CN110158062A - Strip chemical vapor deposition stove - Google Patents
Strip chemical vapor deposition stove Download PDFInfo
- Publication number
- CN110158062A CN110158062A CN201810145768.6A CN201810145768A CN110158062A CN 110158062 A CN110158062 A CN 110158062A CN 201810145768 A CN201810145768 A CN 201810145768A CN 110158062 A CN110158062 A CN 110158062A
- Authority
- CN
- China
- Prior art keywords
- strip
- vapor deposition
- chemical vapor
- deposition stove
- furnace body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The invention discloses a kind of strip chemical vapor deposition stoves, including furnace body, the furnace interior is formed with multiple reaction chambers, pass through the connection of heating channel between each reaction chamber, the two sides in the heating channel are equipped with the induction heater for heating the strip, and a pair of nozzle for the upper and lower surface of strip injection gas-phase chemical reaction object is equipped in the reaction chamber.Using strip chemical vapor deposition stove of the invention, reaction chamber interior air-flow can be made uniform, and its long service life.
Description
Technical field
The present invention relates to a kind of chemical vapor deposition stoves, in particular to a kind of strip chemical vapor deposition stove.
Background technique
Chemical vapor deposition can be applied to the improvement of belt steel surface performance, and the action principle of chemical vapor deposition is: anti-
Interior is answered, heating needs the substrate for carrying out deposition processes and is passed through gas-phase chemical reaction object, and gas-phase chemical reaction object is in substrate
Chemical reaction occurs on surface to obtain required chemical vapor deposition layer, i.e. film.Chemical vapor depsotition equipment is answered extensively
It needs to be placed in substrate in closed reaction chamber when carrying out chemical vapor deposition process for semiconductor devices manufacturing
It is handled, and this mode can not be applied in the continous way production of strip.
For the above problem in the presence of the prior art, providing a kind of strip chemical vapor deposition stove has important meaning
Justice.
Summary of the invention
To solve the above problems, the present invention provides a kind of strip chemical vapor deposition stove, gas in reaction chamber can be made
Stream is uniform, and its long service life.
To achieve the above object, strip chemical vapor deposition stove of the invention, including furnace body, the furnace interior are formed
There are multiple reaction chambers, be connected between each reaction chamber by heating channel, the two sides in the heating channel are equipped with for heating
The induction heater of the strip, the reaction chamber is interior to be equipped with a pair of be used for the upper and lower surface of strip injection gas chemistry
The nozzle of reactant.
Preferably, the furnace body has the inlet and outlet for strip disengaging, and the inlet and outlet is equipped with
A pair is for transmitting the transfer roller of the strip.
Further, the material of the transfer roller is silicon nitride.
Preferably, the material of the inboard wall of furnace body is quartz.
Preferably, the material of the nozzle is quartz.
Preferably, the gas vent for exhaust gas to be discharged is offered on the furnace body.
Strip chemical vapor deposition stove of the invention, by the heating and chemical reaction alternating in chemical vapor deposition process
It carries out, each reaction chamber is mutually indepedent, a pair of nozzles is provided only in reaction chamber, without other gas sources and heating device, so that each anti-
Answer intracavitary air-flow uniform, so that belt steel surface be allow to obtain more uniform film；Meanwhile transfer roller being set to the import of furnace body
And outlet, it may be implemented to carry out chemical vapor deposition process to the strip of continuous operation in relatively closed space.In addition, furnace
Internal wall, nozzle and transfer roller use the material of corrosion-and high-temp-resistant, can extend making for the strip chemical vapor deposition stove
Use the service life.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of strip chemical vapor deposition stove of the invention, wherein arrow direction indicates strip fortune
Line direction.
Specific embodiment
In the following, being further described in conjunction with attached drawing to structure and working principle etc. of the invention.
Referring to Fig. 1, strip chemical vapor deposition stove of the invention, including furnace body 5 is formed with inside furnace body 5 multiple anti-
Chamber 7 is answered, is connected between each reaction chamber 7 by heating channel 8, the two sides up and down in heating channel 8 are equipped with the sense for heating strip 1
Heater 3 is answered, induction heater 3 is embedded on furnace body 5, is equipped in reaction chamber 7 a pair of for spraying to the upper and lower surface of strip 1
The nozzle 4 of gas-phase chemical reaction object.
The furnace body 5 has the import (not indicating in figure) pass in and out for strip 1 and exports (not indicating in figure), import and close
It is connected to by heating channel 8 between the reaction chamber 7 of import, between outlet and the reaction chamber 7 of close outlet.
The working principle of strip of the invention chemical vapor deposition stove is: strip 1 is entered in furnace body 5 by import, first
It is inductively heated the heating of device 3 by heating channel 8, subsequently into reaction chamber 7, nozzle 4 sprays gas phase to the upper and lower surface of strip 1
Chemical reactant, gas-phase chemical reaction object on 1 surface of strip of high temperature occur chemical reaction and in 1 Surface Creation films of strip,
Strip 1 through chemical vapor deposition process enters back into next heating channel 8 and is heated, and then enters back into next reaction chamber
7 are chemically reacted, so alternately heat and chemically react after, the strip 1 through chemical vapor deposition process by export from
Blow-on body 5.
Since chemical vapor deposition needs to carry out in relatively closed space, it will can be used to transmit the one of strip 1
It is set to the inlet and outlet of furnace body 5 to transfer roller 2, seals inlet and outlet while transmitting strip 1, it is relatively close to obtain
The space closed.
Since gas-phase chemical reaction object is corrosive gas, and chemical vapor deposition carries out at high temperature, in order to
The position contacted with gas-phase chemical reaction object is avoided to be damaged by high temperature or by gas attack, 5 inner wall of furnace body, nozzle 4 and biography
The material for sending roller 2 that corrosion-and high-temp-resistant can be used, it is preferable that quartz production can be selected in 5 inner wall of furnace body and nozzle 4, and transfer roller 2 can
Select silicon nitride production.
In addition, gas-phase chemical reaction object can generate exhaust gas after 1 surface of strip chemically reacts, therefore, on furnace body 5 also
Offer the gas vent 6 for exhaust gas to be discharged.
Strip chemical vapor deposition stove of the invention, by the heating and chemical reaction alternating in chemical vapor deposition process
It carries out, each reaction chamber 7 is mutually indepedent, a pair of nozzles 4 is provided only in reaction chamber 7, without other gas sources and heating device, so that respectively
7 interior air-flow of reaction chamber is uniform, so that 1 surface of strip be allow to obtain more uniform film；Meanwhile transfer roller 2 is set to furnace body 5
Inlet and outlet, may be implemented in relatively closed space to the strip of continuous operation 1 carry out chemical vapor deposition process.
In addition, 5 inner wall of furnace body, nozzle 4 and transfer roller 2 can extend the strip chemical gaseous phase using the material of corrosion-and high-temp-resistant
The service life of cvd furnace.
More than, schematic description only of the invention, it will be recognized by those skilled in the art that without departing from work of the invention
On the basis of making principle, a variety of improvement can be made to the present invention, this is all belonged to the scope of protection of the present invention.
Claims (6)
1. a kind of strip chemical vapor deposition stove, which is characterized in that including furnace body, the furnace interior is formed with multiple reactions
Chamber, by the connection of heating channel between each reaction chamber, the two sides in the heating channel are equipped with for heating the strip
Induction heater, the reaction chamber is interior to be equipped with a pair of spray for the upper and lower surface of strip injection gas-phase chemical reaction object
Mouth.
2. strip chemical vapor deposition stove as described in claim 1, which is characterized in that the furnace body, which has, supplies the strip
The inlet and outlet of disengaging, the inlet and outlet are equipped with a pair of for transmitting the transfer roller of the strip.
3. strip chemical vapor deposition stove as claimed in claim 2, which is characterized in that the material of the transfer roller is nitridation
Silicon.
4. strip chemical vapor deposition stove as described in claim 1, which is characterized in that the material of the inboard wall of furnace body is stone
English.
5. strip chemical vapor deposition stove as described in claim 1, which is characterized in that the material of the nozzle is quartz.
6. strip chemical vapor deposition stove as described in claim 1, which is characterized in that offer on the furnace body for arranging
The gas vent of exhaust gas out.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810145768.6A CN110158062A (en) | 2018-02-12 | 2018-02-12 | Strip chemical vapor deposition stove |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810145768.6A CN110158062A (en) | 2018-02-12 | 2018-02-12 | Strip chemical vapor deposition stove |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110158062A true CN110158062A (en) | 2019-08-23 |
Family
ID=67634946
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810145768.6A Pending CN110158062A (en) | 2018-02-12 | 2018-02-12 | Strip chemical vapor deposition stove |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110158062A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62227032A (en) * | 1986-03-28 | 1987-10-06 | Nippon Kokan Kk <Nkk> | Manufacture of high silicon steel strip in continuous line |
| JPS6324035A (en) * | 1986-07-16 | 1988-02-01 | Nippon Kokan Kk <Nkk> | Production of steel sheet |
| CN1875127A (en) * | 2003-12-05 | 2006-12-06 | 山特维克知识产权股份有限公司 | A steel strip coated with zirconia |
| CN1957428A (en) * | 2003-12-15 | 2007-05-02 | 美国超能公司 | High-throughput ex-situ method for rare-earth-barium-copper-oxide film growth |
| CN101514447A (en) * | 2008-02-21 | 2009-08-26 | 宝山钢铁股份有限公司 | Process and device for coating steel strip through ECR microwave plasma chemical vapor deposition |
-
2018
- 2018-02-12 CN CN201810145768.6A patent/CN110158062A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62227032A (en) * | 1986-03-28 | 1987-10-06 | Nippon Kokan Kk <Nkk> | Manufacture of high silicon steel strip in continuous line |
| JPS6324035A (en) * | 1986-07-16 | 1988-02-01 | Nippon Kokan Kk <Nkk> | Production of steel sheet |
| CN1875127A (en) * | 2003-12-05 | 2006-12-06 | 山特维克知识产权股份有限公司 | A steel strip coated with zirconia |
| CN1957428A (en) * | 2003-12-15 | 2007-05-02 | 美国超能公司 | High-throughput ex-situ method for rare-earth-barium-copper-oxide film growth |
| CN101514447A (en) * | 2008-02-21 | 2009-08-26 | 宝山钢铁股份有限公司 | Process and device for coating steel strip through ECR microwave plasma chemical vapor deposition |
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| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190823 |
|
| RJ01 | Rejection of invention patent application after publication |