsulation of the peripheral area PA can be completed simultaneously, thereby reducing encapsulation processes and improving encapsulation efficiency.
It should be noted that fig. 2, fig. 3, and fig. 5 to fig. 9 only exemplarily show that the thin film encapsulation layer 50 includes the first inorganic layer 510, the first organic layer 520, and the second inorganic layer 530, and the first inorganic layer 510 and the third inorganic layer 530 cover the first groove 120 and the second groove 130 located at the retaining wall 20 near the through region TA, but the structure of the display panel in the embodiment of the present invention is not limited and can be set according to actual requirements.
On the basis of the above technical solution, with reference to fig. 9, optionally, the display panel further includes a planarization layer 60, where the planarization layer 60 is located on a surface of the thin film encapsulation layer 50 on a side away from the substrate 110 and is located in the peripheral area PA; the surface of the planarization layer 60 on the side away from the base substrate 110 is flush with the surface of the thin film package on the display area DA on the side away from the base substrate 110.
Specifically, the material of the planarization layer 60 may be polyimide, polyethylene terephthalate, polycarbonate, polyethylene, or polyacrylate, or other organic materials known to those skilled in the art, and the embodiment of the invention is not limited thereto. This arrangement has an advantage of facilitating the planarization of the display panel.
On the basis of the above technical solution, optionally, the cross-sectional shapes of the first groove 120 and the second groove 130 include at least one of a rectangle, an inverted trapezoid, and an arc. Preferably, the cross-sectional shapes of the first groove 120 and the second groove 130 are inverted trapezoids and circular arcs, which is beneficial to realizing that the area of the first opening O1 of the first groove 120 is smaller than the area of the first bottom surface U1 of the first groove 120, thereby improving the partition capability of the first groove 120, and the second groove 130 is the same and is not repeated.
Based on the above inventive concept, embodiments of the present invention further provide a display device, which includes any one of the display panels described above, so that the display device has corresponding functions and advantages. The same can be understood by reference to the above description, which is not repeated hereinafter.
For example, fig. 33 is a schematic plan view of a display device according to an embodiment of the present invention. Referring to fig. 33, the display device may include a display panel and further include a sensor module 710.
For example, the sensor module 710 may include one or more of a camera module, a light sensor, and an ultrasonic distance sensor.
Illustratively, FIG. 34 is a cross-sectional view taken along line C-C' of FIG. 33. Referring to fig. 26, the sensor module 710 is disposed in the through hole. So set up, be favorable to improving the intensity of the external environment signal that sensor module 710 received to be favorable to improving sensor module 710's detection accuracy and sensitivity.
Illustratively, FIG. 35 is a schematic view of another cross-sectional configuration taken along line C-C' of FIG. 33. Referring to fig. 35, the sensor module 710 is disposed at a position corresponding to the through hole of the display panel. With such an arrangement, it is beneficial to reduce interference between signals of the sensor module 710 and the display panel, thereby being beneficial to ensuring picture display quality of the display panel, and simultaneously being beneficial to ensuring that the sensor module 710 has higher detection accuracy and sensitivity.
In other embodiments, the sensor module 710 may also be partially disposed in the through hole, which is not limited in this embodiment of the present invention.
Illustratively, the display device is a mobile phone or a tablet, when the sensor module 710 is a camera module, the through hole corresponds to an area where a front camera of the mobile phone or the tablet is located, and the through hole can allow incident light to enter the front camera and is used for the front camera to acquire an external image; and when the sensor module 710 is a light sensor, the light sensor may be a light sensor for sensing external light and adjusting the brightness of the display device, or a light sensor for sensing whether a fingerprint exists outside, so as to perform fingerprint identification.
For example, the display device may be a mobile phone, a tablet computer, a smart wearable device (e.g., a smart watch), and other types of display devices known to those skilled in the art, and the embodiments of the present invention are not limited thereto.
It is to be noted that the foregoing is only illustrative of the preferred embodiments of the present invention and the technical principles employed. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail by the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present invention, and the scope of the present invention is determined by the scope of the appended claims.

Claims (18)

1. A display panel, comprising: the display area, the peripheral area and the through area are sequentially arranged from outside to inside, the peripheral area surrounds the through area, and the display area surrounds the peripheral area; the display panel further includes:
the substrate comprises a substrate base plate and a retaining wall positioned on one side of the substrate base plate, wherein the retaining wall is positioned in the peripheral area;
a first through hole is formed in the substrate base plate in the penetrating region and penetrates through the substrate base plate; at least one first groove and at least one second groove are formed on the substrate base plate located in the peripheral area, and the first groove and the second groove surround the first through hole; the first groove and the second groove partially penetrate through the substrate base plate, and the depth of the first groove is larger than that of the second groove; at least one first recess is located the barricade is close to one side of first through-hole.
2. The display panel according to claim 1, wherein the first recess includes a first bottom surface in the substrate base and a first opening on a side surface of the substrate base adjacent to the retaining wall, and a coverage area of the first bottom surface is larger than an opening area of the first opening;
the second groove comprises a second bottom surface positioned in the substrate base plate and a second opening on one side surface of the substrate base plate close to the retaining wall, and the coverage area of the second bottom surface is larger than the opening area of the second opening;
the display panel further comprises an organic light emitting layer, the organic light emitting layer is located on one side, deviating from the retaining wall, of the substrate base plate, and the organic light emitting layer is disconnected at the corresponding positions of the first groove and the second groove.
3. The display panel according to claim 1, wherein the base substrate includes a first plastic layer, a barrier layer, a second plastic layer, and a buffer layer, which are sequentially stacked in a first direction;
the first groove penetrates through the buffer layer, the second plastic layer and the barrier layer, and a first bottom surface of the first groove is located in the first plastic layer;
the second groove penetrates through the buffer layer, and a second bottom surface of the second groove is located in the second plastic layer;
the first direction is the direction in which the substrate base plate points to the retaining wall vertically.
4. The display panel according to claim 1, wherein the substrate base plate has at least two second grooves formed thereon; two of at least two second grooves the second groove is separately arranged on two sides of the retaining wall and is adjacent to the retaining wall.
5. The display panel of claim 1, wherein the first via is adjacent to the first recess.
6. The display panel according to claim 1, wherein a plurality of a grooves and a plurality of b grooves are formed on the base substrate; the first grooves comprise a first groove A, and the second grooves comprise two first second grooves;
first recess with first through-hole is adjacent, two first second recess branch is located the barricade both sides, and with the barricade is adjacent.
7. The display panel according to claim 6, wherein the first recesses further comprise second recesses, and the second recesses are located between the first recesses and the first second recesses located on the side of the retaining walls close to the first through holes.
8. The display panel according to claim 6, wherein the plurality of second grooves further comprises a plurality of second grooves, and the second grooves are located between the first grooves and the first second grooves on the side of the retaining walls close to the first through holes.
9. The display panel according to claim 6, wherein the first grooves further comprise a second plurality of grooves, and the second grooves further comprise a second plurality of grooves;
the second grooves and the second grooves are alternately arranged between the first grooves and the first grooves on the side, close to the first through hole, of the retaining wall.
10. The display panel according to claim 1, wherein the first groove is a continuous groove structure provided around the first through hole;
the second groove is a continuous groove structure arranged around the first through hole.
11. The display panel according to claim 1, wherein the first groove comprises a plurality of first sub-grooves arranged at intervals, and the plurality of first sub-grooves are arranged around the first through hole; the second groove comprises a plurality of second sub-grooves arranged at intervals, and the second sub-grooves are arranged around the first through hole;
the vertical projection of each first sub-groove on the plane of the substrate base plate is a first projection area, and an area between two adjacent first projection areas is a spacing area; the vertical projection of each second sub-groove on the plane of the substrate base plate is a second projection area;
and in the radial direction, the second projection area at least covers the interval area, wherein the radial direction is a direction in which the center of the penetration area points to any point on the boundary of the penetration area.
12. The display panel according to claim 1, wherein in the radial direction, on a side of the retaining wall facing away from the first through hole, a distance between the first groove or the second groove adjacent to the retaining wall and the retaining wall is D1; on one side of the retaining wall close to the first through hole, the distance between the first groove or the second groove adjacent to the retaining wall and the retaining wall is D2;
wherein D1 is more than or equal to 12um and less than or equal to 34um, and D2 is more than or equal to 12um and less than or equal to 34 um; the radial direction is a direction in which the center of the penetration region points to any point on the boundary of the penetration region.
13. The display panel according to claim 2, further comprising a driving circuit layer between the base substrate and the organic light emitting layer;
a second through hole is formed in the driving circuit layer in the area where the first groove is located, and the first groove is communicated with the second through hole; and a third through hole is formed in the area where the second groove is located on the driving circuit layer, and the second groove is communicated with the third through hole.
14. The display panel of claim 1, further comprising a thin film encapsulation layer comprising at least one organic layer and at least one inorganic layer;
the thin film packaging layer covers and is located the barricade is kept away from run through the recess of district one side, be located the barricade is kept away from run through the recess of district one side include first recess and/or second recess, at least one deck the inorganic layer covers and is located the barricade is close to run through the recess of district one side, be located the barricade is close to run through the recess of district one side include first recess and/or second recess.
15. The display panel according to claim 14, further comprising a planarization layer on a surface of the thin film encapsulation layer on a side away from the substrate base plate and in the peripheral region;
the surface of one side, away from the substrate base plate, of the planarization layer is flush with the surface of one side, away from the substrate base plate, of the thin film package in the display area.
16. The display panel according to claim 2, wherein the first groove comprises an upper groove and a lower groove, and the upper groove is positioned on one side of the lower groove close to the retaining wall; along a first direction, the upper groove and the lower groove are communicated to form the first groove;
the upper groove comprises the first opening and a third opening located in the substrate base plate, and the lower groove comprises the first bottom surface and a fourth opening located in the substrate base plate; wherein the third opening and the fourth opening coincide; the vertical projection of the first opening on a first plane covers the vertical projection of the fourth opening on the first plane; the first plane is the surface of one side of the substrate base plate, which is far away from the retaining wall.
17. The display panel according to claim 1, wherein the cross-sectional shapes of the first groove and the second groove include at least one of a rectangle, an inverted trapezoid, and a circular arc.
18. An organic light emitting display device comprising the display panel according to any one of claims 1 to 17, and further comprising a sensor module;
the sensor module is arranged in the penetration area.
CN201910918367.4A 2019-09-26 2019-09-26 Display panel and display device Pending CN110634928A (en)

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