CN110129738A - Evaporated device and evaporated device detection method - Google Patents
Evaporated device and evaporated device detection method Download PDFInfo
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- CN110129738A CN110129738A CN201910541252.8A CN201910541252A CN110129738A CN 110129738 A CN110129738 A CN 110129738A CN 201910541252 A CN201910541252 A CN 201910541252A CN 110129738 A CN110129738 A CN 110129738A
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- evaporation source
- duration
- detection
- microswitch
- contact position
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
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- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
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- Mechanical Engineering (AREA)
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- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention provides a kind of evaporated device and evaporated device detection method, by the way that evaporation source, the first elastic compression portion, microswitch to be all set in vapor deposition cavity；The one end in the first elastic compression portion connects microswitch, and the other end extends to preset first contact position, for triggering microswitch closure when evaporation source is moved to first contact position；Timing unit is electrically connected with microswitch, and the closure for responding microswitch carries out timing, and exports detection duration.When detecting duration beyond threshold value duration, warning message is obtained, realizes and the movement of evaporation source is detected with mechanical structure, improve the reliability of detection.The structure that power supply control apparatus is contacted and linked with evaporation source in the present embodiment is mechanical structure, the tolerance vapor deposition intracorporal hot environment of chamber, structural stability with higher.
Description
Technical field
The present invention relates to sensor technical field more particularly to a kind of evaporated device and evaporated device detection methods.
Background technique
In evaporated device, is moved back and forth in closed organic cavity by control evaporation source and substrate is deposited.
However, in order to guarantee that all substrates can be deposited completely, the vapor deposition stroke of evaporation source is typically greater than the length of its substrate, and
The beginning and end that stroke is deposited carries out limit induction, avoids the movement of evaporation source from far surpassing it and stroke is deposited and sends out with cavity inner wall
Raw collision.
In existing evaporated device, the position of surplus will be preset more than vapor deposition stroke as limit base position, and in base
Photoelectric sensor is set on quasi- face.It is encapsulated in the limit benchmark position that two sides are arranged in the photoelectric sensor being closed in machine cavity body
It sets, for exporting warning information to motion control unit to stop when detection evaporation source is mobile to the exception for exceeding vapor deposition stroke
The only movement of evaporation source.
However, reliability is not high under high temperature environment for photoelectric sensor, it, may when photoelectric sensor exports warning information
That the mechanical structure failure of evaporation source leads to its malposition, it is also possible to photoelectric sensor itself be displaced cause to detect it is different
Often, it needs to interrupt and is deposited and begins to speak to confirm.Therefore, the scheme reliability of position detection is carried out not to evaporation source in the prior art
It is high.
Summary of the invention
The present invention provides a kind of evaporated device and evaporated device detection method, when detecting duration and being more than threshold time, obtains
Overload alarm information is taken, realizes and the movement of evaporation source is detected with mechanical structure, improves the reliability of detection.
According to the first aspect of the invention, a kind of evaporated device is provided, comprising: vapor deposition cavity, evaporation source and position pass
Sensor；The position sensor includes: the first elastic compression portion, microswitch and timing unit；Wherein, the evaporation source,
First elastic compression portion, the microswitch are all set in the vapor deposition cavity；The one of first elastic compression portion
End connects the microswitch, and the other end extends to preset first contact position, for being moved to the starting in evaporation source
The microswitch closure is triggered when contact position；The timing unit is electrically connected with the microswitch, described for responding
The closure of microswitch carries out timing, and exports detection duration.
Optionally, the microswitch include: stationary contact to mobile conductive part；
The stationary contact is to being arranged in the power supply line of the timing unit；
The side of the mobile conductive part is with the stationary contact to corresponding, other side connection first elastic compression
Portion is connected to the stationary contact pair for being driven by first elastic compression portion.
It optionally, further include at least one limiting section, at least one described limiting section is set in the vapor deposition cavity, and
At least one described limiting section and the microswitch are located at the same side of the first contact position,
Wherein, the confined planes that at least one described limiting section is formed are less than described at a distance from the first contact position
Microswitch is at a distance from the first contact position.
Optionally, further includes: removable support sector；
The side and first elastic compression portion of the removable support sector extend to and the first contact position
One end connection, the other side of the removable support sector with the evaporation source for contacting；
Wherein, the side that the removable support sector connect with first elastic compression portion also with limit described at least one
Position portion is corresponding, to set when the removable support sector reaches the confined planes at least one described limiting section support.
Optionally, further includes: with the limiting section one-to-one second elastic compression portion；
The one end in second elastic compression portion connects the limiting section, and the other end extends to and the first contact position
And connect the removable support sector.
Optionally, further includes: data processing unit；
The data processing unit is electrically connected with the timing unit, when for obtaining the detection from the timing unit
It is long；When length is less than preset duration threshold value in the detection, moved according to the half of the detection duration and preset evaporation source
Dynamic speed obtains the shift length that the evaporation source exceeds the first contact position；Length is greater than or equal in the detection
When the duration threshold value, overload alarm information is obtained；
Wherein, the duration threshold value is the durations of mobile 2 times of the evaporation source default limit distances, the default limit away from
From being default confined planes at a distance from the first contact position.
Optionally, further includes: data processing unit；
The data processing unit is connect with the driving unit of the evaporation source, is driven for obtaining from the driving unit
Directional information or driving Stop message；
The data processing unit is also electrically connected with the timing unit, in the side that the driving direction information indicates
To when being switched to negative sense from forward direction, or when receiving the driving Stop message, Xiang Suoshu timing unit, which is sent, stops timing
Instruction, and from the timing unit obtain timing duration as the detection duration；According to the detection duration and preset
Evaporation source movement speed obtains the shift length that the evaporation source exceeds the first contact position.
Optionally, the both ends of the preset strokes of the evaporation source are all respectively arranged at least one described position sensor,
And the endpoint location at the both ends is arranged between the first contact position corresponding with endpoint, the microswitch.
According to the second aspect of the invention, a kind of evaporated device detection method is provided, be applied to first aspect present invention and
The first aspect various possible designs evaporated device, which comprises
The detection duration is obtained from the timing unit；
It is long when being less than preset duration threshold value in the detection, according to the detection duration or the detection duration
Half and preset evaporation source movement speed obtain the shift length that the evaporation source exceeds the first contact position；
When length is greater than or equal to the duration threshold value in the detection, overload alarm information is obtained；
Wherein, the duration threshold value is the duration of the mobile default limit distance of the evaporation source or is that the evaporation source is mobile
The duration of 2 times of default limit distances, the default limit distance are default confined planes at a distance from the first contact position.
According to the third aspect of the invention we, a kind of evaporated device detection method is provided, be applied to first aspect present invention and
The first aspect various possible designs evaporated device, which comprises
Driving direction information or driving Stop message are obtained from the driving unit；
When the direction of driving direction information instruction is switched to negative sense from forward direction, or receives the driving and stop
When information, Xiang Suoshu timing unit sends the instruction for stopping timing, and obtains described in timing duration conduct from the timing unit
Detect duration；
According to the detection duration and preset evaporation source movement speed, the shift length is obtained.
The present invention provides a kind of evaporated device and evaporated device detection method, by by evaporation source, the first elastic compression portion,
Microswitch is all set in vapor deposition cavity；The one end in the first elastic compression portion connects microswitch, and the other end extends to default
First contact position, for when evaporation source is moved to first contact position trigger microswitch closure；Timing unit with it is micro-
Dynamic switch electrical connection, the closure for responding microswitch carries out timing, and exports detection duration, when detection duration is greater than threshold value
When duration, overload alarm information is obtained, realizes and the movement of evaporation source is detected with mechanical structure, improve detection can
By property.Moreover, the structure that power supply control apparatus is contacted and linked with evaporation source in the present embodiment is mechanical structure, tolerance vapor deposition
The intracorporal hot environment of chamber, structural stability with higher.
Detailed description of the invention
Fig. 1 is a kind of evaporated device schematic diagram in the prior art；
Fig. 2 is a kind of position sensor structural schematic diagram provided in an embodiment of the present invention；
Fig. 3 is another position sensor structural schematic diagram provided in an embodiment of the present invention；
Fig. 4 is another position sensor structural schematic diagram provided in an embodiment of the present invention；
Fig. 5 is another position sensor structural schematic diagram provided in an embodiment of the present invention；
Fig. 6 is another position sensor structural schematic diagram provided in an embodiment of the present invention；
Fig. 7 is another position sensor structural schematic diagram provided in an embodiment of the present invention；
Fig. 8 is another position sensor structural schematic diagram provided in an embodiment of the present invention；
Fig. 9 is a kind of evaporated device detection method flow diagram provided in an embodiment of the present invention；
Figure 10 is another position sensor structural schematic diagram provided in an embodiment of the present invention；
Figure 11 is another evaporated device detection method flow diagram provided in an embodiment of the present invention；
Figure 12 is a kind of evaporated device structural schematic diagram provided in an embodiment of the present invention.
Specific embodiment
In order to make the object, technical scheme and advantages of the embodiment of the invention clearer, below in conjunction with the embodiment of the present invention
In attached drawing, technical scheme in the embodiment of the invention is clearly and completely described, it is clear that described embodiment is only
It is only a part of the embodiment of the present invention, instead of all the embodiments.Based on the embodiments of the present invention, ordinary skill
Personnel's every other embodiment obtained without making creative work, shall fall within the protection scope of the present invention.
In addition, term " first ", " second " are used for descriptive purposes only and cannot be understood as indicating or suggesting relative importance
Or implicitly indicate the quantity of indicated technical characteristic.Define " first " as a result, the feature of " second " can be expressed or
Implicitly include one or more of the features.In the description of the present invention, the meaning of " plurality " is at least two, such as two
It is a, three etc., unless otherwise specifically defined.
It should be appreciated that in the present invention, " comprising " and " having " and their any deformation, it is intended that covering is not arranged
His includes, for example, containing a series of system of units, product or equipment those of is not necessarily limited to be clearly listed unit,
It but may include other units being not clearly listed or intrinsic for these products or equipment.
It should be appreciated that in the present invention, " multiple " refer to two or more." including A, B and C " refers to A, B, C tri-
Person includes that " including A, B or C " refers to that, including A, B, C thrin, " including A, B and/or C " refers to including in A, B, C three
Wantonly 1 or 2 or 3 wantonly.
It should be appreciated that in the present invention, " B corresponding with A ", " B corresponding with A ", " A and B are corresponding " or " B and A
It is corresponding ", it indicates that the shape of B and A or function have corresponding relationship, B can be determined according to A.Determine that B is not meant to according to A
B is determined only according to A, can also determine B according to A and/or other information.
Technical solution of the present invention is described in detail with specifically embodiment below.The examples of the embodiments are attached
It is shown in figure, wherein indicating same or similar component from beginning to end with same or similar label or there is same or like function
The component of energy.These specific embodiments can be combined with each other below, may be for the same or similar concept or process
Some embodiments repeat no more.
In evaporated device, is moved back and forth in closed organic cavity by control evaporation source and substrate is deposited.
However, in order to guarantee that all substrates can be deposited completely, the vapor deposition stroke of evaporation source is typically greater than the length of its substrate, and
The beginning and end that stroke is deposited carries out limit induction, avoids the movement of evaporation source from far surpassing it and stroke is deposited and sends out with cavity inner wall
Raw collision.
In existing evaporated device, the position of surplus will be preset more than vapor deposition stroke as limit base position, and in base
Photoelectric sensor 11 is set on quasi- face.It is a kind of evaporated device schematic diagram in the prior art referring to Fig. 1.As shown in fig. 1,
The size of two pieces of substrates (substrate A, substrate B) to be deposited is 750*650mm, and the vapor deposition effective distance of substrate is 1500mm,
Two pieces of substrate interval 500mm, the vapor deposition stroke of evaporation source are 2698mm, by the beginning and end 3 of distance vapor deposition stroke to 5mm's
Position is as limit base position.As shown in Figure 1, photoelectric sensor 11 and block 12 are encapsulated in together with substrate, evaporation source
In organic cavity, the limit base position of two sides is arranged in photoelectric sensor 11, and the position of 5mm after datum level is arranged in block 12
It sets.When photoelectric sensor 11 is mobile to the exception beyond vapor deposition stroke in detection evaporation source, output warning information to motion control
Unit is to stop the movement of evaporation source.Block 12 is used for last mechanical position limitation guarantee.
However, when photoelectric sensor 11 exports warning information, it may be possible to which the mechanical structure failure of evaporation source leads to its position
Set exception, it is also possible to which photoelectric sensor 11 is displaced in itself causes detection abnormal.Therefore, in the prior art with photoelectric sensing
The scheme reliability that device 11 carries out position detection to evaporation source is not high.Regardless of being the malposition of photoelectric sensor, or steam
The malposition in plating source, it is necessary to stop the movement of evaporation source and carry out beginning to speak to operate, the structure of enclosed inside could be carried out
Adjustment.But complicated for operation and higher cost is begun to speak, improve the maintenance difficulties of evaporated device.
In order to solve the problems, such as existing evaporated device Maintenance Difficulty, the present invention provides a kind of vapor depositions with position sensor
Equipment will be converted into duration detection to the position detection of evaporation source by position sensor, to obtain evaporation source relative to base
The deviation distance in quasi- face improves the accuracy of position detection.
Also, it by the adjusting to reference time length, realizes the adjustment to vapor deposition end point of travel position, improves to evaporation source position
The reliability for setting detection is operated without beginning to speak, and improves the efficiency of evaporation source malposition processing, and reduces operating cost.
Various possible implementations of the invention are illustrated and are illustrated in the following with reference to the drawings and specific embodiments.
It referring to fig. 2, is a kind of position sensor structural schematic diagram provided in an embodiment of the present invention.Position shown in Fig. 2 passes
Sensor includes: the first elastic compression portion 1, microswitch 2 and timing unit 3.Wherein, microswitch 2 is electrically connected with timing unit 3
It connects, timing unit 3 is used to respond the closure of microswitch 2, starts timing, and export detection duration.Microswitch 2 and timing list
The electrical connection of member 3, such as can be microswitch 2 and be arranged on the current supply circuit of timing unit 3, when microswitch 2 disconnects,
3 power down of timing unit does not work, and when microswitch 2 is closed, timing unit 3 works on power.In another example microswitch 2 connects
It connects between the timing control terminal and high level end of timing unit 3, when microswitch 2 disconnects, timing unit 3 is low because of control terminal
Level is not-time, and when microswitch 2 is closed, timing unit 3 initializes timing duration and start to count because of control terminal high level
When.As it can be seen that the timing duration of timing unit 3 can be understood as the closure duration of microswitch 2.
With continued reference to Fig. 2, the one end in first elastic compression portion 1 connects the microswitch 2, and the other end extends to pre-
If first contact position A, be closed for triggering the microswitch 2 when evaporation source is moved to the first contact position A.
First elastic compression portion 1 such as can be spring, reed 24 can elastic telescopic component.It is to be understood that the first elasticity pressure
Contracting portion 1 does not occur under elastically-deformable normal condition, and one end is against at microswitch 2, and the other end is against first contact position
A.During evaporation source reaches first contact position A and continues mobile to 2 direction of microswitch, the first elastic compression portion 1
It is compressed by evaporation source and microswitch 2 is pushed to closed state, then, microswitch 2 of the first elastic compression portion 1 in closure
Elastic compression is continued between evaporation source, until evaporation source stops the movement to 2 direction of microswitch.
Wherein, the closure that the timing unit 3 is used to respond the microswitch 2 carries out timing, and exports detection duration,
Exceed the shift length of the first contact position A with the evaporation source that converts.It is to be appreciated that since evaporation source is understood that
It is at the uniform velocity to move, therefore the mobile distance of evaporation source and mobile time are proportional relationships.Therefore, pass through timing unit
3 obtain the closure duration of microswitch 2, just can determine that out evaporation source after reaching first contact position A, continue to be more than starting
The shift length of contact position A.For example, it is assumed that the movement speed of evaporation source is 1cm/s, the detection duration that timing unit 3 exports
For 2s, then, consider the case where moving back and forth of evaporation source (the i.e. practical when a length of 1s unidirectionally moved), can determine its position
Moving distance is 1cm/s*1s=1cm.In another example, it is assumed that evaporation source is more than persistently mobile until by first after the A of first contact position
Elastic compression portion 1 is compressed to maximum compression distance, and can not be continued to move to by the limit of microswitch 2.In some embodiments, may be used
When being that timing unit 3 continues timing and exports the detection duration for being greater than duration threshold value, it can thereby determine that evaporation source is mobile super
Limit.Alternatively, the driving motor that can be evaporation source, which can not move, issues the mobile alarm transfinited of instruction in other real-time examples
Information.
Microswitch 2 in above-described embodiment can there are many implementations for example, see Fig. 3 is the embodiment of the present invention
Another position sensor structural schematic diagram of offer, or be that another position provided in an embodiment of the present invention passes referring to fig. 4
Sensor structural schematic diagram.In Fig. 3, position sensor structure shown in Fig. 4, the microswitch 2 includes: stationary contact to 21
With mobile conductive part.
For example, stationary contact is arranged in the power supply line of timing unit 3 to 21；The side of mobile conductive part and stationary contact pair
21 is corresponding, and the other side connects first elastic compression portion 1, is connected to institute for being driven by first elastic compression portion 1
Stationary contact is stated to 21.Mobile conductive part is used for 21 corresponding sides with stationary contact quiet by two when contacting stationary contact to 21
Contact conducting.
For example, the mobile conductive part in embodiment illustrated in fig. 3 includes support elastic sheet 22 and conductive plate 23, support elastic sheet 22
One end is fixed, and the other end connects conductive plate 23, so that conductive plate 23 can maintain slight distance to 21 with stationary contact, and is being led
Conducting is contacted to 21 with stationary contact when battery plate 23 is driven by the first elastic compression portion 1, microswitch 2 is closed.Conductive plate 23 is for example
It can be metal plate.
In another example the mobile conductive part in embodiment illustrated in fig. 4 is reed 24.One end of reed 24 and stationary contact are in 21
The connection of a stationary contact, the other end is hanging and maintains slight distance with another stationary contact.Reed 24 is pressed by the first elasticity
When contracting portion 1 drives, the hanging other end and another described stationary contact point contact, so that stationary contact is connected to 21, fine motion
Switch 2 is closed.
The present embodiment provides a kind of power supply control apparatus, are electrically connected by microswitch with timing unit, described to control
The timing of timing unit；Microswitch is connected with the one end in the first elastic compression portion, the other end extends to preset first contact
Position triggers the microswitch closure when evaporation source is moved to the first contact position；Described in being responded with timing unit
The closure of microswitch carries out timing, and exports detection duration, realizes and is detected with mechanical structure to the movement of evaporation source,
Improve the reliability of detection.Moreover, the structure that power supply control apparatus is contacted and linked with evaporation source in the present embodiment is machine
Tool structure, the tolerance vapor deposition intracorporal hot environment of chamber, structural stability with higher.
Further, which may be used to indicate the shift length that evaporation source exceeds first contact position, with machine
Mobile detection of the tool structure to evaporation source, while improving detection reliability, to detect the shift length that duration embodies evaporation source,
Improve the accuracy of detection.
On the basis of the above embodiments, limiting section 4 can also be added, to increase mechanical limit except microswitch 2
The structure of position, improves the limit reliability of position sensor.Referring specifically to Fig. 5, be it is provided in an embodiment of the present invention another
Position sensor structural schematic diagram.Structure as shown in Figure 5 is that at least one limit is increased on the basis of previous embodiment
Portion 4.If it is two limiting sections 4 shown in fig. 5, then two 4 right alignments of limiting section and a confined planes B is formed.Wherein, institute
It states limiting section 4 and the microswitch 2 is located at the same side of the first contact position A, at least one limiting section 4 formation
Confined planes B at a distance from the first contact position A, less than the microswitch 2 and first contact position A away from
From.In the embodiment shown in fig. 5, it is likely to mobile toward the direction of microswitch 2 always in the case where the mobile exception of evaporation source,
With gradually being compressed for the first elastic compression portion 1, the pressure that microswitch 2 is subject to is gradually increased, if the motor of evaporation source
Driving force is larger, it is likely that damage microswitch 2.And in the structure for being provided with limiting section 4 as shown in Figure 5, evaporation source arrives
To just be blocked after up to the position of confined planes B can not continue to move to, and avoid to the further pressure of microswitch 2.It can manage
The stationary contact of Xie Wei, microswitch 2 can have certain restraining ability to 21, but by confined planes B setting in microswitch 2 and starting
Between contact position A, evaporation source collision microswitch 2 or other structures can be prevented, limit effect is further increased.
In some embodiments, the shift motion under evaporation source normal operating conditions, can be set at stroke edge
Include first contact position A.With continued reference to Fig. 5, the endpoint location C of the preset strokes of the evaporation source the confined planes B with
Between the first contact position A.The endpoint location C of the preset strokes of evaporation source can be understood as evaporation source normal operation
The most edge point position C that should be moved to down.Evaporation source is under there is no moving abnormal normal condition, in Fig. 5
It moves left to after endpoint location C to return and move to right, the distance of endpoint location C to first contact position A can be according to the inspection exported at this time
Duration is surveyed to determine.Such as a length of 2s when detection, then it should be the distance for being used to indicate endpoint location C to first contact position A
Standard duration.And if detection duration is greater than 2s, for example, 4s, and the movement speed of evaporation source is 1cm/s, then can determine
Evaporation source is mobile abnormal, and the distance that evaporation source moves out current endpoint location C is 1cm, and evaporation source moves out starting and connects
The distance for touching position A is 2cm.The present embodiment improves the limit reliability of position sensor by setting limiting section as a result,.
On the basis of embodiment shown in Fig. 5, in order to improve limit effect, it can also increase for contacting with evaporation source
Removable support sector 5 is another position sensor structural schematic diagram provided in an embodiment of the present invention referring to Fig. 6.Shown in Fig. 6
Structure further include: removable support sector 5.The side of the removable support sector 5 is extended to first elastic compression portion 1
It being connect with one end of the first contact position A, the other side of the removable support sector 5 is used to contact with the evaporation source,
Wherein, the side that the removable support sector 5 connect with first elastic compression portion 1 also at least one described limiting section 4
It is corresponding, with when the removable support sector 5 is elapsed by the evaporation source to the confined planes B at least one described limiting section
4 support set.Specifically, moving support sector 5 for example can be slab construction as shown in FIG. 6, and both ends are limited with one respectively
Portion 4 is corresponding, can contact with two limiting sections 4 to setting when evaporation source is moved to confined planes B, prevent evaporation source from continuing to move to.
In the embodiment shown in fig. 6, the spacing between two limiting sections 4 can not be limited, such as may be greater than
The length of evaporation source, but removable support sector 5 should be greater than between two limiting sections 4 in the length on 4 distribution arrangement of limiting section
Spacing, so that the resistance to evaporation source is collectively formed with limiting section 4 when removable support sector 5 is elapsed by evaporation source to confined planes B
Gear.The present embodiment can further increase the limit reliability of limiting section, reduce because of limiting section by the way that removable support sector is arranged
A possibility that position setting mismatches with evaporation source and limit is caused to fail.
On the basis of the above embodiments, in order to balance the stress of removable support sector 5, and the inspection of microswitch 2 is improved
Sensitivity is surveyed, the structure in the second elastic compression portion 6 is increased, is that another position provided in an embodiment of the present invention passes referring to Fig. 7
Sensor structural schematic diagram.In position sensor structure shown in Fig. 7, further includes: with the limiting section 4 one-to-one second
Elastic compression portion 6.The one end in second elastic compression portion 6 connects the limiting section 4, and the other end is extended to be connect with the starting
Touching position A simultaneously connects the removable support sector 5.By the second elastic compression portion 6, can received to avoid removable support sector 5
Occur skew when to evaporation source thrust, improves limit reliability.
In the embodiment shown in fig. 7, microswitch 2 can also be using stationary contact to 21 and the composition knot of conductive plate 23
Structure.Wherein, stationary contact is connected in series in the power supply line of timing unit 3 to 21.The side of conductive plate 23 and stationary contact are to 21
Corresponding, the other side is connect with the first elastic compression portion 1.In the case where the first elastic compression portion 1 is in nonelastic deformed state, one end
Connect removable support sector 5, the other end is ined succession conductive plate 23.Since removable support sector 5 is also connected by the second elastic compression portion 6
Limiting section 4 is connect, therefore in the case where disengaging with evaporation source without by thrust, moves support sector 5 and pressed by the second elasticity
Contracting portion 6 is pushed into first contact position A, and the one end in the first elastic compression portion 1 is then driven to also return to first contact position A, with
So that conductive plate 23 and stationary contact are mutually disengaged to 21.The present embodiment, can be to avoid removable by the second elastic compression portion
Support sector occurs skew when receiving evaporation source thrust, improves limit reliability.
On the basis of any embodiment shown in above-mentioned Fig. 2 to Fig. 7, data processing unit 7 may be incorporated into, thus to inspection
Duration is surveyed to be handled.In the embodiment for being provided with data processing unit 7, there can be at least two implementations, tie below
Fig. 8 and Figure 10 is closed both implementations are illustrated.
It is another position sensor structural schematic diagram provided in an embodiment of the present invention, position shown in Fig. 8 referring to Fig. 8
It sets in sensor structure, can also include: data processing unit 7.The data processing unit 7 is electrically connected with the timing unit 3
It connects, for obtaining the detection duration from the timing unit 3, when length is less than preset duration threshold value when detecting, according to institute
The half and preset evaporation source movement speed for stating detection duration, obtain the shift length；And length is greater than in the detection
Or when being equal to the duration threshold value, shows that evaporation source has reached default confined planes B, obtain overload alarm information.
Wherein, the duration threshold value is the durations of mobile 2 times of the evaporation source default limit distances, the default limit away from
From being default confined planes B at a distance from the first contact position A.Such as default limit distance is 5cm, the mobile speed of evaporation source
Degree is 1cm/s, then duration threshold value is 10s.If data processing unit 7 gets a length of 8s when detection, 4cm is determined as being deposited
The corresponding shift length in source；If data processing unit 7 gets a length of 10s or the value more than 10s when detection, sending is transfinited
Warning message.Wherein, timer can issue the detection duration, example to data processing unit 7 according to preset duration threshold value
Such as when timing is greater than or equal to duration threshold value, the detection duration issued to data processing unit 7 is directly duration threshold value, so that
It obtains 7 response time threshold value of data processing unit and issues overload alarm information.
The present embodiment is handled the detection duration that timing unit exports by data processing unit, and it is super to obtain evaporation source
The shift length of the first contact position either overload alarm information out, improves the accuracy to evaporation source position detection.
On the basis of any embodiment shown in above-mentioned Fig. 2 to Fig. 7, referring to Figure 10, be it is provided in an embodiment of the present invention again
A kind of position sensor structural schematic diagram can also include data processing unit in position sensor structure shown in Fig. 10
7。
Wherein, data processing unit 7 can be connect with the driving unit 13 of the evaporation source, be used for from the driving unit
13 obtain driving direction information or driving Stop message.Moreover, the data processing unit 7 is also electric with the timing unit 3
Connection.Data processing unit 7 is when the direction that the driving direction information indicates is switched to negative sense from forward direction, or receives institute
When stating driving Stop message, Xiang Suoshu timing unit 3 sends the instruction for stopping timing, and obtains timing from the timing unit 3
Duration is as the detection duration.Then data processing unit 7 is according to the detection duration and preset evaporation source movement speed,
Obtain the shift length.Such as when timing duration is 3s, driving unit 13 changes the rotation direction of motor, keeps evaporation source anti-
Timing to movement, therefore after 3s is process of the evaporation source towards the first contact position direction A return.The present embodiment can lead to
The driving direction information that data processing unit 7 obtains driving unit 13 is crossed, to stop immediately when evaporation source moving direction changes
Only timing, and using current timing duration as detection duration, then, the detection duration that this scheme obtains is multiplied by preset vapor deposition
Source movement speed can obtain the shift length that evaporation source exceeds the first contact position A.In another example timing duration reaches
When 5s, evaporation source reaches default confined planes B and is blocked, and driving unit 13 detects that motor can not operate and have issued driving and stop
Information, then, data processing unit 7 responds the driving Stop message and controls timing unit 3 and stop timing, and in terms of current
For Shi Shichang as detection duration, obtained shift length should be the distance of default confined planes B to first contact position A.
When data processing unit 7 combines the driving unit 13 of evaporation source to control the output detection of timing unit 3 in the present embodiment
It is long, first contact position A is returned and left without waiting for evaporation source, or waiting evaporation source is blocked for a long time and confined planes
Until timing duration is more than duration threshold value at B, the present embodiment can detect its shift length in the unidirectional mobile phase of evaporation source,
Improve the speed and efficiency of position detection.
It is corresponding with Fig. 8 or Figure 10, it is a kind of evaporated device detection method provided in an embodiment of the present invention referring to Fig. 9
Flow diagram, evaporated device detection method provided in an embodiment of the present invention for example can be by
Data processing unit shown in Fig. 8 executes.Method as shown in Figure 9 includes step S101 to step S104, specifically
It is as follows:
S101 obtains the detection duration from the timing unit.
S102, judges whether the detection duration is less than preset duration threshold value.
If so, determining that the detection duration is less than preset duration threshold value, it is transferred to step S103.
If it is not, determining that the detection duration is greater than or equal to the duration threshold value, it is transferred to step S104.
S103 is obtained according to the detection duration or the half and preset evaporation source movement speed of the detection duration
Take the shift length.
S104 obtains overload alarm information.
Wherein, the duration threshold value is the duration of the mobile default limit distance of the evaporation source or is that the evaporation source is mobile
The duration of 2 times of default limit distances, the default limit distance are default confined planes at a distance from the first contact position.
The step of embodiment of the method shown in Fig. 9 can be executed with data processing unit in Fig. 8 shown device embodiment is corresponding,
That the realization principle and technical effect are similar is similar for it, and details are not described herein again.
It is corresponding with Figure 10, it is another evaporated device detection method stream provided in an embodiment of the present invention referring to Figure 11
Journey schematic diagram, evaporated device detection method provided in an embodiment of the present invention for example can data processing unit as shown in Figure 10 hold
Row.Method as shown in figure 11 includes step S201 to step S203, specific as follows:
S201 obtains driving direction information or driving Stop message from the driving unit.
S202 when the direction of driving direction information instruction is switched to negative sense from forward direction, or receives the drive
When dynamic Stop message, Xiang Suoshu timing unit sends the instruction for stopping timing, and obtains timing duration from the timing unit and make
For the detection duration.
S203 obtains the shift length according to the detection duration and preset evaporation source movement speed.
The step of embodiment of the method shown in Figure 11 can be executed with data processing unit in Figure 10 shown device embodiment pair
It answers, it is similar that the realization principle and technical effect are similar, and details are not described herein again.
It is a kind of evaporated device structural schematic diagram provided in an embodiment of the present invention referring to Figure 12, is deposited shown in Figure 12
In equipment, including cavity, evaporation source and Fig. 2 any position sensor into embodiment illustrated in fig. 11 is deposited.Wherein
Evaporation source, the first elastic compression portion 1, microswitch 2 are encapsulated in the vapor deposition cavity, and the setting of timing unit 3 is in vapor deposition chamber
Except body.Since the first elastic compression portion 1, microswitch 2 are as mechanical structure, to the vapor deposition intracorporal hot environment of chamber
Tolerance with higher, spoilage is smaller, improves the reliability of position sensor.Moreover, because position in the present embodiment
Setting sensor is the closure duration based on microswitch 2 to the position detection of evaporation source, therefore causes to go because of evaporation source loosening
It, can be by adjusting set distance and its correspondence between endpoint location C to first contact position A when fixed variation occurs for Cheng Duandian
Reference time length mode, position detection is continued with endpoint location C adjusted, reduce begin to speak operation frequency, drop
Low maintenance difficulties, also further improve the reliability of position sensor.
In some embodiments, the both ends of the preset strokes of the evaporation source are all respectively arranged at least one described position
Sensor, and the endpoint location C at the both ends is arranged at the first contact position A corresponding with endpoint, the fine motion is opened
It closes between 2.For example, in evaporated device shown in Figure 12, original left row journey endpoint the rising in leftward position sensor of evaporation source
The left side position 2cm of beginning contact position A, similarly, original right side end point of travel the rising in right positions sensor of evaporation source
The right side position 2cm of beginning contact position A.When evaporation source structural shift causes end point of travel on the left of Figure 12 to move to left 1cm, right side stroke
Endpoint also synchronizes when moving to left 1cm, can the position sensor to both ends adjusted as follows:
The left side end point of travel of evaporation source is adjusted to the left side 3cm in the first contact position A of leftward position sensor
Position, evaporation source movement speed are 1m/s, and the reference time length for being moved to first contact position A from endpoint location C is adjusted to from 2s
3s。
The right side end point of travel of evaporation source is adjusted to the right side 1cm in the first contact position A of right positions sensor
Position, evaporation source movement speed are 1m/s, and the reference time length for being moved to first contact position A from endpoint location C is adjusted to from 2s
1s。
Then, continue to detect the position of evaporation source with endpoint location adjusted and its corresponding reference time length.
(it is pre- to indicate that evaporation source is moved to until the reference time length that reaches to side of degree that evaporation source loosens reaches preset duration threshold value
Limit plane) or for 0s (indicating that evaporation source is unable to reach first contact position), then issue overload alarm information, prompt for example
It carries out beginning to speak to operate.
It thus reduces and begins to speak to operate to adjust the frequency of evaporation source or position sensor, improve detection reliability.
In the description of the present invention, it is to be understood that, used term " center ", " length ", " width ", " thickness
Degree ", " top ", " bottom end ", "upper", "lower", "left", "right", "front", "rear", "vertical", "horizontal", "inner", "outside" " axis
To ", the indicating positions such as " circumferential direction " or positional relationship be to be based on the orientation or positional relationship shown in the drawings, be merely for convenience of describing
The present invention and simplified description, rather than the position of indication or suggestion meaning or original part must have a particular orientation, with specific
Construction and operation, therefore be not considered as limiting the invention.
In the present invention unless specifically defined or limited otherwise, term " installation ", " connected ", " connection ", " fixation " etc.
It shall be understood in a broad sense, such as may be a fixed connection, may be a detachable connection, or be integrally formed；It can be mechanical connection,
It is also possible to be electrically connected or can communicate with each other；It can be directly connected, can also indirectly connected through an intermediary, it can be with
Make the connection inside two elements or the interaction relationship of two elements.For the ordinary skill in the art, may be used
To understand the concrete meaning of above-mentioned term in the present invention as the case may be.
In the present invention unless specifically defined or limited otherwise, fisrt feature second feature "upper" or "lower"
It may include that the first and second features directly contact, also may include that the first and second features are not direct contacts but pass through it
Between other characterisation contact.Moreover, fisrt feature includes the first spy above the second feature " above ", " above " and " above "
Sign is right above second feature and oblique upper, or is merely representative of first feature horizontal height higher than second feature.Fisrt feature exists
Second feature " under ", " lower section " and " following " include that fisrt feature is directly below and diagonally below the second feature, or is merely representative of
First feature horizontal height is less than second feature.
Finally, it should be noted that the above various embodiments is only used to illustrate the technical scheme of the present invention, rather than its limitations；To the greatest extent
Pipe present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that: its according to
So be possible to modify the technical solutions described in the foregoing embodiments, or to some or all of the technical features into
Row equivalent replacement；And these are modified or replaceed, various embodiments of the present invention technology that it does not separate the essence of the corresponding technical solution
The range of scheme.
Claims (10)
1. a kind of evaporated device characterized by comprising vapor deposition cavity, evaporation source and position sensor；The position sensing
Device includes: the first elastic compression portion, microswitch and timing unit；Wherein, the evaporation source, first elastic compression
Portion, the microswitch are all set in the vapor deposition cavity；The one end in first elastic compression portion connects the fine motion and opens
It closes, the other end extends to preset first contact position, for triggering institute when evaporation source is moved to the first contact position
State microswitch closure；The timing unit is electrically connected with the microswitch, for respond the closure of the microswitch into
Row timing, and export detection duration.
2. evaporated device according to claim 1, which is characterized in that the microswitch include: stationary contact to and it is mobile
Conductive part；
The stationary contact is to being arranged in the power supply line of the timing unit；
The side of the mobile conductive part is with the stationary contact to corresponding, other side connection first elastic compression portion, use
The stationary contact pair is connected in being driven by first elastic compression portion.
3. evaporated device according to claim 1, which is characterized in that it further include at least one limiting section, described at least one
A limiting section is set in the vapor deposition cavity, and at least one described limiting section is located at the starting with the microswitch and connects
The same side of position is touched,
Wherein, the confined planes that at least one described limiting section is formed are less than the fine motion at a distance from the first contact position
Switch is at a distance from the first contact position.
4. evaporated device according to claim 3, which is characterized in that further include: removable support sector；The removable branch
The side for holding portion is extended to first elastic compression portion to be connect with one end of the first contact position, the removable branch
The other side in portion is held for contacting with the evaporation source；
Wherein, the removable support sector is corresponding with limiting section described at least one, to reach institute in the removable support sector
It is set when stating confined planes at least one described limiting section support.
5. evaporated device according to claim 4, which is characterized in that further include: with the limiting section one-to-one
Two elastic compression portions；
The one end in second elastic compression portion connects the limiting section, and the other end extends to and the first contact position and company
Meet the removable support sector.
6. evaporated device according to any one of claims 1 to 5, which is characterized in that further include: data processing unit；
The data processing unit is electrically connected with the timing unit, for obtaining the detection duration from the timing unit；
When length is less than preset duration threshold value in the detection, according to the half of the detection duration and the mobile speed of preset evaporation source
Degree obtains the shift length that the evaporation source exceeds the first contact position；It is long more than or equal to described in the detection
When duration threshold value, overload alarm information is obtained；
Wherein, the duration threshold value is the duration of mobile 2 times of the evaporation source default limit distances, and the default limit distance is
Default confined planes are at a distance from the first contact position.
7. evaporated device according to any one of claims 1 to 5, which is characterized in that further include: data processing unit；
The data processing unit is connect with the driving unit of the evaporation source, for obtaining driving direction from the driving unit
Information or driving Stop message；
The data processing unit is also electrically connected with the timing unit, for the direction that the driving direction information indicates from
When forward direction is switched to negative sense, or when receiving the driving Stop message, Xiang Suoshu timing unit sends the finger for stopping timing
It enables, and obtains timing duration as the detection duration from the timing unit；According to the detection duration and preset vapor deposition
Source movement speed obtains the shift length that the evaporation source exceeds the first contact position.
8. evaporated device according to any one of claims 1 to 5, which is characterized in that the two of the preset strokes of the evaporation source
End is all respectively arranged at least one described position sensor, and the endpoint location at the both ends be arranged at it is corresponding with endpoint
Between the first contact position, the microswitch.
9. a kind of evaporated device detection method, which is characterized in that it is applied to evaporated device as described in any of the claims 1 to 8,
The described method includes:
The detection duration is obtained from the timing unit；
When length is less than preset duration threshold value in the detection, the one of duration or the detection duration is detected according to described
Half and preset evaporation source movement speed, obtain shift length；
When length is greater than or equal to the duration threshold value in the detection, overload alarm information is obtained；
Wherein, the duration threshold value is the duration of the mobile default limit distance of the evaporation source or is that the evaporation source is 2 times mobile
The duration of default limit distance, the default limit distance are default confined planes at a distance from the first contact position.
10. a kind of evaporated device detection method, which is characterized in that set applied to vapor deposition as described in any of the claims 1 to 8
It is standby, which comprises
Driving direction information or driving Stop message are obtained from driving unit；
When the direction of driving direction information instruction is switched to negative sense from forward direction, or receive the driving Stop message
When, Xiang Suoshu timing unit sends the instruction for stopping timing, and obtains timing duration as the detection from the timing unit
Duration；
According to the detection duration and preset evaporation source movement speed, shift length is obtained.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910541252.8A CN110129738B (en) | 2019-06-21 | 2019-06-21 | Evaporation device and detection method thereof |
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|---|---|---|---|
| CN201910541252.8A CN110129738B (en) | 2019-06-21 | 2019-06-21 | Evaporation device and detection method thereof |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105960072A (en) * | 2015-12-09 | 2016-09-21 | 友达光电股份有限公司 | An evaporation device and an evaporation method |
| CN207581925U (en) * | 2017-12-18 | 2018-07-06 | 北京铂阳顶荣光伏科技有限公司 | Evaporation rate detecting system |
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2019
- 2019-06-21 CN CN201910541252.8A patent/CN110129738B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105960072A (en) * | 2015-12-09 | 2016-09-21 | 友达光电股份有限公司 | An evaporation device and an evaporation method |
| CN207581925U (en) * | 2017-12-18 | 2018-07-06 | 北京铂阳顶荣光伏科技有限公司 | Evaporation rate detecting system |
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