CN110108401A - A kind of method and device obtaining waveguide internal stress information by polarization wheel measuring - Google Patents
A kind of method and device obtaining waveguide internal stress information by polarization wheel measuring Download PDFInfo
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- CN110108401A CN110108401A CN201810100484.5A CN201810100484A CN110108401A CN 110108401 A CN110108401 A CN 110108401A CN 201810100484 A CN201810100484 A CN 201810100484A CN 110108401 A CN110108401 A CN 110108401A
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- 230000010287 polarization Effects 0.000 title claims abstract description 67
- 238000000034 method Methods 0.000 title claims abstract description 23
- 238000012360 testing method Methods 0.000 claims abstract description 19
- 238000005259 measurement Methods 0.000 claims abstract description 13
- 230000008033 biological extinction Effects 0.000 claims description 23
- 230000003287 optical effect Effects 0.000 claims description 10
- 230000008859 change Effects 0.000 claims description 7
- 230000000694 effects Effects 0.000 claims description 4
- 230000008878 coupling Effects 0.000 claims description 2
- 238000010168 coupling process Methods 0.000 claims description 2
- 238000005859 coupling reaction Methods 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 7
- 229910052710 silicon Inorganic materials 0.000 abstract description 7
- 239000010703 silicon Substances 0.000 abstract description 7
- 239000000463 material Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000000875 corresponding effect Effects 0.000 description 3
- 230000005693 optoelectronics Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000012163 sequencing technique Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/24—Measuring force or stress, in general by measuring variations of optical properties of material when it is stressed, e.g. by photoelastic stress analysis using infrared, visible light, ultraviolet
- G01L1/241—Measuring force or stress, in general by measuring variations of optical properties of material when it is stressed, e.g. by photoelastic stress analysis using infrared, visible light, ultraviolet by photoelastic stress analysis
Abstract
The invention discloses a kind of method and apparatus for obtaining waveguide internal stress information by polarization wheel measuring.The anisotropy of silicon waveguide internal stress will cause the difference of the refractive index on different directions, can obtain the stress information in silicon wafer by the polarization rotation amount after silicon waveguide by measurement polarised light.Method includes two parts, and the first step measures the speed axis direction of device under test, and second step measures the larization rotation angle of device under test emergent light, calculates internal stress.Speed axis direction is obtained by measuring the average value that adjacent minimum polarization rotates corresponding input polarization angle.Input of the speed axis direction and larization rotation angle measured as Stress calculation, Stress calculation step are automatically performed by program.
Description
Technical field
The present invention relates to integrated electro subdomains, more particularly to a kind of polarization wheel measuring that passes through to obtain waveguide internal stress letter
The method and device of breath.
Background technique
With optical communication, optical transport is popularized, and traditional micro-optical device is just by integrated optics, integrated optoelectronic device institute's generation
It replaces.Optical waveguide is one of most common device in integrated optoelectronic device.Optical waveguide is to limit, transmit and couple the geometry of light wave
Waveguiding structure can limit light wave inside it or near its surface, the leaded light that guidance light wave is propagated along determining direction
Channel.
Thin film silicon material (Silicon-on-insulator, SOI) in insulating substrate is a kind of novel silicon based opto-electronics
The CMOS technology compatibility of sub- material, processing technology and standard is good, in recent years in the application in Semiconductor Optic Electronics field
It is increasingly extensive.It can help to reduce optical chip by the optical waveguide of substrate and plane integrated circuit of the silicon SOI in insulating substrate
Cost, and realize that multifunctional single-sheet is integrated.The hot spot that the research of SOI fiber waveguide device becomes the research of current silicon photonics is asked
Topic.
Thermal expansion coefficient mismatches between the multilayer material of silicon based SOI optical waveguide, inevitably draws inside waveguide material
Enter stress, generate birefringent phenomenon, brings the difference of polarization correlated energy, the modes such as plated film, cutting can be used and reduce the polarization phase
It is poor to close performance.In order to make stress compensation measure come into force it should be understood that waveguide internal stress information.
Summary of the invention
Aiming at the problems existing in the prior art, according to one embodiment of present invention, it provides a kind of by polarization rotation
The method that measurement obtains waveguide internal stress information, comprising:
Step 101, the speed axis direction of device under test is measured；
Step 102, the larization rotation angle of device under test emergent light is measured, internal stress is calculated.
In one embodiment of the invention, the step 101 further comprises:
Step 201, the extinction ratio of incident light is set；
Step 202, the polarization angle of incident light is set；
Step 203, determine that outgoing light polarization rotates to be zero angle；
Step 204, the angle that angle is 45 degree between incident light and fast and slow axis is determined；
Step 205, speed axis direction is determined.
In one embodiment of the invention, the extinction ratio of incident light is set by quarter-wave plate.
In one embodiment of the invention, it is rotated by the polarization that incident light is arranged in half wave plate.
In one embodiment of the invention, pass through the corresponding polarization angle of measurement outgoing polarised light power minimum and maximum
To determine that outgoing light polarization rotates to be zero angle.
In one embodiment of the invention, zero is rotated to be by measurement outgoing light polarization to determine incident light and fast and slow axis
Between angle be 45 degree angle.
In one embodiment of the invention, determine that speed axis direction includes by obtaining two neighboring incident light and speed
The angular average that angle is 45 degree between axis is as speed axis direction.
In one embodiment of the invention, the step 102 further comprises:
Step 301, the polarization angle and extinction ratio of incident light and emergent light are measured；
Step 302, the loss and phase change of the component on fast and slow axis are determined；
Step 303, the refractive index on fast and slow axis is determined based on the variation of speed axis component；
Step 304, the stress difference on fast and slow axis is determined according to photoelastic effect.
According to another embodiment of the invention, it provides a kind of by polarizing wheel measuring acquisition waveguide internal stress information
Device, comprising:
The successively collimator of optical coupling；Analyzer；Extinction ratio setter；Polarize rotary setting device；Light power meter；And
Processor, wherein device under test is coupled between polarization rotary setting device and light power meter, and the processor receives
The output data of light power meter,
Wherein extinction ratio is arranged by the extinction ratio setter after the collimator and analyzer in incident light, then passes through
Collimator incidence device under test after the polarization rotary setting device setting larization rotation angle, passes through after device under test outgoing
The collimator and analyzer are crossed to light power meter, the light power meter measurement is emitted the information of polarised light, and the information is sent out
It send to processor, is automatically processed to obtain the stress information of device under test by the processor.
In another embodiment of the present invention, the extinction ratio setter is quarter-wave plate.
In another embodiment of the present invention, the polarization rotary setting device is half wave plate.
Detailed description of the invention
Fig. 1 shows the side according to an embodiment of the invention that waveguide internal stress information is obtained by polarization wheel measuring
The flow diagram of method.
Fig. 2 shows under different input extinction ratios, polarization rotates the relationship with input polarization relative speed axle clamp angle.
Fig. 3 shows the process signal for determining the method for speed axis direction of device under test according to one embodiment of present invention
Figure.
Fig. 4 shows the side for measuring the polarization rotation calculating stress of device under test emergent light according to one embodiment of present invention
The flow diagram of method.
Fig. 5 shows the dress according to an embodiment of the invention that waveguide internal stress information is obtained by polarization wheel measuring
It sets.
Specific embodiment
In the following description, with reference to each embodiment, present invention is described.However, those skilled in the art will recognize
Know can in the case where none or multiple specific details or with other replacements and/or addition method, material or component
Implement each embodiment together.In other situations, well known structure, material or operation are not shown or are not described in detail in order to avoid making this
The aspects of each embodiment of invention is obscure.Similarly, for purposes of explanation, specific quantity, material and configuration are elaborated, with
Comprehensive understanding to the embodiment of the present invention is just provided.However, the present invention can be implemented in the case where no specific detail.This
Outside, it should be understood that each embodiment shown in the accompanying drawings is illustrative expression and is not drawn necessarily to scale.
In the present specification, the reference of " one embodiment " or " embodiment " is meaned to combine embodiment description
A particular feature, structure, or characteristic is included at least one embodiment of the invention.Occur in everywhere in this specification short
Language " in one embodiment " is not necessarily all referring to the same embodiment.
It should be noted that the embodiment of the present invention is described processing step with particular order, however this is only
Facilitate and distinguish each step, and is not the sequencing for limiting each step, it in different embodiments of the invention, can be according to work
Skill is adjusted to adjust the sequencing of each step.
Fig. 1 shows the side according to an embodiment of the invention that waveguide internal stress information is obtained by polarization wheel measuring
The flow diagram of method.Firstly, measuring speed axis direction in step 101, measuring the speed axis direction of chip or device to be measured.
In step 102, the polarization rotation for measuring emergent light calculates stress, the polarization rotation that measurement light occurs by chip to be measured or device
Angle is the stress that chip or device are extrapolated in input with speed axis direction and larization rotation angle.
Fig. 2 shows under different input extinction ratios, polarization rotates the relationship with input polarization relative speed axle clamp angle.From Fig. 2
As can be seen that having minimum polarization rotation, rotation amount 0 when inputting light polarization and fast and slow axis angle 45.So fast and slow axis side
To the average value for the incident light angle for rotating to be zero for two adjacent polarizations.
There are many ways to speed axis direction of measurement chip or device, selects, and Fig. 3 shows a reality according to the present invention
Apply the flow diagram of the method for the measurement chip of example or the speed axis direction of device.Firstly, incident light is arranged in step 201
Extinction ratio.The mode of extinction ratio is arranged, and there are many selections, in one embodiment of the invention, pass through insertion quarter-wave
Piece is realized.Next, the polarization rotation of incident light is arranged in step 202.Be arranged polarization rotation mode there are many selection,
In one embodiment of the invention, it is realized by insertion half wave plate.Then, in step 203, determine that emergent light is inclined
Vibration rotates to be zero angle, and the performance number that emergent light polarization angle is measured by analyzer in different angle determines, measures function
The corresponding analyzer angle of rate minimum and maximum is polarization angle, and light polarization rotation is emitted when the value of power minimum and maximum is equal
Angle is zero.In step 204, the angle that angle is 45 degree between incident light and fast and slow axis is determined, due to input light polarization and fastly
When slow axis angle is 45 degree, emergent light has minimum polarization rotation, i.e. polarization rotates to be zero, rotates to be zero according to outgoing light polarization
It can determine the angle that angle is 45 degree between incident light and fast and slow axis.In step 205, determine speed axis direction, it is two neighboring enter
Penetrating the angular average that angle between light and fast and slow axis is 45 degree is exactly speed axis direction.
The polarization rotation that Fig. 4 shows measurement emergent light according to an embodiment of the invention calculates the stream of the method for stress
Journey schematic diagram.
Step 301, the polarization angle and extinction ratio of incident light and emergent light are measured.
Measure power minimum and maximum value by analyzer, corresponding the surveyed incident light of analyzer angle or emergent light it is inclined
Shake angle, extinction ratio be analyzer relative to by the maximum of analyzer through light intensity and minimum through the ratio between light intensity, can be with
It is measured by light power meter.
Step 302, the loss and phase change of the component on fast and slow axis are determined.
Assuming that speed axis direction respectively corresponds the direction i and j, then incident polarized light decomposes on fast and slow axis i and j are as follows:
Ei=Aicos(ωt) (1)
Outgoing polarization light decomposes on fast and slow axis i and j are as follows:
Ei=Aicos(ωt+ni2πL/λ) (3)
The polarization angle of incident light and emergent light can by measurement obtain, wherein L be device length, according to formula (1),
(2), (3) and (4) can determine the loss and phase change of the component on fast and slow axis.
Step 303, the refractive index on fast and slow axis is released from the variation of speed axis component.
The phase change on fast and slow axis is determined by step 302, and the refractive index on fast and slow axis can be released according to (3) and (4)
niAnd nj。
Step 304, the stress difference on fast and slow axis is released according to photoelastic effect.
According to photoelastic effect, change in refraction is determined by following formula (5) and (6) on the fast and slow axis as caused by stress:
dni=C11Si–C12(Sj+Sk) (5)
dnj=C11Sj–C12(Si+Sk) (6)
dniAnd dnjLead to variations in refractive index, S for the direction i and the direction j upper stressi, Sj, SkFor three direction upper stresses, C11
It is strain optical coefficient with C12.
dni–dnj=(C11+C12) (Si–Sj) (7)
The stress difference S on fast and slow axis can be obtained by formula (7)i–Sj, which can be automatically performed by program.
Fig. 5 shows the dress according to an embodiment of the invention that waveguide internal stress information is obtained by polarization wheel measuring
It sets.Extinction ratio is arranged by extinction ratio setter 43 after collimator 41 and analyzer 42 in light, then through polarizing rotary setting device
Collimator 45 enters to inject device under test after 44 setting larization rotation angles, by 46 He of collimator after device under test outgoing
Analyzer 47 is measured the information of outgoing polarised light by light power meter 48, and it is automatic by processor 49 that above- mentioned information are sent to processor 49
Processing obtains the stress information of device under test.
In some embodiments of the invention, extinction ratio setter 43 can be quarter-wave plate；Polarize rotary setting
Device 44 can be half wave plate.
Although described above is various embodiments of the present invention, however, it is to be understood that they are intended only as example to present
, and without limitation.For those skilled in the relevant art it is readily apparent that various combinations, modification can be made to it
Without departing from the spirit and scope of the invention with change.Therefore, the width of the invention disclosed herein and range should not be upper
It states disclosed exemplary embodiment to be limited, and should be defined according only to the appended claims and its equivalent replacement.
Claims (11)
1. a kind of method for obtaining waveguide internal stress information by polarization wheel measuring, comprising:
Step 101, the speed axis direction of device under test is measured；
Step 102, the larization rotation angle of device under test emergent light is measured, internal stress is calculated.
2. the method as described in claim 1 for obtaining waveguide internal stress information by polarization wheel measuring, which is characterized in that institute
Stating step 101 further comprises:
Step 201, the extinction ratio of incident light is set；
Step 202, the polarization angle of incident light is set；
Step 203, determine that outgoing light polarization rotates to be zero angle；
Step 204, the angle that angle is 45 degree between incident light and fast and slow axis is determined；
Step 205, speed axis direction is determined.
3. the method as claimed in claim 2 for obtaining waveguide internal stress information by polarization wheel measuring, which is characterized in that logical
Cross the extinction ratio of quarter-wave plate setting incident light.
4. the method as claimed in claim 2 for obtaining waveguide internal stress information by polarization wheel measuring, which is characterized in that logical
Cross the polarization rotation of half wave plate setting incident light.
5. the method as claimed in claim 2 for obtaining waveguide internal stress information by polarization wheel measuring, which is characterized in that logical
The corresponding polarization angle of measurement outgoing polarised light power minimum and maximum is crossed to determine that outgoing light polarization rotates to be zero angle.
6. the method as claimed in claim 2 for obtaining waveguide internal stress information by polarization wheel measuring, which is characterized in that logical
It crosses measurement outgoing light polarization and rotates to be zero to determine angle is 45 degree between incident light and fast and slow axis angle.
7. the method as claimed in claim 2 for obtaining waveguide internal stress information by polarization wheel measuring, which is characterized in that really
Determining speed axis direction includes by obtaining the angular average conduct that angle is 45 degree between two neighboring incident light and fast and slow axis
Speed axis direction.
8. the method as described in claim 1 for obtaining waveguide internal stress information by polarization wheel measuring, which is characterized in that institute
Stating step 102 further comprises:
Step 301, the polarization angle and extinction ratio of incident light and emergent light are measured；
Step 302, the loss and phase change of the component on fast and slow axis are determined；
Step 303, the refractive index on fast and slow axis is determined based on the variation of speed axis component；
Step 304, the stress difference on fast and slow axis is determined according to photoelastic effect.
9. a kind of device for obtaining waveguide internal stress information by polarization wheel measuring, comprising:
The successively collimator of optical coupling；Analyzer；Extinction ratio setter；Polarize rotary setting device；Light power meter；And
Processor, wherein device under test is coupled between polarization rotary setting device and light power meter, and the processor receives light function
The output data of rate meter,
Wherein extinction ratio is arranged by the extinction ratio setter after the collimator and analyzer in incident light, then through described
It polarizes rotary setting device and collimator incidence device under test after larization rotation angle is set, by institute after device under test outgoing
Collimator and analyzer are stated to light power meter, the light power meter measurement is emitted the information of polarised light, and the information is sent to
Processor is automatically processed to obtain the stress information of device under test by the processor.
10. the device as claimed in claim 9 for obtaining waveguide internal stress information by polarization wheel measuring, which is characterized in that
The extinction ratio setter is quarter-wave plate.
11. the device as claimed in claim 9 for obtaining waveguide internal stress information by polarization wheel measuring, which is characterized in that
The polarization rotary setting device is half wave plate.
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Citations (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1291287A (en) * | 1998-10-21 | 2001-04-11 | 保尔·G·邓肯 | Optic measuring method and device using optic wave front polarized rotation of rare earth iron garnet |
| US20030090658A1 (en) * | 2001-10-15 | 2003-05-15 | The Regents Of The University Of California | Methods and apparatus for measuring refractive index and optical absorption differences |
| US20050128481A1 (en) * | 2003-12-11 | 2005-06-16 | Sharps Robert W. | System and method for measuring birefringence in an optical material |
| US20060028718A1 (en) * | 2002-07-12 | 2006-02-09 | Olympus Biosystems Gmbh | Illuminating device and optical object-analyzing device |
| CN2798070Y (en) * | 2005-06-22 | 2006-07-19 | 中国科学院上海光学精密机械研究所 | Precise measurer for extinction ratio of polarizing spectrofilm |
| CN2911623Y (en) * | 2006-03-17 | 2007-06-13 | 北京高光科技有限公司 | Measurer for extinctivity and related parameters |
| US20090101297A1 (en) * | 2007-10-23 | 2009-04-23 | Honeywell International Inc. | System and method for characterizing fibrous materials using stokes parameters |
| US20100103417A1 (en) * | 2006-03-20 | 2010-04-29 | Yukitoshi Otani | Optical Characteristic Measuring Apparatus, Optical Characteristic Measuring Method, and Optical Characteristic Measuring Unit |
| CN102661798A (en) * | 2012-05-31 | 2012-09-12 | 北京理工大学 | Novel optical satellite-borne laser alarming system |
| US20130141715A1 (en) * | 2010-07-30 | 2013-06-06 | Yuta Urano | Fault inspection device and fault inspection method |
| CN104535232A (en) * | 2014-11-18 | 2015-04-22 | 湖北新华光信息材料有限公司 | Device and method for testing stress of infrared optical material |
| JP2016027356A (en) * | 2014-07-08 | 2016-02-18 | 大日本印刷株式会社 | Polarizer, laminated substrate and light orientation device |
| CN106404794A (en) * | 2016-10-17 | 2017-02-15 | 中国科学院上海光学精密机械研究所 | High-speed measuring device and method for surface scattering of large-aperture material |
| CN107314888A (en) * | 2017-04-25 | 2017-11-03 | 哈尔滨工程大学 | The polarization property measuring method of multi-functional lithium niobate integrated device |
-
2018
- 2018-02-01 CN CN201810100484.5A patent/CN110108401B/en active Active
Patent Citations (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1291287A (en) * | 1998-10-21 | 2001-04-11 | 保尔·G·邓肯 | Optic measuring method and device using optic wave front polarized rotation of rare earth iron garnet |
| US20030090658A1 (en) * | 2001-10-15 | 2003-05-15 | The Regents Of The University Of California | Methods and apparatus for measuring refractive index and optical absorption differences |
| US20060028718A1 (en) * | 2002-07-12 | 2006-02-09 | Olympus Biosystems Gmbh | Illuminating device and optical object-analyzing device |
| US20050128481A1 (en) * | 2003-12-11 | 2005-06-16 | Sharps Robert W. | System and method for measuring birefringence in an optical material |
| CN2798070Y (en) * | 2005-06-22 | 2006-07-19 | 中国科学院上海光学精密机械研究所 | Precise measurer for extinction ratio of polarizing spectrofilm |
| CN2911623Y (en) * | 2006-03-17 | 2007-06-13 | 北京高光科技有限公司 | Measurer for extinctivity and related parameters |
| US20100103417A1 (en) * | 2006-03-20 | 2010-04-29 | Yukitoshi Otani | Optical Characteristic Measuring Apparatus, Optical Characteristic Measuring Method, and Optical Characteristic Measuring Unit |
| US20090101297A1 (en) * | 2007-10-23 | 2009-04-23 | Honeywell International Inc. | System and method for characterizing fibrous materials using stokes parameters |
| US20130141715A1 (en) * | 2010-07-30 | 2013-06-06 | Yuta Urano | Fault inspection device and fault inspection method |
| CN102661798A (en) * | 2012-05-31 | 2012-09-12 | 北京理工大学 | Novel optical satellite-borne laser alarming system |
| JP2016027356A (en) * | 2014-07-08 | 2016-02-18 | 大日本印刷株式会社 | Polarizer, laminated substrate and light orientation device |
| CN104535232A (en) * | 2014-11-18 | 2015-04-22 | 湖北新华光信息材料有限公司 | Device and method for testing stress of infrared optical material |
| CN106404794A (en) * | 2016-10-17 | 2017-02-15 | 中国科学院上海光学精密机械研究所 | High-speed measuring device and method for surface scattering of large-aperture material |
| CN107314888A (en) * | 2017-04-25 | 2017-11-03 | 哈尔滨工程大学 | The polarization property measuring method of multi-functional lithium niobate integrated device |
Non-Patent Citations (3)
| Title |
|---|
| BAOLIANG WANG 等: "A new instrument for measuring both the magnitude and angle of low level linear birefringence", 《REVIEW OF SCIENTIFIC INSTRUMENTS》 * |
| 刘训章 等: "用单1/4波片法测量晶体消光比的研究", 《中国激光》 * |
| 杜庆华: "《工程力学手册》", 31 October 1994, 北京：高等教育出版社 * |
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