CN110262134A - The manufacturing method and display device of alignment film - Google Patents
The manufacturing method and display device of alignment film Download PDFInfo
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- CN110262134A CN110262134A CN201910467769.7A CN201910467769A CN110262134A CN 110262134 A CN110262134 A CN 110262134A CN 201910467769 A CN201910467769 A CN 201910467769A CN 110262134 A CN110262134 A CN 110262134A
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- Prior art keywords
- alignment film
- orientation
- area
- alignment
- photosensitive layer
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
- G02F1/133723—Polyimide, polyamide-imide
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Abstract
This application discloses a kind of manufacturing method of alignment film and display devices.The manufacturing method of the alignment film includes: the alignment film to be formed and be covered on the display area of substrate and the surface of non-display area, and alignment film includes the first orientation area being covered on the display area of substrate and the second orientation area being covered on the non-display area of substrate；Multiple grooves are formed in the surface layer in the first orientation area at least to limit the orientation and arrangement of liquid crystal molecule；And the second orientation area is removed using photoetching process processing procedure, and retain the first orientation area, wherein multiple grooves are formed in the first orientation area and the second orientation area before photoetching process processing procedure, or are formed in the first orientation area after photoetching process processing procedure.The manufacturing method of the alignment film is after forming entire alignment film, using the alignment film on photoetching process processing procedure removal non-display area, to improve the precision of orientation film figure while eliminating tool figuratum APR plate.
Description
Technical field
The present invention relates to field of display technology, more particularly, to the manufacturing method and display device of a kind of alignment film.
Background technique
Liquid crystal display panel (Liquid Crystal Display, LCD) is put in the parallel glass substrate of two panels
Liquid crystal cell is set, thin film transistor (TFT) (Thin-Film Transistor, TFT) is set on lower baseplate glass, is set on upper substrate glass
Colored filter is set, is changed with voltage to control the rotation direction of liquid crystal molecule, to reach by the signal on thin film transistor (TFT)
Reach display purpose to whether controlling the outgoing of each pixel polarised light.
Liquid crystal display panel is needed at work to one initial orderly deflection angle of liquid crystal in liquid crystal cell, so
Alignment film can be coated on the inside of two glass substrates generally to do initial orientation to liquid crystal, the material of alignment film is, for example, polyamides Asia
Amine (Polyimide, PI).Since PI insulate, so in the outer pin (outer of the lower glass substrate with thin film transistor (TFT)
Lead bonding, OLB) in region, due to bonded integrated circuit (integrated circuit, IC), flexible circuit board
The region bonding (bonding) of (Flexible Printed Circuit, FPC) cannot have PI coating, it is therefore desirable to by the area
PI removal in domain.
Fig. 1 shows the schematic diagram of APR plate according to prior art, as shown in Figure 1, in the prior art, matching in coating
During film, using APR plate (the AsahiKASEI Photosensitive Resin with specific pattern (pattern)
Plate, APR Plate) 100 alignment film with formation with characteristic pattern.Since the product size of different machines production is different,
Need to be arranged according to product size the APR plate with different pattern, therefore different machine needs to buy APR editions specific, and APR
Plate somewhat expensive.Fig. 2 a to 2c respectively illustrates the sectional view in manufacturing method each stage of alignment film according to prior art,
As shown in Fig. 2 a to 2c, the manufacturing method of the alignment film of the prior art includes: to transfer to be formed in display base plate 110 using APR plate
Alignment film 120 with specific pattern, and to 120 precuring of alignment film；Alignment film 120 is solidified；To display base plate 110 into
Row friction (rubbing) orientation.During APR plate transfers to form the alignment film with specific pattern, due to stretching action
Meeting so that the pattern of alignment film easily deformation occurs, so that the orientation precision of liquid crystal will receive very big influence.Further, APR
The design of plate, so that display surface plate electrode in non-alignment technical process, is easily generated due to display caused by shaking
Defect (mura).Further, often there is PI residual at sealant (Seal), the adhesiveness of part PI liquid and sealant is bad,
It is easy to cause the sealant between array substrate and colored filter substrate to fall off (Seal peeling).
Therefore, it needs that the manufacturing method of the alignment film of the prior art is further improved, to solve the above problems.
Summary of the invention
In view of the above problems, the purpose of the present invention is to provide a kind of manufacturing method of alignment film and display devices, wherein
It is formed after entire alignment film, using the alignment film on photoetching process processing procedure removal non-display area, thus eliminating tool
While figuratum APR plate, the precision of orientation film figure is improved.
According to an aspect of the present invention, a kind of manufacturing method of alignment film is provided, comprising: form the display for being covered in substrate
Alignment film on region and the surface of non-display area, the alignment film include being covered on the display area of the substrate
The first orientation area and the second orientation area for being covered on the non-display area of the substrate；At least in first orientation
Multiple grooves are formed in the surface layer in area to limit the orientation and arrangement of liquid crystal molecule；And using described in the removal of photoetching process processing procedure
Second orientation area, and retain first orientation area, wherein the multiple groove be formed in photoetching process processing procedure before it is described
First orientation area and second orientation area, or it is formed in first orientation area after photoetching process processing procedure.
It preferably, the use of the method that photoetching process processing procedure removes second orientation area include: to be formed positioned at the orientation
Photosensitive layer on film；Photoetching is carried out to the photosensitive layer using the photolithography plate with predetermined pattern, in the photosensitive layer
Form opening corresponding with the non-display area；And second orientation area is removed using the opening.
Preferably, further includes: after removing second orientation area, the remaining photosensitive layer is removed, to expose
State the first orientation area.
It preferably, include: through described using having the step of photolithography plate of predetermined pattern carries out photoetching to the photosensitive layer
Photolithography plate is exposed processing to the photosensitive layer；And by it is described it is photosensitive be placed in developer solution, to form the opening.
It preferably, include: through described using having the step of photolithography plate of predetermined pattern carries out photoetching to the photosensitive layer
Photolithography plate is exposed processing to the photosensitive layer；And by it is described it is photosensitive be placed in developer solution, to form the opening.
Preferably, the material of the photosensitive layer is negative photoresist or positive photoetching rubber.
It preferably, include: to be opened using etching solution by described using the method in the opening removal second orientation area
The alignment film of mouth exposure is etched.
Preferably, the etching solution includes alkaline solution.
Preferably, the method that multiple grooves are formed in the surface layer of the alignment film includes alignment technique or non-photic
Allocating process, the non-alignment technique include at least one of gentle quarter allocating process of friction matching technique.
Preferably, the step of forming the alignment film includes: to be coated with alignment liquid in the entire upper surface of the substrate；And
Curing process is carried out to the alignment liquid to be covered on the display area and the surface of the non-display area to be formed
The alignment film.
According to another aspect of the present invention, a kind of display device is provided, including is matched made from manufacturing method as described above
To film, wherein the substrate includes array substrate and/or colored filter substrate, the array substrate and the colorized optical filtering
Liquid crystal molecule is provided between plate base.
The manufacturing method and display device of alignment film provided by the invention, form on substrate after entire alignment film,
Photoetching treatment is carried out to form the figuratum alignment film of tool to alignment film, thus while eliminating tool figuratum APR plate,
Improve the pattern accuracy of alignment film.
Further, the manufacturing method and display device of the alignment film, to alignment film after forming entire alignment film
Orientation processing is carried out, compared with carrying out orientation processing to alignment film after forming the figuratum alignment film of tool, can be effectively reduced
By the display defect for the display panel that vibration generates, the pattern accuracy of alignment film is further improved.
Further, the manufacturing method and display device of the alignment film is exposed photosensitive layer using photolithography plate, shows
Shadow, then alignment film is etched, the pattern accuracy of alignment film can be controlled in several microns of precision, it is ensured that under sealant
There is no PI coating, the envelope caused by preventing due to sealant and PI adhesiveness are insufficient between array substrate and colored filter substrate
The problem of frame glue falls off.
Detailed description of the invention
By referring to the drawings to the description of the embodiment of the present invention, above-mentioned and other purposes of the invention, feature and
Advantage will be apparent from, in the accompanying drawings:
Fig. 1 shows the schematic diagram of APR plate according to prior art；
Fig. 2 a to 2c respectively illustrates the sectional view in manufacturing method each stage of alignment film according to prior art；
Fig. 3 shows the schematic diagram of full coat cloth APR plate according to an embodiment of the present invention；
Fig. 4 shows the schematic diagram of photolithography plate according to an embodiment of the present invention (mask)；
Fig. 5 a to 5f respectively illustrates the sectional view in manufacturing method each stage of alignment film according to an embodiment of the present invention；
Fig. 6 shows the flow chart of the manufacturing method of alignment film according to a first embodiment of the present invention.
Fig. 7 shows the flow chart of the manufacturing method of alignment film according to a second embodiment of the present invention.
Reference signs list is as follows:
100 APR plates
110 display base plates
120 alignment films
200 full coat cloth APR plates
201 Ka Jiao
210 substrates
220 alignment liquids
221 alignment films
222 with alignment film backward
230 photosensitive layers
240 photolithography plates
Specific embodiment
The various embodiments that the present invention will be described in more detail that hereinafter reference will be made to the drawings.In various figures, identical element
It is indicated using same or similar appended drawing reference.For the sake of clarity, the various pieces in attached drawing are not necessarily to scale.
With reference to the accompanying drawings and examples, specific embodiments of the present invention will be described in further detail.
Fig. 3 shows the schematic diagram of full coat cloth APR plate according to an embodiment of the present invention, as shown in figure 3, in the embodiment
In, 200 surface of full coat cloth APR plate does not have pattern, to carry out whole face in substrate (can be array substrate or color membrane substrates)
Coating forms and is located at the alignment film that substrate surface forms whole face pattern-free.Full coat cloth APR plate 200 further includes at least one Ka Jiao
201, for marking the front and back sides and direction of full coat cloth APR plate 200, card angle 201, which is located at full coat cloth APR plate 200 and is used to form, matches
Region other than to film does not influence the formation of alignment film.
APR plate provided in this embodiment uses the design of full coat cloth, does not have pattern on APR plate, can be between different machines
The same APR plate is shared, so as to reduce process costs and improve production capacity.Further, it is being formed positioned at substrate surface shape
During alignment film at whole face pattern-free, compared with forming figuratum alignment film in the prior art, shake is greatly reduced
The generation of dynamic trace.
Fig. 4 shows the schematic diagram of photolithography plate according to an embodiment of the present invention, as shown in figure 4, photolithography plate 240 includes blocking
Region A1With de-occlusion region A2.Photolithography plate 240 is, for example, quartz plate, such as the occlusion area A in quartz plate1Surface covering hides
Obstructing material, due to quartzy light transmission, barrier material is opaque, so that being formed has occlusion area A1With de-occlusion region A2Photoetching
Plate 240.Barrier material is, for example, chromium (Cr) metal.
Substrate includes display area and non-display area, and non-display area includes for example including bond area, display area
Region in addition to non-display area.In this embodiment, the occlusion area A of photolithography plate 2401The non-display area of counterpart substrate
Domain, de-occlusion region A2The display area of counterpart substrate.In alternate embodiments, the occlusion area A of photolithography plate 2401Corresponding base
The display area of plate, de-occlusion region A2The non-display area of counterpart substrate.
Fig. 5 a to 5f respectively illustrates the sectional view in manufacturing method each stage of alignment film according to an embodiment of the present invention.
As shown in Figure 5 a, this method starts from forming the alignment liquid 220 with flat surface over the substrate 210.
Whole face coating is carried out to substrate 210 using alignment liquid and full coat cloth APR plate as shown in Figure 3, is had to be formed
The alignment liquid 220 of flat surface, alignment liquid are, for example, polyimides (PI).Whole face is carried out to substrate 210 using full coat cloth APR plate
Coating is formed after alignment liquid 220, needs to carry out alignment liquid 220 precuring (pre-cure) processing.Such as to alignment liquid 220
It is heated, so that 220 precuring of alignment liquid, heating temperature are, for example, 30 to 75 DEG C, heating time is, for example, 30 to 180s.Base
Plate 210 is for example including array substrate and/or colored filter substrate.
Further, curing process is carried out to alignment liquid 220, to form the orientation being covered on the surface of substrate 210
Film 221, as shown in Figure 5 b.
Photolithography plate includes occlusion area and de-occlusion region, and substrate 210 includes display area B1With non-display area B2.Match
It include the display area B for being covered in substrate 210 to film 2211On the first orientation area 221a and be covered in the non-aobvious of substrate 210
Show region B2On the second orientation area 221b.
In this step, such as to alignment liquid 220 it is further heated, so that the solvent composition in alignment liquid 220 is waved
Hair, to form the alignment film 221 being covered on the surface of substrate 210.Heating temperature is, for example, 45 to 230 DEG C, when heating
Between be, for example, 10 to 15min.It should be understood that the present invention is not limited to this, multiple independent curing schedules pair can be used
Alignment liquid 220 carries out curing process, to form the alignment film 221 being covered on the surface of substrate 210.
Further, orientation processing is carried out to alignment film 221, arranges the molecule on 221 surface layer of alignment film according to specific direction
Column, to be formed with alignment film 222 backward, as shown in Figure 5 c.
With alignment film 222 backward include with the first alignment film 222a backward and with the second alignment film 222b backward,
With backward the first alignment film 222a and with the second alignment film 222b backward respectively with the first orientation area 221a and the second orientation
Area 221b is corresponding, and the display area B of display base plate 210 is located at the first alignment film 222a backward1, the second 221b, orientation area
In the non-display area B of substrate 2102。
In this step, carrying out the alignment film processing procedure of orientation processing to alignment film 221 includes non-alignment technique and light
Cause orientation (photo alignment) technique.In this embodiment, for example, by using non-alignment technique in alignment film 221
Multiple grooves are formed in the surface layer of first orientation area 221a and the second orientation area 221b, the orientation of liquid crystal molecule and arrangement are multiple
Groove limits, and the surface layer of alignment film 221 is opposite with the surface of the covering of alignment film 221 over the substrate 210.Non- alignment technique example
It such as include the gentle quarter allocating process of friction matching technique.For example, orientation processing is carried out to alignment film 221 using friction matching method,
Using the surface of flannelette idler wheel friction matching film 221, so that the molecule on 221 surface layer of alignment film has optical anisotropy, thus shape
At with alignment film 222 backward.
It as described below, will be to alignment film 222 surface coating photosensitive layer backward and to photosensitive layer and with backward
Alignment film 222 is etched, and to retain the first orientation area 221a, removes the second orientation area 221b.The embodiment is in etching orientation
Orientation processing is carried out to alignment film 221 before film 222, advantageously reduces showing of generating when carrying out friction matching due to vibration
Show defect, product quality can be improved.
In alternate embodiments, can 221 surface of alignment film be coated with photosensitive layer and to photosensitive layer and alignment film 221 into
After row etching, orientation processing is carried out to the first orientation area 221a of alignment film 221, to be formed with the first alignment film backward
222a.For example, by using alignment process alignment film 221, be coated with photosensitive layer on 221 surface of alignment film and to photosensitive layer and
After alignment film 221 is etched, using ultraviolet light by the polarizing light irradiation alignment film 221 after polarizing film, to orientation
Film 221 carries out orientation processing.
Further, photosensitive layer 230 is being formed with 222 surface of alignment film backward, as fig 5d.
Photosensitive layer 230 uniformly, is entirely coated on on 222 surface of alignment film backward.Preferably, to photosensitive layer
230 carry out soft drying and processings, are easily polluted by the external foreign matters to avoid photosensitive layer 230, and improve photosensitive layer 230 with alignment film backward
Adhesion strength between 222.Photosensitive layer 230 is, for example, photoresist (photoresist, PR), and photoresist is divided into positive photoetching rubber and bears
Photoresist.Positive photoetching rubber can be retained by the part of illumination after development, and negative photoresist by photosensitive part after development
It can be retained.Photoresist is not only needed to specified light sensitive, it is also necessary to which retention properties is steady during etching later etc.
It is fixed.Different photoresists generally has different photosensitive property, some are photosensitive to all ultraviolet spectrograms, some are only to specific
Photoreception of spectrum, also some are photosensitive to X-ray or to electron beam.In this embodiment, photosensitive layer 230 is negative photoresist.
Further, photosensitive layer 230 is exposed, developed, to expose the table for matching the second alignment film 222b backward
Face, as depicted in fig. 5e.
Photosensitive layer 230 is selectively irradiated using the light of specific wavelength, to be exposed to photosensitive layer 230.?
In the embodiment, the surface of photosensitive layer 230 is covered on for example, by using photolithography plate as shown in Figure 4, using ultraviolet light by light
The photosensitive layer 230 of mechanical covering.After end exposure, by photosensitive layer 230, with backward alignment film 222 and substrate 210 be placed in it is aobvious
In shadow liquid, make the non-display area B of 230 counterpart substrate 210 of photosensitive layer2Be partially dissolved in developer solution, to expose orientation
The surface of the second alignment film 222b afterwards.
Photolithography plate includes occlusion area and de-occlusion region, and substrate 210 includes display area B1With non-display area B2.?
In the embodiment, the occlusion area of photolithography plate corresponds to non-display area B2, de-occlusion region display area B1.Photosensitive layer 230 is negative
Photoresist, photosensitive layer 230 can be retained after development by photosensitive part, therefore be located at display area B1Photosensitive layer 230
To retain.In alternate embodiments, the occlusion area of photolithography plate corresponds to display area B1, de-occlusion region corresponds to non-display area
Domain B2.Photosensitive layer 230 is positive photoetching rubber, and photosensitive layer 230 can be retained by the part of illumination after development, therefore is located at display
Region B1Photosensitive layer 230 retained.
Preferably, after photosensitive layer 230 is exposed, is developed, hard drying and processing, example are carried out to photosensitive layer 230
High-temperature process is such as used, to remove remaining solvent in photosensitive layer 230, enhancing photosensitive layer 230 is to 222 table of alignment film backward
The adhesive force in face, while improving corrosion stability ability of the photoresist in subsequent etching process.In addition, photosensitive layer 230 will under high temperature
Softening forms the molten condition of quasi-vitreous at high temperature, this can make 230 surface of photosensitive layer round and smooth under surface tension effects
Change, and the defects of make photosensitive layer 230 and reduce, the edge contour of 230 figure of photosensitive layer can be corrected.
Further, it is etched to alignment film 222 backward, to expose the non-display area of substrate 210
Surface, as shown in figure 5f.
It is etched using etching solution to alignment film 222 backward, so that with the second alignment film 222b backward
It is removed, display area is corresponding to be retained with the first alignment film 222a backward.In this embodiment, etching solution is alkalinity
Solution, alkaline solution is for example including water, hydramine and alkali metal hydroxide, for example, sodium hydroxide (NaOH) and/or secondary chlorine
Sour sodium (NaClO).
After to being etched with alignment film 222 backward, photosensitive layer 230 is removed.Remove the side of photosensitive layer 230
Method includes that wet process removes photoresist and removes photoresist with dry method, and wet process removes photoresist to remove photoresist for example including organic solvent and remove photoresist with inorganic solvent, and dry method is removed photoresist
Photosensitive layer 230 is removed for example, by using plasma.
Fig. 6 shows the flow chart of the manufacturing method of alignment film according to a first embodiment of the present invention.
In step sl, the alignment film being covered on display area and the surface of non-display area is formed.
In this step, alignment liquid is coated in the entire upper surface of substrate.Existed using full coat cloth APR plate as shown in Figure 3
The entire upper surface of substrate is coated with alignment liquid, and alignment liquid is, for example, polyimides (PI).In the entire upper surface of substrate, coating is matched
To after liquid, need to carry out alignment liquid precuring (pre-cure) processing.Such as alignment liquid is heated, so that alignment liquid
Precuring, heating temperature are, for example, 30 to 75 DEG C, and heating time is, for example, 30 to 180s.
Further, to alignment liquid carry out curing process with formed be covered on display area and non-display area surface it
On alignment film.Such as alignment liquid is further heated, so that the solvent composition in alignment liquid volatilizees, to form covering
Alignment film on the surface of the substrate.Heating temperature is, for example, 45 to 230 DEG C, and heating time is, for example, 10 to 15min.It should
Understand, the present invention is not limited to this, curing process can be carried out to alignment liquid using multiple independent curing schedules, with shape
At the alignment film on covering on the surface of the substrate.
In step s 2, multiple grooves are formed in the surface layer of alignment film to limit the orientation and arrangement of liquid crystal molecule.
In this step, multiple ditches are formed in the surface layer of alignment film before the alignment film on removal non-display area
Slot, the orientation of liquid crystal molecule and arrangement are limited by multiple grooves, and the surface layer of alignment film and alignment film are covered on the surface on substrate
Relatively.The method that multiple grooves are formed in the surface layer of alignment film includes alignment technique or non-alignment technique, non-light
Cause allocating process for example including the gentle quarter allocating process of friction matching technique.For example, being carried out using friction matching method to alignment film
Orientation processing, using the surface of flannelette idler wheel friction matching film, so that the molecule on alignment film surface layer has optical anisotropy, thus
It is formed with alignment film backward.
Preferably, in this step, multiple grooves are formed in the surface layer of alignment film using non-alignment technique, that is, existed
Photoetching process carries out orientation processing to alignment film before processing procedure, advantageously reduces and is produced when carrying out friction matching due to vibration
Raw display defect, can be improved product quality.
In step s3, using the alignment film on photoetching process processing procedure removal non-display area.
In this step, the photosensitive layer being located on alignment film is formed.By photosensitive layer uniformly, be entirely coated on alignment film
On surface.Preferably, soft drying and processing is carried out to photosensitive layer, is easily polluted by the external foreign matters to avoid photosensitive layer, and improve photosensitive layer and match
To the adhesion strength between film.Photosensitive layer is, for example, photoresist, and photoresist includes positive photoetching rubber or negative photoresist.
Further, opening corresponding with non-display area is formed in the photo layer.For example, using having predetermined pattern
Photolithography plate carries out photoetching to photosensitive layer, to form opening corresponding with non-display area in the photo layer.Figure is preset using having
The step of photolithography plate of case carries out photoetching to photosensitive layer includes: to be exposed processing to photosensitive layer through photolithography plate；And it will be photosensitive
It is placed in developer solution, to form opening.Substrate includes display area and non-display area, and correspondingly, photolithography plate has default
Pattern, for example, photolithography plate includes occlusion area and de-occlusion region.In this embodiment, the occlusion area of photolithography plate corresponds to non-
Display area, de-occlusion region correspond to display area.Photosensitive layer is negative photoresist, and photosensitive layer after development can by photosensitive part
It is retained, therefore the photosensitive layer for being located at display area is retained.
Further, the alignment film being located at using opening removal on non-display area.Using etching solution to being exposed by the opening
Alignment film be etched so that non-display area corresponding alignment film removal, the corresponding alignment film in display area are able to
Retain.In this embodiment, etching solution is alkaline solution, alkaline solution for example including water, hydramine and alkali metal hydroxide,
For example, sodium hydroxide (NaOH) and/or sodium hypochlorite (NaClO).Preferably, it is located at the orientation on non-display area in removal
After film, remaining photosensitive layer is removed, the alignment film on display area is located at exposure.The method for removing photosensitive layer includes wet process
Remove photoresist and remove photoresist with dry method, wet process removes photoresist to remove photoresist for example including organic solvent and remove photoresist with inorganic solvent, dry method remove photoresist for example, by using etc.
Gas ions remove photosensitive layer.
Fig. 7 shows the flow chart of the manufacturing method of alignment film according to a second embodiment of the present invention.
In step sl, the alignment film being covered on display area and the surface of non-display area is formed.Alignment film packet
It includes the first orientation area being covered on the display area of substrate and second be covered on the non-display area of substrate is matched
To area.
In this step, alignment liquid is coated in the entire upper surface of substrate.Existed using full coat cloth APR plate as shown in Figure 3
The entire upper surface of substrate is coated with alignment liquid, and alignment liquid is, for example, polyimides (PI).In the entire upper surface of substrate, coating is matched
To after liquid, need to carry out alignment liquid precuring (pre-cure) processing.Such as alignment liquid is heated, so that alignment liquid
Precuring, heating temperature are, for example, 30 to 75 DEG C, and heating time is, for example, 30 to 180s.
Further, to alignment liquid carry out curing process with formed be covered on display area and non-display area surface it
On alignment film.Such as alignment liquid is further heated, so that the solvent composition in alignment liquid volatilizees, to form covering
Alignment film on the surface of the substrate.Heating temperature is, for example, 45 to 230 DEG C, and heating time is, for example, 10 to 15min.It should
Understand, the present invention is not limited to this, curing process can be carried out to alignment liquid using multiple independent curing schedules, with shape
At the alignment film on covering on the surface of the substrate.
In step s 2, the second orientation area is removed using photoetching process processing procedure.
In this step, the photosensitive layer being located on alignment film is formed.By photosensitive layer uniformly, be entirely coated on alignment film
On surface.Preferably, soft drying and processing is carried out to photosensitive layer, is easily polluted by the external foreign matters to avoid photosensitive layer, and improve photosensitive layer and match
To the adhesion strength between film.Photosensitive layer is, for example, photoresist, and photoresist includes positive photoetching rubber or negative photoresist.
Further, opening corresponding with non-display area is formed in the photo layer.For example, using having predetermined pattern
Photolithography plate carries out photoetching to photosensitive layer, to form opening corresponding with non-display area in the photo layer.Figure is preset using having
The step of photolithography plate of case carries out photoetching to photosensitive layer includes: to be exposed processing to photosensitive layer through photolithography plate；And it will be photosensitive
It is placed in developer solution, to form opening.Substrate includes display area and non-display area, and correspondingly, photolithography plate has default
Pattern, for example, photolithography plate includes occlusion area and de-occlusion region.In this embodiment, the occlusion area of photolithography plate corresponds to non-
Display area, de-occlusion region correspond to display area.Photosensitive layer is negative photoresist, and photosensitive layer after development can by photosensitive part
It is retained, therefore the photosensitive layer for being located at display area is retained.
Further, it is located at the second orientation area using opening removal.Using etching solution to the alignment film being exposed by the opening into
Row etching process, so that the second orientation area removes, the first orientation area is retained.In this embodiment, etching solution is that alkalinity is molten
Liquid, alkaline solution is for example including water, hydramine and alkali metal hydroxide, for example, sodium hydroxide (NaOH) and/or hypochlorous acid
Sodium (NaClO).Preferably, after removing the second orientation area, remaining photosensitive layer is removed, with the first orientation area of exposure.Removal
The method of photosensitive layer includes that wet process removes photoresist and removes photoresist with dry method, and wet process is removed photoresist to remove photoresist for example including organic solvent and be gone with inorganic solvent
Glue, dry method, which is removed photoresist, removes photosensitive layer for example, by using plasma.
In step s3, multiple grooves are formed in the surface layer of alignment film to limit the orientation and arrangement of liquid crystal molecule, it is more
A groove is formed in the first orientation area after photoetching process processing procedure.
Multiple grooves, liquid crystal are formed in the surface layer of alignment film before or after removing the alignment film on non-display area
The orientation of molecule and arrangement are limited by multiple grooves, and it is opposite that the surface layer of alignment film with alignment film is covered on the surface on substrate.?
The method that multiple grooves are formed in the surface layer of alignment film includes alignment technique or non-alignment technique, non-alignment work
Skill is for example including the gentle quarter allocating process of friction matching technique.For example, orientation processing is carried out to alignment film using friction matching method,
Using the surface of flannelette idler wheel friction matching film, so that the molecule on alignment film surface layer has optical anisotropy, to form orientation
Alignment film afterwards.
It is as described above according to the embodiment of the present invention, these embodiments details all there is no detailed descriptionthe, also not
Limiting the invention is only the specific embodiment.Obviously, as described above, can make many modifications and variations.This explanation
These embodiments are chosen and specifically described to book, is principle and practical application in order to better explain the present invention, thus belonging to making
Technical field technical staff can be used using modification of the invention and on the basis of the present invention well.The present invention is only by right
The limitation of claim and its full scope and equivalent.
Claims (10)
1. a kind of manufacturing method of alignment film characterized by comprising
The alignment film being covered on the display area of substrate and the surface of non-display area is formed, the alignment film includes covering
The first orientation area on the display area of the substrate and second on the non-display area for being covered in the substrate
Orientation area；
Multiple grooves are formed in the surface layer in first orientation area at least to limit the orientation and arrangement of liquid crystal molecule；And
Second orientation area is removed using photoetching process processing procedure, and retains first orientation area,
Wherein, first orientation area and second orientation area before the multiple groove is formed in photoetching process processing procedure,
Or it is formed in first orientation area after photoetching process processing procedure.
2. the manufacturing method of alignment film according to claim 1, which is characterized in that using described in the removal of photoetching process processing procedure
The method in the second orientation area includes:
Form the photosensitive layer being located on the alignment film；
Using the photolithography plate with predetermined pattern to the photosensitive layer carry out photoetching, in the photosensitive layer formed with it is described non-
The corresponding opening in display area；And
Second orientation area is removed using the opening.
3. the manufacturing method of alignment film according to claim 2, which is characterized in that further include:
After removing second orientation area, the remaining photosensitive layer is removed, with exposure first orientation area.
4. the manufacturing method of alignment film according to claim 2, which is characterized in that utilize the photolithography plate with predetermined pattern
Include: to the step of photosensitive layer progress photoetching
Processing is exposed to the photosensitive layer through the photolithography plate；And
By it is described it is photosensitive be placed in developer solution, to form the opening.
5. the manufacturing method of alignment film according to claim 2, which is characterized in that the material of the photosensitive layer is negative photoetching
Glue or positive photoetching rubber.
6. the manufacturing method of alignment film according to claim 2, which is characterized in that utilize opening removal described second
The method in orientation area includes:
It is etched using etching solution to by the alignment film of the opening exposure.
7. according to right want 6 described in alignment film manufacturing method, which is characterized in that the etching solution includes alkaline solution.
8. the manufacturing method of alignment film according to claim 1, which is characterized in that formed in the surface layer of the alignment film
The method of multiple grooves includes alignment technique or non-alignment technique, and the non-alignment technique includes friction matching
At least one of gentle quarter allocating process of technique.
9. the manufacturing method of alignment film according to claim 1, which is characterized in that the step of forming alignment film packet
It includes:
Alignment liquid is coated in the entire upper surface of the substrate；And
To the alignment liquid carry out curing process with formed be covered on the display area and the non-display area surface it
On the alignment film.
10. a kind of display device, which is characterized in that including matching made from manufacturing method as described in any one of claim 1 to 9
To film,
Wherein, the substrate includes array substrate and colored filter substrate, the array substrate and the colorized optical filtering chip base
Liquid crystal molecule is provided between plate.
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Cited By (1)
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| CN111308792A (en) * | 2020-02-28 | 2020-06-19 | Tcl华星光电技术有限公司 | Liquid crystal panel and manufacturing method thereof |
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| CN105116620A (en) * | 2015-08-21 | 2015-12-02 | 昆山龙腾光电有限公司 | Friction alignment method for display substrate |
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Address after: 215301, 1, Longteng Road, Kunshan, Jiangsu, Suzhou Applicant after: Kunshan Longteng Au Optronics Co. Address before: 215301, 1, Longteng Road, Kunshan, Jiangsu, Suzhou Applicant before: INFOVISION OPTOELECTRONICS (KUNSHAN) Co.,Ltd. |
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Application publication date: 20190920 |