CN109987836A - Alkali-free glass - Google Patents
Alkali-free glass Download PDFInfo
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- CN109987836A CN109987836A CN201910222449.5A CN201910222449A CN109987836A CN 109987836 A CN109987836 A CN 109987836A CN 201910222449 A CN201910222449 A CN 201910222449A CN 109987836 A CN109987836 A CN 109987836A
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- glass
- alkali
- shrinking percentage
- free glass
- mgo
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Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
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- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Abstract
The present invention relates to alkali-free glasss.That the present invention relates to shrinking percentages is low, the mean thermal expansion coefficients at 50 DEG C~350 DEG C are small, is easy to the alkali-free glass of float forming.In particular it relates to a kind of alkali-free glass, the shrinking percentage C1 of the alkali-free glass is 5ppm or less, shrinking percentage C2 is 40ppm hereinafter, in terms of the quality % of oxide benchmark, and the alkali-free glass contains SiO264~72, Al2O317~22, MgO 1~8, CaO 4~15.5, and 0.20≤MgO/ (MgO+CaO)≤0.41.
Description
The application be on June 24th, 2014 applying date, application No. is the Chinese patent applications of 201480036107.X
Divisional application.
Technical field
The present invention relates to base plate for displaying glass used in the manufacture for being suitable as various flat-panel monitors (FPD) or
It is base board for optical mask glass, containing substantially no alkali metal oxide, shrinking percentage is low and is capable of the alkali-free glass of float forming
Glass.
Background technique
In the past, metal or sull etc. are formed for various base plate for displaying glass, particularly on the surface
Base plate for displaying glass, it is desirable that characteristic as shown below for example as shown in Patent Document 1.
(1) when containing alkali metal oxide, alkali metal ion spreads in the film and deteriorates membrane property, it is therefore desirable to
Contain substantially no alkali metal ion.
(2) there is sufficient chemical durability to various chemicals used in semiconductor formation.Especially to being used for
SiOxOr SiNxThe buffered hydrofluoric acid (BHF: the mixed liquor of hydrofluoric acid and ammonium fluoride) of etching and containing for the etching for ITO
There are the medical fluid, various sour (nitric acid, the sulfuric acid etc.) of etching for metal electrode, the alkali of anticorrosive additive stripping liquid controlling of hydrochloric acid to have durable
Property.
(3) internal and surface does not have defect (bubble, striped, field trash, pit, scratch etc.).
Apart from the requirements above, there are also situations below in recent years.
(4) lightweight of display is required, it is expected that glass itself is also the small glass of density.
(5) lightweight of display, the thin plate of expectation substrate glass are required.
(6) other than amorphous silicon (a-Si) type liquid crystal display so far, it is slightly higher heat treatment temperature has also been made
Polysilicon (p-Si) type liquid crystal display (a-Si: about 350 DEG C → p-Si:350~550 DEG C).
(7) in order to accelerate make liquid crystal display when heat treatment warming and cooling rate thereby increasing productivity or improve it is resistance to
Thermal impact, it is desirable that the small glass of the mean thermal expansion coefficients of glass.
Existing technical literature
Patent document
Patent document 1: Japanese Unexamined Patent Publication 2001-348247 bulletin
Summary of the invention
Problem to be solved by the invention
Other than characteristic described in background technology, in recent years, when being exposed to high temperature in film formation process, in order to
Minimum limit is suppressed to by the deformation of glass and with the change in size of the structure stabilization of glass, it is desirable that the shrinking percentage of glass
It is low.
That the purpose of the present invention is to provide shrinking percentages is low, mean thermal expansion coefficients are small and are easy to the alkali-free glass of float forming
Glass.
The means used to solve the problem
The present invention provides a kind of alkali-free glass, wherein the shrinking percentage C1 of the alkali-free glass is 5ppm or less, shrinking percentage C2
For 40ppm hereinafter, in terms of the quality % of oxide benchmark, the alkali-free glass contains:
0.20≤MgO/(MgO+CaO)≤0.41。
In alkali-free glass of the invention, the shrinking percentage C1 of the preferably described alkali-free glass is 5ppm or less, shrinking percentage C2 is
Hereinafter, in terms of the quality % of oxide benchmark, the alkali-free glass contains 25ppm:
SiO2、Al2O3, MgO and CaO be in the total amount 96 mass % or more, and
0.22≤MgO/(MgO+CaO)≤0.39。
In addition, the shrinking percentage C1 of the preferably described alkali-free glass is 5ppm or less, shrinking percentage C2 in alkali-free glass of the invention
For 40ppm hereinafter, in terms of the quality % of oxide benchmark, the alkali-free glass contains:
SiO2、Al2O3, MgO and CaO be in the total amount 96 mass % or more, and
0.22≤MgO/(MgO+CaO)≤0.39。
Invention effect
Alkali-free glass of the invention is suitable as various base plate for displaying glass or photomask base plate glass, can also be with
As glass substrate for disc etc..But since shrinking percentage is low, wanted as when being exposed to high temperature in film formation process
It asks the deformation of glass and is suppressed to minimal various display bases with the change in size of the structure stabilization of glass
Glass sheet or photomask are effective with base plate glass.
Specific implementation form
Next, being illustrated to the compositing range of each ingredient.SiO2More than 72% (quality %, unless otherwise indicated, with
Under it is identical) when, it is possible to devitrification temperature TLIt increases.Moreover, viscosity is also got higher, it is possible to bubble when melting temperature is increased, clarified
It can not completely remove and be mixed into bubble.When less than 64%, the ratio of network former tails off, and shrinking percentage increases.Moreover, evenly heat
The coefficient of expansion becomes larger.
Herein, in the 1st mode of alkali-free glass of the invention, SiO2Content is 67.5% or more and 72% or less.It is more than
When 72%, viscosity is got higher, it is possible to which bubble can not completely remove and be mixed into bubble when melting temperature is increased, clarified.It is less than
When 67.5%, it is possible to which shrinking percentage increases.More preferably 68% or more.
In 2nd mode of alkali-free glass of the invention, SiO2Content is 64% or more and 68% or less.When more than 68%,
It is possible that melting temperature increases.More preferably 67% or less.When less than 64%, it is possible to which shrinking percentage increases.Moreover, evenly heat is swollen
Swollen coefficient becomes larger.
Al2O3When more than 22%, it is possible to devitrification temperature TLIt increases.Moreover, and SiO2It is equally used as network former, because
When this is more than 22%, viscosity increases, it is possible to which melting temperature increases, is mixed into bubble.When less than 17%, cause the increasing of shrinking percentage
Add.
Herein, in the 1st mode of alkali-free glass of the invention, Al2O3Content is 17% or more and 21% or less.It is more than
When 21%, it is possible to devitrification temperature TLIt increases.More preferably 20.5% or less.When less than 17%, cause the increase of shrinking percentage, more
Preferably 18% or more.
In 2nd mode of alkali-free glass of the invention, Al2O3Content is 17% or more and 22% or less.When more than 22%,
It is possible that devitrification temperature TLIt increases.More preferably 21% or less.When less than 17%, cause the increase of shrinking percentage, more preferably
18% or more.
When MgO is more than 8%, glass transition temperature Tg is reduced, moreover, shrinking percentage increases, mean thermal expansion coefficients become larger.
When less than 1%, meltability deterioration, Young's modulus is reduced, and causes devitrification temperature TLIt increases.
Herein, in the 1st mode of alkali-free glass of the invention, content of MgO is 1% or more and 6% or less.When more than 6%,
Glass transition temperature Tg reduces, and shrinking percentage increases, and mean thermal expansion coefficients become larger.More preferably 5% or less.When less than 1%,
Cause devitrification temperature TLIt increases, and Young's modulus reduces.More preferably 2% or more.
In 2nd mode of alkali-free glass of the invention, content of MgO is 2.3% or more and 8% or less.When more than 8%, receive
Shrinkage increases, mean thermal expansion coefficients become larger.When less than 2.3%, cause devitrification temperature TLIt increases.Moreover, Young's modulus reduces.
More preferably 4% or more.
When CaO is more than 15.5%, cause increase or the devitrification temperature T of shrinking percentageLRaising.When less than 4%, meltability is bad
Change, melting temperature increases, and devitrification temperature also increases.
Herein, in the 1st mode of alkali-free glass of the invention, CaO content is 4% or more and 8.5% or less.It is more than
When 8.5%, cause increase or the devitrification temperature T of shrinking percentageLRaising.When less than 4%, meltability deterioration, melting temperature is increased,
Devitrification temperature also increases.More preferably 5% or more.
In 2nd mode of alkali-free glass of the invention, CaO content is 9% or more and 15.5% or less.More than 15.5%
When, cause increase or the devitrification temperature T of shrinking percentageLRaising.When less than 9%, meltability deterioration, melting temperature is increased.It is more excellent
It is selected as 10% or more.
When MgO/ (CaO+MgO) is greater than 0.41, shrinking percentage when heating at 600 DEG C increases.Moreover, evenly heat is swollen
Swollen coefficient becomes larger.It is preferred that 0.39 hereinafter, more preferable 0.37 or less.When less than 0.20, devitrification temperature TLIt increases.It is preferred that 0.22 with
On, more preferable 0.24 or more.
In the range of not interfering effect of the invention, other ingredients, such as ingredient below can be contained.Such case
Under other ingredients, high Young's modulus and low-shrinkage, preferably smaller than 5% in order to balance, more preferably less than 4% are more preferably small
In 3%, it is further preferably no larger than 1%, still more preferably less than 0.5%, is particularly preferably contained substantially no, that is, removing can not keep away
It is not contained other than the impurity exempted from.Therefore, in the present invention, SiO2、Al2O3, CaO and MgO total content be preferably 95% with
On, more preferably 96% or more, more preferably 97% or more, further preferably 99% or more, even more preferably for
99.5% or more.Particularly preferably substantially by SiO2、Al2O3, CaO and MgO constitute, i.e., in addition to inevitable impurity by
SiO2、Al2O3, CaO and MgO constitute.
In order to improve the melting reactivity of glass, B can be contained2O3.But B2O3When excessive, Young's modulus is reduced, and is received
Shrinkage increases, therefore content is preferably smaller than 3%, is further preferably no larger than 1%, particularly preferably contains substantially no.
In order to improve the meltability of glass, BaO can be contained.But BaO it is excessive when, mean thermal expansion coefficients increase, because
This content is preferably smaller than 5%, and more preferably less than 3%, it is further preferably no larger than 1%, still more preferably less than 0.5%, especially
It is preferred that containing substantially no.
In order to improve meltability, SrO can be contained.But SrO it is excessive when, mean thermal expansion coefficients increase, therefore preferably
Content is less than 5%.
Herein, in the 1st mode of alkali-free glass of the invention, the content of SrO is preferably smaller than 3%, and more preferably less than 1%,
Still more preferably less than 0.5%, particularly preferably contain substantially no.
In 2nd mode of alkali-free glass of the invention, SrO content is preferably smaller than 2%, and more preferably less than 1%, it is more preferably small
In 0.3%, particularly preferably contain substantially no.
In order to improve the Young's modulus of glass, ZrO can be contained2.But ZrO2When excessive, devitrification temperature is increased, therefore
Content is preferably smaller than 3%, is further preferably no larger than 1%, particularly preferably contains substantially no.
In addition, in the present invention, in order to improve meltability, the clarification, formability of glass, in glass raw material can containing with
ZnO, the SO of total amount meter less than 1%, preferably smaller than 0.5%, more preferably less than 0.3%, still more preferably less than 0.1%3、
Fe2O3、F、Cl、SnO2。
It should be noted that in order not to which the metal for being set to glass surface when manufacturing panel or sull occurs
Deterioration in characteristics, glass of the invention do not contain (containing substantially no) alkali metal oxide more than impurity level.In addition, being
It is easy to the recycling of glass, preferably contains substantially no PbO, As2O3、Sb2O3。
The shrinking percentage of alkali-free glass of the invention is extremely low.
Shrinking percentage refers to the glass percent thermal shrinkage generated in heat treatment by the relaxation of glass structure.In the present invention,
Shrinking percentage refers to the value using the method measurement that will be illustrated next.
Firstly, flowing out melten glass by being melted at 1550 DEG C~1650 DEG C as the glass of object later, being configured to
It is cooling after plate, polishing is carried out to obtained plate glass, to obtain 100mm × 20mm × 1mm glass plate.
Next, obtained glass plate is heated to+70 DEG C of glass transition temperature Tg, kept for 1 minute at this temperature,
Then it is cooled to room temperature with 40 DEG C/min of cooling rate.Later, along the long side direction with interval A (A on the surface of glass plate
=90mm) impression at 2 is made, to obtain handling preceding sample.
450 DEG C are heated to 100 DEG C/h of heating rate next, preceding sample will be handled, holding 2 is small at 450 DEG C
When, it is cooled to room temperature later with 100 DEG C/h of cooling rate, thus sample 1 after being handled.
Then, the impression spacing B1 of sample 1 after measurement is handled.
Shrinking percentage C1 is calculated from A, the B1 obtained in this way using following formula.
C1 [ppm]=(A-B1)/A × 106
600 DEG C are heated to 100 DEG C/h of heating rate in addition, preceding sample will be handled, holding 1 is small at 600 DEG C
When, it is cooled to room temperature later with 100 DEG C/h of cooling rate, thus sample 2 after being handled.
Then, the impression spacing B2 of sample 2 after measurement is handled.
Shrinking percentage C2 is calculated from A, the B2 obtained in this way using following formula.
C2 [ppm]=(A-B2)/A × 106
The shrinking percentage C1 of alkali-free glass of the invention is 5ppm hereinafter, on the other hand, shrinking percentage C2 is 40ppm or less
Shrinking percentage C1, C2 of alkali-free glass of the invention meets above-mentioned condition, therefore, various being manufactured using alkali-free glass
The film implemented during display is formed in engineering, can be by the deformation of glass and with glass when being exposed to high temperature
The change in size of the structure stabilization of glass is suppressed to minimum limit.
Herein, in the 1st mode of alkali-free glass of the invention, shrinking percentage C1 is 5ppm hereinafter, another aspect, shrinking percentage C2
For 25ppm hereinafter, more preferably 20ppm or less.
In 2nd mode of alkali-free glass of the invention, shrinking percentage C1 is 5ppm hereinafter, on the other hand, shrinking percentage C2 is
40ppm is hereinafter, more preferably 35ppm or less.
In addition, for alkali-free glass of the invention, for ease of melting, and the fire resisting in order to inhibit composition melting furnaces
The erosion of brick, preferred viscosities η reach 102Moor temperature T when (dPas)2It is 1760 DEG C or less.
Herein, in the 1st mode of alkali-free glass of the invention, T2Preferably 1760 DEG C hereinafter, more preferably 1740 DEG C with
Under, it is even more preferably 1720 DEG C or less.
In 2nd mode of alkali-free glass of the invention, T2Preferably 1730 DEG C hereinafter, more preferably 1710 DEG C hereinafter, into
One step is more preferably 1690 DEG C or less.
In addition, for ease of float forming, viscosities il reaches 10 for alkali-free glass of the invention4It moors (dPas)
When temperature T4Preferably 1380 DEG C or less.
Herein, in the 1st mode of alkali-free glass of the invention, T4Preferably 1380 DEG C hereinafter, more preferably 1360 DEG C with
Under, it is even more preferably 1340 DEG C or less.
In 2nd mode of alkali-free glass of the invention, T4Preferably 1360 DEG C hereinafter, more preferably 1340 DEG C hereinafter, into
One step is more preferably 1320 DEG C or less.
In addition, for alkali-free glass of the invention, in order to improve its thermal shock resistance, improve life when manufacturing panel
Yield, the mean thermal expansion coefficients at 50~350 DEG C are preferably 40 × 10-7/ DEG C or less.
Herein, in the 1st mode of alkali-free glass of the invention, the mean thermal expansion coefficients at 50~350 DEG C are preferably 37
×10-7/ DEG C hereinafter, more preferably 34 × 10-7/ DEG C or less.
In 2nd mode of alkali-free glass of the invention, the mean thermal expansion coefficients at 50~350 DEG C are preferably 40 × 10-7/
DEG C hereinafter, more preferably 38 × 10-7/ DEG C or less.
For alkali-free glass of the invention, in order to inhibit thermal contraction when manufacturing panel, and in order to apply
Manufacturing method based on the method for laser annealing as p-Si TFT, glass transition temperature are preferably 780 DEG C or more.
Glass transition temperature be 780 DEG C or more when, be suitable for glass in manufacturing process fictive temperature be easy it is raised
Purposes is (for example, plate thickness 0.7mm or less, preferably 0.5mm or less, the more preferable 0.3mm display below for organic EL etc. are used
The base plate for displaying or illumination of substrate or illumination substrate or plate thickness 0.3mm or less, preferably 0.1mm thin plate below are used
Substrate).
Plate thickness 0.7mm or less, be further 0.5mm or less, be further 0.3mm or less, be further that 0.1mm is below
In the forming of plate glass, pull-out speed when forming has the tendency that quickening, therefore the fictive temperature of glass is easy to increase, glass
Shrinking percentage it is easy to increase.In this case, the glass high if it is glass transition temperature, can inhibit its contraction
Rate.
Alkali-free glass of the invention can be manufactured for example, by the following method.The raw material of usually used each ingredient is matched
Target component is made, it is continuously put into smelting furnace, and is heated to 1550 DEG C~1650 DEG C and is melted.By the melten glass
It is defined plate thickness by float forming, is cut after annealing, it is hereby achieved that plate glass.
Embodiment
Hereinafter, example 1~12 is embodiment, example 13~15 is comparative example.The raw material of each ingredient is configured to target composition, is made
With platinum crucible 1550 DEG C~1650 DEG C at a temperature of melt.It when melting, is stirred using platinum agitator, carries out the homogeneous of glass
Change.Next melten glass is flowed out, annealed after being configured to plate.
Glass composition (unit: quality %) and density p (g/cm are shown in table 1~23), Young's modulus E (GPa) it is (logical
Cross supercritical ultrasonics technology measurement), than elastic modulus E/ρ (GPcm3/ g), glass transition temperature Tg (unit: DEG C), 50~350 DEG C
Under mean thermal expansion coefficients α (unit: × 10-7/ DEG C), glass viscosity η reach 102Temperature T when pool2(unit: DEG C), glass
Viscosities il reaches 104Temperature T when pool4(unit: DEG C) and shrinking percentage C1, C2 (being measured according to the above method, unit: ppm).
It should be noted that the value of parenthetic expression is calculated value in table 1~2.
As seen from table, the shrinking percentage C1 of the glass of embodiment is 5ppm or less, shrinking percentage C2 is 40ppm or less.In addition, 50
Mean thermal expansion coefficients at~350 DEG C are 40 × 10-7/ DEG C or less.
The present invention is described in detail referring to specific embodiment, but it is apparent to those skilled in the art
Be that various modifications may be made without departing from the spirit and scope of the present invention or modification.
The Japanese patent application 2013-134900 that the application was proposed based on June 27th, 2013, content are used as with reference to simultaneously
Enter herein.
Industrial applicability
Alkali-free glass of the invention is suitable as various base plate for displaying glass or photomask base plate glass, can also be with
As glass substrate for disc etc..But since shrinking percentage is low, wanted as when being exposed to high temperature in film formation process
It asks the deformation of glass and is suppressed to minimal various display bases with the change in size of the structure stabilization of glass
Glass sheet or photomask are effective with base plate glass.
Claims (3)
1. a kind of alkali-free glass, wherein the shrinking percentage C1 of the alkali-free glass is 5ppm or less, shrinking percentage C2 is 40ppm hereinafter,
In terms of the quality % of oxide benchmark, the alkali-free glass contains:
0.20≤MgO/ (MgO+CaO)≤0.41, and
SiO2、Al2O3, MgO and CaO be in the total amount 97 mass % or more,
The shrinking percentage refers to the value measured using following methods:
Firstly, flowing out melten glass by being melted at 1550 DEG C~1650 DEG C as the glass of object later, being configured to plate
After cool down, polishing is carried out to obtained plate glass, to obtain 100mm × 20mm × 1mm glass plate,
Next, obtained glass plate is heated to+70 DEG C of glass transition temperature Tg, 1 minute is kept at this temperature, then
It is cooled to room temperature with 40 DEG C/min of cooling rate, later, is made at 2 with interval A along the long side direction on the surface of glass plate
Impression, thus obtain handling preceding sample, the interval A=90mm,
450 DEG C are heated to 100 DEG C/h of heating rate next, preceding sample will be handled, is kept for 2 hours at 450 DEG C,
It is cooled to room temperature later with 100 DEG C/h of cooling rate, thus sample 1 after being handled,
Then, the impression spacing B1 of sample 1 after measurement is handled,
Shrinking percentage C1 is calculated from A, the B1 obtained in this way using following formula:
C1=(A-B1)/A × 106, C1 is ppm magnitude；
600 DEG C are heated to 100 DEG C/h of heating rate in addition, preceding sample will be handled, is kept for 1 hour at 600 DEG C, it
It is cooled to room temperature afterwards with 100 DEG C/h of cooling rate, thus sample 2 after being handled,
Then, the impression spacing B2 of sample 2 after measurement is handled,
Shrinking percentage C2 is calculated from A, the B2 obtained in this way using following formula:
C2=(A-B2)/A × 106, C2 is ppm magnitude.
2. alkali-free glass as described in claim 1, wherein the shrinking percentage C1 of the alkali-free glass is 5ppm or less, shrinking percentage
C2 be 25ppm hereinafter,
In terms of the quality % of oxide benchmark, the alkali-free glass contains:
And
0.22≤MgO/(MgO+CaO)≤0.39。
3. alkali-free glass as described in claim 1, wherein the shrinking percentage C1 of the alkali-free glass is 5ppm or less, shrinking percentage
C2 be 40ppm hereinafter,
In terms of the quality % of oxide benchmark, the alkali-free glass contains:
And
0.22≤MgO/(MgO+CaO)≤0.39。
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013-134900 | 2013-06-27 | ||
| JP2013134900A JP2016153345A (en) | 2013-06-27 | 2013-06-27 | Alkali-free glass |
| CN201480036107.XA CN105324342B (en) | 2013-06-27 | 2014-06-24 | Alkali-free glass |
| PCT/JP2014/066626 WO2014208523A1 (en) | 2013-06-27 | 2014-06-24 | Alkali-free glass |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201480036107.XA Division CN105324342B (en) | 2013-06-27 | 2014-06-24 | Alkali-free glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109987836A true CN109987836A (en) | 2019-07-09 |
| CN109987836B CN109987836B (en) | 2022-03-01 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201480036107.XA Active CN105324342B (en) | 2013-06-27 | 2014-06-24 | Alkali-free glass |
| CN201910222449.5A Active CN109987836B (en) | 2013-06-27 | 2014-06-24 | Alkali-free glass |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201480036107.XA Active CN105324342B (en) | 2013-06-27 | 2014-06-24 | Alkali-free glass |
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| Country | Link |
|---|---|
| JP (1) | JP2016153345A (en) |
| KR (1) | KR102229428B1 (en) |
| CN (2) | CN105324342B (en) |
| TW (1) | TW201509856A (en) |
| WO (1) | WO2014208523A1 (en) |
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| KR20240005182A (en) * | 2015-07-03 | 2024-01-11 | 에이지씨 가부시키가이샤 | Carrier substrate, laminate, and method for manufacturing electronic device |
| KR102403524B1 (en) * | 2016-08-23 | 2022-05-31 | 에이지씨 가부시키가이샤 | alkali free glass |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000302475A (en) * | 1999-04-12 | 2000-10-31 | Carl Zeiss:Fa | Aluminosilicate glass not containing alkali, and its use |
| CN1673140A (en) * | 2004-03-22 | 2005-09-28 | 日本电气硝子株式会社 | Glass for display substrate |
| CN101331090A (en) * | 2005-12-16 | 2008-12-24 | 日本电气硝子株式会社 | Alkali-free glass substrate and its production method |
| CN102007079A (en) * | 2008-04-21 | 2011-04-06 | 旭硝子株式会社 | Glass plate for display panel, method for producing the same, and method for producing tft panel |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001348247A (en) | 2000-05-31 | 2001-12-18 | Asahi Glass Co Ltd | Alkaline-free glass |
| JP2002003240A (en) * | 2000-06-19 | 2002-01-09 | Nippon Electric Glass Co Ltd | Glass substrate for liquid crystal display |
| JP2005320180A (en) * | 2004-05-06 | 2005-11-17 | Central Glass Co Ltd | Thermal treatment method for reducing heat-shrink rate of glass plate |
| WO2007080924A1 (en) * | 2006-01-12 | 2007-07-19 | Nippon Electric Glass Co., Ltd. | Alkali-free glass substrate |
| US8925350B2 (en) * | 2010-07-23 | 2015-01-06 | King Abdulaziz City For Science And Technology | Preparation of sintered cordierite glass-ceramic bodies |
| CN103476718B (en) * | 2011-04-08 | 2015-12-23 | 旭硝子株式会社 | The manufacture method of substrate non-alkali glass and substrate non-alkali glass |
-
2013
- 2013-06-27 JP JP2013134900A patent/JP2016153345A/en active Pending
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2014
- 2014-06-24 WO PCT/JP2014/066626 patent/WO2014208523A1/en active Application Filing
- 2014-06-24 CN CN201480036107.XA patent/CN105324342B/en active Active
- 2014-06-24 KR KR1020157036189A patent/KR102229428B1/en active IP Right Grant
- 2014-06-24 CN CN201910222449.5A patent/CN109987836B/en active Active
- 2014-06-27 TW TW103122385A patent/TW201509856A/en unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000302475A (en) * | 1999-04-12 | 2000-10-31 | Carl Zeiss:Fa | Aluminosilicate glass not containing alkali, and its use |
| CN1673140A (en) * | 2004-03-22 | 2005-09-28 | 日本电气硝子株式会社 | Glass for display substrate |
| CN101331090A (en) * | 2005-12-16 | 2008-12-24 | 日本电气硝子株式会社 | Alkali-free glass substrate and its production method |
| CN102007079A (en) * | 2008-04-21 | 2011-04-06 | 旭硝子株式会社 | Glass plate for display panel, method for producing the same, and method for producing tft panel |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2014208523A1 (en) | 2014-12-31 |
| TW201509856A (en) | 2015-03-16 |
| JP2016153345A (en) | 2016-08-25 |
| KR20160023700A (en) | 2016-03-03 |
| CN105324342B (en) | 2019-04-09 |
| KR102229428B1 (en) | 2021-03-18 |
| CN109987836B (en) | 2022-03-01 |
| CN105324342A (en) | 2016-02-10 |
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