CN110429156B - 一种基于分形纳米线表面结构的Si-APD光电探测器及制备方法 - Google Patents
一种基于分形纳米线表面结构的Si-APD光电探测器及制备方法 Download PDFInfo
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- CN110429156B CN110429156B CN201910742456.8A CN201910742456A CN110429156B CN 110429156 B CN110429156 B CN 110429156B CN 201910742456 A CN201910742456 A CN 201910742456A CN 110429156 B CN110429156 B CN 110429156B
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- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/028—Inorganic materials including, apart from doping material or other impurities, only elements of Group IV of the Periodic System
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by at least one potential-jump barrier or surface barrier, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier or surface barrier
- H01L31/107—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier or surface barrier the potential barrier working in avalanche mode, e.g. avalanche photodiode
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic System
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Microelectronics & Electronic Packaging (AREA)
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CN201910742456.8A CN110429156B (zh) | 2019-08-13 | 2019-08-13 | 一种基于分形纳米线表面结构的Si-APD光电探测器及制备方法 |
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WO2022170476A1 (zh) * | 2021-02-09 | 2022-08-18 | 深圳市大疆创新科技有限公司 | 激光接收电路及其控制方法、测距装置、移动平台 |
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6184054B1 (en) * | 1998-06-29 | 2001-02-06 | Miracle Technology Co., Ltd. | Optical electronic IC capable of photo detection and its process |
CN101258577A (zh) * | 2005-06-10 | 2008-09-03 | 增强技术公司 | 高灵敏度、高分辨率的检测器装置和阵列 |
CN103137773A (zh) * | 2013-03-12 | 2013-06-05 | 电子科技大学 | 以黑硅为光敏层的Si-APD光电探测器及其制备方法 |
CN103746041A (zh) * | 2014-01-24 | 2014-04-23 | 哈尔滨工业大学 | 一种硅基apd红外敏感增强的方法 |
CN109659377A (zh) * | 2018-12-13 | 2019-04-19 | 深圳市灵明光子科技有限公司 | 单光子雪崩二极管及制作方法、探测器阵列、图像传感器 |
CN109716525A (zh) * | 2016-09-23 | 2019-05-03 | 苹果公司 | 堆叠式背面照明spad阵列 |
-
2019
- 2019-08-13 CN CN201910742456.8A patent/CN110429156B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6184054B1 (en) * | 1998-06-29 | 2001-02-06 | Miracle Technology Co., Ltd. | Optical electronic IC capable of photo detection and its process |
CN101258577A (zh) * | 2005-06-10 | 2008-09-03 | 增强技术公司 | 高灵敏度、高分辨率的检测器装置和阵列 |
CN103137773A (zh) * | 2013-03-12 | 2013-06-05 | 电子科技大学 | 以黑硅为光敏层的Si-APD光电探测器及其制备方法 |
CN103746041A (zh) * | 2014-01-24 | 2014-04-23 | 哈尔滨工业大学 | 一种硅基apd红外敏感增强的方法 |
CN109716525A (zh) * | 2016-09-23 | 2019-05-03 | 苹果公司 | 堆叠式背面照明spad阵列 |
CN109659377A (zh) * | 2018-12-13 | 2019-04-19 | 深圳市灵明光子科技有限公司 | 单光子雪崩二极管及制作方法、探测器阵列、图像传感器 |
Non-Patent Citations (1)
Title |
---|
"Strongly enhanced light trapping in a two-dimensional;Barbara Fazio;《Light:Science &Applications》;20160430;第1-5页 * |
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Address after: 400021 No.7, 23rd floor, No.11, Panxi seventh branch road, Jiangbei District, Chongqing Patentee after: Chongqing Lianxin Intelligent Technology Research Institute Co.,Ltd. Country or region after: China Address before: 400021 No.7, 23rd floor, No.11, Panxi seventh branch road, Jiangbei District, Chongqing Patentee before: CHONGQING LIANXIN PHOTOELECTRIC TECHNOLOGY RESEARCH INSTITUTE Co.,Ltd. Country or region before: China |
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