CN110568610A - Electrostatic dynamic adjustable reflective zoom super-surface lens and preparation method thereof - Google Patents
Electrostatic dynamic adjustable reflective zoom super-surface lens and preparation method thereof Download PDFInfo
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/06—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
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Abstract
the invention discloses an electrostatic dynamically adjustable reflective zoom super-surface lens and a preparation method thereof, belonging to the field of dynamically adjustable super-surfaces and comprising the following steps: the device comprises a glass substrate, an ITO film, an antenna, an air gap, a supporting structure, a silicon nitride film, a silicon frame and a gold back plate; the antenna is used for regulating and controlling the phase of incident light; the air gap is used for providing a space for deformation of the gold back plate, and the maximum deformation degree of the gold back plate is one third of the thickness of the air gap; the support structure is used for forming an air gap; the gold back plate is used as a positive electrode, the ITO film is used as a negative electrode to form an electrostatic MEMS system, and the gold back plate is used as a movable electrode and used for realizing different-degree convex deformation under the regulation and control of voltage; the geometric parameters of the antenna are obtained according to the initial focal length, the incident light wavelength and the generalized Snell's law required by the super-surface lens; the invention can adjust the focal length of the static super-surface lens by changing the voltage between the ITO film and the gold back plate, thereby increasing the yield.
Description
Technical Field
the invention belongs to the field of dynamic adjustable super surfaces, and particularly relates to an electrostatic dynamic adjustable reflective zoom super surface lens and a preparation method thereof.
Background
The super surface is used as a novel two-dimensional material, can regulate and control various properties of electromagnetic wave such as amplitude, phase, polarization, vortex and the like, has the characteristics of small size, thin thickness and multiple functions, is compatible with a CMOS (complementary metal oxide semiconductor) process, and has wide application prospect.
errors are easily introduced in the growth, exposure and etching processes of the static super-surface lens in the preparation process, so that the final focal length and the design focal length deviate to cause errors. This error causes a reduction in the super-surface lens yield.
micro Electro Mechanical Systems (MEMS) generally utilize liquid crystal, graphene, mechanical, thermal change, static electricity and other modes, can realize dynamic regulation and control of devices on a micro scale, are developed more and more mature after a period of time, can be applied to micro optical devices to realize micro optical electro mechanical systems (MEMOS), and are compatible with a super surface process, so that the realization of the dynamic adjustable super surface by combining the super surface and the MEMS is a trend of future development.
common dynamic regulation modes generally include a liquid crystal mode, a graphene mode, a mechanical mode, a thermal change mode and the like, wherein the liquid crystal mode realizes dynamic regulation by changing the liquid crystal direction through adjusting voltage, and has the defect that the response speed of liquid crystal is low, generally in millisecond level; the graphene type realizes dynamic regulation and control by adjusting the Fermi level of the graphene, and has the defects that the graphene is incompatible with the traditional CMOS (complementary metal oxide semiconductor) process, large-scale production is difficult on the basis of the existing industry, and the cost of the graphene is high; the mechanical type realizes dynamic regulation and control by stretching a deformable medium through a mechanical arm, and has the defect that an additional mechanical device occupies a larger volume; the thermal deformation type realizes structure dynamic regulation and control by combining materials with different thermal expansion coefficients and controlling temperature change, and has the defects that the cooling time of a system structure is difficult to control, the regulation and control speed is limited due to slow speed, and large thermal noise can be generated in an infrared band, so that the thermal deformation type cannot be applied.
In summary, the static super-surface lens has low yield due to the fact that the focal length is not adjustable, and the existing dynamic adjustment and control technology has the defects of low response speed, high cost, immature production technology, large volume occupation, limited applicable waveband and the like.
disclosure of Invention
aiming at the defects of the prior art, the invention aims to provide an electrostatic dynamically adjustable reflective zoom super-surface lens and a preparation method thereof, and aims to solve the problem of low yield caused by the fact that the focal length of the conventional static super-surface lens cannot be adjusted and controlled.
to achieve the above object, the present invention provides an electrostatic dynamically adjustable reflective zoom super-surface lens, comprising: a glass substrate, an ITO (Indium Tin Oxide) film, an antenna, an air gap, a support structure, a silicon nitride film, a silicon frame and a gold back plate;
the ITO film is positioned above the glass substrate, the antenna is positioned in the middle position above the ITO film, the supporting structure is positioned on the outer side of the antenna, the ITO film and the gold back plate are separated to form an air gap, and a voltage applying position is arranged on the ITO film; the silicon nitride film is positioned above the air gap, the silicon frame is positioned above the silicon nitride film, and the gold back plate is positioned above the silicon frame;
The antenna is used for regulating and controlling the phase of incident light; the air gap is used for providing a space for deformation of the gold back plate, and the maximum deformation degree of the gold back plate is one third of the thickness of the air gap; the support structure is used for forming an air gap; the silicon nitride film and the silicon frame are used for supporting the gold back plate; the gold back plate is used as a positive electrode, the ITO film is used as a negative electrode to form an electrostatic MEMS system, and the gold back plate is used as a movable electrode and used for realizing different-degree convex deformation under the regulation and control of voltage; the geometric parameters of the antenna are obtained according to the initial focal length, the incident light wavelength and the generalized Snell's law required by the super-surface lens;
preferably, the antenna is metal or silicon or titanium dioxide or germanium;
preferably, the shape of the antenna is disc-shaped or square or circular depending on the polarization independent property;
Preferably, the shape of the antenna is strip-shaped or elliptic cylinder-shaped or V-shaped according to the polarization dependent property;
Preferably, the incident light is in the infrared band;
on the other hand, based on the electrostatic dynamically adjustable reflective zoom super-surface lens provided above, the invention provides a preparation method thereof, comprising:
(1) growing an ITO film on the glass substrate by a magnetron sputtering method;
(2) Performing gold evaporation on the surface of the ITO film by using an electron beam evaporation method;
(3) Preparing a gold antenna array structure on the gold surface obtained in the step (2) through glue homogenizing, exposure, development, etching and re-development in sequence;
(4) sequentially carrying out glue homogenizing, exposure and development on the surface of the sample wafer obtained in the step (3) to obtain a hollow insulating support structure, and exposing the area where the gold antenna is located and the position of the ITO film where voltage is applied;
(5) evaporating a silicon nitride film above the supporting structure, and depositing a silicon frame above the silicon nitride film to form a silicon frame silicon nitride film window;
The opening window of the silicon frame is opposite to the gold antenna, and the size of the opening window is larger than or equal to that of the gold antenna array; the silicon nitride film has no influence on the optical field of incident light;
(6) Evaporating a gold film above the silicon nitride film window of the silicon frame to form a movable electrode as a gold back plate;
(7) And fixing the silicon nitride film and the supporting structure to complete the manufacture of the electrostatic dynamic adjustable reflective zoom super-surface lens.
preferably, step (3) comprises:
(3.1) spin-coating a first photoresist on the gold surface obtained in the step (2) to form a photoresist surface;
(3.2) exposing the gold antenna array structural layout to the photoresist surface obtained in the step (3.1) through electron beam exposure equipment to form a sample wafer with patterns;
(3.3) developing the sample wafer with the pattern to obtain the sample wafer with the photoresist layer of the golden antenna array structure;
(3.4) etching the sample wafer with the photoresist layer of the gold antenna array structure to form a sample wafer with the gold antenna array structure;
And (3.5) removing the photoresist on the sample wafer with the gold antenna array structure by using a developing solution.
the step (4) specifically comprises the following steps:
(4.1) spin-coating a second photoresist on the surface of the sample wafer with the gold antenna array obtained in the step (3);
(4.2) carrying out exposure treatment on the sample wafer coated with the second photoresist in a rotating mode;
if the second photoresist is negative photoresist, the non-exposure area is the area where the gold antenna is located and the position where the voltage is applied to the ITO film; otherwise, the exposure area is the area where the gold antenna is located and the position where the voltage is applied to the ITO film;
(4.3) carrying out development treatment on the sample wafer exposed in the step (4.2) to obtain a hollow insulating support structure;
The second photoresist is a negative photoresist.
Preferably, the second photoresist is SU-8 photoresist.
through the technical scheme, compared with the prior art, the invention can obtain the following advantages
Has the advantages that:
(1) In the preparation process of the static super-surface lens, the processes of growing, exposing, etching and the like are difficult to avoid generating errors, the optical performance of the super-surface lens is influenced, and the focal length of the super-surface lens generates errors.
(2) For a non-integrated optical system, due to the fact that the error of the focal length of the super-surface lens exists, the super-surface lens needs to be correspondingly adjusted in the aspect of adjustment of the optical system, and therefore adjustment difficulty of the optical system is increased.
(3) For an integrated optical system, the position of the super-surface lens cannot be adjusted frequently, so that a focal length error generated in the preparation process of the static super-surface lens finally affects the whole integrated optical system to cause a system error.
Drawings
FIG. 1 is a cross-sectional view of an electrostatic dynamically adjustable reflective variable focus super surface lens provided in accordance with the present invention;
fig. 2 is a top view of a gold antenna array structure provided by the present invention;
FIG. 3 is a graph of focus variation of an electrostatic dynamically tunable reflective variable focus super-surface lens provided in accordance with the present invention at different voltages;
FIG. 4 is a flow chart of the process for manufacturing an electrostatic dynamically adjustable reflective variable focus super surface lens provided by the present invention;
FIG. 5 is a schematic diagram of the fabrication of an electrostatic dynamically tunable reflective variable focus super surface lens provided by the present invention;
FIG. 6 is a schematic diagram of the operation of an electrostatic dynamically adjustable reflective variable focus super surface lens provided by the present invention;
the same reference numbers will be used throughout the drawings to refer to the same or like elements or structures, wherein: 11-a glass substrate; 12-an ITO film; 13-a gold antenna array structure; 14-a first photoresist; 15-a support structure; 20-air gap; 21-silicon nitride film; 22-a silicon frame; 23-gold back plate.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
Example 1
As shown in fig. 1, the present embodiment provides an electrostatic dynamically adjustable reflective zoom super surface lens, including: the structure comprises a glass substrate 11, an ITO film 12, a gold antenna 13, a support structure 15, an air gap 20, a silicon nitride film 21, a silicon frame 22 and a gold back plate 23;
the ITO film 12 is positioned above the glass substrate 11, the gold antenna 13 is positioned in the middle position above the ITO film 12, the supporting structure 15 is positioned on the outer side of the gold antenna 13, the ITO film 12 and the gold back plate 23 are separated to form the air gap 20, and the position for applying voltage is arranged on the ITO film 12; the silicon nitride film 21 is positioned above the air gap 20, the silicon frame 22 is positioned above the silicon nitride film 21, and the gold back plate 23 is positioned above the silicon frame 22;
the gold antenna 13 is used for incident light phase regulation; the air gap 20 is used for providing a space for the deformation of the gold back plate 23, and the maximum deformation degree of the gold back plate 23 is one third of the thickness of the air gap 20; the support structure 15 is used to form the air gap 20; the silicon nitride film 21 and the silicon frame 22 are used for supporting the gold back plate 23; the gold back plate 23 is used as a positive electrode and the ITO film 12 is used as a negative electrode to form an electrostatic MEMS system, and the gold back plate 23 is used as a movable electrode and is used for realizing different degrees of convex deformation under the regulation and control of voltage; the geometric parameters of the antenna are obtained according to the initial focal length, the incident light wavelength and the generalized Snell's law required by the super-surface lens.
in this embodiment, the thickness of the ITO film 12 is 100nm, the thickness of the gold antenna 13 is 100nm, the unit period width of the gold antenna array structure is 2um, the thickness of the air gap 20 is 2um, and the thickness of the gold back plate 23 is 200 nm.
the reflection-type super-surface structure generally comprises an antenna, an intermediate medium and a reflection metal back plate, wherein the antenna is generally an array consisting of structural units with a certain period and different duty ratios, and different duty ratios provide different phase abrupt change values, so that the whole array generates different phase profiles, and finally, light focusing is realized.
the common shape of the antenna is generally disc-shaped, square-shaped, circular-ring-shaped and the like according to the polarization-independent characteristic, and is generally strip-shaped, elliptic cylinder-shaped, V-shaped and the like according to the polarization-dependent characteristic, as shown in fig. 2, in this embodiment, the disc structure is adopted in consideration of the polarization-independent characteristic, and actually, according to the realized function, the antenna is not limited to the shape structure, but other structures can be adopted; the antenna material usually includes metals such as gold, silver, aluminum, and the like, or media such as silicon, titanium dioxide, germanium, and the like, different kinds of materials can be selected according to the wavelength of incident light, in this embodiment, it is considered that the incident light is an infrared band, and the antenna material is metal gold, and according to the application, the incident light is not limited to the infrared band, and other bands can also adopt the structure, and also not limited to the material, and other materials can also realize the function of incident light phase adjustment and control.
considering that the gold back plate 23 needs to deform under voltage regulation, the intermediate medium is air, i.e. the air gap 20.
The gold back plate 23 is used as a reflector, so that incident light can be reflected, and according to the dynamic regulation and control characteristics of the reflective super-surface structure, under the action of different voltages, the gold back plate 23 is used as a movable electrode to deform towards the fixed electrode of the ITO thin film 12 to different degrees, so that the phase of a reflected light field changes, and the focal position is changed.
the relation between the radius and the phase of the disk of the unit structure of the golden antenna 13 is obtained through calculation according to a finite time domain difference calculation method, the focal length is set to be 50um, the wavelength of incident monochromatic light is 3.83um, and the radius of each disk of the unit structure of the array today is determined according to the generalized Snell's law.
and (3) acquiring the convex deformation generated by the gold back plate 23 under different voltages according to the simulation of the finite element algorithm of the electrostatic field and the structural mechanics, so that the phase distribution of the reflected light field generated by the gold back plate 23 under different voltages is changed, and finally obtaining the focal length of the super-surface lens under different voltages. As can be seen from FIG. 3, the wavelength of the normal incident light is 3.83um, and the focal length of any linearly polarized light generated by the super-surface lens under the voltage of 0-190V is 50 um-67 um.
Based on the electrostatic dynamically adjustable reflective zoom super-surface lens, the present embodiment discloses a flowchart of a manufacturing method shown in fig. 4 and a manufacturing method shown in fig. 5, including:
s101, growing an ITO film 12 with the thickness of 100nm on a glass substrate 11 by using a magnetron sputtering method;
s102, evaporating a 50nm gold thin film 13 on the surface of the ITO thin film 12 by using an electron beam evaporation method;
S103, spin-coating a first photoresist 14 on the surface of the gold thin film 13 obtained in the step S102 to form a photoresist surface;
s104, exposing the photoresist surface obtained in the step S103 by the gold antenna array structural layout through electron beam exposure equipment to form a sample wafer with a pattern;
the exposure area is shown as the diagonally shaded area in step S104 of FIG. 5; the specific parameters of the gold antenna array structure are determined by the wavelength of incident light, the required focal length and the generalized Snell's law;
s105, developing the sample wafer with the pattern to obtain the sample wafer with the photoresist layer of the gold antenna array structure; as shown in step S105 of fig. 5, 14 is denoted as a photoresist pattern after development processing;
S106, etching the sample wafer of the photoresist layer with the gold antenna array structure to form the sample wafer with the gold antenna array structure; as shown in step S106 of fig. 5, the portion of the gold film 13 not covered by the photoresist pattern 14 is etched away to form a gold antenna array structure;
S107, removing the photoresist on the sample wafer with the gold antenna array structure by using a developing solution; as shown in step S107 of fig. 5, the photoresist 14 is present on the surface of the sample wafer having the gold antenna array structure, and is removed to leave the gold antenna array structure;
S108, spin-coating SU-8 photoresist on the surface of the sample wafer with the gold antenna array obtained in the step S107; as shown in step S108 of fig. 5, the SU-8 photoresist is a relatively thick negative photoresist having insulation property, and can be used for manufacturing the support structure 15 of the microbridge;
the support structure 15 can be made of SU-8 photoresist, but the support structure 15 is not limited to the SU-8 photoresist, and the photoresist for the support structure 15 can be prepared, so that the expression is convenient, and the photoresist can be collectively referred to as second photoresist;
s109, carrying out exposure treatment on the sample wafer coated with SU-8 photoresist in a rotating mode; since SU-8 is a negative resist, the non-exposed regions are removed during subsequent development and the exposed regions are retained. Therefore, the non-exposure area is the area where the gold antenna is located and the position where the voltage is applied to the ITO film; the exposure area is shown by the hatched area of step S109 in fig. 5;
s110, developing the exposed sample wafer in the step S109 to obtain a hollow insulating support structure; after the development, as shown in step S110 in fig. 5, the photoresist region that is not exposed in step S110 in fig. 5 is removed by the developing solution, and the exposed photoresist region is retained to form the insulating support structure 15 as shown in the figure, so as to realize the air gap 20 required for the deformation of the gold back plate 23; meanwhile, the photoresist 15 on the partial edge of the ITO film 12 is also removed, so that the photoresist is exposed, and the ITO electrode is convenient to feed electricity;
S201, evaporating a silicon nitride film 21 on a silicon substrate, corroding the side without the silicon nitride film 21 in the direction with the silicon nitride film by using silicon corrosion liquid until the silicon nitride film 21 is exposed, corroding and removing the middle area of silicon to form a silicon frame 22, and finally forming a silicon frame silicon nitride film window; as shown in step S201 of fig. 5, the silicon frame silicon nitride film window includes a silicon nitride film 21 and a silicon frame 22, the opening of the silicon frame 22 faces the gold antenna 13, and the size of the opening is greater than or equal to the size of the array of the gold antenna 13, in other words, the silicon frame 22 is obtained by etching off the middle region of a whole silicon crystal, and the silicon nitride film 21 below after etching is exposed; the silicon nitride film 21 is thin and has high transmittance for a wide spectrum, and has no influence on the light field of transmitted light, so the silicon nitride film 21 is usually used as a transparent window under the wide spectrum; the silicon frame silicon nitride film window is mainly used as a substrate and a supporting structure for growing the gold film 23 in the invention, and does not influence an incident light field;
s202, evaporating a gold film above the silicon frame silicon nitride film window to form a movable electrode as a gold back plate 23; as shown in step S202 of fig. 5, a gold film is deposited on the top surface of step S201, and uniformly covers the top surfaces of the silicon nitride film 21 and the silicon frame 22 to serve as a movable electrode; meanwhile, the gold film on the silicon frame silicon nitride film window is used as a reflector to reflect incident light; when voltage is applied between the gold back plate 23 and the ITO thin film 12 electrode, the gold back plate 23 is convexly deformed towards the ITO thin film electrode, and convex mirrors with different curvatures are formed according to the voltage, so that the phase of a reflected light field is changed in different degrees, and the change of a focus is realized;
s203, fixing the silicon nitride film 21 and the supporting structure 15 to complete the manufacture of the electrostatic dynamic adjustable reflective zoom super-surface lens.
based on the method for manufacturing the electrostatic dynamically adjustable reflective zoom super-surface lens, as shown in fig. 6, after parallel light incident from the direction 01 is perpendicularly incident to the gold antenna array structure, the gold antenna array structure determined according to the generalized snell's law generates a phase section with a spherical wave shape, so that light is converged. When no voltage is applied, the gold back plate is in a horizontal state, incident light is converged along the direction of a solid line 02 after passing through the gold antenna array, is emitted along the direction of a solid line 03 after being reflected by the gold back plate 23 according to Snell's law, is converged through the gold antenna array structure 13 again, and is finally emitted along the direction of a solid line 04 and converged into one point; when voltage is applied, the gold back plate 23 is convexly deformed towards the direction of the ITO film motor along the virtual line shown in FIG. 6, at the moment, when no pardon exists along the direction 01, the light is converged by the gold antenna array and then enters the convex gold back plate 23 along the direction of the virtual line 05, and after reflection, the light exits along the direction of the virtual line 06 according to Snell's law due to the diffusion effect of the convex mirror, is converged by the gold antenna array again, and finally is converged into a point along the direction of the virtual line 07. When the voltages are different, the gold back plate 23 has different deformation degrees, so that the reflection phase distribution of light rays is affected differently when the reflection is changed, and the regulation and control of the focus are realized.
to sum up, in the preparation process of the static super-surface lens, the processes of growth, exposure, etching and the like are difficult to avoid generating errors, the optical performance of the super-surface lens is affected, and the focal length of the super-surface lens generates errors.
for a non-integrated optical system, the traditional method has the error of the focal length of the super-surface lens, so that the super-surface lens needs to be correspondingly adjusted in the aspect of the adjustment of the optical system, and the adjustment difficulty of the optical system is increased. For an integrated optical system, the position of the super-surface lens cannot be adjusted frequently, so that a focal length error generated in the preparation process of the static super-surface lens finally affects the whole integrated optical system to cause a system error.
it will be understood by those skilled in the art that the foregoing is only a preferred embodiment of the present invention, and is not intended to limit the invention, and that any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (8)
1. an electrostatic dynamically adjustable reflective variable focus super surface lens comprising: the antenna comprises a glass substrate (11), an ITO film (12), an antenna, a support structure (15), an air space (20), a silicon nitride film (21), a silicon frame (22) and a gold back plate (23);
the ITO film (12) is positioned above the glass substrate (11), the antenna is positioned in the middle position above the ITO film (12), the supporting structure is positioned on the outer side of the antenna, the air gap (20) is formed by separating the ITO film (12) and the gold back plate (23), and a position for applying voltage is arranged on the ITO film (12); the silicon nitride film (21) is positioned above the air gap (20), the silicon frame (22) is positioned above the silicon nitride film (21), and the gold back plate (23) is positioned above the silicon frame (22);
the antenna is used for incident light phase regulation and control; the air gap (20) is used for providing a space for deformation of the gold back plate (23), and the maximum deformation degree of the gold back plate (23) is one third of the thickness of the air gap (20); the support structure is used for forming the air gap (20); the silicon nitride film (21) and the silicon frame (22) are used for supporting the gold back plate (23); the gold back plate (23) is used as a positive electrode, the ITO film (12) is used as a negative electrode to form an electrostatic MEMS system, and the gold back plate (23) is used as a movable electrode and is used for realizing different-degree convex deformation under the regulation and control of voltage; the geometric parameters of the antenna are obtained according to the initial focal length, the incident light wavelength and the generalized Snell's law required by the super-surface lens.
2. the electrostatic dynamically adjustable reflective variable focus super surface lens of claim 1, wherein said antenna is metal or silicon or titanium dioxide or germanium.
3. The electrostatic dynamically adjustable reflective variable focus super surface lens according to claim 1 or 2, wherein said antenna has a shape according to polarization independent property that is disc-shaped or square-shaped or circular-ring-shaped, and said antenna has a shape according to polarization dependent property that is bar-shaped or elliptic cylinder-shaped or V-shaped.
4. the electrostatic dynamically tunable reflective zoom super surface lens of any of claims 1 to 3, wherein the incident light is in the infrared band.
5. The method for manufacturing an electrostatic dynamically adjustable reflective zoom super surface lens according to claim 1, comprising:
(1) growing an ITO film (12) above a glass substrate (11) by utilizing a magnetron sputtering method;
(2) performing gold evaporation on the surface of the ITO film (12) by using an electron beam evaporation method;
(3) preparing a gold antenna array structure on the gold surface obtained in the step (2) through glue homogenizing, exposure, development, etching and re-development in sequence;
(4) sequentially carrying out glue homogenizing, exposure and development on the surface of the sample wafer obtained in the step (3) to obtain a hollow insulating support structure, and exposing the area where the gold antenna (13) is located and the position where the ITO thin film (12) applies voltage;
(5) evaporating a silicon nitride film (21) above the supporting structure, and depositing a silicon frame (22) above the silicon nitride film (21) to form a silicon frame silicon nitride film window;
the opening window of the silicon frame (22) is opposite to the gold antenna (13), and the size of the opening window is larger than or equal to that of the gold antenna (13) array; the silicon nitride film (21) has no influence on the optical field of incident light;
(6) A gold film is evaporated above the silicon frame silicon nitride film window to form a movable electrode as a gold back plate (23);
(7) and fixing the silicon nitride film (21) with the supporting structure (15) to complete the manufacture of the electrostatic dynamic adjustable reflective zoom super-surface lens.
6. The production method according to claim 5, wherein the step (3) includes:
(3.1) spin-coating a first photoresist (14) on the gold surface obtained in the step (2) to form a photoresist surface;
(3.2) exposing the gold antenna array structural layout to the photoresist surface obtained in the step (3.1) through electron beam exposure equipment to form a sample wafer with patterns;
(3.3) developing the sample wafer with the pattern to obtain the sample wafer with the photoresist layer of the golden antenna array structure;
(3.4) etching the sample wafer with the photoresist layer of the gold antenna array structure to form a sample wafer with the gold antenna array structure;
And (3.5) removing the photoresist on the sample wafer with the gold antenna array structure by using a developing solution.
7. The production method according to claim 5 or 6, wherein the step (4) includes:
(4.1) spin-coating a second photoresist on the surface of the sample wafer with the gold antenna array obtained in the step (3);
(4.2) carrying out exposure treatment on the sample wafer coated with the second photoresist in a rotating mode; if the second photoresist is negative photoresist, the non-exposure area is the area where the gold antenna is located and the position where the voltage is applied to the ITO film; otherwise, the exposure area is the area where the gold antenna is located and the position where the voltage is applied to the ITO film;
and (4.3) carrying out development treatment on the sample wafer exposed in the step (4.2) to obtain the hollow insulating support structure.
8. The method according to claim 7, wherein the second photoresist is SU-8 photoresist.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN113687453A (en) * | 2021-07-27 | 2021-11-23 | 华南理工大学 | Variable-focus near-infrared super-surface lens and control method thereof |
| CN114966916A (en) * | 2022-06-27 | 2022-08-30 | 清华大学深圳国际研究生院 | Polarization-independent super-resolution super-structured lens and manufacturing method thereof |
| WO2024069335A1 (en) * | 2022-09-30 | 2024-04-04 | 3M Innovative Properties Company | Lens and antenna assembly |
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