CN110517842B - Electromagnetic coupling device and polishing device with same and electromagnetic rheological property measuring device - Google Patents
Electromagnetic coupling device and polishing device with same and electromagnetic rheological property measuring device Download PDFInfo
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- CN110517842B CN110517842B CN201910810297.0A CN201910810297A CN110517842B CN 110517842 B CN110517842 B CN 110517842B CN 201910810297 A CN201910810297 A CN 201910810297A CN 110517842 B CN110517842 B CN 110517842B
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
- B24B1/005—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes using a magnetic polishing agent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N11/00—Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties
- G01N11/10—Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties by moving a body within the material
- G01N11/14—Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties by moving a body within the material by using rotary bodies, e.g. vane
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F7/00—Magnets
- H01F7/02—Permanent magnets [PM]
- H01F7/0231—Magnetic circuits with PM for power or force generation
- H01F7/0242—Magnetic drives, magnetic coupling devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N11/00—Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties
- G01N11/10—Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties by moving a body within the material
- G01N11/14—Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties by moving a body within the material by using rotary bodies, e.g. vane
- G01N2011/147—Magnetic coupling
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Electromagnetism (AREA)
- Power Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention relates to the technical field of precision optical processing, in particular to an electromagnetic coupling device, a polishing device with the electromagnetic coupling device and an electromagnetic rheological property measuring device, which comprise a base, an electric field generating component, a magnetic field generating component, a first rotating component, a second rotating component and an insulating flange arranged above the electric field generating component, wherein the first rotating component is connected with the electric field generating component, the second rotating component is connected with the magnetic field generating component, the electric field generating component and the magnetic field generating component are both connected with the base, and an electric field generated by the electric field generating component and a magnetic field generated by the magnetic field generating component are distributed inside the insulating flange. The invention realizes different forms of electric and magnetic coupling fields by changing the structure of the electric field generating part and the magnetic pole structure, and provides a device foundation for researching an electromagnetic rheological chain control mode and an electromagnetic rheological polishing mode; and is applied to an electromagnetic rheological polishing test and an electromagnetic rheological performance test, and promotes the wide application of electromagnetic rheological polishing in the field of optical precision machining.
Description
Technical Field
The invention relates to the technical field of precision optical machining, in particular to an electromagnetic coupling device, a polishing device with the electromagnetic coupling device and an electromagnetic rheological property measuring device.
Background
In the development of information science and technology, semiconductor materials are increasingly widely applied in the field of microelectronic components, and simultaneously, higher requirements are put on the service performance of the semiconductor materials, and common semiconductor materials comprise monocrystalline silicon, sapphire, monocrystalline silicon carbide and the like. Generally, the semiconductor wafer is manufactured through processes such as slicing, grinding, polishing and the like, so that good service performance is achieved, on one hand, the surface accuracy of the wafer is required to reach ultra-smooth degree (roughness Ra is less than 1 nm), the surface accuracy is also required to be high (surface accuracy is less than 0.5 micron), and on the other hand, the continuous expansion of the wafer size also brings greater challenges to ultra-precise polishing processing. The existing processing device for large-size semiconductor wafers at home and abroad mainly comprises efficient grinding, ultra-precise polishing, chemical mechanical polishing, magneto-rheological polishing, grinding and polishing based on an end surface grinder and the like. The magneto-rheological polishing technology is a method for performing polishing processing by using a semi-fixed flexible polishing head generated by magneto-rheological effect, and can effectively reduce microcracks and residual stress on the processing surface of a workpiece so as to be widely applied.
Although electromagnetic coupling type polishing apparatuses have been developed successively, there are more or less certain drawbacks such as: chinese patent CN103192297B discloses a chemical cluster magnetorheological coupling processing method for monocrystalline silicon carbide wafers, and proposes a coupling polishing method for chemical reaction and mechanical processing based on the fenton reaction corrosion monocrystalline SiC reaction, magnetorheological polishing principle and cluster action mechanism, so that the processing efficiency of monocrystalline SiC with a certain size is effectively improved, but the processing method has weak adaptability, cannot be widely applied to polishing processing of other wafer materials, and has lower magnetic pole cluster degree; chinese patent CN 103317413B discloses a method and apparatus for electromagnetic self-excited vibration electrorheological coupling polishing, which introduces electromagnetic self-excited vibration to realize high-speed longitudinal reciprocating motion of an electric field generating device, thereby generating longitudinal action on a flexible grinding head generated by electrorheological effect, improving processing efficiency, but the adopted single-point polishing method cannot meet the requirement of processing large-size wafers. The electromagnetic coupling polishing device has a plurality of factors influencing the performance, but at present, no effective polishing quality influence factor test device exists, so that the application of electromagnetic rheology in the field of optical precision machining is hindered.
Disclosure of Invention
The invention aims to overcome the defects of the prior art, provides an electromagnetic coupling device, a polishing device with the electromagnetic coupling device and an electromagnetic rheological property measuring device, can realize electromagnetic coupling fields in different forms, measures electromagnetic rheological properties aiming at the electromagnetic coupling fields in different forms, and provides a foundation for researching an electromagnetic rheological chain control mode and an electromagnetic rheological polishing mode.
In order to solve the technical problems, the invention adopts the following technical scheme:
the utility model provides an electromagnetic coupling device, including base, electric field generation subassembly, magnetic field generation subassembly, the first rotating assembly of drive electric field generation subassembly pivoted, the second rotating assembly of drive magnetic field generation subassembly pivoted and locate the insulating flange of electric field generation subassembly top, first rotating assembly is connected with the electric field generation subassembly, the second rotating assembly is connected with the magnetic field generation subassembly, electric field generation subassembly, magnetic field generation subassembly are all connected with the base, insulating flange inside distribution has the electric field that the electric field generation subassembly produced and the magnetic field that the magnetic field generation subassembly produced.
According to the electromagnetic coupling device, the electric field generating assembly and the electromagnetic generating assembly are matched in the insulating flange to form the electromagnetic coupling field, electric fields with different distribution structures and different sizes are generated by changing parameters of the electric field generating assembly, the permanent magnetic moving fields with different forms are generated by changing parameters of the magnetic field generating assembly, and the structures of different electric fields and different magnetic fields provide equipment foundation for researching an electromagnetic rheological chain control mode and an electromagnetic rheological polishing mode.
Further, the electric field generating assembly comprises an electrode group, an electrode chassis, an electrode disc shaft cylinder, a first carbon brush holder, a second carbon brush holder, a first conductive ring and a second conductive ring:
the first carbon brush holder is fixedly arranged on the electrode disc shaft barrel, the first carbon brush is fixed on the first carbon brush holder, a first conductive sheet is arranged between the first carbon brush and the first carbon brush holder, the first carbon brush is attached to the bottom of the electrode chassis, and a first conductive ring is arranged between the first carbon brush and the electrode chassis;
the second carbon brush holder is fixedly arranged on the electrode disc shaft barrel, the second carbon brush is fixed on the second carbon brush holder, a second conductive sheet is arranged between the second carbon brush and the second carbon brush holder, the second carbon brush is attached to the bottom of the electrode chassis, and a second conductive ring is arranged between the second carbon brush and the electrode chassis;
the first conducting ring is electrically connected with the positive electrode of the electrode group, the second conducting ring is electrically connected with the negative electrode of the electrode group, and the first conducting sheet and the second conducting sheet are communicated with an orthogonal high-voltage power supply;
the electrode group is embedded in the electrode chassis, and a wear-resistant insulating layer is arranged on the upper surface of the electrode chassis.
The electric energy of the direct-current and alternating-current high-voltage power supply is transmitted to the positive electrode of the electrode group through the first conducting strip, the first carbon brush and the first conducting ring, and is transmitted to the negative electrode of the electrode group through the second conducting strip, the second carbon brush and the second conducting ring, so that an electric field is formed between the positive electrode and the negative electrode of the electrode, and the form and the electric field strength of the electric field are changed by changing the type of the electrode group, the voltage and the frequency of the direct-current and alternating-current high-voltage power supply.
Further, the electrode chassis is installed in the electrode disk pivot, electrode disk pivot is located electrode disk axle section of thick bamboo periphery and is equipped with first bearing between electrode disk pivot and the electrode disk axle section of thick bamboo, electrode disk pivot periphery is connected with first band pulley.
Further, the first rotating assembly includes a first motor mounted to the base and a first timing belt connected between the first motor and the first pulley. The first motor works to drive the first belt wheel to rotate through the first synchronous belt, the first belt wheel drives the electrode disc rotating shaft to rotate, and the electrode disc rotating shaft can rotate relative to the electrode disc shaft barrel due to the fact that a first bearing is arranged between the electrode disc rotating shaft and the electrode disc shaft barrel.
Further, the magnetic field generating assembly comprises a magnetic pole, a magnetic pole fixing shaft, a magnetic pole sliding block and a magnetic pole guide rail, wherein the magnetic pole sliding block is arranged at one end of the magnetic pole fixing shaft, an inner hole for installing the magnetic pole is arranged at the other end of the magnetic pole fixing shaft, and the magnetic pole sliding block is connected with the magnetic pole guide rail.
Further, the magnetic pole guide rail is arranged on the magnetic pole rotating cylinder, the periphery of the magnetic pole rotating cylinder is connected with a magnetic pole fixed shaft cylinder, the magnetic pole fixed shaft cylinder is connected with the base, a second bearing is connected between the magnetic pole rotating cylinder and the magnetic pole fixed shaft cylinder, and the periphery of the magnetic pole rotating cylinder is connected with a second belt wheel.
Further, the second rotating assembly comprises a second motor and a second synchronous belt, the second motor is mounted on the base, and the second synchronous belt is connected between the second motor and the second belt wheel. The second motor works to drive the second belt pulley to rotate through the second synchronous belt, and the second belt pulley drives the magnetic pole rotating cylinder to rotate; the invention can realize the conversion from the static magnetic field to the dynamic magnetic field of the electrode chassis disk surface by adjusting the relative position between the magnetic pole sliding block and the magnetic pole guide rail to ensure that the magnetic pole rotates with a certain eccentric distance.
The invention also provides a polishing device which comprises a polishing rotating shaft, a clamp for clamping a workpiece and the electromagnetic coupling device, wherein the clamp is connected to the bottom of the polishing rotating shaft, the inside of the insulating flange is filled with electromagnetic rheological polishing liquid, and the bottom surface of the workpiece is in contact with the electromagnetic rheological polishing liquid.
According to the polishing device, the clamp clamps the workpiece and rotates under the drive of the polishing rotating shaft, and relative motion occurs between the surface of the workpiece and the electromagnetic rheological polishing liquid, so that efficient ultra-smooth processing of the surface of the workpiece is realized.
The invention also provides an electromagnetic rheological property measuring device which comprises the polishing device, a rotary force measuring sensor and a signal transmitter, wherein the rotary force measuring sensor is connected to one end of the polishing rotating shaft, the signal transmitter is in signal connection with the rotary force measuring sensor, and the insulating flange outer cover is provided with an energy shielding cover.
According to the electromagnetic rheological property measuring device, the clamp clamps a workpiece and rotates under the drive of the polishing rotating shaft, relative motion occurs between the surface of the workpiece and the electromagnetic rheological polishing liquid, so that efficient ultra-smooth processing of the surface of the workpiece is realized, meanwhile, the rotation force measuring sensor is used for measuring the polishing force, and the monitoring of the polishing force in the polishing process and the influence of the polishing force on the polishing effect are easy to realize.
The invention also provides an electromagnetic rheological property measuring device which comprises a measuring rotor, a torque meter and the electromagnetic coupling device, wherein the measuring rotor is connected with the torque meter, the inside of the insulating flange is filled with electromagnetic rheological polishing liquid, the end part of the measuring rotor stretches into the electromagnetic rheological polishing liquid, and the insulating flange outer cover is provided with an energy shielding cover.
According to the electromagnetic rheological property measuring device, the measuring rotor stretches into the magnetorheological fluid, the torque of the rotor is measured through the torque meter, and the shearing stress and the viscosity of the electromagnetic rheological fluid are obtained through conversion. The invention can be used for researching the rheological property of the electromagnetic rheological fluid under the coupling action of different electric fields and different magnetic fields, and provides a data basis for researching an electromagnetic rheological chain control mode and an electromagnetic rheological polishing mode.
Compared with the prior art, the invention has the beneficial effects that:
the electromagnetic coupling device can realize different forms of electric and magnetic coupling fields by changing the structure of the electric field generating part and the magnetic pole structure, and provides a device foundation for researching an electromagnetic rheological chain control mode and an electromagnetic rheological polishing mode; the electromagnetic coupling device can be used for performing electromagnetic rheological polishing tests, polishing force measurement of electromagnetic rheological polishing and electromagnetic rheological fluid property test, creates test conditions for researching electromagnetic rheological polishing influence factors, and promotes wide application of electromagnetic rheological polishing in the field of optical precision machining.
Drawings
FIG. 1 is a cross-sectional view of an electromagnetic coupling device according to an embodiment;
FIG. 2 is a perspective view of an electromagnetic coupling device according to an embodiment;
FIG. 3 is a partial detail view of an electric field generating assembly of an electromagnetic coupling apparatus according to an embodiment;
FIG. 4 is a cross-sectional view, A-A, of the electric field generating assembly of the electromagnetic coupling apparatus of FIG. 3;
FIG. 5 is an enlarged view of a portion B of the electric field generating assembly of the electromagnetic coupling apparatus of FIG. 4;
FIG. 6 is a schematic diagram of a concentric ring set of electrodes of an electromagnetic coupling apparatus according to an embodiment;
FIG. 7 is a schematic diagram of a strip-type electrode assembly of an electromagnetic coupling device according to an embodiment;
FIG. 8 is a schematic diagram of a lattice electrode assembly of an electromagnetic coupling device according to an embodiment;
FIG. 9 is a schematic view showing the structure of a polishing apparatus according to a second embodiment;
FIG. 10 is a schematic structural diagram of a three-embodiment electromagnetic rheological property measuring device;
FIG. 11 is a schematic structural diagram of a fourth electromagnetic rheological property measuring device according to the embodiment;
in the accompanying drawings: 100-base; 101-mounting holes; 200-an electric field generating assembly; 201-electrode group; 202-an electrode chassis; 203-an electrode disk shaft; 204-a first carbon brush; 205-a first carbon brush holder; 206-a second carbon brush; 207-a second carbon brush holder; 208-a first conductive ring; 209-a second conductive ring; 210-positive electrode; 211-negative electrode; 212-a wear-resistant insulating layer; 213-elongated slots; 214-shielding a copper sheet; 215-electrode disk spindle; 216—a first bearing; 217-switching disk; 300-a magnetic field generating assembly; 301-magnetic poles; 302-pole fixed shaft; 303-pole sliders; 304-pole rails; 305-pole rotating cylinder; 306-magnetic pole fixed shaft cylinder; 307-second bearings; 400-a first rotating assembly; 401-a first pulley; 402-a first motor; 403-a first synchronization belt; 404-a first rotation limiter; 500-a second rotating assembly; 501-a second pulley; 502-a second motor; 503-a second synchronous belt; 505-a second rotation limiter; 600-insulating flanges; 700-polishing device; 701-polishing a rotating shaft; 702-a clamp; 800-an electromagnetic rheological property measuring device; 801-a rotation force sensor; an 802-signal transmitter; 803-energy shield; 804-measuring the rotor; 805-torque meter.
Detailed Description
The invention is further described below in connection with the following detailed description. Wherein the drawings are for illustrative purposes only and are shown in schematic, non-physical, and not intended to be limiting of the present patent; for the purpose of better illustrating embodiments of the invention, certain elements of the drawings may be omitted, enlarged or reduced and do not represent the size of the actual product; it will be appreciated by those skilled in the art that certain well-known structures in the drawings and descriptions thereof may be omitted.
The same or similar reference numbers in the drawings of embodiments of the invention correspond to the same or similar components; in the description of the present invention, it should be understood that, if there is an azimuth or positional relationship indicated by terms such as "upper", "lower", "left", "right", etc., based on the azimuth or positional relationship shown in the drawings, it is only for convenience of describing the present invention and simplifying the description, but it is not indicated or implied that the apparatus or element referred to must have a specific azimuth, be constructed and operated in a specific azimuth, and thus terms describing the positional relationship in the drawings are merely illustrative and should not be construed as limitations of the present patent, and specific meanings of the terms described above may be understood by those skilled in the art according to specific circumstances.
Example 1
Referring to fig. 1 to 8, an embodiment of an electromagnetic coupling device according to the present invention includes a base 100, an electric field generating assembly 200, a magnetic field generating assembly 300, a first rotating assembly 400 for driving the electric field generating assembly 200 to rotate, a second rotating assembly 500 for driving the magnetic field generating assembly 300 to rotate, and an insulating rib 600 disposed above the electric field generating assembly 200, wherein the first rotating assembly 400 is connected with the electric field generating assembly 200, the second rotating assembly 500 is connected with the magnetic field generating assembly 300, the electric field generating assembly 200 and the magnetic field generating assembly 300 are connected with the base 100, and an electric field generated by the electric field generating assembly 200 and a magnetic field generated by the magnetic field generating assembly 300 are distributed inside the insulating rib 600. To facilitate the installation and assembly of the electromagnetic coupling device of the present embodiment, the base 100 of the present embodiment may be configured as a door-shaped structure, and a plurality of installation holes 101 are provided at the bottom of the door-shaped structure for installation. In this embodiment, when the electromagnetic coupling field is formed by the electric field generating component 200 and the electromagnetic generating component in the insulating flange 600, electric fields with different distribution structures and different magnitudes are generated by changing parameters of the electric field generating component 200, and permanent magnetic moving fields with different forms are generated by changing parameters of the magnetic field generating component 300, so that electromagnetic coupling fields with different forms are formed.
As shown in fig. 3 to 5, the electric field generating assembly 200 includes an electrode group 201, an electrode chassis 202, an electrode shaft 203, a first carbon brush 204, a first carbon brush holder 205, a second carbon brush 206, a second carbon brush holder 207, a first conductive ring 208, and a second conductive ring 209:
the first carbon brush holder 205 is fixedly installed on the electrode disc shaft barrel 203, the first carbon brush 204 is fixed on the first carbon brush holder 205, a first conductive sheet is arranged between the first carbon brush 204 and the first carbon brush holder 205, the first carbon brush 204 is attached to the bottom of the electrode chassis 202, and the first conductive ring 208 is arranged between the first carbon brush 204 and the electrode chassis 202;
the second carbon brush holder 207 is fixedly installed on the electrode disc shaft barrel 203, the second carbon brush 206 is fixed on the second carbon brush holder 207, a second conductive sheet is arranged between the second carbon brush 206 and the second carbon brush holder 207, the second carbon brush 206 is attached to the bottom of the electrode chassis 202, and the second conductive ring 209 is arranged between the second carbon brush 206 and the electrode chassis 202;
the first conductive ring 208 is electrically connected with the positive electrode 210 of the electrode group 201, the second conductive ring 209 is electrically connected with the negative electrode 211 of the electrode group 201, and the first conductive sheet and the second conductive sheet are communicated with an direct-current alternating-current high-voltage power supply; wherein, the voltage range of the DC-AC high-voltage power supply is 0-10 kV, and the frequency range is 0-50 Hz.
The electrode group 201 is embedded in the electrode chassis 202, and a wear-resistant insulating layer 212 is arranged on the upper surface of the electrode chassis 202, so that the electrode chassis 202 is prevented from being worn, and the service life of the electrode chassis 202 is prolonged; the thickness of the wear-resistant insulating layer 212 can be adjusted within the range of 0.3 mm-1 mm, and the wear-resistant insulating layer 212 of the embodiment can be an alumina ceramic coating.
The electrode group 201 in this embodiment may be configured in various shapes and arrangements according to the simulation requirements of different coupling electromagnetic fields: like the concentric ring group electrode group 201, the stripe group electrode group 201, and the lattice group electrode group 201, as shown in fig. 6, 7, and 8, respectively. However, it should be noted that the electrode assembly 201 of the present invention is not limited to the above-mentioned configuration, and the positions and the number of the electrode assemblies 201 can be adjusted according to the requirements during practical application.
In order to facilitate the installation of the electrode group 201, a long groove 213 is formed on the lower surface of the electrode chassis 202 at a position corresponding to the electrode group 201, a wire is arranged in the long groove 213 to be welded with the electrode group 201, adjacent electrodes are connected with opposite wires, the tail ends of the wires are respectively welded with the first conductive ring 208 and the second conductive ring 209, and the lead wires of the first conductive sheet and the second conductive sheet are connected with an AC high voltage power supply, so that the voltage generated by the AC high voltage power supply can be guided to the positive electrode and the negative electrode of the electrode group 201.
In order to avoid the influence of the electrode disk shaft 203, the magnetic field generating assembly 300, etc. on the electric field generated after the electrode group 201 is energized with high voltage, a shielding copper sheet 214 is provided between the electrode group 201 and the magnetic field generating assembly 300 in the present embodiment.
In order to facilitate the installation and positioning of the first conductive ring 208, the second conductive ring 209, and the shielding copper sheet 214, positioning notches matching with the first conductive ring 208, the second conductive ring 209, and the shielding copper sheet 214 may be respectively provided on the bottom surface of the electrode chassis 202 in this embodiment.
In order to avoid interference between the first conductive ring 208 and the second conductive ring 209, the first carbon brush 204 and the second carbon brush 206 of the present embodiment are not symmetrical about the center line of the electrode chassis 202, and the first conductive ring 208 and the second conductive ring 209 do not overlap. In order to ensure the motion stability of the electromagnetic coupling device, the electrode chassis 202, the insulating flange 600 and the conversion plate 210 of this embodiment are concentrically arranged.
In the present embodiment, the electrode chassis 202 may be made of alumina ceramic or zirconia ceramic, but not limited thereto, and the electrode chassis 202 may be made of other insulating materials; the electrode assembly 201 in this embodiment is made of pure copper, aluminum or stainless steel, but the electrode assembly 201 may be made of other conductive and non-conductive materials.
In order to change the acting direction of an electric field on particles in the electromagnetic rheological fluid and rotate the electromagnetic rheological fluid so as to achieve the polishing purpose, the electrode chassis 202 of the embodiment is mounted on an electrode disc rotating shaft 215, the electrode disc rotating shaft 215 is arranged on the periphery of an electrode disc shaft barrel 203, a first bearing 216 is arranged between the electrode disc rotating shaft 215 and the electrode disc shaft barrel 203, and the periphery of the electrode disc rotating shaft 215 is connected with a first belt wheel 401; the first rotating assembly 400 includes a first motor 402 and a first timing belt 403, the first motor 402 being mounted to the base 100, the first timing belt 403 being connected between the first motor 402 and the first pulley 401, as shown in fig. 2. So configured, when the first motor 402 works, the first pulley 401 is driven to rotate by the transmission of the first pulley 401, the electrode plate rotating shaft 215 drives the electrode plate to rotate, and simultaneously, the first carbon brush 204 slides on the first conductive ring 208 and the second carbon brush 206 slides on the second conductive ring 209.
In the present embodiment, the electrode disk rotation shaft 215 is concentrically mounted on the outer periphery of the electrode disk shaft cylinder 203 via the first bearing 216, but the arrangement of the relative positions of the electrode disk rotation shaft 215 and the electrode disk shaft cylinder 203 is preferable for obtaining a stable movement effect, and is not limited thereto.
It should be noted that, in the present embodiment, the transmission between the first motor 402 and the electrode plate rotating shaft 215 adopts a belt pulley transmission mode, but the present invention should not be limited thereto, and a transmission mode such as a chain sprocket, a gear transmission, etc. capable of driving the electrode plate rotating shaft 215 to rotate may also be adopted. In this embodiment, the rotation mode of the first motor 402 driving the pole disc rotating shaft is not limited to a complete 360 ° rotation, and the pole disc rotating shaft can rotate within a preset angle range by setting the first rotation limiter 404 and the working mode of the first motor 402.
As shown in fig. 1, the magnetic field generating assembly 300 includes a magnetic pole 301, a magnetic pole fixing shaft 302, a magnetic pole slider 303, and a magnetic pole guide rail 304, wherein the magnetic pole slider 303 is mounted on one end of the magnetic pole fixing shaft 302, an inner hole for mounting the magnetic pole 301 is provided on the other end of the magnetic pole fixing shaft 302, and the magnetic pole slider 303 is connected with the magnetic pole guide rail 304. The magnetic pole guide rail 304 is mounted on the magnetic pole rotating cylinder 305, a magnetic pole fixed shaft cylinder 306 is connected to the periphery of the magnetic pole rotating cylinder 305, the magnetic pole fixed shaft cylinder 306 is connected with the base 100, a second bearing 307 is connected between the magnetic pole rotating cylinder 305 and the magnetic pole fixed shaft cylinder 306, and a second belt wheel 501 is connected to the periphery of the magnetic pole rotating cylinder 305; the second rotating assembly 500 includes a second motor 502 and a second timing belt 503, the second motor 502 is mounted on the base 100, and the second timing belt 503 is connected between the second motor 502 and the second pulley 501, as shown in fig. 2. So set up, when second motor 502 works, can drive second band pulley 501 through the transmission of second band pulley 501 and rotate, magnetic pole rotary drum 305 follows second band pulley 501 and rotates, and magnetic pole 301 constantly changes the direction of action of magnetic field to the inside electromagnetic rheological fluid of insulating flange 600, forces the continuous reorganization of the interior structure chain of electromagnetic rheological polishing pad that forms to renew to realize the purpose of even polishing.
The magnetic pole slider 303 and the magnetic pole guide rail 304 are arranged, and the magnetic pole 301 can rotate with a certain eccentric distance by adjusting the relative positions between the magnetic pole slider 303 and the magnetic pole guide rail 304, so that the static magnetic field of the surface of the electrode chassis 202 can be converted into a dynamic magnetic field; the magnetic pole fixing shaft 302 has a hollow structure, and a wire connected to the dc/ac high-voltage power supply in the electric field generating assembly 200 may be led out from the inside of the hollow structure.
It should be noted that, in the present embodiment, the transmission between the second motor 502 and the electrode disc rotating shaft 215 adopts a belt pulley transmission mode, but the present invention should not be limited thereto, and a transmission mode such as a chain sprocket, a gear transmission, etc. capable of driving the electrode disc rotating shaft 215 to rotate may also be adopted. In this embodiment, the rotation mode of the second motor 502 driving the pole disc rotating shaft is not limited to a complete 360 ° rotation, and the pole disc rotating shaft can rotate within a preset angle range by setting the second rotation limiter 505 and the working mode of the first motor 402.
In this embodiment, the magnetic pole 301 is made of neodymium iron boron, the magnetic field strength is 1000GS-3000GS, and the materials of the parts contacting or adjacent to the magnetic pole 301 are all made of non-magnetic materials, such as aluminum alloy, stainless steel, plastic, etc.
Example two
The embodiment is an embodiment of the polishing apparatus 700, and includes a polishing shaft 701, a fixture 702 for clamping a workpiece, and an electromagnetic coupling device as before, where the fixture 702 is connected to the bottom of the polishing shaft 701, the insulating flange 600 contains an electromagnetic rheological polishing solution, and the bottom surface of the workpiece is in contact with the electromagnetic rheological polishing solution, as shown in fig. 9.
When the embodiment is implemented, the method specifically comprises the following steps:
the polishing device 700 is arranged on a precise vertical numerical control milling machine, as shown in fig. 9, a gasket is additionally arranged at the bottom of a magnetic pole 301 or the thickness of the gasket is adjusted to control the magnetic field intensity of the surface of a workpiece to be 1000-3000 GS, the rotating eccentricity of the magnetic pole 301 is controlled to be 0-5 mm by adjusting the relative positions of a magnetic pole guide rail 304 and a magnetic pole sliding block 303, a first rotating limiter 404 and a second rotating limiter 505 are arranged according to the need of limiting or not to respectively control the rotating limiting of the electrode chassis 202 and the magnetic pole 301, and the structure and the size of the electrode group 201 are selected;
the workpiece is arranged on a clamp 702, the clamp 702 is arranged on the lower section of a polishing rotating shaft 701, the upper section of the polishing rotating shaft 701 is connected with a milling machine spindle, the lower surface of the workpiece and the wear-resistant insulating layer 212 keep the end surface horizontal, and the interval between the lower surface of the workpiece and the wear-resistant insulating layer 212 is adjusted to be 0.5 mm-3 mm through a milling machine Z-axis up-down motion system;
preparing an electromagnetic rheological polishing solution according to a processing object, wherein the electromagnetic rheological polishing solution comprises 70-85 wt% of silicone oil with the viscosity of 50-500 CS, 10-30 wt% of micron-sized Fe3O4 particles, 1-5 wt% of dispersing agent, 2-10 wt% of micron-sized polishing abrasive particles and a small amount of stabilizing additive, mixing the components, fully stirring, and vibrating for 10-30 minutes by ultrasonic waves to form the electromagnetic rheological polishing solution.
Uniformly pouring an electromagnetic rheological polishing solution into the cavities of the insulating flange 600, the electrode chassis 202 and the wear-resistant insulating layer 212 of the polishing equipment, starting the second motor 502, and rotating the magnetic pole 301 with a certain eccentric distance under the drive of the second belt and the second belt wheel 501 to realize the conversion from a static magnetic field to a dynamic magnetic field on the surface of the electrode chassis 202, wherein the electromagnetic rheological polishing solution forms a flexible polishing pad with real-time abrasive updating self-sharpening and shape recovery under the action of the dynamic magnetic field;
according to the characteristics of a processing object, alternating current and direct current with proper voltage and frequency are provided for the electrode group 201 through a direct current and alternating current high-voltage power supply, a high-voltage electric field of 1000 kV/mm-5000 kV/mm is formed on the surface of the electrode chassis 202 by adjacent electrodes, the coupling effect of the electric field and the magnetic field on the flexible polishing pad further improves the shearing stress and viscosity of the flexible polishing pad, and meanwhile, the removal rates of different positions of the polishing pad can be changed through the shapes of different electrode groups 20121, so that planarization polishing can be realized through optimizing track movement;
and starting a main shaft of the milling machine, wherein the rotating speed is 60-1000 rpm, and the workpiece and the electromagnetic coupling flexible polishing head form relative motion, so that the efficient ultra-smooth processing of the surface of the workpiece is realized.
Through the steps, the embodiment can carry out precise optical processing through the electromagnetic coupling field, and can obtain better polishing effect and wide application range.
Example III
The present embodiment is an electromagnetic rheological property measuring device 800 applying the polishing device 700 of the second embodiment, which is used for testing the mechanical properties of the electromagnetic coupling polishing device 700, as shown in fig. 10, and includes the polishing device 700 of the second embodiment, a rotation force sensor 801 and a signal transmitter 802, wherein the rotation force sensor 801 is connected to one end of the polishing shaft 701, the signal transmitter 802 is connected to the rotation force sensor 801 in a signal manner, and an energy shielding cover 803 is provided on the outer cover of the insulating flange 600.
When the embodiment is implemented, the method specifically comprises the following steps:
mounting an electromagnetic rheological property measuring device 800 on a precise vertical numerical control milling machine, mounting a workpiece on a clamp 702, mounting the clamp 702 on the lower section of a polishing rotating shaft 701, connecting the upper section of the polishing rotating shaft 701 with a milling machine main shaft, connecting the milling machine main shaft with a signal transmitter 802 through a rotary force measuring sensor 801, fixing the milling machine on the milling machine, keeping the lower surface of the workpiece and a wear-resistant insulating layer 212 to be horizontal, and fixing an energy shielding cover 803 between an electric field generating component and a force measuring instrument through the energy shielding cover 803 concentrically with an insulating flange 600;
preparing an electromagnetic rheological polishing solution according to a processing object, wherein the electromagnetic rheological polishing solution comprises 70-85 wt% of silicone oil with the viscosity of 50-500 CS, 10-30 wt% of micron-sized Fe3O4 particles, 1-5 wt% of dispersing agent, 2-10 wt% of micron-sized polishing abrasive particles and a small amount of stabilizing additive, mixing the components, fully stirring, vibrating for 10-30 minutes by ultrasonic waves to form the electromagnetic rheological polishing solution, and uniformly pouring the electromagnetic rheological polishing solution into the cavities of the insulating flange 600, the electrode chassis 202 and the wear-resistant insulating layer 212 of the polishing equipment;
adjusting the magnetic field structure and parameters, the electric field structure and parameters and the milling machine processing technological parameters; and starting a milling machine spindle, starting a rotary force measuring sensor 801, setting positive pressure signals and torque signals in the acquisition time of 30s, 60s and 120s, adjusting the interval between the lower surface of a workpiece and the wear-resistant insulating layer 212 to be 0.1-3 mm through a Z-axis up-down motion system of the milling machine in the force measuring process, and stopping the milling machine spindle after the force measuring is finished.
Through the steps, the influence of the rotating speed of the polishing device 700 on the polishing effect can be studied, and a research basis is provided for obtaining a better surface processing effect of the precise optical material.
Example IV
Fig. 11 shows an electromagnetic rheological property measuring device 800 of an electromagnetic coupling device according to a first embodiment, which is used for testing rheological properties of an electromagnetic rheological polishing solution, and comprises a measuring rotor 804, a torque meter 805, and the electromagnetic coupling device according to the first embodiment, wherein the measuring rotor 804 is connected with the torque meter 805, the electromagnetic rheological polishing solution is contained in an insulating flange 600, an end portion of the measuring rotor 804 extends into the electromagnetic rheological polishing solution, and an energy shielding cover 803 is arranged on an outer cover of the insulating flange 600.
When the embodiment is implemented, the method specifically comprises the following steps:
the testing device is arranged on a precise vertical numerical control milling machine, an insulating flange 600 is arranged on the upper surface of an electrode chassis 202, a measuring rotor 804 is concentrically arranged in an inner hole of the insulating flange 600, the measuring rotor 804 is connected with a main shaft of the machine tool through a torque meter 805, a field shielding cover and the insulating flange 600 are concentric and fixed between the electric field generating assembly 200 and the torque meter 805, and a first rotation limiter 404 and a second rotation limiter 505 are not arranged;
a small amount of electromagnetic rheological polishing liquid with different components and component proportions is configured and placed in the gap between the measuring rotor 804 and the wear-resistant insulating layer 212;
adjusting the magnetic field structure and parameters and electromagnetic structure parameters;
the distance between the lower surface of the workpiece and the abrasion-resistant insulating layer 212 is adjusted to be 1mm through a milling machine Z-axis up-down motion system, a milling machine spindle is locked, a torque meter 805 is started, torque signals in 60S are set, a first motor 402 and a second motor 502 are started to realize the rotation of an electrode chassis 202 and the rotation of a magnetic pole 301, the rotating speed is 60 rpm-200 rpm, when the rotating speeds are the same, a static magnetic field is adopted, and when the rotating speeds are different, the electromagnetic rheological fluid is subjected to the action of a dynamic magnetic field;
stopping the main shaft after the force measurement is finished, and closing the direct-current and alternating-current high-voltage power supply; and (5) converting the obtained torque through a formula to obtain the shear stress and viscosity of the electromagnetic rheological polishing liquid.
Through the steps, the rheological properties of the current rheological polishing solution with different compositions in electromagnetic coupling fields with different magnetic field forms and electric field forms can be researched, and a research basis is provided for obtaining better surface processing effects of the precise optical materials.
It is to be understood that the above examples of the present invention are provided by way of illustration only and not by way of limitation of the embodiments of the present invention. Other variations or modifications of the above teachings will be apparent to those of ordinary skill in the art. It is not necessary here nor is it exhaustive of all embodiments. Any modification, equivalent replacement, improvement, etc. which come within the spirit and principles of the invention are desired to be protected by the following claims.
Claims (9)
1. The electromagnetic coupling device is characterized by comprising a base (100), an electric field generating assembly (200), a magnetic field generating assembly (300), a first rotating assembly (400) for driving the electric field generating assembly (200) to rotate, a second rotating assembly (500) for driving the magnetic field generating assembly (300) to rotate and an insulating flange (600) arranged above the electric field generating assembly (200), wherein the first rotating assembly (400) is connected with the electric field generating assembly (200), the second rotating assembly (500) is connected with the magnetic field generating assembly (300), the electric field generating assembly (200) and the magnetic field generating assembly (300) are connected with the base (100), and an electric field generated by the electric field generating assembly (200) and a magnetic field generated by the magnetic field generating assembly (300) are distributed in the insulating flange (600);
the electric field generating assembly (200) comprises an electrode group (201), an electrode chassis (202), an electrode disc shaft cylinder (203), a first carbon brush (204), a first carbon brush holder (205), a second carbon brush (206), a second carbon brush holder (207), a first conductive ring (208) and a second conductive ring (209):
the first carbon brush holder (205) is fixedly arranged on the electrode disc shaft barrel (203), the first carbon brush (204) is fixed on the first carbon brush holder (205), a first conductive sheet is arranged between the first carbon brush (204) and the first carbon brush holder (205), the first carbon brush (204) is attached to the bottom of the electrode chassis (202), and a first conductive ring (208) is arranged between the first carbon brush (204) and the electrode chassis (202);
the second carbon brush holder (207) is fixedly arranged on the electrode disc shaft barrel (203), the second carbon brush (206) is fixed on the second carbon brush holder (207), a second conductive sheet is arranged between the second carbon brush (206) and the second carbon brush holder (207), the second carbon brush (206) is attached to the bottom of the electrode chassis (202), and a second conductive ring (209) is arranged between the second carbon brush (206) and the electrode chassis (202);
the first conducting ring (208) is electrically connected with the positive electrode (210) of the electrode group (201), the second conducting ring (209) is electrically connected with the negative electrode (211) of the electrode group (201), and the first conducting sheet and the second conducting sheet are communicated with an direct-current and alternating-current high-voltage power supply;
the electrode group (201) is embedded in the electrode chassis (202), and a wear-resistant insulating layer (212) is arranged on the upper surface of the electrode chassis (202).
2. The electromagnetic coupling device according to claim 1, wherein the electrode chassis (202) is mounted on an electrode disc rotating shaft (215), the electrode disc rotating shaft (215) is disposed on the outer periphery of the electrode disc shaft cylinder (203), a first bearing (216) is disposed between the electrode disc rotating shaft (215) and the electrode disc shaft cylinder (203), and a first belt wheel (401) is connected on the outer periphery of the electrode disc rotating shaft (215).
3. The electromagnetic coupling device according to claim 2, wherein the first rotating assembly (400) comprises a first motor (402) and a first timing belt (403), the first motor (402) being mounted to the base (100), the first timing belt (403) being connected between the first motor (402) and the first pulley (401).
4. An electromagnetic coupling device according to any one of claims 1 to 3, wherein the magnetic field generating assembly (300) comprises a magnetic pole (301), a magnetic pole fixing shaft (302), a magnetic pole slider (303) and a magnetic pole guide rail (304), the magnetic pole slider (303) is mounted at one end of the magnetic pole fixing shaft (302), an inner hole for mounting the magnetic pole (301) is arranged at the other end of the magnetic pole fixing shaft (302), and the magnetic pole slider (303) is connected with the magnetic pole guide rail (304).
5. The electromagnetic coupling device according to claim 4, wherein the magnetic pole guide rail (304) is mounted on a magnetic pole rotating cylinder (305), a magnetic pole fixed shaft cylinder (306) is connected to the outer periphery of the magnetic pole rotating cylinder (305), the magnetic pole fixed shaft cylinder (306) is connected to the base (100), a second bearing (307) is connected between the magnetic pole rotating cylinder (305) and the magnetic pole fixed shaft cylinder (306), and a second belt wheel (501) is connected to the outer periphery of the magnetic pole rotating cylinder (305).
6. The electromagnetic coupling device of claim 5, wherein the second rotating assembly (500) includes a second motor (502) and a second timing belt (503), the second motor (502) being mounted to the base (100), the second timing belt (503) being connected between the second motor (502) and the second pulley (501).
7. A polishing device, comprising a polishing rotating shaft (701), a clamp (702) for clamping a workpiece and an electromagnetic coupling device according to any one of claims 1 to 6, wherein the clamp (702) is connected to the bottom of the polishing rotating shaft (701), an electromagnetic rheological polishing liquid is contained in the insulating flange (600), and the bottom surface of the workpiece is in contact with the electromagnetic rheological polishing liquid.
8. An electromagnetic rheological property measuring device, comprising the polishing device, a rotary force sensor (801) and a signal transmitter (802) according to claim 7, wherein the rotary force sensor (801) is connected to one end of the polishing rotating shaft (701), the signal transmitter (802) is in signal connection with the rotary force sensor (801), and the insulating flange (600) is provided with an energy shielding cover (803) in a covering manner.
9. An electromagnetic rheological property measuring device, characterized by comprising a measuring rotor (804), a torque meter (805) and an electromagnetic coupling device according to any one of claims 1 to 6, wherein the measuring rotor (804) is connected with the torque meter (805), an electromagnetic rheological polishing liquid is contained in the insulating flange (600), the end part of the measuring rotor (804) stretches into the electromagnetic rheological polishing liquid, and an energy shielding cover (803) is arranged on the outer cover of the insulating flange (600).
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| CN201910810297.0A CN110517842B (en) | 2019-08-29 | 2019-08-29 | Electromagnetic coupling device and polishing device with same and electromagnetic rheological property measuring device |
| PCT/CN2019/117610 WO2021035971A1 (en) | 2019-08-29 | 2019-11-12 | Electromagnetic coupling device, polishing device having same, and electromagnetic rheological property measuring device |
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| CN201910810297.0A CN110517842B (en) | 2019-08-29 | 2019-08-29 | Electromagnetic coupling device and polishing device with same and electromagnetic rheological property measuring device |
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| WO2010064493A1 (en) * | 2008-12-03 | 2010-06-10 | キヤノンアネルバ株式会社 | Plasma processing apparatus, apparatus for manufacturing magnetoresistive element, method for forming magnetic thin film and program for controlling film formation |
| CN105328516A (en) * | 2015-11-18 | 2016-02-17 | 广东工业大学 | Dynamic magnetic field self-sharpening finishing device for flexible magnetorheological finishing pad and finishing method for dynamic magnetic field self-sharpening finishing device |
| CN210667955U (en) * | 2019-08-29 | 2020-06-02 | 广东工业大学 | Electromagnetic coupling device, polishing device with same and electromagnetic rheological property measuring device |
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| US7074114B2 (en) * | 2003-01-16 | 2006-07-11 | Micron Technology, Inc. | Carrier assemblies, polishing machines including carrier assemblies, and methods for polishing micro-device workpieces |
| CN103317413B (en) * | 2013-07-04 | 2016-03-30 | 北京理工大学 | Electromagnetism self-excited vibration ER effect composite polishing method and device |
| CN105458840B (en) * | 2015-12-29 | 2017-12-29 | 广东工业大学 | A kind of magnetostatic dynamic field MRF mechanism experimental rig and its processing method |
| CN106312796B (en) * | 2016-10-20 | 2018-05-15 | 广东工业大学 | Two-sided planarization system of processing |
| US20190080829A1 (en) * | 2017-09-12 | 2019-03-14 | Dexter Magnetic Technologies, Inc. | Magnet array with near sinusoidal field output |
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| WO2010064493A1 (en) * | 2008-12-03 | 2010-06-10 | キヤノンアネルバ株式会社 | Plasma processing apparatus, apparatus for manufacturing magnetoresistive element, method for forming magnetic thin film and program for controlling film formation |
| CN105328516A (en) * | 2015-11-18 | 2016-02-17 | 广东工业大学 | Dynamic magnetic field self-sharpening finishing device for flexible magnetorheological finishing pad and finishing method for dynamic magnetic field self-sharpening finishing device |
| CN210667955U (en) * | 2019-08-29 | 2020-06-02 | 广东工业大学 | Electromagnetic coupling device, polishing device with same and electromagnetic rheological property measuring device |
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