CN110524315A - A kind of green economy environment protection chemical mechanical polishing method of optical quartz glass - Google Patents
A kind of green economy environment protection chemical mechanical polishing method of optical quartz glass Download PDFInfo
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- CN110524315A CN110524315A CN201910724192.3A CN201910724192A CN110524315A CN 110524315 A CN110524315 A CN 110524315A CN 201910724192 A CN201910724192 A CN 201910724192A CN 110524315 A CN110524315 A CN 110524315A
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- polishing
- quartz glass
- deionized water
- chemical mechanical
- abrasive
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
- B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
Abstract
The present invention provides a kind of green economy environment protection chemical mechanical polishing methods of optical quartz glass, belong to the Ultra-precision Turning field of hard brittle material.First quartz glass is ground, then successively carries out chemical machinery rough polishing and fine polishing.When rough polishing, polishing fluid is made of the Alpha-alumina abrasive material that average grain diameter is 30~100nm and deionized water, and polishing pad selects urethane pad.When finishing polish, polishing fluid is made of ceramic abrasive, dispersing agent, pH adjusting agent and deionized water.The average grain diameter of ceramic abrasive is 20~50nm, and weight percent is 1~3%；Dispersant weight percentage is 0.1~2%；PH adjusting agent is citric acid, acetic acid and malic acid, and adjusting pH value is 4~6.Polishing pad selects Buffed leather pad.After polishing, the surface roughness Ra of quartz glass reaches 0.6~0.75nm, realizes the efficient ultralow damage ultraprecise chemical mechanical polishing of quartz glass.
Description
Technical field
The invention belongs to the Ultra-precision Turning fields of hard brittle material, are related specifically to a kind of green warp of optical quartz glass
Help environment protection chemical mechanical polishing method.
Background technique
Optical quartz glass has excellent light transmission in multispectral region, and have high temperature resistant, thermal expansion coefficient it is minimum,
The advantages that stable chemical performance, radiation hardness, is the common optics of optical precision device and substrate material, is widely used in aviation boat
It, the fields such as detection system, spectral instrument and optical commucication.
The requirement of contemporary optics systems for optical element surface roughness is more and more harsher, has reached Subnano-class level,
Such as laser gyro reflecting mirror, superlaser reflecting mirror etc. require that surface roughness is less than 1nm.However quartz glass belongs to firmly
Crisp material, conventional mechanical polishing easily lead to residual stress and surface/sub-surface damage, and chemically mechanical polishing is processing optical
The preferably selection of one of quartz glass.
Currently used for mostly used in the chemical mechanical polishing liquid of quartz glass strong acid, highly basic, the salt containing metallic with
And toxic reagent, and the reagent type used is more, concentration is higher.Strong acid, highly basic and toxic agent are to environment and operator
Health exist seriously endanger and do not meet environmentally protective modern machining based conception；Metal ion in polishing fluid is easily residual
Substrate surface is stayed in, the reliability of product is reduced, increases the cost cleaned after chemically mechanical polishing；High concentration, multiple types examination
The use of agent also will increase production cost, not meet economy processing principle.Therefore, using a kind of optics of green economy environmental protection
Quartz glass chemical mechanical polishing liquid and polishing method can reduce the harm to environment and operator, improve production efficiency,
Processing cost is reduced, compared with (105 × 141 μm of wide-measuring range2) reach Subnano-class surface roughness.
Summary of the invention
The present invention is directed to the problem of current quartz glass chemical mechanical polishing liquid, proposes a kind of chemical machinery throwing
Light liquid and polishing method.The polishing fluid ingredient includes: ceramic abrasive grain, dispersing agent, pH adjusting agent and deionized water, can be realized stone
The Subnano-class super hot investment casting of English glass surface, can satisfy commercial requirement.
Technical solution of the present invention:
Quartz glass plate, is adhesively fixed with paraffin by a kind of chemical mechanical polishing liquid and polishing method of quartz glass first
On stainless steel carrying disk, concretion abrasive silicon carbide silicon carbide paper is fixed on abrasive disk and is ground, lapping liquid be go from
Sub- water.Then two processes of rough polishing and fine polishing are successively carried out, polish pressure is 30~45kPa, polishing disk and carrying disk
Revolving speed be 60~80rpm, polishing flow velocity be 5~10mL/min.When rough polishing, polishing fluid abrasive grain is Alpha-alumina,
Average grain diameter is 30~100nm, and weight percent is the 1~3% of polishing fluid；Using polyurethane polishing pad, polishing time is 5~
10min.When finishing polish, polishing fluid abrasive grain is the mixing of one or more of silica, Alpha-alumina, cerium oxide, average
Partial size is 20~50nm, and weight percent is the 1~3% of polishing fluid；Dispersing agent is D-glucitol, polyethylene glycol, octylphenol polyethylene
The mixing of one or more of ethylene oxide ether, weight percent are the 0.1~2% of polishing fluid；PH adjusting agent be citric acid,
The mixing of one or more of acetic acid, malic acid, adjusting polishing fluid pH is 4~6, and polishing pad is Buffed leather polishing pad, is thrown
It is 10~18min between light time.After essence is thrown, 3~5min is cleaned by ultrasonic in alcohol, is then waited for compressed gas drying thick
Rugosity measurement.After polishing, at 105 × 141 μm2Measurement range under, the surface roughness Ra of quartz glass reaches 0.6~
0.75nm.The present invention realizes the chemically mechanical polishing of the Subnano-class surface roughness of quartz glass.
Sample workpiece is optical quartz glass, the excellent physicochemical property of quartz glass, make its be widely used in aerospace,
The fields such as detection system, spectral instrument and optical commucication.
Grinding process: quartz glass plate is uniformly adhesively fixed on stainless steel carrying disk with paraffin, by the consolidation of #3000
Abrasive material silicon carbide silicon carbide paper, which is fixed on abrasive disk, to be ground.The revolving speed of abrasive disk and carrying disk is 60~80rpm, grinding
Pressure is 30~45kPa, and milling time is 3~5min, and lapping liquid is deionized water.After the completion of grinding, in order to remove quartzy glass
Glass impurity remained on surface places it in 3~5min of ultrasonic cleaning in deionized water, is dried up with compressed gas.The purpose of grinding
It is and 3 pieces of quartz glass plates to be ground to same plane in order to which each quartz glass slice lapping is smooth, guarantees following process
Surface figure accuracy is preferable.It compares and free abrasive, the material removal of efficient uniform may be implemented in concretion abrasive sand paper, to guarantee
The surface figure accuracy of quartz glass plate, while can be avoided free abrasive grain insertion Quartz glass surfaces, generate unnecessary defect.Carbon
SiClx silicon carbide paper is easy to use, cheap, and silicon carbide hardness is high, can remove material faster.It is made of deionized water
Lapping liquid, economic, environmental protection are non-hazardous to operator and environment.
It to be chemically-mechanicapolish polished after grinding, to solve the defect that Quartz glass surfaces generate in process of lapping, be reduced
Roughness realizes the super-smooth surface of sub-nanometer roughness.Chemically mechanical polishing is divided into two processes of rough polishing and fine polishing.
Rough polishing is to improve surface quality in order to quickly reduce Quartz glass surfaces roughness, prepare for subsequent processing finishing polish, together
When also for reduce finishing polish processing duration, improve production efficiency；Finishing polish is to realize Quartz glass surfaces Subnano-class
A most important procedure for roughness and super-smooth surface.
Rough polishing method, specifically includes the following steps:
A) first step prepares chemical mechanical polishing liquid used in rough polishing process；
At room temperature, the Alpha-alumina abrasive material for weighing certain mass is added in the deionized water of certain mass, is set in ultrasound
Standby middle oscillation 10min is to get required chemical mechanical polishing liquid；
B) second step carries out chemical machinery rough polishing to quartz glass plate using polyurethane polishing pad；
C) third step carries out 3~5min of ultrasonic cleaning using deionized water after rough polishing, and is dried up with compressed gas.
Selecting average grain diameter is the Alpha-alumina of 30~100nm as abrasive material, can be quickly gone because its hardness is higher
The scratch occurred during the grinding process except Quartz glass surfaces；Partial size is too small, and material removal rate is small, and partial size is too big, to quartz
Scratch caused by glass surface is serious.Polyurethane polishing pad is selected, is unlikely to deform, it is ensured that stone because its hardness is higher
The surface figure accuracy of English glass.
Final polishing method, specifically includes the following steps:
A) first step prepares chemical mechanical polishing liquid used in finishing polish process；
At room temperature, the ceramic abrasive and dispersing agent for weighing certain mass are added in the deionized water of certain mass；
B) pH adjusting agent is added in second step, and adjusting polishing fluid pH is 4~6, vibrates 10min in ultrasonic device to get institute
Need chemical mechanical polishing liquid；
C) third step carries out chemical machinery finishing polish to quartz glass plate using Buffed leather polishing pad；
Quartz glass plate after finishing polish is placed in 3~5min of ultrasonic cleaning in alcohol, is blown with compressed gas by d) the 4th step
It is dry；
Ceramic abrasive grain is the mixing of one or both of silica, Alpha-alumina and cerium oxide.The above abrasive grain is in nature
In be widely present, it is economic and environment-friendly.Wherein, when cerium oxide is as abrasive material, the effect of the molecule on quartz glass surface layer in mechanical force
Under be easier to chemically react with it, generate Ce-O-Si key, simultaneously as it is compared to the slightly lower (cerium oxide of quartz glass hardness
Mohs' hardness be 6, and the Mohs' hardness of quartz glass be 7), do not easily cause surface scratching, polishing effect is preferable.Select frosted
Leather polishing pad is to guarantee the preferable surface figure accuracy of Quartz glass surfaces because its is neither too hard, nor too soft, obtaining the sub-nanometer of ultra-smooth
While grade roughness surface, and it can rapidly remove material.
Dispersing agent is the mixing of one or both of D-glucitol, polyethylene glycol and octyl phenol polyoxyethylene ether.Dispersing agent
It can be improved the dispersion performance of ceramic abrasive grain in deionized water, improve chemically mechanical polishing outcome quality.Disperse energy except having
Outside power, sorbierite is widely present in pears, apple and peach, can be used as food additives use；Polyethylene glycol is in pharmacy and food
Product processing industry is widely used；Octyl phenol polyoxyethylene ether can play fresh-keeping, bacteriostasis to fruits and vegetables.The above dispersing agent belongs to
Environmentally protective, innocuous agents, it is non-hazardous to operator and environment.
PH adjusting agent is the mixing of one or both of citric acid, acetic acid and malic acid, and adjusting polishing fluid pH is 4~6.It is green
Citric acid, acetic acid and the malic acid that colour circle is protected are edible organic monoacids, polishing fluid can be maintained acid as pH adjusting agent
The stabilization of environment improves material removal rate.
After chemically mechanical polishing, test characterization is carried out to Quartz glass surfaces.At 105 × 141 μm2Relatively wide-measuring range
Under, the Quartz glass surfaces roughness Ra after polishing is 0.6~0.75nm, has reached Subnano-class surface roughness, has realized
The ultra-smooth of Quartz glass surfaces chemically-mechanicapolish polishes.
The invention has the advantages that in conjunction with grinding-CMP process, using environmentally protective ceramic abrasive grain,
Dispersing agent, pH adjusting agent, deionized water prepare chemical mechanical polishing liquid, and each constituent concentration of polishing fluid is low, polishing flow velocity is small,
Polishing time is short, realizes the super hot investment casting of Quartz glass surfaces sub-nanometer roughness.
Detailed description of the invention
Fig. 1 is the measurement result of Quartz glass surfaces roughness after chemically mechanical polishing, and surface roughness Ra value is
0.696nm, rms value are that 0.874nm, PV value are 7.772nm.
Fig. 2 is the measurement result of Quartz glass surfaces roughness after chemically mechanical polishing, and surface roughness Ra value is
0.742nm, rms value are that 0.936nm, PV value are 8.355nm.
Fig. 3 is the measurement result of Quartz glass surfaces roughness after chemically mechanical polishing, and surface roughness Ra value is
0.659nm, rms value are that 0.831nm, PV value are 7.900nm.
Fig. 4 by purchase business Quartz glass surfaces roughness measurement result, surface roughness Ra value 0.867nm,
Rms value is that 1.092nm, PV value are 9.027nm.
Specific embodiment
Below in conjunction with attached drawing and technical solution, a specific embodiment of the invention is further illustrated.
Processed sample is optical quartz glass, having a size of 10 × 10mm2.3 pieces of quartz glass are equably bonded with paraffin
It is fixed on carrying disk, grinding and the chemical machinery of quartz glass is carried out on UNIPOL-1200S automatic pressure polisher lapper
Polishing.
The fixed grain silicon carbide silicon carbide paper of #3000 is fixed on abrasive disk, Quartz glass surfaces is ground,
The revolving speed of abrasive disk and carrying disk is 60rmp, and grinding pressure 40.6kPa, lapping liquid is deionized water, and milling time is
3min.After the completion of grinding, ultrasonic cleaning 3min is carried out using deionized water, and dried up with compressed gas.
When rough polishing, carried out using the Alpha-alumina abrasive grain, polyurethane polishing pad and deionized water that average grain diameter is 30nm
The revolving speed of rough polishing, polish pressure 40.6kPa, polishing disk and carrying disk is 80rpm, and polishing flow velocity is 10mL/min,
Polishing time is 10min.Ultrasonic cleaning 3min is carried out using deionized water after rough polishing, and is dried up with compressed gas.
When finishing polish, the polishing fluid abrasive grain used is the cerium oxide that average grain diameter is 30nm, and dispersing agent is D-glucitol, pH
Value regulator is citric acid.When preparing polishing fluid, shaken in ultrasonic device after each ingredient is mixed according to proper ratio
10min。
Buffed leather polishing pad is used in polishing process, polishing flow velocity is 7ml/min, polishing time 15min.After polishing
Ultrasonic cleaning 3min is carried out using alcohol, and is dried up with compressed gas.Stone is detected using ZYGONewview5022 white light interferometer
English glass surface roughness, measurement range are 105 × 141 μm2。
Embodiment 1
Each main component of polishing fluid and its content: the content of cerium oxide abrasive grain is 2%, and the content of D-glucitol is 0.5%,
It the use of lemon acid for adjusting pH is 5.4；
Technological parameter: polish pressure 40.6kPa, polishing disk rotating speed 80rpm；
It is 0.874nm, PV value is 7.772nm that Quartz glass surfaces roughness Ra value after polishing, which is 0.696nm, rms value,
(see Fig. 1).
Embodiment 2
Each main component of polishing fluid and its content: the content of cerium oxide is 1%, and the content of D-glucitol is 0.5%, is used
Lemon acid for adjusting pH is 4.3；
Technological parameter: polish pressure 44.2kPa, polishing disk rotating speed 80rpm；
It is 0.936nm, PV value is 8.355nm that Quartz glass surfaces roughness Ra value after polishing, which is 0.742nm, rms value,
(see Fig. 2).
Embodiment 3
Each main component of polishing fluid and its content: the content of cerium oxide is 2%, and the content of D-glucitol is 1%, uses lemon
Lemon acid for adjusting pH is 5.3；
Technological parameter: polish pressure 38.0kPa, polishing disk rotating speed 80rpm；
It is 0.831nm, PV value is 7.900nm that Quartz glass surfaces roughness Ra value after polishing, which is 0.659nm, rms value,
(see Fig. 3).
Claims (1)
1. the green economy environment protection chemical mechanical polishing method of a kind of optical quartz glass, using ceramic abrasive grain, dispersing agent, pH tune
Agent, deionized water preparation chemical mechanical polishing liquid are saved, realizes that the efficient ultralow damage of quartz glass is Ultraprecise polished；Its feature exists
In:
(1) quartz glass plate is uniformly adhesively fixed on stainless steel carrying disk with paraffin, by the concretion abrasive silicon carbide of #3000
Silicon carbide paper is fixed on abrasive disk and is ground；The revolving speed of abrasive disk and carrying disk is 60~80rpm, grinding pressure 30
~45kPa, milling time are 3~5min, and lapping liquid is deionized water；After the completion of grinding, it is placed in deionized water and is cleaned by ultrasonic 3
~5min, and dried up with compressed gas；
(2) it is then chemically-mechanicapolish polished, is divided into two processes of rough polishing and fine polishing；Polish pressure is 30~45kPa,
The revolving speed of polishing disk and carrying disk is 60~80rpm, and polishing flow velocity is 5~10ml/min；
(3) when rough polishing, polishing fluid is mainly made of Alpha-alumina abrasive material and deionized water；The average grain diameter of Alpha-alumina abrasive material
For 30~100nm, weight percent is the 1~3% of polishing fluid, and polishing pad is polyurethane polishing pad, polishing time is 5~
10min；After the completion of rough polishing, it is placed in 3~5min of ultrasonic cleaning in deionized water, and dried up with compressed gas；
(4) when finishing polish, polishing fluid is mainly made of ceramic abrasive grain, dispersing agent, pH adjusting agent and deionized water；Ceramic abrasive grain is
The mixing of one or more of silica, Alpha-alumina, cerium oxide, average grain diameter are 20~50nm, and weight percent is
The 1~3% of polishing fluid；Dispersing agent is mixed for one or more of D-glucitol, polyethylene glycol, octyl phenol polyoxyethylene ether
It closes, weight percent is the 0.1~2% of polishing fluid；PH adjusting agent be one or both of citric acid, acetic acid, malic acid with
Upper mixing, adjusting pH value is 4~6；Buffed leather polishing pad is selected, polishing time is 10~18min；After the completion of finishing polish, it is placed in
It goes to be cleaned by ultrasonic 3~5min in alcohol, then be dried up with compressed gas；
(5) after chemically-mechanicapolish polishing, at 105 × 141 μm2Larger detection range under, the surface roughness R of quartz glassaFor
0.6~0.75nm.
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112701037A (en) * | 2020-12-29 | 2021-04-23 | 苏州焜原光电有限公司 | Polishing method of semiconductor material and polishing solution for polishing gallium antimonide substrate |
| CN113787450A (en) * | 2021-09-07 | 2021-12-14 | 大连理工大学 | Preparation method of super-smooth surface of FeCrAl material |
| CN113814799A (en) * | 2021-09-13 | 2021-12-21 | 中国地质大学（北京） | Polishing method for low-index crystal face of single crystal diamond |
| CN114479676A (en) * | 2022-03-08 | 2022-05-13 | 机械科学研究总院海西（福建）分院有限公司 | Low-abrasive-content and weakly acidic polishing solution for ultraprecise processing of optical glass and preparation method thereof |
| CN116082961A (en) * | 2022-12-01 | 2023-05-09 | 宁波平恒电子材料有限公司 | Silicon wafer retaining ring grinding fluid and preparation method thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2017318A2 (en) * | 2007-06-19 | 2009-01-21 | JSR Corporation | Chemical mechanical polishing aqueous dispersion preparation set, method of preparing chemical mechanical polishing aqueous dispersion, chemical mechanical polishing aqueous dispersion, and chemical mechanical polishing method |
| CN101831244A (en) * | 2010-05-10 | 2010-09-15 | 上海高纳粉体技术有限公司 | High-precision alumina polishing solution and preparation method thereof |
| CN104745092A (en) * | 2013-12-26 | 2015-07-01 | 安集微电子（上海）有限公司 | Chemical mechanical polishing liquid used in STI field, and use method thereof |
| CN108117842A (en) * | 2016-11-30 | 2018-06-05 | 上海新昇半导体科技有限公司 | A kind of chemical mechanical polishing liquid and preparation method thereof |
| CN109848821A (en) * | 2018-12-28 | 2019-06-07 | 大连理工大学 | A kind of environmentally protective cmp method of nickel alloy |
-
2019
- 2019-08-07 CN CN201910724192.3A patent/CN110524315A/en not_active Withdrawn
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2017318A2 (en) * | 2007-06-19 | 2009-01-21 | JSR Corporation | Chemical mechanical polishing aqueous dispersion preparation set, method of preparing chemical mechanical polishing aqueous dispersion, chemical mechanical polishing aqueous dispersion, and chemical mechanical polishing method |
| CN101831244A (en) * | 2010-05-10 | 2010-09-15 | 上海高纳粉体技术有限公司 | High-precision alumina polishing solution and preparation method thereof |
| CN104745092A (en) * | 2013-12-26 | 2015-07-01 | 安集微电子（上海）有限公司 | Chemical mechanical polishing liquid used in STI field, and use method thereof |
| CN108117842A (en) * | 2016-11-30 | 2018-06-05 | 上海新昇半导体科技有限公司 | A kind of chemical mechanical polishing liquid and preparation method thereof |
| CN109848821A (en) * | 2018-12-28 | 2019-06-07 | 大连理工大学 | A kind of environmentally protective cmp method of nickel alloy |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112701037A (en) * | 2020-12-29 | 2021-04-23 | 苏州焜原光电有限公司 | Polishing method of semiconductor material and polishing solution for polishing gallium antimonide substrate |
| CN113787450A (en) * | 2021-09-07 | 2021-12-14 | 大连理工大学 | Preparation method of super-smooth surface of FeCrAl material |
| CN113787450B (en) * | 2021-09-07 | 2022-11-15 | 大连理工大学 | Preparation method of super-smooth surface of FeCrAl material |
| CN113814799A (en) * | 2021-09-13 | 2021-12-21 | 中国地质大学（北京） | Polishing method for low-index crystal face of single crystal diamond |
| CN114479676A (en) * | 2022-03-08 | 2022-05-13 | 机械科学研究总院海西（福建）分院有限公司 | Low-abrasive-content and weakly acidic polishing solution for ultraprecise processing of optical glass and preparation method thereof |
| WO2023168780A1 (en) * | 2022-03-08 | 2023-09-14 | 中国机械总院集团海西(福建)分院有限公司 | Polishing solution having low abrasive material content and weak acidity for ultra-precise machining of optical glass, preparation method therefor |
| CN116082961A (en) * | 2022-12-01 | 2023-05-09 | 宁波平恒电子材料有限公司 | Silicon wafer retaining ring grinding fluid and preparation method thereof |
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Application publication date: 20191203 |