CN110003996B - Soak solution and preparation method and use method thereof - Google Patents
Soak solution and preparation method and use method thereof Download PDFInfo
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- CN110003996B CN110003996B CN201910424770.1A CN201910424770A CN110003996B CN 110003996 B CN110003996 B CN 110003996B CN 201910424770 A CN201910424770 A CN 201910424770A CN 110003996 B CN110003996 B CN 110003996B
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- 238000000034 method Methods 0.000 title claims abstract description 37
- 238000002360 preparation method Methods 0.000 title claims abstract description 22
- 238000002791 soaking Methods 0.000 claims abstract description 84
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims abstract description 63
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims abstract description 42
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 38
- 239000003945 anionic surfactant Substances 0.000 claims abstract description 28
- 239000002736 nonionic surfactant Substances 0.000 claims abstract description 28
- 239000002888 zwitterionic surfactant Substances 0.000 claims abstract description 28
- BAERPNBPLZWCES-UHFFFAOYSA-N (2-hydroxy-1-phosphonoethyl)phosphonic acid Chemical compound OCC(P(O)(O)=O)P(O)(O)=O BAERPNBPLZWCES-UHFFFAOYSA-N 0.000 claims abstract description 24
- 150000001413 amino acids Chemical class 0.000 claims abstract description 21
- 238000004140 cleaning Methods 0.000 claims abstract description 21
- 238000003756 stirring Methods 0.000 claims description 113
- 239000000243 solution Substances 0.000 claims description 73
- 239000005304 optical glass Substances 0.000 claims description 28
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 17
- 230000008569 process Effects 0.000 claims description 17
- 239000004094 surface-active agent Substances 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 14
- 239000003085 diluting agent Substances 0.000 claims description 11
- -1 alkyl diphenyl ether Chemical compound 0.000 claims description 10
- MRUAUOIMASANKQ-UHFFFAOYSA-N cocamidopropyl betaine Chemical group CCCCCCCCCCCC(=O)NCCC[N+](C)(C)CC([O-])=O MRUAUOIMASANKQ-UHFFFAOYSA-N 0.000 claims description 9
- 229940073507 cocamidopropyl betaine Drugs 0.000 claims description 9
- 239000002994 raw material Substances 0.000 claims description 9
- 239000011259 mixed solution Substances 0.000 claims description 8
- 238000005406 washing Methods 0.000 claims description 8
- 238000005303 weighing Methods 0.000 claims description 8
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Natural products C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 claims description 7
- 230000000694 effects Effects 0.000 abstract description 12
- 230000007613 environmental effect Effects 0.000 abstract description 5
- 229910001385 heavy metal Inorganic materials 0.000 abstract description 5
- 238000005498 polishing Methods 0.000 description 6
- 229910052761 rare earth metal Inorganic materials 0.000 description 6
- 150000002910 rare earth metals Chemical class 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 150000007524 organic acids Chemical class 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 229910000420 cerium oxide Inorganic materials 0.000 description 3
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000012459 cleaning agent Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- 239000010865 sewage Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000011001 backwashing Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000005202 decontamination Methods 0.000 description 1
- 230000003588 decontaminative effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000004945 emulsification Methods 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 238000003911 water pollution Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/88—Ampholytes; Electroneutral compounds
- C11D1/94—Mixtures with anionic, cationic or non-ionic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2075—Carboxylic acids-salts thereof
- C11D3/2086—Hydroxy carboxylic acids-salts thereof
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/33—Amino carboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/34—Organic compounds containing sulfur
- C11D3/3454—Organic compounds containing sulfur containing sulfone groups, e.g. vinyl sulfones
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/36—Organic compounds containing phosphorus
- C11D3/361—Phosphonates, phosphinates or phosphonites
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/02—Anionic compounds
- C11D1/12—Sulfonic acids or sulfuric acid esters; Salts thereof
- C11D1/22—Sulfonic acids or sulfuric acid esters; Salts thereof derived from aromatic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/66—Non-ionic compounds
- C11D1/72—Ethers of polyoxyalkylene glycols
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/88—Ampholytes; Electroneutral compounds
- C11D1/90—Betaines
-
- C11D2111/18—
Abstract
The invention discloses a soak solution which comprises the following components in percentage by weight: 7-10% of amino acid, 8-10% of citric acid, 3-5% of hydroxyethylidene diphosphonic acid, 2-3% of nonionic surfactant, 0.5-1% of zwitterionic surfactant, 0.5-1% of anionic surfactant, 2-3% of dimethyl sulfoxide and the balance of water. The invention also discloses a preparation method and a using method of the soaking solution. The soaking solution disclosed by the invention has the characteristics of good cleaning effect, high yield, low cost, environmental friendliness, no inorganic matter and no heavy metal.
Description
Technical Field
The invention relates to a soaking solution, and particularly relates to a soaking solution and a preparation method and a using method thereof.
Background
China has abundant rare earth resources, the storage capacity of industrial cerium resources is about 1800 ten thousand tons, and cerium oxide polishing materials have the advantages of strong cutting capability, short polishing time, high polishing precision, clean operating environment and the like, so that the cerium oxide polishing materials are applied to many aspects, such as polishing of lenses, optical fibers, optical elements, silicon wafers, ITO glass, mobile phone glass, aviation glass, integrated circuit substrates and the like, and become one of important materials for chemical mechanical polishing.
Most of optical glass materials in the prior art are made of silicon dioxide, the optical glass materials are cut into various shapes, then a surface polishing process is carried out, cerium oxide (rare earth) adopted in the polishing process is mixed with water for use, the viscosity is very strong, adhered milled powder cannot be cleaned, and how to clean the milled powder is a very delicate problem. The methods for removing the powder cleaning agent in the prior art include the following methods: 1. potassium ferricyanide is added with water for soaking, and the cleaning effect is not ideal; 2. the effect is slightly good when the toilet cleaner (hydrochloric acid) is used for soaking, the ground powder is softened and loosened, but the soaking is required for at least 5 minutes, the treatment efficiency is slow, and in addition, the greatest defect is that the sewage cannot be effectively treated. 3. The strong-alkaline optical cleaning agent is adopted for treatment, repeated cleaning is needed, the backwashing rate is increased, the glass scratching probability is increased, the yield is low, and the production cost is high.
Disclosure of Invention
In order to overcome the defects of the prior art, one of the purposes of the invention is to provide a soaking solution which has the characteristics of good cleaning effect, high yield, low cost, environmental protection, no inorganic matter and no heavy metal.
The second purpose of the invention is to provide a preparation method of the soak solution, which has the characteristics of simple and reliable preparation process, convenient operation and simple required equipment.
The invention also aims to provide a using method of the soaking solution.
One of the purposes of the invention is realized by adopting the following technical scheme:
the soaking solution is characterized by comprising the following components in percentage by weight:
7-10% of amino acid, 8-10% of citric acid, 3-5% of hydroxyethylidene diphosphonic acid (HEDP), 2-3% of nonionic surfactant, 0.5-1% of zwitterionic surfactant, 0.5-1% of anionic surfactant, 2-3% of dimethyl sulfoxide and the balance of water.
Further, the soaking solution comprises the following components in percentage by weight: 10% of amino acid, 10% of citric acid, 5% of hydroxyethylidene diphosphonic acid, 3% of nonionic surfactant, 1% of zwitterionic surfactant, 1% of anionic surfactant, 3% of dimethyl sulfoxide and the balance of water.
Further, the nonionic surfactants are AEO-3 surfactants and basf isomeric alcohol XL90, wherein the addition amount of the AEO-3 surfactants is 1% of the total weight of the soaking solution, and the addition amount of the basf isomeric alcohol XL90 is 2% of the total weight of the soaking solution.
Further, the zwitterionic surfactant is cocamidopropyl betaine.
Further, the anionic surfactant is alkyl diphenyl ether disulfonate, specifically DOWFAX 8390.
The second purpose of the invention is realized by adopting the following technical scheme:
the preparation method of the soak solution is characterized by comprising the following steps:
material preparation: weighing the raw materials according to the formula ratio for later use;
stirring: adding water with a formula amount into a container, then respectively adding amino acid and citric acid with a formula amount into the container for primary stirring, uniformly stirring, then adding hydroxyethylidene diphosphonic acid with a formula amount into the container for secondary stirring, and uniformly stirring to obtain a first mixed solution; and finally, respectively adding the non-ionic surfactant, the zwitterionic surfactant, the anionic surfactant and the dimethyl sulfoxide in the formula ratio into a container for secondary stirring, and uniformly stirring to obtain a soaking solution.
Further, in the stirring step, the stirring time for the first stirring is 8 to 10 minutes.
Further, in the stirring step, the stirring time of the second stirring is 1 to 2 minutes.
Further, in the stirring step, the stirring time of the third stirring is 1 to 3 minutes.
The third purpose of the invention is realized by adopting the following technical scheme:
the using method of the soaking solution is characterized by comprising the following steps: adding 18-20 times of water into the soaking solution to obtain soaking diluent; and (3) soaking the polished optical glass sheet in a soaking diluent at normal temperature for 50-60 seconds, taking out the optical glass sheet, washing the optical glass sheet with clear water once, and then carrying out ultrasonic process cleaning to complete the whole process.
Compared with the prior art, the invention has the beneficial effects that:
1. the soaking solution of the invention comprises amino acid, citric acid and hydroxyethylidene diphosphonic acid, the three types of organic acid are all nontoxic to human body and equipment, and the three types of organic acid have good effect on water pollution treatment, the three-acid compound has softening effect on rare earth, the three types of organic acid have synergistic effect, and in addition, the three types of organic acid can strip the rare earth under the action of strong solubility and strong permeability of dimethyl sulfoxide. The cocamidopropyl betaine has a thickening effect, is fully wetted, permeated and stripped by being matched with other surfactants, and can reduce the adhesion of rare earth in the wetting process. In conclusion, the soaking solution disclosed by the invention has the characteristics of good cleaning effect, high yield, low cost, environmental friendliness, no inorganic matter and no heavy metal.
2. The preparation method of the invention has the advantages of simple soaking equipment, no need of heating, capacity of holding the glass bracket as long as the size is large, good cleaning effect, high yield, low cost, environmental protection, no inorganic matter and no heavy metal.
Detailed Description
The present invention is further described below with reference to specific embodiments, and it should be noted that, without conflict, any combination between the embodiments or technical features described below may form a new embodiment. The materials used in this example are all commercially available.
The soaking solution comprises the following components in percentage by weight:
7-10% of amino acid, 8-10% of citric acid, 3-5% of hydroxyethylidene diphosphonic acid (HEDP), 2-3% of nonionic surfactant, 0.5-1% of zwitterionic surfactant, 0.5-1% of anionic surfactant, 2-3% of dimethyl sulfoxide and the balance of water.
As a preferred embodiment, the soaking solution comprises the following components in percentage by weight: 10% of amino acid, 10% of citric acid, 5% of hydroxyethylidene diphosphonic acid, 3% of nonionic surfactant, 1% of zwitterionic surfactant, 1% of anionic surfactant, 3% of dimethyl sulfoxide and the balance of water.
In a preferred embodiment, the nonionic surfactant is one or two of AEO-3 surfactant and basf isomeric alcohol XL 90.
In a preferred embodiment, the AEO-3 surfactant is added in an amount of 1% by weight of the total weight of the soaking solution, and the basf isomeric alcohol XL90 is added in an amount of 2% by weight of the total weight of the soaking solution.
As a preferred embodiment, the zwitterionic surfactant is cocamidopropyl betaine.
As a preferred embodiment, the anionic surfactant is an alkyl diphenyl oxide disulfonate, specifically DOWFAX 8390.
The basf isomeric alcohol XL90 has high decontamination capability, dispersion capability and emulsification capability, has quite strong change effect on oxide traces after equipment is completely stripped or rare earth is stripped under the cooperation of the functions, has dispersion effect, and has good cleaning effect on post processes.
The Dow FAX8390 has good stability and solubility, reduces gel, has the functions of low foaming, acid resistance and alkali resistance, and is easy to rinse. After the soak solution is compounded, the environmental protection requirement reaches the standard, the soak solution can be treated by a sewage station, and the soak solution does not contain inorganic substances, lead, cadmium and other heavy metal elements.
A preparation method of a soak solution comprises the following steps:
material preparation: weighing the raw materials according to the formula ratio for later use;
stirring: adding water with a formula amount into a container, then respectively adding amino acid and citric acid with a formula amount into the container for primary stirring, uniformly stirring, then adding hydroxyethylidene diphosphonic acid with a formula amount into the container for secondary stirring, and uniformly stirring to obtain a first mixed solution; and finally, respectively adding the non-ionic surfactant, the zwitterionic surfactant, the anionic surfactant and the dimethyl sulfoxide in the formula ratio into a container for secondary stirring, and uniformly stirring to obtain a soaking solution.
In a preferred embodiment, in the stirring step, the stirring time for the first stirring is 8 to 10 minutes.
In a preferred embodiment, in the stirring step, the stirring time of the second stirring is 1 to 2 minutes.
In a preferred embodiment, in the stirring step, the stirring time of the third stirring is 1 to 3 minutes.
The use method of the soaking solution comprises the following steps: adding 18-20 times of water into the soaking solution to obtain soaking diluent; and (3) soaking the polished optical glass sheet in a soaking diluent at normal temperature for 50-60 seconds, taking out the optical glass sheet, washing the optical glass sheet with clear water once, and then carrying out ultrasonic process cleaning to complete the whole process.
The following are specific examples of the present invention, and raw materials, equipments and the like used in the following examples can be obtained by purchasing them unless otherwise specified.
Example 1:
the soaking solution comprises the following components in percentage by weight:
10% of amino acid, 10% of citric acid, 5% of hydroxyethylidene diphosphonic acid (HEDP), 3% of nonionic surfactant, 1% of zwitterionic surfactant, 1% of anionic surfactant, 3% of dimethyl sulfoxide and the balance of water.
The nonionic surfactant is AEO-3 surfactant and basf isomeric alcohol XL90, wherein the addition amount of the AEO-3 surfactant is 1% of the total weight of the soaking solution, and the addition amount of the basf isomeric alcohol XL90 is 2% of the total weight of the soaking solution.
The zwitterionic surfactant is cocamidopropyl betaine.
The anionic surfactant is alkyl diphenyl ether disulfonate, specifically Dowfax8390 Dow.
A preparation method of a soak solution comprises the following steps:
material preparation: weighing the raw materials according to the formula ratio for later use;
stirring: adding water with a formula amount into a container, then respectively adding amino acid and citric acid with a formula amount into the container for primary stirring, uniformly stirring, then adding hydroxyethylidene diphosphonic acid with a formula amount into the container for secondary stirring, and uniformly stirring to obtain a first mixed solution; and finally, respectively adding the non-ionic surfactant, the zwitterionic surfactant, the anionic surfactant and the dimethyl sulfoxide in the formula ratio into a container for secondary stirring, and uniformly stirring to obtain a soaking solution. Wherein the stirring time of the first stirring is 10 minutes. The stirring time for the second stirring was 2 minutes. The stirring time for the third stirring was 3 minutes.
Example 2:
the soaking solution comprises the following components in percentage by weight:
7% of amino acid, 8% of citric acid, 3% of hydroxyethylidene diphosphonic acid, 2% of nonionic surfactant, 0.5% of zwitterionic surfactant, 0.5% of anionic surfactant, 2% of dimethyl sulfoxide and the balance of water.
The nonionic surfactant is AEO-3 surfactant and basf isomeric alcohol XL90, wherein the addition amount of the AEO-3 surfactant is 1% of the total weight of the soaking solution, and the addition amount of the basf isomeric alcohol XL90 is 1% of the total weight of the soaking solution.
The zwitterionic surfactant is cocamidopropyl betaine.
The anionic surfactant is alkyl diphenyl ether disulfonate, specifically Dowfax8390 Dow.
A preparation method of a soak solution comprises the following steps:
material preparation: weighing the raw materials according to the formula ratio for later use;
stirring: adding water with a formula amount into a container, then respectively adding amino acid and citric acid with a formula amount into the container for primary stirring, uniformly stirring, then adding hydroxyethylidene diphosphonic acid with a formula amount into the container for secondary stirring, and uniformly stirring to obtain a first mixed solution; and finally, respectively adding the non-ionic surfactant, the zwitterionic surfactant, the anionic surfactant and the dimethyl sulfoxide in the formula ratio into a container for secondary stirring, and uniformly stirring to obtain a soaking solution. Wherein the stirring time of the first stirring is 10 minutes. The stirring time for the second stirring was 2 minutes. The stirring time for the third stirring was 3 minutes.
Example 3:
the soaking solution comprises the following components in percentage by weight:
8% of amino acid, 9% of citric acid, 4% of hydroxyethylidene diphosphonic acid, 2.5% of nonionic surfactant, 0.8% of zwitterionic surfactant, 0.8% of anionic surfactant, 2.5% of dimethyl sulfoxide and the balance of water.
The nonionic surfactant is AEO-3 surfactant and basf isomeric alcohol XL90, wherein the addition amount of the AEO-3 surfactant is 1% of the total weight of the soaking solution, and the addition amount of the basf isomeric alcohol XL90 is 1.5% of the total weight of the soaking solution.
The zwitterionic surfactant is cocamidopropyl betaine.
The anionic surfactant is alkyl diphenyl ether disulfonate, specifically Dowfax8390 Dow.
A preparation method of a soak solution comprises the following steps:
material preparation: weighing the raw materials according to the formula ratio for later use;
stirring: adding water with a formula amount into a container, then respectively adding amino acid and citric acid with a formula amount into the container for primary stirring, uniformly stirring, then adding hydroxyethylidene diphosphonic acid with a formula amount into the container for secondary stirring, and uniformly stirring to obtain a first mixed solution; and finally, respectively adding the non-ionic surfactant, the zwitterionic surfactant, the anionic surfactant and the dimethyl sulfoxide in the formula ratio into a container for secondary stirring, and uniformly stirring to obtain a soaking solution. Wherein the stirring time of the first stirring is 10 minutes. The stirring time for the second stirring was 2 minutes. The stirring time for the third stirring was 3 minutes.
Example 4:
the soaking solution comprises the following components in percentage by weight:
9% of amino acid, 10% of citric acid, 5% of hydroxyethylidene diphosphonic acid, 2.5% of nonionic surfactant, 1% of zwitterionic surfactant, 1% of anionic surfactant, 3% of dimethyl sulfoxide and the balance of water.
The nonionic surfactant is AEO-3 surfactant and basf isomeric alcohol XL90, wherein the addition amount of the AEO-3 surfactant is 1% of the total weight of the soaking solution, and the addition amount of the basf isomeric alcohol XL90 is 1.5% of the total weight of the soaking solution.
The zwitterionic surfactant is cocamidopropyl betaine.
The anionic surfactant is alkyl diphenyl ether disulfonate, specifically Dowfax8390 Dow.
A preparation method of a soak solution comprises the following steps:
material preparation: weighing the raw materials according to the formula ratio for later use;
stirring: adding water with a formula amount into a container, then respectively adding amino acid and citric acid with a formula amount into the container for primary stirring, uniformly stirring, then adding hydroxyethylidene diphosphonic acid with a formula amount into the container for secondary stirring, and uniformly stirring to obtain a first mixed solution; and finally, respectively adding the non-ionic surfactant, the zwitterionic surfactant, the anionic surfactant and the dimethyl sulfoxide in the formula ratio into a container for secondary stirring, and uniformly stirring to obtain a soaking solution. Wherein the stirring time of the first stirring is 10 minutes. The stirring time for the second stirring was 2 minutes. The stirring time for the third stirring was 3 minutes.
Example 5:
the soaking solution comprises the following components in percentage by weight:
10% of amino acid, 9% of citric acid, 4% of hydroxyethylidene diphosphonic acid, 2.5% of nonionic surfactant, 0.5% of zwitterionic surfactant, 0.5% of anionic surfactant, 2% of dimethyl sulfoxide and the balance of water.
The nonionic surfactant is AEO-3 surfactant and basf isomeric alcohol XL90, wherein the addition amount of the AEO-3 surfactant is 1% of the total weight of the soaking solution, and the addition amount of the basf isomeric alcohol XL90 is 1.5% of the total weight of the soaking solution.
The zwitterionic surfactant is cocamidopropyl betaine.
The anionic surfactant is alkyl diphenyl ether disulfonate, specifically Dowfax8390 Dow.
A preparation method of a soak solution comprises the following steps:
material preparation: weighing the raw materials according to the formula ratio for later use;
stirring: adding water with a formula amount into a container, then respectively adding amino acid and citric acid with a formula amount into the container for primary stirring, uniformly stirring, then adding hydroxyethylidene diphosphonic acid with a formula amount into the container for secondary stirring, and uniformly stirring to obtain a first mixed solution; and finally, respectively adding the non-ionic surfactant, the zwitterionic surfactant, the anionic surfactant and the dimethyl sulfoxide in the formula ratio into a container for secondary stirring, and uniformly stirring to obtain a soaking solution. Wherein the stirring time of the first stirring is 10 minutes. The stirring time for the second stirring was 2 minutes. The stirring time for the third stirring was 3 minutes.
And (3) performance detection:
the cleaning method 1: adding 20 times of water into the soaking solution prepared in the example 1 respectively to obtain soaking diluted solutions; and respectively soaking the polished optical glass sheets in soaking diluent at normal temperature for 60 seconds, taking out the optical glass sheets, washing the optical glass sheets with clear water once, and then carrying out ultrasonic process cleaning, thus completing the whole process.
The cleaning method 2 comprises the following steps: adding 20 times of water into the soaking solution prepared in the example 2 respectively to obtain soaking dilution; and respectively soaking the polished optical glass sheets in soaking diluent at normal temperature for 60 seconds, taking out the optical glass sheets, washing the optical glass sheets with clear water once, and then carrying out ultrasonic process cleaning, thus completing the whole process.
The cleaning method 3: adding 20 times of water into the soaking solution prepared in the example 3 respectively to obtain soaking diluted solutions; and respectively soaking the polished optical glass sheets in soaking diluent at normal temperature for 60 seconds, taking out the optical glass sheets, washing the optical glass sheets with clear water once, and then carrying out ultrasonic process cleaning, thus completing the whole process.
The cleaning method 4: adding 20 times of water into the soaking solution prepared in the embodiment 4 respectively to obtain soaking diluted solutions; and respectively soaking the polished optical glass sheets in soaking diluent at normal temperature for 60 seconds, taking out the optical glass sheets, washing the optical glass sheets with clear water once, and then carrying out ultrasonic process cleaning, thus completing the whole process.
The cleaning method 5: adding 20 times of water into the soaking solution prepared in the example 5 respectively to obtain soaking diluted solutions; and respectively soaking the polished optical glass sheets in soaking diluent at normal temperature for 60 seconds, taking out the optical glass sheets, washing the optical glass sheets with clear water once, and then carrying out ultrasonic process cleaning, thus completing the whole process.
Respectively cleaning 200 polished optical glass sheets according to the method, detecting the yield of products, and obtaining the result: the yield is more than 96%.
The above embodiments are only preferred embodiments of the present invention, and the protection scope of the present invention is not limited thereby, and any insubstantial changes and substitutions made by those skilled in the art based on the present invention are within the protection scope of the present invention.
Claims (7)
1. The soaking solution is characterized by comprising the following components in percentage by weight:
7-10% of amino acid, 8-10% of citric acid, 3-5% of hydroxyethylidene diphosphonic acid, 3% of nonionic surfactant, 0.5-1% of zwitterionic surfactant, 0.5-1% of anionic surfactant, 2-3% of dimethyl sulfoxide and the balance of water;
the nonionic surfactant is AEO-3 surfactant and basf isomeric alcohol XL90, wherein the addition amount of the AEO-3 surfactant is 1% of the total weight of the soaking solution, and the addition amount of the basf isomeric alcohol XL90 is 2% of the total weight of the soaking solution;
the zwitterionic surfactant is cocamidopropyl betaine;
the anionic surfactant is alkyl diphenyl ether disulfonate;
the soaking solution is used for treating the polished optical glass sheet.
2. The soaking solution according to claim 1, which comprises the following components in percentage by weight: 10% of amino acid, 10% of citric acid, 5% of hydroxyethylidene diphosphonic acid, 3% of nonionic surfactant, 1% of zwitterionic surfactant, 1% of anionic surfactant, 3% of dimethyl sulfoxide and the balance of water.
3. A method for preparing the soaking solution according to any one of claims 1 to 2, which is characterized by comprising the following steps:
material preparation: weighing the raw materials according to the formula ratio for later use;
stirring: adding water with a formula amount into a container, then respectively adding amino acid and citric acid with a formula amount into the container for primary stirring, uniformly stirring, then adding hydroxyethylidene diphosphonic acid with a formula amount into the container for secondary stirring, and uniformly stirring to obtain a first mixed solution; and finally, respectively adding the non-ionic surfactant, the zwitterionic surfactant, the anionic surfactant and the dimethyl sulfoxide in the formula ratio into a container for secondary stirring, and uniformly stirring to obtain a soaking solution.
4. The method for preparing soak solution according to claim 3, wherein in the stirring step, the stirring time of the first stirring is 8 to 10 minutes.
5. The method for preparing soak solution according to claim 3, wherein in the stirring step, the stirring time of the second stirring is 1 to 2 minutes.
6. The method for preparing soak solution according to claim 3, wherein in the stirring step, the stirring time of the third stirring is 1 to 3 minutes.
7. A method for using the soaking solution according to any one of claims 1-2, characterized by comprising the following steps: adding 18-20 times of water into the soaking solution to obtain soaking diluent; and (3) soaking the polished optical glass sheet in a soaking diluent at normal temperature for 50-60 seconds, taking out the optical glass sheet, washing the optical glass sheet with clear water once, and then carrying out ultrasonic process cleaning to complete the whole process.
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