CN110221516B - Auxiliary graph adding method, auxiliary graph adding device, storage medium and processor - Google Patents
Auxiliary graph adding method, auxiliary graph adding device, storage medium and processor Download PDFInfo
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- CN110221516B CN110221516B CN201910413379.1A CN201910413379A CN110221516B CN 110221516 B CN110221516 B CN 110221516B CN 201910413379 A CN201910413379 A CN 201910413379A CN 110221516 B CN110221516 B CN 110221516B
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
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- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F30/00—Computer-aided design [CAD]
- G06F30/30—Circuit design
- G06F30/39—Circuit design at the physical level
- G06F30/392—Floor-planning or layout, e.g. partitioning or placement
Abstract
The application provides an auxiliary graph adding method, an auxiliary graph adding device, a storage medium and a processor. The adding method comprises the following steps: determining a test pattern according to the prefabricated pattern, wherein the test pattern comprises a main pattern and an auxiliary pattern, and the auxiliary pattern is obtained by a model calculation method; and extracting the adding rule of the auxiliary graph according to at least part of the test graph. The auxiliary graph obtained by the method has very high precision, so that the test graph comprising the auxiliary graph is very accurate, and the adding rules extracted according to the test graph are more accurate, so that the auxiliary graph added in the pre-manufactured graph by using the adding rules is more accurate later. The method obtains the adding rule, the auxiliary graph can be added in the prefabricated graph by using the adding rule subsequently, the application speed is high, convenience and simplicity are realized, and the method meets the double requirements of mass production on speed and precision.
Description
Technical Field
The present application relates to the field of semiconductors, and in particular, to an auxiliary graph adding method, an auxiliary graph adding apparatus, a storage medium, and a processor.
Background
One layout usually has both densely distributed patterns (such as lines with equal spacing 1. And in particular the design of logic devices, has greater discretion. Both theoretical and experimental results clearly show that the lithography process window for densely distributed patterns is not consistent with the lithography process window for sparse patterns. The method is suitable for the illumination condition of exposure of the dense pattern and is not suitable for the exposure of the sparse pattern. If both dense and sparse patterns are present on the same mask, the common photolithography process window is small.
Also, by observation, the lithographic process window for dense lines (line: gap = 1) is larger than that of individual lines, and the lithographic process window for semi-sparse lines (line: gap = 1. Under off-axis illumination conditions, the process window is more strongly related to pattern intensity.
The technical problem that a later pattern process window is too small can be solved by adding the exposure auxiliary pattern in the design of the mask. The exposure assist pattern was introduced earlier than the 90nm node, almost simultaneously with the introduction of model-based OPC. The exposure assist pattern is a number of very fine patterns that are placed around the index pattern so that the sparse pattern looks like a dense pattern from an optical perspective. These auxiliary patterns must be smaller than the resolution of the lithography machine, i.e. sub-resolution. Upon exposure, they only scatter light and should not form an image on the photoresist. Therefore, the exposure assist pattern also becomes a sub-resolution assist pattern or scattering bar. On the other hand, the auxiliary pattern cannot be too small, and the too small auxiliary pattern will increase the difficulty of mask manufacture, and the cost of the mask is greatly increased.
At the 90nm node, the method is realized by establishing some rules for inserting auxiliary patterns. The rules determine the width of the assistant line, insert the first assistant line when the width period (equal to the distance between two figures, i.e. the sum of the space width between two figures and the line width of one figure) is equal to how much, insert the second assistant line when the width period is more or less, etc. The size and placement position of the auxiliary pattern are determined experimentally by exposure, which is costly. And, as the nodes are further reduced, the accuracy of the method is also poor.
The above information disclosed in this background section is only for enhancement of understanding of the background of the technology described herein and, therefore, it may contain information that does not form the prior art that is already known in this country to a person of ordinary skill in the art.
Disclosure of Invention
The present application mainly aims to provide an auxiliary graph adding method, an auxiliary graph adding device, a storage medium and a processor, so as to solve the problem of low accuracy of a rule-based auxiliary graph insertion method in the prior art.
In order to achieve the above object, according to an aspect of the present application, there is provided an auxiliary graphic adding method including: determining a test graph according to the prefabricated graph, wherein the test graph comprises a main graph and an auxiliary graph, and the auxiliary graph is obtained by a model calculation method; and extracting the adding rule of the auxiliary graph according to at least part of the test graph.
Further, after determining a test pattern from a pre-fabricated pattern, before extracting an addition rule of the auxiliary pattern from at least a part of the test pattern, the addition method further includes: selecting at least part of the test pattern as a processing area.
Further, the selecting at least part of the test pattern as a processing region comprises: detecting whether the auxiliary graph with unknown attribution exists in the test graph, wherein the auxiliary graph with unknown attribution is the auxiliary graph which does not determine the main graph; and if the auxiliary graph which is unknown is present, taking the area comprising the auxiliary graph which is unknown and the adjacent main graph as the processing area.
Further, the detecting whether the auxiliary graph with unknown attribution exists in the test graph comprises: detecting the number of the auxiliary patterns between any two main patterns in the test patterns; and determining that the auxiliary graph with unknown attribution exists when the number of the auxiliary graphs between the two main graphs is an odd number.
Further, the adding rule for extracting the auxiliary graph according to at least part of the test graph is the adding rule for extracting the auxiliary graph according to the processing area, and the adding rule for extracting the auxiliary graph according to the processing area comprises: calculating the distance between the auxiliary graph with unknown attribution in the processing area and each adjacent main graph; and determining the main body graph with the smallest distance to the auxiliary graph which is not attributed as the attribution of the auxiliary graph which is not attributed under the condition that the distance between the auxiliary graph which is not attributed and one main body graph is smallest.
Further, the calculating the distance between the auxiliary graph which belongs to unknown data in the processing area and each adjacent main graph comprises: acquiring the central coordinates of the auxiliary graph which belongs to unknown attributes in the processing area; acquiring the center coordinates of each main figure adjacent to the auxiliary figure with unknown attribution in the processing area; and calculating the distance between the central coordinate of the unknown auxiliary graph and the central coordinate of each main graph to obtain the distance between the unknown auxiliary graph and each adjacent main graph.
Further, the test pattern comprises two pattern layers, wherein one pattern layer is the main pattern, and the other pattern layer is the auxiliary pattern.
In order to achieve the above object, according to an aspect of the present application, there is provided an auxiliary graphic adding apparatus including: the device comprises a determining unit, a processing unit and a processing unit, wherein the determining unit is used for determining a test pattern according to a prefabricated pattern, the test pattern comprises a main pattern and an auxiliary pattern, and the auxiliary pattern is obtained by a model calculation method; and the extraction unit is used for extracting the addition rule of the auxiliary graph according to at least part of the test graph.
According to another aspect of the present application, there is provided a storage medium including a stored program, wherein the program executes any one of the addition methods.
According to another aspect of the application, a processor for running a program is provided, wherein the program runs to perform any one of the adding methods.
By applying the technical scheme of the application, in the method for adding the auxiliary graph, the test graph is determined according to the prefabricated graph, the auxiliary graph in the test graph is obtained through a model calculation method, namely the auxiliary graph in the test graph is the auxiliary graph based on the model, the model calculation method is a method known in the art, the method calculates the imaging contrast of the main graph according to the size and the inserting position of the auxiliary graph, and then continuously adjusts the parameters until the obtained contrast is maximum, at the moment, the size and the inserting position of the corresponding auxiliary graph are the finally determined size and the inserting position, the precision of the auxiliary graph obtained through the method is very high, therefore, the test graph comprising the auxiliary graph is very accurate, and the adding rule extracted according to the test graph is more accurate, so that the auxiliary graph added in the prefabricated graph by using the adding rules is more accurate. The method obtains the adding rule, the auxiliary graph can be added in the prefabricated graph by using the adding rule subsequently, the application speed is high, convenience and simplicity are realized, and the method meets the double requirements of mass production on speed and precision.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this application, illustrate embodiments of the application and, together with the description, serve to explain the application and are not intended to limit the application. In the drawings:
FIG. 1 shows a schematic flow diagram of an embodiment of a method of adding auxiliary graphics according to the present application;
FIG. 2 shows a schematic structural diagram of an embodiment of an auxiliary graphic adding apparatus according to the present application;
FIGS. 3 and 4 are two-dimensional body graphic layouts of the present application;
FIG. 5 shows a layout of a one-dimensional graph of the present application; and
FIG. 6 shows a schematic view of one treatment area of the present application.
Detailed Description
It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict. The present application will be described in detail below with reference to the accompanying drawings in conjunction with embodiments.
In order to make the technical solutions better understood by those skilled in the art, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only partial embodiments of the present application, but not all embodiments. All other embodiments obtained by a person of ordinary skill in the art based on the embodiments in the present application without making any creative effort shall fall within the protection scope of the present application.
It should be noted that the terms "first," "second," and the like in the description and claims of this application and in the drawings described above are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It should be understood that the data so used may be interchanged under appropriate circumstances such that embodiments of the application described herein may be used. Furthermore, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed, but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.
In order to solve the problem of low accuracy of the rule-based auxiliary graph insertion method in the prior art, according to an embodiment of the present application, an auxiliary graph adding method is provided.
Fig. 1 is a flowchart of an auxiliary graphic adding method according to an embodiment of the present application. As shown in fig. 1, the method comprises the steps of:
step S101, determining a test pattern according to a prefabricated pattern, wherein the test pattern comprises a main pattern and an auxiliary pattern, and the auxiliary pattern is obtained through a model calculation method;
step S102, extracting the adding rule of the auxiliary graph according to at least part of the test graph.
In the method for adding the auxiliary graph, the test graph is determined according to the prefabricated graph, the auxiliary graph in the test graph is obtained through a model calculation method, namely the auxiliary graph in the test graph is the auxiliary graph based on the model, the model calculation method is a method known in the art, the imaging contrast of the main graph is calculated according to the size and the inserting position of the auxiliary graph, then the parameters are continuously adjusted until the obtained contrast is maximum, at the moment, the size and the inserting position of the corresponding auxiliary graph are the finally determined size and the inserting position, and the precision of the auxiliary graph obtained through the method is very high, so that the test graph comprising the auxiliary graph is very accurate, the adding rule extracted according to the test graph is more accurate, and the auxiliary graph added in the prefabricated graph by using the adding rule subsequently is more accurate. The method obtains the adding rule, the auxiliary graph can be added in the prefabricated graph by using the adding rule subsequently, the application speed is high, convenience and simplicity are realized, and the method meets the double requirements of mass production on speed and precision.
In the present application, the auxiliary patterns are all sub-resolution auxiliary patterns unless otherwise specified.
In a specific embodiment, the determining the test pattern from the pre-fabricated pattern includes: determining a main body graph according to the prefabricated graph; and determining the auxiliary graph according to the main graph.
In an actual application process, the test pattern generally includes a plurality of main patterns and a plurality of auxiliary patterns, if the whole test pattern is directly used to extract the addition rule, the workload is large, and in order to reduce the workload in extracting the rule, in an embodiment of the present application, after determining the test pattern according to the pre-fabricated pattern, before extracting the addition rule of the auxiliary pattern according to at least part of the test pattern, the addition method further includes: at least part of the test pattern is selected as a processing region.
With the processing region extraction addition rule, the processing region should be a region including the main body graphic and the auxiliary graphic, and any region including the main body graphic and the auxiliary graphic may be selected as the processing region in an actual application process. In order to extract more accurate and comprehensive adding rules, in an embodiment of the application, the selecting at least part of the test pattern as the processing area includes: detecting whether the auxiliary pattern with unknown attribution exists in the test pattern, wherein the auxiliary pattern with unknown attribution is the auxiliary pattern which does not determine the main pattern to which the auxiliary pattern belongs; when the auxiliary pattern of unknown attribute exists, the area including the auxiliary pattern of unknown attribute and the adjacent main pattern is used as the processing area.
On the basis of including attributive unclear auxiliary patterns and corresponding main patterns, the size of the processing area can be determined according to actual conditions, and the processing area can be expanded to the periphery by more than 50nm on the basis of the area which just includes attributive unclear auxiliary patterns and corresponding main patterns, so that more main patterns can be included, and the main patterns to which the attributive unclear auxiliary patterns belong can be more accurately determined.
In the application process, which auxiliary graphics are unknown auxiliary graphics need to be judged, in the actual processing process, the judgment can be carried out by naked eyes, and when one auxiliary graphic looks as if the distances between the auxiliary graphic and the main graphics are all about, the auxiliary graphic can be determined to be the unknown auxiliary graphic.
Of course, the determination may also be made by other methods, and in a specific embodiment, the detecting whether the auxiliary pattern with unknown attribution exists in the test pattern includes: detecting the number of the auxiliary patterns between any two main patterns in the test patterns; when the number of the auxiliary patterns between two main patterns is an odd number, it is determined that there is an auxiliary pattern whose attribution is unknown.
In a case where an addition rule is extracted according to a processing area after the processing area is selected, in an embodiment of the present application, the extracting the addition rule of the auxiliary graphic according to the processing area includes: calculating the distance between the auxiliary pattern whose attribution is unknown in the processing area and each of the adjacent main patterns; and under the condition that the distance between the auxiliary graph which is unknown and one of the main graphs is the smallest, determining that the main graph which is the smallest in distance from the auxiliary graph which is unknown is the attribution of the auxiliary graph which is unknown, and taking the parameters of the auxiliary graph which is unknown, the corresponding main graph and the distance between the auxiliary graph and the main graph as an adding rule, wherein the parameters comprise the shape and the size of the auxiliary graph. The adding rule obtained in the embodiment is more comprehensive, more accurate and faster.
Of course, the attribution of the auxiliary graph with unknown attribution of the present application can also adopt other methods, such as confirming the attribution of the SRAF by using the light intensity distribution/gray scale/space map (identity map) of the local main body graph, and the specific process includes the following steps: with further development of the technology, the auxiliary graphic can be played to which is automatically inserted by the model calculation method. The imaging contrast of the main pattern (the portion other than the auxiliary pattern) is calculated based on the size of the SRAF and the position of the insertion, and then these parameters are continuously adjusted until the maximum calculation result of the distance variation is obtained. In this process, a limitation is placed on the size of the auxiliary pattern to ensure that the final result meets the mask preparation requirements. But this method is slow.
In an embodiment of the present application, the calculating a distance between an unaffiliated auxiliary pattern and each adjacent main pattern may be performed by any method in the prior art, and the calculating a distance between an unaffiliated auxiliary pattern and each adjacent main pattern in the processing area includes: acquiring the central coordinate of the auxiliary graph with unknown attribution in the processing area; acquiring the center coordinates of each main figure adjacent to the auxiliary figure with unknown attribution in the processing area; the distance between the center coordinate of the unaffiliated auxiliary pattern and the center coordinate of each main pattern is calculated to obtain the distance between the unaffiliated auxiliary pattern and each adjacent main pattern.
Of course, in the present application, the distance between the main graphic and the auxiliary graphic of unknown attribution may not be calculated, or the distance between the centers of the main graphic and the auxiliary graphic may not be calculated, or the distance between the boundaries of the main graphic and the auxiliary graphic may be calculated.
In an actual application process, in order to separate the auxiliary graphic from the main graphic, so that it can be easily distinguished which graphic is the auxiliary graphic and which is the main graphic in the subsequent process, thereby simplifying the adding method, in a specific embodiment of the present application, the test graphic includes two graphic layers, one of which is the main graphic and the other is the auxiliary graphic.
Of course, the test pattern of the present application is not limited to include two pattern layers, and may also include more than two pattern layers, and specifically, when there are three or more auxiliary patterns, the test pattern may include three or more pattern layers.
Of course, the test pattern of the present application is not limited to include a plurality of pattern layers, and may have only one pattern layer, and the auxiliary pattern and the main pattern may be distinguished by different pattern fills, or may be distinguished by size when the size difference between the auxiliary pattern and the main pattern is large.
It should be noted that the steps illustrated in the flowcharts of the figures may be performed in a computer system such as a set of computer-executable instructions and that, although a logical order is illustrated in the flowcharts, in some cases, the steps illustrated or described may be performed in an order different than presented herein.
The embodiment of the present application further provides an auxiliary graph adding device, and it should be noted that the auxiliary graph adding device of the embodiment of the present application can be used for executing the auxiliary graph adding method provided by the embodiment of the present application. The following describes an auxiliary graphic adding apparatus provided in an embodiment of the present application.
Fig. 2 is a schematic diagram of an auxiliary graphic adding apparatus according to an embodiment of the present application. As shown in fig. 2, the apparatus includes:
a determining unit 10, configured to determine a test pattern according to a pre-fabricated pattern, where the test pattern includes a main pattern and an auxiliary pattern, and the auxiliary pattern is obtained through a model calculation method;
an extracting unit 20, configured to extract an adding rule of the auxiliary pattern according to at least a part of the test pattern.
In the above-mentioned device for adding an auxiliary pattern, the determining unit determines a test pattern according to a pre-made pattern, the auxiliary pattern in the test pattern is obtained by a model calculation method, that is, the auxiliary pattern in the test pattern is a model-based auxiliary pattern, the model calculation method is a method known in the art, the method calculates the imaging contrast of the main pattern according to the size and the insertion position of the auxiliary pattern, and then continuously adjusts the parameters until the obtained contrast is maximum, at this time, the size and the insertion position of the corresponding auxiliary pattern are the finally determined size and insertion position, and the precision of the auxiliary pattern obtained by the device is very high, so that the test pattern including the auxiliary pattern is very accurate, and the adding rule extracted by the extracting unit according to the test pattern is more accurate, so that the auxiliary pattern subsequently added in the pre-made pattern by using the adding rules is more accurate. And the device obtains the adding rule, and the auxiliary graph can be added in the prefabricated graph subsequently by using the adding rule, so that the application speed is high, convenience and simplicity are realized, and the device meets the dual requirements of mass production on speed and precision.
In an actual application process, the test pattern generally includes a plurality of main patterns and a plurality of auxiliary patterns, if the whole test pattern is directly used to extract the addition rule, the workload is large, and in order to reduce the workload in extracting the rule, in an embodiment of the application, the addition apparatus further includes a selection unit, and the selection unit is configured to select at least part of the test pattern as a processing region.
With the processing region extraction addition rule, the processing region should be a region including the main body graphic and the auxiliary graphic, and any region including the main body graphic and the auxiliary graphic may be selected as the processing region in an actual application process. In order to extract more accurate and comprehensive adding rules, in an embodiment of the present application, the selecting unit includes a detecting module and a determining module, where the detecting module is configured to detect whether the auxiliary pattern with unknown attribution exists in the test pattern, and the auxiliary pattern with unknown attribution is the auxiliary pattern without determining the main pattern to which the auxiliary pattern belongs; the determination module is configured to, when the auxiliary pattern of unknown attribution exists, use an area including the auxiliary pattern of unknown attribution and the adjacent main pattern as the processing area.
In the application process, which auxiliary patterns are unknown auxiliary patterns need to be judged, in the actual processing process, the judgment can be carried out through naked eyes, and when one auxiliary pattern looks as much as the distances between the auxiliary pattern and the main patterns, the auxiliary pattern can be determined to be the unknown auxiliary pattern.
Certainly, the determination may also be made by other devices, in a specific embodiment, the detection module includes a detection sub-module and a determination sub-module, and the detection sub-module is configured to detect the number of the auxiliary patterns between any two of the main patterns in the test patterns; the determination submodule is configured to determine that the auxiliary pattern of unknown attribute exists when the number of the auxiliary patterns between two main patterns is odd.
In a case where the selection unit is included, the extraction unit is configured to extract the addition rule according to the processing area, in an embodiment of the present application, the extraction unit includes a calculation module and an attribution determination module, and the calculation module is configured to calculate a distance between the auxiliary graph whose attribution is unknown in the processing area and each of the adjacent main graphs; the attribution determining module is used for determining that the main body graph with the smallest distance with the unknown auxiliary graph is attributive to the unknown auxiliary graph under the condition that the distance between the unknown auxiliary graph and one main body graph is the smallest, and taking the parameters of the unknown auxiliary graph and the corresponding main body graph and the distance between the unknown auxiliary graph and the corresponding main body graph as an adding rule, wherein the parameters comprise the shape and the size of the auxiliary graph. The adding rule obtained in the embodiment is more comprehensive, more accurate and faster.
Of course, the assignment of the auxiliary pattern with unknown assignment determination of the present application may also adopt other modules, such as using the light intensity distribution/gray scale/space map (identity map) of the local main body pattern to confirm the assignment of the SRAF, but the device speed is relatively slow.
In an embodiment of the present application, the calculation module includes an obtaining sub-module and a calculation sub-module, where the obtaining sub-module is configured to obtain a center coordinate of the unknown auxiliary graph in the processing region and is further configured to obtain a center coordinate of each main graph in the processing region adjacent to the unknown auxiliary graph; the calculation submodule is used for calculating the distance between the center coordinate of the auxiliary graph which is unknown to be belonged and the center coordinate of each main graph, and obtaining the distance between the auxiliary graph which is unknown to be belonged and each main graph which is adjacent to the auxiliary graph.
Of course, the distance between the main graphic and the unknown auxiliary graphic may be calculated by selecting an appropriate device according to actual conditions.
In an actual application process, in order to separate the auxiliary pattern from the main pattern, so that it can be easily distinguished which pattern is the auxiliary pattern and which is the main pattern in the subsequent process, thereby simplifying the adding device, in a specific embodiment of the present application, the test pattern includes two pattern layers, one of which is the main pattern and the other is the auxiliary pattern.
Of course, the test pattern of the present application is not limited to include two pattern layers, and may also include more than two pattern layers, and specifically, when there are three or more auxiliary patterns, the test pattern may include three or more pattern layers.
Of course, the test pattern of the present application is not limited to include a plurality of pattern layers, and may have only one pattern layer, and the auxiliary pattern and the main pattern may be distinguished by different pattern fills, or may be distinguished by size when the size difference between the auxiliary pattern and the main pattern is large.
Note that the pre-formed pattern in the present application is a pattern to be formed in a certain process step of the device.
In order to make the technical solutions of the present application more clearly understood by those skilled in the art, the technical solutions of the present application will be described below with reference to specific embodiments.
Examples
The method for adding the auxiliary graph specifically comprises the following steps:
in a first step, a basic regular body figure is designed based on a preform.
In this step, the center point and side length of each main body pattern 11, the line width of the line and the repetition period are specified first, and output to a certain layer of the layout, as shown in fig. 3, and fig. 4 is another design scheme of a conventional two-dimensional main body pattern 11.
If the one-dimensional pattern is to be subjected to the auxiliary pattern extraction, the one-dimensional body pattern 11 may be designed as shown in fig. 5.
And secondly, adding an accurate auxiliary graph for the main graph by using an auxiliary graph adding method based on a model.
In the step, the software sets some limiting conditions for the size of Sub-Resolution-Assist-Feature (SRAF) to ensure that the final result can meet the requirement of mask preparation; then the imaging contrast of the subject figure is calculated by the size and insertion position of the SRAF, and these parameters are continuously adjusted until the maximum contrast is obtained. And the final main body graph and the SRAF are respectively output to different layout layers.
And thirdly, selecting a processing area with reasonable size, namely a processing window.
Some SRAFs are common to two subject graphs, and are not easy to handle because they encounter problems in the extraction process of the addition rule. Therefore, it is necessary to select a region including an auxiliary pattern whose assignment is unknown as a processing region for subsequent calculation, that is, a region including an auxiliary pattern whose assignment is unknown, as the processing region, and to appropriately extend the region to the periphery by 200nm or more, so that the range of the main pattern which may be corresponded can be wider. In the processing area shown in fig. 6, the dotted line frame is an area including the unknown auxiliary graphic 12, and the rest is an expanded area.
And fourthly, extracting the coordinates of the center point of each SRAF and the main figure.
The coordinates of the center point of each SRAF and the coordinates of the center point of each subject figure within the processing window are extracted.
The distance to each subject figure is calculated for each SRAF. Taking an SRAF within the processing window as an example, the distance between the SRAF and the center coordinate point of each subject figure is calculated. The selection order of the body graphics may follow a rule from left to right, from bottom to top. And finding the main body graph corresponding to the SRAF minimum distance, namely the main body graph is the main body graph to which the SRAF belongs. If there are multiple main body patterns corresponding to the minimum distance, each main body pattern can completely own the SRAF.
The above operation is repeated for each SRAF, so that the SRAFs to be resolved within the dotted line all find the subject graph to which they should belong.
The auxiliary graph adding device comprises a processor and a memory, the determining unit, the extracting unit and the like are stored in the memory as program units, and the processor executes the program units stored in the memory to realize corresponding functions.
The processor comprises a kernel, and the kernel calls the corresponding program unit from the memory. The kernel can be set to be one or more, and the adding speed and the adding precision of the auxiliary graph are improved by adjusting the kernel parameters.
The memory may include volatile memory in a computer readable medium, random Access Memory (RAM) and/or non-volatile memory, such as Read Only Memory (ROM) or flash memory (flash RAM), including at least one memory chip.
An embodiment of the present invention provides a storage medium, on which a program is stored, and the program implements the above-described auxiliary graph adding method when executed by a processor.
The embodiment of the invention provides a processor, which is used for running a program, wherein the auxiliary graph adding method is executed when the program runs.
The embodiment of the invention provides equipment, which comprises a processor, a memory and a program which is stored on the memory and can run on the processor, wherein the processor executes the program and realizes the following steps:
step S101, determining a test pattern according to a prefabricated pattern, wherein the test pattern comprises a main pattern and an auxiliary pattern, and the auxiliary pattern is obtained by a model calculation method;
step S102, extracting the adding rule of the auxiliary graph according to at least part of the test graph.
The device herein may be a server, a PC, a PAD, a mobile phone, etc.
The present application further provides a computer program product adapted to perform a program for initializing the following method steps when executed on a data processing device:
step S101, determining a test pattern according to a prefabricated pattern, wherein the test pattern comprises a main pattern and an auxiliary pattern, and the auxiliary pattern is obtained by a model calculation method;
step S102, extracting the adding rule of the auxiliary graph according to at least part of the test graph.
As will be appreciated by one skilled in the art, embodiments of the present application may be provided as a method, system, or computer program product. Accordingly, the present application may take the form of an entirely hardware embodiment, an entirely software embodiment or an embodiment combining software and hardware aspects. Furthermore, the present application may take the form of a computer program product embodied on one or more computer-usable storage media (including, but not limited to, disk storage, CD-ROM, optical storage, and the like) having computer-usable program code embodied therein.
The present application is described with reference to flowchart illustrations and/or block diagrams of methods, apparatus (systems), and computer program products according to embodiments of the application. It will be understood that each flow and/or block of the flowchart illustrations and/or block diagrams, and combinations of flows and/or blocks in the flowchart illustrations and/or block diagrams, can be implemented by computer program instructions. These computer program instructions may be provided to a processor of a general purpose computer, special purpose computer, embedded processor, or other programmable data processing apparatus to produce a machine, such that the instructions, which execute via the processor of the computer or other programmable data processing apparatus, create means for implementing the functions specified in the flowchart flow or flows and/or block diagram block or blocks.
These computer program instructions may also be stored in a computer-readable memory that can direct a computer or other programmable data processing apparatus to function in a particular manner, such that the instructions stored in the computer-readable memory produce an article of manufacture including instruction means which implement the function specified in the flowchart flow or flows and/or block diagram block or blocks.
These computer program instructions may also be loaded onto a computer or other programmable data processing apparatus to cause a series of operational steps to be performed on the computer or other programmable apparatus to produce a computer implemented process such that the instructions which execute on the computer or other programmable apparatus provide steps for implementing the functions specified in the flowchart flow or flows and/or block diagram block or blocks.
In a typical configuration, a computing device includes one or more processors (CPUs), input/output interfaces, network interfaces, and memory.
The memory may include forms of volatile memory in a computer readable medium, random Access Memory (RAM) and/or non-volatile memory, such as Read Only Memory (ROM) or flash memory (flash RAM). The memory is an example of a computer-readable medium.
Computer-readable media, including both permanent and non-permanent, removable and non-removable media, may implement the information storage by any method or technology. The information may be computer readable instructions, data structures, modules of a program, or other data. Examples of computer storage media include, but are not limited to, phase change memory (PRAM), static Random Access Memory (SRAM), dynamic Random Access Memory (DRAM), other types of Random Access Memory (RAM), read Only Memory (ROM), electrically Erasable Programmable Read Only Memory (EEPROM), flash memory or other memory technology, compact disc read only memory (CD-ROM), digital Versatile Discs (DVD) or other optical storage, magnetic cassettes, magnetic tape magnetic disk storage or other magnetic storage devices, or any other non-transmission medium that can be used to store information that can be accessed by a computing device. As defined herein, a computer readable medium does not include a transitory computer readable medium such as a modulated data signal and a carrier wave.
It should also be noted that the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrases "comprising a," "8230," "8230," or "comprising" does not exclude the presence of additional identical elements in the process, method, article, or apparatus comprising the element.
As will be appreciated by one skilled in the art, embodiments of the present application may be provided as a method, system, or computer program product. Accordingly, the present application may take the form of an entirely hardware embodiment, an entirely software embodiment or an embodiment combining software and hardware aspects. Furthermore, the present application may take the form of a computer program product embodied on one or more computer-usable storage media (including, but not limited to, disk storage, CD-ROM, optical storage, and the like) having computer-usable program code embodied therein.
From the above description, it can be seen that the above-described embodiments of the present application achieve the following technical effects:
1) According to the method for adding the auxiliary graph, the test graph is determined according to the prefabricated graph, the auxiliary graph in the test graph is obtained through a model calculation method, namely the auxiliary graph in the test graph is the auxiliary graph based on the model, the model calculation method is a method known in the art, the method calculates the imaging contrast of a main graph according to the size and the inserting position of the auxiliary graph, then the parameters are continuously adjusted until the obtained contrast is maximum, at the moment, the size and the inserting position of the corresponding auxiliary graph are the finally determined size and the inserting position, the precision of the auxiliary graph obtained through the method is very high, therefore, the test graph comprising the auxiliary graph is very accurate, the adding rule extracted according to the test graph is more accurate, and the auxiliary graph added in the prefabricated graph by the adding rules is more accurate. The method obtains the adding rule, the auxiliary graph can be added in the prefabricated graph by utilizing the adding rule subsequently, the application speed is high, convenience and simplicity are realized, and the method meets the double requirements of mass production on speed and precision.
2) In the auxiliary graph adding device, firstly, the determining unit determines a test graph according to a prefabricated graph, the auxiliary graph in the test graph is obtained through a model calculation method, namely the auxiliary graph in the test graph is the auxiliary graph based on a model, the model calculation method is a method known in the art, the method calculates the imaging contrast of a main graph according to the size and the insertion position of the auxiliary graph, and then continuously adjusts the parameters until the obtained contrast is maximum, at the moment, the size and the insertion position of the corresponding auxiliary graph are the finally determined size and insertion position, the precision of the auxiliary graph obtained by the device is very high, therefore, the test graph comprising the auxiliary graph is also very accurate, and further, the extracting unit extracts more accurate adding rules according to the test graph, so that the auxiliary graph added in the prefabricated graph by using the adding rules is more accurate. The device obtains the adding rule, the auxiliary graph can be added in the prefabricated graph by utilizing the adding rule subsequently, the application speed is high, convenience and simplicity are realized, and the device meets the dual requirements of mass production on speed and precision.
The above description is only a preferred embodiment of the present application and is not intended to limit the present application, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, improvement and the like made within the spirit and principle of the present application shall be included in the protection scope of the present application.
Claims (8)
1. An auxiliary graphic adding method, comprising:
determining a test graph according to the prefabricated graph, wherein the test graph comprises a main graph and an auxiliary graph, and the auxiliary graph is obtained by a model calculation method;
extracting an adding rule of the auxiliary pattern according to at least part of the test pattern,
after determining a test pattern from a pre-fabricated pattern, before extracting an addition rule of the auxiliary pattern from at least a part of the test pattern, the addition method further includes:
selecting at least part of the test pattern as a processing region,
the selecting at least part of the test patterns as a processing area comprises:
detecting whether the auxiliary graph with unknown attribution exists in the test graph, wherein the auxiliary graph with unknown attribution is the auxiliary graph which does not determine the main graph;
and if the auxiliary graph which is unknown is present, taking the area comprising the auxiliary graph which is unknown and the adjacent main graph as the processing area.
2. The adding method according to claim 1, wherein the detecting whether the auxiliary pattern of unknown attribution exists in the test patterns comprises:
detecting the number of the auxiliary patterns between any two main patterns in the test patterns;
and determining that the auxiliary graph with unknown attribution exists when the number of the auxiliary graphs between the two main graphs is an odd number.
3. The adding method according to claim 1, wherein the adding rule for extracting the auxiliary pattern according to at least part of the test pattern is an adding rule for extracting the auxiliary pattern according to the processing region, and the extracting the auxiliary pattern according to the processing region includes:
calculating the distance between the auxiliary graph which belongs to unknown places in the processing area and each adjacent main graph;
and determining the main body graph with the smallest distance to the auxiliary graph which is not attributed as the attribution of the auxiliary graph which is not attributed under the condition that the distance between the auxiliary graph which is not attributed and one main body graph is smallest.
4. The adding method according to claim 3, wherein the calculating of the distance between the auxiliary pattern of which attribution is unknown in the processing area and each of the adjacent main body patterns comprises:
acquiring the central coordinates of the auxiliary graph which belongs to unknown attributes in the processing area;
acquiring the center coordinates of each main figure adjacent to the auxiliary figure with unknown attribution in the processing area;
and calculating the distance between the central coordinate of the unaffiliated auxiliary graph and the central coordinate of each main graph to obtain the distance between the unaffiliated auxiliary graph and each adjacent main graph.
5. The adding method according to any one of claims 1 to 4, wherein the test pattern includes two pattern layers, one of which is the main pattern and the other of which is the auxiliary pattern.
6. An auxiliary graphic adding apparatus, comprising:
the device comprises a determining unit, a calculating unit and a processing unit, wherein the determining unit is used for determining a test graph according to a prefabricated graph, the test graph comprises a main graph and an auxiliary graph, and the auxiliary graph is obtained through a model calculation method;
an extracting unit, configured to extract an adding rule of the auxiliary pattern according to at least a part of the test pattern, where the adding device further includes:
a selection unit that selects at least a part of the test pattern as a processing region,
the selection unit includes:
the detection module is used for detecting whether the auxiliary graph with unknown attribution exists in the test graph, wherein the auxiliary graph with unknown attribution is the auxiliary graph which is not determined to belong to the main graph;
and the determining module is used for taking an area comprising the auxiliary graph which is unknown in attribution and the adjacent main graph as the processing area under the condition that the auxiliary graph which is unknown in attribution exists.
7. A storage medium characterized by comprising a stored program, wherein the program executes the addition method of any one of claims 1 to 5.
8. A processor, characterized in that the processor is configured to run a program, wherein the program when running performs the adding method of any one of claims 1 to 5.
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104090468A (en) * | 2014-07-31 | 2014-10-08 | 上海华力微电子有限公司 | Method for optimizing exposure auxiliary graph |
| CN107065430A (en) * | 2017-03-10 | 2017-08-18 | 上海集成电路研发中心有限公司 | A kind of rule-based Sub-resolution assist features adding method |
| CN107490931A (en) * | 2016-06-12 | 2017-12-19 | 中芯国际集成电路制造(上海)有限公司 | The modification method of mask plate patterns |
| CN108333865A (en) * | 2017-01-18 | 2018-07-27 | 中芯国际集成电路制造(上海)有限公司 | The modification method of mask plate patterns |
| CN108828896A (en) * | 2018-05-31 | 2018-11-16 | 中国科学院微电子研究所 | Add the application of the method and this method of Sub-resolution assist features |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20170053058A1 (en) * | 2015-08-21 | 2017-02-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Model-based rule table generation |
-
2019
- 2019-05-17 CN CN201910413379.1A patent/CN110221516B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104090468A (en) * | 2014-07-31 | 2014-10-08 | 上海华力微电子有限公司 | Method for optimizing exposure auxiliary graph |
| CN107490931A (en) * | 2016-06-12 | 2017-12-19 | 中芯国际集成电路制造(上海)有限公司 | The modification method of mask plate patterns |
| CN108333865A (en) * | 2017-01-18 | 2018-07-27 | 中芯国际集成电路制造(上海)有限公司 | The modification method of mask plate patterns |
| CN107065430A (en) * | 2017-03-10 | 2017-08-18 | 上海集成电路研发中心有限公司 | A kind of rule-based Sub-resolution assist features adding method |
| CN108828896A (en) * | 2018-05-31 | 2018-11-16 | 中国科学院微电子研究所 | Add the application of the method and this method of Sub-resolution assist features |
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