CN109897377A - A kind of flexible parent metal and preparation method thereof - Google Patents

A kind of flexible parent metal and preparation method thereof Download PDF

Info

Publication number
CN109897377A
CN109897377A CN201910211881.4A CN201910211881A CN109897377A CN 109897377 A CN109897377 A CN 109897377A CN 201910211881 A CN201910211881 A CN 201910211881A CN 109897377 A CN109897377 A CN 109897377A
Authority
CN
China
Prior art keywords
oxide
film
polyamic acid
parent metal
flexible parent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201910211881.4A
Other languages
Chinese (zh)
Other versions
CN109897377B (en
Inventor
韦新颖
楚俊波
李仁佑
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mianyang Beijing Oriental Optoelectronic Technology Co Ltd
BOE Technology Group Co Ltd
Mianyang BOE Optoelectronics Technology Co Ltd
Original Assignee
Mianyang Beijing Oriental Optoelectronic Technology Co Ltd
BOE Technology Group Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mianyang Beijing Oriental Optoelectronic Technology Co Ltd, BOE Technology Group Co Ltd filed Critical Mianyang Beijing Oriental Optoelectronic Technology Co Ltd
Priority to CN201910211881.4A priority Critical patent/CN109897377B/en
Publication of CN109897377A publication Critical patent/CN109897377A/en
Application granted granted Critical
Publication of CN109897377B publication Critical patent/CN109897377B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Laminated Bodies (AREA)

Abstract

The embodiment of the present invention provides a kind of flexible parent metal and preparation method thereof, is related to flexible electronic device production field, is able to solve existing flexible parent metal complex manufacturing technology, the problem that cost of manufacture is higher and product yield is lower.The production method includes: to be coated with polyamic acid solution on a support, and use the first baking process baking polyamic acid solution to form Polyamic Acid Film;It is coated with oxide sol on Polyamic Acid Film, and uses the second baking process baking oxide sol to form oxide gel film;Polyamic Acid Film and oxide gel film are toasted using third baking process, to form polyimide/oxide film layer, and the multiple groups polyimide/oxide film layer that one group or lamination are arranged is as flexible parent metal.The present invention is for making flexible parent metal.

Description

A kind of flexible parent metal and preparation method thereof
Technical field
The present invention relates to flexible electronic device production fields more particularly to a kind of flexible parent metal and preparation method thereof.
Background technique
In recent years due to the continuous development of science and technology, requirement of the people to display device not only rests on image quality, response In terms of the characteristics such as speed, and the requirement to (foldable as soft, rollable etc.) in terms of the form of display device is also increasingly It is high.Currently, the production of flexible display (such as AMOLED) is usually that first the precursor solution of polymer is coated on hard carrier, Then flexible parent metal is converted to by heat treatment mode appropriate (such as low-temperature bake and high-temperature baking), then on flexible parent metal Make driving element and display element, then be packaged technique, finally total is peeled from hard carrier to be formed it is soft Property display.
However, the oxygen characteristic that blocks water of the existing flexible parent metal by polymeric material is poor, water vapor transmittance (WVTR) with OTR oxygen transmission rate (O2TR) general all 100~102Magnitude, and OLED device is to WVTR and O2The requirement of TR is distinguished It is 10-6g·m-2d-1With 10-5cm3·m-2d-1.Therefore, in the prior art it is generally necessary to make single layer on the surface of flexible parent metal Or the inorganic water oxygen barrier layer of multilayer, such as silicon oxide layer, silicon nitride layer etc..The production of inorganic water oxygen barrier layer generally uses PECVD (Plasma Enhanced Chemical Vapor Deposition, plasma enhanced chemical vapor deposition method) or ALD The method of (Atomic layer deposition, atomic layer deposition) needs expensive vacuum equipment, causes to be fabricated in this way This is higher.In addition, the difference due to inorganic material and organic material in structure, mainly leads between inorganic material and organic material Physical action combination is crossed, with the increase of inorganic film quantity or thickness, film layer residual stress increases, while polymer material The problems such as thermal expansion coefficient is higher, these are all easy to cause flexible base board warpage, and inorganic layer removing is failed, it is good in turn result in product Rate is lower.
Summary of the invention
The embodiment of the present invention provides a kind of flexible parent metal and preparation method thereof, is able to solve existing flexible parent metal production work The problem that skill is complicated, cost of manufacture is higher and product yield is lower.
In order to achieve the above objectives, the embodiment of the present invention adopts the following technical scheme that
On the one hand, the embodiment of the present invention provides a kind of production method of flexible parent metal, and the production method includes: to support Polyamic acid solution is coated on object, and it is thin to form polyamic acid to use the first baking process to toast the polyamic acid solution Film;Oxide sol is coated on the Polyamic Acid Film, and use the second baking process toast the oxide sol with Form oxide gel film;The Polyamic Acid Film and the oxide gel film are toasted using third baking process, To form polyimide/oxide film layer, and polyimide/oxide film layer described in the multiple groups that one group or lamination are arranged as The flexible parent metal.
Optionally, it is described use the second baking process to toast the oxide sol with formed oxide gel film it Afterwards, the production method further include: be coated with polyamic acid solution on the oxide gel film, and dried using described first Curing process toasts the polyamic acid solution to form Polyamic Acid Film;It is described that the polyamides is toasted using third baking process Amino acid film and the oxide gel film to form polyimide/oxide film layer, and one group or lamination are arranged more The group polyimide/oxide film layer is specifically included as the flexible parent metal: described poly- using the baking of third baking process Amic acid film and the oxide gel film, to form polyimide/oxide/polyimide film, and by one group or Polyimide/oxide/polyimide film described in the multiple groups of lamination setting is as the flexible parent metal.
It is optionally, described that the Polyamic Acid Film and the oxide gel film are toasted using third baking process, To form polyimide/oxide film layer, and polyimide/oxide film layer described in the multiple groups that one group or lamination are arranged as The flexible parent metal specifically includes: toasting the Polyamic Acid Film using third baking process and the oxide gel is thin Film, to form polyimide/oxide film layer;It is coated with polyamic acid solution in the polyimide/oxide film layer, and is adopted The polyamic acid solution is toasted with first baking process to form Polyamic Acid Film;It is toasted using third baking process The Polyamic Acid Film, to form polyimide/oxide/polyimide film, and the multiple groups that one group or lamination are arranged Polyimide/oxide/the polyimide film is as the flexible parent metal.
Optionally, first baking process include: in 200 DEG C of nitrogen or inert gas environment below volatilization described in 50% or more solvent in polyamic acid solution.
Optionally, second baking process include: in 200 DEG C of nitrogen or inert gas environment below with 1 DEG C/ Min~5 DEG C/min heating rate is heated up stage by stage come the solvent in the oxide sol that volatilizees.
Optionally, the third baking process includes: in nitrogen or inert gas environment with 3 DEG C/min~10 DEG C/min Heating rate be warming up to preset temperature stage by stage, and on the preset temperature continue preset duration;Wherein, the default temperature Degree is greater than or equal to 300 DEG C.
Optionally, the oxide is SiO2、Al2O3、MgO2、ZnO、ZrO2In any one or any several mixing Object.
Optionally, above support is glass substrate or flexible stainless steel coiled material.
On the other hand, the embodiment of the present invention provides a kind of flexible parent metal, and the flexible parent metal is as described in any one of the above The production method of flexible parent metal be made.
Flexible parent metal provided in an embodiment of the present invention and preparation method thereof, the production method include: to apply on a support Cloth polyamic acid solution, and use the first baking process baking polyamic acid solution to form Polyamic Acid Film;In polyamide It is coated with oxide sol on sour film, and uses the second baking process baking oxide sol to form oxide gel film; Polyamic Acid Film and oxide gel film are toasted using third baking process, to form polyimide/oxide film layer, and The multiple groups polyimide/oxide film layer that one group or lamination are arranged is as flexible parent metal.Compared to the prior art, the present invention is real It applies in example by using third baking process while toasting Polyamic Acid Film and oxide gel film, to form polyamides Asia Amine/oxide membranous layer, since polyamic acid imidization and oxide precursor object hydrolysis-condensation carry out simultaneously, storeroom mutually expands It dissipates, the nature transition of film layer interface, so that residual stress is small between film layer, adhesion is good, and oxide diffusion can effectively drop The thermal expansion coefficient of oligomeric polyimide improves its glass transition temperature, and has efficient water vapor barrier property, improves in this way The water oxygen barrier properties of flexible parent metal.In addition, due to not needing vacuum equipment in the embodiment of the present invention, so that flexible parent metal Manufacture craft it is relatively simple, cost of manufacture is lower.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this Some embodiments of invention for those of ordinary skill in the art without creative efforts, can be with It obtains other drawings based on these drawings.
Fig. 1 is the production method flow chart of flexible parent metal provided in an embodiment of the present invention;
Fig. 2 be another embodiment of the present invention provides flexible parent metal production method flow chart;
Fig. 3 is the production method flow chart for the flexible parent metal that yet another embodiment of the invention provides;
Fig. 4 is the structural schematic diagram that flexible parent metal is formed on supporter provided in an embodiment of the present invention;
Fig. 5 is the structural schematic diagram provided in an embodiment of the present invention that flexible parent metal is made of roll-to-roll mode.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other Embodiment shall fall within the protection scope of the present invention.
The embodiment of the present invention provides a kind of production method of flexible parent metal, as shown in Figure 1 and Figure 5, the production method packet It includes:
Step 101 is coated with polyamic acid solution on a support, and toasts polyamic acid solution using the first baking process To form Polyamic Acid Film.
Above support can be the glass substrate of hard, be also possible to flexible stainless steel coiled material, the embodiment of the present invention Material, form for supporter etc. are without limitation.
The embodiment of the present invention for coating mode also without limitation, it is exemplary, can be slit (slit/slot die) Coating method, scraper (blade) coating method, spraying (spray) etc..
Polyamic acid (PAA) film can be formed using the first baking process baking polyamic acid (PAA) solution;Described One baking process is low-temperature bake, specifically, the polyamides that can volatilize in 200 DEG C of nitrogen or inert gas environment below 50% or more solvent in amino acid solution, to form PAA film.
Step 102 is coated with oxide sol on Polyamic Acid Film, and molten using the second baking process baking oxide Glue is to form oxide gel film.
Oxide in the oxide sol can be SiO2、Al2O3、MgO2、ZnO、ZrO2In any one or appoint It anticipates several mixtures, it is not limited in the embodiment of the present invention.
Oxide gel film can be formed using the second baking process baking oxide sol;Second baking process For low-temperature bake, specifically, can be in 200 DEG C of nitrogen or inert gas environment below with 1 DEG C/min~5 DEG C/min liter Warm rate is heated up stage by stage come the solvent in the oxide sol that volatilizees, to form oxide gel film.
Step 103 toasts Polyamic Acid Film and oxide gel film using third baking process, to form polyamides Asia Amine/oxide membranous layer, and the multiple groups polyimide/oxide film layer that one group or lamination are arranged is as flexible parent metal.
Polyamic acid (PAA) film and oxide gel film are toasted using third baking process, polyamides Asia can be formed Amine (PI)/oxide membranous layer;The third baking process is high-temperature baking, specifically, can be in nitrogen or inert gas environment In preset temperature is warming up to stage by stage with 3 DEG C/min~10 DEG C/min heating rate, and continue on the preset temperature pre- If duration;Wherein, the preset temperature is greater than or equal to 300 DEG C;The preset duration is pre-set duration, this field skill Setting when art personnel can carry out according to the actual situation, it is not limited in the embodiment of the present invention.
It is exemplary, PAA solution can be coated on a support first, in 40 DEG C~120 DEG C nitrogen or inert gas environment The middle solvent by PAA solution evaporates into 50% or more to form PAA film;Then it is thin oxide sol to be coated on the PAA On film, using sol-gel technology with 1 DEG C/min~5 DEG C/min heating rate sublevel in nitrogen or inert gas environment Duan Shengwen is come the solvent in the oxide sol that volatilizees to form oxide gel film;Again with 3 DEG C/min~10 DEG C/min liter Warm rate is warming up to 450 DEG C stage by stage and maintains preset duration, so that the imidization of PAA and the generation of sull are complete simultaneously At.Can as needed above steps may be repeated multiple times to make multilayer film as flexible parent metal.Before PAA imidization and oxide It drives object hydrolysis-condensation to carry out simultaneously, storeroom phase counterdiffusion, the nature transition of film layer interface, residual stress is small between film layer, adhesion It is good, and oxide diffusion can effectively reduce the thermal expansion coefficient (CTE) of PI, improve its glass transition temperature (Tg), and have There is efficient water vapor barrier property.
This method not only can chip (sheet to sheet) production, be more suitable for the height of roll-to-roll (roll to roll) Imitate production method.
Example goes out a specific embodiment of chip production below: being coated on the glass substrate using the method for slot coated Then one layer of PAA solution toasts solvent flashing to 65% in 60 DEG C of nitrogen environment, forms PAA film;Then in formation One layer of SiO of slot coated is used on PAA film2Colloidal sol, heated up in nitrogen environment with the rate of 2 DEG C/min baking shape stage by stage At SiO2Gel film, it is specific: to continue 30min at 30 DEG C, then heat to 60 DEG C, continue 20min at 60 DEG C, then 90 DEG C are warming up to, continues 15min at 90 DEG C;And then baking is heated up stage by stage with the rate of 5 DEG C/min to form PI/ oxidation Object film layer, it is specific: after being warming up to 120 DEG C, to continue 15min at 120 DEG C, then heat to 240 DEG C, continue at 240 DEG C 15min then heats to 480 DEG C, continues 30min at 480 DEG C, to complete the imidization of PAA and the generation of sull, So far PI/SiO is formed2Flexible parent metal.It is subsequent can be in the PI/SiO of formation2Driving element, display device, envelope are made in film layer Dress etc., finally removes it from glass substrate, forms flexible display device.
Example goes out a specific embodiment of roll-to-roll production below: refering to what is shown in Fig. 5, using step 101 in 50um thickness Stainless steel coiled material on using slot coated method be coated with one layer of PAA solution, then toast and wave in 60 DEG C of nitrogen environment The solvent in PAA solution is sent out to 80%, forms PAA film;Then slit is used on the PAA film of formation using step 102 It is coated with one layer of SiO2Colloidal sol, the baking that then heated up stage by stage in nitrogen environment with the rate of 2 DEG C/min form SiO2Gel is thin Film, specific: continue 30min at 30 DEG C, then heat to 60 DEG C, continues 20min at 60 DEG C, then heat to 90 DEG C, Continue 15min at 90 DEG C;Finally utilize step 103 by the PAA/SiO of formation2Gel film is taken off from stainless-steel roll material, And the baking that heated up stage by stage with the rate of 5 DEG C/min is to form PI/SiO2Film layer, it is specific: after being warming up to 120 DEG C, at 120 DEG C Shi Chixu 15min then heats to 240 DEG C, continues 15min at 240 DEG C, then heats to 480 DEG C, continues at 480 DEG C 30min so far forms PI/SiO to complete the imidization of PAA and the generation of sull2Coiled material.
Another embodiment of the present invention provides a kind of production methods of flexible parent metal, as shown in Fig. 2, the production method packet It includes:
Step 201 is coated with polyamic acid solution on a support, and toasts polyamic acid solution using the first baking process To form Polyamic Acid Film.
It is exemplary, refering to what is shown in Fig. 4, being coated with one layer of PAA solution using the method for slot coated on glass substrate 11, so Solvent flashing is toasted in 60 DEG C of nitrogen environment afterwards to 65%, forms PAA film 12.
Step 202 is coated with oxide sol on Polyamic Acid Film, and molten using the second baking process baking oxide Glue is to form oxide gel film.
It is exemplary, refering to what is shown in Fig. 4, using one layer of SiO of slot coated on PAA film 122-Al2O3Then colloidal sol exists It heats up to toast stage by stage with the rate of 2 DEG C/min in nitrogen environment and forms SiO2-Al2O3Gel film 13, it is specific: at 30 DEG C Shi Chixu 30min then heats to 60 DEG C, continues 20min at 60 DEG C, then heats to 90 DEG C, continues at 90 DEG C 15min。
Step 203 is coated with polyamic acid solution on oxide gel film, and toasts polyamides using the first baking process Amino acid solution is to form Polyamic Acid Film.
It is exemplary, refering to what is shown in Fig. 4, in SiO2-Al2O3One layer is coated with using the method for slot coated on gel film 13 Then PAA solution toasts solvent flashing to 65% in 60 DEG C of nitrogen environment, forms PAA film 12.
Step 204 toasts Polyamic Acid Film and oxide gel film using third baking process, to form polyamides Asia Amine/oxide/polyimide film, and multiple groups polyimide/oxide/polyimide film that one group or lamination are arranged is made For flexible parent metal.
It is exemplary, refering to what is shown in Fig. 4, heated up stage by stage with the rate of 5 DEG C/min baking PAA film 12 and SiO2-Al2O3 Gel film 13, it is specific: after being warming up to 120 DEG C, to continue 15min at 120 DEG C, 240 DEG C are then heated to, at 240 DEG C Continue 15min, then heat to 480 DEG C, continue 30min at 480 DEG C, to complete imidization and the sull of PAA It generates, so far forms PI/SiO2-Al2O3/ PI flexible parent metal.
Yet another embodiment of the invention provides a kind of production method of flexible parent metal, as shown in figure 3, the production method packet It includes:
Step 301 is coated with polyamic acid solution on a support, and toasts polyamic acid solution using the first baking process To form Polyamic Acid Film.
Step 302 is coated with oxide sol on Polyamic Acid Film, and molten using the second baking process baking oxide Glue is to form oxide gel film.
Step 303 toasts Polyamic Acid Film and oxide gel film using third baking process, to form polyamides Asia Amine/oxide membranous layer.
Step 304 is coated with polyamic acid solution in polyimide/oxide film layer, and is dried using the first baking process Polyamic acid solution is baked to form Polyamic Acid Film.
Step 305 toasts Polyamic Acid Film using third baking process, sub- to form polyimide/oxide/polyamides Amine film layer, and multiple groups polyimide/oxide/polyimide film that one group or lamination are arranged is as flexible parent metal.
PI/ oxide/PI film layer can be also produced using such production method.
Another embodiment of the present invention provides a kind of flexible parent metal, flexible parent metal flexibility as described in any one of the above The production method of substrate is made.
The embodiment of the present invention toasts Polyamic Acid Film when making flexible parent metal, by using third baking process simultaneously With oxide gel film, to form polyimide/oxide film layer, due to polyamic acid imidization and oxide precursor object water Solution-polycondensation carries out simultaneously, storeroom phase counterdiffusion, the nature transition of film layer interface, so that residual stress is small between film layer, adheres to Property it is good, and oxide diffusion can effectively reduce the thermal expansion coefficient of polyimides, improve its glass transition temperature, and have Efficient water vapor barrier property improves the water oxygen barrier properties of flexible parent metal in this way.In addition, due to being not required in the embodiment of the present invention Want vacuum equipment, so that the manufacture craft of flexible parent metal is relatively simple, and cost of manufacture is lower.
The above description is merely a specific embodiment, but scope of protection of the present invention is not limited thereto, any In the technical scope disclosed by the present invention, any changes or substitutions that can be easily thought of by those familiar with the art, all answers It is included within the scope of the present invention.Therefore, protection scope of the present invention should be with the scope of protection of the claims It is quasi-.

Claims (9)

1. a kind of production method of flexible parent metal, which is characterized in that the production method includes:
It is coated with polyamic acid solution on a support, and it is poly- to be formed to use the first baking process to toast the polyamic acid solution Amic acid film;
Oxide sol is coated on the Polyamic Acid Film, and use the second baking process toast the oxide sol with Form oxide gel film;
The Polyamic Acid Film and the oxide gel film are toasted using third baking process, with formed polyimides/ Oxide membranous layer, and polyimide/oxide film layer described in the multiple groups that one group or lamination are arranged is as the flexible parent metal.
2. the production method of flexible parent metal according to claim 1, which is characterized in that use the second baking process described After the oxide sol is toasted to form oxide gel film, the production method further include:
It is coated with polyamic acid solution on the oxide gel film, and the polyamides is toasted using first baking process Amino acid solution is to form Polyamic Acid Film;
It is described that the Polyamic Acid Film and the oxide gel film are toasted using third baking process, to form polyamides Asia Amine/oxide membranous layer, and polyimide/oxide film layer described in the multiple groups that one group or lamination are arranged is as the flexible parent metal It specifically includes:
The Polyamic Acid Film and the oxide gel film are toasted using third baking process, with formed polyimides/ Oxide/polyimide film, and polyimide/oxide/polyimide film described in the multiple groups that one group or lamination are arranged As the flexible parent metal.
3. the production method of flexible parent metal according to claim 1, which is characterized in that described to be dried using third baking process The Polyamic Acid Film and the oxide gel film are baked, to form polyimide/oxide film layer, and it is by one group or folded Polyimide/oxide film layer described in the multiple groups of layer setting is specifically included as the flexible parent metal:
The Polyamic Acid Film and the oxide gel film are toasted using third baking process, with formed polyimides/ Oxide membranous layer;
It is coated with polyamic acid solution in the polyimide/oxide film layer, and institute is toasted using first baking process Polyamic acid solution is stated to form Polyamic Acid Film;
The Polyamic Acid Film is toasted using third baking process, to form polyimide/oxide/polyimide film, And polyimide/oxide/polyimide film described in the multiple groups that one group or lamination are arranged is as the flexible parent metal.
4. the production method of flexible parent metal as claimed in any of claims 1 to 3, which is characterized in that described first Baking process includes:
Volatilize in the polyamic acid solution in 200 DEG C of nitrogen or inert gas environment below 50% or more solvent.
5. the production method of flexible parent metal according to claim 1, which is characterized in that second baking process includes:
It heats up to come stage by stage with 1 DEG C/min~5 DEG C/min heating rate in 200 DEG C of nitrogen or inert gas environment below The solvent to volatilize in the oxide sol.
6. the production method of flexible parent metal as claimed in any of claims 1 to 3, which is characterized in that the third Baking process includes:
Preset temperature is warming up to stage by stage with 3 DEG C/min~10 DEG C/min heating rate in nitrogen or inert gas environment, And continue preset duration on the preset temperature;Wherein, the preset temperature is greater than or equal to 300 DEG C.
7. the production method of flexible parent metal according to claim 1, which is characterized in that the oxide is SiO2、Al2O3、 MgO2、ZnO、ZrO2In any one or any several mixture.
8. the production method of flexible parent metal according to claim 1, which is characterized in that above support be glass substrate or Flexible stainless steel coiled material.
9. a kind of flexible parent metal, which is characterized in that flexible parent metal flexibility as described in any one of claim 1 to 8 The production method of substrate is made.
CN201910211881.4A 2019-03-19 2019-03-19 Flexible base material and manufacturing method thereof Active CN109897377B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910211881.4A CN109897377B (en) 2019-03-19 2019-03-19 Flexible base material and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910211881.4A CN109897377B (en) 2019-03-19 2019-03-19 Flexible base material and manufacturing method thereof

Publications (2)

Publication Number Publication Date
CN109897377A true CN109897377A (en) 2019-06-18
CN109897377B CN109897377B (en) 2021-04-30

Family

ID=66952763

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201910211881.4A Active CN109897377B (en) 2019-03-19 2019-03-19 Flexible base material and manufacturing method thereof

Country Status (1)

Country Link
CN (1) CN109897377B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114335404A (en) * 2021-12-20 2022-04-12 深圳市华星光电半导体显示技术有限公司 Preparation method of flexible substrate, flexible substrate and flexible display panel

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070129535A1 (en) * 2003-02-24 2007-06-07 Triton Systems, Inc. Linear polyphosphonates and methods of making
CN105552247A (en) * 2015-12-08 2016-05-04 上海天马微电子有限公司 Composite substrate, flexible display device and preparation method thereof
CN106229419A (en) * 2016-07-29 2016-12-14 华南理工大学 Composite and flexible substrate that a kind of residual stress is controlled and preparation technology thereof and application
CN107936275A (en) * 2017-12-13 2018-04-20 长春聚明光电材料有限公司 A kind of Kapton of flexibility water white transparency and preparation method thereof
CN108473702A (en) * 2015-12-11 2018-08-31 米希尔斯集团 The method for manufacturing the polymeric substrate of the coating with low-E

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070129535A1 (en) * 2003-02-24 2007-06-07 Triton Systems, Inc. Linear polyphosphonates and methods of making
CN105552247A (en) * 2015-12-08 2016-05-04 上海天马微电子有限公司 Composite substrate, flexible display device and preparation method thereof
CN108473702A (en) * 2015-12-11 2018-08-31 米希尔斯集团 The method for manufacturing the polymeric substrate of the coating with low-E
CN106229419A (en) * 2016-07-29 2016-12-14 华南理工大学 Composite and flexible substrate that a kind of residual stress is controlled and preparation technology thereof and application
CN107936275A (en) * 2017-12-13 2018-04-20 长春聚明光电材料有限公司 A kind of Kapton of flexibility water white transparency and preparation method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114335404A (en) * 2021-12-20 2022-04-12 深圳市华星光电半导体显示技术有限公司 Preparation method of flexible substrate, flexible substrate and flexible display panel
CN114335404B (en) * 2021-12-20 2023-11-28 深圳市华星光电半导体显示技术有限公司 Preparation method of flexible substrate, flexible substrate and flexible display panel

Also Published As

Publication number Publication date
CN109897377B (en) 2021-04-30

Similar Documents

Publication Publication Date Title
JP5357675B2 (en) Release layer material, substrate structure including the same, and method for manufacturing the same
JP6062894B2 (en) Substrate structure and method for manufacturing flexible electronic device
CN104769021B (en) Flexible device substrate, flexible device and its manufacture method, laminate and its manufacture method and resin combination
CN104377118B (en) The preparation method and flexible display substrates motherboard of flexible display substrates
CN107680994A (en) A kind of flexible OLED display panel and preparation method thereof
US10490758B2 (en) Flexible OLED display panel and manufacturing method thereof
TWI505410B (en) Substrate structures applied in flexible electrical devices and fabrication method thereof
TWI306882B (en) Thermoplastic polyimide composition and method of making double-sided flexible copper clad laminate using the same
TWI765882B (en) Manufacturing method of flexible substrate
TWI662868B (en) Manufacturing method of display device, resin solution, and exfoliation device
CN110428731A (en) The preparation method of display panel and display panel
TWI673167B (en) Laminated product and method for producing flexible device
TW201033005A (en) Laminate, method for producing the same and laminate circuit board
WO2019095406A1 (en) Flexible substrate and method for manufacturing same
US20230133423A1 (en) Flexible substrate, manufacturing method thereof, and flexible display device
WO2016080312A1 (en) Glass laminate, method for producing same and method for manufacturing electronic device
CN109897377A (en) A kind of flexible parent metal and preparation method thereof
TW202130501A (en) Laminated substrate, method for manufacturing laminated body, laminated body, laminated body with components for electronic device, and method for manufacturing electronic device do not easily peel off the formed polyimide film when a polyimide varnish is coated on the surface of the laminated substrate to form a polyimide film
CN105321875B (en) A kind of flexible base board, flexible display and preparation method thereof
CN106229419A (en) Composite and flexible substrate that a kind of residual stress is controlled and preparation technology thereof and application
TW201712059A (en) Method for manufacturing polyimide film which improves productivity and reduces cost by a time-reduction heat treatment step and avoiding the outcomes of bubbling and insufficient hardening
WO2020124824A1 (en) Composite thin film and preparation method therefor
JP6412727B2 (en) Manufacturing method of resin substrate and manufacturing method of display device
CN109859626A (en) Flexible display screen and preparation method thereof
TWI555637B (en) Release layer, substrate structure, and method for manufacturing flexible electronic device

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant