CN110364287B - UV irradiation resistant silver nanowire ink, preparation method thereof and prepared transparent conductive film - Google Patents
UV irradiation resistant silver nanowire ink, preparation method thereof and prepared transparent conductive film Download PDFInfo
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- CN110364287B CN110364287B CN201910735162.2A CN201910735162A CN110364287B CN 110364287 B CN110364287 B CN 110364287B CN 201910735162 A CN201910735162 A CN 201910735162A CN 110364287 B CN110364287 B CN 110364287B
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- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
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Abstract
The invention provides UV irradiation resistant silver nanowire ink, a preparation method thereof and a prepared transparent conductive film, wherein the silver nanowire ink comprises the following components in percentage by mass: 0.1% -1% of silver nanowires; 1% -2% of a thickening agent; 0.01 to 0.4 percent of dispersant; 0.01 to 0.4 percent of flatting agent; 0.01 to 0.4 percent of surfactant; 0.01% -0.5% of UV resistant additive; 95.3 to 98.86 percent of solvent. According to the invention, the anti-UV additive is introduced into the silver nanowire ink, so that the anti-UV performance of the transparent conductive film prepared from the silver nanowire ink can be obviously enhanced.
Description
Technical Field
The invention relates to a conductive film, in particular to a UV irradiation resistant silver nanowire ink, a preparation method thereof and a prepared transparent conductive film.
Background
The silver nanowire transparent conductive film has the advantages of excellent conductivity, high optical transmittance, excellent flexibility, ductility, low cost and the like, so the silver nanowire transparent conductive film has a wide application prospect in the aspects of flexible photoelectric devices such as mobile phone touch screens, liquid crystal displays, flexible solar cells and the like. At present, the silver nanowire transparent conductive film is considered as a substitute material of the traditional ITO transparent electrode, and the current situations that the ITO film is high in price, high in brittleness and short in indium resource can be solved. However, the silver nanowires strongly absorb ultraviolet wave bands under the illumination condition and are easily decomposed, which severely limits the practical application of the silver nanowires, so that the improvement of the anti-UV performance of the silver nanowire ink after coating on a flexible substrate is a problem which needs to be solved at present.
Disclosure of Invention
In order to overcome the defects of the prior art, the invention provides the UV-irradiation-resistant silver nanowire ink, the preparation method thereof and the prepared transparent conductive film, and aims to reduce the damage of the silver nanowires caused by ultraviolet irradiation.
The invention is realized by the following technical scheme:
the UV irradiation resistant silver nanowire ink comprises the following components in percentage by mass:
preferably, the wire diameter of the silver nanowire is 13-40nm, and the wire length is 10-50 um.
Preferably, the thickener is one of hydroxypropyl methylcellulose and methyl hydroxypropyl cellulose.
Preferably, the anti-UV additive is at least one of 2- (2 '-hydroxy-5' -methylphenyl) benzotriazole, 2- (2-hydroxy-3 ', 5' -di-tert-phenyl) -5-chlorobenzotriazole, 2-hydroxy-4-methoxybenzophenone, 2, 4-dihydroxybenzophenone, 2-hydroxy-4-n-octoxybenzophenone, phenyl o-hydroxybenzoate, hexamethylphosphoramide, 4-benzoyloxy-2, 2, 6, 6-tetramethylpiperidine, tris (1, 2, 2, 6, 6-pentamethylpiperidinyl) phosphite, benzoin and benzoin dimethyl ether.
Preferably, the dispersant is one of Sago-3636, Sago-3223, Sago-9006 and Sago-9760.
Preferably, the leveling agent is one of ethanolamine, propylene glycol methyl ether, propylene glycol and diacetone alcohol.
Preferably, the surfactant is polyvinylpyrrolidone, and the molecular weight is 55000-1300000; the solvent is a mixed solution of water and ethanol.
The preparation method of the UV irradiation resistant silver nanowire ink comprises the following steps:
(1) preparing a silver nanowire dispersion liquid: dispersing silver nanowires in a polyvinylpyrrolidone solution;
(2) preparing silver nanowire ink: and centrifuging the silver nanowire dispersion liquid, dispersing the silver nanowires by using a thickening agent solution, putting the silver nanowires into a shaking table for oscillation, then respectively adding a dispersing agent, a flatting agent, a surfactant and an anti-UV additive, and oscillating on the shaking table after each addition to obtain the silver nanowire ink.
The silver nanowire transparent conductive film is prepared by adopting the UV irradiation resistant silver nanowire ink.
The preparation method of the silver nanowire transparent conductive film comprises the steps of coating the UV-irradiation-resistant silver nanowire ink on a PET substrate in a scraping mode, drying, forming a film on the PET substrate, spin-coating an OC layer on the film, drying, and curing under the irradiation of a UV lamp to obtain the UV-irradiation-resistant silver nanowire transparent conductive film.
Compared with the prior art, the invention has the following beneficial technical effects:
according to the invention, the anti-UV additive is introduced into the silver nanowire ink, so that UVA wave band ultraviolet rays can be strongly absorbed, the silver nanowires are protected, the transparent conductive film is prevented from losing effectiveness due to the deterioration of the silver nanowires, the anti-UV performance of the transparent conductive film prepared by the silver nanowire ink can be obviously enhanced, and the silver nanowires are protected from decomposition and fracture under the irradiation of the ultraviolet rays. The invention utilizes the anti-UV additive to well solve the problem of silver nanowire breakage caused by ultraviolet irradiation, and can prolong the service life of the silver nanowire transparent film and expand the application range thereof. The invention has good coating effect by using a substrate sold in the market, and the appearance of the transparent conductive film is not influenced during coating because the addition amount of the UV resistant additive is very small.
The preparation method is simple, obvious UV resistant effect can be achieved only by adding a very small amount of UV resistant additive, the cost is low, and the preparation method is suitable for large-scale production.
Detailed Description
The present invention will now be described in further detail with reference to specific examples, which are intended to be illustrative, but not limiting, of the invention.
The UV irradiation resistant silver nanowire ink comprises the following components in percentage by mass:
wherein the wire diameter of the silver nanowire is 13-40nm, and the wire length is 10-50 um. The thickener is at least one of hydroxypropyl methylcellulose HPMC and methyl hydroxypropyl cellulose MHPC. The anti-UV additive is at least one of 2- (2 '-hydroxy-5' -methylphenyl) benzotriazole, 2- (2-hydroxy-3 ', 5' -di-tert-phenyl) -5-chlorobenzotriazole, 2-hydroxy-4-methoxybenzophenone, 2, 4-dihydroxybenzophenone, 2-hydroxy-4-n-octoxybenzophenone, phenyl o-hydroxybenzoate, hexamethylphosphoramide, 4-benzoyloxy-2, 2, 6, 6-tetramethylpiperidine, tris (1, 2, 2, 6, 6-pentamethylpiperidinyl) phosphite, benzoin, and benzoin dimethyl ether. The dispersant is at least one of Sago dispersants Sago-3636, Sago-3223, Sago-9006 and Sago-9760. The leveling agent is at least one of ethanolamine, propylene glycol methyl ether, propylene glycol and diacetone alcohol. The surfactant is polyvinylpyrrolidone PVP, and the molecular weight is 55000-1300000. The solvent is a mixed solution of deionized water and ethanol.
The preparation method of the UV irradiation resistant silver nanowire transparent conductive film comprises the following steps:
(1) and preparing silver nanowire dispersion liquid. The silver nanowires are synthesized by using ethylene glycol as a solvent, and polyethylene pyrrolidone (PVP) is used as a surfactant in the synthesis process, so that the primary pulp of the silver nanowires needs to be cleaned. The cleaning process is as follows: centrifugally cleaning the silver nanowire primary pulp for 6-10min for three times at the rotation speed of 5000-; the silver nanowires were then dispersed in a 0.5-2% PVP solution.
(2) And (4) quantifying. 5mL of silver nanowire dispersion liquid is taken, centrifugally washed by ethanol, dried and weighed, and the concentration of the silver nanowires is calculated.
(3) And preparing the silver nanowire ink. And centrifuging the silver nanowire dispersion liquid at the rotating speed of 5500rpm for 10min, dispersing the silver nanowires by using 1-2% of thickening agent solution to prepare silver nanowire solution with the mass fraction of 0.1-1%, and placing the silver nanowire solution into a shaking table to oscillate for 30min-1 h. Respectively adding a certain amount of dispersing agent, flatting agent and surfactant, and oscillating on a shaking table for 30min-1h after each addition to obtain the silver nanowire solution.
(4) Adding anti-UV additive. Adding one or more UV resistant additives with the mass fraction of 0.01-0.5% into the prepared silver nanowire solution, placing the mixture into a shaking table, and oscillating for 30min-1h to finish ink preparation.
(5) And preparing the UV irradiation resistant silver nanowire transparent conductive film. And (3) scraping the UV-resistant silver nanowire ink on a PET substrate by using an automatic coating machine, and drying for 5min at 70 ℃ in an oven. Cutting the silver nanowire transparent conductive film into 2 x 2cm small squares, spin-coating an OC layer at the rotation speed of 250-1000rpm for 15-45s, drying in an oven at 130 ℃ for 5min, controlling the power of a UV lamp at 50-85% and curing for 30s-3min to obtain the UV irradiation resistant silver nanowire transparent conductive film.
In order to make the contents of the present invention more clearly understood, the present invention will be described in further detail below according to specific examples of the present invention in conjunction with the attached table 1.
Comparative example and examples 1 to 5
The silver nanowire ink comprises the following components in percentage by mass:
wherein: the diameter of the silver nanowire is 13-40nm, and the length of the nanowire is 10-50 um; the thickener is hydroxypropyl methylcellulose HPMC; the dispersant used is Sago-3636; the flatting agent is propylene glycol methyl ether; the surfactant is polyvinylpyrrolidone K90; the used anti-UV additive is 2- (2-hydroxy-3 ', 5' -di-tert-phenyl) -5-chlorobenzotriazole, 4-benzoyloxy-2, 2, 6, 6-tetramethylpiperidine and phenyl o-hydroxybenzoate; the solvent is a mixed solution of deionized water and ethanol.
The preparation method of the anti-UV silver nanowire transparent film comprises the following steps:
(1) and preparing silver nanowire dispersion liquid. Centrifugally cleaning the silver nanowire primary pulp for 10min three times at a rotating speed of 5500 rpm; the silver nanowires were then dispersed in a 1% PVP solution.
(2) And (4) quantifying. 5mL of silver nanowire dispersion liquid is taken, centrifugally washed by ethanol, dried and weighed, and the concentration of the silver nanowires is calculated.
(3) And preparing the silver nanowire ink. And centrifuging the silver nanowire dispersion liquid at the rotating speed of 5500rpm for 10min, dispersing the silver nanowire dispersion liquid by using a 2% thickening agent solution to prepare a silver nanowire solution with the mass fraction of 0.15%, and placing the silver nanowire solution in a shaking table to oscillate for 40 min. Respectively adding a certain amount of dispersant, flatting agent and surfactant, and oscillating on a shaking table for 40min after each addition.
(4) Adding anti-UV additive. Adding anti-UV additives 2- (2-hydroxy-3 ', 5' -di-tert-phenyl) -5-chlorobenzotriazole, 4-benzoyloxy-2, 2, 6, 6-tetramethylpiperidine and phenyl o-hydroxybenzoate into the prepared silver nanowire ink respectively or in a mixing manner, placing the mixture into a shaking table, and oscillating for 40min to finish ink preparation.
(5) And preparing the UV irradiation resistant silver nanowire transparent conductive film. And (3) scraping the UV-irradiation-resistant silver nanowire ink on a PET substrate by using an automatic coating machine, and drying in an oven at 70 ℃ for 5 min. And cutting the silver nanowire transparent conductive film into 2 × 2cm small blocks, spin-coating an OC layer at the rotation speed of 500rpm for 25s, drying in an oven at 130 ℃ for 5min, controlling the power of a UV lamp to be 65%, and curing for 2min to obtain the UV-irradiation-resistant silver nanowire transparent conductive film.
The composition of the silver nanowire ink and the UV resistance of the transparent conductive film of the comparative example and each example are compared in table 1.
The comparative example and the silver nanowire transparent conductive films prepared by adding different types of UV resistant additives in examples 1-5 are obtained by comparing the photoelectric properties of the silver nanowire transparent conductive films before and after 240h of ultraviolet irradiation, and the silver nanowire transparent conductive films prepared within the range of the conditions of the invention show good UV irradiation resistance and meet the UV resistance requirement. The anti-UV additive 2- (2-hydroxy-3 ', 5' -di-tert-phenyl) -5-chlorinated benzotriazole shows the most excellent anti-UV performance on the basis of the silver nanowire ink formula.
Table 1 comparison of UV resistance of silver nanowire ink compositions and transparent conductive films of comparative examples and examples
Examples 6 to 11
The UV irradiation resistant silver nanowire ink comprises the following components in percentage by mass:
wherein: the diameter of the used nano silver wire is 13-40nm, and the wire length is 10-50 um; the thickening agent is methyl hydroxypropyl cellulose (MHPC); the dispersant used is Sago-9006; the flatting agent is ethanolamine; the surfactant is polyvinylpyrrolidone K30; the used anti-UV additive is 2- (2 '-hydroxy-5' -methylphenyl) benzotriazole, 2-hydroxy-4-methoxybenzophenone and hexamethylphosphoramide; the solvent is a mixed solution of deionized water and ethanol.
The preparation method of the anti-UV silver nanowire transparent film comprises the following steps:
(1) and preparing silver nanowire dispersion liquid. Centrifugally cleaning the silver nanowire primary pulp for 10min three times at a rotating speed of 5500 rpm; the silver nanowires were then dispersed in a 1% PVP solution.
(2) And (4) quantifying. 5mL of silver nanowire dispersion liquid is taken, centrifugally washed by ethanol, dried and weighed, and the concentration of the silver nanowires is calculated.
(3) And preparing the silver nanowire ink. And centrifuging the silver nanowire dispersion liquid at the rotating speed of 5500rpm for 10min, dispersing the silver nanowire dispersion liquid by using a 2% thickening agent solution to prepare a silver nanowire solution with the mass fraction of 0.2%, and placing the silver nanowire solution in a shaking table to oscillate for 40 min. Respectively adding a certain amount of dispersant, flatting agent and surfactant, and oscillating on a shaking table for 40min after each addition.
(4) Adding anti-UV additive. Adding anti-UV additives 2- (2 '-hydroxy-5' -methylphenyl) benzotriazole, 2-hydroxy-4-methoxybenzophenone and hexamethylphosphoramide into the prepared silver nanowire ink respectively or in a mixing manner, placing the mixture into a shaking table, and oscillating for 40min to finish ink preparation.
(5) And preparing the UV irradiation resistant silver nanowire transparent conductive film. And (3) scraping the UV-irradiation-resistant silver nanowire ink on a PET substrate by using an automatic coating machine, and drying in an oven at 70 ℃ for 5 min. And cutting the silver nanowire transparent conductive film into small blocks of 2 x 2cm, spin-coating an OC layer at the rotation speed of 750rpm for 30s, drying in an oven at 130 ℃ for 5min, controlling the power of a UV lamp to be 85%, and curing for 30s to obtain the UV-irradiation-resistant silver nanowire transparent conductive film.
The compositions of the silver nanowire inks of examples 6-11 and the comparison of the UV resistance of the transparent conductive film are detailed in Table 2.
Examples 6 to 11 were obtained by comparing the photoelectric properties of silver nanowire transparent conductive films prepared by adding different types of UV-resistant additives before and after 240h of UV irradiation, and the silver nanowire transparent conductive films prepared within the above-mentioned ranges of conditions of the present invention all showed good UV irradiation resistance, and satisfied UV resistance requirements. Wherein the anti-UV additive shows the most excellent anti-UV performance on the basis of the silver nanowire ink formula when being mixed and added.
Table 2 comparison of UV resistance of silver nanowire ink compositions and transparent conductive films of examples 6-11
Examples 12 to 17
The UV irradiation resistant silver nanowire ink comprises the following components in percentage by mass:
wherein: the diameter of the used nano silver wire is 13-40nm, and the wire length is 10-50 um; the thickener is hydroxypropyl methylcellulose HPMC; the dispersant is Sago-9760; the leveling agent is propylene glycol; the surfactant is polyvinylpyrrolidone K30; the anti-UV additive is 2, 4-dihydroxy benzophenone, tris (1, 2, 2, 6, 6-pentamethylpiperidinyl) phosphite ester and benzoin; the solvent is a mixed solution of deionized water and ethanol.
The preparation method of the UV irradiation resistant silver nanowire transparent film comprises the following steps:
(1) and preparing silver nanowire dispersion liquid. Centrifugally cleaning the silver nanowire primary pulp for 10min three times at a rotating speed of 5500 rpm; the silver nanowires were then dispersed in a 1% PVP solution.
(2) And (4) quantifying. 5mL of silver nanowire dispersion liquid is taken, centrifugally washed by ethanol, dried and weighed, and the concentration of the silver nanowires is calculated.
(3) And preparing the silver nanowire ink. And centrifuging the silver nanowire dispersion liquid at the rotating speed of 5500rpm for 10min, dispersing the silver nanowire dispersion liquid by using a 2% thickening agent solution to prepare a silver nanowire solution with the mass fraction of 1%, and placing the silver nanowire solution into a shaking table to oscillate for 40 min. Respectively adding a certain amount of dispersant, flatting agent and surfactant, and oscillating on a shaking table for 40min after each addition.
(4) Adding anti-UV additive. Adding anti-UV additives such as 2, 4-dihydroxybenzophenone, tris (1, 2, 2, 6, 6-pentamethylpiperidinyl) phosphite ester and benzoin into the prepared silver nanowire ink respectively or in a mixing manner, placing the mixture into a shaking table, and oscillating for 40min to finish ink preparation.
(5) And preparing the UV irradiation resistant silver nanowire transparent conductive film. And (3) scraping the UV-irradiation-resistant silver nanowire ink on a PET substrate by using an automatic coating machine, and drying in an oven at 70 ℃ for 5 min. And cutting the silver nanowire transparent conductive film into small blocks of 2 x 2cm, spin-coating an OC layer at the rotation speed of 1000rpm for 15s, drying in an oven at 130 ℃ for 5min, controlling the power of a UV lamp to be 50%, and curing for 3min to obtain the UV-irradiation-resistant silver nanowire transparent conductive film.
The compositions of the silver nanowire inks of examples 12-17 and the comparison of the UV resistance of the transparent conductive film are detailed in Table 3.
Examples 12 to 17 were obtained by comparing the photoelectric properties of silver nanowire transparent conductive films prepared by adding different types of UV-resistant additives before and after 240h of UV irradiation, and the silver nanowire transparent conductive films prepared within the above-mentioned ranges of conditions of the present invention all showed good UV irradiation resistance, and satisfied UV resistance requirements. The anti-UV additive tris (1, 2, 2, 6, 6-pentamethylpiperidinyl) phosphite ester shows the most excellent anti-UV performance on the basis of the silver nanowire ink formula.
Table 3 comparison of UV resistance of silver nanowire ink compositions and transparent conductive films of examples 12-17
Examples 18 to 22
The UV irradiation resistant silver nanowire ink comprises the following components in percentage by mass:
wherein: the diameter of the used nano silver wire is 13-40nm, and the wire length is 10-50 um; the thickener is hydroxypropyl methylcellulose HPMC; the dispersant used is Sago-3223; the flatting agent is diacetone alcohol; the surfactant is polyvinylpyrrolidone K90; the anti-UV additive is 2-hydroxy-4-n-octoxybenzophenone and benzoin dimethyl ether; the solvent is a mixed solution of deionized water and ethanol.
The preparation method of the UV irradiation resistant silver nanowire transparent film comprises the following steps:
(1) and preparing silver nanowire dispersion liquid. Centrifugally cleaning the silver nanowire primary pulp for 10min three times at a rotating speed of 5500 rpm; the silver nanowires were then dispersed in a 1% PVP solution.
(2) And (4) quantifying. 5mL of silver nanowire dispersion liquid is taken, centrifugally washed by ethanol, dried and weighed, and the concentration of the silver nanowires is calculated.
(3) And preparing the silver nanowire ink. And centrifuging the silver nanowire dispersion liquid at the rotating speed of 5500rpm for 10min, dispersing the silver nanowire dispersion liquid by using 1% of thickening agent solution to prepare silver nanowire solution with the mass fraction of 0.1%, and placing the silver nanowire solution into a shaking table to oscillate for 40 min. Respectively adding a certain amount of dispersant, flatting agent and surfactant, and oscillating on a shaking table for 40min after each addition.
(4) Adding anti-UV additive. Adding UV resistant additives 2-hydroxy-4-n-octoxy benzophenone and benzoin dimethyl ether into the prepared silver nanowire ink respectively or in a mixing manner, placing the mixture into a shaking table, and oscillating for 40min to finish ink preparation.
(5) And preparing the UV irradiation resistant silver nanowire transparent conductive film. And (3) scraping the UV-irradiation-resistant silver nanowire ink on a PET substrate by using an automatic coating machine, and drying in an oven at 70 ℃ for 5 min. And cutting the silver nanowire transparent conductive film into 2 x 2cm small blocks, spin-coating an OC layer at the rotation speed of 600rpm for 20s, drying in an oven at 130 ℃ for 5min, controlling the power of a UV lamp to be 70%, and curing for 1.5min to obtain the UV-irradiation-resistant silver nanowire transparent conductive film.
The compositions of the silver nanowire inks of examples 18-22 and the UV resistance of the transparent conductive film are compared in Table 4.
Examples 18 to 22 were obtained by comparing the photoelectric properties of silver nanowire transparent conductive films prepared by adding different types of UV-resistant additives before and after 240h of UV irradiation, and the silver nanowire transparent conductive films prepared within the above ranges all showed good UV irradiation resistance, and satisfied the UV resistance requirements. The anti-UV additive benzoin dimethyl ether shows the most excellent anti-UV performance on the basis of the silver line ink formula.
Table 4 comparison of UV resistance of silver nanowire ink compositions and transparent conductive films of examples 18-22
Examples 23 to 27
The UV irradiation resistant silver nanowire ink comprises the following components in percentage by mass:
wherein: the diameter of the used nano silver wire is 13-40nm, and the wire length is 10-50 um; the thickener is hydroxypropyl methylcellulose HPMC; the dispersant used is Sago-9006; the leveling agent is propylene glycol; the surfactant is polyvinylpyrrolidone 36W; the anti-UV additive is 2, 4-dihydroxy benzophenone or hexamethylphosphoramide; the solvent is a mixed solution of deionized water and ethanol.
The preparation method of the UV irradiation resistant silver nanowire transparent film comprises the following steps:
(1) and preparing silver nanowire dispersion liquid. Centrifugally cleaning the silver nanowire primary pulp for 10min three times at a rotating speed of 5500 rpm; the silver nanowires were then dispersed in a 1% PVP solution.
(2) And (4) quantifying. 5mL of silver nanowire dispersion liquid is taken, centrifugally washed by ethanol, dried and weighed, and the concentration of the silver nanowires is calculated.
(3) And preparing the silver nanowire ink. And centrifuging the silver nanowire dispersion liquid at the rotating speed of 5500rpm for 10min, dispersing the silver nanowire dispersion liquid by using 1% of thickening agent solution to prepare silver nanowire solution with the mass fraction of 0.1%, and placing the silver nanowire solution into a shaking table to oscillate for 40 min. Respectively adding a certain amount of dispersant, flatting agent and surfactant, and oscillating on a shaking table for 40min after each addition.
(4) Adding anti-UV additive. And respectively or mixedly adding anti-UV additives such as 2, 4-dihydroxy benzophenone and hexamethylphosphoramide into the prepared silver nanowire ink, placing the mixture into a shaking table, and oscillating for 40min to finish ink preparation.
(5) And preparing the UV irradiation resistant silver nanowire transparent conductive film. And (3) scraping the UV-irradiation-resistant silver nanowire ink on a PET substrate by using an automatic coating machine, and drying in an oven at 70 ℃ for 5 min. And cutting the silver nanowire transparent conductive film into 2 x 2cm small blocks, spin-coating an OC layer at the rotation speed of 600rpm for 20s, drying in an oven at 130 ℃ for 5min, controlling the power of a UV lamp to be 70%, and curing for 1.5min to obtain the UV-irradiation-resistant silver nanowire transparent conductive film.
The compositions of the silver nanowire inks of examples 23-27 and the UV resistance of the transparent conductive film are compared in Table 5.
Examples 23 to 27 were obtained by comparing the photoelectric properties of silver nanowire transparent conductive films prepared by adding different types of UV-resistant additives before and after 240h of UV irradiation, and the silver nanowire transparent conductive films prepared within the above ranges all showed good UV irradiation resistance, and satisfied the UV resistance requirements. The anti-UV additive 2, 4-dihydroxy benzophenone shows the most excellent anti-UV performance on the basis of the silver wire ink formula.
Table 5 comparison of UV resistance of silver nanowire ink compositions and transparent conductive films of examples 23-27
Aiming at the problems of decomposition and silver migration of silver nanowires due to strong light absorption of the silver nanowires in an ultraviolet waveband, the invention develops the UV-irradiation-resistant silver nanowire transparent conductive film, and the UV-irradiation-resistant silver nanowire transparent conductive film can strongly absorb ultraviolet rays in a UVA waveband by adding the UV-resistant additive into the silver nanowire ink, protect the silver nanowires, prevent the silver nanowires from being deteriorated to cause failure of the transparent conductive film, has obvious effect and promotes industrial application of the silver nanowires.
Claims (5)
1. The preparation method of the UV irradiation resistant silver nanowire ink is characterized by comprising the following steps:
(1) preparing a silver nanowire dispersion liquid: dispersing silver nanowires in a polyvinylpyrrolidone solution;
(2) preparing silver nanowire ink: centrifuging the silver nanowire dispersion liquid, dispersing the silver nanowires by using a thickening agent solution, putting the silver nanowires into a shaking table for oscillation, then respectively adding a dispersing agent, a leveling agent and a surfactant, finally adding an anti-UV additive, and oscillating on the shaking table after each addition to obtain silver nanowire ink;
the UV-irradiation-resistant silver nanowire ink comprises the following components in percentage by mass:
the thickener is one of hydroxypropyl methylcellulose and methyl hydroxypropyl cellulose;
the anti-UV additive is at least one of 2- (2 '-hydroxy-5' -methylphenyl) benzotriazole, 2- (2-hydroxy-3 ', 5' -di-tert-phenyl) -5-chlorobenzotriazole, 2-hydroxy-4-methoxybenzophenone, 2, 4-dihydroxybenzophenone, 2-hydroxy-4-n-octoxybenzophenone, phenyl o-hydroxybenzoate, hexamethylphosphoramide, 4-benzoyloxy-2, 2, 6, 6-tetramethylpiperidine, tris (1, 2, 2, 6, 6-pentamethylpiperidinyl) phosphite, benzoin, and benzoin dimethyl ether;
the dispersant is one of Sago-3636, Sago-3223, Sago-9006 and Sago-9760;
the flatting agent is one of ethanolamine, propylene glycol methyl ether, propylene glycol and diacetone alcohol;
the surfactant is polyvinylpyrrolidone, and the molecular weight is 55000-1300000; the solvent is a mixed solution of water and ethanol.
2. The UV radiation resistant silver nanowire ink obtained by the formulation method of claim 1.
3. The UV radiation resistant silver nanowire ink according to claim 2, wherein the silver nanowires have a wire diameter of 13 to 40nm and a wire length of 10 to 50 um.
4. The silver nanowire transparent conductive film prepared by using the UV irradiation resistant silver nanowire ink of any one of claims 2 to 3.
5. The method for preparing a silver nanowire transparent conductive film according to claim 4, wherein the silver nanowire ink resistant to UV irradiation is knife-coated on a PET substrate, dried, formed into a film on the PET substrate, spin-coated with an OC layer on the film, then dried, and cured under irradiation of a UV lamp to obtain the silver nanowire transparent conductive film resistant to UV irradiation.
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| CN102942832A (en) * | 2012-12-11 | 2013-02-27 | 青岛大学 | Preparation method of block macromolecule-nanometer metallic-film composite conductive material |
| CN104927412A (en) * | 2015-05-22 | 2015-09-23 | 东莞市纳利光学材料有限公司 | Blue-ray-resistant conductive thin film and preparation method thereof |
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