CN110540669B - 一种可用于镭射加工的内防爆膜及其应用 - Google Patents
一种可用于镭射加工的内防爆膜及其应用 Download PDFInfo
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Abstract
本发明属于防爆膜技术领域,具体涉及一种可用于镭射加工的内防爆膜及其应用,内防爆膜包括从下至上依次设置的基材层、减镭射层和离型膜层。本发明的防爆膜具有减镭射层,可以有效屏蔽镭射光中的部分紫外线,减少镭射线对膜片的穿透能力,避免玻璃后盖在进行镭射加工过程中被击穿,提高产品品质,降低报废率;本发明所制备的防爆膜透光率大于90%,雾度小于1%,减镭射层的紫外光透过率为15‑60%,优选20‑30%,采用355nm镭射光对基材层进行激光镭射加工可以保证在获得清晰的镭射图案的同时,避免将膜片击穿,提高美观度和合格率。
Description
技术领域
本发明属于防爆膜技术领域,具体涉及一种可用于镭射加工的内防爆膜及其应用。
背景技术
随着科技的发展,数码产品如手机、平板电脑等已经深入千家万户,成为日常生活中不可或缺的一部分。智能手机的外壳材质,从最开始的塑料外壳,发展到近几年的金属外壳、玻璃外壳、陶瓷外壳等等。
虽然塑料外壳和金属外壳由于加工工艺简单而得到了广泛的应用,但是新开发的玻璃外壳具有高颜值的优势,同时比金属外壳对信号产生的屏蔽作用要小,因此,玻璃外壳已经开始在目前的高档手机上广泛应用。虽然玻璃外壳具有以上不可比拟的优势,但玻璃外壳也存在着耐磨性差和易碎的缺点,为了对玻璃材质进行增强,避免玻璃外壳破碎飞溅导致伤人,通常会在手机背壳玻璃上使用防爆膜。在手机后壳加工中,随着工艺的发展和人们对高颜值的追求,开始采用镭射工艺对手机玻璃后壳进行商标、图案等加工。
由于激光镭射的穿透性强,可以达到深层的蒸镀层和印刷层,镭射光将UV转印层击穿后会形成肉眼可见的白色图案,影响镭射效果。目前使用的玻璃内防爆膜对镭射光的穿透率达80%以上,镭射光会将膜片击穿影响镭射效果。
发明内容
为了解决对玻璃后盖进行激光镭射加工过程中容易击穿防爆膜而影响外观、增加报废率的问题,本发明公开了一种可用于镭射加工的内防爆膜及其应用,该内防爆膜包括基材层、减镭射层和离型膜层,减镭射层可以有效屏蔽镭射光中的部分紫外线,减少镭射线对膜片的穿透能力,避免玻璃后盖在进行镭射加工过程中被击穿,提高产品品质,降低报废率。
为了实现上述目的,本发明采用如下技术方案:
一种可用于镭射加工的内防爆膜,其特征在于:包括从下至上依次设置的基材层、减镭射层和离型膜层。
作为优选,上述减镭射层所用的涂布液由如下重量百分比的各组分组成:树脂20-60%、紫外线吸收剂0.2-5%、溶剂余量,优选地,所述紫外线吸收剂的用量为0.5-2%。
作为优选,上述树脂为丙烯酸树脂、聚氨酯树脂、聚酯树脂和环氧树脂中的一种,所述溶剂为乙酸乙酯、乙酸丁酯、甲苯、丁酮中的一种或几种,所述紫外线吸收剂为苯酮类紫外线吸收剂、苯并三唑类紫外线吸收剂、三嗪类紫外线吸收剂中的一种或几种。
作为优选,上述紫外线吸收剂为UV-P、UV-O、UV-234、UV-326、UV-327、UV-531、UV-328、UV-329、UV-1130、UV-928、UV-1577、UV-1164、UV-360中的一种或几种。
作为优选,上述防爆膜的制备方法为:
(1)按比例称取涂布液的各组分,加入配液桶中,搅拌分散30min,静置消泡,得到涂布液;
(2)将配制好的涂布液均匀涂布到基材表面,60-140℃加热1-5min,烘干溶剂;
(3)进行紫外光固化或加热固化,贴合离型膜。
作为优选,上述基材为PET、COP、TAC和PMMA中的一种。
作为优选,上述基材层的厚度为25~100μm,优选50μm,所述减镭射层厚度为10~50μm,优选25μm。
作为优选,上述防爆膜的透光率>90%,雾度<1%。
一种可用于镭射加工的内防爆膜的应用,具体步骤为:除去内防爆膜的离型膜层,将减镭射层贴敷于玻璃表面,然后从玻璃一侧对基材层进行激光镭射加工。
作为优选,上述激光镭射加工所用的激光波长为355nm,所述减镭射层的紫外光透过率为15-60%,优选20-30%。
本发明具有如下的有益效果:(1)本发明的防爆膜具有减镭射层,可以有效屏蔽镭射光中的部分紫外线,减少镭射线对膜片的穿透能力,避免玻璃后盖在进行镭射加工过程中被击穿,提高产品品质,降低报废率;
(2)本发明所制备的防爆膜透光率大于90%,雾度小于1%,减镭射层的紫外光透过率为15-60%,优选20-30%,采用355nm镭射光对基材层进行激光镭射加工可以保证在获得清晰的镭射图案的同时,避免将膜片击穿,提高美观度和合格率。
附图说明
下面结合附图和实施例对本发明进一步说明。
图1是本发明的结构示意图;
图中:1.基材层;2.减镭射层;3.离型膜层。
具体实施方式
现在结合实施例对本发明作进一步详细的说明。
可用于镭射加工的内防爆膜,包括从下至上依次设置的基材层1、减镭射层2和离型膜层3,其中,减镭射层2是用涂布液涂布在基材层1上之后固化而成,固化后贴合离型膜层3即可。
实施例1
(1)分别称取1000g丙烯酸树脂、4000g甲苯和20g紫外线吸收剂UV-326,加入配液桶中,搅拌分散30min,静置1h消泡,得到涂布液;
(2)将配制好的涂布液均匀涂布到PMMA基材(厚度25μm,透光率91.8%,雾度0.78%)表面,140℃加热1min,烘干溶剂;
(3)进行紫外光固化,贴合离型膜,得到可用于镭射加工的内防爆膜,减镭射层厚度为10μm。
实施例2
(1)分别称取1000g聚氨酯树脂、700g乙酸丁酯和50g紫外线吸收剂UV-P,加入配液桶中,搅拌分散30min,静置1h消泡,得到涂布液;
(2)将配制好的涂布液均匀涂布到PET基材(厚度50μm,透光率91.2%,雾度0.89%)表面,80℃加热4min,烘干溶剂;
(3)进行加热固化,贴合离型膜,得到可用于镭射加工的内防爆膜,减镭射层厚度为50μm。
实施例3
(1)分别称取1000g环氧树脂、2000g乙酸丁酯、350g丁酮、15g紫外线吸收剂UV-531和15g紫外线吸收剂UV-327,加入配液桶中,搅拌分散30min,静置1h消泡,得到涂布液;
(2)将配制好的涂布液均匀涂布到COP基材(厚度100μm,透光率92.1%,雾度0.98%)表面,60℃加热5min,烘干溶剂;
(3)进行加热固化,贴合离型膜,得到可用于镭射加工的内防爆膜,减镭射层厚度为25μm。
实施例4
(1)分别称取1000g聚酯树脂、1000g乙酸丁酯、500g甲苯、15g紫外线吸收剂UV-360和10g紫外线吸收剂UV-329,加入配液桶中,搅拌分散30min,静置1h消泡,得到涂布液;
(2)将配制好的涂布液均匀涂布到TAC基材(厚度60μm,透光率91.5%,雾度0.91%)表面,120℃加热2min,烘干溶剂;
(3)进行加热固化,贴合离型膜,得到可用于镭射加工的内防爆膜,减镭射层厚度为25μm。
实施例5
(1)分别称取1000g丙烯酸树脂、2000g乙酸丁酯、2000g甲苯、15g紫外线吸收剂UV-1164和10g紫外线吸收剂UV-234,加入配液桶中,搅拌分散30min,静置1h消泡,得到涂布液;
(2)将配制好的涂布液均匀涂布到PMMA基材(厚度30μm,透光率91.8%,雾度0.78%)表面,110℃加热3min,烘干溶剂;
(3)进行加热固化,贴合离型膜,得到可用于镭射加工的内防爆膜,,减镭射层厚度为40μm。
实施例6
(1)分别称取1000g丙烯酸树脂、500g乙酸丁酯、500g甲苯、2g紫外线吸收剂UV-O和2g紫外线吸收剂UV-328,加入配液桶中,搅拌分散30min,静置1h消泡,得到涂布液;
(2)将配制好的涂布液均匀涂布到COP基材(厚度40μm,透光率92.1%,雾度0.98%)表面,120℃加热3min,烘干溶剂;
(3)进行加热固化,贴合离型膜,得到可用于镭射加工的内防爆膜,减镭射层厚度为20μm。
实施例7
(1)分别称取1000g丙烯酸树脂、3000g丁酮、1g紫外线吸收剂UV-1130、10g紫外线吸收剂UV-928和5g紫外线吸收剂UV-1577,加入配液桶中,搅拌分散30min,静置1h消泡,得到涂布液;
(2)将配制好的涂布液均匀涂布到COP基材(厚度40μm,透光率92.1%,雾度0.98%)表面,120℃加热3min,烘干溶剂;
(3)进行加热固化,贴合离型膜,得到可用于镭射加工的内防爆膜,减镭射层厚度为25μm。
实施例8
(1)分别称取1000g聚酯树脂、1500g乙酸丁酯、8g紫外线吸收剂UV-1130和5g紫外线吸收剂UV-928,加入配液桶中,搅拌分散30min,静置1h消泡,得到涂布液;
(2)将配制好的涂布液均匀涂布到PET基材(厚度50μm,透光率91.2%,雾度0.89%)表面,100℃加热3min,烘干溶剂;
(3)进行加热固化,贴合离型膜,得到可用于镭射加工的内防爆膜,减镭射层厚度为15μm。
实施例9
(1)分别称取1000g丙烯酸树脂、1000g甲苯、20g紫外线吸收剂UV-531和20g紫外线吸收剂UV-328,加入配液桶中,搅拌分散30min,静置1h消泡,得到涂布液;
(2)将配制好的涂布液均匀涂布到COP基材(厚度50μm,透光率92.1%,雾度0.98%)表面,120℃加热3min,烘干溶剂;
(3)进行加热固化,贴合离型膜,得到可用于镭射加工的内防爆膜,减镭射层厚度为25μm。
实施例10
(1)分别称取1000g环氧树脂、2000g乙酸丁酯、350g丁酮、100g紫外线吸收剂UV-531和75g紫外线吸收剂UV-327,加入配液桶中,搅拌分散30min,静置1h消泡,得到涂布液;
(2)将配制好的涂布液均匀涂布到COP基材(厚度50μm,透光率92.1%,雾度0.98%)表面,120℃加热3min,烘干溶剂;
(3)进行加热固化,贴合离型膜,得到可用于镭射加工的内防爆膜,减镭射层厚度为40μm。
对比例1与实施例4基本相同,不同之处在于,未添加紫外线吸收剂。
对比例2与实施例4基本相同,不同之处在于,紫外线吸收剂UV-360用量为2g和紫外线吸收剂UV-329用量为1g。
对实施例1-10和对比例1-2所制备的防爆膜进行各项性能测试,测试结果见表1,测试方法如下:
(1)剥离力:取25mm*60mm样条,贴在玻璃上静置24小时后,用拉力机测试防爆膜对玻璃的剥离力(180°);
(2)紫外光透过率:用紫外可见分光光度计测试防爆膜的紫外光透过率;
(3)镭射加工后的外观:取60mm*100mm样条(基材上印有图案),贴敷于玻璃表面,从玻璃一侧用355nm镭射光对基材层进行激光镭射加工,观察所获得样品的外观,按外观效果由好到差依次记录为+++++、++++、+++、++、+、-。
表1
其中,透光率为基材层和减镭射层的透光率(排除离型膜层)。
以上述依据本发明的理想实施例为启示,通过上述的说明内容,相关工作人员完全可以在不偏离本项发明技术思想的范围内,进行多样的变更以及修改。本项发明的技术性范围并不局限于说明书上的内容,必须要根据权利要求范围来确定其技术性范围。
Claims (6)
1.一种可用于镭射加工的内防爆膜,其制备方法包括如下步骤:
(1)分别称取1000g聚氨酯树脂、700g乙酸丁酯和50g紫外线吸收剂UV-P,加入配液桶中,搅拌分散30min,静置1h消泡,得到涂布液:
(2)将配制好的涂布液均匀涂布到PET基材表面,80℃加热4min,烘干溶剂,所述PET基材厚度为50μm,透光率为91.2%,雾度为0.89%;
(3)进行加热固化,贴合离型膜,得到可用于镭射加工的内防爆膜,减镭射层厚度为50μm。
2.一种可用于镭射加工的内防爆膜,其制备方法包括如下步骤:
(1)分别称取1000g环氧树脂、2000g乙酸丁酯、350g丁酮、15g紫外线吸收剂UV-531和15g紫外线吸收剂UV-327,加入配液桶中,搅拌分散30min,静置1h消泡,得到涂布液;
(2)将配制好的涂布液均匀涂布到COP基材表面,60℃加热5min,烘干溶剂,所述COP基材厚度为100μm,透光率为92.1%,雾度为0.98%;
(3)进行加热固化,贴合离型膜,得到可用于镭射加工的内防爆膜,减镭射层厚度为25μm。
3.一种可用于镭射加工的内防爆膜,其制备方法包括如下步骤:
(1)分别称取1000g聚酯树脂、1000g乙酸丁酯、500g甲苯、15g紫外线吸收剂UV-360和10g紫外线吸收剂UV-329,加入配液桶中,搅拌分散30min,静置1h消泡,得到涂布液;
(2)将配制好的涂布液均匀涂布到TAC基材表面,120C加热2min,烘干溶剂,所述TAC基材厚度为60μm,透光率为91.5%,雾度为0.91%;
(3)进行加热固化,贴合离型膜,得到可用于镭射加工的内防爆膜,减镭射层厚度为25μm。
4.一种可用于镭射加工的内防爆膜,其制备方法包括如下步骤:
(1)分别称取1000g丙烯酸树脂、2000g乙酸丁酯、2000g甲苯、15g紫外线吸收剂UV-1164和10g紫外线吸收剂UV-234,加入配液桶中,搅拌分散30min,静置1h消泡,得到涂布液;
(2)将配制好的涂布液均匀涂布到PMMA基材表面,110℃加热3min,烘干溶剂,所述PMMA基材厚度为30μm,透光率为91.8%,雾度为0.78%;
(3)进行加热固化,贴合离型膜,得到可用于镭射加工的内防爆膜,减镭射层厚度为40μm。
5.一种可用于镭射加工的内防爆膜,其制备方法包括如下步骤:(1)分别称取1000g聚酯树脂、1500g乙酸丁酯、8g紫外线吸收剂UV-1130和5g紫外线吸收剂UV-928,加入配液桶中,搅拌分散30min,静置1h消泡,得到涂布液;
(2)将配制好的涂布液均匀涂布到PET基材表面,100℃加热3min,烘干溶剂,所述PET基材厚度为50μm,透光率为91.2%,雾度为0.89%;
(3)进行加热固化,贴合离型膜,得到可用于镭射加工的内防爆膜,减镭射层厚度为15μm。
6.一种可用于镭射加工的内防爆膜,其制备方法包括如下步骤:
(1)分别称取1000g丙烯酸树脂、1000g甲苯、20g紫外线吸收剂UV-531和20g紫外线吸收剂UV-328,加入配液桶中,搅拌分散30min,静置1h消泡,得到涂布液;
(2)将配制好的涂布液均匀涂布到C0P基材表面,120℃加热3min,烘干溶剂,所述C0P基材厚度为50μm,透光率为92.1%,雾度为0.98%;
(3)进行加热固化,贴合离型膜,得到可用于镭射加工的内防爆膜,减镭射层厚度为25μm。
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