CN110184572A - A method of preparing sterilizing membrane on glass - Google Patents

A method of preparing sterilizing membrane on glass Download PDF

Info

Publication number
CN110184572A
CN110184572A CN201910500507.6A CN201910500507A CN110184572A CN 110184572 A CN110184572 A CN 110184572A CN 201910500507 A CN201910500507 A CN 201910500507A CN 110184572 A CN110184572 A CN 110184572A
Authority
CN
China
Prior art keywords
workpiece
target
silver
glass
coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201910500507.6A
Other languages
Chinese (zh)
Other versions
CN110184572B (en
Inventor
麦世枝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to CN201910500507.6A priority Critical patent/CN110184572B/en
Publication of CN110184572A publication Critical patent/CN110184572A/en
Application granted granted Critical
Publication of CN110184572B publication Critical patent/CN110184572B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/008—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/155—Deposition methods from the vapour phase by sputtering by reactive sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Composite Materials (AREA)
  • Physical Vapour Deposition (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)

Abstract

The present invention is a kind of method that sterilizing membrane is prepared on glass, it is not required to increase temperature using the technical program whole process and plated film under the premise of not damaging glass, acetylene gas progress carrier layer is reused after being coated with using silicon target and carrier of oxygen progress basement membrane layer to be coated with, the main component of glass includes a large amount of silicon atom, there is good binding force with the silicon atom in plated film, after the completion of basement membrane layer and carrier layer are coated with, carrier layer is maintained to start and silver target sputtering is added, it is evenly distributed on the silver with bactericidal effect in silicon carbide film layer, form the sterilizing membrane with bactericidal effect, in addition workpiece is hung on hanger in coating process, workpiece revolves while rotation, keep sputtering process film forming uniform, and it can be avoided the excessively high disfiguring workpiece of local temperature.Health, environmental protection, the effect of not only having retained the various characteristics of bare glass, external form and played sterilization, production is more convenient, and equipment investment is smaller, is widely used.

Description

A method of preparing sterilizing membrane on glass
Technical field
The present invention relates to the technical field of glass evacuated plated film, especially a kind of side that sterilizing membrane is prepared in glass pieces Method.
Background technique
Glass articles such as electronic curtain are all suitable regardless of the application in mobile phone, computer, TV, automobile or other industries Extensively, make we work or life in critically important a part, these intelligentized electronic products can generate a large amount of Electrostatic Absorption.The generation of electrostatic charge can adsorb dust and bacterium in air, and the long-term accumulation of dust is growing for bacterium The favorable environment of offer if things go on like this influences the health of people.One scientific investigations showed that, the grape ball carried on mobile phone The bacteriums such as bacterium, Escherichia coli are 18 times of closestool.Therefore, it is necessary to often to carrying out surface cleaning in electronic product glass pieces, Removal is adsorbed on dust and the bacterium on electronic product surface due to electrostatic.And the screen of mobile phone, TV, computer be even more dust and The breeding ground of bacterium, and due to the particularity of its material, simple wiping can not usually thoroughly remove dust on screen and Bacterium, or even screen can be damaged for a long time, it is necessary to it is cleaned using special detergent, the detergent in modern market The dirt that can only simply clear screen can not prevent the pernicious gases such as bacterium, virus, stink and substance smelly and breed out Bacterium sucks the problem of human body, therefore it is desirable to have a kind of glass electronics that effective sterilization mode protection people use Screen.
Summary of the invention
The main object of the present invention is to overcome the deficiencies in the prior art, provides a kind of prepare on electronic curtain and kills The method of mycoderm is solved because using electronic curtain to be easy to cause the pernicious gases such as bacterium, virus, stink and substance smelly and breed The problem of bacterium out sucks human body and is detrimental to health.
To achieve the above object, according to present invention provide the technical scheme that described prepare on electronic glass screen is killed The method of mycoderm includes the following steps:
(1) it pre-processes: by workpiece is clean and low temperature dries up；
(2) be vacuum-treated: pretreated workpiece is put hanger and is put into vacuum drying oven, loads bias, vacuum to metal hanging rack 5.0x10 is vacuumized in furnace-3Pa starts turntable, rotates workpiece on hanger, while hanger rotates in vacuum drying oven；
(3) base film layer is coated with: being opened power supply and is adjusted to 30-40V, duty ratio 20%-30%, being passed through argon gas reaches vacuum degree 2.0x10-2Pa, starting silicon target and oxygen, the oxygen being passed through makes vacuum degree reach 3.0x10-2Pa makes workpiece surface form oxidation Silicon base film layer；
(4) carrier layer is coated with: being kept silicon target and is closed oxygen, reduces argon flow, be passed through acetylene gas, form workpiece surface The carrier layer of silicon carbide；
(5) sterilization film layer is coated with: being kept silicon target sputtering, is continued to be passed through acetylene gas, while starting silver target sputtering in workpiece surface Form the sterilization film layer that silicon carbide and silver are made into；
(6) plated film is completed: first being closed silicon target and silver-colored target, is then shut off all gas, cooled down to 5-10 minutes, then by vacuum drying oven Segmentation is dropped a hint to atmospheric pressure, is taken out workpiece and is completed plated film.In whole coating process, the water-cooling system normal operation of vacuum drying oven, The temperature of overall process can be controlled at 100 DEG C hereinafter, completing plated film in the case where not damaging screen workpiece.In addition, work Part is placed on hanger and rotates, and hanger rotates on vacuum drying oven, so that workpiece carries out rotation and revolution simultaneously in coating process, Therefore workpiece even film layer and can be avoided local coating process since target as sputter heating is excessive in coating process, damage Workpiece.Pumping removes the carbon atom in remaining acetylene, avoids carbon atom from adhering to and sterilizes film layer, influences to sterilize Film color.
As a further solution of the present invention, workpiece cleaning is glass cleaner cleaning or ultrasonic wave in the step (1) One of cleaning, drying temperature are no more than 100 DEG C.To workpiece cleaned there are many mode, keep workpiece before plated film Clean and dry surface, conducive to the binding force for improving film layer, to improve the coating quality of sterilizing membrane.
As a further solution of the present invention, metal hanging rack loads bias-200-- 300V in the step (2).
As a further solution of the present invention, the flow of argon gas is 100-250sccm in the step (3), and target current is 10A, electroplating time are 2-10 minutes.
As a further solution of the present invention, argon flow is reduced to 40-80sccm, acetylene gas in the step (5) Flow is 150-250sccm, and it is 1-5 minutes that acetylene gas, which is passed through the time,.
As a further solution of the present invention, the target current of silver-colored target is 0.5-1A in rapid (5), and the silver target sputtering time is 1-4 minutes.
In conclusion carrying out being coated with for sterilizing membrane in glass pieces using above-mentioned technical proposal, whole process is not required to add Chemical treatment, the plated film under the premise of table for not damaging glass is seen close oxygen after being coated with using silicon target and oxygen progress basement membrane layer Gas and carry out carrier layer using acetylene and be coated with, the main component of glass includes that the silicon of a large amount of silicon atom and plated film content has It after the completion of good binding force, basement membrane layer and carrier layer are coated with, maintain carrier layer operation and silver target sputtering is added, make to have and kill The silver of bacterium effect is evenly distributed in silicon carbide film layer, forms the sterilizing membrane with bactericidal effect, in addition the work in coating process Part is hung on hanger, and workpiece revolves while rotation, makes sputtering process film forming uniformly, and it is excessively high to can be avoided local temperature Disfiguring workpiece.Health, environmental protection, the effect of not only having retained the various characteristics of primary electron screen, external form and played sterilization, make compared with For convenience, equipment investment is smaller, is widely used.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other Embodiment shall fall within the protection scope of the present invention.
A method of it preparing sterilizing membrane on electronic curtain, includes the following steps:
(1) it pre-processes: by workpiece is clean and low temperature dries up；
(2) be vacuum-treated: pretreated workpiece is put hanger and is put into vacuum drying oven, loads bias, vacuum to metal hanging rack 5.0x10 is vacuumized in furnace-3Pa starts turntable, rotates workpiece on hanger, while hanger rotates in vacuum drying oven；
(3) base film layer is coated with: being opened power supply and is adjusted to 30-40V, duty ratio 20%-30%, being passed through argon gas reaches vacuum degree 2.0x10-2Pa, starting silicon target and oxygen, the oxygen being passed through makes vacuum degree reach 3.0x10-2Pa makes workpiece surface form oxidation Silicon base film layer；
(4) carrier layer is coated with: being kept silicon target and is closed oxygen, reduces argon flow, be passed through acetylene gas, form workpiece surface The carrier layer of silicon carbide；
(5) sterilization film layer is coated with: being kept silicon target sputtering, is continued to be passed through acetylene gas, while starting silver target sputtering in workpiece surface Form the sterilization film layer that silicon carbide and silver are made into；
(6) plated film is completed: first being closed silicon target and silver-colored target, is then shut off all gas, cooled down to 5-10 minutes, then by vacuum drying oven Segmentation is dropped a hint to atmospheric pressure, is taken out workpiece and is completed plated film.In whole coating process, the water-cooling system normal operation of vacuum drying oven, The temperature of overall process can be controlled at 100 DEG C hereinafter, completing plated film in the case where not damaging screen workpiece.In addition, work Part is placed on hanger and rotates, and hanger rotates on vacuum drying oven, so that workpiece carries out rotation and revolution simultaneously in coating process, Therefore workpiece even film layer and can be avoided local coating process since target as sputter heating is excessive in coating process, damage Workpiece.Pumping removes the carbon atom in remaining acetylene, avoids carbon atom from adhering to and sterilizes film layer, influences to sterilize Film color.
Workpiece cleaning is screen detergent cleaning or supersonic cleaning in the step (1) in one of the embodiments, One of, drying temperature is no more than 100 DEG C.To workpiece cleaned there are many mode, so that workpiece is kept clean before plated film Dry surface, conducive to the binding force for improving film layer, to improve the coating quality of sterilizing membrane.
Metal hanging rack loads bias-200-- 300V in the step (2) in one of the embodiments,.
In one of the embodiments, in the step (3) argon gas flow be 100-250sccm, target current 10A, Electroplating time is 2-10 minutes.Electroplating time can control the thickness of basement membrane layer, and electroplating time is short, can generate transparent Huang Color plated film, the time lengthens film layer thickening, and then film layer can decline at coffee color and transparency, require be plated according to specific product plated film The control of film time.
Argon flow is reduced to 40-80sccm, acetylene gas flow in the step (5) in one of the embodiments, For 150-250sccm, it is 1-5 minutes that acetylene gas, which is passed through the time,.
The target current of silver-colored target is 0.5-1A in the step (5) in one of the embodiments, and the silver target sputtering time is 1- 4 minutes.
Embodiment 1
A method of it preparing sterilizing membrane on glass, includes the following steps:
(1) pre-process: glass pieces are clean and dry up under the conditions of 50 DEG C, and workpiece cleaning is that glass cleaner cleans；
(2) be vacuum-treated: pretreated workpiece is put hanger and is put into vacuum drying oven, loads bias -200V to metal hanging rack, 5.0x10 is vacuumized in vacuum drying oven-3Pa starts turntable, rotates workpiece on hanger, while hanger rotates in vacuum drying oven；
(3) base film layer is coated with: being opened power supply and is adjusted to 30V, duty ratio 20%, being passed through the argon gas that flow is 100sccm makes vacuum Degree reaches 2.0x10-2Pa, starting starting silicon target and oxygen, the oxygen being passed through make vacuum degree reach 3.0x10-2Pa, target current are 10A, electroplating time are 2 minutes, and workpiece surface is made to form silica base film layer；
(4) carrier layer is coated with: being opened power supply and is adjusted to 32V, duty ratio 25% keeps silicon target and closes oxygen, reduces argon flow For 90sccm, being passed through acetylene gas makes vacuum degree reach 2.7x10-2Pa, target current 10A, electroplating time are 2 minutes, make workpiece The carrier layer of surface formation silicon carbide；
(5) sterilization film layer is coated with: being kept silicon target sputtering, is continued to be passed through acetylene gas 1 minute that flow is 90ccm, start simultaneously Silver-colored target forms the sterilization film layer that silicon carbide and silver are made into workpiece surface；The target current of silver-colored target is 0.5A, and the silver target sputtering time is 1 Minute；
(6) plated film is completed: first being closed silicon target, is turned off silver-colored target, be then shut off all gas, cooled down to 6 minutes, then by vacuum Furnace segmentation is dropped a hint to atmospheric pressure, is taken out workpiece and is completed plated film.
Embodiment 2
A method of it preparing sterilizing membrane on glass, includes the following steps:
(1) pre-process: glass pieces are clean and dry up under the conditions of 52 DEG C, and workpiece cleaning is that glass cleaner cleans；
(2) be vacuum-treated: pretreated workpiece is put hanger and is put into vacuum drying oven, loads bias -250V to metal hanging rack, 5.0x10 is vacuumized in vacuum drying oven-3Pa starts turntable, rotates workpiece on hanger, while hanger rotates in vacuum drying oven；
(3) base film layer is coated with: being opened power supply and is adjusted to 32V, duty ratio 25%, being passed through the argon gas that flow is 170sccm makes vacuum Degree reaches 2.0x10-2Pa, starting silicon target and oxygen, the oxygen being passed through makes vacuum degree reach 3.0x10-2Pa, target current 10A, Electroplating time is 4 minutes, and workpiece surface is made to form silica base film layer；
(4) carrier layer is coated with: being opened power supply and is adjusted to 32V, duty ratio 25% keeps silicon target and closes oxygen, reduces argon flow For 90sccm, being passed through acetylene gas makes vacuum degree reach 2.7x10-2Pa, target current 10A, electroplating time are 2 minutes, make workpiece The carrier layer of surface formation silicon carbide；
(4) carrier layer is coated with: being opened power supply and is adjusted to 35V, duty ratio 30% keeps silicon target and closes oxygen, reduces argon flow For 90sccm, being passed through acetylene gas makes vacuum degree reach 2.7x10-2Pa, target current 10A, electroplating time are 2 minutes, make workpiece The carrier layer of surface formation silicon carbide；
(5) sterilization film layer is coated with: being kept silicon target sputtering, is continued to be passed through acetylene gas 1 minute that flow is 90ccm, start simultaneously Silver-colored target forms the sterilization film layer that silicon carbide and silver are made into workpiece surface；The target current of silver-colored target is 0.6A, and the silver target sputtering time is 1 Minute；
((6) plated film is completed: silicon target first closed, silver-colored target is turned off, is then shut off all gas, was cooled down to 7 minutes, it then will be true Empty furnace segmentation is dropped a hint to atmospheric pressure, is taken out workpiece and is completed plated film.
Embodiment 3
A method of it preparing sterilizing membrane on glass, includes the following steps:
(1) pre-process: glass pieces are clean and dry up under the conditions of 54 DEG C, and workpiece cleaning is that glass cleaner cleans；
(2) be vacuum-treated: pretreated workpiece is put hanger and is put into vacuum drying oven, loads bias -220V to metal hanging rack, 5.0x10 is vacuumized in vacuum drying oven-3Pa starts turntable, rotates workpiece on hanger, while hanger rotates in vacuum drying oven；
(3) base film layer is coated with: being opened power supply and is adjusted to 34V, duty ratio 27%, being passed through the argon gas that flow is 200sccm makes vacuum Degree reaches 2.0x10-2Pa, starting silicon target and oxygen, the oxygen being passed through makes vacuum degree reach 3.0x10-2Pa, target target current are 10A, electroplating time are 6 minutes, and workpiece surface is made to form silica base film layer；
(4) carrier layer is coated with: being opened power supply and is adjusted to 36V, duty ratio 32% keeps silicon target and closes oxygen, reduces argon flow For 90sccm, being passed through acetylene gas makes vacuum degree reach 2.7x10-2Pa, target current 10A, electroplating time are 6 minutes, make workpiece The carrier layer of surface formation silicon carbide；
(5) sterilization film layer is coated with: being kept silicon target sputtering, is continued to be passed through acetylene gas 1 minute that flow is 90ccm, start simultaneously Silver-colored target forms the sterilization film layer that silicon carbide and silver are made into workpiece surface；The target current of silver-colored target is 0.7A, and the silver target sputtering time is 3 Minute；
(6) plated film is completed: first being closed silicon target, is turned off silver-colored target, be then shut off all gas, cooled down to 8 minutes, then by vacuum Furnace segmentation is dropped a hint to atmospheric pressure, is taken out workpiece and is completed plated film.
Embodiment 4
A method of it preparing sterilizing membrane on glass, includes the following steps:
(1) pre-process: glass pieces are clean and dry up under the conditions of 56 DEG C, and workpiece cleaning is that glass cleaner cleans；
(2) be vacuum-treated: pretreated workpiece is put hanger and is put into vacuum drying oven, loads bias -280V to metal hanging rack, 5.0x10 is vacuumized in vacuum drying oven-3Pa starts turntable, rotates workpiece on hanger, while hanger rotates in vacuum drying oven；
(3) base film layer is coated with: being opened power supply and is adjusted to 36V, duty ratio 23%, being passed through the argon gas that flow is 230sccm makes vacuum Degree reaches 2.0x10-2Pa, starting silicon target and oxygen, the oxygen being passed through makes vacuum degree reach 3.0x10-2Pa, target current 10A, Electroplating time is 8 minutes, and workpiece surface is made to form silica base film layer；
(4) carrier layer is coated with: being opened power supply and is adjusted to 36V, duty ratio 33% keeps silicon target and closes oxygen, reduces argon flow For 90sccm, being passed through acetylene gas makes vacuum degree reach 2.7x10-2Pa, target current 10A, electroplating time are 8 minutes, make workpiece The carrier layer of surface formation silicon carbide；
(5) sterilization film layer is coated with: being kept silicon target sputtering, is continued to be passed through acetylene gas 1 minute that flow is 90ccm, start simultaneously Silver-colored target forms the sterilization film layer that silicon carbide and silver are made into workpiece surface；The target current of silver-colored target is 0.8A, and the silver target sputtering time is 4 Minute；
(6) plated film is completed: first being closed silicon target, is turned off silver-colored target, be then shut off all gas, cooled down to 9 minutes, then by vacuum Furnace segmentation is dropped a hint to atmospheric pressure, is taken out workpiece and is completed plated film.
Embodiment 5
A method of it preparing sterilizing membrane on glass, includes the following steps:
(1) pre-process: glass pieces are clean and dry up under the conditions of 58 DEG C, and workpiece cleaning is that glass cleaner cleans；
(2) be vacuum-treated: pretreated workpiece is put hanger and is put into vacuum drying oven, loads bias -300V to metal hanging rack, 5.0x10 is vacuumized in vacuum drying oven-3Pa starts turntable, rotates workpiece on hanger, while hanger rotates in vacuum drying oven；
(3) base film layer is coated with: being opened power supply and is adjusted to 38V, duty ratio 33%, being passed through the argon gas that flow is 270sccm makes vacuum Degree reaches 2.0x10-2Pa, starting silicon target and oxygen, the oxygen being passed through makes vacuum degree reach 3.0x10-2Pa, target current 10A, Electroplating time is 2-10 minutes, and workpiece surface is made to form silica base film layer；
(4) carrier layer is coated with: being opened power supply and is adjusted to 40V, duty ratio 35% keeps silicon target and closes oxygen, reduces argon flow For 90sccm, being passed through acetylene gas makes vacuum degree reach 2.7x10-2Pa, target current 10A, electroplating time are 2-10 minutes, are made The carrier layer of workpiece surface formation silicon carbide；
(5) sterilization film layer is coated with: being kept silicon target sputtering, is continued to be passed through acetylene gas 1 minute that flow is 90ccm, start simultaneously Silver-colored target forms the sterilization film layer that silicon carbide and silver are made into workpiece surface；The target current of silver-colored target is 1A, and the silver target sputtering time is 4 points Clock；
(6) plated film is completed: silicon target is first closed, silver-colored target is turned off, is then shut off all gas, was cooled down to 10 minutes, it then will be true Empty furnace segmentation is dropped a hint to atmospheric pressure, is taken out workpiece and is completed plated film.
Embodiment 6
Experimental data measurement is carried out to the glass of sterilizing membrane obtained by embodiment 1-5, the membranous layer binding force of workpiece, as a result such as following table institute Show:
Embodiment 1 2 3 4 5
Binding force (N) 60.5 62 63.5 65 67
According to the experimental results, the membranous layer binding force of the sterilizing membrane of the glass surface obtained using the technical program is all larger than 60N, Then illustrate that membranous layer binding force is more excellent, is able to satisfy simple glass product demand.
Embodiment 7
The glass pieces of embodiment 1-5 are the mobile phone screen of same material, are taken common common and embodiment 1-5 same material Mobile phone screen is contrast groups, and total six groups of samples measure the bacterium of 5 hours and 10 hours rear surfaces respectively under identical use environment Number is fallen, as a result as shown in the table:
Test sample Embodiment 1 Embodiment 2 Embodiment 3 Embodiment 4 Embodiment 5 Contrast groups
5 hours (a/cm2) 10 12 15 10 8 40
10 hours (a/cm2) 5 6 7 5 4 53
24 hours (a/cm2) 0 0 0 0 0 70
According to the experimental results, it is compared using the mobile phone screen with sterilizing membrane of the technical program with ordinary screen, it is fungi-proofing Significant effect has very high actual use value.
Illustrating for one of present invention possible embodiments is described in detail above, only embodiment is not to limit this The scope of the patents of invention, it is all without departing from technical spirit of the present invention equivalence enforcement or change for it, it is specially to be intended to be limited solely by this case In sharp range.

Claims (6)

1. a kind of method for preparing sterilizing membrane on glass, it is characterised in that include the following steps:
(1) it pre-processes: by workpiece is clean and low temperature dries up；
(2) be vacuum-treated: pretreated workpiece is put hanger and is put into vacuum drying oven, loads bias, vacuum to metal hanging rack 5.0x10 is vacuumized in furnace-3Pa starts turntable, rotates workpiece on hanger, while hanger rotates in vacuum drying oven；
(3) base film layer is coated with: being opened power supply and is adjusted to 30-40V, duty ratio 20%-30%, being passed through argon gas reaches vacuum degree 2.0x10-2Pa, starting silicon target and oxygen, the oxygen being passed through makes vacuum degree reach 3.0x10-2Pa makes workpiece surface form oxidation Silicon base film layer；
(4) carrier layer is coated with: being kept silicon target and is closed oxygen, reduces argon flow, be passed through acetylene gas, form workpiece surface The carrier layer of silicon carbide；
(5) sterilization film layer is coated with: being kept silicon target sputtering, is continued to be passed through acetylene gas, while starting silver target sputtering in workpiece surface Form the sterilization film layer that silicon carbide and silver are made into；
(6) plated film is completed: first being closed silicon target and silver-colored target, is then shut off all gas, cooled down to 5-10 minutes, then by vacuum drying oven Segmentation is dropped a hint to atmospheric pressure, is taken out workpiece and is completed plated film.
2. a kind of method for preparing sterilizing membrane on glass according to claim 1, it is characterised in that: in the step (1) Workpiece cleaning is one of glass cleaner cleaning or supersonic cleaning, and drying temperature is no more than 100 DEG C.
3. a kind of method for preparing sterilizing membrane on glass according to claim 1, it is characterised in that: in the step (2) Metal hanging rack loads bias-200-- 300V.
4. a kind of method for preparing sterilizing membrane on glass according to claim 1, it is characterised in that: in the step (3) The flow of argon gas is 100-250sccm, and target current 10A, electroplating time is 2-10 minutes.
5. a kind of method for preparing sterilizing membrane on glass according to claim 1, it is characterised in that: in the step (5) Argon flow is reduced to 40-80sccm, and acetylene gas flow is 150-250sccm, and it is 1-5 minutes that acetylene gas, which is passed through the time,.
6. a kind of method for preparing sterilizing membrane on glass according to claim 1, it is characterised in that: in the step (5) The target current of silver-colored target is 0.5-1A, and the silver target sputtering time is 1-4 minutes.
CN201910500507.6A 2019-06-11 2019-06-11 Method for preparing bactericidal membrane on glass Active CN110184572B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910500507.6A CN110184572B (en) 2019-06-11 2019-06-11 Method for preparing bactericidal membrane on glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910500507.6A CN110184572B (en) 2019-06-11 2019-06-11 Method for preparing bactericidal membrane on glass

Publications (2)

Publication Number Publication Date
CN110184572A true CN110184572A (en) 2019-08-30
CN110184572B CN110184572B (en) 2021-07-09

Family

ID=67721204

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201910500507.6A Active CN110184572B (en) 2019-06-11 2019-06-11 Method for preparing bactericidal membrane on glass

Country Status (1)

Country Link
CN (1) CN110184572B (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110760804A (en) * 2019-09-23 2020-02-07 麦世枝 Method for preparing antibacterial composite membrane on silica gel
CN111020480A (en) * 2019-10-12 2020-04-17 麦世枝 Silica gel product with composite sterilization layer
CN111321371A (en) * 2019-12-30 2020-06-23 麦福枝 Method for producing bactericidal film with silicon nitride bonding layer on silica gel
CN111364003A (en) * 2019-12-17 2020-07-03 麦福枝 Method for producing sterilization film with silicon nitride bonding layer on plastic
CN111441019A (en) * 2019-12-17 2020-07-24 麦福枝 Method for preparing bactericidal film with silicon nitride bonding layer on glass and ceramic
US11377727B2 (en) * 2020-06-11 2022-07-05 Fook Chi Mak Method for preparing bactericidal film on fiber cloth

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100015193A1 (en) * 2006-10-16 2010-01-21 Nippon Sheet Glass Company, Limited Antibacterial Substrate and Method of Manufacturing the Same
CN104230181A (en) * 2014-09-12 2014-12-24 苏州胜利光学玻璃有限公司 Antibacterial-layer panel of electronic product
CN204079783U (en) * 2014-09-12 2015-01-07 苏州胜利光学玻璃有限公司 A kind of electronic product antibiotic layer panel
CN105586576A (en) * 2016-02-04 2016-05-18 东莞沙头朝日五金电子制品有限公司 Method for plating physical vapor deposition (PVD) anti-microbial film
CN107140850A (en) * 2017-05-02 2017-09-08 江苏秀强玻璃工艺股份有限公司 A kind of plated film antibacterial safety glass and preparation method thereof
CN107653441A (en) * 2017-09-01 2018-02-02 麦世枝 A kind of method that PVD bacteria-proof films are produced on plastic cement

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100015193A1 (en) * 2006-10-16 2010-01-21 Nippon Sheet Glass Company, Limited Antibacterial Substrate and Method of Manufacturing the Same
CN104230181A (en) * 2014-09-12 2014-12-24 苏州胜利光学玻璃有限公司 Antibacterial-layer panel of electronic product
CN204079783U (en) * 2014-09-12 2015-01-07 苏州胜利光学玻璃有限公司 A kind of electronic product antibiotic layer panel
CN105586576A (en) * 2016-02-04 2016-05-18 东莞沙头朝日五金电子制品有限公司 Method for plating physical vapor deposition (PVD) anti-microbial film
CN107140850A (en) * 2017-05-02 2017-09-08 江苏秀强玻璃工艺股份有限公司 A kind of plated film antibacterial safety glass and preparation method thereof
CN107653441A (en) * 2017-09-01 2018-02-02 麦世枝 A kind of method that PVD bacteria-proof films are produced on plastic cement

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110760804A (en) * 2019-09-23 2020-02-07 麦世枝 Method for preparing antibacterial composite membrane on silica gel
CN111020480A (en) * 2019-10-12 2020-04-17 麦世枝 Silica gel product with composite sterilization layer
CN111364003A (en) * 2019-12-17 2020-07-03 麦福枝 Method for producing sterilization film with silicon nitride bonding layer on plastic
CN111441019A (en) * 2019-12-17 2020-07-24 麦福枝 Method for preparing bactericidal film with silicon nitride bonding layer on glass and ceramic
CN111321371A (en) * 2019-12-30 2020-06-23 麦福枝 Method for producing bactericidal film with silicon nitride bonding layer on silica gel
US11377727B2 (en) * 2020-06-11 2022-07-05 Fook Chi Mak Method for preparing bactericidal film on fiber cloth

Also Published As

Publication number Publication date
CN110184572B (en) 2021-07-09

Similar Documents

Publication Publication Date Title
CN110184572A (en) A method of preparing sterilizing membrane on glass
JP6920239B2 (en) Method of Producing PVD Antibacterial Film on Plastic
CN107227444A (en) The preparation method and anti-fingerprint protective film coated article of anti-fingerprint protective film plated film
CN113277745B (en) Fingerprint-proof film coating process and glass
CN103887285B (en) Method for manufacturing anti-static TFT substrate
CN112456812A (en) Preparation method of AF (AF) coated glass with antibacterial effect
CN101665910A (en) Method for cleaning SiO* substrate used in alloy films made by vacuum evaporation
CN111441019A (en) Method for preparing bactericidal film with silicon nitride bonding layer on glass and ceramic
CN106998596A (en) Saturated solution for preparing Electric radiant Heating Film
CN111364003A (en) Method for producing sterilization film with silicon nitride bonding layer on plastic
US20130022835A1 (en) Coated article having antibacterial effect and method for making the same
EP3202947A1 (en) Method for depositing pvd germ repellent film
CN106756845A (en) It is a kind of can be used as the preparation method of the N doping DLC film of sliding members face coat
US20200347490A1 (en) Metal surface protective layer and preparation method thereof
CN108893711B (en) Method and device for thickening amorphous tetrahedral carbon coating by using ion beam and coating
CN111636198A (en) Method for preparing sterilization film on fiber cloth
CN111057996A (en) All-solid-state insulation wave-transparent PVD (physical vapor deposition) film layer and preparation method and application thereof
CN105088148A (en) Method of depositing aluminum film on plastic part by evaporation in vacuum
CN110760804A (en) Method for preparing antibacterial composite membrane on silica gel
CN109112474B (en) Preparation method of molybdenum disulfide biological functional coating based on magnetron sputtering of titanium sheet surface
TWI493060B (en) Silvery white film structure and method manufacturing same
CN103882400B (en) The anti-static method of TFT substrate
CN111733388A (en) Preparation method of ITO film
CN220723982U (en) Color temperature Huang Mo with spherical ZF glass as substrate
CN114231902A (en) Preparation method of indium tin oxide film

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant