CN109979794A - 一种射频感应耦合等离子体中和器 - Google Patents
一种射频感应耦合等离子体中和器 Download PDFInfo
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- CN109979794A CN109979794A CN201711446538.5A CN201711446538A CN109979794A CN 109979794 A CN109979794 A CN 109979794A CN 201711446538 A CN201711446538 A CN 201711446538A CN 109979794 A CN109979794 A CN 109979794A
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- Prior art keywords
- plasma
- radio frequency
- averager
- cathode
- plasma discharge
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201711446538.5A CN109979794A (zh) | 2017-12-27 | 2017-12-27 | 一种射频感应耦合等离子体中和器 |
Applications Claiming Priority (1)
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CN201711446538.5A CN109979794A (zh) | 2017-12-27 | 2017-12-27 | 一种射频感应耦合等离子体中和器 |
Publications (1)
Publication Number | Publication Date |
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CN109979794A true CN109979794A (zh) | 2019-07-05 |
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CN201711446538.5A Pending CN109979794A (zh) | 2017-12-27 | 2017-12-27 | 一种射频感应耦合等离子体中和器 |
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111447722A (zh) * | 2019-12-27 | 2020-07-24 | 费勉仪器科技(上海)有限公司 | 一种高效射频等离子体源发生装置 |
CN113782408A (zh) * | 2021-09-15 | 2021-12-10 | 中山市博顿光电科技有限公司 | 等离子体发射方向控制装置、等离子体源及其启动方法 |
CN114302548A (zh) * | 2021-12-31 | 2022-04-08 | 中山市博顿光电科技有限公司 | 射频电离装置、射频中和器及其控制方法 |
CN114352493A (zh) * | 2021-12-06 | 2022-04-15 | 兰州空间技术物理研究所 | 一种用于射频阴极的集成化气体分配及离子收集组件 |
WO2022242120A1 (zh) * | 2021-05-18 | 2022-11-24 | 江苏鲁汶仪器有限公司 | 离子源装置及其使用方法和真空处理系统 |
CN117545158A (zh) * | 2023-11-09 | 2024-02-09 | 东莞市晟鼎精密仪器有限公司 | 一种射频线性等离子发生装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6452315B1 (en) * | 2000-02-08 | 2002-09-17 | Ronald A. Vane | Compact RF plasma device for cleaning electron microscopes and vacuum chambers |
JP2003242917A (ja) * | 2002-02-20 | 2003-08-29 | Shincron:Kk | 電子銃および電子ビーム照射処理装置 |
CN104114862A (zh) * | 2011-12-29 | 2014-10-22 | 奥尼拉(国家宇航研究所) | 等离子推进器和用于产生等离子推进推力的方法 |
CN207993797U (zh) * | 2017-12-27 | 2018-10-19 | 核工业西南物理研究院 | 一种射频感应耦合等离子体中和器 |
-
2017
- 2017-12-27 CN CN201711446538.5A patent/CN109979794A/zh active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6452315B1 (en) * | 2000-02-08 | 2002-09-17 | Ronald A. Vane | Compact RF plasma device for cleaning electron microscopes and vacuum chambers |
JP2003242917A (ja) * | 2002-02-20 | 2003-08-29 | Shincron:Kk | 電子銃および電子ビーム照射処理装置 |
CN104114862A (zh) * | 2011-12-29 | 2014-10-22 | 奥尼拉(国家宇航研究所) | 等离子推进器和用于产生等离子推进推力的方法 |
CN207993797U (zh) * | 2017-12-27 | 2018-10-19 | 核工业西南物理研究院 | 一种射频感应耦合等离子体中和器 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111447722A (zh) * | 2019-12-27 | 2020-07-24 | 费勉仪器科技(上海)有限公司 | 一种高效射频等离子体源发生装置 |
WO2022242120A1 (zh) * | 2021-05-18 | 2022-11-24 | 江苏鲁汶仪器有限公司 | 离子源装置及其使用方法和真空处理系统 |
CN113782408A (zh) * | 2021-09-15 | 2021-12-10 | 中山市博顿光电科技有限公司 | 等离子体发射方向控制装置、等离子体源及其启动方法 |
CN114352493A (zh) * | 2021-12-06 | 2022-04-15 | 兰州空间技术物理研究所 | 一种用于射频阴极的集成化气体分配及离子收集组件 |
CN114352493B (zh) * | 2021-12-06 | 2024-09-10 | 兰州空间技术物理研究所 | 一种用于射频阴极的集成化气体分配及离子收集组件 |
CN114302548A (zh) * | 2021-12-31 | 2022-04-08 | 中山市博顿光电科技有限公司 | 射频电离装置、射频中和器及其控制方法 |
CN117545158A (zh) * | 2023-11-09 | 2024-02-09 | 东莞市晟鼎精密仪器有限公司 | 一种射频线性等离子发生装置 |
CN117545158B (zh) * | 2023-11-09 | 2024-05-31 | 东莞市晟鼎精密仪器有限公司 | 一种射频线性等离子发生装置 |
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Address after: No.5, Huangjing Road, Southwest Airport, Shuangliu, Chengdu, Sichuan 610041 Applicant after: SOUTHWESTERN INSTITUTE OF PHYSICS Applicant after: Zhonghe Tongchuang (Chengdu) Technology Co.,Ltd. Address before: No.5, Huangjing Road, Southwest Airport, Shuangliu, Chengdu, Sichuan 610041 Applicant before: SOUTHWESTERN INSTITUTE OF PHYSICS Applicant before: CHENGDU TONGCHUANG MATERIAL SURFACE TECHNOLOGY CO.,LTD. |
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Effective date of registration: 20220729 Address after: No. 219, section 4, xihanggang Avenue, Shuangliu Southwest Airport Economic Development Zone, Chengdu, Sichuan 610207 Applicant after: Zhonghe Tongchuang (Chengdu) Technology Co.,Ltd. Address before: No.5, Huangjing Road, Southwest Airport, Shuangliu, Chengdu, Sichuan 610041 Applicant before: SOUTHWESTERN INSTITUTE OF PHYSICS Applicant before: Zhonghe Tongchuang (Chengdu) Technology Co.,Ltd. |
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