CN110018757B - Touch substrate and manufacturing method - Google Patents
Touch substrate and manufacturing method Download PDFInfo
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- CN110018757B CN110018757B CN201910187162.3A CN201910187162A CN110018757B CN 110018757 B CN110018757 B CN 110018757B CN 201910187162 A CN201910187162 A CN 201910187162A CN 110018757 B CN110018757 B CN 110018757B
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- electrode
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
Abstract
The invention provides a touch substrate and a manufacturing method thereof, wherein the touch substrate comprises a substrate and a touch layer positioned on the substrate, and the touch layer comprises: the first electrode group comprises at least two first electrodes arranged along a first direction; at least one second electrode group, which comprises at least two second electrodes arranged along a second direction; the first electrode and the second electrode are arranged in an insulated and crossed mode. According to the invention, the first electrodes and the second electrodes which are crossed in an insulating manner are formed on the substrate through different photomask processes, so that the two adjacent first electrodes or second electrodes are not electrically connected through a bridge, the arrangement of the contact holes is eliminated, the contact impedance is eliminated, and the touch sensitivity of the touch substrate is enhanced.
Description
Technical Field
The invention relates to the field of display, in particular to a touch substrate and a manufacturing method thereof.
Background
Currently, the commonly used touch technologies include an external touch technology and an embedded touch technology. The external-hanging touch technology is characterized in that a touch sensor is embedded into a display panel, namely the touch sensor is arranged on a liquid crystal panel, and compared with the embedded touch technology, the difficulty is reduced.
In the existing in-cell touch technology, the touch sensor includes self-capacitance and mutual capacitance. The mutual capacitance type touch screen comprises a plurality of touch electrodes and induction electrodes. Contact holes are required to be formed in the adjacent touch electrodes, and the adjacent touch electrodes are electrically connected through bridging connection of the contact holes. The existence of the contact hole generates contact resistance, and the touch sensitivity is reduced.
Disclosure of Invention
The invention provides a touch substrate and a manufacturing method thereof, and aims to solve the technical problem that an existing touch screen is low in touch sensitivity.
In order to solve the above problems, the technical scheme provided by the invention is as follows:
the invention provides a touch substrate, which comprises a substrate and a touch layer positioned on the substrate, wherein the touch layer comprises:
the first electrode group comprises at least two first electrodes arranged along a first direction;
at least one second electrode group, which comprises at least two second electrodes arranged along a second direction;
wherein the first electrode and the second electrode are arranged in an insulated and crossed manner.
In the touch substrate of the present application,
the first electrode group further comprises a first connecting section positioned between two adjacent first electrodes, and the two adjacent first electrodes are electrically connected through the first connecting section;
the second electrode group further comprises a second connecting section positioned between two adjacent second electrodes, and the two adjacent second electrodes are electrically connected through the second connecting section.
In the touch substrate of the present application,
the first electrode, the first connecting section and the second electrode are arranged in the same layer;
the second connecting section is located on the first connecting section.
In the touch substrate of the present application,
the first electrode and the first connecting section are formed in a first photomask process;
the second electrode and the second connecting section are formed in a second photomask process.
In the touch substrate of the present application,
the first electrode group and the second electrode group are formed of metal meshes.
The application also provides a manufacturing method of the touch substrate, which comprises the following steps:
providing a substrate;
forming at least one first electrode group on the substrate;
forming a first insulating layer on the first electrode group;
forming at least one second electrode group on the first insulating layer;
the first electrode group comprises at least two first electrodes arranged along a first direction, the second electrode group comprises at least two second electrodes arranged along a second direction, and the first electrodes and the second electrodes are arranged in an insulated and crossed mode.
In the method of manufacture of the present application,
the step of forming at least one first electrode set on the substrate comprises:
forming a first metal layer on the substrate;
forming at least two first electrodes arranged along a first direction and a first connecting section positioned between two adjacent first electrodes on the first metal layer by using a first photomask process;
and two adjacent first electrodes are electrically connected through the first connecting section.
In the method of manufacture of the present application,
the step of forming at least one second electrode set on the first insulating layer includes:
forming a second metal layer on the first insulating layer;
forming at least two second electrodes arranged along a second direction and a second connecting section positioned between two adjacent second electrodes on the second metal layer by using a second photomask process;
and two adjacent second electrodes are electrically connected through the second connecting section.
In the method of manufacture of the present application,
the first electrode, the first connecting section and the second electrode are arranged in the same layer;
the second connecting section is located on the first connecting section.
In the method of manufacture of the present application,
the first electrode group and the second electrode group are formed of metal meshes.
Has the advantages that: according to the invention, the first electrodes and the second electrodes which are crossed in an insulating manner are formed on the substrate through different photomask processes, so that the two adjacent first electrodes or second electrodes are not electrically connected through a bridge, the arrangement of the contact holes is eliminated, the contact impedance is eliminated, and the touch sensitivity of the touch substrate is enhanced.
Drawings
In order to illustrate the embodiments or the technical solutions in the prior art more clearly, the drawings needed to be used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the invention, and it is obvious for a person skilled in the art that other drawings can be obtained according to these drawings without creative efforts.
FIG. 1 is a top view of a touch layer of a touch substrate according to the present disclosure;
FIG. 2 is a diagram of the structure of the film layer at section A-A of FIG. 1;
FIG. 3 is a diagram of the structure of the film layer at section B-B of FIG. 1;
FIG. 4 is a diagram of the structure of the film layer at section C-C of FIG. 1;
FIG. 5 is an enlarged view of an electrode of the touch substrate of the present application;
FIG. 6 is a step diagram of a method for fabricating a touch substrate according to the present application;
fig. 7A to 7B are process diagrams of a method for manufacturing a touch substrate according to the present application.
Detailed Description
The following description of the various embodiments refers to the accompanying drawings that illustrate specific embodiments in which the invention may be practiced. The directional terms mentioned in the present invention, such as [ upper ], [ lower ], [ front ], [ rear ], [ left ], [ right ], [ inner ], [ outer ], [ side ], are only referring to the directions of the attached drawings. Accordingly, the directional terms used are used for explanation and understanding of the present invention, and are not used for limiting the present invention. In the drawings, elements having similar structures are denoted by the same reference numerals.
Referring to fig. 1, fig. 1 is a top view of a touch layer 20 in a touch substrate 100 according to the present application.
The touch substrate 100 includes a substrate 10 and a touch layer 20 on the substrate 10.
In the present embodiment, the raw material of the substrate 10 may be one of a glass substrate, a quartz substrate, a resin substrate, and the like. The substrate 10 may also be a flexible substrate. The material of the flexible substrate may be PI (polyimide).
The touch layer 20 includes at least one first electrode set 21 and at least one second electrode set 22.
In the present embodiment, the touch layer 20 includes two first electrode groups 21 and two second electrode groups 22.
The first electrode group 21 includes at least two first electrodes 211 arranged in a first direction. In this embodiment, the first electrode group 21 includes three first electrodes 211.
The second electrode group 22 includes at least two second electrodes 221 arranged in a second direction. In this embodiment, the second electrode group 22 includes three second electrodes 221.
In this embodiment, the first electrode 211 and the second electrode 221 are disposed in an insulated and crossed manner.
In this embodiment, the first direction is a horizontal direction, and the second direction is a vertical direction.
In this embodiment, the first electrode 211 is a driving electrode, and the second electrode 221 is a sensing electrode. Alternatively, the first electrode 211 is a sensing electrode, and the second electrode 221 is a driving electrode.
In the touch substrate 100 of the present application, the first electrode group 21 further includes a first connection segment 212 located between two adjacent first electrodes 211, and the two adjacent first electrodes 211 are electrically connected through the first connection segment 212;
the second electrode group 22 further includes a second connection 222 located between two adjacent second electrodes 221, and two adjacent second electrodes 221 are electrically connected through the second connection section 222.
Referring to FIG. 2, FIG. 2 is a diagram illustrating a structure of a film layer of the cross section A-A of FIG. 1.
The touch substrate 100 includes a substrate 10, a first electrode 211 and a first connection segment 212 on the substrate 10, a first insulating layer 30 on the first connection segment 212, a second connection segment 222 on the first insulating layer 30, and a passivation layer 40 on the second connection segment 222.
The first electrode 211 and the first connection segment 212 are formed in a first photo-masking process.
The second connection segment 222 is formed in a second masking process.
Referring to FIG. 3, FIG. 3 is a diagram illustrating a structure of a film layer of the cross section B-B of FIG. 1.
The touch substrate 100 includes a substrate 10, a first electrode 211 and a second electrode 221 on the substrate 10, a first insulating layer 30 on the first electrode 211, and a passivation layer 40 on the first insulating layer 30 and the second electrode 221.
The first electrode 211 and the second electrode 221 are disposed in the same layer.
The first electrode 211 is formed in a first masking process.
The second electrode 221 is formed in a second masking process.
Referring to FIG. 4, FIG. 4 is a diagram illustrating a structure of a film layer at a section C-C of FIG. 1.
The touch substrate 100 includes a substrate 10, a first connection segment 212 on the substrate 10, a first insulating layer 30 on the first connection segment 212, a second electrode 221 and a second connection segment 222 on the first insulating layer 30, and a passivation layer 40 on the second electrode 221 and the second connection segment 222.
The first connection segment 212 and the second electrode 221 are disposed at the same layer.
The first connection segment 212 is formed in a first masking process.
The second electrode 221 and the second connection segment 222 are formed in a second masking process.
The number of the first connection segments 212 between two adjacent first electrodes 211 and the second connection segments 222 between two adjacent second electrodes 221 is not particularly limited. In this embodiment, the number of the first connecting segments 212 between two adjacent first electrodes 211 and the number of the second connecting segments 222 between two adjacent second electrodes 221 are both one.
In this embodiment, the first connecting segment 212 and the second connecting segment 222 have an irregular or regular shape such as a long strip or other curved shapes, which is not illustrated here.
Since the first electrode 211, the second electrode 221, the first connection segment 212, and the second connection segment 222 are located on a pixel unit. In order to ensure the aperture ratio of the pixel unit, the first electrode 211, the second electrode 221, the first connection segment 212, and the second connection segment 222 may be made of a transparent metal material.
In this embodiment, the material of the first electrode 211, the second electrode 221, the first connection segment 212, and the second connection segment 222 may be Indium Tin Oxide (ITO).
In this embodiment, the shapes of the first electrode 211 and the second electrode 221 may be, but are not limited to, diamond shapes in fig. 1. The shape of the first electrode 211 and the second electrode 221 may be one or two of a polygon, a circle, or other shapes.
Referring to fig. 5, fig. 5 is an enlarged view of an electrode in the touch substrate 100 according to the present application.
The first electrode group 21 and the second electrode group 22 are made of metal mesh.
The first electrode 211, the second electrode 221, the first connection section 212, and the second connection section 222 may be formed of a metal mesh.
In the present embodiment, a metal grid is formed by arranging metal lines staggered horizontally and vertically around each pixel unit. The metal wires corresponding to the electrodes with different properties (such as the driving electrode and the sensing electrode) are insulated by a breakpoint.
In this embodiment, since the pixel unit is not shielded by the electrode, the metal materials of the first electrode 211, the second electrode 221, the first connection segment 212, and the second connection segment 222 are not limited to transparent materials.
According to the invention, the first electrodes 211 and the second electrodes 221 which are crossed in an insulating manner are formed on the substrate 10 through different photomask processes, so that the two adjacent first electrodes 211 or second electrodes 221 are not electrically connected through a bridge, the arrangement of contact holes is eliminated, the contact impedance is eliminated, and the touch sensitivity of the touch substrate 100 is enhanced.
Referring to fig. 6, fig. 6 is a step diagram of a method for manufacturing a touch substrate 100 according to the present application.
Referring to fig. 7A to 7B, fig. 7A to 7B are process diagrams of a method for manufacturing a touch substrate 100 according to the present application.
The manufacturing method comprises the following steps:
s10, providing a substrate 10;
referring to fig. 7A, the raw material of the substrate 10 may be one of a glass substrate, a quartz substrate, a resin substrate, and the like. The substrate 10 may also be a flexible substrate. The material of the flexible substrate may be PI (polyimide).
S20, forming at least one first electrode set 21 on the substrate 10;
referring to fig. 7A, step S20 includes:
s201, forming a first metal layer on the substrate 10;
s202, using a first photo-masking process to form at least two first electrodes 211 arranged along a first direction and a first connection segment 212 located between two adjacent first electrodes 211 in the first metal layer.
In this step, the touch layer 20 includes two first electrode groups 21.
Each of the first electrode groups 21 includes at least two first electrodes 211 arranged along a first direction. In this embodiment, the first electrode group 21 includes two first electrodes 211. Two adjacent first electrodes 211 are electrically connected through the first connection section 212.
S30, forming a first insulating layer 30 on the first electrode group 21;
step S30 includes:
s301, forming a first insulating layer 30 on the first electrode group 21;
the first insulating layer (not shown) in this step completely covers the first electrode 211 and the first connection segment 212.
S302, performing a patterning process on the first insulating layer, and removing the first insulating layer not covering the first electrode group 21 to form a plurality of first grooves.
S40, forming at least one second electrode set 22 on the first insulating layer;
referring to fig. 7B, step S40 includes:
step S401 of forming a second metal layer on the first insulating layer 30;
step S402, forming at least two second electrodes 221 arranged along a second direction and a second connection segment 222 located between two adjacent second electrodes 221 on the second metal layer by using a second mask process.
In this step, the touch layer 20 includes two second electrode groups 22.
Each of the second electrode groups 22 includes at least two second electrodes arranged along the second direction. In this embodiment, the second electrode group 22 includes three second electrodes 221. Two adjacent second electrodes 221 are electrically connected through the second connection segment 222.
In this embodiment, the second electrode 221 is located in the first groove.
In this embodiment, the first electrode 211 and the second electrode 221 are disposed in an insulated and crossed manner.
S50, forming a passivation layer 40 on the first insulating layer, the second electrode 221 and the second connection segment 222.
In this embodiment, the first direction is a horizontal direction, and the second direction is a vertical direction.
In this embodiment, the first electrode 211 is a driving electrode, and the second electrode 221 is a sensing electrode. Alternatively, the first electrode 211 is a sensing electrode, and the second electrode 221 is a driving electrode.
Referring to fig. 2, fig. 2 is a diagram illustrating a film structure of a section a-a in fig. 7B.
The touch substrate 100 includes a substrate 10, a first electrode 211 and a first connection segment 212 on the substrate 10, a first insulating layer 30 on the first connection segment 212, a second connection segment 222 on the first insulating layer 30, and a passivation layer 40 on the second connection segment 222.
The first electrode 211 and the first connection segment 212 are formed in a first photo-masking process.
The second connection segment 222 is formed in a second masking process.
Referring to FIG. 3, FIG. 3 is a diagram illustrating a structure of a film layer of the cross section B-B of FIG. 7B.
The touch substrate 100 includes a substrate 10, a first electrode 211 and a second electrode 221 on the substrate 10, a first insulating layer 30 on the first electrode 211, and a passivation layer 40 on the first insulating layer 30 and the second electrode 221.
The first electrode 211 and the second electrode 221 are disposed in the same layer.
The first electrode 211 is formed in a first masking process.
The second electrode 221 is formed in a second masking process.
Referring to FIG. 4, FIG. 4 is a diagram illustrating a structure of a film layer of the cross section C-C of FIG. 7B.
The touch substrate 100 includes a substrate 10, a first connection segment 212 on the substrate 10, a first insulating layer 30 on the first connection segment 212, a second electrode 221 and a second connection segment 222 on the first insulating layer 30, and a passivation layer 40 on the second electrode 221 and the second connection segment 222.
The first connection segment 212 and the second electrode 221 are disposed at the same layer.
The first connection segment 212 is formed in a first masking process.
The second electrode 221 and the second connection segment 222 are formed in a second masking process.
The number of the first connection segments 212 between two adjacent first electrodes 211 and the second connection segments 222 between two adjacent second electrodes 221 is not particularly limited. In this embodiment, the number of the first connecting segments 212 between two adjacent first electrodes 211 and the number of the second connecting segments 222 between two adjacent second electrodes 221 are both one.
In this embodiment, the first connecting segment 212 and the second connecting segment 222 have an irregular or regular shape such as a long strip or other curved shapes, which is not illustrated here.
Since the first electrode 211, the second electrode 221, the first connection segment 212, and the second connection segment 222 are located on a pixel unit. In order to ensure the aperture ratio of the pixel unit, the first electrode 211, the second electrode 221, the first connection segment 212, and the second connection segment 222 may be made of a transparent metal material.
In this embodiment, the material of the first electrode 211, the second electrode 221, the first connection segment 212, and the second connection segment 222 may be Indium Tin Oxide (ITO).
In this embodiment, the shapes of the first electrode 211 and the second electrode 221 may be, but are not limited to, diamond shapes in fig. 1. The shape of the first electrode 211 and the second electrode 221 may be one or two of a polygon, a circle, or other shapes.
Referring to fig. 5, fig. 5 is an enlarged view of an electrode in the touch substrate 100 according to the present application.
The first electrode group 21 and the second electrode group 22 are made of metal mesh.
The first electrode 211, the second electrode 221, the first connection section 212, and the second connection section 222 may be formed of a metal mesh.
In the present embodiment, a metal grid is formed by arranging metal lines staggered horizontally and vertically around each pixel unit. The metal wires corresponding to the electrodes with different properties (such as the driving electrode and the sensing electrode) are insulated by a breakpoint.
In this embodiment, since the pixel unit is not shielded by the electrode, the metal materials of the first electrode 211, the second electrode 221, the first connection segment 212, and the second connection segment 222 are not limited to transparent materials.
According to the invention, the first electrodes 211 and the second electrodes 221 which are crossed in an insulating manner are formed on the substrate 10 through different photomask processes, so that the two adjacent first electrodes 211 or second electrodes 221 are not electrically connected through a bridge, the arrangement of contact holes is eliminated, the contact impedance is eliminated, and the touch sensitivity of the touch substrate 100 is enhanced.
According to another aspect of the invention, a touch screen is also provided, which includes the touch substrate, and a polarizing layer and a cover plate layer sequentially disposed on the touch substrate.
According to still another aspect of the present invention, there is also provided an electronic apparatus, including the touch screen; the electronic device includes, but is not limited to, a mobile phone, a tablet computer, a computer monitor, a game machine, a television, a display screen, a wearable device, and other life appliances or household appliances with display functions.
The working principle of the touch screen and the working principle of the electronic device are similar to the working principle of the touch substrate, and the working principle of the touch screen and the working principle of the electronic device can specifically refer to the working principle of the touch substrate, which is not described herein again.
The invention provides a touch substrate and a manufacturing method thereof, wherein the touch substrate comprises a substrate and a touch layer positioned on the substrate, and the touch layer comprises: the first electrode group comprises at least two first electrodes arranged along a first direction; at least one second electrode group, which comprises at least two second electrodes arranged along a second direction; the first electrode and the second electrode are arranged in an insulated and crossed mode. According to the invention, the first electrodes and the second electrodes which are crossed in an insulating manner are formed on the substrate through different photomask processes, so that the two adjacent first electrodes or second electrodes are not electrically connected through a bridge, the arrangement of the contact holes is eliminated, the contact impedance is eliminated, and the touch sensitivity of the touch substrate is enhanced.
In summary, although the present invention has been described with reference to the preferred embodiments, the above-described preferred embodiments are not intended to limit the present invention, and those skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention, therefore, the scope of the present invention shall be determined by the appended claims.
Claims (7)
1. A touch substrate, comprising a substrate and a touch layer on the substrate, wherein the touch layer comprises:
the first electrode group comprises at least two first electrodes arranged along a first direction;
at least one second electrode group, wherein the second electrode group comprises at least two second electrodes arranged along a second direction;
wherein the first electrode and the second electrode are arranged in an insulated and crossed manner;
the first electrode group further comprises a first connecting section positioned between two adjacent first electrodes, and the two adjacent first electrodes are electrically connected through the first connecting section;
the second electrode group further comprises a second connecting section positioned between two adjacent second electrodes, and the two adjacent second electrodes are electrically connected through the second connecting section.
2. The touch substrate of claim 1,
the first electrode, the first connecting section and the second electrode are arranged in the same layer;
the second connecting section is located on the first connecting section.
3. The touch substrate of claim 2,
the first electrode and the first connecting section are formed in a first photomask process;
the second electrode and the second connecting section are formed in a second photomask process.
4. The touch substrate of claim 1,
the first electrode group and the second electrode group are formed of metal meshes.
5. A manufacturing method of a touch substrate is characterized by comprising the following steps:
providing a substrate;
forming at least one first electrode group on the substrate;
forming a first insulating layer on the first electrode group;
forming at least one second electrode group on the first insulating layer;
the first electrode group comprises at least two first electrodes arranged along a first direction, the second electrode group comprises at least two second electrodes arranged along a second direction, and the first electrodes and the second electrodes are arranged in an insulated and crossed mode;
the step of forming at least one first electrode set on the substrate comprises:
forming a first metal layer on the substrate;
forming at least two first electrodes arranged along a first direction and a first connecting section positioned between two adjacent first electrodes on the first metal layer by using a first photomask process;
wherein two adjacent first electrodes are electrically connected through the first connecting section;
the step of forming at least one second electrode set on the first insulating layer includes:
forming a second metal layer on the first insulating layer;
forming at least two second electrodes arranged along a second direction and a second connecting section positioned between two adjacent second electrodes on the second metal layer by using a second photomask process;
and two adjacent second electrodes are electrically connected through the second connecting section.
6. The method of manufacturing according to claim 5,
the first electrode, the first connecting section and the second electrode are arranged in the same layer;
the second connecting section is located on the first connecting section.
7. The method of manufacturing according to claim 5,
the first electrode group and the second electrode group are formed of metal meshes.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910187162.3A CN110018757B (en) | 2019-03-13 | 2019-03-13 | Touch substrate and manufacturing method |
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| CN201910187162.3A CN110018757B (en) | 2019-03-13 | 2019-03-13 | Touch substrate and manufacturing method |
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| CN110018757B true CN110018757B (en) | 2022-04-05 |
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| CN111796723B (en) * | 2019-10-11 | 2023-06-02 | 武汉华星光电半导体显示技术有限公司 | Touch sensing device and touch display panel |
| CN111522468B (en) * | 2020-04-28 | 2021-11-02 | 武汉华星光电半导体显示技术有限公司 | Touch control display device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106201136A (en) * | 2016-07-01 | 2016-12-07 | 京东方科技集团股份有限公司 | Touch base plate and preparation method thereof, touch screen |
| CN107479754A (en) * | 2017-08-22 | 2017-12-15 | 武汉天马微电子有限公司 | A kind of flexible touch sensor and flexible touch display panel |
| CN108762589A (en) * | 2018-05-30 | 2018-11-06 | 武汉华星光电半导体显示技术有限公司 | touch panel, touch panel preparation method and touch device |
| CN109148535A (en) * | 2018-08-21 | 2019-01-04 | 深圳市华星光电半导体显示技术有限公司 | Array substrate and its manufacturing method, display panel |
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| KR102312314B1 (en) * | 2015-01-28 | 2021-10-13 | 삼성디스플레이 주식회사 | Touch sensor device and manufacturing method |
| CN106020575B (en) * | 2015-03-27 | 2020-12-04 | 东友精细化工有限公司 | Touch panel |
| CN111736398B (en) * | 2017-02-28 | 2023-05-05 | 上海天马微电子有限公司 | Display panel and display device |
| TWI668619B (en) * | 2017-07-07 | 2019-08-11 | 鴻海精密工業股份有限公司 | Micro LED touch display panel |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106201136A (en) * | 2016-07-01 | 2016-12-07 | 京东方科技集团股份有限公司 | Touch base plate and preparation method thereof, touch screen |
| CN107479754A (en) * | 2017-08-22 | 2017-12-15 | 武汉天马微电子有限公司 | A kind of flexible touch sensor and flexible touch display panel |
| CN108762589A (en) * | 2018-05-30 | 2018-11-06 | 武汉华星光电半导体显示技术有限公司 | touch panel, touch panel preparation method and touch device |
| CN109148535A (en) * | 2018-08-21 | 2019-01-04 | 深圳市华星光电半导体显示技术有限公司 | Array substrate and its manufacturing method, display panel |
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