CN110490929A - Substrate detection equipment and its detection method - Google Patents

Substrate detection equipment and its detection method Download PDF

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Publication number
CN110490929A
CN110490929A CN201910681802.6A CN201910681802A CN110490929A CN 110490929 A CN110490929 A CN 110490929A CN 201910681802 A CN201910681802 A CN 201910681802A CN 110490929 A CN110490929 A CN 110490929A
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CN
China
Prior art keywords
substrate
detection
module
residue information
cleannes
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Pending
Application number
CN201910681802.6A
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Chinese (zh)
Inventor
郝鹏
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Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Application filed by Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
Priority to CN201910681802.6A priority Critical patent/CN110490929A/en
Publication of CN110490929A publication Critical patent/CN110490929A/en
Pending legal-status Critical Current

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/70Determining position or orientation of objects or cameras

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

The invention discloses a kind of substrate detection equipment and its detection method, the detection method includes: to obtain the position of substrate;It detects and obtains residue information;And according to the residue information, judge the cleannes of the position, and feedback result.After the present invention is positioned by optical microscopy, start photoresist detection device and photoresist residue detection is carried out to required position, it may be implemented to have detected and just feed back, it is simple and efficient, mechanical arm motion detection device to position to be detected is utilized simultaneously, compared to traditional mode, large size panel can not have to slice just and the operation of non-destructive testing can be performed, and take into account consumptive material utilization rate and measurement efficiency.

Description

Substrate detection equipment and its detection method
Technical field
The invention belongs to terminal display field more particularly to a kind of substrate detection equipment and its detection methods.
Background technique
Organic electroluminescence device (Organic Light Emitting Diode, OLED) with its self-luminous, it is all solid state, The advantages that high contrast, becomes New Type Display Devices most potential in recent years.It is current with evaporated device preparation OLED device The main way of production, but evaporation process stock utilization is low, and the poor disadvantage of uniformity lacks always effective solution scheme. Solwution method prepares OLED film, and with its stock utilization height, the advantages such as equipment manufacturing cost is low show apparent advantage.
And solwution method processing procedure includes the modes such as spin coating, printing, printing, wherein the solution of (or function) material that shines will be contained It is dropped in predetermined position in a manner of fine droplet (pl grades), then by solvent evaporative removal, leaves behind solute (luminous or function Material) method of film that is formed is referred to as inkjet printing (Ink-Jet Printing, IJP), and it is to be best suited at present at present The processing procedure of OLED luminescent device.
The key step that IJP prepares OLED includes:
(1) by the drips of accurate volume in the sub-pixel opening of panel.
(2) it is dried droplet drying by vacuum decompression into film.
(3) heating anneal is handled, to promote gained OLED membrane quality.
OLED device has high requirement to membrane quality at present, this is because film quality largely influences The important parameters such as the service life of device, photochromic and efficiency.In order to obtain the film of high-quality, need printed substrates completely pollution-free Residual.Pollution residual common at present includes residual particles, photoresist residual etc..Under normal conditions, residual particles are in cleaning link It is easy to remove, and photoresist residual can not be removed by conventional cleaning and optical microscopy (optical is difficult to be utilized Microscope, OM) discovery.If substrate surface there are photoresist residual, most direct consequence be OLED device film thickness not , so that light emission luminance is inconsistent in pixel and the service life is shorter.
Photoresist residue detection is carried out to oled substrate at present and substantially relies on OM and common elemental analysis equipment.But one As in the case of above-mentioned detection device objective table design size it is generally smaller, for large size panel photoresist residual detection then need Shift to an earlier date sliver, then clearly visible following several drawbacks:
1. residue detection is usually inspected by random samples just for respective regions, however large size panel is then needed to be cut to small Piece, this can expend whole panel, be unfavorable for environmental protection.
2. if being cleaned, being detected, clearly first to carry out the step of photoresist residue detection executes printing again It washes, print four steps, this is obviously more troublesome.
Therefore it needs to propose a solution to the problems of the prior art.
Summary of the invention
The object of the present invention is to provide a kind of detection method of substrate detection equipment and equipment, the present invention passes through detection Device carries out photoresist residue detection to required position, may be implemented to have detected and just feed back, is simple and efficient, while being moved using mechanical arm The position that motion detection device is detected to needs, compared to traditional mode, large size panel can be carried out lossless without slice Detection, has taken into account consumptive material utilization rate and measurement efficiency.
According to an aspect of the present invention, the present invention provides a kind of detection method of substrate detection equipment, including obtains substrate Position;It detects and obtains residue information;And according to the residue information, judge the cleannes of the position, and anti- Present result.
Further, it is described obtain substrate position the step of in, using a camera lens to obtain by way of light transmitting-receiving The position of substrate.
Further, the cleannes of the position, and the step of feedback result are judged according to the residue information described In rapid, if the position without the residue information, determines that the position is pollution-free, if the position has the residue to believe Breath, then determine that there is pollution in the position.
According to another aspect of the present invention, the present invention also provides a kind of substrate detection equipments comprising processor and storage Device, the memory is for storing instruction and data, the processor are used to execute following steps: obtaining the position of substrate;Inspection It surveys and obtains residue information;And according to the residue information, judge the cleannes of the position, and feedback result.
Further, the substrate detection equipment further includes camera model, for obtaining the position of substrate;Detection module, For detecting and obtaining residue information, the detection module is set on the camera model;First movement module, for moving The camera model;Second mobile module, for moving the substrate;And message processing module, for being believed according to residue Breath judges the cleannes of the position, the message processing module respectively with the camera model, the detection module, described the One mobile module and second mobile module connection.
Further, the message processing module includes: judging unit, for judging the cleannes of substrate;And it executes Unit, execution unit, for receiving the feedback result of cleannes and controlling the first movement module and the second mobile mould Block.
Further, the camera model includes an optical microscopy.
Further, the detection module includes photoresist detection device.
Further, the first movement module is for being moved forward and backward the camera model.
Further, second mobile module is for moving left and right the substrate.
The present invention utilizes the optical microscopy of camera by the way that photoresist detection device to be integrated on the camera of ink-jet printer It is positioned, then starts photoresist detection device and photoresist residue detection is carried out to required position, may be implemented to have detected and just feed back, The position for being simple and efficient, while being detected using mechanical arm motion detection device to needs, compared to traditional mode, large scale face Plate can not have to slice just and the operation of non-destructive testing can be performed, and take into account consumptive material utilization rate and measurement efficiency.
Detailed description of the invention
With reference to the accompanying drawing, by the way that detailed description of specific embodiments of the present invention, technical solution of the present invention will be made And its advantages are apparent.
Fig. 1 is the flow diagram of the detection method of substrate detection equipment provided in an embodiment of the present invention.
Fig. 2 is a structural schematic diagram of substrate detection equipment provided in an embodiment of the present invention.
Fig. 3 is another structural schematic diagram of substrate detection equipment provided in an embodiment of the present invention.
Fig. 4 is the structural schematic diagram of detection module provided in an embodiment of the present invention.
Fig. 5 is the structural schematic diagram of message processing module provided in an embodiment of the present invention.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete Site preparation description.Obviously, described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on Embodiment in the present invention, those skilled in the art's every other implementation obtained without creative efforts Example, shall fall within the protection scope of the present invention.
Description and claims of this specification and term " first " in above-mentioned attached drawing, " second ", " third " etc. (if present) is to be used to distinguish similar objects, without being used to describe a particular order or precedence order.It should be appreciated that this The object of sample description is interchangeable under appropriate circumstances.In addition, term " includes " and " having " and their any deformation, meaning Figure, which is to cover, non-exclusive includes.
In specification of the invention literary, the attached drawing that is discussed herein below and for describing each implementation of principle disclosed by the invention Example is merely to illustrate, and should not be construed as limiting the scope of the present disclosure.Those skilled in the art will appreciate that the present invention Principle can implement in any system suitably arranged.It will be explained in illustrative embodiments, this be shown in the attached drawings The example of a little embodiments.In addition, terminal accoding to exemplary embodiment will be described in detail with reference to the attached drawings.It is identical attached in attached drawing Figure grade refers to identical element.
Term used in description of the invention is only used to describe particular implementation, and is not intended to show of the invention Concept.Unless have clearly different meanings in context, it is otherwise, used in the singular to express the table for covering plural form It reaches.In the description of the present invention, it should be appreciated that there are this hairs for the terms meant for illustration such as " comprising ", " having " and " containing " A possibility that feature for being disclosed in bright specification, number, step, movement or combinations thereof, and be not intended to exclude may be present or can A possibility that adding other one or more features, number, step, movement or combinations thereof.Same reference numerals in attached drawing refer to For same section.
As shown in Figure 1, the embodiment of the present invention provides a kind of detection method of substrate detection equipment 1, include the following steps.
Step S10 obtains the position of substrate.
In embodiments of the present invention, substrate detection equipment 1 includes a camera, and the optical microscopy function of camera utilizes camera lens The position of substrate is obtained by way of light transmitting-receiving.Wherein light transmitting-receiving mode is using radiation of visible light in substrate surface formation office Portion's scattering or refraction, and the light for receiving the scattering or reflecting, the position of substrate is judged according to the deflection of light.
Step S20 is detected and is obtained residue information.
In embodiments of the present invention, using mechanical arm motion detection device to position to be detected, then start photoresist inspection Device 3021 is surveyed, reference can be made to substrate is detected shown in Fig. 4, compared to traditional mode, large size panel can not have to cut Piece is carried out non-destructive testing, has taken into account consumptive material utilization rate and measurement efficiency.
Step S30 judges the cleannes of the position, and feedback result according to the residue information.
In embodiments of the present invention, if detection position noresidue information, determines that the position is pollution-free.If detecting position There is residue information, then determines that there is pollution in the position.
The embodiment of the present invention also provides a kind of inspecting substrate equipment 1, including memory 201 and processor 202, the storage Device 201 is for storing instruction and data, the processor 202 are used to execute corresponding step.
As shown in Fig. 2, Fig. 2 is a kind of structural schematic diagram of inspecting substrate equipment 1 provided in an embodiment of the present invention.Substrate inspection Looking into equipment includes memory 201 and processor 202.It will be understood by those skilled in the art that inspecting substrate equipment shown in Figure 2 Structure does not constitute the restriction to the inspecting substrate equipment 1, may include components more more or fewer than diagram, or combine certain A little components or different component layouts.
Memory 201 can be used for store instruction and data.It include executable generation in the instruction that memory 201 stores Code.The instruction that processor 202 is stored in memory 201 by operation, thereby executing various function commands and data processing.
Processor 202 is the control centre of substrate detection equipment 1, is detected using various interfaces and the entire substrate of connection The various pieces of equipment 1 by running or execute the instruction being stored in memory 201, and are called and are stored in memory 201 Interior data execute the various functions and processing data of substrate detection equipment 1, to carry out whole prison to inspecting substrate equipment Control.
In embodiments of the present invention, processor 202 in substrate detection equipment 1 can according to following instruction, by one or It is more than one that corresponding executable code is instructed to be loaded into memory 201, and run by processor 202 and be stored in storage Instruction in device 201, thereby executing: obtain the position of substrate;It detects and obtains residue information;And according to the residue Information judges the cleannes of the position, and feedback result.
As shown in figure 3, another structural schematic diagram of substrate detection equipment 1 provided in an embodiment of the present invention.Substrate detection is set Standby 1 includes camera model 301, detection module 302, first movement module 303, the second mobile module 304 and information processing mould Block 305.
Camera model 301 is used to obtain the position of substrate.
Camera model 301 includes a camera lens, and the optical microscopy function of camera model 301 passes through light transmitting-receiving side using camera lens Formula is to obtain the exact position of substrate.Wherein light transmitting-receiving mode be using radiation of visible light substrate surface formed part scattering or Refraction, and the light for receiving the scattering or reflecting, the position of substrate is judged according to the deflection of light.
Detection module 302 is set to the camera model for detecting and obtaining residue information, the detection module 302 On 301.
As shown in figure 4, detection module 302 includes photoresist detection device 3021, the position of substrate is determined in camera model 301 Afterwards, photoresist residue detection is carried out, may be implemented to have detected and just feed back, be simple and efficient.
First movement module 303 includes a mechanical arm, and the first movement module 303 is for moving the camera model 301。
First movement module 303 is for being moved forward and backward camera model 301, motion detection device to the position for needing to detect, Compared to traditional mode, large size panel can not have to the operation that slice is carried out non-destructive testing, take into account consumptive material utilization rate With measurement efficiency.
Second mobile module 304 also may include a mechanical arm, and second mobile module 304 is for moving the base Plate.
Second mobile module 304 is for moving left and right substrate, the position that moving substrate is detected to needs, compared to traditional Mode, large size panel can not have to slice and be carried out non-destructive testing, take into account consumptive material utilization rate and measurement efficiency.
Message processing module 305 is used to judge according to residue information the cleannes of the position, the information processing mould Block 305 is moved with the camera model 301, the detection module 302, the first movement module 303 and described second respectively Dynamic model block 304 connects.
As shown in figure 5, message processing module 305 includes: judging unit 3051, for judging the cleannes of substrate;And Execution unit 3052, for receiving the feedback result of cleannes and controlling the first movement module 303 and second movement Module 304.Wherein judging unit 3051 is connected with camera model 301 and detection module 302, execution unit 3052 and first movement Module 303 and the second mobile module 304 are connected.
The present invention utilizes the optical microscopy of camera by the way that photoresist detection device to be integrated on the camera of ink-jet printer It is positioned, then starts photoresist detection device and photoresist residue detection is carried out to required position, may be implemented to have detected and just feed back, The position for being simple and efficient, while being detected using mechanical arm motion detection device to needs, compared to traditional mode, large scale face Plate can not have to slice and be carried out non-destructive testing, take into account consumptive material utilization rate and measurement efficiency.
It is provided for the embodiments of the invention a kind of substrate detection equipment above and its detection method is described in detail, Used herein a specific example illustrates the principle and implementation of the invention, and the explanation of above embodiments is only used In facilitating the understanding of the method and its core concept of the invention;Meanwhile for those skilled in the art, think of according to the present invention Think, there will be changes in the specific implementation manner and application range, in conclusion the content of the present specification should not be construed as pair Limitation of the invention.

Claims (10)

1. a kind of detection method of substrate detection equipment characterized by comprising
Obtain the position of substrate;
It detects and obtains residue information;And
According to the residue information, the cleannes of the position, and feedback result are judged.
2. detection method according to claim 1, which is characterized in that it is described obtain substrate position the step of in, make The position of substrate is obtained by way of light transmitting-receiving with a camera lens.
3. detection method according to claim 1, which is characterized in that described according to the residue information, judge institute Cleannes that rheme is set, and in the step of feedback result, if the position without the residue information, determine the position without Pollution, if there is the residue information in the position, determines that there is pollution in the position.
4. a kind of substrate detection equipment, which is characterized in that including processor and memory, the memory for storing instruction and Data, the processor is for executing following steps:
Obtain the position of substrate;
It detects and obtains residue information;And
According to the residue information, the cleannes of the position, and feedback result are judged.
5. substrate detection equipment according to claim 4, which is characterized in that further include:
Camera model, for obtaining the position of substrate;
Detection module, for detecting and obtaining residue information, the detection module is set on the camera model;
First movement module, for moving the camera model;
Second mobile module, for moving the substrate;And
Message processing module, for judging the cleannes of the position, the message processing module difference according to residue information It is connect with the camera model, the detection module, the first movement module and second mobile module.
6. substrate detection equipment according to claim 5, which is characterized in that the message processing module includes:
Judging unit, for judging the cleannes of substrate;And
Execution unit, for receiving the feedback result of cleannes and controlling the first movement module and the second mobile mould Block.
7. substrate detection equipment according to claim 5, which is characterized in that the camera model includes a camera lens.
8. substrate detection equipment according to claim 5, which is characterized in that the detection module includes photoresist detection dress It sets.
9. substrate detection equipment according to claim 6, which is characterized in that the first movement module is for being moved forward and backward The camera model.
10. substrate detection equipment according to claim 10, which is characterized in that second mobile module is moved for left and right Move the substrate.
CN201910681802.6A 2019-07-26 2019-07-26 Substrate detection equipment and its detection method Pending CN110490929A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910681802.6A CN110490929A (en) 2019-07-26 2019-07-26 Substrate detection equipment and its detection method

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Application Number Priority Date Filing Date Title
CN201910681802.6A CN110490929A (en) 2019-07-26 2019-07-26 Substrate detection equipment and its detection method

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102253505A (en) * 2010-05-20 2011-11-23 北京京东方光电科技有限公司 Substrate position detecting method and device
CN103941541A (en) * 2014-04-11 2014-07-23 京东方科技集团股份有限公司 Position identifying method and device of mask plate polluted area
CN104391427A (en) * 2014-12-17 2015-03-04 合肥鑫晟光电科技有限公司 Mask plate detector, mask plate detecting method and mask plate washing equipment
CN105080855A (en) * 2015-06-03 2015-11-25 合肥京东方光电科技有限公司 Detection device and method for marks of substrates

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102253505A (en) * 2010-05-20 2011-11-23 北京京东方光电科技有限公司 Substrate position detecting method and device
CN103941541A (en) * 2014-04-11 2014-07-23 京东方科技集团股份有限公司 Position identifying method and device of mask plate polluted area
CN104391427A (en) * 2014-12-17 2015-03-04 合肥鑫晟光电科技有限公司 Mask plate detector, mask plate detecting method and mask plate washing equipment
CN105080855A (en) * 2015-06-03 2015-11-25 合肥京东方光电科技有限公司 Detection device and method for marks of substrates

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