CN109950124B - Radio frequency coil for eliminating secondary discharge of inductively coupled plasma mass spectrum - Google Patents
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Abstract
A radio frequency coil for eliminating secondary discharge of inductively coupled plasma mass spectrometry belongs to the technical field of plasmas. The radio frequency coil is coaxially arranged outside a plasma rectangular tube consisting of an inner tube, a middle tube and an outer tube, is not in contact with the plasma rectangular tube, a sample cone is arranged at the bottom end of the plasma rectangular tube, the sample cone is not connected with the bottom end of the plasma rectangular tube, the radio frequency coil is a hollow oxygen-free copper tube and internally connected with circulating water, connecting terminals are arranged at two ends of the radio frequency coil, and the connecting terminals are connected with the sample cone through grounding metal sheets. The invention reduces or even eliminates the secondary discharge phenomenon caused by the induced potential in the plasma rectangular tube by modifying the radio frequency coil, and greatly reduces the manufacturing cost and the use cost.
Description
Technical Field
The invention belongs to the technical field of plasmas, and particularly relates to a radio frequency coil for eliminating secondary discharge of inductively coupled plasma mass spectrometry.
Background
Inductively coupled plasma mass Spectrometry (ICP-MS for short) is a trace element analysis technology developed in the 80 s of the 20 th century, can measure most elements in the periodic table of elements, has the characteristics of extremely low detection limit, extremely wide dynamic linear range, simple spectral line, less interference, high precision, high analysis speed, capability of providing isotope analysis and the like, and is suitable for environmental fields (drinking water, seawater, environmental water resource food, sanitary epidemic prevention, commercial inspection and the like); material analysis (high purity metals, high purity reagents, ultra trace impurities of Si wafers, photoresists, etc.); medical and physiological analysis (medical research of hair, whole blood, serum, urine sample, biological tissue, etc., in particular, measurement of lead in whole blood); the nuclear industry field (analysis of radioisotope of nuclear fuel, pollution analysis of primary cooling water, etc.) is widely used in other fields such as chemical industry, petrochemical industry, geology, etc.
Inductively coupled plasma (Inductively Coupled Plasma, ICP) is a key component in ICP-MS, and is formed by the interaction of a high frequency generator (high frequency current flowing through a coil, usually in the short-wave radio frequency range of 2-200 MHz), an induction coil, a plasma tube and a working gas, and is an important light source in spectroscopic analysis, such as inductively coupled plasma atomic emission spectrometer (Inductively Coupled Plasma Atomic Emission Spectrometry, ICP-AES) inductively coupled plasma emission spectrometer (Inductively Coupled Plasma Optical Emission Spectrometer, ICP-OES) and the like, by using the principle of high frequency induction heating to ionize the working gas (usually Ar) flowing through the plasma tube to generate flame-like ions. Charged particles (electrons and ions) generated by electric spark ignition are reciprocally accelerated by the action of an axially distributed high-frequency electromagnetic field and collide with gas in a plasma moment tube for a plurality of times, so that Lenz-Joule heating is caused, the high-frequency electromagnetic field energy is absorbed, the gas flowing through the plasma moment tube is excited and ionized, when the charged particles in the gas are so much that the gas has enough conductivity, a closed circular current perpendicular to the axis of the plasma moment tube is formed in the plasma moment tube, the circular current has high strength, and the gas in the plasma moment tube instantaneously forms stable flame-shaped plasma (plasma flame) with the temperature of more than thousands of degrees, so that elements in a sample in carrier gas are evaporated, atomized, excited and ionized.
In contrast to the applications in spectroscopic analysis, in ICP-MS, the interface between ICP and mass MS is often subject to interference from secondary discharges. The working gas in the plasma tube, including plasma gas and auxiliary gas (usually argon) and carrier gas carrying Sample, after being ionized by the high frequency electric field formed by the induction coil, the generated ionization and ions are continuously subjected to the action of the high frequency electric field in the high frequency electric field, and the electric field coupling induction forms voltages of tens to hundreds of volts, when the plasma with voltages bombards to the Sample cone (at the ground potential) at the vacuum interface of the mass spectrometer, the discharge (called as secondary discharge, secondary discharge) is formed, the secondary discharge can seriously influence the energy distribution of the generated ions, not only can bring serious interference to qualitative and quantitative analysis of elements, but also can seriously destroy the interface of the Sample cone, and seriously shorten the service life of the Sample cone, therefore, in various commercial ICP-MS instrument devices, the ICP-MS of the Agilent company adopts the shielding distance technology, namely, an ICP-MS with the shielding flame is additionally arranged between the induction coil and the plasma tube to reduce the induced voltages to reduce the frequency of the high temperature resistant metal shielding cover, so as to reduce the frequency of the induced voltage to 5340 MHz, but the electric field coupling efficiency of the plasma flame shielding can be reduced to 5340 MHz; the Perkin Elmer and the Siemens Feier adopt virtual grounding and do not depend on external physical grounding to eliminate cone secondary arc discharge technology, and a two-path balanced radio frequency design technology is used, so that a radio frequency power supply needs to be modified; there are also indirect grounding techniques in the induction coil, etc., but there is also a need to retrofit the radio frequency power supply.
In summary, the problem of secondary discharge between ICP and mass spectrometry MS interfaces is the ICP-MS co-linearity problem. The prior art needs to reconstruct the structure between the induction coil and the plasma rectangular tube or reconstruct the radio frequency power supply to use a two-path balanced radio frequency design and the like.
Through theoretical analysis and experimental analysis, the generation and the height of the induced voltage of the plasma flame are mainly caused by low coupling efficiency between the radio frequency electric field of the induction coil and the working gas and electromagnetic induction of the radio frequency electric field to the plasma body at the outlet of the plasma tube.
Disclosure of Invention
In order to solve the problems in the prior art, particularly to avoid modification of a commercial radio frequency power supply, the invention provides a radio frequency coil for eliminating secondary discharge of inductively coupled plasma mass spectrometry. Based on a general commercial radio frequency power supply, the induction coil is reasonably designed, so that the secondary discharge phenomenon between the ICP and a mass spectrum MS interface is reduced or eliminated, the service lives of the radio frequency coil and a sample cone are prolonged, and the equipment cost and the use cost are reduced.
The device for solving the technical problem comprises the following components: the device comprises an inner tube, a middle tube, an outer tube, a radio frequency coil, a wiring terminal A, a wiring terminal B, a grounding metal sheet and a sample cone. Wherein the inner tube top is equipped with the inner tube air inlet, and well pipe and outer tube are close to the top and are equipped with well pipe air inlet and outer tube air inlet, and inner tube diameter < well pipe diameter < outer tube diameter, outer tube, well pipe and outer tube are coaxial heart setting, and well pipe box is in the inner tube outside, and outer pipe box is in the well pipe outside, and inner tube tip protrusion is in well pipe tip, and well pipe tip protrusion is in outer tube tip, and this sleeve pipe is plasma quarter butt. The plasma rectangular tube is close to the coaxial radio frequency coil that sets up of bottom, and radio frequency coil diameter is greater than plasma rectangular tube external diameter, and both are contactless, and radio frequency coil both ends are equipped with binding post A and binding post B, and binding post A and binding post B connect the radio frequency power. The bottom end opening of the plasma rectangular tube is not contacted with a sample cone, an atmospheric environment is arranged between the sample cone and the bottom end of the plasma rectangular tube, a rough vacuum environment of a vacuum pump is arranged in the sample cone, a hole is arranged between the sample cones, and a grounding metal sheet is connected between the sample cone and a wiring terminal B.
The structure of binding post A and binding post B be the exact same, be equipped with radio frequency sheetmetal and radio frequency parcel portion in the binding post, the radio frequency parcel portion is cylindric, the radio frequency sheetmetal is the bottom for 3/4 circular rectangular sheet structure, be equipped with the power hole on the radio frequency sheetmetal and be used for connecting the radio frequency power, this 3/4 circle internal diameter is greater than the radio frequency coil external diameter, this circle external diameter is the same with radio frequency parcel portion internal diameter, radio frequency coil, radio frequency sheetmetal and radio frequency parcel portion three are in the same place through screwed connection.
The plasma rectangular tube is made of quartz.
The radio frequency coil is an oxygen-free copper tube, and circulating water is introduced into the middle of the radio frequency coil to cool the radio frequency coil.
The radio frequency metal sheet is made of copper or silver.
The grounding metal sheet is made of oxygen-free copper or silver foil, and the surface of the grounding metal sheet is plated with gold or silver.
When the device disclosed by the invention works, circulating water is introduced into the radio frequency coil for cooling, the connecting terminal A and the connecting terminal B are connected into a radio frequency power supply, working gas enters from the air inlet of the inner tube and passes through the inner tube to reach the inside of the plasma rectangular tube, auxiliary gas enters from the air inlet of the middle tube and the air inlet of the outer tube and passes through the middle tube and the outer tube respectively to reach the inside of the plasma rectangular tube, and after a sample collides with the gas, the sample enters into the detection device through the gap of the sample cone for detection.
The radio frequency coil is a key component in the inductively coupled plasma mass spectrum, is arranged outside the plasma rectangular tube and is coaxial with the plasma rectangular tube, and provides a necessary radio frequency electric field for generating and maintaining stable discharge of inductively coupled plasma. Electrons and ions generated by high-frequency electric spark ignition are accelerated in a reciprocating way under the action of a radio-frequency electric field, collide with working gas and auxiliary gas (usually argon) in a plasma moment tube for multiple times, generate a large amount of Lenz-Joule heat, form stable discharge plasma flame, and evaporate, elemental and excite and ionize a sample carried by carrier gas through high-temperature ion and electron collision.
The sample cone (mass spectrum vacuum interface, made of high temperature resistant metal) is a key interface for introducing ions in the plasma flame generated by the plasma tube from the atmosphere to the mass spectrum vacuum environment. The sample cone is directly facing the high temperature plasma flame, needs to be cooled by cooling water, and is in vacuum tight connection (electrical communication) with the mass spectrum, and is therefore typically at ground potential. The phenomenon of secondary discharge often occurs between the plasma flame and the sample cone and causes a high divergence of ion energy, which causes serious interference to mass spectrometry.
As described above, the charged particles (ions, electrons) in the plasma flame generate induced potential under the action of the rf electric field, and a potential difference exists between the grounded sample cone to cause a secondary discharge phenomenon. Therefore, lowering the induced potential of the plasma is fundamental to eliminating the secondary discharge. Therefore, the coupling efficiency of the high-frequency electric field generated by the radio-frequency coil and the plasma circulation is improved, the collision times and the collision efficiency of charged particles and neutral particles in the plasma tube are improved, the electromagnetic induction potential in the plasma flame at the outlet of the plasma tube can be effectively reduced, and the occurrence of the secondary discharge phenomenon is reduced. This requires that the high frequency electric field generated by the rf coil be confined in a small space as much as possible, improving the coupling efficiency of the rf power supply to the rf coil and the rf coil to the plasma circulation.
The proper inductance value of the radio frequency coil can improve the coupling efficiency of the high-frequency electric field generated by the radio frequency coil and the plasma circulation. In the short-wave radio frequency band, 2-200 MHz, the inductance value of the radio frequency coil is in microhenry (H) level, and the inductance value of the radio frequency coil made of the hollow metal tube is simplified and calculated as: l (μh) = (DN) 2/(d+2s)/500 where D is the radio frequency coil inner diameter (in millimeters, mm), N is the number of turns of the coil, and S is the total length of the radio frequency coil (in millimeters, mm).
In order to prevent the plasma rectangular tube from being broken due to contact with the water-cooled radio frequency coil during high-temperature operation, the inner diameter of the radio frequency coil is slightly larger than the outer diameter of the plasma rectangular tube, the distance between the radio frequency coil and the outer wall of the plasma rectangular tube is 1-3mm, and the distance is smaller than the distance, so that the rectangular tube is too hot and is easy to break when approaching to the water-cooled coil; above this distance, rf electric field convergence is not favored.
The radio frequency coil is arranged between the outlet end of the inner tube and the outlet end of the plasma rectangular tube, the distance between the radio frequency coil and the outlet end of the inner tube is 3-10mm, and the distance between the radio frequency coil and the outlet end of the plasma rectangular tube is 3-10mm.
For a given plasma rectangular tube, determining the total length and the minimum inner diameter of the radio frequency coil according to the factors, calculating each parameter of the radio frequency coil according to the formula, and designing and processing the radio frequency coil manufacturing mould (comprising the inner diameter, the spacing and the pipe diameter) according with the corresponding parameter. Winding a hollow metal tube (commonly used oxygen-free copper tube, which is used for cooling the radio frequency coil by cooling water) with a proper pipe diameter on a radio frequency coil manufacturing mould until a certain number of turns.
In order to reduce the connection resistance with the radio frequency electric field (which can cause local overheating and reduce the coupling efficiency of the radio frequency electric field), improve the oxidation resistance of the radio frequency coil and prolong the service life of the radio frequency coil, the surface of the radio frequency coil is subjected to silver plating or gold plating treatment.
The two ends of the radio frequency coil are required to be connected with cooling water and are connected with the output of a radio frequency power supply. To reduce and eliminate the induced potential of the plasma, the side of the rf coil near the exit end of the plasma tube is held in good contact with the sample cone by a wider sheet of metal with good conductivity. Meanwhile, the output of the radio frequency coil and the output of the radio frequency power supply are connected by adopting a cladding structure, the two ends of the radio frequency coil are clad by semicircular metal sheets (copper or silver sheets) with good conductivity, the metal sheets are inserted into semi-closed wiring terminals with slightly larger diameters of through holes, and the metal sheets are fastened by screws, so that the output of the radio frequency coil and the output of the radio frequency power supply are kept in large-area close contact.
The beneficial effects of the invention are as follows:
The invention reduces or even eliminates the secondary discharge phenomenon caused by the induced potential in the plasma rectangular tube by modifying the radio frequency coil, and greatly reduces the manufacturing cost and the use cost.
Fig. 1 is a schematic structural view of the present invention.
Fig. 2 is a schematic structural view of the connection terminal.
Fig. 3 is a schematic view of a radio frequency metal sheet in the connection terminal.
Fig. 4 is a schematic view of a radio frequency package in the terminal.
Fig. 5 is a schematic diagram of a radio frequency coil.
FIG. 6 is a graph of sample cone operation in example 3.
FIG. 7 is a graph showing the operation of the control sample at the cone.
FIG. 1 shows an inner tube inlet, 2 shows a middle tube inlet, 3 shows an outer tube inlet, 4 shows a radio frequency coil, 5 shows a terminal A,6 shows a terminal B,7 shows a cooling water inlet, 8 shows a cooling water outlet, 9 shows a sample cone, 10 shows a grounded metal sheet, 11 shows an inner tube, 12 shows a middle tube, 13 shows an outer tube, 101 shows a radio frequency metal sheet, 102 shows a radio frequency wrapping part, 103 shows a power hole.
Detailed Description
The invention is further illustrated below with reference to examples.
Example 1
The top end of an inner tube 11 is provided with an inner tube air inlet 1, the top ends of a middle tube 12 and an outer tube 13 close to the top end are provided with a middle tube air inlet 2 and an outer tube air inlet 3, and the three tubes form sleeves with different top end positions, and the sleeves are named as plasma rectangular tubes. The plasma rectangular tube is close to the coaxial radio frequency coil 4 that sets up of bottom, and radio frequency coil 4 diameter is greater than plasma rectangular tube external diameter, and both are contactless, and radio frequency coil 4 both ends are equipped with binding post A5 and binding post B6, and binding post A5 and binding post B6 connect the radio frequency power. The bottom end of the plasma rectangular tube is not contacted with a sample cone 9, a rough vacuum environment of a vacuum pump is arranged in the sample cone 9, pores are arranged between the sample cones 9, and a grounding metal sheet 10 is connected between the sample cone 9 and a wiring terminal B6.
Example 2
When the device disclosed by the invention works, circulating water is introduced into the radio frequency coil for cooling, the wiring terminal A5 and the wiring terminal B6 are connected into a radio frequency power supply, working gas enters from the inner pipe air inlet 1 and passes through the inner pipe 11 to reach the inside of the plasma rectangular pipe, auxiliary gas enters from the middle pipe air inlet 2 and the outer pipe air inlet 3 and passes through the middle pipe 12 and the outer pipe 13 respectively to reach the inside of the plasma rectangular pipe, and after a sample collides with the gas, the sample enters the detection device through the gap of the sample cone 9 for detection.
Example 3
The invention is used for optimizing ICP-MS working conditions. When the plasma formed by the radio frequency coil manufactured by the invention is sprayed from the plasma rectangular tube outlet to the sample cone, stable plasma jet can be formed without generating or obvious secondary discharge phenomenon. Wherein:
Plasma rectangular tube parameters; the total length is 138mm; the outer diameter of the outer tube is 19.6mm; the outer diameter of the middle tube is 9.5mm, the inner diameter of the inner tube is 1.0mm, and the outlet of the inner tube is 23.5mm away from the outlet of the plasma rectangular tube;
A gas parameter; the outer tube plasma gas is argon, and the flow is 15L/min; the auxiliary gas of the middle pipe is argon, and the flow is 1.5L/min; the carrier gas in the inner tube is argon or nitrogen, and the flow is 0.5L/min;
radio frequency coil parameters: an oxygen-free copper tube with an outer diameter of 3mm and an inner diameter of 2.2mm is manufactured. According to the plasma rectangular tube parameters and the calculation formula, the radio frequency coil parameters are determined: an inner diameter of 23.3mm,3 turns and a total length of 14.8mm; the grounding end of the radio frequency coil is 8-12mm away from the plasma rectangular tube outlet; the grounding end of the radio frequency coil is 2-4mm away from the outlet of the inner tube of the plasma rectangular tube;
Radio frequency power supply parameters: the working frequency is 27.12MHz, and the radio frequency power provided by the radio frequency coil is 1-2000W.
Sample cone opening: 0.5mm, stainless steel, 120 degrees taper angle.
Comparative example
As shown in fig. 7, the plasma generated by the rf coil not made according to the present invention has a significant secondary discharge phenomenon when it is ejected from the plasma tube toward the sample cone. The parameters of the plasma rectangular tube, the gas parameter, the radio frequency power supply parameter, the sample cone opening and the like are the same as the working parameters of the embodiment 3, except for the radio frequency coil parameters. The radio frequency coil is 3 circles, but the total length and the internal diameter parameter deviate from the formula calculation result is larger, the internal diameter of the radio frequency coil parameter is 26mm, and the total length is 24mm; the grounding end of the radio frequency coil is 2-4mm away from the outlet of the inner tube of the plasma rectangular tube;
The foregoing is only a preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art, who is within the scope of the present invention, should be covered by the protection scope of the present invention by making equivalents and modifications to the technical solution and the inventive concept thereof.
Claims (5)
1. The radio frequency coil for eliminating secondary discharge of inductively coupled plasma mass spectrometry is characterized in that two ends of the radio frequency coil are provided with a connecting terminal A (5) and a connecting terminal B (6); the wiring terminal A (5) is internally provided with a radio frequency metal sheet (101) and a radio frequency wrapping part (102), the radio frequency wrapping part (102) is cylindrical, the radio frequency metal sheet (101) is of a rectangular sheet-shaped structure with a bottom end being 3/4 round, the radio frequency metal sheet (101) is provided with a power hole (103) for connecting a radio frequency power supply, the 3/4 round inner diameter is larger than the outer diameter of the radio frequency coil (4), the 3/4 round outer diameter is the same as the inner diameter of the radio frequency wrapping part (102), and the radio frequency coil (4), the radio frequency metal sheet (101) and the radio frequency wrapping part (102) are connected together through screws; the structure of the wiring terminal A (5) and the structure of the wiring terminal B (6) are identical; the radio frequency coil (4) is an oxygen-free copper tube.
2. The rf coil for eliminating secondary discharge of inductively coupled plasma mass spectrometry according to claim 1, wherein the rf metal sheet (101) is made of copper or silver.
3. An inductively coupled plasma mass spectrometry apparatus for eliminating secondary discharge, comprising: the plasma rectangular tube, the radio frequency coil (4), the wiring terminal A (5), the wiring terminal B (6), the grounding metal sheet (10) and the sample cone (9); the two ends of the radio frequency coil are provided with a wiring terminal A (5) and a wiring terminal B (6); the wiring terminal A (5) is internally provided with a radio frequency metal sheet (101) and a radio frequency wrapping part (102), the radio frequency wrapping part (102) is cylindrical, the radio frequency metal sheet (101) is of a rectangular sheet-shaped structure with a bottom end being 3/4 round, the radio frequency metal sheet (101) is provided with a power hole (103) for connecting a radio frequency power supply, the 3/4 round inner diameter is larger than the outer diameter of the radio frequency coil (4), the 3/4 round outer diameter is the same as the inner diameter of the radio frequency wrapping part (102), and the radio frequency coil (4), the radio frequency metal sheet (101) and the radio frequency wrapping part (102) are connected together through screws; the plasma rectangular tube is close to the bottom end and is coaxially provided with a radio frequency coil (4), the diameter of the radio frequency coil (4) is larger than the outer diameter of the plasma rectangular tube, the radio frequency coil and the plasma rectangular tube are not contacted, two ends of the radio frequency coil (4) are provided with a connecting terminal A (5) and a connecting terminal B (6), and the connecting terminal A (5) and the connecting terminal B (6) are connected with a radio frequency power supply; the bottom end of the plasma rectangular tube is provided with an opening, a sample cone is arranged, an atmosphere environment is arranged between the sample cone (9) and the bottom end of the plasma rectangular tube, a rough vacuum environment of a vacuum pump is arranged in the sample cone (9), a hole is arranged between the sample cones (9), and a grounding metal sheet (10) is connected between the sample cone (9) and a wiring terminal B (6); the plasma rectangular tube comprises an inner tube (11), a middle tube (12) and an outer tube (13); the top end of the inner tube (11) is provided with an inner tube air inlet (1), the top end of the middle tube (12) and the top end of the outer tube (13) are provided with a middle tube air inlet (2) and an outer tube air inlet (3) close to the top end, the diameter of the inner tube (11) is smaller than that of the middle tube (12), the diameter of the outer tube (13) is smaller than that of the middle tube (12), the inner tube (11), the middle tube (12) and the outer tube (13) are coaxially arranged, the middle tube (12) is sleeved outside the inner tube (11), the outer tube (13) is sleeved outside the middle tube (12), the end part of the inner tube (11) protrudes out of the end part of the middle tube (12), and the end part of the middle tube (12) protrudes out of the end part of the outer tube (13); the plasma rectangular tube is made of quartz.
4. An inductively coupled plasma mass spectrometry apparatus for removing secondary discharge according to claim 3, wherein the grounding metal plate (10) is made of oxygen-free copper or silver foil, and is surface-plated with gold or silver.
5. An inductively coupled plasma mass spectrometry apparatus for removing a secondary discharge according to claim 3, wherein the rf coil (4) is disposed between the outlet end of the inner tube (11) and the outlet end of the plasma tube, the distance between the rf coil (4) and the outer wall of the plasma tube is 1-3mm, the distance between the rf coil (4) and the outlet end of the inner tube (11) is 3-10mm, and the distance between the rf coil (4) and the outlet end of the plasma tube is 3-10mm.
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN87104633A (en) * | 1986-07-07 | 1988-01-20 | 株式会社岛津制作所 | Induction coupling plasma mass analyzer |
US5841531A (en) * | 1994-12-20 | 1998-11-24 | Varian Associates, Inc. | Spectrometer with discharge limiting means |
CN107920411A (en) * | 2017-11-13 | 2018-04-17 | 四川大学 | A kind of hybrid plasma body generator for silica-base material processing |
CN109087845A (en) * | 2018-09-25 | 2018-12-25 | 南方科技大学 | Single crystal material polishing device and method based on inductively coupled plasma |
CN209843655U (en) * | 2019-04-17 | 2019-12-24 | 大连民族大学 | Radio frequency coil for eliminating inductively coupled plasma mass spectrometer tube and secondary discharge |
Family Cites Families (1)
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---|---|---|---|---|
JP4903515B2 (en) * | 2006-08-11 | 2012-03-28 | アジレント・テクノロジーズ・インク | Inductively coupled plasma mass spectrometer |
-
2019
- 2019-04-17 CN CN201910309460.5A patent/CN109950124B/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN87104633A (en) * | 1986-07-07 | 1988-01-20 | 株式会社岛津制作所 | Induction coupling plasma mass analyzer |
US5841531A (en) * | 1994-12-20 | 1998-11-24 | Varian Associates, Inc. | Spectrometer with discharge limiting means |
CN107920411A (en) * | 2017-11-13 | 2018-04-17 | 四川大学 | A kind of hybrid plasma body generator for silica-base material processing |
CN109087845A (en) * | 2018-09-25 | 2018-12-25 | 南方科技大学 | Single crystal material polishing device and method based on inductively coupled plasma |
CN209843655U (en) * | 2019-04-17 | 2019-12-24 | 大连民族大学 | Radio frequency coil for eliminating inductively coupled plasma mass spectrometer tube and secondary discharge |
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