CN109909813A - ZnSe semicylinder mirror development technology - Google Patents
ZnSe semicylinder mirror development technology Download PDFInfo
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- CN109909813A CN109909813A CN201910159298.3A CN201910159298A CN109909813A CN 109909813 A CN109909813 A CN 109909813A CN 201910159298 A CN201910159298 A CN 201910159298A CN 109909813 A CN109909813 A CN 109909813A
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Abstract
The invention discloses ZnSe semicylinder mirror development technologies, the present invention is in order to solve the disadvantage that the presence of the prior art, propose nSe semicylinder mirror development technology, the following steps are included: S1, according to product size (R12.7*12.7*25.4), select respective face mirror substrate, size 28*27*14, S2, substrate is processed at disk, ring mill processing can well guarantee whole disk dimensional uniformity, 6 surfaces are processed respectively, S3, ring throws the face 27*25.4, size is to 27*25.4*13.5 (0/-0.005), S4, two pieces ring is taken to throw the semi-finished product completed, by the photosensitive glue glued adhesion of two burnishing surfaces (27*25.4), it is good to guarantee plane finish, semi-finished dimensions are 27*27*25.4 after gluing, S5, edging, edging To outer diameter D 25.6 (0/-0.02) size, S7 removes two pieces of products, removes plane light-sensitive emulsion, upper disk, low throwing converted products cylinder, and reach customer demand；Product consumption size is consistent before polishing, polishing size consumption 0.02 or so, S8, lower wall, cleaning, bevelling, product completion.The present invention utilizes conventional cuboid substrate, effectively save cost.
Description
Technical field
The present invention relates to face mirror development technique field more particularly to ZnSe semicylinder mirror development technologies.
Background technique
ZnSe belongs to direct band gap II-IV race semiconductor, and face-centred cubic structure has excellent physicochemical property, can be used for making
Make blue semiconductor laser part, light-detecting device, device for non-linear optical, waveguide modulator etc.；Simultaneously as outstanding red
Outer material is the preferred material of Infrared Lens, laser window, thermal infrared imager, and ZnSe lens can use classic polishing processes processing,
ZnSe diaphragm can two-sided throwing or ring throwing processing etc..Lens and window are widely used, but for the optics cold working side of product
Face, difficulty of processing are larger.The present invention will be explained in detail with ZnSe cylindrical mirror, and product is semicolumn, having a size of R12.7*12.7 thickness *
25.4 is wide, and there are the following problems for conventional machining: conventional semicolumn substrate is expensive, and precision not can guarantee and process semicolumn
Product is cut after being first processed as pole, but ZnSe material softer, and cutting difficulty is big, and easily damages machined optical surface,
There is eccentric requirement in product, because product is semicolumn, fine grinding easily causes consumption uneven, cannot reach completely half
Circle, in addition bias not can guarantee.
Summary of the invention
The purpose of the present invention is to solve disadvantages existing in the prior art, and the ZnSe semicylinder mirror exploitation proposed
Technique ZnSe semicylinder mirror development technology.
To achieve the goals above, present invention employs following technical solutions:
ZnSe semicylinder mirror development technology ZnSe semicylinder mirror development technology, comprising the following steps:
S1 selects respective face mirror substrate, size 28*27*14, without stringent according to product size (R12.7*12.7*25.4)
It is required that.
S2 processes substrate at disk, and ring mill processing can well guarantee whole disk dimensional uniformity, process 6 surfaces respectively.
S3, ring throw the face 27*25.4, size to 27*25.4*13.5 (0/-0.005), and guarantee that well (final be to produce to aperture
The face product S2).
S4 takes two pieces ring to throw the semi-finished product completed, good to guarantee to put down by the photosensitive glue glued adhesion of two burnishing surfaces (27*25.4)
Face finish, it is glued after semi-finished dimensions be 27*27*25.4；And in each glued D27 in the two sides 27*27 or so plano-convex lens.
S5, edging: using plano-convex lens convex surface as positioning surface, edging to outer diameter D 25.6 (0/-0.02) size；(lens
It contacts with edging clamp, positioning stablity, is processed convenient for edging).
S6 removes both sides lens, V-groove manual rounding to D25.4, guarantee whole product outer diameter consistency 0.02 with
It is interior.
S7 removes two pieces of products, removes plane light-sensitive emulsion, upper disk, low throwing converted products cylinder, and reaching client need to
It asks；Product consumption size is consistent before polishing, polishing size consumption 0.02 or so, small to Influence from Eccentric, is effectively ensured partially
Heart requirement.
S8, lower wall, cleaning, bevelling, product completion.
Mirror surface substrate is more appropriate using rectangular shape in the S1, and density is 2500 kilograms -3000 kilograms/cubes
Rice, and its size does not do body particular/special requirement, but minimum should be it is 14 millimeters of 28* wide 27* thickness long, dimensional tolerance control exists
Within 0.01.
Process the size at least 27*25.4*13.52 on 6 surfaces, dimensional tolerance in the S2 respectively at disk processing substrate
Control is within 0.01.
Light-sensitive emulsion in the S4 is purple in some strength and wavelength by, as photoinitiator, being solidified by photosensitive resin
It is realized under outer light action, is glued and is used for as photoresist (photoresist) system of microcircuit and integrated circuit component
It makes,
The oligomer of the lower C of ═ containing the C double bond of light-sensitive emulsion relative molecular mass in the S4 mainly has epoxies, gathers
Esters, polyurethanes etc., wherein urethane acrylate is that China applies a kind of more photosensitive oligomer at present, can be assigned
The good toughness of light-sensitive emulsion, cementability and chemical stability.
Compared with prior art, the beneficial effects of the present invention are:
1. using conventional cuboid substrate, effectively save cost.
2. effectively avoiding optical grade polished surface from damaging without processes such as cuttings, guarantee that product shape size meets attached column
Face requires.
3. consumption is consistent in process, good to guarantee that product bias index meets customer requirement and subsequent use.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.
ZnSe semicylinder mirror development technology, comprising the following steps:
S1 selects respective face mirror substrate, size 28*27*14, without stringent according to product size (R12.7*12.7*25.4)
It is required that.
S2 processes substrate at disk, and ring mill processing can well guarantee whole disk dimensional uniformity, process 6 surfaces respectively.
S3, ring throw the face 27*25.4, size to 27*25.4*13.5 (0/-0.005), and guarantee that well (final be to produce to aperture
The face product S2).
S4 takes two pieces ring to throw the semi-finished product completed, good to guarantee to put down by the photosensitive glue glued adhesion of two burnishing surfaces (27*25.4)
Face finish, it is glued after semi-finished dimensions be 27*27*25.4；And in each glued D27 in the two sides 27*27 or so plano-convex lens.
S5, edging: using plano-convex lens convex surface as positioning surface, edging to outer diameter D 25.6 (0/-0.02) size；(lens
It contacts with edging clamp, positioning stablity, is processed convenient for edging).
S6 removes both sides lens, V-groove manual rounding to D25.4, guarantee whole product outer diameter consistency 0.02 with
It is interior.
S7 removes two pieces of products, removes plane light-sensitive emulsion, upper disk, low throwing converted products cylinder, and reaching client need to
It asks；Product consumption size is consistent before polishing, polishing size consumption 0.02 or so, small to Influence from Eccentric, is effectively ensured partially
Heart requirement.
S8, lower wall, cleaning, bevelling, product completion.
Mirror surface substrate is more appropriate using rectangular shape in the S1, and density is 2500 kilograms -3000 kilograms/cubes
Rice, and its size does not do body particular/special requirement, but minimum should be it is 14 millimeters of 28* wide 27* thickness long, dimensional tolerance control exists
Within 0.01.
Process the size at least 27*25.4*13.52 on 6 surfaces, dimensional tolerance in the S2 respectively at disk processing substrate
Control is within 0.01.
Light-sensitive emulsion in the S4 is purple in some strength and wavelength by, as photoinitiator, being solidified by photosensitive resin
It is realized under outer light action, is glued and is used for as photoresist (photoresist) system of microcircuit and integrated circuit component
It makes,
The oligomer of the lower C of ═ containing the C double bond of light-sensitive emulsion relative molecular mass in the S4 mainly has epoxies, gathers
Esters, polyurethanes etc., wherein urethane acrylate is that China applies a kind of more photosensitive oligomer at present, can be assigned
The good toughness of light-sensitive emulsion, cementability and chemical stability.
Embodiment 1: such as Fig. 1, ZnSe semicylinder mirror development technology figure, comprising the following steps:
S1 selects respective face mirror substrate, size 28*27*14, without stringent according to product size (R12.7*12.7*25.4)
It is required that.
S2 processes substrate at disk, and ring mill processing can well guarantee whole disk dimensional uniformity, process 6 surfaces respectively.
S3, ring throw the face 27*25.4, size to 27*25.4*13.5 (0/-0.005), and guarantee that well (final be to produce to aperture
The face product S2).
S4 takes two pieces ring to throw the semi-finished product completed, good to guarantee to put down by the photosensitive glue glued adhesion of two burnishing surfaces (27*25.4)
Face finish, it is glued after semi-finished dimensions be 27*27*25.4；And in each glued D27 in the two sides 27*27 or so plano-convex lens.
S5, edging: using plano-convex lens convex surface as positioning surface, edging to outer diameter D 25.6 (0/-0.02) size；(lens
It contacts with edging clamp, positioning stablity, is processed convenient for edging).
S6 removes both sides lens, V-groove manual rounding to D25.4, guarantee whole product outer diameter consistency 0.02 with
It is interior.
S7 removes two pieces of products, removes plane light-sensitive emulsion, upper disk, low throwing converted products cylinder, and reaching client need to
It asks；Product consumption size is consistent before polishing, polishing size consumption 0.02 or so, small to Influence from Eccentric, is effectively ensured partially
Heart requirement.
S8, lower wall, cleaning, bevelling, product completion.
Embodiment 2: it takes two pieces ring to throw the semi-finished product figure completed in S2 as described in Figure 2, two burnishing surfaces (27*25.4) is used up
Quick glue glued adhesion, good to guarantee plane finish, semi-finished dimensions are 27*27*25.4 after gluing；And in each gluing in the two sides 27*27
One D27 or so plano-convex lens.
Embodiment 3: edging is using plano-convex lens convex surface as positioning surface schematic diagram, edging to outer diameter in S5 as described in Figure 3
D25.6 (0/-0.02) size；(lens are contacted with edging clamp, positioning stablity, are processed convenient for edging).
The foregoing is only a preferred embodiment of the present invention, but scope of protection of the present invention is not limited thereto,
Anyone skilled in the art in the technical scope disclosed by the present invention, according to the technique and scheme of the present invention and its
Inventive concept is subject to equivalent substitution or change, should be covered by the protection scope of the present invention.
Claims (5)
1.ZnSe semicylinder mirror development technology, which comprises the following steps:
S1 selects respective face mirror substrate, size 28*27*14 according to product size (R12.7*12.7*25.4), and nothing is strictly wanted
It asks.
S2 processes substrate at disk, and ring mill processing can well guarantee whole disk dimensional uniformity, process 6 surfaces respectively.
S3, ring throw the face 27*25.4, size to 27*25.4*13.5 (0/-0.005), and guarantee that aperture is good (final for product S2
Face).
S4 takes two pieces ring to throw the semi-finished product completed and the photosensitive glue glued adhesion of two burnishing surfaces (27*25.4) is well guaranteed planar light
Cleanliness, it is glued after semi-finished dimensions be 27*27*25.4；And in each glued D27 in the two sides 27*27 or so plano-convex lens.
S5, edging: using plano-convex lens convex surface as positioning surface, edging to outer diameter D 25.6 (0/-0.02) size；(lens and edging
Fixture contact, positioning stablity are processed convenient for edging).
S6 removes both sides lens, V-groove manual rounding to D25.4, guarantees within whole product outer diameter consistency 0.02.
S7 removes two pieces of products, removes plane light-sensitive emulsion, upper disk, low throwing converted products cylinder, and reach customer demand；It throws
Product consumption size is consistent before light, polishing size consumption 0.02 or so, small to Influence from Eccentric, and bias is effectively ensured and wants
It asks.
S8, lower wall, cleaning, bevelling, product completion.
2. ZnSe semicylinder mirror development technology according to claim 1, which is characterized in that mirror surface substrate uses in the S1
Rectangular shape is more appropriate, and density is 2500 kilograms -3000 kilograms/cubic metres, and its size does not do body particular/special requirement, but
It is that minimum should be to be 14 millimeters of 28* wide 27* thickness long, dimensional tolerance controls within 0.01.
3. ZnSe semicylinder mirror development technology according to claim 1, which is characterized in that process substrate at disk in the S2
The size at least 27*25.4*13.52 on 6 surfaces is processed respectively, and dimensional tolerance controls within 0.01.
4. ZnSe semicylinder mirror development technology according to claim 1, which is characterized in that light-sensitive emulsion in the S4 by by
For photosensitive resin as photoinitiator, solidifying is realized under the action of ultraviolet light of some strength and wavelength, is glued and conduct
Photoresist (photoresist) is used for the manufacture of microcircuit and integrated circuit component.
5. ZnSe semicylinder mirror development technology according to claim 1, which is characterized in that the light-sensitive emulsion in the S4 is opposite
The oligomer of the lower C of ═ containing the C double bond of molecular mass, mainly has epoxies, polyesters, polyurethanes etc., wherein polyurethane third
Olefin(e) acid ester is that China applies a kind of more photosensitive oligomer at present, can assign the good toughness of light-sensitive emulsion, cementability and chemistry
Stability.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910159298.3A CN109909813A (en) | 2019-03-04 | 2019-03-04 | ZnSe semicylinder mirror development technology |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910159298.3A CN109909813A (en) | 2019-03-04 | 2019-03-04 | ZnSe semicylinder mirror development technology |
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| CN109909813A true CN109909813A (en) | 2019-06-21 |
Family
ID=66963098
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
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| CN201910159298.3A Pending CN109909813A (en) | 2019-03-04 | 2019-03-04 | ZnSe semicylinder mirror development technology |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111452227A (en) * | 2020-04-23 | 2020-07-28 | 北京理工大学 | Processing method of aspheric cylindrical mirror |
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| JP2000009959A (en) * | 1998-06-19 | 2000-01-14 | Fuji Xerox Co Ltd | Optical bus and signal processor |
| JP2000237888A (en) * | 1999-02-18 | 2000-09-05 | Fine Machining Kk | Laser beam machining method and laser beam machine |
| CN1350204A (en) * | 2001-12-20 | 2002-05-22 | 张益民 | Automatic continuous cylindrical mirror producing process |
| CN1935455A (en) * | 2005-09-22 | 2007-03-28 | 亚洲光学股份有限公司 | Convex cylindrical mirror working device |
| CN104290002A (en) * | 2013-11-28 | 2015-01-21 | 中国航空工业集团公司洛阳电光设备研究所 | Method for machining cylindrical mirror |
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|---|---|---|---|---|
| AU627557B2 (en) * | 1990-03-23 | 1992-08-27 | Zeni Lite Buoy Co. Limited | A cylindrical lens and manufacturing method for the same |
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| JP2000237888A (en) * | 1999-02-18 | 2000-09-05 | Fine Machining Kk | Laser beam machining method and laser beam machine |
| CN1350204A (en) * | 2001-12-20 | 2002-05-22 | 张益民 | Automatic continuous cylindrical mirror producing process |
| CN1935455A (en) * | 2005-09-22 | 2007-03-28 | 亚洲光学股份有限公司 | Convex cylindrical mirror working device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN111452227A (en) * | 2020-04-23 | 2020-07-28 | 北京理工大学 | Processing method of aspheric cylindrical mirror |
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Application publication date: 20190621 |