CN110045450A - Three-colour filter - Google Patents
Three-colour filter Download PDFInfo
- Publication number
- CN110045450A CN110045450A CN201910304636.8A CN201910304636A CN110045450A CN 110045450 A CN110045450 A CN 110045450A CN 201910304636 A CN201910304636 A CN 201910304636A CN 110045450 A CN110045450 A CN 110045450A
- Authority
- CN
- China
- Prior art keywords
- layer
- thickness
- film layer
- tio2
- sio2
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000576 coating method Methods 0.000 claims abstract description 41
- 239000011248 coating agent Substances 0.000 claims abstract description 40
- 230000003287 optical effect Effects 0.000 claims abstract description 36
- 239000011159 matrix material Substances 0.000 claims abstract description 25
- 239000005304 optical glass Substances 0.000 claims abstract description 21
- 239000003086 colorant Substances 0.000 claims abstract description 20
- 239000011521 glass Substances 0.000 claims abstract description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 392
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 377
- 229910052681 coesite Inorganic materials 0.000 claims description 194
- 229910052906 cristobalite Inorganic materials 0.000 claims description 194
- 239000000377 silicon dioxide Substances 0.000 claims description 194
- 229910052682 stishovite Inorganic materials 0.000 claims description 194
- 229910052905 tridymite Inorganic materials 0.000 claims description 194
- 235000012239 silicon dioxide Nutrition 0.000 claims description 181
- 239000000203 mixture Substances 0.000 claims description 17
- MEYZYGMYMLNUHJ-UHFFFAOYSA-N tunicamycin Natural products CC(C)CCCCCCCCCC=CC(=O)NC1C(O)C(O)C(CC(O)C2OC(C(O)C2O)N3C=CC(=O)NC3=O)OC1OC4OC(CO)C(O)C(O)C4NC(=O)C MEYZYGMYMLNUHJ-UHFFFAOYSA-N 0.000 claims description 16
- 239000003989 dielectric material Substances 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 11
- 239000012528 membrane Substances 0.000 claims description 10
- 238000001914 filtration Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 3
- 239000004744 fabric Substances 0.000 claims 1
- 238000001228 spectrum Methods 0.000 abstract description 9
- 238000002834 transmittance Methods 0.000 abstract description 6
- 230000005540 biological transmission Effects 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 316
- 230000000694 effects Effects 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000004737 colorimetric analysis Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
Abstract
The present invention relates to optical field, in particular to a kind of three-colour filter.The optical filter is by optical glass matrix and the threeway filter coating that is respectively deposited on the two sides of optical glass matrix and wide bandpass filters form, three passbands of the threeway filter coating respectively correspond red, green, blue three primary colours, other bypass belts other than wide bandpass filters cut-off three passband of red, green, blue.Three transmission passbands of the invention are located in the wave-length coverage of red, green, blue three primary colours, red, green, blue three primary colours can be divided into when natural light passes through the optical filter, do not only transmit that bands of a spectrum are relatively narrow, peak transmittance is high, and the ultraviolet and infrared ray mixed in light source can be blocked, help to obtain the red, green, blue three coloured light that intensity is ideal, color saturation is high, furthermore, only by carrying out double-sided coating on single glass matrix, the disadvantages of volume is big, processing cost is high, difficulty is big is overcome in the prior art.
Description
Technical field
The present invention relates to optical field, in particular to a kind of three-colour filter.
Background technique
The principle of three primary colours is the most basic principle of colorimetry, is widely applied in various image techniques and display technology,
Usual red wavelengths range is 622-700nm, and green optical wavelength range is 492-577nm, and blue optical wavelength range is 450-
492nm.In the application of earlier generations display technology, three primary colours light bands of a spectrum are wider, and intensity is undesirable, color saturation is low, directly
Connecing causes chrominance space small, and colored expressive ability is not high.And the forth generation laser for the laser light source for using spectral bandwidth narrower is aobvious
Show technology, then the display function of big colour gamut may be implemented, reproduces more perfect color rendition.Existing three-colour filter is often
By multiple single band pass filters (plating different filter coatings on multiple glass substrates respectively) by glued or other combinations come
Realize the effect of three primary colours output, filter coating design is complicated, and the design number of plies is more, and filter membranous layer totals over 100 layers, processing
At high cost, difficulty is big, and volume it is larger limit its micromation application.
Summary of the invention
It is an object of the invention to overcome disadvantage mentioned above, a kind of three-colour filter is provided, three of the three-colour filter are thoroughly
Passband is penetrated to be located in the wave-length coverage of red, green, blue three primary colours, when natural light pass through the optical filter when can be divided into it is red, green,
Blue three primary colours, do not only transmit that bands of a spectrum are relatively narrow, peak transmittance is high, and can block the ultraviolet and infrared ray in mixing light source,
Help to obtain the red, green, blue three coloured light that intensity is ideal, color saturation is high, in addition, only by enterprising in single glass matrix
Row double-sided coating overcomes in the prior art the disadvantages of volume is big, processing cost is high, difficulty is big.
The present invention is implemented as follows: a kind of three-colour filter, it is characterised in that: the optical filter by optical glass matrix with
And the threeway filter coating and wide bandpass filters composition, the threeway being respectively deposited on the two sides of optical glass matrix filter
Three passbands of film respectively correspond red, green, blue three primary colours, and the wide bandpass filters end its other than three passband of red, green, blue
Its bypass belt.
Preferably, the threeway filter coating is using the 11 tunic layers composition based on Fabry-Perot Luo optical filtering membrane structure.
Preferably, the film structure of the threeway filter coating be AIR | ^2H12LH (LH) ^2 | SUB, wherein H be four/
The high refractive index layer of one optical thickness, L are the low-index film of a quarter optical thickness, and AIR is incident medium air,
SUB is optical glass matrix, and ^2 indicates that membrane stack number of repetition is twice.
Preferably, the film structure of the threeway filter coating be AIR | ^2H10LH (LH) ^2 | SUB, wherein H be four/
The high refractive index layer of one optical thickness, L are the low-index film of a quarter optical thickness, and AIR is incident medium air,
SUB is optical glass matrix, and ^2 indicates that membrane stack number of repetition is twice.
Preferably, the threeway filter coating is by high refractive index medium material TiO2Film layer and low refractive index dielectric material SiO2
11 tunics that film layer is successively alternately stacked composition, the thickness of 11 tunic is from the inside to the outside successively are as follows: and the 1st layer, TiO2 film layer, thickness
For 57.1-58.2nm；2nd layer, SiO2 film layer, with a thickness of 93.2-95.1nm；3rd layer, TiO2 film layer, with a thickness of 57.1-
58.2nm；4th layer, SiO2 film layer, with a thickness of 93.2-95.1nm；5th layer, TiO2 film layer, with a thickness of 57.1-58.2nm；6th
Layer, SiO2 film layer, with a thickness of 1118.8-1141.4nm；7th layer, TiO2 film layer, with a thickness of 57.1-58.2nm；8th layer, SiO2
Film layer, with a thickness of 93.2-95.1nm；9th layer, TiO2 film layer, with a thickness of 57.1-58.2nm；10th layer, SiO2 film layer, thickness
For 93.2-95.1nm, 11th layer, TiO2 film layer, with a thickness of 57.1-58.2nm.
Preferably, the thickness of 11 tunics of the threeway filter coating is successively are as follows: and the 1st layer, TiO2 film layer, with a thickness of
57.7nm；2nd layer, SiO2 film layer, with a thickness of 94.2nm；3rd layer, TiO2 film layer, with a thickness of 57.7nm；4th layer, SiO2 film
Layer, with a thickness of 94.2nm；5th layer, TiO2 film layer, with a thickness of 57.7nm；6th layer, SiO2 film layer, with a thickness of 1130.1nm；7th
Layer, TiO2 film layer, with a thickness of 57.7nm；8th layer, SiO2 film layer, with a thickness of 94.2nm；9th layer, TiO2 film layer, with a thickness of
57.7nm；10th layer, SiO2 film layer, with a thickness of 94.2nm, 11th layer, TiO2 film layer, with a thickness of 57.7nm.
Preferably, the wide bandpass filters are by high refractive index medium material TiO2Film layer and low refractive index dielectric material
SiO234 tunics that film layer is successively alternately stacked composition, the thickness of 34 tunic is from the inside to the outside successively are as follows: and the 1st layer, TiO2 film layer,
With a thickness of 16.7-17.0nm；2nd layer, SiO2 film layer, with a thickness of 44.0-44.9nm；3rd layer, TiO2 film layer, with a thickness of
161.0-164.2nm；4th layer, SiO2 film layer, with a thickness of 63.7-65.0nm；5th layer, TiO2 film layer, with a thickness of 23.9-
24.4nm；6th layer, SiO2 film layer, with a thickness of 71.9-73.3nm；7th layer, TiO2 film layer, with a thickness of 48.5-49.5nm；8th
Layer, SiO2 film layer, with a thickness of 70.7-72.1nm；9th layer, TiO2 film layer, with a thickness of 31.3-32.0nm；10th layer, SiO2 film
Layer, with a thickness of 62.2-63.4nm, 11th layer, TiO2 film layer, with a thickness of 47.1-48.0nm；12nd layer, SiO2 film layer, with a thickness of
75.4-77.0nm；13rd layer, TiO2 film layer, with a thickness of 32.8-33.4nm；14th layer, SiO2 film layer, with a thickness of 55.7-
56.8nm；15th layer, TiO2 film layer, with a thickness of 147.8-150.8nm；16th layer, SiO2 film layer, with a thickness of 84.3-86.0nm；
17th layer, TiO2 film layer, with a thickness of 126.0-128.6nm；18th layer, SiO2 film layer, with a thickness of 74.5-76.0nm；19th layer,
TiO2 film layer, with a thickness of 46.2-47.1nm；20th layer, SiO2 film layer, with a thickness of 196.8-200.8nm；21st layer, TiO2 film
Layer, with a thickness of 53.9-55.0nm；22nd layer, SiO2 film layer, with a thickness of 120.9-123.4nm；23rd layer, TiO2 film layer, thickness
For 101.9-104.0nm；24th layer, SiO2 film layer, with a thickness of 98.4-100.4nm；25th layer, TiO2 film layer, with a thickness of
73.3-74.7nm；26th layer, SiO2 film layer, with a thickness of 170.0-173.4nm；27th layer, TiO2 film layer, with a thickness of 56.0-
57.1nm；28th layer, SiO2 film layer, with a thickness of 342.5-349.4nm；29th layer, TiO2 film layer, with a thickness of 86.8-88.5nm；
30th layer, SiO2 film layer, with a thickness of 117.1-119.4nm；31st layer, TiO2 film layer, with a thickness of 102.0-104.1nm；32nd
Layer, SiO2 film layer, with a thickness of 90.0-91.8nm；33rd layer, TiO2 film layer, with a thickness of 98.0-100.0nm；34th layer, SiO2
Film layer, with a thickness of 59.0-60.1nm.
Preferably, the thickness of 34 tunics of the wide bandpass filters is successively are as follows: and the 1st layer, TiO2 film layer, with a thickness of
16.9nm；2nd layer, SiO2 film layer, with a thickness of 44.4nm；3rd layer, TiO2 film layer, with a thickness of 162.6nm；4th layer, SiO2 film
Layer, with a thickness of 64.3nm；5th layer, TiO2 film layer, with a thickness of 24.2nm；6th layer, SiO2 film layer, with a thickness of 72.6nm；7th
Layer, TiO2 film layer, with a thickness of 49.0nm；8th layer, SiO2 film layer, with a thickness of 71.4nm；9th layer, TiO2 film layer, with a thickness of
31.6nm；10th layer, SiO2 film layer, with a thickness of 62.8nm, 11th layer, TiO2 film layer, with a thickness of 47.5nm；12nd layer, SiO2
Film layer, with a thickness of 76.2nm；13rd layer, TiO2 film layer, with a thickness of 33.1nm；14th layer, SiO2 film layer, with a thickness of 56.2m；The
15 layers, TiO2 film layer, with a thickness of 149.3nm；16th layer, SiO2 film layer, with a thickness of 85.2nm；17th layer, TiO2 film layer, thickness
For 127.3nm；18th layer, SiO2 film layer, with a thickness of 75.3nm；19th layer, TiO2 film layer, with a thickness of 46.7nm；20th layer,
SiO2 film layer, with a thickness of 198.8nm；21st layer, TiO2 film layer, with a thickness of 54.5nm；22nd layer, SiO2 film layer, with a thickness of
122.1nm；23rd layer, TiO2 film layer, with a thickness of 103.0nm；24th layer, SiO2 film layer, with a thickness of 99.4nm；25th layer,
TiO2 film layer, with a thickness of 74.0nm；26th layer, SiO2 film layer, with a thickness of 171.7nm；27th layer, TiO2 film layer, with a thickness of
56.5nm；28th layer, SiO2 film layer, with a thickness of 345.9nm；29th layer, TiO2 film layer, with a thickness of 87.6nm；30th layer, SiO2
Film layer, with a thickness of 118.2nm；31st layer, TiO2 film layer, with a thickness of 103.0nm；32nd layer, SiO2 film layer, with a thickness of
90.9nm；33rd layer, TiO2 film layer, with a thickness of 99.0nm；34th layer, SiO2 film layer, with a thickness of 59.6nm.
For the prior art, the invention has the following advantages that
(1) three transmission passbands of three-colour filter provided by the invention, the three-colour filter are located at red, green, blue
In the wave-length coverage of three primary colours, red, green, blue three primary colours can be divided into when natural light passes through the optical filter, do not only transmit bands of a spectrum
It is relatively narrow, peak transmittance is high, and can block the ultraviolet and infrared ray in mixing light source, help to obtain that intensity is ideal, color
Color saturate red, green, blue three coloured light, in addition, only being overcome existing by carrying out double-sided coating on single glass matrix
The disadvantages of volume is big in technology, processing cost is high, difficulty is big；
(2) three-colour filter provided by the invention, threeway filter coating can adjust three coloured light spectrum wavelength, by changing threeway filter
Adjustable three intervals through peak of the order of interference of light film wall, it can the three coloured light of selection output different-waveband；
(3) three-colour filter provided by the invention, threeway filter coating is using 11 based on Fabry-Perot Luo optical filtering membrane structure
Tunic layer composition, film layer structure is simple, and regular film thickness design, the number of plies is less, and operation easy to accomplish, relative difficulty is lower, realizes
Cost is relatively low；
(4) three-colour filter provided by the invention, structure is simple, and handling ease, manufacturing cost is low, application easy to spread.
Detailed description of the invention
The invention will be further described in conjunction with the embodiments with reference to the accompanying drawings:
Fig. 1 is the structural schematic diagram of three-colour filter of the present invention；
Fig. 2 is the combined permeation effect picture of three-colour filter provided by embodiment 1；
Fig. 3 is the combined permeation effect picture of three-colour filter provided by embodiment 2；
Fig. 4 is the combined permeation effect picture of three-colour filter provided by embodiment 3；
Fig. 5 is the combined permeation effect picture of three-colour filter provided by embodiment 4.
Symbol description in figure: 1, optical glass matrix, 2, threeway filter coating, 3, wide bandpass filters, 4, air.
Specific embodiment
The content of present invention is described in detail with specific embodiment with reference to the accompanying drawings of the specification:
As shown in Figure 1, being provided by the invention the present invention is implemented as follows: a kind of three-colour filter, it is characterised in that:
The optical filter is by optical glass matrix 1 and the threeway filter coating 2 and width that are respectively deposited on the two sides of optical glass matrix 1
Bandpass filters 3 form, and three passbands of the threeway filter coating 2 respectively correspond red, green, blue three primary colours, the logical filter in the broadband
Light film 3 ends other bypass belts other than three passband of red, green, blue.
Preferably, the threeway filter coating 2 is using the 11 tunic layers composition based on Fabry-Perot Luo optical filtering membrane structure.
Preferably, the film structure of the threeway filter coating 2 is AIR | HL^2H12LH (LH) ^2 | SUB, wherein H is four points
One of optical thickness high refractive index layer, L is the low-index film of a quarter optical thickness, and AIR is that incident medium is empty
Gas, SUB are optical glass matrix 1, and ^2 indicates that membrane stack number of repetition is twice.
Preferably, the film structure of the threeway filter coating 2 is AIR | HL^2H10LH (LH) ^2 | SUB, wherein H is four points
One of optical thickness high refractive index layer, L is the low-index film of a quarter optical thickness, and AIR is that incident medium is empty
Gas, SUB are optical glass matrix 1, and ^2 indicates that membrane stack number of repetition is twice.
Preferably, the threeway filter coating 2 is by high refractive index medium material TiO2Film layer and low refractive index dielectric material SiO2
11 tunics that film layer is successively alternately stacked composition, the thickness of 11 tunic is from the inside to the outside successively are as follows: and the 1st layer, TiO2 film layer, thickness
For 57.1-58.2nm；2nd layer, SiO2 film layer, with a thickness of 93.2-95.1nm；3rd layer, TiO2 film layer, with a thickness of 57.1-
58.2nm；4th layer, SiO2 film layer, with a thickness of 93.2-95.1nm；5th layer, TiO2 film layer, with a thickness of 57.1-58.2nm；6th
Layer, SiO2 film layer, with a thickness of 1118.8-1141.4nm；7th layer, TiO2 film layer, with a thickness of 57.1-58.2nm；8th layer, SiO2
Film layer, with a thickness of 93.2-95.1nm；9th layer, TiO2 film layer, with a thickness of 57.1-58.2nm；10th layer, SiO2 film layer, thickness
For 93.2-95.1nm, 11th layer, TiO2 film layer, with a thickness of 57.1-58.2nm.
Preferably, the wide bandpass filters 3 are by high refractive index medium material TiO2Film layer and low refractive index dielectric material
SiO234 tunics that film layer is successively alternately stacked composition, the thickness of 34 tunic is from the inside to the outside successively are as follows: and the 1st layer, TiO2 film layer,
With a thickness of 16.7-17.0nm；2nd layer, SiO2 film layer, with a thickness of 44.0-44.9nm；3rd layer, TiO2 film layer, with a thickness of
161.0-164.2nm；4th layer, SiO2 film layer, with a thickness of 63.7-65.0nm；5th layer, TiO2 film layer, with a thickness of 23.9-
24.4nm；6th layer, SiO2 film layer, with a thickness of 71.9-73.3nm；7th layer, TiO2 film layer, with a thickness of 48.5-49.5nm；8th
Layer, SiO2 film layer, with a thickness of 70.7-72.1nm；9th layer, TiO2 film layer, with a thickness of 31.3-32.0nm；10th layer, SiO2 film
Layer, with a thickness of 62.2-63.4nm, 11th layer, TiO2 film layer, with a thickness of 47.1-48.0nm；12nd layer, SiO2 film layer, with a thickness of
75.4-77.0nm；13rd layer, TiO2 film layer, with a thickness of 32.8-33.4nm；14th layer, SiO2 film layer, with a thickness of 55.7-
56.8nm；15th layer, TiO2 film layer, with a thickness of 147.8-150.8nm；16th layer, SiO2 film layer, with a thickness of 84.3-86.0nm；
17th layer, TiO2 film layer, with a thickness of 126.0-128.6nm；18th layer, SiO2 film layer, with a thickness of 74.5-76.0nm；19th layer,
TiO2 film layer, with a thickness of 46.2-47.1nm；20th layer, SiO2 film layer, with a thickness of 196.8-200.8nm；21st layer, TiO2 film
Layer, with a thickness of 53.9-55.0nm；22nd layer, SiO2 film layer, with a thickness of 120.9-123.4nm；23rd layer, TiO2 film layer, thickness
For 101.9-104.0nm；24th layer, SiO2 film layer, with a thickness of 98.4-100.4nm；25th layer, TiO2 film layer, with a thickness of
73.3-74.7nm；26th layer, SiO2 film layer, with a thickness of 170.0-173.4nm；27th layer, TiO2 film layer, with a thickness of 56.0-
57.1nm；28th layer, SiO2 film layer, with a thickness of 342.5-349.4nm；29th layer, TiO2 film layer, with a thickness of 86.8-88.5nm；
30th layer, SiO2 film layer, with a thickness of 117.1-119.4nm；31st layer, TiO2 film layer, with a thickness of 102.0-104.1nm；32nd
Layer, SiO2 film layer, with a thickness of 90.0-91.8nm；33rd layer, TiO2 film layer, with a thickness of 98.0-100.0nm；34th layer, SiO2
Film layer, with a thickness of 59.0-60.1nm.
Manufacturing process of the invention includes: to prepare skill using various optical thin films in the vacuum chamber of vacuum coating equipment
Art, in 1 two sides of the optical glass matrix TiO that successively accurate deposition specific thickness requires2Film layer and SiO2Film layer ultimately forms 11
The wide bandpass filters 3 of the threeway filter coating 2 and 34 layer structure of layer structure.
Embodiment 1:
A kind of three-colour filter, the optical filter is by optical glass matrix 1 and is respectively deposited at the two of optical glass matrix 1
Threeway filter coating 2 on side and wide bandpass filters 3 form, three passbands of the threeway filter coating 2 respectively correspond it is red,
Green, blue three primary colours, the wide bandpass filters 3 end other bypass belts other than three passband of red, green, blue.
The threeway filter coating 2 is by high refractive index medium material TiO2Film layer and low refractive index dielectric material SiO2Film layer according to
The secondary 11 tunics composition being alternately stacked, the thickness of 11 tunic is from the inside to the outside successively are as follows: and the 1st layer, TiO2 film layer, with a thickness of
57.7nm；2nd layer, SiO2 film layer, with a thickness of 94.2nm；3rd layer, TiO2 film layer, with a thickness of 57.7nm；4th layer, SiO2 film
Layer, with a thickness of 94.2nm；5th layer, TiO2 film layer, with a thickness of 57.7nm；6th layer, SiO2 film layer, with a thickness of 1130.1nm；7th
Layer, TiO2 film layer, with a thickness of 57.7nm；8th layer, SiO2 film layer, with a thickness of 94.2nm；9th layer, TiO2 film layer, with a thickness of
57.7nm；10th layer, SiO2 film layer, with a thickness of 94.2nm, 11th layer, TiO2 film layer, with a thickness of 57.7nm.
The wide bandpass filters 3 are by high refractive index medium material TiO2Film layer and low refractive index dielectric material SiO2Film layer
The 34 tunics composition being successively alternately stacked, the thickness of 34 tunic is from the inside to the outside successively are as follows: and the 1st layer, TiO2 film layer, with a thickness of
16.9nm；2nd layer, SiO2 film layer, with a thickness of 44.4nm；3rd layer, TiO2 film layer, with a thickness of 162.6nm；4th layer, SiO2 film
Layer, with a thickness of 64.3nm；5th layer, TiO2 film layer, with a thickness of 24.2nm；6th layer, SiO2 film layer, with a thickness of 72.6nm；7th
Layer, TiO2 film layer, with a thickness of 49.0nm；8th layer, SiO2 film layer, with a thickness of 71.4nm；9th layer, TiO2 film layer, with a thickness of
31.6nm；10th layer, SiO2 film layer, with a thickness of 62.8nm, 11th layer, TiO2 film layer, with a thickness of 47.5nm；12nd layer, SiO2
Film layer, with a thickness of 76.2nm；13rd layer, TiO2 film layer, with a thickness of 33.1nm；14th layer, SiO2 film layer, with a thickness of 56.2m；The
15 layers, TiO2 film layer, with a thickness of 149.3nm；16th layer, SiO2 film layer, with a thickness of 85.2nm；17th layer, TiO2 film layer, thickness
For 127.3nm；18th layer, SiO2 film layer, with a thickness of 75.3nm；19th layer, TiO2 film layer, with a thickness of 46.7nm；20th layer,
SiO2 film layer, with a thickness of 198.8nm；21st layer, TiO2 film layer, with a thickness of 54.5nm；22nd layer, SiO2 film layer, with a thickness of
122.1nm；23rd layer, TiO2 film layer, with a thickness of 103.0nm；24th layer, SiO2 film layer, with a thickness of 99.4nm；25th layer,
TiO2 film layer, with a thickness of 74.0nm；26th layer, SiO2 film layer, with a thickness of 171.7nm；27th layer, TiO2 film layer, with a thickness of
56.5nm；28th layer, SiO2 film layer, with a thickness of 345.9nm；29th layer, TiO2 film layer, with a thickness of 87.6nm；30th layer, SiO2
Film layer, with a thickness of 118.2nm；31st layer, TiO2 film layer, with a thickness of 103.0nm；32nd layer, SiO2 film layer, with a thickness of
90.9nm；33rd layer, TiO2 film layer, with a thickness of 99.0nm；34th layer, SiO2 film layer, with a thickness of 59.6nm.
As shown in Fig. 2, for the combined permeation effect picture of three color optical filtering optical filters provided by the embodiment of the present invention 1, from
As can be seen that the central wavelength of the corresponding three primary colours of optical filter provided by the invention and peak transmittance are respectively as follows: blue T in figure
=96%@484nm, green T=96%@550nm, red T=96%@635nm, RGB three coloured light bands of a spectrum are relatively narrow, intensity is managed
Think, color saturation height.
Embodiment 2:
Embodiment 2 the difference from embodiment 1 is that: by the optical thickness of the wall (the 6th layer) in threeway filter coating 2 by
The 12L of embodiment 1 is adjusted to 10L.The thickness of 11 tunics is from the inside to the outside successively after adjustment, in threeway filter coating 2 are as follows: and the 1st layer,
TiO2 film layer, with a thickness of 57.7nm；2nd layer, SiO2 film layer, with a thickness of 94.2nm；3rd layer, TiO2 film layer, with a thickness of
57.7nm；4th layer, SiO2 film layer, with a thickness of 94.2nm；5th layer, TiO2 film layer, with a thickness of 57.7nm；6th layer, SiO2 film
Layer, with a thickness of 941.8nm；7th layer, TiO2 film layer, with a thickness of 57.7nm；8th layer, SiO2 film layer, with a thickness of 94.2nm；9th
Layer, TiO2 film layer, with a thickness of 57.7nm；10th layer, SiO2 film layer, with a thickness of 94.2nm, 11th layer, TiO2 film layer, with a thickness of
57.7nm。
As shown in figure 3, for the combined permeation effect picture of three-colour filter provided by the embodiment of the present invention 2, Cong Tuzhong
The central wavelength that can be seen that the corresponding three primary colours of optical filter provided by the invention changes are as follows: and blue T=96% 478nm is green
Color T=96%@550nm, red T=97%@646nm, although blue and red spectral wavelength are varied, what it was exported
RGB three coloured light spectrum keeps the feature that narrow bandwidth, intensity are ideal, color saturation is high.
Embodiment 3:
A kind of three-colour filter, the optical filter is by optical glass matrix 1 and is respectively deposited at the two of optical glass matrix 1
Threeway filter coating 2 on side and wide bandpass filters 3 form, three passbands of the threeway filter coating 2 respectively correspond it is red,
Green, blue three primary colours, the wide bandpass filters 3 end other bypass belts other than three passband of red, green, blue.
The threeway filter coating 2 is by high refractive index medium material TiO2Film layer and low refractive index dielectric material SiO2Film layer according to
The secondary 11 tunics composition being alternately stacked, the thickness of 11 tunic is from the inside to the outside successively are as follows: and the 1st layer, TiO2 film layer, with a thickness of
57.1nm；2nd layer, SiO2 film layer, with a thickness of 93.2nm；3rd layer, TiO2 film layer, with a thickness of 57.1nm；4th layer, SiO2 film
Layer, with a thickness of 93.2nm；5th layer, TiO2 film layer, with a thickness of 57.1nm；6th layer, SiO2 film layer, with a thickness of 1118.8nm；7th
Layer, TiO2 film layer, with a thickness of 57.1nm；8th layer, SiO2 film layer, with a thickness of 93.2nm；9th layer, TiO2 film layer, with a thickness of
57.1nm；10th layer, SiO2 film layer, with a thickness of 93.2nm, 11th layer, TiO2 film layer, with a thickness of 57.1nm.
The wide bandpass filters 3 are by high refractive index medium material TiO2Film layer and low refractive index dielectric material SiO2Film layer
The 34 tunics composition being successively alternately stacked, the thickness of 34 tunic is from the inside to the outside successively are as follows: and the 1st layer, TiO2 film layer, with a thickness of
16.7nm；2nd layer, SiO2 film layer, with a thickness of 44.0nm；3rd layer, TiO2 film layer, with a thickness of 161.0nm；4th layer, SiO2 film
Layer, with a thickness of 63.7nm；5th layer, TiO2 film layer, with a thickness of 23.9nm；6th layer, SiO2 film layer, with a thickness of 71.9nm；7th
Layer, TiO2 film layer, with a thickness of 48.5nm；8th layer, SiO2 film layer, with a thickness of 70.7nm；9th layer, TiO2 film layer, with a thickness of
31.3nm；10th layer, SiO2 film layer, with a thickness of 62.2nm, 11th layer, TiO2 film layer, with a thickness of 47.1nm；12nd layer, SiO2
Film layer, with a thickness of 75.4nm；13rd layer, TiO2 film layer, with a thickness of 32.8nm；14th layer, SiO2 film layer, with a thickness of 55.7nm；
15th layer, TiO2 film layer, with a thickness of 147.8nm；16th layer, SiO2 film layer, with a thickness of 84.3nm；17th layer, TiO2 film layer is thick
Degree is 126.0nm；18th layer, SiO2 film layer, with a thickness of 74.5nm；19th layer, TiO2 film layer, with a thickness of 46.2nm；20th layer,
SiO2 film layer, with a thickness of 196.8nm；21st layer, TiO2 film layer, with a thickness of 53.9nm；22nd layer, SiO2 film layer, with a thickness of
120.9nm；23rd layer, TiO2 film layer, with a thickness of 101.9nm；24th layer, SiO2 film layer, with a thickness of 98.4nm；25th layer,
TiO2 film layer, with a thickness of 73.3nm；26th layer, SiO2 film layer, with a thickness of 170.0nm；27th layer, TiO2 film layer, with a thickness of
56.0nm；28th layer, SiO2 film layer, with a thickness of 342.5nm；29th layer, TiO2 film layer, with a thickness of 86.8nm；30th layer, SiO2
Film layer, with a thickness of 117.1nm；31st layer, TiO2 film layer, with a thickness of 102.0nm；32nd layer, SiO2 film layer, with a thickness of
90.0nm；33rd layer, TiO2 film layer, with a thickness of 98.0nm；34th layer, SiO2 film layer, with a thickness of 59.0nm.
As shown in figure 4, for the combined permeation effect picture of three-colour filter provided by the embodiment of the present invention 3, Cong Tuzhong
As can be seen that the central wavelength and peak transmittance of the corresponding three primary colours of optical filter provided by the invention are respectively as follows: blue T=
96%@480nm, green T=96%@545nm, red T=96%@629nm, the RGB three coloured light spectrum holding narrow bandwidth of output,
The feature that intensity is ideal, color saturation is high.
Embodiment 4:
A kind of three-colour filter, the optical filter is by optical glass matrix 1 and is respectively deposited at the two of optical glass matrix 1
Threeway filter coating 2 on side and wide bandpass filters 3 form, three passbands of the threeway filter coating 2 respectively correspond it is red,
Green, blue three primary colours, the wide bandpass filters 3 end other bypass belts other than three passband of red, green, blue.
The threeway filter coating 2 is by high refractive index medium material TiO2Film layer and low refractive index dielectric material SiO2Film layer according to
The secondary 11 tunics composition being alternately stacked, the thickness of 11 tunic is from the inside to the outside successively are as follows: and the 1st layer, TiO2 film layer, with a thickness of
58.2nm；2nd layer, SiO2 film layer, with a thickness of 95.1nm；3rd layer, TiO2 film layer, with a thickness of 58.2nm；4th layer, SiO2 film
Layer, with a thickness of 95.1nm；5th layer, TiO2 film layer, with a thickness of 58.2nm；6th layer, SiO2 film layer, with a thickness of 1141.4nm；7th
Layer, TiO2 film layer, with a thickness of 58.2nm；8th layer, SiO2 film layer, with a thickness of 95.1nm；9th layer, TiO2 film layer, with a thickness of
58.2nm；10th layer, SiO2 film layer, with a thickness of 95.1nm, 11th layer, TiO2 film layer, with a thickness of 58.2nm.
The wide bandpass filters 3 are by high refractive index medium material TiO2Film layer and low refractive index dielectric material SiO2Film layer
The 34 tunics composition being successively alternately stacked, the thickness of 34 tunic is from the inside to the outside successively are as follows: and the 1st layer, TiO2 film layer, with a thickness of
17.0nm；2nd layer, SiO2 film layer, with a thickness of 44.9nm；3rd layer, TiO2 film layer, with a thickness of 164.2nm；4th layer, SiO2 film
Layer, with a thickness of 65.0nm；5th layer, TiO2 film layer, with a thickness of 24.4nm；6th layer, SiO2 film layer, with a thickness of 73.3nm；7th
Layer, TiO2 film layer, with a thickness of 49.5nm；8th layer, SiO2 film layer, with a thickness of 72.1nm；9th layer, TiO2 film layer, with a thickness of
32.0nm；10th layer, SiO2 film layer, with a thickness of 63.4nm, 11th layer, TiO2 film layer, with a thickness of 48.0nm；12nd layer, SiO2
Film layer, with a thickness of 77.0nm；13rd layer, TiO2 film layer, with a thickness of 33.4nm；14th layer, SiO2 film layer, with a thickness of 56.8nm；
15th layer, TiO2 film layer, with a thickness of 150.8nm；16th layer, SiO2 film layer, with a thickness of 86.0nm；17th layer, TiO2 film layer is thick
Degree is 128.6nm；18th layer, SiO2 film layer, with a thickness of 76.0nm；19th layer, TiO2 film layer, with a thickness of 47.1nm；20th layer,
SiO2 film layer, with a thickness of 200.8nm；21st layer, TiO2 film layer, with a thickness of 55.0nm；22nd layer, SiO2 film layer, with a thickness of
123.4nm；23rd layer, TiO2 film layer, with a thickness of 104.0nm；24th layer, SiO2 film layer, with a thickness of 100.4nm；25th layer,
TiO2 film layer, with a thickness of 74.7nm；26th layer, SiO2 film layer, with a thickness of 173.4nm；27th layer, TiO2 film layer, with a thickness of
57.1nm；28th layer, SiO2 film layer, with a thickness of 349.4nm；29th layer, TiO2 film layer, with a thickness of 88.5nm；30th layer, SiO2
Film layer, with a thickness of 119.4nm；31st layer, TiO2 film layer, with a thickness of 104.1nm；32nd layer, SiO2 film layer, with a thickness of
91.8nm；33rd layer, TiO2 film layer, with a thickness of 100.0nm；34th layer, SiO2 film layer, with a thickness of 60.1nm.
As shown in figure 5, for the combined permeation effect picture of three-colour filter provided by the embodiment of the present invention 4, Cong Tuzhong
As can be seen that the central wavelength and peak transmittance of the corresponding three primary colours of optical filter provided by the invention are respectively as follows: blue T=
96%@488nm, green T=96%@555nm, red T=96%@641nm, the RGB three coloured light spectrum holding narrow bandwidth of output,
The feature that intensity is ideal, color saturation is high.
Above-mentioned specific embodiment is only explained in detail technical solution of the present invention, the present invention not only only office
It is limited to above-described embodiment, all any improvement or replacement according to the principle of the invention should all be within protection scope of the present invention.
Claims (8)
1. a kind of three-colour filter, it is characterised in that: the optical filter is by optical glass matrix (1) and is respectively deposited at optics glass
Threeway filter coating (2) and wide bandpass filters (3) on the two sides of glass matrix (1) form, and the three of the threeway filter coating (2)
A passband respectively corresponds red, green, blue three primary colours, and the width bandpass filters (3) are ended other other than three passband of red, green, blue
Bypass belt.
2. three-colour filter according to claim 1, it is characterised in that: the threeway filter coating (2) is using based on method cloth
In -11 tunic layers of amber Luo optical filtering membrane structure composition.
3. three-colour filter according to claim 1, it is characterised in that: the film structure of the threeway filter coating (2) is
AIR | (HL) ^2H12LH (LH) ^2 | SUB, wherein H is the high refractive index layer of a quarter optical thickness, and L is a quarter light
The low-index film of thickness is learned, AIR is incident medium air, and SUB is optical glass matrix (1), and ^2 indicates membrane stack repetition time
Number is twice.
4. three-colour filter according to claim 1, it is characterised in that: the film structure of the threeway filter coating (2) is
AIR | (HL) ^2H10LH (LH) ^2 | SUB, wherein H is the high refractive index layer of a quarter optical thickness, and L is a quarter light
The low-index film of thickness is learned, AIR is incident medium air, and SUB is optical glass matrix (1), and ^2 indicates membrane stack repetition time
Number is twice.
5. three-colour filter according to claim 1, it is characterised in that: the threeway filter coating (2) is situated between by high refractive index
Material TiO2Film layer and low refractive index dielectric material SiO2The 11 tunics composition that film layer is successively alternately stacked, the thickness of 11 tunic
It spends from the inside to the outside successively are as follows: the 1st layer, TiO2 film layer, with a thickness of 57.1-58.2nm；2nd layer, SiO2 film layer, with a thickness of 93.2-
95.1nm；3rd layer, TiO2 film layer, with a thickness of 57.1-58.2nm；4th layer, SiO2 film layer, with a thickness of 93.2-95.1nm；5th
Layer, TiO2 film layer, with a thickness of 57.1-58.2nm；6th layer, SiO2 film layer, with a thickness of 1118.8-1141.4nm；7th layer, TiO2
Film layer, with a thickness of 57.1-58.2nm；8th layer, SiO2 film layer, with a thickness of 93.2-95.1nm；9th layer, TiO2 film layer, with a thickness of
57.1-58.2nm；10th layer, SiO2 film layer, with a thickness of 93.2-95.1nm, 11th layer, TiO2 film layer, with a thickness of 57.1-
58.2nm。
6. three-colour filter according to claim 5, it is characterised in that: the thickness of 11 tunics of the threeway filter coating (2)
Degree is successively are as follows: and the 1st layer, TiO2 film layer, with a thickness of 57.7nm；2nd layer, SiO2 film layer, with a thickness of 94.2nm；3rd layer, TiO2 film
Layer, with a thickness of 57.7nm；4th layer, SiO2 film layer, with a thickness of 94.2nm；5th layer, TiO2 film layer, with a thickness of 57.7nm；6th
Layer, SiO2 film layer, with a thickness of 1130.1nm；7th layer, TiO2 film layer, with a thickness of 57.7nm；8th layer, SiO2 film layer, with a thickness of
94.2nm；9th layer, TiO2 film layer, with a thickness of 57.7nm；10th layer, SiO2 film layer, with a thickness of 94.2nm, 11th layer, TiO2 film
Layer, with a thickness of 57.7nm.
7. three-colour filter according to claim 1, it is characterised in that: the width bandpass filters (3) are by high refractive index
Dielectric material TiO2Film layer and low refractive index dielectric material SiO2The 34 tunics composition that film layer is successively alternately stacked, 34 tunic
Thickness is from the inside to the outside successively are as follows: and the 1st layer, TiO2 film layer, with a thickness of 16.7-17.0nm；2nd layer, SiO2 film layer, with a thickness of
44.0-44.9nm；3rd layer, TiO2 film layer, with a thickness of 161.0-164.2nm；4th layer, SiO2 film layer, with a thickness of 63.7-
65.0nm；5th layer, TiO2 film layer, with a thickness of 23.9-24.4nm；6th layer, SiO2 film layer, with a thickness of 71.9-73.3nm；7th
Layer, TiO2 film layer, with a thickness of 48.5-49.5nm；8th layer, SiO2 film layer, with a thickness of 70.7-72.1nm；9th layer, TiO2 film
Layer, with a thickness of 31.3-32.0nm；10th layer, SiO2 film layer, with a thickness of 62.2-63.4nm, 11th layer, TiO2 film layer, with a thickness of
47.1-48.0nm；12nd layer, SiO2 film layer, with a thickness of 75.4-77.0nm；13rd layer, TiO2 film layer, with a thickness of 32.8-
33.4nm；14th layer, SiO2 film layer, with a thickness of 55.7-56.8nm；15th layer, TiO2 film layer, with a thickness of 147.8-150.8nm；
16th layer, SiO2 film layer, with a thickness of 84.3-86.0nm；17th layer, TiO2 film layer, with a thickness of 126.0-128.6nm；18th layer,
SiO2 film layer, with a thickness of 74.5-76.0nm；19th layer, TiO2 film layer, with a thickness of 46.2-47.1nm；20th layer, SiO2 film layer,
With a thickness of 196.8-200.8nm；21st layer, TiO2 film layer, with a thickness of 53.9-55.0nm；22nd layer, SiO2 film layer, with a thickness of
120.9-123.4nm；23rd layer, TiO2 film layer, with a thickness of 101.9-104.0nm；24th layer, SiO2 film layer, with a thickness of 98.4-
100.4nm；25th layer, TiO2 film layer, with a thickness of 73.3-74.7nm；26th layer, SiO2 film layer, with a thickness of 170.0-
173.4nm；27th layer, TiO2 film layer, with a thickness of 56.0-57.1nm；28th layer, SiO2 film layer, with a thickness of 342.5-
349.4nm；29th layer, TiO2 film layer, with a thickness of 86.8-88.5nm；30th layer, SiO2 film layer, with a thickness of 117.1-
119.4nm；31st layer, TiO2 film layer, with a thickness of 102.0-104.1nm；32nd layer, SiO2 film layer, with a thickness of 90.0-
91.8nm；33rd layer, TiO2 film layer, with a thickness of 98.0-100.0nm；34th layer, SiO2 film layer, with a thickness of 59.0-60.1nm.
8. three-colour filter according to claim 7, it is characterised in that: 34 tunics of the width bandpass filters (3)
Thickness is successively are as follows: and the 1st layer, TiO2 film layer, with a thickness of 16.9nm；2nd layer, SiO2 film layer, with a thickness of 44.4nm；3rd layer, TiO2
Film layer, with a thickness of 162.6nm；4th layer, SiO2 film layer, with a thickness of 64.3nm；5th layer, TiO2 film layer, with a thickness of 24.2nm；The
6 layers, SiO2 film layer, with a thickness of 72.6nm；7th layer, TiO2 film layer, with a thickness of 49.0nm；8th layer, SiO2 film layer, with a thickness of
71.4nm；9th layer, TiO2 film layer, with a thickness of 31.6nm；10th layer, SiO2 film layer, with a thickness of 62.8nm, 11th layer, TiO2 film
Layer, with a thickness of 47.5nm；12nd layer, SiO2 film layer, with a thickness of 76.2nm；13rd layer, TiO2 film layer, with a thickness of 33.1nm；The
14 layers, SiO2 film layer, with a thickness of 56.2m；15th layer, TiO2 film layer, with a thickness of 149.3nm；16th layer, SiO2 film layer, thickness
For 85.2nm；17th layer, TiO2 film layer, with a thickness of 127.3nm；18th layer, SiO2 film layer, with a thickness of 75.3nm；19th layer,
TiO2 film layer, with a thickness of 46.7nm；20th layer, SiO2 film layer, with a thickness of 198.8nm；21st layer, TiO2 film layer, with a thickness of
54.5nm；22nd layer, SiO2 film layer, with a thickness of 122.1nm；23rd layer, TiO2 film layer, with a thickness of 103.0nm；24th layer,
SiO2 film layer, with a thickness of 99.4nm；25th layer, TiO2 film layer, with a thickness of 74.0nm；26th layer, SiO2 film layer, with a thickness of
171.7nm；27th layer, TiO2 film layer, with a thickness of 56.5nm；28th layer, SiO2 film layer, with a thickness of 345.9nm；29th layer,
TiO2 film layer, with a thickness of 87.6nm；30th layer, SiO2 film layer, with a thickness of 118.2nm；31st layer, TiO2 film layer, with a thickness of
103.0nm；32nd layer, SiO2 film layer, with a thickness of 90.9nm；33rd layer, TiO2 film layer, with a thickness of 99.0nm；34th layer, SiO2
Film layer, with a thickness of 59.6nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910304636.8A CN110045450B (en) | 2019-04-16 | 2019-04-16 | Trichromatic filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910304636.8A CN110045450B (en) | 2019-04-16 | 2019-04-16 | Trichromatic filter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110045450A true CN110045450A (en) | 2019-07-23 |
| CN110045450B CN110045450B (en) | 2024-03-12 |
Family
ID=67277428
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910304636.8A Active CN110045450B (en) | 2019-04-16 | 2019-04-16 | Trichromatic filter |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110045450B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113759452A (en) * | 2021-04-07 | 2021-12-07 | 广州市佳禾光电科技有限公司 | Three-way filter plate and preparation method thereof, biological imaging device and identification system |
| CN114114495A (en) * | 2021-01-28 | 2022-03-01 | 广州市佳禾光电科技有限公司 | Three-way optical filter and biological identification system thereof |
| EP4116682A3 (en) * | 2021-07-07 | 2023-03-29 | Viavi Solutions Inc. | Multi-bandpass optical interference filter |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004219900A (en) * | 2003-01-17 | 2004-08-05 | Sony Corp | Screen, optical film, glasses, and manufacturing method of screen |
| CN203164464U (en) * | 2013-02-19 | 2013-08-28 | 东莞五方光电科技有限公司 | Infrared cut-off optical filter |
| CN208689198U (en) * | 2018-08-02 | 2019-04-02 | 利基光电科技(九江)有限公司 | Day and night two use optical filter |
| CN209707725U (en) * | 2019-04-16 | 2019-11-29 | 福建福特科光电股份有限公司 | Three-colour filter |
-
2019
- 2019-04-16 CN CN201910304636.8A patent/CN110045450B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004219900A (en) * | 2003-01-17 | 2004-08-05 | Sony Corp | Screen, optical film, glasses, and manufacturing method of screen |
| CN203164464U (en) * | 2013-02-19 | 2013-08-28 | 东莞五方光电科技有限公司 | Infrared cut-off optical filter |
| CN208689198U (en) * | 2018-08-02 | 2019-04-02 | 利基光电科技(九江)有限公司 | Day and night two use optical filter |
| CN209707725U (en) * | 2019-04-16 | 2019-11-29 | 福建福特科光电股份有限公司 | Three-colour filter |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114114495A (en) * | 2021-01-28 | 2022-03-01 | 广州市佳禾光电科技有限公司 | Three-way optical filter and biological identification system thereof |
| CN114114495B (en) * | 2021-01-28 | 2023-10-24 | 广州市佳禾光电科技有限公司 | Tee bend light filter and biological identification system thereof |
| CN113759452A (en) * | 2021-04-07 | 2021-12-07 | 广州市佳禾光电科技有限公司 | Three-way filter plate and preparation method thereof, biological imaging device and identification system |
| EP4116682A3 (en) * | 2021-07-07 | 2023-03-29 | Viavi Solutions Inc. | Multi-bandpass optical interference filter |
Also Published As
| Publication number | Publication date |
|---|---|
| CN110045450B (en) | 2024-03-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN110045450A (en) | Three-colour filter | |
| CN100475915C (en) | All-dielectric optically variable pigments | |
| US20080013178A1 (en) | Dielectric multilayer filter | |
| US5200855A (en) | Absorbing dichroic filters | |
| JP4401880B2 (en) | Multiple band pass filter | |
| US20100188737A1 (en) | Dielectric multilayer filter | |
| US4659178A (en) | Optical filter | |
| CN111257985B (en) | Matched interference pigments or foils and methods of designing same | |
| JP2003294938A5 (en) | ||
| US20070217045A1 (en) | Color filter substrate | |
| JP2022541974A (en) | NEAR INFRARED NARROW-BAND OPTICAL FILTER AND MANUFACTURING METHOD | |
| WO2003083528A1 (en) | Dichroic mirror and projection type display unit | |
| CN104834024B (en) | A kind of double; two disappear short-pass film system and color-separation and color-recombination device | |
| CN209707725U (en) | Three-colour filter | |
| CN102819058A (en) | Making method of multi-channel integrated optical filter | |
| JP2007171735A (en) | Wide band anti-reflection film | |
| US7697209B2 (en) | Dichroic mirror | |
| CN204631282U (en) | A kind of two short-pass optical filter that disappears | |
| CN105005107B (en) | A kind of multispectral two-channel photon crystal wave filter of visible region | |
| JP4095344B2 (en) | Trimming filter | |
| CN115639638B (en) | Low-angle effect multi-notch color separation filter for multi-channel fluorescence detection | |
| JPH01254087A (en) | Projection type television receiver | |
| CN103487864B (en) | A kind of plate wedge colour annalyzer | |
| JP2004317738A5 (en) | ||
| JP2008058561A (en) | Optical filter and color separation prism |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |