CN110400767A - Base plate cleaning device - Google Patents
Base plate cleaning device Download PDFInfo
- Publication number
- CN110400767A CN110400767A CN201910703138.0A CN201910703138A CN110400767A CN 110400767 A CN110400767 A CN 110400767A CN 201910703138 A CN201910703138 A CN 201910703138A CN 110400767 A CN110400767 A CN 110400767A
- Authority
- CN
- China
- Prior art keywords
- water
- outlet
- filter
- water inlet
- base plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 50
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 128
- 239000002351 wastewater Substances 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims description 23
- 238000005507 spraying Methods 0.000 claims description 12
- 230000007246 mechanism Effects 0.000 claims description 11
- 239000007921 spray Substances 0.000 claims description 7
- 238000001914 filtration Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 description 12
- 230000000694 effects Effects 0.000 description 11
- 239000004973 liquid crystal related substance Substances 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 238000012423 maintenance Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The present invention provides a kind of base plate cleaning devices.The base plate cleaning device includes a first filter, one second filter, a discharge pipe line and several protection valves；Discharge pipe line includes a supervisor, an outlet pipe and several water inlet pipes；First filter includes one first water inlet, one first water outlet and at least one first discharge outlet, and the second filter includes one second water inlet, one second water outlet and at least one second discharge outlet；Supervisor is equipped with an apopore and several blastholes；First water inlet accesses ejected wash water, and the first water outlet connects the second water inlet, and every one first discharge outlet is connected to its corresponding blasthole by a water inlet pipe；Second water outlet exports filtered ejected wash water, and every one second discharge outlet is connected to its corresponding blasthole by a water inlet pipe；One end of outlet pipe connects apopore, and waste water is discharged in the other end；It is equipped with a protection valve on each water inlet pipe, by the way that protection valve is arranged on water inlet pipe, can guarantee that ejected wash water is effectively filtered.
Description
Technical field
The present invention relates to field of display technology more particularly to a kind of base plate cleaning devices.
Background technique
In field of display technology, liquid crystal display (Liquid Crystal Display, LCD) and Organic Light Emitting Diode
The flat-panel monitors such as (Organic Light Emitting Diode, OLED) display gradually replace CRT monitor, extensively
General is applied to LCD TV, mobile phone, personal digital assistant, digital camera, computer screen or laptop screen etc..
Display panel is the important component of LCD, OLED.Whether the display surface of the display panel of LCD or OLED
Plate usually all has a thin film transistor (TFT) (Thin Film Transistor, TFT) substrate.By taking the display panel of LCD as an example,
It is mainly film (Color Filter, CF) substrate by TFT substrate, coloured silk and the liquid crystal layer and sealing frame that are configured between two substrates
Glue (Sealant) is constituted, and moulding process generally comprises: leading portion array (Array) processing procedure (film, yellow light, etching and stripping
Film), middle section is at box (Cell) processing procedure (TFT substrate is bonded with CF substrate) and back segment module group assembling processing procedure (driving IC and printing path
Plate pressing).Wherein, leading portion Array processing procedure mainly forms TFT substrate, in order to control the movement of liquid crystal molecule；Middle section Cell
Processing procedure mainly adds liquid crystal between TFT substrate and CF substrate；Back segment module group assembling processing procedure mainly drives IC pressing and print
The integration of printed circuit board, and then liquid crystal molecule rotation is driven, show image.
At present in FPD manufacturing process, cleans, goes water drying, coating, prebake conditions, exposure, development and rear baking
It is the main process unit of yellow light process, wherein the effect of cleaning unit is the dust granules removed on glass substrate
(Particle), the effect for removing water drying unit is to remove the hydrophobicity of moisture and increase surface on substrate, coater unit
Effect is one layer of photoresist of painting on substrate, and the effect of prebake conditions unit (its normal temperature is 90-130 DEG C) is except in removing photoresistance
Solvent and the adhesion for increasing photoresist and substrate, the effect of exposing unit are defined on substrate to photoresist using light shield (MASK)
Figure, the effect of developing cell are so that photoresist is left specific pattern on substrate and show figure, the rear action diagram for toasting unit
The photoresist of case further solidifies on the glass substrate.
In the prior art, cleaning equipment (Chemical Vapor Deposition High Density before chemical membrane
Cleaning, CVD HDC) in super-pressure subparticle spray cleaning fillter section (High Pressure Micro Jet
Filter House, HPMJ Filter House) it include two filters, each filter all has discharge outlet, two mistakes
The discharge outlet of filter is connected to a discharge pipe line, and it is total to be only equipped with a draining in final discharge ends in existing discharge pipe line
Valve, and there is no valve in the discharge outlet of filter, in board work, there is certain probability to will appear ejected wash water from a filter
Discharge outlet outflow, flow into the discharge outlet of another filter, then flow out from the water outlet of another filter, and then cause clear
Wash water is filtered and is directly used in cleaning, and unfiltered water, which is directly used in cleaning, can bring impurity (Particle) foreign matter into base
Plate, so that product yield be caused to decline.
Summary of the invention
It the purpose of the present invention is to provide a kind of base plate cleaning device, can guarantee that ejected wash water is effectively filtered, be promoted
Cleaning effect guarantees product yield.
To achieve the above object, the present invention provides a kind of base plate cleaning devices, including a first filter, one second mistake
Filter, a discharge pipe line and several protection valves；
The discharge pipe line includes a supervisor, an outlet pipe and several water inlet pipes；The first filter includes one first
Water inlet, one first water outlet and at least one first discharge outlet, second filter include one second water inlet, one second
Water outlet and at least one second discharge outlet；The supervisor is equipped with an apopore and several blastholes；
First water inlet accesses ejected wash water, and first water outlet connects the second water inlet, every one first discharge outlet
Its corresponding blasthole is connected to by a water inlet pipe；
Second water outlet exports filtered ejected wash water, and it is right that every one second discharge outlet by a water inlet pipe is connected to its
The blasthole answered；
One end of the outlet pipe connects the apopore, and waste water is discharged in the other end；
A protection valve is equipped on each water inlet pipe.
The base plate cleaning device further includes the outlet valve on the outlet pipe.
The first filter is including the first cavity and is set to intracorporal first filter core of first chamber, first filter core
First cavity is divided into the first space and second space；
Second filter is including the second cavity and is set to intracorporal second filter core of second chamber, second filter core
Second cavity is divided into third space and the 4th space；
First water inlet and the first water outlet are connected to first space and second space respectively, described second into
The mouth of a river and the second water outlet are connected to third space and the 4th space respectively.
The first filter includes two the first discharge outlet, and second filter includes two the second discharge outlet；
Described two first discharge outlet are connected to first space and second space respectively；
Described two second discharge outlet are connected to the third space and the 4th space respectively.
Several protection valves are hand-operated valve.
Several protection valves are motor-driven valve.
The base plate cleaning device further includes the valve control module being electrically connected with several protection valves, the valve
Control module is for controlling several protection valves while opening or simultaneously closing off.
The base plate cleaning device further includes assisted drainage pipeline, and the assisted drainage pipeline includes an auxiliary supervisor, one
First the second auxiliary branch line of auxiliary branch line two；
The auxiliary supervisor is equipped with one first connecting hole and two the second connecting holes；
The first filter further includes one first auxiliary connection, and second filter further includes that one second auxiliary connects
Interface；
First auxiliary connection is connected to one second connecting hole by one second auxiliary branch；
Second auxiliary connection is connected to another second connecting hole by another second auxiliary branch line；
One end of first auxiliary branch line connects the first connecting hole, other end access draining auxiliary gas；
A protection valve is equipped on each second auxiliary branch line.
The base plate cleaning device further includes the intake valve on first auxiliary branch line.
The base plate cleaning device further includes spraying mechanism, and the spraying mechanism is connected with the second water outlet, to receive
Filtered cleaning water spray substrate to be cleaned.
Beneficial effects of the present invention: the present invention provides a kind of base plate cleaning devices, including a first filter, one second
Filter, a discharge pipe line and several protection valves；The discharge pipe line includes a supervisor, an outlet pipe and several water inlet pipes；Institute
Stating first filter includes one first water inlet, one first water outlet and at least one first discharge outlet, second filter
Including one second water inlet, one second water outlet and at least one second discharge outlet；The supervisor is equipped with an apopore and number
A blasthole；First water inlet accesses ejected wash water, and first water outlet connects the second water inlet, every one first discharge outlet
Its corresponding blasthole is connected to by a water inlet pipe；Second water outlet exports filtered ejected wash water, each second row
The mouth of a river is connected to its corresponding blasthole by a water inlet pipe；One end of the outlet pipe connects the apopore, other end row
Waste water out；It is equipped with a protection valve on each water inlet pipe, by the way that protection valve is arranged on water inlet pipe, can guarantee that ejected wash water obtains
Effectively filtering promotes cleaning effect, guarantees product yield.
Detailed description of the invention
For further understanding of the features and technical contents of the present invention, it please refers to below in connection with of the invention detailed
Illustrate and attached drawing, however, the drawings only provide reference and explanation, is not intended to limit the present invention.
In attached drawing,
Fig. 1 is the schematic diagram of the first embodiment of base plate cleaning device of the invention；
Fig. 2 is the schematic diagram of the second embodiment of base plate cleaning device of the invention.
Specific embodiment
Further to illustrate technological means and its effect adopted by the present invention, below in conjunction with preferred implementation of the invention
Example and its attached drawing are described in detail.
Fig. 1 and Fig. 2 is please referred to, the present invention provides a kind of base plate cleaning device, including a first filter 2, one second mistake
Filter 3, a discharge pipe line 4 and several protection valves 5；
The discharge pipe line 4 includes 41, one outlet pipe 42 of supervisor and several water inlet pipes 43；The first filter 2 is wrapped
Include one first water inlet 21, one first water outlet 22 and at least one first discharge outlet 23, second filter 3 includes one the
Two water inlets 31, one second water outlet 32 and at least one second discharge outlet 33；It is described supervisor 41 be equipped with an apopore 411 and
Several blastholes 412；
The access of first water inlet 21 ejected wash water, second water inlet 31 of the connection of the first water outlet 22, every one first
Discharge outlet 23 is connected to its corresponding blasthole 412 by a water inlet pipe 43；
Second water outlet 32 exports filtered ejected wash water, and every one second discharge outlet 33 is connected by a water inlet pipe 43
To its corresponding blasthole 412；
One end of the outlet pipe 42 connects the apopore 411, and waste water is discharged in the other end；
A protection valve 5 is equipped on each water inlet pipe 43.
Specifically, in a preferred embodiment of the invention, the base plate cleaning device further includes being set to the outlet pipe 42
On outlet valve 91.
Further, the first filter 2 include the first cavity 201 and in first cavity 201 first
First cavity 201 is divided into the first space 401 and second space 402 by filter core 202, first filter core 202；Described
Tow filtrator 3 includes the second cavity 301 and the second filter core 302 in second cavity 301, second filter core 302
Second cavity 301 is divided into third space 403 and the 4th space 404；First water inlet 21 and the first water outlet
22 are connected to first space 401 and second space 402 respectively, second water inlet 31 and the second water outlet 32 respectively with
Third space 403 and the connection of the 4th space 404.
Specifically, the first filter 2 includes two the first discharge outlet 23, and second filter 3 includes two the
Two discharge outlet 33；Described two first discharge outlet 23 are connected to first space 401 and second space 402 respectively；Described two
A second discharge outlet 33 is connected to the third space 403 and the 4th space 404 respectively.
Further, the base plate cleaning device further includes spraying mechanism 1, the spraying mechanism 1 and the second filter 3
Water outlet 52 is connected, to receive filtered cleaning water spray substrate to be cleaned.
Specifically, the base plate cleaning device further includes assisted drainage pipeline 7, and the assisted drainage pipeline 7 includes one auxiliary
Help supervisor 71, one first auxiliary branch line, 72 two the second auxiliary branch lines 73；The auxiliary supervisor 71 is equipped with one first connecting hole
711 and two the second connecting holes 712；The first filter 2 further includes one first auxiliary connection 24, second filter
3 further include one second auxiliary connection 34；First auxiliary connection 24 is connected to one the by one second auxiliary branch line 73
Two connecting holes 712；Second auxiliary connection 34 is connected to another second connecting hole by another second auxiliary branch line 73
712；One end of first auxiliary branch line 72 connects the first connecting hole 711, other end access draining auxiliary gas；Each
A protection valve 5 is equipped on two auxiliary branch lines 73.
Further, the base plate cleaning device further includes the intake valve 92 set on first auxiliary branch line 72.
It should be noted that the course of work of base plate cleaning device of the invention includes: when the normal work of base plate cleaning device
When making, each protection valve 5, outlet valve 91 and intake valve 92 are turned off, and discharge pipe line 4 and assisted drainage pipeline 7 are in closing
State, ejected wash water enter the first space 401 from the first water inlet 21, are subsequently passed through the first filter core 202 and enter second space 402,
It is then flowed out from the first water outlet 22, is then passed through the entrance of the second filter core 302 into the second water inlet 31 into third space 403
4th space 404 is then exported from the second water outlet 32 to spraying mechanism 1, and spraying mechanism 1 will be by first filter 2 and the
The ejected wash water of the secondary filter of tow filtrator 3 is sprayed on substrate, to clean to substrate, at this point, due to each protection valve
5, outlet valve 91 and intake valve 92 are turned off, and ejected wash water could be defeated after can only sequentially passing through first filter 2 and the second filter 3
Out to spraying mechanism 1, and it cannot pass through discharge pipe line 4 or the output of assisted drainage pipeline 7 to spraying mechanism 1, to ensure that clear
Wash water is effectively filtered, and cleaning effect is promoted, and guarantees product yield.
Preferably, spraying mechanism 1 of the invention includes that water pump (not shown) and the spray pipeline being connected with water pump (are not schemed
Show), the water pump of spraying mechanism 1 is initially entered by filtered ejected wash water, then exported to spray pipeline, finally by spraying by water pump
Shower pipe road is sprayed on substrate, completes the cleaning to substrate.
Further, the maintenance process of base plate cleaning device of the invention includes: and works as to need to first filter 2 and second
When filter 3 is safeguarded (such as replacement filter core), each protection valve 5, outlet valve 91 and intake valve 92 are opened, discharge pipe line
4 and assisted drainage pipeline 7 be in opening state, draining auxiliary gas from assisted drainage pipeline 7 be input to first filter 2 and
In second filter 3, oppresses remaining waste water in first filter 2 and the second filter 3 and be discharged from discharge pipe line 4, waste water is complete
After full discharge, maintenance personnel carries out service action to first filter 2 and the second filter 3, after the completion of maintenance, closes each guarantor
Valve 5, outlet valve 91 and intake valve 92 are protected, makes base plate cleaning device enter normal operating conditions again.
Preferably, as shown in Figure 1, in the first embodiment of the present invention, several protection valves 5 are hand-operated valve, behaviour
It is manually opened by staff when making.
Preferably, as shown in Fig. 2, several protection valves 5 are motor-driven valve, the base plate cleaning device further includes at this time
The valve control module 6 being electrically connected with several protection valves 5, the valve control module 6 is for controlling several guarantors
Shield valve 5 is opened or is simultaneously closed off simultaneously, is controlled several protection valves 5 by valve control module 6 while being opened or closing simultaneously
It closes, the opening and closing operations of protection valve 5 can be simplified, promote maintenance efficiency, further, in some embodiments of the invention, institute
Stating outlet valve 91 and intake valve 92 also is motor-driven valve, and the valve control module 6 is also electrically connected the outlet valve 91 and air inlet
Valve 92, and the outlet valve 91 and intake valve 92 can be controlled and open or simultaneously close off simultaneously with protection valve 5.
In conclusion the present invention provides a kind of base plate cleaning device, including a first filter, one second filter,
One discharge pipe line and several protection valves；The discharge pipe line includes a supervisor, an outlet pipe and several water inlet pipes；First mistake
Filter includes one first water inlet, one first water outlet and at least one first discharge outlet, and second filter includes one the
Two water inlets, one second water outlet and at least one second discharge outlet；The supervisor is equipped with an apopore and several blastholes；
First water inlet accesses ejected wash water, and first water outlet connects the second water inlet, and every one first discharge outlet enters by one
Water pipe is connected to its corresponding blasthole；Second water outlet exports filtered ejected wash water, and every one second discharge outlet passes through
One water inlet pipe is connected to its corresponding blasthole；One end of the outlet pipe connects the apopore, and waste water is discharged in the other end；Often
It is equipped with a protection valve on one water inlet pipe, protects valve by being arranged on water inlet pipe, can guarantee that ejected wash water is effectively filtered,
Cleaning effect is promoted, guarantees product yield.
The above for those of ordinary skill in the art can according to the technique and scheme of the present invention and technology
Other various corresponding changes and modifications are made in design, and all these change and modification all should belong to the claims in the present invention
Protection scope.
Claims (10)
1. a kind of base plate cleaning device, which is characterized in that including a first filter (2), one second filter (3), a draining
Pipeline (4) and several protection valves (5)；
The discharge pipe line (4) includes a supervisor (41), an outlet pipe (42) and several water inlet pipes (43)；The first filter
It (2) include one first water inlet (21), one first water outlet (22) and at least one first discharge outlet (23), second filtering
Device (3) includes one second water inlet (31), one second water outlet (32) and at least one second discharge outlet (33)；The supervisor
(41) apopore (411) and several blastholes (412) are equipped with；
First water inlet (21) accesses ejected wash water, and first water outlet (22) connects the second water inlet (31), and every 1 the
One discharge outlet (23) is connected to its corresponding blasthole (412) by a water inlet pipe (43)；
Second water outlet (32) exports filtered ejected wash water, and every one second discharge outlet (33) is connected by a water inlet pipe (43)
It is connected to its corresponding blasthole (412)；
One end of the outlet pipe (42) connects the apopore (411), and waste water is discharged in the other end；
A protection valve (5) is equipped on each water inlet pipe (43).
2. base plate cleaning device as described in claim 1, which is characterized in that further include going out on the outlet pipe (42)
Water valve (91).
3. base plate cleaning device as described in claim 1, which is characterized in that the first filter (2) includes the first cavity
(201) and the first filter core (202) for being set in first cavity (201), first filter core (202) is by first cavity
(201) it is divided into the first space (401) and second space (402)；
Second filter (3) includes the second cavity (301) and the second filter core in second cavity (301)
(302), second cavity (301) is divided into third space (403) and the 4th space (404) by second filter core (302)；
First water inlet (21) and the first water outlet (22) respectively with first space (401) and second space (402)
Connection, second water inlet (31) and the second water outlet (32) connect with third space (403) and the 4th space (404) respectively
It is logical.
4. base plate cleaning device as claimed in claim 3, which is characterized in that the first filter (2) includes two first
Discharge outlet (23), second filter (3) include two the second discharge outlet (33)；
Described two first discharge outlet (23) are connected to first space (401) and second space (402) respectively；
Described two second discharge outlet (33) are connected to the third space (403) and the 4th space (404) respectively.
5. base plate cleaning device as described in claim 1, which is characterized in that several protection valves (5) are hand-operated valve.
6. base plate cleaning device as described in claim 1, which is characterized in that several protection valves (5) are motor-driven valve.
7. base plate cleaning device as claimed in claim 6, which is characterized in that further include electrical with several protection valves (5)
The valve control module (6) of connection, the valve control module (6) for control several protection valves (5) and meanwhile unlatching or
It simultaneously closes off.
8. base plate cleaning device as described in claim 1, which is characterized in that further include assisted drainage pipeline (7), the auxiliary
Discharge pipe line (7) includes that an auxiliary is responsible for (72) two (71), one first auxiliary branch line the second auxiliary branch lines (73)；
The auxiliary supervisor (71) is equipped with one first connecting hole (711) and two the second connecting holes (712)；
The first filter (2) further includes one first auxiliary connection (24), and second filter (3) further includes one second
Auxiliary connection (34)；
First auxiliary connection (24) is connected to one second connecting hole (712) by one second auxiliary branch line (73)；
Second auxiliary connection (34) is connected to another second connecting hole (712) by another second auxiliary branch line (73)；
One end of first auxiliary branch line (72) connects the first connecting hole (711), other end access draining auxiliary gas；
A protection valve (5) is equipped on each second auxiliary branch line (73).
9. base plate cleaning device as claimed in claim 8, which is characterized in that further include being set to first auxiliary branch line (72)
On intake valve (92).
10. base plate cleaning device as described in claim 1, which is characterized in that further include spraying mechanism (1), the spray thrower
Structure (1) is connected with the second water outlet (32), to receive filtered cleaning water spray substrate to be cleaned.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910703138.0A CN110400767B (en) | 2019-07-31 | 2019-07-31 | Substrate cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910703138.0A CN110400767B (en) | 2019-07-31 | 2019-07-31 | Substrate cleaning device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110400767A true CN110400767A (en) | 2019-11-01 |
| CN110400767B CN110400767B (en) | 2021-07-23 |
Family
ID=68326976
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910703138.0A Active CN110400767B (en) | 2019-07-31 | 2019-07-31 | Substrate cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110400767B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107530590A (en) * | 2015-03-17 | 2018-01-02 | 唐纳森公司 | Water bag hydrocarbon cleaning system |
| CN207108569U (en) * | 2017-06-30 | 2018-03-16 | 淮安富扬电子材料有限公司 | A kind of reverse osmosis membrane waste waster processor |
| CN207941399U (en) * | 2018-01-30 | 2018-10-09 | 山西清泽环境科技有限公司 | A kind of Integrated Films separating and filtering device |
| US20190105613A1 (en) * | 2017-10-09 | 2019-04-11 | Samsung Electronics Co., Ltd. | Methods of fluorinating filters used in the manufacture of a semiconductor device |
-
2019
- 2019-07-31 CN CN201910703138.0A patent/CN110400767B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107530590A (en) * | 2015-03-17 | 2018-01-02 | 唐纳森公司 | Water bag hydrocarbon cleaning system |
| CN207108569U (en) * | 2017-06-30 | 2018-03-16 | 淮安富扬电子材料有限公司 | A kind of reverse osmosis membrane waste waster processor |
| US20190105613A1 (en) * | 2017-10-09 | 2019-04-11 | Samsung Electronics Co., Ltd. | Methods of fluorinating filters used in the manufacture of a semiconductor device |
| CN207941399U (en) * | 2018-01-30 | 2018-10-09 | 山西清泽环境科技有限公司 | A kind of Integrated Films separating and filtering device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN110400767B (en) | 2021-07-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20180141077A1 (en) | Coating apparatus, method for recycling coating liquid by utilization of the same, and method for cleaning the same | |
| US20080057838A1 (en) | Photoresist stripping apparatus and internal air circulating system thereof | |
| US20070119322A1 (en) | Printing system and method for manufacturing liquid crystal display device using the same | |
| GB2409574A (en) | Method and apparatus of fabricating flat panel display | |
| CN109244009A (en) | Wet-method etching device | |
| CN110400767A (en) | Base plate cleaning device | |
| JP5533227B2 (en) | Exposure equipment | |
| CN103399468A (en) | Method and device for stripping photoresist layer | |
| CN205248245U (en) | Cleaning device | |
| CN211996679U (en) | Caching device for mask photoresist | |
| US11513378B2 (en) | Display panel manufacturing device and cleaning method | |
| CN107134432B (en) | Array substrate manufacturing process | |
| CN106098525B (en) | Dry ecthing equipment | |
| CN109119375A (en) | The detection restorative procedure and photoresist repair apparatus of arraying bread board | |
| JP2004041943A (en) | Coating device and organic electroluminescence (el) coating device | |
| CN100560371C (en) | Ink-jet system | |
| KR20020087637A (en) | Vertical type cleaner | |
| JP6240777B2 (en) | Cleaning device | |
| TW200540978A (en) | Apparatus and method for process substrate | |
| JP2010153425A (en) | Substrate treatment apparatus, substrate treatment method, and method of manufacturing display panel substrate | |
| CN101020869B (en) | Cleaning agent for slit type coater, slit type coater for manufacturing display device, and method for manufacturing display device | |
| JP2003297911A (en) | Substrate attraction device | |
| KR100852751B1 (en) | Coating-drying apparatus capable of adjusting air flow path | |
| CN110735035A (en) | Metal recovery and classification waste discharge device for wafer photoresist and metal stripping process | |
| JP7190291B2 (en) | FILTER UNIT, LIQUID TREATMENT SYSTEM AND LIQUID TREATMENT METHOD |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| CB02 | Change of applicant information | ||
| CB02 | Change of applicant information |
Address after: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Applicant after: TCL China Star Optoelectronics Technology Co.,Ltd. Address before: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Applicant before: Shenzhen China Star Optoelectronics Technology Co.,Ltd. |
|
| GR01 | Patent grant | ||
| GR01 | Patent grant |