CN110346869A - A kind of production method of the optical waveguide isolator based on femtosecond laser photoetching technique - Google Patents
A kind of production method of the optical waveguide isolator based on femtosecond laser photoetching technique Download PDFInfo
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- CN110346869A CN110346869A CN201910502612.3A CN201910502612A CN110346869A CN 110346869 A CN110346869 A CN 110346869A CN 201910502612 A CN201910502612 A CN 201910502612A CN 110346869 A CN110346869 A CN 110346869A
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- glass block
- optical waveguide
- magnetic rotation
- magnetic
- femtosecond laser
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/12004—Combinations of two or more optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/09—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on magneto-optical elements, e.g. exhibiting Faraday effect
- G02F1/095—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on magneto-optical elements, e.g. exhibiting Faraday effect in an optical waveguide structure
- G02F1/0955—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on magneto-optical elements, e.g. exhibiting Faraday effect in an optical waveguide structure used as non-reciprocal devices, e.g. optical isolators, circulators
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
Abstract
The invention discloses a kind of production methods of optical waveguide isolator based on femtosecond laser photoetching technique, comprising the following steps: S1, six sides of the magnetic rotation glass block of cuboid are polished, it is spare；S2, magnetic rotation glass block is placed in femtosecond laser lithography system, magnetic rotation glass block is processed, optical waveguide to be written along its length in magnetic rotation glass block；S3, the detection device for building optically-active characteristic for measuring waveguide in magnetic rotation glass；S4, the both ends of the length direction of the magnetic rotation glass block handled in step S2 are polished, so that the optical waveguide in magnetic rotation glass block runs through magnetic rotation glass block, and the polarizer and rotation analyzer is respectively set in the two sides of the optical waveguide in magnetic rotation glass block, the polarizer and rotation analyzer of magnetic rotation glass block and its two sides constitute optical waveguide isolator.The present invention provides a kind of method for making optical waveguide isolator.
Description
Technical field
The present invention relates to the processing method fields of optical waveguide isolator.It is more particularly related to a kind of based on winged
The production method of the optical waveguide isolator of second Laser lithography.
Background technique
Femtosecond laser is a kind of ultra-short pulse laser that peak power is high, is led in optical storage, optic communication, Precision Machining etc.
There is huge application value in domain, in recent years, causes the great interest of people using femtosecond laser processing transparent dielectric material.When
Femtosecond laser is focused onto transparent medium, and after reaching certain threshold value, multi-photon can be generated in the finite region of near focal point
The effects such as ionization, avalanche ionization, this local energy deposition can generate structure and refractive index forever inside dielectric material
Change long, using this mechanism, complicated three-dimensional photon structure, such as waveguide, grating, waveguide coupler, beam splitting can be made
Device, waveguide polarizer and waveguide laser etc..In short, femtosecond laser direct write photon structure is to realize High Density Integration photon core
Piece provides a kind of effective means.
Magnetic rotation glass is also faraday (Faraday) rotation glass, is a kind of emerging functional material, due to itself
Faraday effect, has been widely used in magnetic-optic devices.In addition to this, since it is in visible light and near infrared band
Transmissivity is higher, and magnetic rotation glass is also widely used in high power laser output control.Therefore, it is made in magnetic rotation optical medium
Make the hot spot that three-dimensional photon structure also becomes photonic device manufacture, before integrated optics field has important application
Scape.
Summary of the invention
The object of the present invention is to provide a kind of methods for making optical waveguide isolator.
In order to realize these purposes and other advantages according to the present invention, provide a kind of based on femtosecond laser photoetching technique
Optical waveguide isolator production method, comprising the following steps:
S1, six sides of the magnetic rotation glass block of cuboid are polished, it is spare；
S2, the obtained magnetic rotation glass block of the step S1 is placed in femtosecond laser lithography system, to the magnetic rotation
Glass blocks is processed, specifically, optical waveguide is written along its length in the magnetic rotation glass block；
S3, the detection device for building optically-active characteristic for measuring waveguide in magnetic rotation glass, the detection device include
Laser body, the polarizer, the first microcobjective, waveguide, the second micro- object set gradually along longitudinal direction and from front to back
Then mirror, rotation analyzer and detector are applying the magnetic field that magnetic field strength is A in the waveguide region along longitudinal direction, are applying
Add the reading for rotating analyzer before and after magnetic field to remain zero, obtains the angle for applying the magnetic field front and back rotation analyzer
Spend poor Δ θ；
S4, the both ends of the length direction of the magnetic rotation glass block handled in the step S2 are polished, so that institute
It states the optical waveguide in magnetic rotation glass block and runs through the magnetic rotation glass block, and two of the optical waveguide in the magnetic rotation glass block
The polarizer and rotation analyzer is respectively set in side, and the angle between the polarizer and rotation analyzer is 45 °, in the magnetic
Rotation glass block region applies magnetic field strengthMagnetic field, the polarizer of the magnetic rotation glass block and its two sides and
It rotates analyzer and constitutes the optical waveguide isolator.
Preferably, in a kind of production method of optical waveguide isolator based on femtosecond laser photoetching technique, institute
It states in step S2 and the obtained magnetic rotation glass block of the step S1 is placed in femtosecond laser lithography system, and in femtosecond laser
Write power is 3mW, and writing speed is 40 μm/s, longitudinal to be written under conditions of waveguide length is 1mm to the magnetic rotation glass
Block is processed.
Preferably, in a kind of production method of optical waveguide isolator based on femtosecond laser photoetching technique, institute
The wavelength for stating the laser that laser body issues in step S2 is 980nm.
Preferably, in a kind of production method of optical waveguide isolator based on femtosecond laser photoetching technique, institute
Stating the first microcobjective in step S3 is 10 × microcobjective.
Preferably, in a kind of production method of optical waveguide isolator based on femtosecond laser photoetching technique, institute
Stating the second microcobjective in step S3 is 10 × microcobjective.
The production method of optical waveguide isolator based on femtosecond laser photoetching technique of the invention is to realize High Density Integration
Photon chip provides a kind of effective means, and the optoisolator of this method production more minimizes, and has reached the size of waveguide
Rank can effectively be isolated the interference light of backpropagation in optical path.
Further advantage, target and feature of the invention will be partially reflected by the following instructions, and part will also be by this
The research and practice of invention and be understood by the person skilled in the art.
Detailed description of the invention
Fig. 1 is the PCM figure of waveguide in S1 of the present invention；
Fig. 2 is 980nm laser mould field figure in S1 of the present invention；
Fig. 3 is the refractive index profile of waveguide cross-section in S1 of the present invention；
Fig. 4 is the structural schematic diagram of detection device of the present invention；
Fig. 5 is the structural schematic diagram of optical waveguide isolator of the present invention.
Specific embodiment
Present invention will be described in further detail below with reference to the accompanying drawings, to enable those skilled in the art referring to specification text
Word can be implemented accordingly.
It should be noted that in the description of the present invention, term " transverse direction ", " longitudinal direction ", "upper", "lower", "front", "rear",
The orientation or positional relationship of the instructions such as "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outside" is based on attached drawing institute
The orientation or positional relationship shown, is merely for convenience of description of the present invention and simplification of the description, and is not the dress of indication or suggestion meaning
It sets or element must have a particular orientation, be constructed and operated in a specific orientation, therefore should not be understood as to limit of the invention
System.
As Figure 1-Figure 5, the embodiment of the present invention provides a kind of optical waveguide isolation based on femtosecond laser photoetching technique
The production method of device, comprising the following steps:
S1, six sides of the magnetic rotation glass block 1 of cuboid are polished, it is spare；
S2, the obtained magnetic rotation glass block 1 of the step S1 is placed in femtosecond laser lithography system, laser body
The wavelength of 3 laser issued is 980nm, and is 3mW in the write power of femtosecond laser, and writing speed is 40 μm/s, is longitudinally write
Enter under conditions of 6 length of waveguide is 1mm and the magnetic rotation glass block 1 is processed, specifically, in the magnetic rotation glass block
Optical waveguide is written in 1 along its length；
S3, as shown in figure 4, building the detection device of the optically-active characteristic for measuring waveguide 6 in magnetic rotation glass, the inspection
Surveying device includes the laser body 3 set gradually along longitudinal direction and from front to back, the polarizer 4, the first microcobjective 5, wave
The 6, second microcobjective 7, rotation analyzer 8 and detector 2 are led, wherein the first microcobjective 5 and the second microcobjective 7 are 10
Then × microcobjective is applying the magnetic field that magnetic field strength is A in 6 region of waveguide along longitudinal direction, apply institute before and after magnetic field
The reading for stating rotation analyzer 8 remains zero, obtains the differential seat angle Δ θ for applying the magnetic field front and back rotation analyzer 8；
S4, the both ends of the length direction of the magnetic rotation glass block 1 handled in the step S2 are polished, so that institute
The optical waveguide in magnetic rotation glass block 1 is stated through the magnetic rotation glass block 1, and in the optical waveguide of the magnetic rotation glass block 1
Two sides be respectively set the polarizer 4 and rotation analyzer 8, as shown in figure 5, and the polarizer 4 and rotation analyzer 8 between
Angle is 45 °, applies magnetic field strength in 1 region of magnetic rotation glass block and isMagnetic field, the magnetic rotation glass
Block 1 and its polarizer of two sides 4 and rotation analyzer 8 constitute the optical waveguide isolator.
In above-mentioned technical proposal, femtosecond laser lithography system uses the prior art, and Authorization Notice No. is
The utility model of CN205074681U discloses a kind of multipurpose lithography system based on femto-second laser, and using in this programme should
Lithography system；The write power that femtosecond laser is adjusted in S2 is 3mW, and writing speed is 40 μm/s, and longitudinal write-in waveguide 6 is long
Degree is 1mm, and the side PCM figure of waveguide 6, laser mould field figure and cross section refractive index profile difference are as shown in Figure 1-Figure 3, can be with
Find out that waveguide 6 is guide-lighting well-behaved, 980nm laser mould field size is about 10 μm, and the variations in refractive index of 6 central area of waveguide is most
Greatly, the reason is that laser beam is in Gaussian Profile, the peak power of central area is maximum, and the unit time energy of accumulation is most, lures
The variations in refractive index led is bigger, maximum variations in refractive index △ n=4.5 × 10-4；Then by having built a set of detection device
Measure the optically-active characteristic of waveguide 6 in magnetic rotation glass, detection device includes swashing of setting gradually along longitudinal direction and from front to back
Light-transmitting means 3, the polarizer 4, the first microcobjective 5, waveguide 6, the second microcobjective 7, rotation analyzer 8 and detector 2, so
Apply the magnetic field that magnetic field strength is A in 6 region of waveguide along longitudinal direction afterwards, applies the rotation analyzer before and after magnetic field
8 reading remains zero, obtains the differential seat angle Δ θ for applying the magnetic field front and back rotation analyzer 8, such as along 6 side of waveguide
To the magnetic field that intensity is 0.25T is added, obtaining the angle for rotating analyzer 8 before and after applying magnetic field is 3.5 °, such laser
After the waveguide 6 added with magnetic field, 3.5 ° of rotation is had occurred in its polarization direction, and theoretically optically-active angle reaches in this way
At 45 °, magnetic field strength 3.2T, so as shown in figure 5, the polarizer 4 is respectively set in the two sides of the optical waveguide of magnetic rotation glass block 1
With rotation analyzer 8, the angle between the polarizer 4 and rotation analyzer 8 is 45 °, is applied in 1 region of magnetic rotation glass block
Magnetic field strength is the magnetic field of 3.2T, the polarizer 4 and rotation analyzer 8 of magnetic rotation glass block 1 and its two sides at optical waveguide every
From device.
Although the embodiments of the present invention have been disclosed as above, but its is not only in the description and the implementation listed
With it can be fully applied to various fields suitable for the present invention, for those skilled in the art, can be easily
Realize other modification, therefore without departing from the general concept defined in the claims and the equivalent scope, the present invention is simultaneously unlimited
In specific details and embodiment shown and described herein.
Claims (5)
1. a kind of production method of the optical waveguide isolator based on femtosecond laser photoetching technique, which is characterized in that including following step
It is rapid:
S1, six sides of the magnetic rotation glass block (1) of cuboid are polished, it is spare；
S2, the magnetic rotation glass block (1) for obtaining the step S1 are placed in femtosecond laser lithography system, to the magnetic rotation
Light glass blocks (1) is processed, specifically, optical waveguide is written along its length in the magnetic rotation glass block (1)；
S3, the detection device for building optically-active characteristic for measuring waveguide in magnetic rotation glass, the detection device includes equal edge
Laser body (3), the polarizer (4), the first microcobjective (5), waveguide (6), the longitudinal and set gradually from front to back
Two microcobjectives (7), rotation analyzer (8) and detector (2) are then applying in the waveguide (6) region along longitudinal direction
Magnetic field strength is the magnetic field of A, and the reading for rotating analyzer (8) remains zero before and after applying magnetic field, obtains applying magnetic
The differential seat angle Δ θ of rotation analyzer (8) before and after；
S4, the both ends of the length direction of the magnetic rotation glass block (1) handled in the step S2 are polished, so that described
Optical waveguide in magnetic rotation glass block (1) runs through the magnetic rotation glass block (1), and in the light of the magnetic rotation glass block (1)
The polarizer (4) and rotation analyzer (8) is respectively set in the two sides of waveguide, and between the polarizer (4) and rotation analyzer (8)
Angle be 45 °, magnetic rotation glass block (1) region apply magnetic field strength beMagnetic field, the magnetic rotation
The polarizer (4) and rotation analyzer (8) of glass blocks (1) and its two sides constitute the optical waveguide isolator.
2. a kind of production method of the optical waveguide isolator based on femtosecond laser photoetching technique as described in claim 1, special
Sign is, the magnetic rotation glass block (1) that the step S1 is obtained is placed in femtosecond laser lithography system in the step S2, and
It is 3mW in the write power of femtosecond laser, writing speed is 40 μm/s, and longitudinal waveguide (6) length that is written is right under conditions of 1mm
The magnetic rotation glass block (1) is processed.
3. a kind of production method of the optical waveguide isolator based on femtosecond laser photoetching technique as described in claim 1, special
Sign is that the wavelength for the laser that laser body (3) issues in the step S2 is 980nm.
4. a kind of production side of optical waveguide isolator based on femtosecond laser photoetching technique as described in any one of claims 1-3
Method, which is characterized in that the first microcobjective (5) is 10 × microcobjective in the step S3.
5. a kind of production side of optical waveguide isolator based on femtosecond laser photoetching technique as described in any one of claims 1-3
Method, which is characterized in that the second microcobjective (7) is 10 × microcobjective in the step S3.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112548323A (en) * | 2020-12-09 | 2021-03-26 | 吉林大学 | Method for improving coupling efficiency by femtosecond laser direct writing waveguide coupling region |
Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1039309A (en) * | 1988-07-04 | 1990-01-31 | 陶尚平 | Optical isolator of garnet mouocrystal mingled with in, bi, ca and v |
| US20040223719A1 (en) * | 2003-01-02 | 2004-11-11 | Ram Rajeev J. | Magnetically active semiconductor waveguides for optoelectronic integration |
| US20050089258A1 (en) * | 2003-10-23 | 2005-04-28 | Korea Institute Of Science And Technology | Integrated optical isolator |
| EP1925966A1 (en) * | 2006-11-27 | 2008-05-28 | Alcatel Lucent | Integrated optical isolator including a Bragg grating |
| CN102109687A (en) * | 2011-03-04 | 2011-06-29 | 北京交通大学 | Optical isolator and machining method thereof |
| CN102156356A (en) * | 2011-04-29 | 2011-08-17 | 中国科学院西安光学精密机械研究所 | Optical isolator and isolation method |
| US20130258468A1 (en) * | 2012-03-30 | 2013-10-03 | Fujitsu Limited | Optical transmitter, optical module, and optical connector |
| CN203931304U (en) * | 2014-06-02 | 2014-11-05 | 上海复旦天欣科教仪器有限公司 | A kind of comprehensive experimental device of measuring Faraday effect and magneto-optic modulation |
| CN105044934A (en) * | 2015-08-06 | 2015-11-11 | 深圳市创鑫激光股份有限公司 | Optical isolator, laser output head and laser equipment |
| CN105842883A (en) * | 2016-05-12 | 2016-08-10 | 深圳市芯思杰智慧传感技术有限公司 | Photoisolator |
| CN109459871A (en) * | 2018-12-24 | 2019-03-12 | 南京邮电大学 | A kind of isolator and preparation method thereof based on magneto-optic waveguide |
| CN109507813A (en) * | 2018-12-24 | 2019-03-22 | 南京邮电大学 | A kind of optoisolator and preparation method thereof based on ridge waveguide structure |
-
2019
- 2019-06-11 CN CN201910502612.3A patent/CN110346869A/en active Pending
Patent Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1039309A (en) * | 1988-07-04 | 1990-01-31 | 陶尚平 | Optical isolator of garnet mouocrystal mingled with in, bi, ca and v |
| US20040223719A1 (en) * | 2003-01-02 | 2004-11-11 | Ram Rajeev J. | Magnetically active semiconductor waveguides for optoelectronic integration |
| US20050089258A1 (en) * | 2003-10-23 | 2005-04-28 | Korea Institute Of Science And Technology | Integrated optical isolator |
| EP1925966A1 (en) * | 2006-11-27 | 2008-05-28 | Alcatel Lucent | Integrated optical isolator including a Bragg grating |
| CN102109687A (en) * | 2011-03-04 | 2011-06-29 | 北京交通大学 | Optical isolator and machining method thereof |
| CN102156356A (en) * | 2011-04-29 | 2011-08-17 | 中国科学院西安光学精密机械研究所 | Optical isolator and isolation method |
| US20130258468A1 (en) * | 2012-03-30 | 2013-10-03 | Fujitsu Limited | Optical transmitter, optical module, and optical connector |
| CN203931304U (en) * | 2014-06-02 | 2014-11-05 | 上海复旦天欣科教仪器有限公司 | A kind of comprehensive experimental device of measuring Faraday effect and magneto-optic modulation |
| CN105044934A (en) * | 2015-08-06 | 2015-11-11 | 深圳市创鑫激光股份有限公司 | Optical isolator, laser output head and laser equipment |
| CN105842883A (en) * | 2016-05-12 | 2016-08-10 | 深圳市芯思杰智慧传感技术有限公司 | Photoisolator |
| CN109459871A (en) * | 2018-12-24 | 2019-03-12 | 南京邮电大学 | A kind of isolator and preparation method thereof based on magneto-optic waveguide |
| CN109507813A (en) * | 2018-12-24 | 2019-03-22 | 南京邮电大学 | A kind of optoisolator and preparation method thereof based on ridge waveguide structure |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112548323A (en) * | 2020-12-09 | 2021-03-26 | 吉林大学 | Method for improving coupling efficiency by femtosecond laser direct writing waveguide coupling region |
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