CN110568718B - Gray-scale photomask and manufacturing method of display substrate - Google Patents
Gray-scale photomask and manufacturing method of display substrate Download PDFInfo
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- CN110568718B CN110568718B CN201910722806.4A CN201910722806A CN110568718B CN 110568718 B CN110568718 B CN 110568718B CN 201910722806 A CN201910722806 A CN 201910722806A CN 110568718 B CN110568718 B CN 110568718B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
Abstract
The invention provides a gray-scale photomask and a manufacturing method of a display substrate. The gray scale photomask comprises a light-transmitting area and a light-shielding area surrounding the light-transmitting area, the light-transmitting area comprises a first light-transmitting area and a second light-transmitting area, the first light-transmitting area is used for forming a first film gasket, and the second light-transmitting area is used for forming a second film gasket, the first light-transmitting area is completely light-transmitting, and the second light-transmitting area is partially light-transmitting; the thickness of first film liner is greater than the second film liner, just the second printing opacity district is through preventing peeling off the processing, can make the thickness of the four corners of the second film liner that forms through this second printing opacity district be 60% of its central thickness at least, through preventing peeling off the processing to the second printing opacity district, can effectively promote the film forming stability of second film liner, prevents that the second film liner from peeling off.
Description
Technical Field
The invention relates to the technical field of display, in particular to a gray-scale photomask and a manufacturing method of a display substrate.
Background
Liquid Crystal Displays (LCDs) are the most widely used Display products in the market at present, and have the advantages of mature production process technology, high product yield, relatively low production cost and high market acceptance. Most of the liquid crystal displays in the existing market are backlight liquid crystal display devices, which include a liquid crystal display panel and a backlight module. Generally, a liquid crystal display panel includes a Color Filter (CF) substrate, an Array (Array) substrate, a liquid crystal and a Sealant (Sealant) sandwiched between the Color Filter substrate and the Array substrate, wherein the CF substrate mainly includes a Color Filter layer for forming colored light through a Color resistance unit (R/G/B), a Black Matrix (BM) for preventing light leakage at an edge of a pixel, and a Spacer (Photo Spacer, PS) for maintaining a box thickness.
The Black Photo Spacer (BPS) material is a new material, and has the characteristics of the conventional BPS material, such as excellent elastic restoring force and low liquid crystal pollution, and the Black matrix material, such as a high Optical Density (OD) value, which can block light, so that it can be used to combine BM and PS processes into one, reduce a yellow light process, reduce material cost and production time (tacttime), and reduce the overall production cost.
The coa (color Filter on array) technology is a technology for fabricating a color Filter layer on an array substrate. The display panel with the COA structure does not have the alignment problem of the color film substrate and the array substrate, so that the difficulty of box alignment manufacturing process in the preparation process of the display panel can be reduced, and errors in box alignment are avoided. A new BM-Less technique is based on the technology of COA to assemble BM and PS on the same BPS material and a kind of technology that the same process is finished and is designed on Array base plate in the same BPS material, compare with traditional liquid crystal display technology, design black matrix, main spacer, auxiliary spacer, and colored filter film on the Array base plate side totally, not only can avoid in the process of organizing group because of the error to the group precision like this, or the exposure that the translation that causes because the panel bends in the curved surface display technology brought, more importantly save a material and process, shorten production time, have reduced the product cost.
In the structure of the conventional BPS type product, as shown in fig. 1, a first thin film pad 201 and a second thin film pad 202 are used as pad stages under a main spacer 101 and an auxiliary spacer 102, a height difference between the main spacer 101 and the auxiliary spacer 102 is formed by a thickness difference between the first thin film pad 201 and the second thin film pad 202, heights of the main spacer 101 and the auxiliary spacer 102 are the same, a height difference between the first thin film pad 201 and the second thin film pad 202 is formed by a Gray Tone Mask (GTM) technique, in which the first thin film pad 201 and the second thin film pad 202 are formed by a conventional technique, so-called Gray Tone Mask is a Mask in which two light transmission regions of complete light transmission and partial light transmission are formed by a Mask, wherein the light transmission regions of partial light transmission are formed by alternately arranging light-shielding bars and light-transmission slits, and widths of all light-transmission slits in the light transmission regions of partial light transmission in the conventional technique are equal, however, during actual exposure, the exposure amount of the light-transmitting slits at the head and the tail ends is often smaller than that of the light-transmitting slit in the middle, so that the thickness of the edge of the second film gasket 202 is different from that of the middle of the second film gasket 202, even the edge of the second film gasket 202 is peeled (Peeling), and the product quality is seriously affected.
Disclosure of Invention
The invention aims to provide a gray-scale photomask which can effectively prevent a film liner from peeling, improve the process yield and ensure the product quality.
The invention also aims to provide a manufacturing method of the display substrate, which can effectively prevent the film liner from peeling, improve the process yield and ensure the product quality.
In order to achieve the above object, the present invention provides a gray scale photomask, comprising a light-transmitting region and a light-shielding region surrounding the light-transmitting region, wherein the light-transmitting region comprises a first light-transmitting region for forming a first film pad and a second light-transmitting region for forming a second film pad, which are sequentially arranged, the first light-transmitting region is completely light-transmitting, and the second light-transmitting region is partially light-transmitting;
the thickness of the first film gasket is larger than that of the second film gasket, and the second light-transmitting area is subjected to anti-stripping treatment, so that the thickness of the four corners of the second film gasket formed by the second light-transmitting area is at least 60% of the thickness of the center of the second film gasket.
The second light-transmitting area comprises a plurality of light-transmitting slits which are sequentially arranged in parallel, and a light-shielding strip is arranged between every two adjacent light-transmitting slits;
the anti-stripping treatment comprises the following steps: the width that sets up two printing opacity slits that are located head and the tail both ends is first width, and the width of other printing opacity slits except two printing opacity slits at head and the tail both ends is the second width, first width is greater than the second width, and the width homoenergetic of all light-shading strips equals.
The second light-transmitting area comprises a plurality of light-transmitting slits which are sequentially arranged in parallel, and a light-shielding strip is arranged between every two adjacent light-transmitting slits;
the anti-stripping treatment comprises the following steps: the width that sets up two light-shielding strips that are located head and the tail both ends is the third width, and the width of other light-shielding strips except two light-shielding strips at head and the tail both ends is the fourth width, the third width is less than the fourth width, and the width homoenergetic of all printing opacity slits equals.
The second light-transmitting area comprises a plurality of light-transmitting slits which are sequentially arranged in parallel, and a light-shielding strip is arranged between every two adjacent light-transmitting slits;
the anti-stripping treatment comprises the following steps: two auxiliary light-transmitting slits are respectively arranged on two opposite sides of the second light-transmitting area, the auxiliary light-transmitting slits are vertically spaced from the light-transmitting slits, one end of each auxiliary light-transmitting slit is flush with or exceeds the outer side edge of the light-transmitting slit positioned at the head end, and the other end of each auxiliary light-transmitting slit is flush with or exceeds the outer side edge of the light-transmitting slit positioned at the tail end.
The second light-transmitting area comprises a plurality of light-transmitting slits which are sequentially arranged in parallel, and a light-shielding strip is arranged between every two adjacent light-transmitting slits;
the anti-stripping treatment comprises the following steps: two auxiliary light-transmitting slits are respectively arranged on two opposite sides of the second light-transmitting area, the auxiliary light-transmitting slits are perpendicular to the light-transmitting slits, and two ends of each light-transmitting slit are respectively and correspondingly connected to the two auxiliary light-transmitting slits.
The invention provides a manufacturing method of a display substrate, which comprises the following steps:
step S1, providing a substrate, and forming a color resistance film on the substrate;
step S2, providing a gray-scale photomask, which comprises a light-transmitting area and a light-shielding area surrounding the light-transmitting area, wherein the light-transmitting area comprises a first light-transmitting area and a second light-transmitting area which are sequentially arranged, the first light-transmitting area is completely light-transmitting, the second light-transmitting area is partially light-transmitting, and the second light-transmitting area is subjected to anti-stripping treatment;
step S3, patterning the color resistance film through the gray scale photomask, so that a first film gasket is formed on the color resistance film corresponding to the first light-transmitting area, and a second film gasket is formed on the color resistance film corresponding to the second light-transmitting area;
wherein the thickness of the first film liner is greater than the thickness of the second film liner, and the thickness of the four corners of the second film liner is at least 60% of the thickness of the center thereof;
step S4, forming a light-shielding film on the substrate, the second film pad and the second film pad, patterning the light-shielding film to form a black matrix, a main spacer on the black matrix on the first film pad, and an auxiliary spacer on the black matrix on the second film pad.
In the step S2, the second light-transmitting region includes a plurality of light-transmitting slits arranged in parallel in sequence, and a light-shielding strip is disposed between two adjacent light-transmitting slits;
the anti-stripping treatment comprises the following steps: the width that sets up two printing opacity slits that are located head and the tail both ends is first width, and the width of other printing opacity slits except two printing opacity slits at head and the tail both ends is the second width, first width is greater than the second width, and the width homoenergetic of all light-shading strips equals.
In the step S2, the second light-transmitting region includes a plurality of light-transmitting slits arranged in parallel in sequence, and a light-shielding strip is disposed between two adjacent light-transmitting slits;
the anti-stripping treatment comprises the following steps: the width that sets up two light-shielding strips that are located head and the tail both ends is the third width, and the width of other light-shielding strips except two light-shielding strips at head and the tail both ends is the fourth width, the third width is less than the fourth width, and the width homoenergetic of all printing opacity slits equals.
In the step S2, the second light-transmitting region includes a plurality of light-transmitting slits arranged in parallel in sequence, and a light-shielding strip is disposed between two adjacent light-transmitting slits;
the anti-stripping treatment comprises the following steps: two auxiliary light-transmitting slits are respectively arranged on two opposite sides of the second light-transmitting area, the auxiliary light-transmitting slits are vertically spaced from the light-transmitting slits, one end of each auxiliary light-transmitting slit is flush with or exceeds the outer side edge of the light-transmitting slit positioned at the head end, and the other end of each auxiliary light-transmitting slit is flush with or exceeds the outer side edge of the light-transmitting slit positioned at the tail end.
In the step S2, the second light-transmitting region includes a plurality of light-transmitting slits arranged in parallel in sequence, and a light-shielding strip is disposed between two adjacent light-transmitting slits;
the anti-stripping treatment comprises the following steps: two auxiliary light-transmitting slits are respectively arranged on two opposite sides of the second light-transmitting area, the auxiliary light-transmitting slits are perpendicular to the light-transmitting slits, and two ends of each light-transmitting slit are respectively and correspondingly connected to the two auxiliary light-transmitting slits.
The invention has the beneficial effects that: the invention provides a gray scale photomask, which comprises a light-transmitting area and a light-shielding area surrounding the light-transmitting area, wherein the light-transmitting area comprises a first light-transmitting area and a second light-transmitting area, the first light-transmitting area is used for forming a first film gasket, and the second light-transmitting area is used for forming a second film gasket, the first light-transmitting area is completely light-transmitting, and the second light-transmitting area is partially light-transmitting; the thickness of first film liner is greater than the second film liner, just the second printing opacity district is through preventing peeling off the processing, can make the thickness of the four corners of the second film liner that forms through this second printing opacity district be 60% of its central thickness at least, through preventing peeling off the processing to the second printing opacity district, can effectively promote the film forming stability of second film liner, prevents that the second film liner from peeling off. The invention also provides a manufacturing method of the display substrate, which can effectively improve the film forming stability of the second film liner and prevent the second film liner from peeling.
Drawings
For a better understanding of the nature and technical aspects of the present invention, reference should be made to the following detailed description of the invention, taken in conjunction with the accompanying drawings, which are provided for purposes of illustration and description and are not intended to limit the invention.
In the drawings, there is shown in the drawings,
fig. 1 is a schematic view of a conventional BPS substrate;
FIG. 2 is a schematic diagram of a gray-scale mask according to a first embodiment of the present invention;
FIG. 3 is a diagram of a gray-scale mask according to a second embodiment of the present invention;
FIG. 4 is a diagram illustrating a gray-scale mask according to a third embodiment of the present invention;
FIG. 5 is a diagram illustrating a gray-scale mask according to a fourth embodiment of the present invention;
FIG. 6 is a flow chart of a method for fabricating a display substrate according to the present invention;
fig. 7 is a schematic view of a display substrate manufactured by the method of manufacturing a display substrate according to the present invention.
Detailed Description
To further illustrate the technical means and effects of the present invention, the following detailed description is given with reference to the preferred embodiments of the present invention and the accompanying drawings.
Referring to fig. 2 to 5, the gray tone mask of the present invention includes a light-transmitting region 31 and a light-shielding region 32 surrounding the light-transmitting region 31, wherein the light-transmitting region 31 includes a first light-transmitting region 311 for forming a first film pad 41 and a second light-transmitting region 312 for forming a second film pad 42, which are sequentially arranged, the first light-transmitting region 311 is completely light-transmitting, and the second light-transmitting region 312 is partially light-transmitting;
the thickness of the first film gasket 41 is greater than that of the second film gasket 42, and the second light-transmitting region 312 is subjected to a peeling prevention process, so that the thickness of the four corners of the second film gasket 42 formed by the second light-transmitting region 312 is at least 60% of the thickness of the center thereof.
Specifically, as shown in fig. 2, in the first embodiment of the present invention, the second light-transmitting region 312 includes a plurality of light-transmitting slits 51a arranged in parallel in sequence, and a light-shielding strip 52a is disposed between two adjacent light-transmitting slits 51 a;
the anti-stripping treatment comprises the following steps: the width of the two light-transmitting slits 51a at the head end and the tail end is set to be a first width, the width of the other light-transmitting slits 51a except the two light-transmitting slits 51a at the head end and the tail end is set to be a second width, the first width is greater than the second width, and the widths of all the light-shielding strips 52a are equal.
It should be noted that, compared with the prior art, the first embodiment of the present invention has the advantages that the widths of the two light-transmitting slits 51a at the front and rear ends are increased, upon exposure, the light-receiving area of the edge of the second light-transmitting region 312 is increased, so that the thickness of the edge of the second thin-film gasket 42 is increased, this arrangement enables the thickness of the four corners of the second film liner 42 formed by the second light-transmitting regions 312 to be at least 60% of the thickness of the center thereof, corresponding to this first embodiment, the second film liner 42 is not only increased in thickness at the four corners, and the thickness of both the left and right side edges of the second film liner 42 is increased, that is, in the first embodiment, the thickness of the two side edges of the second film liner 42 is at least 60% of the thickness of the center thereof, which can effectively improve the film forming strength of the second film liner 42 and prevent the second film liner 42 from peeling off.
Specifically, as shown in fig. 3, in the second embodiment of the present invention, the second light-transmitting region 312 includes a plurality of light-transmitting slits 51b arranged in parallel in sequence, and a light-shielding strip 52b is disposed between two adjacent light-transmitting slits 51 b;
the anti-stripping treatment comprises the following steps: the widths of the two light-shielding strips 52b at the head end and the tail end are set to be a third width, the widths of the other light-shielding strips 52b except the two light-shielding strips 52b at the head end and the tail end are set to be a fourth width, the third width is smaller than the fourth width, and the widths of all the light-transmitting slits 51b are equal.
It should be noted that, compared to the prior art, the second embodiment of the present invention has a reduced width of the two light-shielding bars 52b at the front and rear ends, and during exposure, the light receiving intensity by the overlapping of the light transmitting slits 51b on both sides of the two light-shielding bars 52b is increased, so that the thickness of the edge of the second film liner 42 is increased, the arrangement can be such that the thickness of the four corners of the second film liner 42 formed by the second light-transmitting regions 312 is at least 60% of the thickness of the center thereof, corresponding to this second embodiment, the second film liner 42 is not only increased in thickness at the four corners, and the thickness of both the left and right side edges of the second film liner 42 is increased, that is, in the first embodiment, the thickness of the two side edges of the second film liner 42 is at least 60% of the thickness of the center thereof, which can effectively improve the film forming strength of the second film liner 42 and prevent the second film liner 42 from peeling off.
Specifically, as shown in fig. 4, in the third embodiment of the present invention, the second light-transmitting region 312 includes a plurality of light-transmitting slits 51c arranged in parallel in sequence, and a light-shielding strip 52c is provided between two adjacent light-transmitting slits 51 c;
the anti-stripping treatment comprises the following steps: two auxiliary light-transmitting slits 53c are respectively arranged on two opposite sides of the second light-transmitting region 312, the auxiliary light-transmitting slits 53c are vertically spaced from the light-transmitting slits 51c, one end of each auxiliary light-transmitting slit 53c is flush with or exceeds the outer side edge of the light-transmitting slit 51c at the head end, and the other end of each auxiliary light-transmitting slit 53c is flush with or exceeds the outer side edge of the light-transmitting slit 51c at the tail end.
Compared with the prior art, in the third embodiment of the present invention, the auxiliary light-transmitting slits 53c perpendicular to the light-transmitting slits 51c are respectively disposed at the upper and lower ends of the light-transmitting slit 51c, a transverse sealing design is formed by exposing the auxiliary light-transmitting slits 53c, and the light receiving intensity at the four corners of the second light-transmitting region 312 is enhanced, so that the thickness of the four corners of the second film gasket 42 formed by the second light-transmitting region 312 is at least 60% of the thickness of the center thereof, and a locking structure is formed by the transverse sealing design, so as to effectively improve the film forming intensity of the second film gasket 42 and prevent the second film gasket 42 from peeling off.
Specifically, as shown in fig. 5, in the fourth embodiment of the present invention, the second light-transmitting region 312 includes a plurality of light-transmitting slits 51d arranged in parallel in sequence, and a light-shielding strip 52d is disposed between two adjacent light-transmitting slits 51 d; the anti-stripping treatment comprises the following steps: two auxiliary light-transmitting slits 53d are respectively arranged on two opposite sides of the second light-transmitting region 312, the auxiliary light-transmitting slits 53d are perpendicular to the light-transmitting slits 51d, and two ends of each light-transmitting slit 51d are respectively and correspondingly connected to the two auxiliary light-transmitting slits 53 d.
It should be noted that the operation principle of the fourth embodiment and the third embodiment of the present invention is the same as that of the third embodiment, and the region is only that the auxiliary light-transmitting slit 53d and the light-transmitting slit 51d are changed from the interval to the connection.
It should be noted that, the peeling prevention processing according to the first to fourth embodiments of the present invention can effectively prevent the edge of the film liner from peeling off and ensure the yield of the manufacturing process by the edge strength of the film liner formed by the partially transparent region (Slit Mask) of the gray-scale Mask.
Referring to fig. 6 and 7, based on the gray-scale mask, the present invention further provides a method for fabricating a display substrate by using the gray-scale mask for patterning, the method comprising:
step S1, providing a substrate 10, and forming a color-resist film on the substrate 10.
Preferably, the display substrate is a COA substrate, the substrate 10 includes a substrate 11 and a TFT layer 91 disposed on the substrate 11, the structure of the TFT layer 91 may be designed as required, and a typical TFT layer 91 structure may include a first metal layer, a first insulating layer, an active layer, a second insulating layer, a second metal layer, a protective layer, and the like, which are stacked.
Step S2, providing a gray tone mask, which includes a light-transmitting region 31 and a light-shielding region 32 surrounding the light-transmitting region 31, where the light-transmitting region 31 includes a first light-transmitting region 311 and a second light-transmitting region 312 arranged in sequence, the first light-transmitting region 311 is completely light-transmitting, the second light-transmitting region 312 is partially light-transmitting, and the second light-transmitting region 312 is subjected to anti-peeling treatment;
step S3, patterning the color-resist film through the gray tone mask, so that a first film pad 41 is formed on a portion of the color-resist film corresponding to the first light-transmitting region 311, and a second film pad 42 is formed on a portion of the color-resist film corresponding to the second light-transmitting region 312; wherein the thickness of the first film gasket 41 is greater than that of the second film gasket 42, and the thickness of the four corners of the second film gasket 42 is at least 60% of the thickness of the center thereof.
Specifically, as shown in fig. 2, in the first embodiment of the present invention, the second light-transmitting region 312 includes a plurality of light-transmitting slits 51a arranged in parallel in sequence, and a light-shielding strip 52a is disposed between two adjacent light-transmitting slits 51 a;
the anti-stripping treatment comprises the following steps: the width of the two light-transmitting slits 51a at the head end and the tail end is set to be a first width, the width of the other light-transmitting slits 51a except the two light-transmitting slits 51a at the head end and the tail end is set to be a second width, the first width is greater than the second width, and the widths of all the light-shielding strips 52a are equal.
It should be noted that, compared with the prior art, the first embodiment of the present invention has the advantages that the widths of the two light-transmitting slits 51a at the front and rear ends are increased, upon exposure, the light-receiving area of the edge of the second light-transmitting region 312 is increased, so that the thickness of the edge of the second thin-film gasket 42 is increased, this arrangement enables the thickness of the four corners of the second film liner 42 formed by the second light-transmitting regions 312 to be at least 60% of the thickness of the center thereof, corresponding to this first embodiment, the second film liner 42 is not only increased in thickness at the four corners, and the thickness of both the left and right side edges of the second film liner 42 is increased, that is, in the first embodiment, the thickness of the two side edges of the second film liner 42 is at least 60% of the thickness of the center thereof, which can effectively improve the film forming strength of the second film liner 42 and prevent the second film liner 42 from peeling off.
Specifically, as shown in fig. 3, in the second embodiment of the present invention, the second light-transmitting region 312 includes a plurality of light-transmitting slits 51b arranged in parallel in sequence, and a light-shielding strip 52b is disposed between two adjacent light-transmitting slits 51 b;
the anti-stripping treatment comprises the following steps: the widths of the two light-shielding strips 52b at the head end and the tail end are set to be a third width, the widths of the other light-shielding strips 52b except the two light-shielding strips 52b at the head end and the tail end are set to be a fourth width, the third width is smaller than the fourth width, and the widths of all the light-transmitting slits 51b are equal.
It should be noted that, compared to the prior art, the second embodiment of the present invention has a reduced width of the two light-shielding bars 52b at the front and rear ends, and during exposure, the light receiving intensity by the overlapping of the light transmitting slits 51b on both sides of the two light-shielding bars 52b is increased, so that the thickness of the edge of the second film liner 42 is increased, the arrangement can be such that the thickness of the four corners of the second film liner 42 formed by the second light-transmitting regions 312 is at least 60% of the thickness of the center thereof, corresponding to this second embodiment, the second film liner 42 is not only increased in thickness at the four corners, and the thickness of both the left and right side edges of the second film liner 42 is increased, that is, in the first embodiment, the thickness of the two side edges of the second film liner 42 is at least 60% of the thickness of the center thereof, which can effectively improve the film forming strength of the second film liner 42 and prevent the second film liner 42 from peeling off.
Specifically, as shown in fig. 4, in the third embodiment of the present invention, the second light-transmitting region 312 includes a plurality of light-transmitting slits 51c arranged in parallel in sequence, and a light-shielding strip 52c is provided between two adjacent light-transmitting slits 51 c;
the anti-stripping treatment comprises the following steps: two auxiliary light-transmitting slits 53c are respectively arranged on two opposite sides of the second light-transmitting region 312, the auxiliary light-transmitting slits 53c are vertically spaced from the light-transmitting slits 51c, one end of each auxiliary light-transmitting slit 53c is flush with or exceeds the outer side edge of the light-transmitting slit 51c at the head end, the other end of each auxiliary light-transmitting slit 53c is flush with or exceeds the outer side edge of the light-transmitting slit 51c at the tail end, preferably, one end of each auxiliary light-transmitting slit 53c is flush with the outer side edge of the light-transmitting slit 51c at the head end, and the other end of each auxiliary light-transmitting slit is flush with the outer side.
Compared with the prior art, in the third embodiment of the present invention, the auxiliary light-transmitting slits 53c perpendicular to the light-transmitting slits 51c are respectively disposed at the upper and lower ends of the light-transmitting slit 51c, a transverse sealing design is formed by exposing the auxiliary light-transmitting slits 53c, and the light receiving intensity at the four corners of the second light-transmitting region 312 is enhanced, so that the thickness of the four corners of the second film gasket 42 formed by the second light-transmitting region 312 is at least 60% of the thickness of the center thereof, and a locking structure is formed by the transverse sealing design, so as to effectively improve the film forming intensity of the second film gasket 42 and prevent the second film gasket 42 from peeling off.
Specifically, as shown in fig. 5, in the fourth embodiment of the present invention, the second light-transmitting region 312 includes a plurality of light-transmitting slits 51d arranged in parallel in sequence, and a light-shielding strip 52d is disposed between two adjacent light-transmitting slits 51 d; the anti-stripping treatment comprises the following steps: two auxiliary light-transmitting slits 53d are respectively disposed on two opposite sides of the second light-transmitting region 312, the auxiliary light-transmitting slits 53d are perpendicular to the light-transmitting slits 51d, and two ends of each light-transmitting slit 51 are respectively and correspondingly connected to the two auxiliary light-transmitting slits 53 d.
It should be noted that the fourth embodiment and the third embodiment of the present invention have the same operation principle as the third embodiment, and the region is only that the auxiliary light-transmitting slit and the light-transmitting slit are changed from the interval to the connection.
It should be noted that, the peeling prevention processing according to the first to fourth embodiments of the present invention can effectively prevent the edge of the film liner from peeling off and ensure the yield of the manufacturing process by the edge strength of the film liner formed by the partially transparent region (Slit Mask) of the gray-scale Mask.
Step S4, forming a light-shielding film on the substrate 10, the second film liner 41 and the second film liner 42, and patterning the light-shielding film to form the black matrix 61, the main spacers 62 on the black matrix 61 on the first film liner 41, and the auxiliary spacers 63 on the black matrix 61 on the second film liner 42.
Further, a step of forming an organic insulating layer 92 on the substrate 10, the second thin film spacer 41, and the second thin film spacer 42 is further included between the steps S3 and S4, and the light shielding thin film is laminated on the organic insulating layer 92.
Specifically, in step S4, the light-shielding film is exposed to light using a mask designed by a Full-penetration (Full tone) method to obtain the black matrix 61, the main spacer 62, and the auxiliary spacer 63, so that the thickness of the main spacer 62 is the same as that of the auxiliary spacer 63, and the difference in thickness between the second film spacer 41 and the second film spacer 42 constitutes the height difference between the main spacer 62 and the auxiliary spacer 63.
Preferably, the material of the shading film is a BPS material.
Furthermore, the invention improves the reliability of the film pattern formed by the part of the light-transmitting area in the gray-scale photomask by adjusting the design of the gray-scale photomask, effectively prevents the film from peeling, improves the process yield and ensures the product quality.
In summary, the present invention provides a gray-scale mask, which includes a light-transmitting area and a light-shielding area surrounding the light-transmitting area, wherein the light-transmitting area includes a first light-transmitting area for forming a first film pad and a second light-transmitting area for forming a second film pad, which are sequentially arranged, the first light-transmitting area is completely light-transmitting, and the second light-transmitting area is partially light-transmitting; the thickness of first film liner is greater than the second film liner, just the second printing opacity district is through preventing peeling off the processing, can make the thickness of the four corners of the second film liner that forms through this second printing opacity district be 60% of its central thickness at least, through preventing peeling off the processing to the second printing opacity district, can effectively promote the film forming stability of second film liner, prevents that the second film liner from peeling off. The invention also provides a manufacturing method of the display substrate, which can effectively improve the film forming stability of the second film liner and prevent the second film liner from peeling.
As described above, it will be apparent to those skilled in the art that other various changes and modifications may be made based on the technical solution and concept of the present invention, and all such changes and modifications are intended to fall within the scope of the appended claims.
Claims (8)
1. The gray tone mask is characterized by comprising a light-transmitting area (31) and a light-shielding area (32) surrounding the light-transmitting area (31), wherein the light-transmitting area (31) comprises a first light-transmitting area (311) and a second light-transmitting area (312), the first light-transmitting area (311) is used for forming a first film gasket (41) and the second light-transmitting area (312) is used for forming a second film gasket (42), the first light-transmitting area (311) is completely light-transmitting, and the second light-transmitting area (312) is partially light-transmitting;
the thickness of the first film gasket (41) is larger than that of the second film gasket (42), and the second light-transmitting area (312) is subjected to anti-stripping treatment, so that the thickness of the four corners of the second film gasket (42) formed by the second light-transmitting area (312) is at least 60% of the thickness of the center of the second film gasket;
the second light-transmitting area (312) comprises a plurality of light-transmitting slits (51a) which are sequentially arranged in parallel, and a light shielding strip (52a) is arranged between every two adjacent light-transmitting slits (51 a);
the anti-stripping treatment comprises the following steps: the width of two light-transmitting slits (51a) arranged at the head end and the tail end is set to be a first width, the width of other light-transmitting slits (51a) except the two light-transmitting slits (51a) arranged at the head end and the tail end is set to be a second width, the first width is larger than the second width, and the widths of all the shading strips (52a) are equal.
2. The gray tone mask is characterized by comprising a light-transmitting area (31) and a light-shielding area (32) surrounding the light-transmitting area (31), wherein the light-transmitting area (31) comprises a first light-transmitting area (311) and a second light-transmitting area (312), the first light-transmitting area (311) is used for forming a first film gasket (41) and the second light-transmitting area (312) is used for forming a second film gasket (42), the first light-transmitting area (311) is completely light-transmitting, and the second light-transmitting area (312) is partially light-transmitting;
the thickness of the first film gasket (41) is larger than that of the second film gasket (42), and the second light-transmitting area (312) is subjected to anti-stripping treatment, so that the thickness of the four corners of the second film gasket (42) formed by the second light-transmitting area (312) is at least 60% of the thickness of the center of the second film gasket;
the second light-transmitting area (312) comprises a plurality of light-transmitting slits (51b) which are sequentially arranged in parallel, and a light shielding strip (52b) is arranged between every two adjacent light-transmitting slits (51 b);
the anti-stripping treatment comprises the following steps: the width of the two light-shielding strips (52b) positioned at the head end and the tail end is set to be a third width, the width of the other light-shielding strips (52b) except the two light-shielding strips (52b) positioned at the head end and the tail end is set to be a fourth width, the third width is smaller than the fourth width, and the widths of all the light-transmitting slits (51b) are equal.
3. The gray tone mask is characterized by comprising a light-transmitting area (31) and a light-shielding area (32) surrounding the light-transmitting area (31), wherein the light-transmitting area (31) comprises a first light-transmitting area (311) and a second light-transmitting area (312), the first light-transmitting area (311) is used for forming a first film gasket (41) and the second light-transmitting area (312) is used for forming a second film gasket (42), the first light-transmitting area (311) is completely light-transmitting, and the second light-transmitting area (312) is partially light-transmitting;
the thickness of the first film gasket (41) is larger than that of the second film gasket (42), and the second light-transmitting area (312) is subjected to anti-stripping treatment, so that the thickness of the four corners of the second film gasket (42) formed by the second light-transmitting area (312) is at least 60% of the thickness of the center of the second film gasket;
the second light-transmitting area (312) comprises a plurality of light-transmitting slits (51c) which are sequentially arranged in parallel, and a light shielding strip (52c) is arranged between every two adjacent light-transmitting slits (51 c);
the anti-stripping treatment comprises the following steps: two auxiliary light-transmitting slits (53c) are respectively arranged on two opposite sides of the second light-transmitting area (312), the auxiliary light-transmitting slits (53c) are vertically spaced from the light-transmitting slits (51c), one end of each auxiliary light-transmitting slit (53c) is flush with the outer side of the light-transmitting slit (51c) positioned at the head end or one end of each auxiliary light-transmitting slit (53c) exceeds the outer side of the light-transmitting slit (51c) positioned at the head end, and the other end of each auxiliary light-transmitting slit (53c) is flush with the outer side of the light-transmitting slit (51c) positioned at the tail end or the other end of each auxiliary light-transmitting slit (53c) exceeds the outer side of the light-transmitting slit (51c) positioned at the tail end.
4. The gray tone mask is characterized by comprising a light-transmitting area (31) and a light-shielding area (32) surrounding the light-transmitting area (31), wherein the light-transmitting area (31) comprises a first light-transmitting area (311) and a second light-transmitting area (312), the first light-transmitting area (311) is used for forming a first film gasket (41) and the second light-transmitting area (312) is used for forming a second film gasket (42), the first light-transmitting area (311) is completely light-transmitting, and the second light-transmitting area (312) is partially light-transmitting;
the thickness of the first film gasket (41) is larger than that of the second film gasket (42), and the second light-transmitting area (312) is subjected to anti-stripping treatment, so that the thickness of the four corners of the second film gasket (42) formed by the second light-transmitting area (312) is at least 60% of the thickness of the center of the second film gasket;
the second light-transmitting area (312) comprises a plurality of light-transmitting slits (51d) which are sequentially arranged in parallel, and a light shielding strip (52d) is arranged between every two adjacent light-transmitting slits (51 d);
the anti-stripping treatment comprises the following steps: two auxiliary light-transmitting slits (53d) are respectively arranged on two opposite sides of the second light-transmitting area (312), the auxiliary light-transmitting slits (53d) are perpendicular to the light-transmitting slits (51d), and two ends of each light-transmitting slit (51d) are respectively and correspondingly connected to the two auxiliary light-transmitting slits (53 d).
5. A manufacturing method of a display substrate is characterized by comprising the following steps:
step S1, providing a substrate (10), and forming a color resistance film on the substrate (10);
step S2, providing a gray tone mask, which comprises a light-transmitting area (31) and a light-shielding area (32) surrounding the light-transmitting area (31), wherein the light-transmitting area (31) comprises a first light-transmitting area (311) and a second light-transmitting area (312) which are sequentially arranged, the first light-transmitting area (311) is completely light-transmitting, the second light-transmitting area (312) is partially light-transmitting, and the second light-transmitting area (312) is subjected to anti-stripping treatment;
step S3, patterning the color resistance film through the gray scale mask, so that a first film gasket (41) is formed on the color resistance film corresponding to the first light-transmitting area (311), and a second film gasket (42) is formed on the color resistance film corresponding to the second light-transmitting area (312);
wherein the first film liner (41) has a thickness greater than the second film liner (42), the thickness of the four corners of the second film liner (42) being at least 60% of the thickness of the center thereof;
step S4, forming light-shielding films on the substrate (10), the second film liner (41) and the second film liner (42), and patterning the light-shielding films to form a black matrix (61), a main spacer (62) on the black matrix (61) on the first film liner (41), and an auxiliary spacer (63) on the black matrix (61) on the second film liner (42);
in the step S2, the second light-transmitting region (312) includes a plurality of light-transmitting slits (51a) arranged in parallel in sequence, and a light-shielding strip (52a) is provided between two adjacent light-transmitting slits (51 a);
the anti-stripping treatment comprises the following steps: the width of two light-transmitting slits (51a) arranged at the head end and the tail end is set to be a first width, the width of other light-transmitting slits (51a) except the two light-transmitting slits (51a) arranged at the head end and the tail end is set to be a second width, the first width is larger than the second width, and the widths of all the shading strips (52a) are equal.
6. A manufacturing method of a display substrate is characterized by comprising the following steps:
step S1, providing a substrate (10), and forming a color resistance film on the substrate (10);
step S2, providing a gray tone mask, which comprises a light-transmitting area (31) and a light-shielding area (32) surrounding the light-transmitting area (31), wherein the light-transmitting area (31) comprises a first light-transmitting area (311) and a second light-transmitting area (312) which are sequentially arranged, the first light-transmitting area (311) is completely light-transmitting, the second light-transmitting area (312) is partially light-transmitting, and the second light-transmitting area (312) is subjected to anti-stripping treatment;
step S3, patterning the color resistance film through the gray scale mask, so that a first film gasket (41) is formed on the color resistance film corresponding to the first light-transmitting area (311), and a second film gasket (42) is formed on the color resistance film corresponding to the second light-transmitting area (312);
wherein the first film liner (41) has a thickness greater than the second film liner (42), the thickness of the four corners of the second film liner (42) being at least 60% of the thickness of the center thereof;
step S4, forming light-shielding films on the substrate (10), the second film liner (41) and the second film liner (42), and patterning the light-shielding films to form a black matrix (61), a main spacer (62) on the black matrix (61) on the first film liner (41), and an auxiliary spacer (63) on the black matrix (61) on the second film liner (42);
in the step S2, the second light-transmitting region (312) includes a plurality of light-transmitting slits (51b) arranged in parallel in sequence, and a light-shielding strip (52b) is provided between two adjacent light-transmitting slits (51 b);
the anti-stripping treatment comprises the following steps: the width of the two light-shielding strips (52b) positioned at the head end and the tail end is set to be a third width, the width of the other light-shielding strips (52b) except the two light-shielding strips (52b) positioned at the head end and the tail end is set to be a fourth width, the third width is smaller than the fourth width, and the widths of all the light-transmitting slits (51b) are equal.
7. A manufacturing method of a display substrate is characterized by comprising the following steps:
step S1, providing a substrate (10), and forming a color resistance film on the substrate (10);
step S2, providing a gray tone mask, which comprises a light-transmitting area (31) and a light-shielding area (32) surrounding the light-transmitting area (31), wherein the light-transmitting area (31) comprises a first light-transmitting area (311) and a second light-transmitting area (312) which are sequentially arranged, the first light-transmitting area (311) is completely light-transmitting, the second light-transmitting area (312) is partially light-transmitting, and the second light-transmitting area (312) is subjected to anti-stripping treatment;
step S3, patterning the color resistance film through the gray scale mask, so that a first film gasket (41) is formed on the color resistance film corresponding to the first light-transmitting area (311), and a second film gasket (42) is formed on the color resistance film corresponding to the second light-transmitting area (312);
wherein the first film liner (41) has a thickness greater than the second film liner (42), the thickness of the four corners of the second film liner (42) being at least 60% of the thickness of the center thereof;
step S4, forming light-shielding films on the substrate (10), the second film liner (41) and the second film liner (42), and patterning the light-shielding films to form a black matrix (61), a main spacer (62) on the black matrix (61) on the first film liner (41), and an auxiliary spacer (63) on the black matrix (61) on the second film liner (42);
in the step S2, the second light-transmitting region (312) includes a plurality of light-transmitting slits (51c) arranged in parallel in sequence, and a light-shielding strip (52c) is provided between two adjacent light-transmitting slits (51 c);
the anti-stripping treatment comprises the following steps: two auxiliary light-transmitting slits (53c) are respectively arranged on two opposite sides of the second light-transmitting area (312), the auxiliary light-transmitting slits (53c) are vertically spaced from the light-transmitting slits (51c), one end of each auxiliary light-transmitting slit (53c) is flush with the outer side of the light-transmitting slit (51c) positioned at the head end or one end of each auxiliary light-transmitting slit (53c) exceeds the outer side of the light-transmitting slit (51c) positioned at the head end, and the other end of each auxiliary light-transmitting slit (53c) is flush with the outer side of the light-transmitting slit (51c) positioned at the tail end or the other end of each auxiliary light-transmitting slit (53c) exceeds the outer side of the light-transmitting slit (51c) positioned at the tail end.
8. A manufacturing method of a display substrate is characterized by comprising the following steps:
step S1, providing a substrate (10), and forming a color resistance film on the substrate (10);
step S2, providing a gray tone mask, which comprises a light-transmitting area (31) and a light-shielding area (32) surrounding the light-transmitting area (31), wherein the light-transmitting area (31) comprises a first light-transmitting area (311) and a second light-transmitting area (312) which are sequentially arranged, the first light-transmitting area (311) is completely light-transmitting, the second light-transmitting area (312) is partially light-transmitting, and the second light-transmitting area (312) is subjected to anti-stripping treatment;
step S3, patterning the color resistance film through the gray scale mask, so that a first film gasket (41) is formed on the color resistance film corresponding to the first light-transmitting area (311), and a second film gasket (42) is formed on the color resistance film corresponding to the second light-transmitting area (312);
wherein the first film liner (41) has a thickness greater than the second film liner (42), the thickness of the four corners of the second film liner (42) being at least 60% of the thickness of the center thereof;
step S4, forming light-shielding films on the substrate (10), the second film liner (41) and the second film liner (42), and patterning the light-shielding films to form a black matrix (61), a main spacer (62) on the black matrix (61) on the first film liner (41), and an auxiliary spacer (63) on the black matrix (61) on the second film liner (42);
in the step S2, the second light-transmitting region (312) includes a plurality of light-transmitting slits (51d) arranged in parallel in sequence, and a light-shielding strip (52d) is provided between two adjacent light-transmitting slits (51 d);
the anti-stripping treatment comprises the following steps: two auxiliary light-transmitting slits (53d) are respectively arranged on two opposite sides of the second light-transmitting area (312), the auxiliary light-transmitting slits (53d) are perpendicular to the light-transmitting slits (51d), and two ends of each light-transmitting slit (51d) are respectively and correspondingly connected to the two auxiliary light-transmitting slits (53 d).
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910722806.4A CN110568718B (en) | 2019-08-06 | 2019-08-06 | Gray-scale photomask and manufacturing method of display substrate |
| PCT/CN2019/104229 WO2021022602A1 (en) | 2019-08-06 | 2019-09-03 | Gray-tone mask and method for manufacturing display substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910722806.4A CN110568718B (en) | 2019-08-06 | 2019-08-06 | Gray-scale photomask and manufacturing method of display substrate |
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| Publication Number | Publication Date |
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| CN110568718A CN110568718A (en) | 2019-12-13 |
| CN110568718B true CN110568718B (en) | 2020-09-01 |
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| WO (1) | WO2021022602A1 (en) |
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| CN111443528A (en) * | 2020-04-03 | 2020-07-24 | 信利(仁寿)高端显示科技有限公司 | High-pressure-resistance liquid crystal display module manufacturing method and high-pressure-resistance liquid crystal display module |
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| JP2013167884A (en) * | 2006-07-21 | 2013-08-29 | Dainippon Printing Co Ltd | Gradation mask |
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| JP4574250B2 (en) * | 2004-06-30 | 2010-11-04 | キヤノン株式会社 | Photo mask |
| CN103852969A (en) * | 2012-12-05 | 2014-06-11 | 上海广电富士光电材料有限公司 | Mask, method for manufacturing light filter and liquid crystal display device |
| CN105974651B (en) * | 2016-07-18 | 2019-05-31 | 深圳市华星光电技术有限公司 | The production method of liquid crystal display panel |
| CN106125500B (en) * | 2016-08-31 | 2020-02-07 | 深圳市华星光电技术有限公司 | Photomask and preparation method of black light resistance spacing layer |
| CN107741673B (en) * | 2017-10-13 | 2019-08-16 | 深圳市华星光电半导体显示技术有限公司 | The preparation method and liquid crystal display panel of a kind of spacer in liquid crystal display panel |
| CN208922014U (en) * | 2018-07-16 | 2019-05-31 | 惠科股份有限公司 | Display panel |
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- 2019-09-03 WO PCT/CN2019/104229 patent/WO2021022602A1/en active Application Filing
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| US5725972A (en) * | 1995-05-17 | 1998-03-10 | Fujitsu Limited | Mask with gradual increase in transmittance from opaque to transparent region |
| JP2013167884A (en) * | 2006-07-21 | 2013-08-29 | Dainippon Printing Co Ltd | Gradation mask |
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| WO2021022602A1 (en) | 2021-02-11 |
| CN110568718A (en) | 2019-12-13 |
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