CN110383176A - Processing equipment - Google Patents

Abstract

The present invention relates to a kind of processing equipments for base main body, especially optical treatment equipment, including the exposure system with exposing unit or multiple exposing units, calibration system at least one calibration camera for adjusting exposure system, substrate carrier unit with the holding meanss for base main body, and the registration arrangement with a registration camera or multiple registration cameras, wherein, by holding meanss keep base main body position and/or be oriented at least one registration position of substrate carrier unit can by one or at least one be registrated phase machine testing, the processing equipment is configured so that exposure system and registration arrangement can be easily coordinated with each other, calibration system has a reference marker or multiple reference markers, reference marker is arranged in the relative position relative to the restriction of at least one calibration camera, And a reference marker or at least one reference marker can be by a registration camera or at least one registration phase machine testings.

Description

Processing equipment

Technical field

The present invention relates to a kind of processing equipment for base main body, especially optical processing equipment, the processing equipment Including with one or more exposing units exposure system, at least one calibration camera for being used to adjust exposure system Calibration system, the substrate carrier unit with the holding meanss for base main body, and there are one or more registration cameras Registration arrangement, wherein by holding meanss keep base main body at least one registration position of substrate carrier unit Position and/or orientation can be registrated phase machine testing by one or at least one.

Background technique

Processing equipment is, for example, exposure sources.

This processing equipment is known in the prior art.

In these processing equipments, there are problems that coordinating exposure system and registration arrangement.

Particularly, exposure system is oriented relative to the coordinate system of exposure system, and registration arrangement is in the seat of registration arrangement Position and/or the orientation of base main body are detected in mark system.

Therefore the problem is that, in the coordinate system (one side) of exposure system and coordinate system (another party of registration arrangement Face) between obtain transformation rule.

For example, carrying out the test exposure for having markd test base main body, wherein institute in known processing equipment It states label to be detected by registration arrangement, and exposure system will test exposure structure to test base main body.From test base main body Label and the test structure that is exposed between spatial offset, can determine the coordinate system (one side) of exposure system be registrated Transformation rule between the coordinate system (another aspect) of system.

However, this method is very complicated and needs special professional knowledge, therefore it is only capable of by well-trained service people Member executes.

Summary of the invention

Therefore, the purpose of the present invention is to provide a kind of processing equipments of improved affiliated type, are especially to provide following place Equipment is managed, wherein exposure system and registration arrangement can be mutually coordinated in a simple manner.

According to the present invention, which is accomplished by the following way in the processing equipment of the above-mentioned type, that is, calibration system tool There are a reference marker or multiple reference markers, reference marker is respectively disposed at the restriction relative at least one calibration camera Relative position in, and one or at least one reference marker can by a registration camera or at least one registration phase Machine testing especially detects at least one registration position.

Preferably, multiple, particularly all reference markers can be special by a registration camera or at least one registration camera It is not to be detected in registration position.

It can be seen that the advantages of solution according to the present invention is, one or at least one reference marker can be with By it is one or at least one registration phase machine testing, and therefore one or at least one reference marker position by matching Barebone detection.Therefore, by means of in the opposite of restriction one or between at least one reference marker and calibration camera The position of position, calibration camera can be determined by registration arrangement.

Since exposure system is adjusted by means of the calibration system at least one calibration camera, the position of the calibration camera Setting can be determined by registration arrangement, therefore exposure system and registration arrangement can be by means of having one or at least one with reference to mark The calibration system of note is coordinated with each other.

Particularly, it can be referred to by means of the coordinate system for the exposure system that calibration system is adjusted with one or at least one is detected Transformation rule between the coordinate system of the registration arrangement of label can be determined by referring to label.

Particularly, the position of reference marker or the position of multiple reference markers are in the coordinate system of calibration system Know.

It is therefore preferred that can also determine between the coordinate system of exposure system and the coordinate system of calibration system and match Transformation rule between the coordinate system of Barebone and the coordinate system of calibration system.

It can be seen that another advantage of solution according to the present invention is, it is able to achieve the automatic adjustment of exposure system With the automatic synchronization of exposure system to registration arrangement.

Particularly, turn between the coordinate system of the coordinate system and calibration system of the coordinate system of exposure system and registration arrangement Changing rule can automatically detect, such as be detected by control system.

About the construction of substrate carrier unit, more detailed description is not done at present.

It especially provides, substrate carrier unit and exposure system can be movable with respect to each other.

For example, substrate carrier unit and one or more of exposing units can be movable with respect to each other.

The base main body being arranged on substrate carrier unit as a result, can be exposed in an advantageous manner by exposure system.

It is preferably provided that substrate carrier unit and registration arrangement, particularly one or more of registration cameras can be opposite In moving each other.

Therefore, in a certain position, the position of base main body and/or orientation can be detected by registration arrangement, and another In one position, base main body can be exposed by exposure system.

It is provided in particularly advantageous embodiment, substrate carrier unit can be relative to exposure system and/or registration arrangement Substantial linear movement in feed direction.

For example, substrate carrier unit is arranged to movable in the rack of processing equipment, particularly is movably guided.

Particularly, rack includes one or more guide portions.

Preferably, substrate carrier unit, particularly in feed direction substantially linearly it is movable guidance be arranged into In one or more of guide portions of rack.

Particularly, base main body, which is arranged in supporting zone, is arranged on substrate carrier unit.

Preferably, base main body is shelved on a support component or multiple support components with arrangement appropriate.

For example, base main body is flatly shelved on one or at least one support component.

It provides in a preferred embodiment, base main body is partly shelved on a support component or at least one support On element, preferably partially it is shelved on multiple support components.

Particularly, supporting zone substantially extends in geometry supporting plane.

In principle, holding meanss can be constructed with mode in a variety of manners.

Particularly, base main body is substantially maintained in the holding plane of geometry by holding meanss.

The arrangement substantially carried out in one plane is understood to, and the deviation of precise plane is less than 5mm, is more preferably less than 2mm and preferably smaller than 1mm.

Advantageously, the holding plane of geometry and the supporting plane of geometry are substantially parallel to each other extension.

Substantially parallel extension be understood to deviate it is exactly parallel extend up to ± 10 ° (angles), preferably at most ± 5 ° (angle), and preferably up to ± 2 ° (angle) of extension.

For example, holding meanss include the mechanical holding mechanism for keeping base main body.

For example, mechanical retaining means include the fixed cramping body for keeping base main body.

It provides in a preferred embodiment, keeps base main body to holding meanss hydrostatic pressure.

Preferably, holding meanss include a suction nozzle or multiple suction nozzles, special using one suction nozzle or multiple suction nozzles It is negative pressure to be generated relative to environmental pressure, and base main body is kept by negative pressure, such as is crimped into described one by negative pressure A or at least one support component.

In particularly advantageous embodiment, holding meanss, particularly the substructure relative to substrate carrier unit are Movable.

Preferably, holding meanss can be moved upwards in the side for being at least approximately perpendicular to that plane is kept to extend.

Particularly, holding meanss can be moved upwards in the side for the exposure plane for being at least approximately perpendicular to exposure system.

It is therefore preferred that have the holding meanss of base main body arranged be it is movable, especially with respect to holding Plane and/or exposed planes are height-adjustable.

And hence it is also possible to which the base main body for positioning different-thickness well respectively is especially utilized respectively with being exposed Its processing side to be processed is positioned substantially in exposure plane.

Context will state " at least approximate " and be interpreted as, including wherein accurately realize those of described value construction and including Such construction: wherein realizing the deviation at most ± 20% of described value, preferably no more than ± 10%, in particular up to ± 5%, and example Such as at most ± 1%.

For example, base main body is the base main body of plate.

In particular, base main body substantially extends in the subject plane of geometry, wherein for example, base main body is in geometry Subject plane in ratio of elongation base main body it is much bigger perpendicular to the extension of the subject plane of geometry such as at least 5 times big.

Especially provide, in the case where base main body is correctly arranged on substrate carrier unit, the supporting plane of geometry Substantially parallel with each other extend with the subject plane of geometry.

It is preferably provided that the main body of geometry is flat in the case where base main body is correctly arranged on substrate carrier unit The holding plane of face and geometry substantially parallel with each other extends.

It provides in an advantageous embodiment, in the case where base main body is correctly arranged on substrate carrier unit, The subject plane of geometry and the holding plane of geometry are substantially coincident.

Particularly, base main body includes at least one processing side.It provides herein, processing side is handled by processing equipment.

It is preferably provided that base main body utilizes the side positioned opposite with processing side to be shelved in supporting zone.

It provides in another advantageous embodiment, is correctly arranged into the situation in substrate carrier unit in base main body Under, the holding plane of geometry extends substantially across the processing side of base main body.

Particularly, base main body includes at least one photosensitive layer, which is advantageously arranged on processing side.

When being irradiated with suitable light, photochemistry is triggered in the photo layer, and chemical conversion photosensitive layer is at least A part.

Furthermore it provides in an advantageous embodiment, processing equipment includes substrate carrier control chip unit detecting system, is used for High-precision detects the position of substrate carrier unit.

Therefore, even if being also accurately known that the position always in movable substrate carrier unit.

Particularly, substrate carrier control chip unit detecting system detects the position of substrate carrier unit in feed direction with high precision It sets.

For example, substrate carrier control chip unit detecting system is at least ± 0.3mm, preferably at least ± 0.1mm, particularly at least ± 0.05mm, particularly advantageously at least ± 0.001mm and the more advantageously at least accuracy detection substrate carrier of ± 0.0005mm The position of unit.

About the construction of exposure system and one or more of exposing units, it is not described in detail at present.

It especially provides, each exposing unit in exposing unit includes light source.

Particularly, radiation of light source light, the light trigger photochemistry in the photosensitive layer of base main body.

For example, light source is laser diode.

Advantageously, each exposing unit include one, particularly oneself or optical deflecting device that it is attached.

In this case, such as each exposing unit may include itself arrangement for deflecting.

Preferably, arrangement for deflecting attaches multiple exposing units.

Particularly, optical deflecting device makes the light beam deflection issued from light source, especially accurately deflects.

Therefore, predefined structure or its at least part accurately can be exposed to substrate master using each exposing unit On body.

Preferably, each exposing unit setting in exposure section for exposing.As a result, particularly, base main body is every A region is exposed by exposing unit respectively.

Particularly, exposure system (being in an advantageous case each exposing unit) can be adjusted, example by means of calibration system Such as with adjusted in the spatial relationship of a reference marker or at least one reference marker.

It provides in an advantageous embodiment, the adjacent exposure section cloth adjacent to each other in the state of regulating respectively It sets.

Particularly, each exposure section is not overlapped in the state of adjusting.

Provided in particularly advantageous embodiment, exposure section in the state of regulating transverse to direction of feed simultaneously Arrangement is set, particularly disposed adjacent one another.

Therefore, advantageously, substantially in feed direction by means of the entire of the base main body of substrate carrier unit motion Exposure area to be exposed can be exposed system exposure substantially region-widely.

Particularly, exposure area is partly exposed by exposing unit respectively.

Advantageously, each exposure band is exposed in base main body by each exposing unit.

Particularly, exposure band substantially slenderly extends in feed direction.

Advantageously, each exposure band is disposed adjacently transverse to direction of feed.

Particularly, each two mutually adjacent exposure bands are disposed adjacently to one another.

It provides in an advantageous embodiment, exposure system is oriented for exposure and is arranged substantially at geometry exposure plane In base main body processing side.

Particularly, the holding plane that the exposure plane of geometry is arranged essentially parallel to geometry extends.

It is preferably provided that the exposure plane of geometry and the supporting plane of geometry are substantially parallel to each other extension.

Particularly, about exposure system, entirely by reference to 102006059818 A1 of DE 10242142 A1 and DE.

It is provided in particularly advantageous embodiment, exposing unit includes the known exposure mechanism from these open files One or more features.

About the design of calibration system and at least one calibration camera, it is not described in detail at present.

Calibration system preferably includes what a proper calibration camera.

It is provided in other advantageous embodiments, calibration system includes multiple calibration cameras.

Particularly advantageously, several in one calibration camera or at least one calibration camera or multiple calibration cameras Calibration camera, particularly all calibration cameras include one or more of following characteristics.

Particularly, calibration camera is movable, movable especially with respect to rack.

Calibration camera and registration camera are preferably arranged to be movable with respect to each other.

Particularly advantageously, calibration camera is arranged to movable relative to exposure system, particularly relative to exposing unit 's.

Particularly, calibration camera can be arranged essentially parallel to exposure plane movement, for example shift.

Preferably, calibration camera is movable in each exposure section.

Advantageously, calibration camera is movable in all exposure sections.

Therefore, particularly, each light beam of each exposing unit can be detected by calibration camera, and each exposing unit It can easily adjust each other.

In principle, calibration camera can be movably arranged in rack by the individual kinematic system with position detection On.

It is provided in particularly advantageous embodiment, calibration camera is arranged on substrate carrier unit.

Thus, it is possible to move calibration camera in an advantageous manner together with substrate carrier unit.

It especially provides, calibration camera is movably arranged on substrate carrier unit, and being preferably arranged to can be at least approximate It is moved perpendicular to direction of feed.

It is thereby achieved that a simple embodiment, wherein calibration camera can be basic by means of substrate carrier unit On move in feed direction, and transverse to, particularly be at least approximately perpendicular to direction of feed equally and can move.

For example, calibration camera is movably arranged on substrate carrier unit in linear axes, the linear axes are especially It is at least approximately perpendicular to direction of feed extension.

Furthermore it is provided in particularly advantageous embodiment, calibration system includes calibration camera detection system, the calibration phase Machine examination examining system especially up to precision testing calibration camera position.

Particularly, calibration camera detection system testing calibration camera relative to the position of exposure plane, preferably in the exposure Position in plane.

Advantageously, the detection of calibration camera detection system is along the position of the calibration camera of linear axes.

Therefore, the position of calibration camera always special full accuracy it is known that and can realize school in a simple manner It is quasi-.

In particular, " full accuracy " is understood to, measurement error is at most ± 0.01mm, preferably up to ± 0.001mm, and And particularly preferably at most ± 0.0005mm.

It is provided in particularly advantageous embodiment, calibration system includes the imaging system for calibration camera.

For example, imaging system includes multiple optical elements.

Preferably, imaging system, particularly its optical element are fixedly connected to calibration camera, for example, directly or indirectly Ground is unchangeably arranged on calibration camera.

It is provided in particularly advantageous embodiment, imaging system includes Microscope optics, and therefore calibrates phase Machine advantageously captures the image of full accuracy.

It especially provides, calibration camera captures image in imaging region, especially up to captures image to precision.

Preferably, imaging region substantially extends in exposure plane.

It provides in another advantageous embodiment, imaging region substantially extends in keeping plane.

It provides in some embodiments, imaging region substantially extends in supporting plane.

Advantageously, imaging region substantially extends in the object plane of imaging system, particularly calibration camera.

In this case, the imaging region substantially extended in one plane is understood to especially such imaging Region: the imaging region and the plane are at a distance of at most 5mm, preferably up to 1mm, in particular up to 0.3mm, and particularly preferably At most 0.1mm.

About reference marker, it is not described in detail at present.

For example, calibration system has just what a reference marker.

It provides in an advantageous embodiment, calibration system has multiple reference markers, such as two or three or four Or five reference markers.

Thus, it is possible to more accurately determine the coordinate system of the coordinate system of exposure system and registration arrangement and especially calibrate Conversion between the coordinate system of system.It is therefore preferred that can also determine rotation angle between coordinate system and/or translation and/ Or linear scale.

It advantageously provides for, one or more, particularly all reference markers are arranged substantially in exposure plane.

Therefore, reference marker is especially arranged in exposure plane relevant to exposure, and advantageously, the seat of exposure system Conversion between the coordinate system of the coordinate system and registration arrangement of mark system and calibration system is more acurrate.

Such as can provide, the relative position between one or more reference markers and calibration camera is can to change over time , because they, which are arranged to, to be movable with respect to each other, and for example detected by means of calibration camera detection system and thus Limit relative position.

However, preferably regulation, one or more, particularly all reference markers are arranged in basic with calibration camera In constant relative position.

Particularly, one or more, particularly all reference markers still arrange relative to calibration camera, and therefore These reference markers are advantageously when calibration camera moves, such as in feed direction and/or especially along linear axes and school Quasi- camera moves together.

Therefore, the position of one or more reference markers in the coordinate system of calibration system is in an advantageous manner by especially quasi- Really determine.

For example, one or more, particularly all reference markers are unchangeably arranged relative to calibration camera.

It is provided in particularly advantageous embodiment, one or more, particularly all reference markers are arranged in calibration phase In the imaging region of machine.

Particularly, a reference marker or multiple, particularly all reference markers can be detected by calibration camera, such as in order to It adjusts exposure system and detects.

Preferably, one or more, particularly all reference markers are arranged in the object plane of calibration camera.

It provides in an advantageous embodiment, one or more, particularly all reference markers are disposed in imaging system Optical element on.

For example, optical element can be concentrating element, especially lens.

Particularly, optical element is the parallel transparent panel of plane.

Preferably, optical element is light beam visualization element, visualizes the light beam of exposing unit by calibration phase Machine testing.

It is preferably provided that one or more, particularly all reference markers are arranged on the surface of optical element.

Particularly, which extends in the object plane of calibration camera.

Furthermore particularly advantageously, it is disposed with the optical element of one or more, particularly all reference markers thereon Surface substantially extends in the exposure plane of geometry.

It provides in another embodiment, surface substantially extends in the holding plane of geometry.

Therefore, one or more, particularly all reference markers can always be detected by calibration camera, and therefore they Position in the coordinate system of calibration system is always detectable, particularly high-precision is detectable.

Therefore, in this embodiment, since calibration camera always detects the accurate location of reference marker, provide The error sensitivity of very little, such as about the error sensitivity of mechanically deform and/or thermotropic extension and compression, they can Change relative position of the reference marker relative to calibration camera.

In addition, after disassembly processing equipment, particularly calibration system, it can rapidly and easily again by calibration camera The position of secondary detection reference marker.

It provides in another advantageous embodiment, one or more, particularly all reference markers are preferably constant Ground is arranged on calibration camera.

Therefore, particularly, reference marker is constant relative to the relative position of calibration camera, and system is for example in machine Tool deformation aspect is not easy to make mistakes.

It provides in another advantageous embodiment, one or more, particularly all reference markers are relative to calibration The bracket of camera is unchangeably arranged, such as is arranged in bracket sheet.

In addition, especially when calibration camera cannot detect the embodiment of one or more reference markers, advantageously Regulation, reference marker are stored after being measured in the controls relative to the relative position of calibration camera.

Therefore, relative position is always searchable, and readjusting also preferably is also what automation was implemented.

Advantageously, moreover it provides, one or more, particularly all reference markers are at least in the reference of substrate carrier unit In position, such as in registration position, phase machine testing can be registrated by one or more.

Therefore, even if in movable substrate carrier unit, phase machine examination can also be registrated by one or more always Survey reference marker.

Particularly, one, preferably several, particularly all reference markers be arranged in one, it is for example multiple, particularly all It is registrated in the object plane of camera, is disposed particularly in its imaging region.

It especially provides, one or more, particularly all reference markers include relative to the high optical contrast in background area Structure.

Therefore, by calibration camera and/or camera can be registrated particularly well and accurately detect reference marker.

For example, one or more, particularly all reference markers are individual elements.

Preferably, one or more, particularly all reference markers are configured to especially on optical element and/or calibrate Coating on camera and/or on the bracket of calibration camera.

It provides in an advantageous embodiment, coating includes chromium or chromium oxide.

Reference marker can have various shape.

It especially provides, at least one reference marker is configured to round or rectangle.

Particularly advantageously, at least one reference marker is configured to cross.

Another preferred solution regulation, reference marker are formed line profile.

Particularly, line profile can be structured as surrounding the line profile of interior zone, which can have a variety of trends, Such as rectangle or circle are moved towards.

The invention further relates to a kind of method of processing equipment for running substrate main body, it is especially a kind of for adjusting and The method of the component of registration process equipment, wherein processing equipment includes: the exposure system with one or more exposing units, tool There is the calibration system of at least one calibration camera for adjusting exposure system, there is the base of the holding meanss for base main body Onboard body unit, and the registration arrangement with a registration camera or multiple registration cameras, are protected for detecting by holding meanss The position for the base main body held and/or orientation.

Herein, the object of the present invention is to provide a kind of for the simplification side that exposure system and registration arrangement is coordinated with each other Method.

According to the present invention, which is accomplished by the following way by the method for the above-mentioned type, that is, calibration system has one A reference marker or multiple reference markers, reference marker are respectively disposed at the phase of the restriction relative at least one calibration camera To in position, and a reference marker or at least one reference marker are by a registration camera or at least one registration phase machine examination It surveys.

It can be seen that one of the advantages of solution according to the present invention is, at least one is registrated these ginsengs of phase machine testing At least one reference marker in label is examined, and therefore can be by means of a reference marker or multiple reference markers with simple Mode registration arrangement is coordinated to exposure system.

Particularly, registration arrangement detects the position of base main body to be processed and/or is determined in the coordinate system of registration arrangement To.

Exposure system, particularly an exposing unit or multiple exposing units are oriented relative to the coordinate system of exposure system.

Particularly, exposure system is adjusted by means of calibration system.

Advantageously, exposure system is adjusted in the coordinate system of calibration system by means of calibration system, and herein preferably Determine the transformation rule between the coordinate system of exposure system and the coordinate system of calibration system.

Particularly, exposing unit emits light beam respectively.

Preferably, by means of calibration system, especially by means of calibration camera, relative to one or more, particularly institute Have reference marker, i.e., detected relative to the position of reference marker the light beam emitted by one or more exposing units, especially It is the rays of multiple preferably all light beams.

For example, the crosspoint of the exposure plane of detection rays and exposure system.

In the method according to the invention, the coordinate system of registration arrangement and the coordinate system of exposure system can especially be determined And the transformation rule between the coordinate system of especially calibration system, because of exposure system and a reference marker or multiple references The spatial relationship of label is conditioned, and is marked by least one registration one reference marker of phase machine testing or at least one reference Note.

It is provided in particularly advantageous embodiment, the position of a reference marker or at least one reference marker is by least One calibration camera detection.

It especially provides, the position of multiple, particularly all reference markers is detected by least one calibration camera.

Preferably, a reference marker or multiple reference markers are detected to adjust exposure system.

Therefore, the exact position of one or more reference markers always can be detected and be had by least one calibration camera Orient exposure system relative to one or more reference markers.

Provide in another advantageous embodiment, by measure one or at least one known reference marker relative to The position of at least one calibration camera.

Preferably, a relative position or multiple reference markers and at least one for reference marker and at least one calibration camera Multiple relative positions storage of a calibration camera is in the controls.

It thus, can be with simple advantageously in the adjusting of exposure system or in exposure system and registration arrangement universal time coordinated Mode recalls a relative position or multiple relative positions from control system, and relative position is known without surveying again Amount.

It especially provides, is detected by calibration camera to the movement of at least one calibration camera and/or position preferably up to precision System detection.

Preferably, the movement of calibration camera and/or position relative to exposure system exposure plane, be preferably parallel to exposure The exposure plane of system is detected.

For example, movement and/or position of the testing calibration camera relative to exposure system and/or registration arrangement.

Particularly, the movement along linear shaft detection calibration camera and/or position, wherein calibration camera can be transported along linear axes It is arranged on substrate carrier unit dynamicly.

It is preferably provided that substrate carrier control chip unit detecting system especially up to precision detect the movement of substrate carrier unit The position and/or.

Particularly, relative to be for example parallel to exposure system exposure plane detect substrate carrier unit movement and/or Position.

Preferably, movement and/or position of the detection substrate carrier unit relative to exposure system.

Particularly advantageously, movement and/or position of the detection substrate carrier unit relative to registration arrangement.

Advantageously, the movement in feed direction of detection substrate carrier unit and/or position, substrate carrier unit are being fed It is especially brought on direction movable.

Therefore, even if its position is also known in the movement of calibration camera and/or substrate carrier unit, and therefore It can at least determine relative displacement of the coordinate system of calibration system relative to exposure system and the coordinate system of registration arrangement.

For example, each exposing unit includes light source and optical deflecting device, for controllably deflecting the light beam of light source.

It especially provides, optical deflecting device is oriented such that the light beam point of corresponding exposing unit by means of calibration system The exposure in section Yong Yu not exposed.

It is provided in particularly advantageous embodiment, the adjusting of the component of this method, particularly processing equipment and orientation are What automation carried out.

Particularly, the method for automation is executed by for example computer assisted control system.

It is possible thereby in the case where no trained attendant in an advantageous manner, such as in processing equipment After at least partly dismantling or after a predetermined period of time, readjusting and/or again for the component of processing equipment is executed It is new to coordinate.

It further preferably provides, has used the one or more features being mentioned in conjunction with processing equipment in the method.

In addition, the particularly preferred embodiment of above-mentioned processing equipment is configured to execute according to the method for the present invention.

Detailed description of the invention

Other features and advantages of the present invention are the themes being described below with the signal of the attached drawing of some embodiments:

It is shown in the accompanying drawings:

Fig. 1 is the perspective view of processing equipment according to first embodiment,

Fig. 2 is the diagram of base main body to be processed,

Fig. 3 is the local perspective view of the substrate carrier unit with the calibration camera arranged,

Fig. 4 is the partial side view of the substrate carrier unit with the calibration camera arranged,

Fig. 5 is partial enlarged view of the processing equipment in the region of exposure system and base main body to be exposed,

Fig. 6 is the schematic diagram of two exposure bands of exposure system,

Fig. 7 be a) exposure system orientation and b) by registration camera obtain reference marker when calibration system signal Figure,

Fig. 8 is the signal according to the second embodiment by means of the calibration camera in rack arrangement to substrate carrier unit Figure, and

Fig. 9 is the schematic diagram similar to Fig. 7 of 3rd embodiment.

Specific embodiment

The example of the processing equipment indicated as a whole with 10 describes and the example in Fig. 1 as first embodiment Show a kind of processing equipment 10 of optical treatment for base main body 12 to property.

Fig. 2 shows base main body 12 to be processed in an illustrative manner.

Particularly, base main body 12 is basically constructed as plate.

Preferably, base main body 12 substantially extends in the subject plane of geometry 22, wherein particularly, base main body Extension of the extension of 12 subject plane 22 perpendicular to geometry significantly less than base main body 12 in the subject plane 22 of geometry.

Particularly, base main body 12 includes at least one photosensitive layer 24 and the structure sheaf 26 being located below.

At least one described photosensitive layer 24 and at least one structure sheaf 26 are arranged on the processing side 28 of base main body 12.

In this case, photosensitive layer 24 is applied on structure sheaf 26.

For example, photosensitive layer 24 is additionally provided with protective layer on the side away from structure sheaf 26, protective layer protection photosensitive layer 24 is exempted from By externalities, particularly harmful influence.

For example, structure sheaf 26 and photosensitive layer 24 are applied on loading plate 32.

Particularly, loading plate 32 substantially extends in the subject plane of geometry 22.

It is defined to be, predefined structure 42 is formed on processing side 28 by means of processing equipment 10.

It especially provides, predefined structure 42 is applied by exposure.

In this case, photochemistry is triggered in photosensitive layer 24 under suitable exposure, thus converts photosensitive layer 24 material.

Preferably, the material protection structure sheaf 26 of the photosensitive layer 24 being exposed being chemically converted is located under this material The region of side, to only remove, particularly etch away photosensitive layer 24 not in removal process, particularly in etching process The region of conversion zone and structure sheaf 26 being correspondingly positioned at below the region.

Structure sheaf 26 includes especially metal, such as structure sheaf 26 is layers of copper.

Predefined structure 42 is especially made of the multiple images of structural detail 44.

The multiple structural detail 44 especially substantially alike constructs.

Each structural detail 44 is made of multiple components 46.

For example, structural detail 44 is configured to the conductor line system of for electronics or electrical function element, and structure The especially electric conductor line of part 46.

Processing equipment 10 includes substrate carrier unit 52 and exposure system 54, wherein will be made a reservation for by means of exposure system 54 Adopted structure 42 is exposed in the base main body 12 being arranged on substrate carrier unit 52.

In addition, processing equipment 10 includes calibration system 56 for adjusting exposure system 54 and for detecting base main body The registration arrangement 58 of 12 position and/or orientation on substrate carrier unit 52.

Substrate carrier unit 52 is movably arranged in the rack 62 of processing equipment 10, and being preferably arranged to can be along feeding 66 linear movement of direction.

For example, rack 62 includes two guide portions 68a and 68b.The two guide portions are preferably substantially similarly constructed simultaneously And collectively referred to below as guide portion 68.

Guide portion 68 substantially extends along direction of feed 66 and is for example spaced each other transverse to direction of feed 66.

Substrate carrier unit 52 is movably arranged into guide portion 68, preferably to guide between two guide portions 68 Mode is arranged.

Substrate carrier unit 52 includes such as substructure 112.

Substrate carrier unit 52 includes at least two guide bodies 114a, 114b, the guide body in a manner of meeting purpose It is preferably embedded in guide portion 68a, 68b.Particularly, guide body 114 is arranged in by substructure 112.

In addition, setting substrate carrier control chip unit detecting system 118, detects to full accuracy the position of substrate carrier unit 52 It sets, especially its position in direction of feed 66.

Substrate carrier unit 52 includes holding meanss 122, keeps substrate master using holding meanss 122 during treatment process Body 12.

Here, holding meanss 122 especially include support component 124.Support component 124 includes at least one support-side 126, Supporting zone 128 is arranged in support-side 126 (Fig. 3 and Fig. 4).

In this case, base main body 12 is in the supporting zone 128 on support component 124 during processing. Particularly, base main body 12 is shelved on the supporting zone in support-side 126 using the side opposite with processing side 28 to be processed In 128.

For example, in the modification of embodiment, supporting zone 128 be configured to it is flat, so that base main body 12 is laid flat.

It is provided in another modification, in supporting zone 128, the various pieces of support component 124 extend, and substrate Main body 12 is only partially shelved on these parts of support component 124 in supporting zone 128.

For example, the part of support component 124 is configured to fenestral fabric.

For example, holding meanss 122 include suction nozzle 129.Negative pressure is generated relative to environmental pressure using suction nozzle 129, is preferably existed Negative pressure is generated in the support-side 126 of support component 124, and base main body 12 is attracted on support component 124 and is fixed.

For example, suction nozzle 129 is arranged on support component 124.

In the modification of embodiment, base main body 12 is alternately or additionally by means of mechanical retaining means (such as fixture) It keeps.

Therefore, base main body 12 remains essentially in geometry by holding meanss 122 and keeps in plane 132.

Particularly, in the case where base main body 12 is shelved in the supporting zone 128 on support component 124, the substrate The subject plane 22 of the geometry of main body and the holding plane 132 of geometry are substantially coincident.

It providing in a variant, the holding plane 132 of geometry extends essentially through support-side 126, especially through The surface of support-side extends.

It is provided in another modification, when base main body 12 by regulation is arranged in holding meanss 122, the guarantor of geometry Fair face 132 extends substantially across the processing side 28 to be processed of base main body 12, especially through the surface of the processing side.

Preferably, holding meanss 122 are arranged to movable relative to rack 62, such as can be transported relative to substructure 112 It is dynamic.

Particularly, holding meanss 122 can be at least approximately perpendicular to keep to transport on the vertically extending direction of plane 132 It is dynamic.

Exposure system 54 includes multiple exposing units 152, especially a large amount of exposing units 152 (Fig. 5).

For example, exposure system 54 includes several hundred a exposing units 152.

Exposing unit 152 respectively includes at least one light source 156 and especially relative optical deflecting device 158.

Light source 156 emits light, which triggers chemical conversion process in the photosensitive layer 24 of base main body 12.

The light beam 159 emitted by light source 156 is aligned using optical deflecting device 158 and for example focuses on base main body Desired locations on 12.

Exposing unit 152 is oriented, so that base main body 12, particularly its processing side 28 are substantially in exposure plane 160 Exposure.

Optical deflecting device 158 deflects the light beam 159 of light source 156, so that the light beam is hit in advance in exposure plane 160 Determine region and exposes presumptive area.

Particularly, presumptive area corresponds to the partial region of predefined structure 42.

Particularly, in the case where keeping base main body 12 by regulation by holding meanss 122, exposure plane 160 is passed through Its processing side 28 to be processed, the surface for preferably passing through the processing side 28.

Particularly, exposure plane 160 and holding plane 132 are substantially parallel to each other extension.

Arrangement for deflecting 158 makes the light beam 159 of light source 156 in exposure 162 intrinsic deflection of section, more precisely, according to presence Data in coordinate system (X1, Y1) deflect light beam.

It is thus known that rays of the light beam 159 in coordinate system (X1, Y1).

It provides herein, the light beam 159 of exposing unit 152 moves in exposure section 162 respectively, to carry out base main body 12 exposure.

In this case, exposure section 162 is especially adjacent to each other but not overlappingly arrangement or overlapping one another simultaneously Arrangement is set.

Preferably, exposure section 162 transverse to direction of feed 66, particularly is at least approximately perpendicular to direction of feed 66 side by side Ground arrangement.

It especially provides, during the exposure of base main body 12, base main body is by substrate carrier unit 52 in direction of feed 66 Linear motion, and the light beam 159 of light source 156 in exposure section 162 accordingly transverse to, particularly favour feeding side It is deflected to 66 by arrangement for deflecting 158.

Therefore, exposing unit 152 preferably respectively by the movement of light beam 159 in exposure section 162 accordingly respectively according to It penetrates in the region limited by exposure band 164 in base main body 12.

The exposure band 164 generated in base main body 12 especially longitudinally extends in direction of feed 66, and has Transverse to the width of direction of feed 66, which is equal to the width of exposure section 162.

Exposure band 164 also transverses to direction of feed 66 and is arranged side by side, wherein preferably, exposing band 164 at edge Stress to fold.

Particularly, two adjacent exposure bands 164 are distinguished adjacent to each other.

Therefore, being determined entirely by by exposure band 164 of region 166 to be exposed in base main body 12.

Preferably, exposing unit 152 exposes the single pixel in the exposure section 162.

Herein particularly, the pixel is arranged in the grid being made of each grid point RP (Fig. 6).

Particularly, grid point RP arrangement embarks on journey 168, these rows are extending essentially in the transverse in exposure section 162.

For example, row 168 transverse to direction of feed 66 extend, wherein be especially expert at 168 trend and direction of feed 66 it Between tilt angle may be by movement velocity of the base main body 12 in direction of feed 66 and light beam transverse to direction of feed 66 Movement velocity provide.

Exposing unit 152 exposes each pixel, a grid of the center difference of these pixels substantially in grid point RP In lattice point.

In this case, the size of pixel spot is more much larger than the distance of two adjacent gate lattice point RP in row 168, such as It is at least 5 times big and more much larger than the distance of two adjacent rows 168 such as at least 5 times big.

In addition, typical sizes of the mutual distance of grid point RP significantly less than single component 46.

Therefore, the region to be exposed of predefined structure 42 is covered by multiple pixel spots, so as to enough precision The sharp edge of predefined structure 42 is imaged.

It is described all referring to DE 10242142A1 with particular reference to there about other favorable characteristics of exposure system 54 Exposure device construction.

Each exposing unit 152 is adjusted relative to each other by means of calibration system 56.

Particularly, the exposure section 162 of each exposing unit 152 orients relative to each other, and it is single to detect each exposure Corresponding coordinate system (the Xl of member 152_a,Yl_a)、(Xl_b,Yl_b)、...。

Calibration system 56 includes at least one calibration camera 212 (Fig. 3, Fig. 4 and Fig. 7) with optical imaging system 214.

Calibration camera 212 is especially arranged on substrate carrier unit 52, such as is arranged in the side of substrate carrier unit 52 On, which is the end side of substrate carrier unit 52 relative to direction of feed 66.

Calibration camera 212 extends substantially transversely to direction of feed 66, can preferably at least transport approximately perpendicular to direction of feed 66 It is arranged on substrate carrier unit 52, is for example arranged in its underpart structure 112 dynamicly.

For example, calibration camera 212 is arranged to be movably guided in linear axes 216 by means of bracket 218, the linear axes Extend transverse to direction of feed 66.

Particularly, calibration camera 212 is arranged so into movable, allows the calibration camera single by each exposure Each exposure section 162 movement of member 152.

By means of imaging system 214, calibration camera 212 detects imaging region 222 in its coordinate system (X2, Y2).

Preferably, optical element 224 is arranged in imaging region 222.

Particularly, optical element 224 is configured to light beam visualization element, so as to detect light beam 159 to for school The rum point 226 of the optical element 224 of quasi- camera 212.For example, 224 scattered beam 159 of optical element.

For example, optical imaging element 224 is made of glass, particularly glass plate.

The side towards calibration camera 212 of imaging region 222, such as optical element 224, particular on calibration camera In 212 object plane, so that calibration camera 212 clearly detects the image of imaging region 222.

Particularly, imaging system 214 and especially optical element 224 are permanently attached calibration camera 212, such as by means of Help the connection of bracket 218, so that imaging region 222 also transverses to, preferably at least approximately perpendicular to feeding optical element 224 in turn Direction 66 is movable and moves with the movement of calibration camera 212.

Preferably, imaging region 222 substantially extends in exposure plane 160.

In a variant, imaging region 222 substantially extends in the holding plane 132 of geometry.

In addition, calibration system 56 has at least one reference marker 232, such as two reference markers 232a, 232b.

The position of reference marker 232 be in the coordinate system (X2, Y2) of calibration camera 212 it is known, particularly, these positions It sets and is detected by calibration camera 212.

Particularly, reference marker 232 is arranged in imaging region 222, is preferably arranged on optical element 224.

For example, reference marker 232 is arranged in the fringe region of imaging region 222, so that reference marker is calibrated camera 212 detect, and the middle section of imaging region 222 is available.

Particularly, reference marker 232 includes high-contrast structures 234, is arranged with the background optical of reference marker 232 Height contrastively sets off out.

Reference marker 232 is for example formed by chromium or chromium oxide.

In addition, calibration system 56 further includes calibration camera detection system 242, the position of testing calibration camera 212, and Such as testing calibration camera is along the movement of linear axes 216.

Particularly, position of the 242 testing calibration camera 212 of calibration camera detection system in linear axes 216.

Registration arrangement 58 includes at least one registration camera 252.

In advantageous modification, if there are two be registrated camera 252.

For example, at least one described registration camera 252 is arranged on the bridge 254 of rack 62.

Preferably, bridge 254 extends transverse to direction of feed 66.

Particularly, bridge 254 is across guide portion 68 and substrate carrier unit 52 can move with passing through below bridge 254.

Particularly, substrate carrier unit 52 is arranged to movable relative to registration camera 252.

In at least one registration position 258 of substrate carrier unit 52, registration camera 252 is directed at substrate carrier unit 52, and particularly detect supporting zone 128.

It is correctly arranged on substrate carrier unit 52 it is possible thereby to be detected in registration position 258 by registration camera 252 Base main body 12.

It is registrated especially base main body of the detection arrangement on substrate carrier unit 52 in registration position 258 of camera 252 12 position and orientation in its coordinate system (X3, Y3).

For example, registration camera 252 is by means of the ginseng in base main body 12 and/or base main body 12 turning and edge Label is examined to detect its position and orientation.

In addition, reference marker 232 can be by registration phase at least one reference position 264 of substrate carrier unit 52 Machine 252 detects.

Processing equipment 10 works as a result, and its calibration preferably carries out as follows:

In order to orient and be arranged exposing unit 152, calibration camera 212 is in the exposure section 162 of each exposing unit 152 It portion and is moved between the exposure section.

Particularly, here, substrate carrier unit 52 is moved in direction of feed 66, for example moved in guide portion 68, and And calibration camera 212 is moved along linear axes 216 transverse to direction of feed 66.

In this case, substrate carrier unit 52 is along the exact position of direction of feed 66 always by substrate carrier unit Detection system 118 detects, and calibration camera 212 is true by calibration camera detection system 242 along the position of linear axes 216 It is fixed, so that its position is known to full accuracy.For example, as it is known that its position has at most ± 0.1mm, more preferable ± 0.05mm, then More preferably ± 0.001mm, and the error of particularly advantageously ± 0.0005mm.

In this case, calibration camera 212 detects rum point 226 and reference of the light beam 159 in imaging region 222 Label 232 (Fig. 7 a).

Therefore, rum point 226 is detected in its coordinate system (X2, Y2) by calibration camera 212 relative to reference marker 232 Position, position of the rum point in the coordinate system (X1, Y1) of exposing unit 152 is known.

Therefore, it is able to achieve between the coordinate system (X1, Y1) of exposing unit and the coordinate system (X2, Y2) of calibration camera 212 Transformation.

In addition, calibration camera 212 moves in each exposure section 162 of exposing unit 152, and by adjusting deflection Device 158 orients exposure section 162 relative to each other.

For this purpose, the endpoint of especially row 168 is detected by calibration camera 212 and arrangement for deflecting 158 is coordinated, so that two Each endpoint of adjacent exposure section 162 has relative position required relative to each other, especially substantially in feeding side It arranges with being offset relative to each other on to 66, and for example there is distance, the distance and row 168 each other transverse to direction of feed 66 The basic size of spacing of interior adjacent gate lattice point RP is identical.

In order to match the coordinate system (X2, Y2) of calibration camera 212 and be registrated the coordinate system (X3, Y3) of camera 252, substrate is carried Body unit 52 moves to reference position 264, such as by substrate carrier unit 52 along the movement of direction of feed 66 and calibration phase Machine 212 is realized along the movement of linear axes 216.

In this case, registration camera 252 detects position of the reference marker 232 in its coordinate system (X3, Y3), it is known that The position of reference marker 232 in the coordinate system (X2, Y2) of calibration camera 212.Thus it is able to achieve the coordinate system of calibration camera 212 Adjustment and transformation (Fig. 7 b) between (X2, Y2) and the coordinate system (X3, Y3) for being registrated camera 252.

In this case, in the coordinate system (X2, Y2) of calibration system (56) and the coordinate system (X1, Y1) of exposure system 54 Space relative displacement between the coordinate system (X3, Y3) of registration arrangement 58 is in substrate carrier unit 52 and calibration camera 212 By being detected by substrate carrier control chip unit detecting system 118 and the especially up to precision of calibration camera detection system 242 in movement Movement and it is known.

Using calibration system 56 coordinate system (X2, Y2) on the one hand with the coordinate system of exposure system 54 (X1, Y1) and another On the one hand the so determining transformation between the coordinate system (X3, Y3) of registration arrangement 58, can determine the seat of exposure system 54 Transformation between mark system (X1, Y1) and the coordinate system (X3, Y3) of registration arrangement 58.

Preferably, the component of processing equipment 10, particularly substrate carrier unit 52, exposure system 54,56 and of calibration system The above-mentioned adjusting and calibration of registration arrangement 58 are automated by such as computer aided control system 312 and are carried out.

In order to handle base main body 12, especially for the base main body is exposed, the base main body 12 is arranged in substrate On carrier element 52, it is disposed particularly in supporting zone 128 and is kept by holding meanss 122.

Preferably, processing side 28 is positioned substantially in exposure plane 160 by height-adjustable holding meanss 122.

In the case where arranging base main body 12, substrate carrier unit 52 is moved in registration position 258, and by matching Quasi- camera 252 position of detection base main body 12 and orientation in its coordinate system (X3, Y3).

Therefore, by the adjusting and calibration of processing equipment 10, it is also known that base in the coordinate system (X1, Y1) of exposure system 54 The position of plate main body 12 and orientation.

For exposure base main body 12, base main body passes through exposure section 162 from the movement of substrate carrier unit 52, and exposes Light unit 152 especially exposes the base main body 12 with predetermined structure 42 in its respective exposure band 164.

It is real with first in the second embodiment of processing equipment 10 according to the present invention (such as part is shown in fig. 8) Those of the identical component appended drawing reference having the same of those of example component is applied, and real entirely by reference to first relative to its description The embodiment for applying example.

In a second embodiment, at least one reference marker 232, such as two reference markers 232a, 232b, are arranged on At the element 322 of calibration system 56, for example be arranged on bracket 218.

In this case, element 322 is permanently attached calibration camera 212.

Particularly, element 322 is for example moved along linear axes 216 in an identical manner together with calibration camera 212.

It is therefore preferred that at least under the conventional operating conditions of processing equipment 10, reference marker 232 and calibration camera 212 Between relative position substantially constant.

Position of the reference marker 232 in the coordinate system (X2, Y2) of calibration system 56 is for example measured primary and is stored in To be used for subsequent use in control system 312, such as calibrating and the component of directional process equipment 10.

In a second embodiment, the orientation of exposing unit 152 is executed in the mode similar with first embodiment.By calibration phase The rum point 226 of the detection light beam 159 in its coordinate system (X2, Y2) of machine 212.Hence, it can be determined that from the seat of exposing unit 152 Mark system (X1, Y1) arrives the transformation of the coordinate system (X2, Y2) of calibration camera 212, and each exposure section 162 is fixed relative to each other To.

In addition, registration camera 252 detects reference marker 232 in reference position 264, thus in the coordinate of calibration system 56 When being known to the position of the reference marker 232 in (X2, Y2), coordinate system (X3, Y3) and the calibration of registration arrangement 58 can be determined Transformation between the coordinate system (X2, Y2) of system 56.

The position of the reference marker 232 in coordinate system (X2, Y2) in order to accurately determine calibration system 56, such as equipped with ginseng Examining the test base main body 12 ' of structure, there is the processing equipment 10 of test structure to be exposed, test structure be designed to for example with Reference configuration is essentially identical.

Here, particularly, using the coordinate system (X3, Y3) of registration arrangement 58 and the coordinate system (X2, Y2) of calibration system 56 Between transformation it is first approximate.

According to the spatial offset between reference configuration and the test structure being exposed, can determine to coordinate system (X3, Y3) The approximate correction of transformation between (X2, Y2), and the offset is for example stored in control system 312.

It is approximate from there through converted with offset correction first, coordinate system (X3, Y3) and calibration system in registration arrangement 58 Determine that high-precision converts between the coordinate system (X2, Y2) of system 56.

Further preferably, such determined position of the reference marker 232 in the coordinate system (X2, Y2) of calibration system 56 It is stored preferably in control system 312, so as to call these positions in subsequent adjustment and directional process equipment 10.

It is therefore preferred that the component of automatic adjustment and directional process equipment 10 also may be implemented in a second embodiment.

In the 3rd embodiment of processing equipment according to the present invention as shown in Figure 9, reference marker 232'a is configured to wrap The line profile that encloses interior zone 233' and therefore can highly precisely be detected.

In addition, all elements being identical with the first embodiment are designed with identical appended drawing reference, so as to entirely by reference to To the embodiment of first embodiment.

Claims (32)

1. one kind is used for the processing equipment (10) of base main body (12), especially optical treatment equipment (10), comprising: have one The exposure system (54) of exposing unit (152) or multiple exposing units (152) has for adjusting exposure system (54) at least The calibration system (56) of one calibration camera (212) has the substrate of the holding meanss (122) for the base main body (12) Carrier element (52), and the registration arrangement (58) with a registration camera (252) or multiple registrations camera (252), wherein By the holding meanss (122) keep the base main body (12) position and/or be oriented in the substrate carrier unit It (52) can be by one registration camera or at least one registration camera (252) inspection at least one registration position (258) It surveys,

It is characterized in that, the calibration system (56) has a reference marker (232) or multiple reference markers (232), it is described One or at least one reference marker is arranged in the opposite position of the restriction relative at least one calibration camera (212) In setting, and one or at least one reference marker (232) can be by one or at least one registration camera (252) Detection.

2. processing equipment (10) according to claim 1, which is characterized in that the substrate carrier unit (52) and the exposure Photosystem (54) can be movable with respect to each other.

3. according to the described in any item processing equipments of preceding claims (10), which is characterized in that the substrate carrier unit (52) it can be movable with respect to each other with the registration arrangement (58).

4. according to the described in any item processing equipments of preceding claims (10), which is characterized in that the substrate carrier unit It (52) can be substantial linear on direction of feed (66) relative to the exposure system (54) and/or the registration arrangement (58) Movement.

5. according to the described in any item processing equipments of preceding claims (10), which is characterized in that processing equipment (10) packet Substrate carrier control chip unit detecting system (118) are included, with the position for accurately detecting substrate carrier unit (52).

6. according to the described in any item processing equipments of preceding claims (10), which is characterized in that in the exposing unit (152) Each exposing unit include light source (156) and optical deflecting device (158).

7. according to the described in any item processing equipments of preceding claims (10), which is characterized in that in the exposing unit (152) Each exposing unit setting for accordingly exposure section (162) in exposure.

8. processing equipment (10) according to claim 7, which is characterized in that in the state of regulating, each exposure is single The exposure section (162) of first (152) is disposed adjacent to each other respectively.

9. according to the described in any item processing equipments of preceding claims (10), which is characterized in that exposure system (54) quilt Orient the processing side (28) in the exposure plane (160) for being arranged substantially at geometry to expose the base main body (12).

10. according to the described in any item processing equipments of preceding claims (10), which is characterized in that at least one described calibration phase Machine (212) can move in each exposure section (162) and can move to exposure section (162) inside.

11. according to the described in any item processing equipments of preceding claims (10), which is characterized in that at least one described calibration phase Machine (212) is arranged on the substrate carrier unit (52).

12. according to the described in any item processing equipments of preceding claims (10), which is characterized in that at least one described calibration phase Machine (212) is at least approximately perpendicular to the direction of feed (66) and is movably arranged on the substrate carrier unit (52).

13. according to the described in any item processing equipments of preceding claims (10), which is characterized in that calibration system (56) packet It includes calibration camera detection system (242), the calibration camera detection system detects the position of at least one calibration camera (212) It sets, especially up to detects to precision.

14. according to the described in any item processing equipments of preceding claims (10), which is characterized in that it is one or more, particularly All reference markers (232) are arranged substantially in the exposure plane (160).

15. according to the described in any item processing equipments of preceding claims (10), which is characterized in that it is one or more, particularly All reference markers (232) be arranged in at least one described calibration camera (212) substantially invariable relative position.

16. according to the described in any item processing equipments of preceding claims (10), which is characterized in that it is one or more, particularly All reference markers (232) be arranged in the optical imaging system (214) at least one calibration camera (252) with institute It states on the optical element (224) that calibration camera is fixedly connected, is disposed particularly on light beam visualization element.

17. according to the described in any item processing equipments of preceding claims (10), which is characterized in that the optical element (224) Surface extend substantially in the exposure plane (160), arrangement is one or more on said surface, particularly all ginsengs Examine label.

18. according to the described in any item processing equipments of preceding claims (10), which is characterized in that it is one or more, particularly All reference markers (232) are arranged in the imaging region (222) of at least one calibration camera (212).

19. according to the described in any item processing equipments of preceding claims (10), which is characterized in that it is one or more, particularly All reference markers (232) are arranged at least one described calibration camera (212),.

20. according to the described in any item processing equipments of preceding claims (10), which is characterized in that it is one or more, particularly All reference markers (232) are arranged on the bracket (218) of at least one calibration camera (212), especially unchangeably cloth It sets.

21. according to the described in any item processing equipments of preceding claims (10), which is characterized in that it is one or more, particularly All reference markers (232) at least can be by one at least one reference position (264) of the substrate carrier unit (52) A or multiple registration camera (252) detections.

22. according to the described in any item processing equipments of preceding claims (10), which is characterized in that it is one or more, particularly All reference markers (232) include the structure relative to the high optical contrast in background area.

23. according to the described in any item processing equipments of preceding claims (10), which is characterized in that it is one or more, particularly All reference markers (232) are configured at least one on the optical element (224) and/or described calibration camera (212) And/or at least one calibration camera (212) bracket (218) on coating.

24. according to the described in any item processing equipments of preceding claims (10), which is characterized in that the reference marker (232) It is configured to region-wide label, there is the outer profile limited.

25. according to claim 1 to processing equipment described in any one of 23, which is characterized in that reference marker (232) structure Make the line profile for being especially constructed to surround interior zone for line profile.

26. method of the one kind for the processing equipment (10) of running substrate main body (12), especially described for adjusting and orienting The method of the component of processing equipment (10), wherein the processing equipment (10) includes: with an exposing unit (152) or multiple The exposure system (54) of exposing unit (152) has at least one calibration camera for adjusting the exposure system (54) (212) calibration system (56) has the substrate carrier unit of the holding meanss (122) for the base main body (12) (52), and with a registration camera (252) or multiple registration arrangements (58) for being registrated camera (252), for detecting by institute State position and/or the orientation of the base main body (12) of holding meanss (122) holding, which is characterized in that the calibration system (56) there is a reference marker (232) or multiple reference markers (232), the reference marker to be respectively disposed at relative to institute In the relative position for stating the restriction of at least one calibration camera (212), and one or at least one reference marker (232) By one or at least one registration camera (252) detection.

27. according to the method for claim 26, which is characterized in that adjust the exposure by means of the calibration system (56) System (54).

28. the method according to claim 26 or 27, which is characterized in that detected by means of the calibration system by described one One or more that a or multiple exposing units (152) emit relative to one or at least one reference marker (232), spy It is not the rays of all light beams (159).

29. the method according to any one of claim 26 to 28, which is characterized in that one or at least one reference It is detected by least one described calibration camera (212) position of label (232).

30. the method according to any one of claim 26 to 29, which is characterized in that one or at least one reference Label (232) is stored in control system (312) relative to the position of at least one calibration camera (212).

31. the method according to any one of claim 26 to 30, which is characterized in that at least one described calibration camera (212) movement of the exposure plane (160) for being parallel to the exposure system (54) and/or position are by calibration camera detection system (242) it detects, especially up to detects to precision.

32. the method according to any one of claim 26 to 31, which is characterized in that by substrate carrier control chip unit detecting system (118) the substrate carrier unit (52) is detected relative to the exposure system (54) and/or relative to the registration arrangement (58) movement and/or position, are especially accurately detected.