CN110244392A - A kind of asymmetry transmitter - Google Patents
A kind of asymmetry transmitter Download PDFInfo
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- CN110244392A CN110244392A CN201910698566.9A CN201910698566A CN110244392A CN 110244392 A CN110244392 A CN 110244392A CN 201910698566 A CN201910698566 A CN 201910698566A CN 110244392 A CN110244392 A CN 110244392A
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Abstract
The invention discloses a kind of asymmetric transmitters, it include: the first metal grating layer being cascading, metal layer, the second metal grating layer and dielectric substrate, the values of the structural parameters of first metal grating layer meets parameter preset condition, so that the light wave for being incident on the first metal grating layer surface is converted to surface plasma excimer；Metal layer stops successively to penetrate through dielectric substrate and the light wave of the second metal grating layer incidence, and the thickness of metal layer is less than penetration depth of the surface plasma excimer in the metal, so that the surface plasma excimer converted through the first metal grating layer surface enters the second metal grating layer；Second metal grating layer is embedded in dielectric substrate, it is different from the grating constant of the first metal grating layer, the values of the structural parameters of second metal grating layer is unsatisfactory for parameter preset condition, prevent the light wave for being incident on the second metal grating layer surface solves bulky defect present in asymmetric transmitter from being converted to surface plasma excimer.
Description
Technical field
The present invention relates to field of optical device technology more particularly to a kind of asymmetric transmitters.
Background technique
Asymmetric transmitter is a kind of optical passive component, it has indispensable role in optic communication, optical-fiber network, together
When can be used for controlling or cancelling noise, the light source in protection laser and unidirectional detection/unidirectional sensor-based system etc..Its function is
When light beam is from some direction incidence, allow to transmit；But when this Shu Guang is incident in opposite direction, transmissivity is very low.
The realization of asymmetric transmitter generally requires to break the domain symmetry of system, but current asymmetric transmitter
There are bulky defects.
Summary of the invention
The present invention solves bulky present in asymmetric transmitter at present by providing a kind of asymmetric transmitter
Defect.
The present invention provides a kind of asymmetric transmitters, comprising: the first metal grating layer for being cascading, metal
Layer, the second metal grating layer and dielectric substrate；
Wherein, the values of the structural parameters of first metal grating layer meets parameter preset condition, so that being incident on described
The light wave of first metal grating layer surface is converted to plasmon；
The metal layer is for stopping the light wave successively through the dielectric substrate and the second metal grating layer incidence saturating
It crosses, and the thickness of the metal layer is less than penetration depth of the surface plasma excimer in the metal, so that through institute
It states the surface plasma excimer that the first metal grating layer surface is converted and the second metal light is entered by tunneling effect
Grid layer；
Second metal grating layer is embedded in the dielectric substrate, the grating constant with first metal grating layer
Difference, and the values of the structural parameters of second metal grating layer is unsatisfactory for the parameter preset condition, it is described to forbid being incident on
The light wave of second metal grating layer surface is converted to surface plasma excimer.
Further, the value range of the trench depth of first metal grating layer isWherein, λ0For work
Make optical wavelength.
Further, the trench depth of first metal grating layer is less than the ditch groove depth of second metal grating layer
Degree.
Further, the gratings strips of first metal grating layer are wide wide not with the gratings strips of second metal grating layer
It is equal.
Further, first metal grating layer, the metal layer and second metal grating layer are all made of same
Kind noble metal is made.
Further, the noble metal is gold, silver or copper.
Further, the noble metal is silver.
Further, the material of the dielectric substrate is silica, silicon nitride or magnesium fluoride.
Further, the material of the dielectric substrate is silica.
One or more technical solution provided in the present invention, has at least the following technical effects or advantages:
The present invention provides a kind of asymmetric transmitters, when forward entrance illumination is mapped to the asymmetry transmitter, light wave
Surface plasma excimer (English: Surface Plasmon is converted by the first metal grating layer therein first
Polartions, SPPs).Because the thickness of metal layer therein is less than the penetration depth of the SPPs, SPPs is via tunnel
Penetration effect expeditiously enters the second metal grating layer, directly and efficiently decoupling to medium lining by the second metal grating layer
Bottom is finally transmitted to free space, it is thus achieved that the high permeability of forward entrance light；Conversely, when incident light opposite direction is irradiated to
When the asymmetry transmitter, light wave first passes around the second metal grating layer, since the second metal grating layer can not be by incident light wave
It is converted into SPPs, under the auxiliary transmission effect of not SPPs, reversed incident light is difficult across metal layer；Simultaneously as metal
Layer has strong reflection effect with big extinction coefficient, and most of light is caused to be reflected, thus reversed incident light almost all
It is reflected back, to realize nearly zero reversed transmissivity.In the present invention, the first metal grating layer and the second metal grating
It is one layer of very thin metal layer between layer, the thickness of metal layer is less than penetration depth of the SPPs in the metal, belongs to metal-
Metal-metal structure.The introducing of metal layer can promote the efficient tunnelling of SPPs, while reduce the thickness of device, it is easier to small
Type and integrated not only solves bulky defect present in asymmetric transmitter at present, but also significantly improves
The performance of asymmetry transmission.Moreover, because metal layer is very thin, it can be obviously improved the tunneling efficiency and forward direction transmissivity of SPPs, into
And improve contrast (ratio of i.e. positive transmissivity and reversed transmissivity).Further, since the structure is simple, production of the invention
Technique is also simplified.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of asymmetric transmitter provided in an embodiment of the present invention；
Fig. 2 is the working principle diagram of asymmetric transmitter provided in an embodiment of the present invention；
Fig. 3 is the structural schematic diagram of M component in asymmetric transmitter provided in an embodiment of the present invention；
Fig. 4 is the structural schematic diagram of N component in asymmetric transmitter provided in an embodiment of the present invention；
Fig. 5 is incident light forward entrance and reversed incident transmission spectrum in the embodiment of the present invention；
Fig. 6 is contrast in the embodiment of the present invention (ratio of i.e. positive transmissivity and reversed transmissivity) with wavelength change
Relational graph.
Specific embodiment
The embodiment of the present invention can realize positive biography by providing a kind of asymmetric transmitter in very narrow wave-length coverage
It broadcasts, the effect of reverse isolation, solves bulky defect present in asymmetric transmitter at present.
Technical solution in the embodiment of the present invention is to solve the above problems, general thought is as follows:
The embodiment of the present invention is using the asymmetric grating of metal-metal-metal structure come unidirectional excitating surface plasma
Excimer (SPPs), and then realize asymmetric transmission.SPPs is a kind of mode of electromagnetic wave propagated along medium/metal interface, is one
The special surface wave of kind.Its field strength is along the exponential decaying in direction perpendicular to interface.Known according to the dispersion relation of SPPs,
Under same frequency, the wave vector k of light in a vacuum0Wave vector k less than SPPsSPPs, that is, there is the unmatched problem of wave vector.In the present invention
In embodiment, we use diffraction compensation method easy to operate and can efficiently exciting SPPs, are exactly using grating specifically
Wave vector increment is provided for incident light to excite SPPs.
Specifically, it is the π N/ Δ of β=2 that grating constant (i.e. the arrangement period of grating), which is the increment wave vector that provides of grating of Δ,
(wherein, N is integer).In embodiments of the present invention, in order to generate SPPs on the surface of the first metal grating layer A, we pass through
Diffraction compensation method carrys out the structural parameters of the optimization design grating, and the increment wave vector β for providing it just meets:
β=kSPPs-k0sinθ (1)
As previously mentioned, the k in (1) formulaSPPsFor the wave vector of SPPs, the structural parameters and periphery of value and metal grating
Media environment it is related.k0For the wave vector of incident light in a vacuum, θ is incidence angle.
According to the propagation characteristic of SPPs it is found that the penetration depth δ of SPPs in a metalmIt can be calculated by following formula
It arrives:
In formula, λ0For the wavelength of incident light in a vacuum, ε 'mAnd εd' be respectively metal and medium real part of permittivity.
First metal grating layer A and the second metal grating layer C has different structural parameters, i.e., they are asymmetric light
Grid.By the structural parameters of the first metal grating layer of optimization design A, allow to excite SPPs；Pass through the second gold medal of optimization design
The structural parameters for belonging to grating layer C, make it that can not excite SPPs.In this way, when work light forward entrance when, SPPs can be excited, because
That initially encounter for incident light is the first metal grating layer A.And when the light that works is reversely incident, then SPPs can not be excited, because
That it is initially encountered is the second metal grating layer C.Thus the unidirectional excitation of SPPs can be realized.
As previously mentioned, the increment wave vector π N/ of β=2 Δ (wherein, N is integer, and Δ is grating constant) that grating provides, and gold
The structural parameters for belonging to grating also will affect the wave vector k of the SPPs excited in medium/metal interfaceSPPs.It is described based on formula (1)
Principle, by the grating structural parameter of the first metal grating layer of optimization design A, make it to incident light provide increment wave vector β
Meet (1) formula, so that the light wave for being incident on the first metal grating layer A is converted to SPPs.Similarly, pass through optimization design second
The grating structural parameter of metal grating layer C, the increment wave vector β for providing it to incident light is unsatisfactory for (1) formula, so that incident
Light wave to the second metal grating layer C cannot be converted to SPPs.Since the second metal grating layer C and the first metal grating layer A has
There are different grating structural parameters, thus referred to as asymmetric grating.
According to formula (2), penetration depth of the SPPs in selected metal can be calculated in we, and metal layer is arranged
The thickness of B makes it be less than the penetration depth.Therefore, when light forward entrance, the SPPs that the first metal grating layer A is excited can
With via tunneling effect by metal layer B enter the second metal grating layer C, and by the second metal grating layer C it is decoupling after be able to
Outgoing；And when incident light is reversely incident, metal layer B then plays the role of strong reflection, is achieved in the reversed incident light transmission of blocking
Function.
Subsequent discussion for convenience, we are by light wave from the first metal grating layer A to the incidence of the second metal grating layer C
Direction definition is forward entrance, and the incident direction by light wave along the second metal grating layer C to the first metal grating layer A is defined as
It is reversed incident.
It, can be in the surface excitation of the first metal grating layer A when light forward entrance is irradiated to the asymmetry transmitter
Incident electromagnetic wave is converted SPPs by SPPs, i.e. the first metal grating layer A.Since the thickness of selected metal layer B is less than
Penetration depth of the SPPs in the metal, therefore the SPPs excited can be penetrated into the lower surface of metal layer B via tunneling effect.
Since SPPs can also decouple synthesis light to external radiation along grating surface propagation, metal layer B and the is arranged in we
Two metal grating layer C are directly contacted, and the SPPs that the first metal grating layer A is excited directly and efficiently is tunneling to second
Metal grating layer C.Then, the second metal grating layer C can be further efficiently decoupling into dielectric substrate D by SPPs, with
It is transmitted in free space again afterwards.Therefore, the asymmetric transmitter can work light to forward entrance provide it is very high
Transmissivity.
Conversely, when light is reversely incident on the asymmetry transmitter, due to the one-dimensional grating knot in the second metal grating layer C
The increment wave vector β that structure provides is unsatisfactory for wave vector matching condition (i.e. β ≠ k of SPPs excitationSPPs-k0Sin θ), it is therefore, reversed incident
Light can not be in the surface excitation SPPs of the second metal grating layer C.Under the auxiliary transmission effect of not SPPs, reversed incident light is very
Hardly possible passes through metal layer B.Simultaneously as metal layer B has very big extinction coefficient χ, according to reflectance formula R=1-4nmnair/
[(nm+nair)2+χ2] (wherein, R is reflectivity, nmFor the real part of metal refractive index, χ is the extinction coefficient of metal, nairFor air
Refractive index) it is found that the metal have very strong luminous reflectanc, cause most of light to be reflected.Therefore, when light is reversely incident
When, the asymmetric transmitter can only provide extremely low transmissivity.
In addition, the embodiment of the present invention also uses linear grating groove effect of depth to design the first gold medal with shallow groove depths
Belong to grating layer A.According to linear grating groove effect of depth, with the reduction of linear grating groove depth, the interaction of incident light and grating
Weaken, causes to absorb damping reduction, to will cause the increase of resonance peak-to-peak amplitude and the reduction of bandwidth of operation.In addition, the first gold medal
Belong to the SPPs and multi interference effect directly can be occurred by the light that metal layer B is reflected that grating layer A is excited, this also contributes to subtracting
Small bandwidth of operation.The asymmetry transmitter also has the characteristic of narrow bandwidth of operation, high quality factor as a result,.
By observing the first metal grating layer A difference trench depth h1Theoretical simulation as a result, we available first
Metal grating layer A trench depth h1Value range are as follows:Wherein, λ0For the optical wavelength that works.Work as h1Become in the range
When change, the asymmetric transmitter is able to maintain preferable narrow bandwidth characteristic, and bandwidth is respectively less than 10nm.
Above-mentioned technical proposal in order to better understand, in conjunction with appended figures and specific embodiments to upper
Technical solution is stated to be described in detail.
Referring to Fig. 1, asymmetry transmitter provided in an embodiment of the present invention, comprising: the first metal light being cascading
Grid layer A, metal layer B, the second metal grating layer C and dielectric substrate D；
Wherein, the values of the structural parameters of the first metal grating layer A meets parameter preset condition, so that being incident on the first metal
The light wave on the surface grating layer A is converted to plasmon (SPPs)；
Metal layer B is successively penetrated through dielectric substrate D and the light wave of the second metal grating layer C incidence for stopping, and metal
The thickness of layer B is less than penetration depth of the above-mentioned surface plasma excimer in the metal, so that through the first metal grating layer A
The surface plasma excimer that surface is converted expeditiously enters the second metal grating layer C by tunneling effect；
Second metal grating layer C is embedded in dielectric substrate D, different from the grating constant of the first metal grating layer A, and the
The values of the structural parameters of two metal grating layer C is unsatisfactory for parameter preset condition, to forbid being incident on the second metal grating layer surface C
Light wave is converted to surface plasma excimer.
Wherein, parameter preset condition is arranged according to above-mentioned wave vector matching condition, when the values of the structural parameters of metal grating layer is full
When sufficient parameter preset condition, then metal grating layer meets wave vector matching condition, conversely, then metal grating layer is unsatisfactory for wave vector matching
Condition.Specifically, the values of the structural parameters of the first metal grating layer A and the second metal grating layer C include: grating constant, light
Grid metal item is wide and trench depth.That is, passing through the grating of design the first metal grating layer A and the second metal grating layer C
Constant, grating metal strip be wide and trench depth, and the first metal grating layer A is made to meet wave vector matching condition and the second metal grating
Layer C is unsatisfactory for wave vector matching condition.
Specifically, the first face of metal layer B is contacted with the first metal grating layer A, the second face of metal layer B and the second metal
Grating layer C contact, the second metal grating layer C are arranged in dielectric substrate D；The thickness of metal layer B swashs less than surface plasma
The penetration depth of first (SPPs) in the metal；First metal grating layer A from the second metal grating layer C there are different gratings to arrange
The cloth period.
Specifically, trench depth of the trench depth of the first metal grating layer A less than the second metal grating layer C.Wherein,
The trench depth of one metal grating layer A is arranged according to linear grating groove effect of depth, according to linear grating groove effect of depth, ditch
Groove depth is more shallow, and bandwidth of operation is narrower, we are required of narrow bandwidth of operation herein, thus the first metal grating layer A is set
What is set is shallow groove depths.The trench depth of second metal grating layer C is to be obtained in parameter determination by calculation optimization
, and the trench depth of the second metal grating layer C is greater than the trench depth of the first metal grating layer A, it is thus possible to it is narrow meeting
Bandwidth of operation under the premise of, asymmetric transmission performance is more excellent.
In order to improve the asymmetric behavior of asymmetric transmitter, the gratings strips of the first metal grating layer A are wide with the second metal
The gratings strips width of grating layer C is unequal.Gratings strips width will affect the effective dielectric constant of metal grating, and then change swashing for SPPs
Clockwork spring part can be calculated when metal grating item width is unequal, when asymmetric performance is equal compared to metal strip width
Asymmetric behavior is more excellent.
In order to keep design and the production of asymmetric transmitter more convenient, while avoiding because of material lattice mismatch or material
Material type is complicated and leads to other problems, in the present invention, the first metal grating layer A, metal layer B and the second metal grating
Layer C is all made of same noble metal and is made.
Specifically, noble metal is gold, silver or copper.
In order to while guaranteeing asymmetric transmission performance, reduce the cost of manufacture of transmitter, noble metal is silver.
Specifically, the material of dielectric substrate D is silica, silicon nitride or magnesium fluoride.
In the present embodiment, the material of dielectric substrate D is silica (SiO2)。
Below to provided in an embodiment of the present invention based on the asymmetric transmission of metal-metal-metal structure asymmetry grating
The specific structure of device is described in detail:
The asymmetric transmission based on the asymmetric grating of metal-metal-metal structure that the embodiment of the invention provides a kind of
Device, the asymmetry transmitter realize that (asymmetric grating refers to the first metal grating layer A and the second metal using asymmetric grating
Grating layer C has different structural parameters).Referring to Fig. 1 and Fig. 2, under the rectangular coordinate system being made of x-axis, y-axis and z-axis, just
Incident (i.e. along the positive direction of z-axis) to N component direction along M component to incident light, reversed incident light is along N component to M component direction
Incident (i.e. along the negative direction of z-axis).The asymmetry transmitter only allows along z-axis forward entrance light transmission, and reversely enters along z-axis
It penetrates light then almost all to be reflected, to realize nearly zero reversed transmissivity.
Referring to Fig. 1, the asymmetry transmitter is made of M and N two components, and M component is located at the upside of N component.The M
Component includes that the first metal grating layer A and metal layer B, the first metal grating layer A are located at the upper surface of metal layer B；The N component
Including in the second metal grating layer C and dielectric substrate D, the second metal grating layer C embedding medium substrate D, and with M attached components.
Metal in the first metal grating layer A, the metal in the second metal grating layer C, the metal in metal layer B are using same
Precious metal material belongs to metal-metal-metal structure.Noble metal therein refers to the materials such as gold, silver, copper.In the present embodiment
In, preferred precious metal material is silver.
Referring to Fig. 3, the first metal grating layer A is made of the metal grating of one-dimensional shallow groove depths, and grating constant is (i.e.
The arrangement period of grating) it is Δ1, gratings strips width is w1, trench depth h1.Because of trench depth h1Value very little, therefore
The grating of one metal grating layer A is the one-dimensional metal grating of shallow groove depths.Metal layer B with a thickness of d.
Referring to Fig. 3, in the rectangular coordinate system established with x-axis, y-axis and z-axis, the direction of an electric field of forward and reverse incident light
Parallel with x-axis, i.e., the electric field intensity of incident light is along x-axis (i.e. electric field intensity direction is vertical with linear grating groove direction).
According to SPPs chromatic dispersion principle it is found that since wave vector mismatches (the i.e. wave vector k of incident light wave in a vacuum0With SPPs
Wave vector kSPPsIt is unequal), incident light cannot directly exciting media/metal interface SPPs.The increment wave that known grating provides
It swears the π N/ of β=2 Δ (wherein, N is integer, and Δ is grating constant), and the structural parameters of metal grating will affect in medium/metal
The wave vector k of the SPPs of interface excitationSPPs.In embodiments of the present invention, in order in the generation of the surface of the first metal grating layer A
SPPs, we design the structural parameters of the first metal grating layer A by diffraction compensation method to provide increment wave vector β, i.e., and first
The wave vector increment β that metal grating layer A is generated is exactly equal to the wave vector k of SPPsSPPsWith the wave vector k of light wave in a vacuum0Difference, i.e. β
=kSPPs-k0sinθ.Therefore, the first metal grating layer A can make the light wave for being incident on its surface be converted to SPPs.Then,
It, can be that is, described in the surface excitation SPPs of the first metal grating layer A when forward entrance illumination is mapped to the asymmetry transmitter
M component realizes the function of converting forward entrance electromagnetic wave to SPPs.
According to the penetration depth formula (2) of SPPs in a metal, penetration depth of the SPPs in the metal can be calculated,
And the thickness d of metal layer B is set, it is made to be less than the penetration depth being calculated.Therefore, when light forward entrance, the first gold medal
The second metal grating layer C can be entered by metal layer B via tunneling effect by belonging to the SPPs that grating layer A is excited, and by second
It is emitted after metal grating layer C is decoupling；And when incident light is reversely incident, metal layer B then plays the role of strong reflection, thus
It realizes and stops reversed incident light transmissive function.
Referring to fig. 4, the second metal grating layer C is one-dimensional metal optical grating construction, and grating constant is Δ2, gratings strips
Width is w2, trench depth h2；Dielectric substrate D with a thickness of s.The material of dielectric substrate D is preferably silica.
The grating constant Δ of second metal grating layer C2Not equal to the grating constant Δ of the first metal grating layer A1, i.e. Δ2≠
Δ1.Second metal grating layer C and the first metal grating layer A has different grating structural parameters, the two gratings belong to not right
Claim grating.
Referring to fig. 4, in the rectangular coordinate system established with x-axis, y-axis and z-axis, the direction of an electric field of forward and reverse incident light
Parallel with x-axis, i.e., the electric field intensity of incident light is along x-axis (i.e. electric field intensity direction is vertical with linear grating groove direction).
Here, providing optimization the first metal grating layer A and the second metal grating layer C to keep the first metal grating layer A full
Sufficient wave vector matching condition and the second metal grating layer C are unsatisfactory for the specific method of wave vector matching condition:
The increment wave vector β (formula (3)) that known wave vector matching condition (formula (1)) and grating layer are capable of providing:
The π N Δ of β=2 (3)
N is integer in formula, represents diffraction time；Δ is grating constant (i.e. the arrangement period of grating)；λ0Exist for incident light
Wavelength in vacuum.
In the wave vector for the SPPs that metal grating and medium interface are excited are as follows:
Wherein, εdFor the dielectric constant of medium；εmFor the effective dielectric constant of metal grating, its value and metal material
Parameter it is related with the structural parameters of metal grating.Specifically, εmWith grating constant Δ, the wide w of gratings strips, trench depth h, gold
It is related to belong to material category.
Formula (3)-(5) are substituted into formula (1), are obtained:
By formula (6) it is found that in given incident wavelength λ0, incidence angle θ, diffraction time N and medium dielectric constant feelings
Under condition, the effective dielectric constant ε of metal gratingmIt is to be mutually related with grating constant Δ.
Therefore, the first metal grating layer A and the second metal grating layer C first on independent analysis thick metal layers, thus just
Step determines their structural parameters.The material and grating layer of thick metal layers use identical metal, and thickness is greater thanλ0.Institute
It is the excitation situation in order to preferably observe grating layer Yu medium interface SPPs with the metal layer in this step using thickness, thus
Obtain the preliminary structure parameter of the first metal grating layer A and the second metal grating layer C.Then, preliminary structure parameter will be determined
The first metal grating layer A, metal layer B, the second metal grating layer C and dielectric substrate D combination, further analyze entire device
Performance, thus finally determine the first metal grating layer A and the second metal grating layer C structural parameters.
Specifically, the first metal grating layer A structural parameters primarily determine that method is as follows:
For the first metal grating layer A on thick metal layers, the thickness of thick metal layers is taken as 130nm, material and first
The metal material of metal grating layer A is the same, is all silver-colored (Ag).
Detailed process is as follows:
1. firstly, determining work light wavelength lambda0(λ0=610nm), incidence angle θ (θ=0), diffraction time N (N=1) and medium
Permittivity εd1(the first metal grating layer A is contacted with air, and taking the dielectric constant of air is εd1=1)；
2. choosing the grating constant Δ of the first metal grating layer A1Value (Δ1=600nm)；
3. choosing the wide w of gratings strips of the first metal grating layer A1With trench depth h1Value；
4. when wavelength be 590nm~640nm x- polarised light (i.e. electric field intensity direction is vertical with linear grating groove direction) with
It in the case where incidence angle θ (θ=0) forward entrance to device, calculates and solves maxwell equation group, obtain the space point of electromagnetic field
Cloth situation and absorption spectra；
5. observing electric field component EzDistribution situation and absorption spectra, thus judge the excitation situation of SPPs；
First by observation perpendicular to electric field component (the namely E in interface directionz) space distribution situation, if in work
Make light wavelength lambda0(λ0=610nm) at, the first metal grating layer A/ Air Interface near zone observes EzAmplitude and phase edge
The direction x occur periodically distribution, we tentatively judge there is SPPs excitation.
Then, further determine whether excite SPPs by the way that whether observation absorption spectra absorption peak occurs, if it is observed that
In operation wavelength λ0There is absorption peak appearance at place, we can determine to excite SPPs.
6. if it is above-mentioned 5. during, do not observe we it is desired as a result, if repeat 3. -5. the step of.Namely
Be, step 3. in choose the wide w of grating metal strip of grating layer again1With trench depth h1Value, step 4. in count again
It calculates to solve and obtains the space distribution situation and absorption spectra of electromagnetic field.Deterministic process 5. is repeated, until finding and can expire simultaneously
The narrow Absorber Bandwidth of foot (i.e. the full width at half maximum (FWHM) of absorption spectra is less than 10nm), and the light wavelength lambda that works0(λ0=610nm) it is incident when can be
Until first metal grating layer A excites the structural parameters of SPPs, the whole of the first metal grating layer A can be primarily determined at this time
Structural parameters, i.e. grating constant Δ1, the wide w of grating metal strip1With trench depth h1。
For the second metal grating layer C, structural parameters primarily determine that method is as follows:
For the second metal grating layer C on thick metal layers, the thickness of thick metal layers is taken as 130nm, material and second
The metal material of metal grating layer C is the same, is all Ag.
Detailed process is as follows:
1. firstly, determining work light wavelength lambda0(λ0=610nm), incidence angle θ (θ=0), diffraction time N (N=1) and medium
Permittivity εd2(the second metal grating layer C and SiO2Substrate contact takes SiO2Dielectric constant be εd2=2.325)；
2. choosing the grating constant Δ of the second metal grating layer C2Value (Δ2=400nm)；
3. choosing the wide w of gratings strips of the second metal grating layer C2With trench depth h2Value；
4. when wavelength be 590nm~640nm x- polarised light (i.e. electric field intensity direction is vertical with linear grating groove direction) with
It in the case that incidence angle θ (θ=0) is reversely incident on device, calculates and solves maxwell equation group, obtain the space point of electromagnetic field
Cloth situation and absorption spectra；
5. observing electric field component EzDistribution situation and absorption spectra, thus judge the excitation situation of SPPs；
In work light wavelength lambda0(λ0=610nm) at, if in the second metal grating layer C/SiO2Interface near zone does not have
Observe EzAmplitude and phase along the direction x occur periodically distribution, we tentatively judge without excitation SPPs.
Then, further determine whether excite SPPs by the way that whether observation absorption spectra absorption peak occurs, if existed at this time
Operation wavelength λ0Place also occurs without absorption peak, we can determine not excite SPPs.
6. if it is above-mentioned 5. during, do not observe we it is desired as a result, if repeat 3. -5. the step of.Namely
Be, step 3. in choose the wide w of grating metal strip of grating layer again2With trench depth h2Value, step 4. in count again
It calculates to solve and obtains the space distribution situation and absorption spectra of electromagnetic field.Deterministic process 5. is repeated, until finding in work light wave
Long λ0(λ0=610nm) at, until the second metal grating layer C does not excite the structural parameters of SPPs, can be primarily determined at this time
The entire infrastructure parameter of two metal grating layer C, i.e. grating constant Δ2, the wide w of grating metal strip2With trench depth h2。
The analysis of overall structure performance, and finally determine the entire infrastructure parameter of asymmetric transmitter:
We will primarily determine the first metal grating layer A, the second metal grating layer C and metal layer B of structural parameters with
And dielectric substrate D is combined, and obtains the overall structure of asymmetric transmitter, and determines that satisfaction is expected by advanced optimizing
It is required that asymmetric transmitter final structure parameter.
1. for primarily determining the first metal grating layer A (i.e. grating constant Δ of structural parameters1, the wide w of grating metal strip1With
Trench depth h1) and the second metal grating layer C (i.e. grating constant Δ2, the wide w of grating metal strip2With trench depth h2) and with a thickness of
The metal layer B of d is combined.Already mentioned before, the thickness d of metal layer B is less than SPPs and penetrates depth in the metal
Degree, takes d=20nm herein.The material of dielectric substrate D is SiO2, thickness s is between 100 microns to 400 microns.
2. when wavelength be 590nm~640nm x- polarised light (i.e. electric field intensity direction is vertical with linear grating groove direction) with
In the case that incidence angle θ (θ=0) is incident on device, it is known that diffraction time N (N=1), Jie contacted with the first metal grating layer A
The permittivity ε of matterd1(dielectric constant for taking air is εd1=1) and it is normal with the dielectric of the second metal grating layer C medium contacted
Number εd2(take SiO2Dielectric constant be εd2=2.325) it, calculates and solves maxwell equation group, obtain the spatial distribution of electromagnetic field
Situation and absorption spectra and transmission spectrum；
3. observing the first metal grating layer A/ Air Interface and the second metal grating layer C/SiO2The electric field component at interface
EzDistribution situation and absorption spectra, thus judge the excitation situation of SPPs；
The analysis method of SPPs is as previously mentioned, i.e. in work light wavelength lambda0(λ0=610nm) at, the first metal grating layer A/
Air Interface needs, which are observed, excites SPPs, and the second metal grating layer C/SiO2Interface does not excite SPPs.
4. transmission spectrum when observing forward entrance, it is reversed incident when transmission spectrum.Because the present embodiments relate to not
Symmetrical transmitter, it is desirable to which the device is in work light (λ0=610nm) forward entrance when with high transmissivity (such as larger than
0.6), and with very low transmissivity (such as less than 0.01) when reversed incident；
5. if it is above-mentioned 3. -4. during, do not observe we it is desired as a result, if knot that we are tentatively obtained
Structure parameter is finely adjusted.That is to say, step 1. in the wide w of grating metal strip of the grating layer of selection1And w2, trench depth h1
And h2Value be finely adjusted, step 2. in again calculate solve obtain the space distribution situation and absorption spectra of electromagnetic field
And transmission spectrum.Repeat step 3.-deterministic process 4., until obtained meeting expected result, i.e., until find can
Until the parameter for meeting following conditions simultaneously, i.e., positive transmission spectrum meets narrow bandwidth, and (i.e. the full width at half maximum (FWHM) of transmission spectrum is less than
10nm), in work optical wavelength (λ0=610nm) at high positive transmissivity (being greater than 0.6) and very low reversed transmissivity
(i.e. less than 0.01), and operation wavelength light (λ0=610nm) forward entrance when can be in the first metal grating layer A/ air circle
Face excites SPPs, and when it is reversed incident, in the second metal grating layer C/SiO2Interface does not excite SPPs.At this point,
The final entire infrastructure parameter for determining the first metal grating layer A and the second metal grating layer C, i.e. grating constant Δ1, grating metal
The wide w of item1, trench depth h1, grating constant Δ2, the wide w of grating metal strip2With trench depth h2.Have the first metal grating layer A and
The structural parameters of second metal grating layer C, along with the parameter of selected metal layer B and dielectric substrate D, so that it may determine
The structural parameters of the asymmetric entire device of transmitter.
Referring to Fig. 5, it be the asymmetric transmitter provided in an embodiment of the present invention obtained by analogue simulation forward direction and
Reversed transmission spectrum, the targeted related dimensional parameters of the emulation are as follows: the grating constant Δ of the first metal grating layer A1=
600nm, the wide w of gratings strips1=220nm, trench depth h1=15nm；Thickness d=20nm of metal layer B；Second metal grating layer C
Grating constant Δ2=400nm, the wide w of gratings strips2=200nm, trench depth h2=110nm；The thickness s=300 of dielectric substrate D
μm.Can be seen that the first metal grating layer A and the second metal grating layer C with different structural parameters from these parameters, i.e., it
Be asymmetric grating.
As operation wavelength λ0When being mapped to the asymmetry transmitter for the forward entrance illumination of 610nm, due to the first metal light
Grid layer A is capable of providing incident light and generates increment wave vector β (i.e. β=k required for SPPsSPPs-k0Sin θ), therefore, forward entrance light
The function that electromagnetic wave is converted into SPPs can be realized in the surface excitation SPPs of the first metal grating layer A, i.e., the described M component.Again
It (is calculated by formula (2) since the thickness (d=20nm) of designed metal layer B is less than penetration depth of the SPPs in metal Ag
It is 23.4nm that its value at optical wavelength 610nm, which can be obtained), therefore, the SPPs of excitation can be perforated through metal via tunnel-effect
Layer B.Simultaneously as metal layer B is directly contacted with the second metal grating layer C, the second metal grating layer C can will be penetrated into metal layer
The SPPs of the lower surface B is efficiently decoupling into free space, to realize the highly transmissive characteristic of forward entrance light.Such as Fig. 5
Shown, at work optical wavelength 610nm positive transmissivity TJustUp to 0.72.
Conversely, when the work light that operation wavelength is 610nm enters the device in the opposite direction, due to the second metal light
The increment wave vector β that one-dimensional grating structure in grid layer C provides is unsatisfactory for wave vector matching condition (i.e. β ≠ k of SPPs excitationSPPs-
k0Sin θ), therefore, reversed incident light can not generate SPPs on the surface of the second metal grating layer C.It is saturating in the auxiliary of not SPPs
It penetrates under effect, reversed incident light is difficult across metal layer B.Further, since metal layer B has very big extinction coefficient χ, according to anti-
Penetrate rate formula R=1-4nmnair/[(nm+nair)2+χ2] (wherein, nmFor the real part of metal refractive index, χ is the extinction coefficient of metal,
nairFor the refractive index of air) it is found that the metal has very strong luminous reflectanc, cause most of light to be reflected.Therefore, when
When light is reversely incident, the asymmetric transmitter can only provide nearly zero transmissivity.As shown in figure 5, in work light wave
Reversed transmissivity T at long 610nmInsteadDown to 0.0015.
While realizing the reversed transmissivity of high positive transmissivity, nearly zero, the embodiment of the present invention also utilizes grating ditch
Groove depth effect (designs the first metal grating layer A, trench depth h of shallow groove depths1Very little, only 15nm) and it is multiple
Interference effect (i.e. the first metal grating layer A excitation SPPs with directly by the multi interference of metal layer B institute reflected light) realization it is narrow
The good characteristic of bandwidth and high quality factor.
From fig. 5, it is seen that in work light wavelength lambda0There is high positive transmissivity (T at=610nmJust=0.72), together
When with nearly zero reversed transmissivity (TInstead, and its bandwidth of operation Δ λ (i.e. full width at half maximum (FWHM) FWHM (full=0.0015)
Width at half maximum)) very narrow, only 6.7nm, quality factor q is up to 91 (Q=λ0/Δλ)。
The asymmetric transmitter provided in an embodiment of the present invention based on asymmetric grating is compactly observed in order to more clear
Performance, we also calculate contrast (Contrast Ratio), i.e. contrast ratio=10 × log10(TJustTInstead),
In, TJustIndicate transmissivity when forward entrance, TInsteadTransmissivity when indicating reversed incident.Calculated result is referring to Fig. 6.In the present invention
In embodiment, due to having very high positive transmissivity (T at work optical wavelength 610nmJust=0.72) and nearly zero it is reversed
Penetrate rate (TInstead=0.0015), therefore, which has the advantages that high contrast.As can be seen from Figure 6 it is working
At optical wavelength 610nm, contrast reaches 26.8dB.
It is passed in conclusion a kind of metal-metal provided in an embodiment of the present invention-metal structure asymmetry grating is asymmetric
Defeated device is realizing forward entrance light high efficiency transmission, while forbidding reversed incident light transmission, also has narrow bandwidth, high-quality
The superior function of factor and high contrast.
Due to a kind of asymmetric transmitter of metal-metal-metal structure asymmetry grating provided in an embodiment of the present invention,
Only with the one-dimensional grating structure based on plane manufacture craft, thus have that structure is simple, manufacture craft is simple and production
Feature at low cost.
Technical solution in the embodiments of the present invention is a kind of metal -- Au described in visible light wave range simplation verification
The asymmetric transmitter of category-metal structure asymmetry grating can be allowed to be moved to set appoint according to size scaling effect
Meaning wavelength, it is only necessary to simple adjustment appropriate be done to structural parameters and material, near-infrared wave may be implemented in those skilled in the art
The asymmetric transmitter based on asymmetric grating of section, terahertz wave band and microwave section.
[technical effect]
The embodiment of the invention provides a kind of based on the asymmetric transmitter of metal-metal-metal structure asymmetry grating,
When forward entrance illumination is mapped to the asymmetry transmitter, light wave is converted into SPPs by the first metal grating layer A therein first.
Because the thickness of metal layer B therein be less than the SPPs penetration depth, SPPs via penetration tunnel effect expeditiously
It is directly and efficiently decoupling to dielectric substrate D by the second metal grating layer C into the second metal grating layer C, it is finally transmitted to certainly
By space, it is thus achieved that the high permeability of forward entrance light；Conversely, when incident light opposite direction is irradiated to the asymmetry transmitter
When, light wave first passes around the second metal grating layer C, since incident light wave can not be transferred to SPPs by the second metal grating layer C,
Under not having the auxiliary transmission of SPPs to act on, reversed incident light is difficult across metal layer B；Simultaneously as metal layer B has big disappear
Backscatter extinction logarithmic ratio and have strong reflection effect, cause most of light to be reflected, thus reversely incident light almost all be reflected back, from
And realize nearly zero reversed transmissivity.The ratio of positive transmissivity and reversed transmissivity is known as contrast, implements in the present invention
In example, very high forward direction transmissivity and nearly zero reversed transmissivity make the asymmetry transmitter have the advantages that high contrast.
In addition, the trench depth of the first metal grating layer A is very shallow in the embodiment of the present invention, linear grating groove effect of depth and multiple dry is utilized
The characteristic of narrow bandwidth, high quality factor can be realized by relating to effect.Therefore, the asymmetry transmitter also have high contrast, narrow bandwidth,
The advantages of high quality factor.
It in embodiments of the present invention, is one layer of very thin gold between the first metal grating layer A and the second metal grating layer C
Belong to layer B, the thickness of metal layer B is less than penetration depth of the SPPs in the metal, belongs to metal-metal-metal structure.Metal layer
The introducing of B can promote the efficient tunnelling of SPPs, while reduce the thickness of device, it is easier to minimize and integrated, not only solve
It has determined bulky defect present in current asymmetric transmitter, but also has significantly improved the performance of asymmetric transmission.This
Outside, since metal layer B is very thin, it can be obviously improved the tunneling efficiency and forward direction transmissivity of SPPs, and then it is (i.e. positive to improve contrast
The ratio of transmissivity and reversed transmissivity).In addition, the manufacture craft of the embodiment of the present invention is also simplified.
In conclusion the embodiment of the present invention passes through the unidirectional excitation of SPPs, linear grating groove effect of depth and multi interference effect
The function that high contrast, narrow bandwidth, high quality factor asymmetry transmitter should be realized not only overcomes existing asymmetric biography
The volume of defeated device is big, service band is wide low with quality factor etc. insufficient, but also have and have excellent performance, structure is simple and is fabricated to
This low advantage.This asymmetry transmitter can be applicable to the unidirectional optical detection and sensing, filter for requiring narrow bandwidth, high quality factor
In the application fields such as wave, decoupling, modulation.
Although preferred embodiments of the present invention have been described, it is created once a person skilled in the art knows basic
Property concept, then additional changes and modifications may be made to these embodiments.So it includes excellent that the following claims are intended to be interpreted as
It selects embodiment and falls into all change and modification of the scope of the invention.
Obviously, various changes and modifications can be made to the invention without departing from essence of the invention by those skilled in the art
Mind and range.In this way, if these modifications and changes of the present invention belongs to the range of the claims in the present invention and its equivalent technologies
Within, then the present invention is also intended to include these modifications and variations.
Claims (9)
1. a kind of asymmetry transmitter characterized by comprising the first metal grating layer for being cascading, metal layer, the
Two metal grating layers and dielectric substrate；
Wherein, the values of the structural parameters of first metal grating layer meets parameter preset condition, so that being incident on described first
The light wave of metal grating layer surface is converted to plasmon；
The metal layer is successively penetrated through the dielectric substrate and the light wave of the second metal grating layer incidence for stopping, and
The thickness of the metal layer is less than penetration depth of the surface plasma excimer in the metal, so that through described first
The surface plasma excimer that metal grating layer surface is converted enters second metal grating layer by tunneling effect；
Second metal grating layer is embedded in the dielectric substrate, not with the grating constant of first metal grating layer
Together, and the values of the structural parameters of second metal grating layer is unsatisfactory for the parameter preset condition, to forbid being incident on described
The light wave of two metal grating layer surfaces is converted to surface plasma excimer.
2. asymmetry transmitter as described in claim 1, which is characterized in that the trench depth of first metal grating layer
Value range isWherein, λ0For the optical wavelength that works.
3. asymmetry transmitter as described in claim 1, which is characterized in that the trench depth of first metal grating layer is small
In the trench depth of second metal grating layer.
4. asymmetry transmitter as described in claim 1, which is characterized in that the gratings strips of first metal grating layer it is wide with
The gratings strips width of second metal grating layer is unequal.
5. asymmetry transmitter as described in claim 1, which is characterized in that first metal grating layer, the metal layer
Same noble metal is all made of with second metal grating layer to be made.
6. asymmetry transmitter as claimed in claim 5, which is characterized in that the noble metal is gold, silver or copper.
7. asymmetry transmitter as claimed in claim 5, which is characterized in that the noble metal is silver.
8. such as asymmetric transmitter of any of claims 1-7, which is characterized in that the material of the dielectric substrate is
Silica, silicon nitride or magnesium fluoride.
9. asymmetry transmitter as claimed in claim 8, which is characterized in that the material of the dielectric substrate is silica.
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