CN110568610A - An electrostatic dynamic adjustable reflective zoom metasurface lens and its preparation method - Google Patents
An electrostatic dynamic adjustable reflective zoom metasurface lens and its preparation method Download PDFInfo
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- 229910052737 gold Inorganic materials 0.000 claims abstract description 120
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- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/06—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
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Abstract
Description
技术领域technical field
本发明属于动态可调超表面领域,更具体地,涉及一种静电式动态可调反射式变焦超表面透镜及其制备方法。The invention belongs to the field of dynamically adjustable metasurfaces, and more specifically relates to an electrostatic dynamic adjustable reflective zoom metasurface lens and a preparation method thereof.
背景技术Background technique
超表面作为一种新型的二维材料,可以对电磁波的振幅、相位、偏振和涡旋等多种性质进行调控,具有体积小、厚度薄和多功能特性,并且超表面和CMOS工艺相兼容,具有广泛的应用前景。As a new type of two-dimensional material, the metasurface can regulate the amplitude, phase, polarization, and vortex of electromagnetic waves. It has the characteristics of small size, thin thickness and multifunctionality, and the metasurface is compatible with CMOS technology. It has broad application prospects.
静态超表面透镜由于在制备过程中的生长、曝光和刻蚀过程易引入误差,使得最终焦距和设计焦距产生偏移造成误差。该误差使得超表面透镜成品率降低。Static metasurface lens is easy to introduce errors due to the growth, exposure and etching processes in the preparation process, which makes the final focal length and design focal length offset and cause errors. This error reduces the yield of the metasurface lens.
微机电系统(MEMS)通常利用液晶、石墨烯、机械、热变、静电等方式,可以在微小尺度上实现对器件的动态调控,经过一段时间发展已经越来越成熟,可以应用到微型光学器件上实现微光机电系统(MEMOS),而MEMS的工艺和超表面的工艺相互兼容,因此,将超表面和MEMS相结合实现动态可调超表面势必是未来发展的趋势。Micro-electromechanical systems (MEMS) usually use liquid crystal, graphene, machinery, thermal change, static electricity, etc. to achieve dynamic control of devices on a small scale. After a period of development, they have become more and more mature and can be applied to micro-optical devices. Micro-opto-electromechanical systems (MEMOS) are realized on the surface, and the technology of MEMS and metasurface are compatible with each other. Therefore, the combination of metasurface and MEMS to realize dynamically tunable metasurface is bound to be the trend of future development.
常见的动态调控方式通常有液晶式、石墨烯式、机械式和热变式等等,其中,液晶式通过调整电压改变液晶方向实现动态调控,缺点在于液晶的响应速度较低,通常在毫秒级;石墨烯式通过调整石墨烯的费米能级实现动态调控,缺点在于石墨烯和传统的CMOS工艺不兼容,在现有的工业基础下很难大规模生产,并且石墨烯成本较高;机械式通过机械臂拉伸可形变介质实现动态调控,缺点在于附加的机械装置占用体积较大;热变式通过不同热膨胀系数的材料结合,控制温度变化实现结构动态调控,缺点在于系统结构冷却时间难以控制且速度较慢导致调控速度受限,并且在红外波段会产生较大的热噪声而无法应用。Common dynamic regulation methods usually include liquid crystal type, graphene type, mechanical type, thermal variable type, etc. Among them, the liquid crystal type realizes dynamic regulation by adjusting the voltage to change the direction of the liquid crystal. The disadvantage is that the response speed of the liquid crystal is low, usually in milliseconds. ; The graphene formula realizes dynamic control by adjusting the Fermi level of graphene. The disadvantage is that graphene is not compatible with traditional CMOS technology, and it is difficult to produce on a large scale under the existing industrial foundation, and the cost of graphene is relatively high; The mechanical arm stretches the deformable medium to achieve dynamic regulation. The disadvantage is that the additional mechanical device occupies a large volume. The thermal variable method uses materials with different thermal expansion coefficients to control temperature changes to achieve dynamic regulation of the structure. The disadvantage is that the cooling time of the system structure is difficult. The control and the slow speed lead to the limitation of the control speed, and it will generate large thermal noise in the infrared band, which cannot be applied.
综上所述,静态超表面透镜由于焦距不可调控将导致成品率低,以及现有动态调控技术存在响应速度低、成本高、生产技术不成熟、体积占用较大、适用波段有限等缺点。To sum up, the uncontrollable focal length of static metasurface lenses will lead to low yield, and the existing dynamic control technology has disadvantages such as low response speed, high cost, immature production technology, large volume occupation, and limited applicable wavelength bands.
发明内容Contents of the invention
针对现有技术的缺陷,本发明的目的在于提供一种静电式动态可调反射式变焦超表面透镜及其制备方法,旨在解决现有的静态超表面透镜焦距不可调控导致的成品率较低的问题。In view of the defects of the prior art, the purpose of the present invention is to provide an electrostatic dynamic adjustable reflective zoom metasurface lens and its preparation method, aiming to solve the problem of low yield caused by the non-adjustable focal length of the existing static metasurface lens The problem.
为实现上述目的,本发明提供了一种静电式动态可调反射式变焦超表面透镜,包括:玻璃衬底、ITO(Indium Tin Oxide,掺锡氧化铟)薄膜、天线、空气间隙、支撑结构、氮化硅薄膜、硅框架和金背板;To achieve the above object, the present invention provides an electrostatic dynamic adjustable reflective zoom metasurface lens, comprising: glass substrate, ITO (Indium Tin Oxide, tin-doped indium oxide) film, antenna, air gap, support structure, Silicon nitride film, silicon frame and gold backplane;
ITO薄膜位于玻璃衬底上方,天线位于ITO薄膜上方的中间位置,支撑结构位于天线的外侧,在ITO薄膜和金背板分隔开形成空气间隙,ITO薄膜上设置施加电压的位置;氮化硅薄膜位于空气间隙上方,硅框架位于氮化硅薄膜的上方,金背板位于硅框架上方;The ITO film is located above the glass substrate, the antenna is located in the middle above the ITO film, and the support structure is located outside the antenna. The ITO film and the gold backplane are separated to form an air gap, and the position for applying voltage is set on the ITO film; silicon nitride The film is over the air gap, the silicon frame is over the silicon nitride film, and the gold backplane is over the silicon frame;
天线用于入射光相位调控;空气间隙用于提供金背板变形的空间,金背板的最大变形程度为空气间隙厚度的三分之一;支撑结构用于形成空气间隙;氮化硅薄膜和硅框架用于支撑金背板;金背板作为正电极且ITO薄膜作为负电极构成静电式MEMS系统,金背板为活动电极,用于在电压的调控下实现不同程度的凸起形变;天线的几何参数根据超表面透镜所需初始焦距、入射光波长和广义斯涅耳定律获取;The antenna is used to adjust the phase of the incident light; the air gap is used to provide space for the deformation of the gold backplane, and the maximum deformation of the gold backplane is one third of the thickness of the air gap; the support structure is used to form the air gap; the silicon nitride film and The silicon frame is used to support the gold backplane; the gold backplane is used as the positive electrode and the ITO film is used as the negative electrode to form an electrostatic MEMS system. The geometric parameters of are obtained according to the initial focal length required by the metasurface lens, the wavelength of the incident light and the generalized Snell's law;
优选地,天线为金属或硅或二氧化钛或锗;Preferably, the antenna is metal or silicon or titanium dioxide or germanium;
优选地,天线的形状根据偏振无关特性为圆盘形或方形或圆环形;Preferably, the shape of the antenna is disc-shaped or square-shaped or circular-shaped according to the polarization-independent characteristic;
优选地,天线的形状根据偏振相关特性为条形或椭圆柱形或V形;Preferably, the shape of the antenna is strip-shaped or elliptical-cylindrical or V-shaped according to polarization-related characteristics;
优选地,入射光为红外波段;Preferably, the incident light is in the infrared band;
另一方面,基于上述提供的一种静电式动态可调反射式变焦超表面透镜,本发明提出了其制备方法,包括:On the other hand, based on the electrostatic dynamic adjustable reflective zoom metasurface lens provided above, the present invention proposes its preparation method, including:
(1)利用磁控溅射方法在玻璃衬底上方生长ITO薄膜;(1) Utilize the magnetron sputtering method to grow an ITO thin film above the glass substrate;
(2)利用电子束蒸镀方法在ITO薄膜表面蒸镀金;(2) Utilize the electron beam evaporation method to evaporate gold on the ITO thin film surface;
(3)在步骤(2)获取的金表面依次通过匀胶、曝光、显影、刻蚀和再显影,制备金天线阵列结构;(3) The gold surface obtained in step (2) is sequentially passed through uniform glue, exposure, development, etching and redevelopment to prepare a gold antenna array structure;
(4)在步骤(3)获取的样片表面依次通过匀胶、曝光和显影,获取中空的绝缘支撑结构,将金天线所在区域以及ITO薄膜施加电压的位置裸露;(4) The surface of the sample sheet obtained in step (3) is sequentially passed through uniform glue, exposure and development to obtain a hollow insulating support structure, and expose the area where the gold antenna is located and the position where the voltage is applied to the ITO film;
(5)在支撑结构上方蒸镀氮化硅薄膜,并在氮化硅薄膜上方沉积硅框架,形成硅框架氮化硅薄膜窗口;(5) Evaporate a silicon nitride film on the support structure, and deposit a silicon frame on the top of the silicon nitride film to form a silicon frame silicon nitride film window;
硅框架的开窗口正对金天线,且开窗口大小大于等于金天线阵列的大小;氮化硅薄膜对入射光的光场无影响;The opening window of the silicon frame is facing the gold antenna, and the size of the opening window is greater than or equal to the size of the gold antenna array; the silicon nitride film has no effect on the light field of the incident light;
(6)在硅框架氮化硅薄膜窗口上方蒸镀金薄膜,形成活动电极作为金背板;(6) Evaporate a gold film above the silicon nitride film window of the silicon frame to form a movable electrode as a gold backplane;
(7)将氮化硅薄膜与支撑结构固定,完成静电式动态可调反射式变焦超表面透镜的制作。(7) Fix the silicon nitride film and the support structure to complete the fabrication of the electrostatic dynamic adjustable reflective zoom metasurface lens.
优选地,步骤(3)包括:Preferably, step (3) includes:
(3.1)在步骤(2)获取的金表面旋涂第一光刻胶,形成光刻胶面;(3.1) Spin-coat the first photoresist on the gold surface obtained in step (2) to form a photoresist surface;
(3.2)将金天线阵列结构版图通过电子束曝光设备对步骤(3.1)获取的光刻胶面曝光,形成具有图案的样片;(3.2) exposing the photoresist surface obtained in step (3.1) through electron beam exposure equipment to the gold antenna array structure layout to form a patterned sample;
(3.3)将具有图案的样片进行显影,获取具有金天线阵列结构的光刻胶层的样片;(3.3) develop the sample with pattern, and obtain the sample of photoresist layer with gold antenna array structure;
(3.4)在具有金天线阵列结构的光刻胶层的样片上刻蚀,形成具有金天线阵列结构的样片;(3.4) Etching on the sample sheet of the photoresist layer with the gold antenna array structure to form a sample sheet with the gold antenna array structure;
(3.5)利用显影液将具有金天线阵列结构的样片上的光刻胶去除。(3.5) Remove the photoresist on the sample sheet with the gold antenna array structure using a developing solution.
步骤(4)具体包括:Step (4) specifically includes:
(4.1)在步骤(3)获取的具有金天线阵列的样片表面旋涂第二光刻胶;(4.1) Spin-coat the second photoresist on the sample surface with the gold antenna array obtained in step (3);
(4.2)对旋涂有第二光刻胶的样片进行曝光处理;(4.2) Carry out exposure treatment to the sample piece that is spin-coated with the second photoresist;
若第二光刻胶为负光刻胶,则非曝光区域为金天线所在区域以及ITO薄膜施加电压的位置;否则,曝光区域为金天线所在区域以及ITO薄膜施加电压的位置;If the second photoresist is a negative photoresist, the non-exposed area is the area where the gold antenna is located and the position where the voltage is applied to the ITO film; otherwise, the exposed area is the area where the gold antenna is located and the position where the voltage is applied to the ITO film;
(4.3)对步骤(4.2)曝光后的样片进行显影处理,获取中空的绝缘支撑结构;(4.3) Developing the sample after exposure in step (4.2) to obtain a hollow insulating support structure;
第二光刻胶为负光刻胶。The second photoresist is a negative photoresist.
优选地,第二光刻胶为SU-8光刻胶。Preferably, the second photoresist is SU-8 photoresist.
通过本发明所构思的以上技术方案,与现有技术相比,能够取得以下Through the above technical solutions conceived in the present invention, compared with the prior art, the following can be obtained
有益效果:Beneficial effect:
(1)静态超表面透镜在制备过程中,生长、曝光和刻蚀等工艺难以避免产生误差,影响超表面透镜的光学性能,使超表面透镜焦距产生误差,本发明提出基于MEMS的静电式动态可调反射式变焦超表面透镜可以解决静态超表面透镜焦距不可调的问题,由于透镜焦距不合格造成的成品可通过改变ITO薄膜和金背板之间的电压,调节静态超表面透镜焦距使其符合标准,因此,提高了整体的成品率。(1) In the preparation process of the static metasurface lens, it is difficult to avoid errors in processes such as growth, exposure, and etching, which affect the optical performance of the metasurface lens and cause errors in the focal length of the metasurface lens. The present invention proposes an electrostatic dynamic method based on MEMS. The adjustable reflective zoom metasurface lens can solve the problem that the focal length of the static metasurface lens cannot be adjusted. The finished product caused by the unqualified focal length of the lens can be adjusted by changing the voltage between the ITO film and the gold backplane. Compliance with standards, therefore, improves the overall yield.
(2)对于非集成光学系统,由于存在超表面透镜焦距的误差,因此,超表面透镜在光学系统的装调方面需要进行相应的调整,导致光学系统的装调难度增大,本发明即使存在超表面透镜焦距的误差,也可以通过调节ITO薄膜和金背板之间的电压克服,并不需要在光学系统的装调方面做相应的调整。(2) For non-integrated optical systems, due to the error of the focal length of the metasurface lens, the metasurface lens needs to be adjusted accordingly in the installation and adjustment of the optical system, resulting in an increased difficulty in the installation and adjustment of the optical system. Even if the present invention exists The error of the focal length of the metasurface lens can also be overcome by adjusting the voltage between the ITO film and the gold backplane, and there is no need to make corresponding adjustments in the adjustment of the optical system.
(3)对于集成光学系统,往往无法调整超表面透镜的位置,因此静态超表面透镜制备过程中产生的焦距误差最终对整个集成光学系统产生影响,造成系统误差,本发明可以通过调节ITO薄膜和金背板之间的电压改变焦距,校正焦距误差,最终减小系统误差。(3) For the integrated optical system, it is often impossible to adjust the position of the metasurface lens, so the focal length error produced in the preparation process of the static metasurface lens finally affects the entire integrated optical system, causing system errors. The present invention can adjust the ITO thin film and The voltage between the gold backplates changes the focal length, corrects the focal length error, and ultimately reduces the system error.
附图说明Description of drawings
图1是本发明提供的静电式动态可调反射式变焦超表面透镜的结构剖视图;Fig. 1 is the structural cross-sectional view of electrostatic dynamic adjustable reflective zoom metasurface lens provided by the present invention;
图2是本发明提供的金天线阵列结构俯视图;Fig. 2 is a top view of the gold antenna array structure provided by the present invention;
图3是本发明提供的静电式动态可调反射式变焦超表面透镜在不同电压下的焦点变化图;Fig. 3 is the focal change diagram of the electrostatic dynamic adjustable reflective zoom metasurface lens provided by the present invention under different voltages;
图4是本发明提供的静电式动态可调反射式变焦超表面透镜的制备流程图;Fig. 4 is the preparation flowchart of the electrostatic dynamic adjustable reflective zoom metasurface lens provided by the present invention;
图5是本发明提供的静电式动态可调反射式变焦超表面透镜的制备示意图;Fig. 5 is a schematic diagram of the preparation of the electrostatic dynamic adjustable reflective zoom metasurface lens provided by the present invention;
图6是本发明提供的静电式动态可调反射式变焦超表面透镜的工作示意图;Fig. 6 is a working schematic diagram of the electrostatic dynamic adjustable reflective zoom metasurface lens provided by the present invention;
在所有附图中,相同的附图标记代表相同的元件或结构,其中:11-玻璃衬底;12-ITO薄膜;13-金天线阵列结构;14-第一光刻胶;15-支撑结构;20-空气间隙;21-氮化硅薄膜;22-硅框架;23-金背板。In all the drawings, the same reference numerals represent the same elements or structures, wherein: 11-glass substrate; 12-ITO film; 13-gold antenna array structure; 14-first photoresist; 15-support structure ; 20-air gap; 21-silicon nitride film; 22-silicon frame; 23-gold backplane.
具体实施方式Detailed ways
为了使本发明的目的、技术方案及优点更加清楚明白,以下结合附图及实施例,对本发明进行进一步详细说明。应当理解,此处所描述的具体实施例仅仅用以解释本发明,并不用于限定本发明。In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
实施例1Example 1
如图1所示,本实施例提供了一种静电式动态可调反射式变焦超表面透镜,包括:玻璃衬底11、ITO薄膜12、金天线13、支撑结构15、空气间隔20、氮化硅薄膜21、硅框架22和金背板23;As shown in Figure 1, the present embodiment provides an electrostatic dynamic adjustable reflective zoom metasurface lens, comprising: glass substrate 11, ITO film 12, gold antenna 13, support structure 15, air spacer 20, nitrided Silicon film 21, silicon frame 22 and gold backplane 23;
ITO薄膜12位于所述玻璃衬底11上方,金天线13位于ITO薄膜12上方的中间位置,所述支撑结构15位于金天线13的外侧,在ITO薄膜12和金背板23分隔开形成所述空气间隙20,ITO薄膜12上设置施加电压的位置;氮化硅薄膜21位于空气间隙20上方,硅框架22位于氮化硅薄膜21的上方,金背板23位于硅框架22上方;The ITO film 12 is located above the glass substrate 11, the gold antenna 13 is located in the middle above the ITO film 12, the support structure 15 is located outside the gold antenna 13, and the ITO film 12 and the gold backplane 23 are separated to form the Above the air gap 20, the ITO film 12 is provided with a position for applying voltage; the silicon nitride film 21 is located above the air gap 20, the silicon frame 22 is located above the silicon nitride film 21, and the gold backplane 23 is located above the silicon frame 22;
金天线13用于入射光相位调控;空气间隙20用于提供金背板23变形的空间,金背板23的最大变形程度为所述空气间隙20厚度的三分之一;支撑结构15用于形成所述空气间隙20;氮化硅薄膜21和硅框架22用于支撑所述金背板23;金背板23作为正电极且ITO薄膜12作为负电极构成静电式MEMS系统,金背板23为活动电极,用于在电压的调控下实现不同程度的凸起形变;所述天线的几何参数根据超表面透镜所需初始焦距、入射光波长和广义斯涅耳定律获取。The gold antenna 13 is used to adjust the phase of the incident light; the air gap 20 is used to provide a space for the deformation of the gold back plate 23, and the maximum deformation degree of the gold back plate 23 is one-third of the thickness of the air gap 20; the support structure 15 is used for The air gap 20 is formed; the silicon nitride film 21 and the silicon frame 22 are used to support the gold back plate 23; the gold back plate 23 is used as a positive electrode and the ITO film 12 is used as a negative electrode to form an electrostatic MEMS system, and the gold back plate 23 It is an active electrode, which is used to realize different degrees of convex deformation under the regulation of voltage; the geometric parameters of the antenna are obtained according to the initial focal length required by the metasurface lens, the wavelength of incident light, and the generalized Snell's law.
本实施例中,ITO薄膜12的厚度为100nm,金天线13厚度为100nm,金天线阵列结构的单元周期宽度为2um,空气间隙20厚度为2um,金背板23的厚度为200nm。In this embodiment, the thickness of the ITO film 12 is 100nm, the thickness of the gold antenna 13 is 100nm, the unit period width of the gold antenna array structure is 2um, the thickness of the air gap 20 is 2um, and the thickness of the gold backplane 23 is 200nm.
反射式超表面结构,通常由天线、中间介质和反射金属背板组成,其中,天线通常为具有一定周期的占空比不同的结构单元组成的阵列,不同的占空比提供不同的相位突变值,使得整个阵列产生不同的相位剖面,最终实现光的聚焦。A reflective metasurface structure is usually composed of an antenna, an intermediate medium, and a reflective metal backplane. The antenna is usually an array of structural units with different duty ratios with a certain period, and different duty ratios provide different phase mutation values. , so that the entire array produces different phase profiles, and finally realizes the focusing of light.
常见的天线形状根据偏振无关特性通常由圆盘形、方形和圆环形等,根据偏振相关特性通常由条形、椭圆柱形和V形等,如图2所示,在本实施例中,考虑偏振无关特性,采用圆盘结构,实际上根据所实现的功能,并不限于该形状结构,仍可采用其他结构;天线材料通常包括金属如金、银和铝等或者介质如硅、二氧化钛和锗等,根据入射光的波长可选用不同种类的材料,本实施例中考虑入射光为红外波段,采用天线的材料为金属金,实际根据用途,入射光并不限于红外波段,其他波段也可采用该结构,也不限于该材料,其他材料也可以实现入射光相位调控的功能。Common antenna shapes are usually disc-shaped, square, and circular according to polarization-independent characteristics, and are usually strip-shaped, elliptical cylindrical, and V-shaped according to polarization-dependent characteristics, as shown in Figure 2. In this embodiment, Considering the polarization-independent characteristics, the disk structure is adopted. In fact, according to the realized function, it is not limited to this shape structure, and other structures can still be used; antenna materials usually include metals such as gold, silver and aluminum, or dielectrics such as silicon, titanium dioxide and Germanium, etc., different types of materials can be selected according to the wavelength of the incident light. In this embodiment, the incident light is considered to be in the infrared band, and the material of the antenna is metal gold. According to the actual application, the incident light is not limited to the infrared band, and other bands can also be used. Adopting this structure is not limited to this material, and other materials can also realize the function of adjusting the phase of incident light.
考虑金背板23在电压调控下需要发生形变,因此中间介质为空气,即空气间隙20。Considering that the gold backplane 23 needs to be deformed under voltage control, the intermediate medium is air, that is, the air gap 20 .
金背板23作为反射镜,可是得入射光发生反射,根据本反射式超表面结构的动态调控特性,在不同电压作用下,金背板23作为活动电极向ITO薄膜12固定电极方向发生不同程度的形变,使得反射光场的相位发生变化,以此改变焦点位置。The gold back plate 23 is used as a reflector, but the incident light is reflected. According to the dynamic control characteristics of the reflective metasurface structure, under different voltages, the gold back plate 23 acts as a movable electrode to the direction of the fixed electrode of the ITO film 12 to different degrees. The deformation of the reflected light field changes the phase, thereby changing the focus position.
根据有限时域差分计算法计算获取金天线13单元结构圆盘半径和相位关系,并由设定焦距为50um,入射单色光波长为3.83um,根据广义斯涅耳定律确定今天阵列每个单元结构圆盘的半径。According to the finite time domain difference calculation method, the radius and phase relationship of the 13-unit structure of the gold antenna are calculated, and the focal length is set to 50um, and the wavelength of the incident monochromatic light is 3.83um. According to the generalized Snell’s law, each unit of today’s array is determined. The radius of the structure disk.
根据静电场和结构力学有限元算法仿真获取在不同电压下金背板23产生的凸起形变,使得在不同电压下金背板23产生的反射光场相位分布发生改变,最终得到不同电压下超表面透镜的焦距。由图3可知,正入射光波长为3.83um,任意线偏振光在电压0~190V下超表面透镜产生的焦距为50um~67um变化。According to the electrostatic field and structural mechanics finite element algorithm simulation, the protrusion deformation generated by the gold back plate 23 under different voltages is obtained, so that the phase distribution of the reflected light field generated by the gold back plate 23 under different voltages changes, and finally the super The focal length of the surface lens. It can be seen from Fig. 3 that the wavelength of the normal incident light is 3.83um, and the focal length of the metasurface lens produced by the metasurface lens changes from 50um to 67um under the voltage of 0-190V for any linearly polarized light.
基于上述静电式动态可调反射式变焦超表面透镜,本实施例公开了如图4所示的制备方法流程图以及如图5所示的制备方法,包括:Based on the above electrostatic dynamic adjustable reflective zoom metasurface lens, this embodiment discloses the flow chart of the preparation method shown in Figure 4 and the preparation method shown in Figure 5, including:
S101利用磁控溅射方法在玻璃衬底11上方生长厚度为100nm的ITO薄膜12;S101 growing an ITO thin film 12 with a thickness of 100 nm on the glass substrate 11 by using a magnetron sputtering method;
S102利用电子束蒸镀方法在ITO薄膜12表面蒸镀50nm的金薄膜13;S102 vapor-depositing a 50nm gold thin film 13 on the surface of the ITO thin film 12 by using an electron beam evaporation method;
S103在步骤S102获取的金薄膜13表面旋涂第一光刻胶14,形成光刻胶面;S103 Spin-coat the first photoresist 14 on the surface of the gold thin film 13 obtained in step S102 to form a photoresist surface;
S104将金天线阵列结构版图通过电子束曝光设备对步骤S103获取的光刻胶面曝光,形成具有图案的样片;S104 exposing the gold antenna array structure layout to the photoresist surface obtained in step S103 by electron beam exposure equipment to form a patterned sample;
曝光区为如图5步骤S104斜线阴影区域所示;金天线阵列结构的具体参数由入射光的波长、所需焦距以及广义斯涅耳定律确定;The exposure area is shown in the shaded area of step S104 in Figure 5; the specific parameters of the gold antenna array structure are determined by the wavelength of the incident light, the required focal length and the generalized Snell's law;
S105将具有图案的样片进行显影,获取具有金天线阵列结构的光刻胶层的样片;如图5步骤S105所示,14记为显影处理后的光刻胶图案;S105 develops the patterned sample to obtain a photoresist layer sample with a gold antenna array structure; as shown in Figure 5 step S105, 14 is recorded as the photoresist pattern after the development process;
S106在具有金天线阵列结构的光刻胶层的样片上刻蚀,形成具有金天线阵列结构的样片;如图5步骤S106所示,没有被光刻胶图案14覆盖的金薄膜13部分被刻蚀掉,形成金天线阵列结构;S106 etches on the sample sheet of the photoresist layer with the gold antenna array structure to form a sample sheet with the gold antenna array structure; etched away to form a gold antenna array structure;
S107利用显影液将具有金天线阵列结构的样片上的光刻胶去除;如图5步骤S107所示,具有金天线阵列结构的样片表面存在光刻胶14,将其去除,剩下金天线阵列结构;S107 utilizes developing solution to remove the photoresist on the sample with the gold antenna array structure; as shown in Figure 5 step S107, there is a photoresist 14 on the surface of the sample with the gold antenna array structure, which is removed, leaving the gold antenna array structure;
S108在步骤S107获取的具有金天线阵列的样片表面旋涂SU-8光刻胶;如图5步骤S108所示,SU-8光刻胶是一种具有绝缘性的比较厚的负光刻胶,可以用于制作微桥的支撑结构15;S108 Spin-coat SU-8 photoresist on the sample surface with gold antenna array obtained in step S107; as shown in Figure 5 step S108, SU-8 photoresist is a relatively thick negative photoresist with insulation , can be used to make the supporting structure 15 of the microbridge;
本发明可采用SU-8光刻胶制作支撑结构15,但是并不局限于采用SU-8光刻胶,能制备支撑结构15的光刻胶均可,便于表述,可将这类光刻胶统称为第二光刻胶;The present invention can adopt SU-8 photoresist to make support structure 15, but it is not limited to adopt SU-8 photoresist, can prepare the photoresist of support structure 15 all can, convenient expression, can use this kind of photoresist collectively referred to as the second photoresist;
S109对旋涂有SU-8光刻胶的样片进行曝光处理;由于SU-8为负胶,非曝光区域在后续显影过程中去除,曝光区域将得以保留。因此非曝光区域为金天线所在区域以及ITO薄膜施加电压的位置;曝光区域如图5步骤S109斜线阴影区域所示;S109 Expose the sample coated with SU-8 photoresist; since SU-8 is a negative resist, the non-exposed area will be removed in the subsequent development process, and the exposed area will be retained. Therefore, the non-exposed area is the area where the gold antenna is located and the position where the voltage is applied to the ITO film; the exposed area is shown in the oblique shaded area of step S109 in Figure 5;
S110对步骤S109曝光后的样片进行显影处理,获取中空的绝缘支撑结构;如图5步骤S110所示,显影后,图5步骤S110中没有进行曝光的光刻胶区域被显影液去除,曝光的光刻胶区域得以保留,形成如图所示的绝缘支撑结构15,以实现金背板23形变所需的空气间隙20;同时ITO薄膜12的部分边缘上面的光刻胶15同样被去除,使得其暴露出来,便于向ITO电极馈电;S110 develops the sample after exposure in step S109 to obtain a hollow insulating support structure; as shown in step S110 in FIG. 5 , after development, the photoresist area that has not been exposed in step S110 in FIG. The photoresist area is retained to form an insulating support structure 15 as shown in the figure, so as to realize the air gap 20 required for the deformation of the gold backplane 23; at the same time, the photoresist 15 on the part of the edge of the ITO film 12 is also removed, so that It is exposed to facilitate feeding the ITO electrodes;
S201在硅衬底上方蒸镀氮化硅薄膜21,使用硅腐蚀液体在不具有氮化硅薄膜21的一侧向具有氮化硅薄膜的方向进行腐蚀直至氮化硅薄膜21暴露,腐蚀去除硅的中间区域形成硅框架22,并最终形成硅框架氮化硅薄膜窗口;如图5步骤S201所示,硅框架氮化硅薄膜窗口包括氮化硅薄膜21和硅框架22,硅框架22的开窗口正对金天线13,且开窗口大小大于等于金天线13阵列的大小,换句话就是硅框架22是由一整块硅晶体的中间区域腐蚀掉得到的,腐蚀后下方的氮化硅薄膜21暴露;氮化硅薄膜21厚度薄且对较宽光谱具有高透过率,对透射光的光场无影响,因此,氮化硅薄膜21通常作为宽光谱下的透明窗口;硅框架氮化硅薄膜窗口在本发明中主要作为金薄膜23生长的衬底和支撑结构,且对入射光场不产生影响;S201 Evaporate a silicon nitride film 21 on the silicon substrate, use a silicon etching liquid to etch the silicon nitride film 21 on the side without the silicon nitride film 21 until the silicon nitride film 21 is exposed, and remove the silicon by etching Form the silicon frame 22 in the middle area of the silicon frame, and finally form the silicon nitride film window of the silicon frame; The window is facing the gold antenna 13, and the size of the window is greater than or equal to the size of the gold antenna 13 array. In other words, the silicon frame 22 is obtained by etching the middle area of a whole silicon crystal. After etching, the silicon nitride film below 21 exposure; the silicon nitride film 21 is thin and has high transmittance to a wide spectrum, and has no influence on the light field of the transmitted light. Therefore, the silicon nitride film 21 is usually used as a transparent window under a wide spectrum; the silicon nitride film is nitrided The silicon thin film window is mainly used as the substrate and supporting structure for the growth of the gold thin film 23 in the present invention, and has no influence on the incident light field;
S202在硅框架氮化硅薄膜窗口上方蒸镀金薄膜,形成活动电极作为金背板23;如图5步骤S202所示,在步骤S201的上表面蒸镀一层金薄膜,其均匀地覆盖在氮化硅薄膜21和硅框架22的上表面,作为活动电极;同时在硅框架氮化硅薄膜窗口上面的金薄膜作为反射镜,将入射光进行反射;并且在金背板23和ITO薄膜12电极之间施加电压时,金背板23会向ITO薄膜电极方向发生凸起形变,根据电压大小,形成具有不同曲率的凸面镜,使得反射光场的相位发生不同程度的变化,从而实现焦点的改变;S202 vapor-deposits a gold film above the silicon nitride film window of the silicon frame to form a movable electrode as the gold back plate 23; as shown in step S202 of FIG. The upper surface of the silicon nitride film 21 and the silicon frame 22 is used as an active electrode; at the same time, the gold film on the silicon nitride film window of the silicon frame is used as a reflector to reflect incident light; and on the gold back plate 23 and the ITO film 12 electrode When a voltage is applied between them, the gold back plate 23 will protrude and deform in the direction of the ITO thin film electrode, and according to the magnitude of the voltage, a convex mirror with different curvatures will be formed, so that the phase of the reflected light field will change to varying degrees, thereby realizing the change of the focal point ;
S203将氮化硅薄膜21与支撑结构15固定,完成静电式动态可调反射式变焦超表面透镜的制作。S203 fixes the silicon nitride film 21 and the supporting structure 15 to complete the manufacture of the electrostatic dynamic adjustable reflective zoom metasurface lens.
基于本发明提出的静电式动态可调反射式变焦超表面透镜的制备方法可知,如图6所示,由01方向入射的平行光垂直入射到金天线阵列结构后,根据广义斯涅耳定律确定的金天线阵列结构会产生具有球面波形状的相位剖面,使得光线发生汇聚。当没有施加电压时,金背板为水平状态,入射光经过金天线阵列后,沿实线02方向发生汇聚,经过金背板23反射后,根据斯涅耳定律,沿实线03方向出射,再次经过金天线阵列结构13发生汇聚,最终沿实线04方向出射汇聚为一点;当施加电压时,金背板23沿如图6所示虚线向ITO薄膜电机方向发生凸起形变,此时当光线沿01方向无赦,经金天线阵列汇聚后,沿虚线05方向入射到凸起的金背板23上,反射后由于凸面镜的扩散作用,根据斯涅耳定律,沿虚线06方向出射,再次经过金天线阵列汇聚,最终沿虚线07方向汇聚为一点。当电压不同时,金背板23产生的形变程度不同,变现为反射时对光线的反射相位分布产生不同影响,实现焦点的调控。Based on the preparation method of the electrostatic dynamic adjustable reflective zoom metasurface lens proposed by the present invention, as shown in Figure 6, after the parallel light incident from the 01 direction is vertically incident on the gold antenna array structure, it is determined according to the generalized Snell's law The gold antenna array structure produces a phase profile with a spherical wave shape, allowing light to converge. When no voltage is applied, the gold backplane is in a horizontal state. After the incident light passes through the gold antenna array, it converges along the direction of the solid line 02, and after being reflected by the gold backplane 23, it exits along the direction of the solid line 03 according to Snell’s law. Convergence occurs again through the gold antenna array structure 13, and finally converges to one point along the direction of the solid line 04; when a voltage is applied, the gold backplane 23 protrudes and deforms along the dotted line shown in Figure 6 toward the direction of the ITO film motor. The light is uninterrupted along the direction 01. After being converged by the gold antenna array, it is incident on the raised gold back plate 23 along the dotted line 05. After reflection, due to the diffusion effect of the convex mirror, it emerges along the dotted line 06 according to Snell’s law. Converge again through the gold antenna array, and finally converge to a point along the direction of the dotted line 07. When the voltage is different, the degree of deformation produced by the gold back plate 23 is different, and when realized as reflection, it will have different effects on the reflection phase distribution of the light, and realize the control of the focus.
综上所述,静态超表面透镜在制备过程中,生长、曝光和刻蚀等工艺难以避免产生误差,影响超表面透镜的光学性能,使超表面透镜焦距产生误差,本发明提出基于MEMS的静电式动态可调反射式变焦超表面透镜可以解决静态超表面透镜焦距不可调的问题,由于透镜焦距不合格造成的成品可通过改变ITO薄膜12和金背板23之间的电压,调节静态超表面透镜焦距使其符合标准,因此,提高了整体的成品率。In summary, during the preparation process of the static metasurface lens, it is difficult to avoid errors in processes such as growth, exposure, and etching, which affect the optical performance of the metasurface lens and cause an error in the focal length of the metasurface lens. The present invention proposes a MEMS-based electrostatic The dynamic adjustable reflective zoom metasurface lens can solve the problem that the focal length of the static metasurface lens cannot be adjusted. The finished product caused by the unqualified focal length of the lens can be adjusted by changing the voltage between the ITO film 12 and the gold backplane 23. The focal length of the lens makes it conform to the standard, thus, improving the overall yield.
对于非集成光学系统,传统的由于存在超表面透镜焦距的误差,因此,超表面透镜在光学系统的装调方面需要进行相应的调整,导致光学系统的装调难度增大,本发明即使存在超表面透镜焦距的误差,也可以通过调节ITO薄膜和金背板之间的电压克服,并不需要在光学系统的装调方面做相应的调整。对于集成光学系统,往往无法调整超表面透镜的位置,因此静态超表面透镜制备过程中产生的焦距误差最终对整个集成光学系统产生影响,造成系统误差,本发明可以通过调节ITO薄膜和金背板之间的电压改变焦距,校正焦距误差,最终减小系统误差。For non-integrated optical systems, due to the error of the focal length of the traditional metasurface lens, the metasurface lens needs to be adjusted accordingly in the installation and adjustment of the optical system, resulting in increased difficulty in the installation and adjustment of the optical system. The error of the focal length of the surface lens can also be overcome by adjusting the voltage between the ITO film and the gold backplane, and there is no need to make corresponding adjustments in the adjustment of the optical system. For integrated optical systems, it is often impossible to adjust the position of the metasurface lens, so the focal length error generated during the preparation of the static metasurface lens will eventually affect the entire integrated optical system, causing system errors. The present invention can adjust the ITO film and gold backplane The voltage between changes the focal length, corrects the focal length error, and finally reduces the system error.
本领域的技术人员容易理解,以上所述仅为本发明的较佳实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等,均应包含在本发明的保护范围之内。It is easy for those skilled in the art to understand that the above descriptions are only preferred embodiments of the present invention, and are not intended to limit the present invention. Any modifications, equivalent replacements and improvements made within the spirit and principles of the present invention, All should be included within the protection scope of the present invention.
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