CN109876727B - High ratio compounding device and use its preparation production system - Google Patents
High ratio compounding device and use its preparation production system Download PDFInfo
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- CN109876727B CN109876727B CN201910129189.7A CN201910129189A CN109876727B CN 109876727 B CN109876727 B CN 109876727B CN 201910129189 A CN201910129189 A CN 201910129189A CN 109876727 B CN109876727 B CN 109876727B
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Abstract
The invention provides a high-proportion mixing device which is provided with a first feeding pipe, a second feeding pipe, a first atomizing/fine-grain agent amount control device, a second atomizing/fine-grain agent amount control device and a reaction chamber. The first and second feeding pipes are configured in a multi-layer sleeve mode, the first and second atomization/fine dosage control devices are respectively arranged at the tail ends of the first and second feeding pipes, and the reaction chamber is used for accommodating the first and second feeding pipes and the first and second atomization/fine dosage control devices. The first and second feeding pipes receive the first and second liquid reagents, respectively. The first atomization/fine dosage control device and the second atomization/fine dosage control device respectively carry out atomization or fine dispersion treatment on the first liquid agent and the second liquid agent, and spray the atomized or fine first liquid agent and the atomized or fine second liquid agent on the liquid agent mixing wall surface of the reaction chamber respectively so as to mix the first liquid agent and the second liquid agent.
Description
Technical Field
The invention relates to a high-proportion mixing device for producing a preparation and a preparation production system using the same, in particular to a high-proportion mixing device which has the advantages of relatively short reaction time, relatively high reaction efficiency and miniaturization and a preparation production system using the same.
Background
In semiconductor manufacturing, optoelectronic manufacturing, pharmaceutical manufacturing, chemical manufacturing, food manufacturing, or other manufacturing processes, it is often necessary to blend products or aid in the manufacture of products with different liquid formulations. In the mixing process for manufacturing the preparation, there may be a large volume difference between different liquid agents (i.e. a high ratio between a plurality of liquid agents) according to the difference between the reaction time and the blending ratio.
In the prior art, the high-ratio liquid agent mixing is performed by controlling the feeding ratio and mixing in a single injection hole or injection flow channel manner. Further, the known technology injects a small amount of liquid agent into a large amount of liquid agent in a single-point manner, and then stirs the mixture to achieve the mixing purpose. However, the above-mentioned method cannot obtain a complete mixing effect. Furthermore, in the case of a fast reaction, the mixing may not be uniformly dispersed, which may cause some disadvantages, such as: caking due to acid-base neutralization, mixing failure, poor mixing, and the like. On the other hand, most of the mixing devices used in semiconductor manufacturing plants or photovoltaic manufacturing plants are devices with bulky tanks combined with long-path pipeline systems, so that the mixing devices in the prior art occupy huge space and are not easy to move or fixed facilities which cannot move.
Disclosure of Invention
Therefore, in order to overcome the disadvantages of the prior art, embodiments of the present invention provide a high-ratio mixing device for producing a preparation and a preparation production system using the same, wherein a plurality of different liquid agents are atomized or finely dispersed, and then the atomized or finely dispersed liquid agents are sprayed on a liquid agent mixing wall surface of a reaction chamber, so as to achieve the purpose of uniform, rapid and efficient mixing. Moreover, the high-proportion mixing device and the preparation production system using the high-proportion mixing device can complete mixing of different liquid preparations only in a limited space, so that a pretreatment area is not required to be additionally arranged, the number, the cost and the required space of unit arrangement are reduced, and the high-proportion mixing device and the preparation production system using the high-proportion mixing device can be miniaturized and are easy to carry away or carry.
In view of at least one of the above objectives, an embodiment of the present invention provides a high-ratio mixing apparatus, which includes first and second feeding pipes, first and second atomization/micronization dose control devices, and a reaction chamber. The first and second feeding pipes are configured in a multi-layer sleeve mode, the first and second atomization/fine dosage control devices are respectively arranged at the tail ends of the first and second feeding pipes, and the reaction chamber is used for accommodating the first and second feeding pipes and the first and second atomization/fine dosage control devices. The first and second feeding pipes receive the first and second liquid reagents, respectively. The first atomization/fine dosage control device and the second atomization/fine dosage control device respectively carry out atomization or fine dispersion treatment on the first liquid agent and the second liquid agent, and respectively spray the atomized or fine first liquid agent and the atomized or fine second liquid agent on the liquid agent mixing wall surface of the reaction chamber so as to mix the first liquid agent and the second liquid agent.
Optionally, the high-ratio mixing device further comprises a first dose control device and a second dose control device. The first dosage control device is arranged at the other end of the first feeding pipe and used for receiving the first liquid dosage and adjusting the feeding dosage and pressure of the first liquid dosage so as to feed the first liquid dosage into the first feeding pipe. The second dosage control device is arranged at the other end of the second feeding pipe and used for receiving the second liquid dosage and adjusting the feeding dosage and pressure of the second liquid dosage so as to feed the second liquid dosage into the second feeding pipe.
Optionally, the high mix ratio mixing device further comprises an end mixer. The end mixer is arranged at one end of the reaction chamber and is used for mixing the first liquid agent and the second liquid agent flowing down from the liquid agent mixing wall surface.
Optionally, the liquid agent mixing wall is smooth.
Optionally, the liquid agent mixing wall has at least one drainage pattern.
Optionally, the first and second feeding pipes are horizontally parallel and overlapped or horizontally parallel and staggered on a horizontal cloth dividing surface.
Optionally, the side surfaces of the first and second atomization/micronization agent control devices are each configured with at least one microporous structure.
Optionally, the lubricious surface is a corrosion resistant, water repellent material, or the lubricious surface is coated or painted with a corrosion resistant, water repellent material.
Based on at least one of the above objectives, an embodiment of the present invention provides a preparation production system, which includes the above high-ratio mixing device, the first and second pressure-stabilizing feeding devices, and a finished preparation output device. The high-proportion mixing device is connected with the first and second pressure-stabilizing feeding devices and the preparation finished product output device.
Optionally, the preparation production system further comprises a first monitoring and verifying device, a second monitoring and verifying device and a real-time monitoring device. The first monitoring and verifying device is arranged between the first pressure stabilizing feeding device and the high-proportion mixing device, the second monitoring and verifying device is arranged between the second pressure stabilizing feeding device and the high-proportion mixing device, and the real-time monitoring device is arranged between the preparation finished product output device and the high-proportion mixing device.
In short, the high-proportion mixing device for producing the preparation and the preparation production system using the high-proportion mixing device provided by the embodiment of the invention have the technical effects of high-proportion uniform mixing, rapid mixing, low facility space, low cost and the like.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, a brief description will be given below of the drawings required for the embodiments or the technical solutions in the prior art, and it is obvious that the drawings in the following description are some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
FIG. 1 is a functional block diagram of a formulation production system according to an embodiment of the present invention.
FIG. 2 is a schematic sectional side view of a high mix ratio mixing device according to an embodiment of the present invention.
Fig. 3A is a schematic cross-sectional top view of a high mix ratio mixing device according to an embodiment of the present invention.
Fig. 3B is a schematic top sectional view of a high mix ratio mixing device according to another embodiment of the present invention.
Fig. 3C is a schematic side view of the multiple micro-porous structures of the atomization/micronization agent amount control device of the high-ratio mixing device according to the embodiment of the invention.
Fig. 4A is a schematic side view of a liquid-phase mixing wall of a reaction chamber of a high-ratio mixing apparatus according to an embodiment of the present invention.
Fig. 4B is a schematic side view of the liquid reagent mixing wall of the reaction chamber of a high batch mixing apparatus according to another embodiment of the invention.
Fig. 4C is a schematic side view of a liquid reagent mixing wall of a reaction chamber of a high batch mixing apparatus according to yet another embodiment of the invention.
FIG. 4D is a schematic sectional side view of the liquid agent mixing wall of the reaction chamber of a high batch mixing apparatus according to yet another embodiment of the invention.
Fig. 5A is a schematic cross-sectional side view of an end mixer of a high mix compounding device of an embodiment of the present invention.
Fig. 5B is a schematic cross-sectional side view of an end mixer of a high mix compounding device according to another embodiment of the present invention.
Wherein, 1-a formulation production system; 101-104-first to fourth doses; 111-114-pressure-stabilizing feeding device; 131-134-monitoring verification device; 14. 2-a high-proportion mixing device; 15-a real-time monitoring device; 16-finished product output device of preparation; 201-203-dose control device; 211-213-a feeding pipe; 221 to 223-atomization/fine agent dosage control device; 2211. 2221, 2231-microporous structure; 22311-microwells; 23-a reaction chamber; 231-liquid agent mixing wall; 2311-2314-drainage duct pattern; 24-terminal mixer; 241-fan blades; 242 — moving parts.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. All other embodiments, which can be obtained by a person skilled in the art without any inventive step based on the embodiments of the present invention, are within the scope of the present invention.
The following detailed description of the embodiments of the invention refers to the accompanying drawings. The same symbols represent members or devices having the same or similar functions. Electrical connection or electrical connection means direct or indirect electrical connection.
The embodiment of the invention provides a high-proportion mixing device for producing a preparation and a preparation production system using the same, wherein a plurality of different liquid agents are atomized or refined and dispersed, and the atomized or refined liquid agents are sprayed on the liquid agent mixing wall surface of a reaction chamber to mix the liquid agents from surface to surface, so that the technical effects of uniform mixing and rapid mixing in high proportion and the like are realized. Through the method, the mixing can be completed only in a limited space, so that the high-proportion mixing device and the preparation production system using the high-proportion mixing device have the technical effects of low facility space, low cost and the like, and the high-proportion mixing device and the preparation production system using the high-proportion mixing device can be easily moved to the nearest distance of a product processing end, so that the facility and the operating cost are saved. In addition, the high-ratio mixing device can be a miniaturized device of 300 ml (even less than 300 ml) or a large device of up to several tons, and the type and volume of the liquid agent for mixing are not limited to the invention.
The high-proportion mixing device and the preparation production system using the same can achieve high-proportion mixing. In response to the reaction time of mixing the liquid agents, some liquid agents can be rapidly mixed into a large amount of liquid agents only in a small amount ratio, so as to achieve the optimal agent mixing reaction efficiency. For example, the ratio of the liquid agents can be as high as 1: 10 to 1: 500, but the invention is not so limited. The high-proportion mixing device and the preparation production system using the same can be used in various fields, such as: the blending of chemical liquid (chemical) and grinding fluid (slurry) in semiconductor industry or photoelectric industry, the blending of special medical drugs conforming to functional medical architecture, the blending of general medical drugs, the blending of chemicals (such as KOH) requiring short-term reaction, the blending of other chemical substances, the blending of food blending accurately mixed with seasonings or nutritional supplements.
In general, the high-ratio mixing device of the embodiment of the invention is a multiple-input and single-output (multiple-input and single-output) mixing device, and can achieve the purpose of accurately mixing materials at a high ratio under the requirement of a short-distance mixing space. The high-proportion mixing device comprises a plurality of feeding pipes, a plurality of atomization/fine-particle dose control devices and a reaction chamber, wherein the feeding pipes are correspondingly connected with the atomization/fine-particle dose control devices, and the reaction chamber accommodates the feeding pipes and the atomization/fine-particle dose control devices. The multiple feeding pipes receive multiple different liquid agents, the multiple atomization/fine agent amount control devices atomize or finely disperse the different liquid agents, and the atomized or finely dispersed liquid agents are sprayed on the liquid agent mixing wall surface of the reaction chamber to mix the different liquid agents, wherein the liquid agent mixing wall surface can be a smooth surface or a non-smooth surface.
Next, referring to fig. 1 of the present application, fig. 1 is a functional block diagram of a system for producing a preparation according to an embodiment of the present invention. The preparation production system 1 comprises pressure-stabilizing feeding devices 111-114, monitoring and verifying devices 131-134, a high-proportion mixing device 14, a real-time monitoring device 15 and a preparation finished product output device 16, wherein the pressure-stabilizing feeding devices 111-114 are respectively connected with the monitoring and verifying devices 131-134, the monitoring and verifying devices 131-134 are connected with the high-proportion mixing device 14, the high-proportion mixing device 14 is connected with the real-time monitoring device 15, and the real-time monitoring device 15 is connected with the preparation finished product output device 16.
The pressure-stabilizing feeding devices 111-114 receive the first to fourth agents 101-104, which are mainly liquid, respectively, wherein the types of the first to fourth agents 101-104, which are mainly liquid, are not limited, and may be semiconductor polishing liquid, chemical liquid, doped-particle liquid (solid-contained liquid), or other liquid to be mixed. The pressure-stabilizing feeding devices 111-114 can stabilize the pressure in the pipeline and buffer the pulse wave of the liquid, so that the first to fourth doses 101-104 have stable flow rate and flow velocity in the conveying process.
The monitoring and verifying devices 131 to 134 are used to verify whether the quality of the first to fourth agents 101 to 104 meets the process requirement, respectively, so as to determine whether the first to fourth agents 101 to 104 can be sent to the high-ratio mixing device 14, respectively. The detection items of the first to fourth agents 101 to 104 of the monitoring and verifying devices 131 to 134 may include at least one of ph value, concentration, particle distribution, particle size, specific gravity, temperature, density, conductivity, pressure, flow rate and weight, and correspondingly, the monitoring and verifying devices 131 to 134 include at least one of ph meter, concentration meter, particle distribution meter, particle size meter, specific gravity meter, temperature meter, density meter, conductivity meter, pressure meter, flow meter and weight.
The high-ratio mixing device 14 can mix and mix the first to fourth agents 101-104 according to different ratios, and mainly sprays the first to fourth agents 101-104 on the liquid agent mixing wall of the reaction chamber by means of fine mist for mixing. Preferably, the high-ratio mixing device 14 may further include an end mixer at the end of the reaction chamber for performing the second mixing. Details of the high-mix mixing device 14 will be described later, and will not be described herein.
The real-time monitoring device 15 receives the preparation mixed by the high-ratio mixing device 14 and confirms whether the preparation meets the quality requirements, that is, the preparation is subjected to verification and detection of liquid characteristics to determine whether the preparation can be delivered. The detection items of the preparation by the real-time monitoring device 15 may include at least one of ph value, concentration, particle distribution, particle size, specific gravity, temperature, density, conductivity, pressure, flow rate and weight, and correspondingly, the real-time monitoring device 15 includes at least one of a ph meter, a concentration meter, a particle distribution meter, a particle size meter, a specific gravity meter, a thermometer, a densitometer, a conductivity meter, a pressure meter, a flow meter and a weight.
The product output device 16 receives the product output by the real-time monitoring device 15, and can receive the incoming material request command from the user end, so as to provide the corresponding volume of the product to the user end according to the required dosage in the incoming material request command and considering the pressure stability and pulse wave control of the pipeline transportation.
In the operation process, the pressure-stabilizing feeding devices 111-114 will stabilize the pressure in each pipeline before sending the first to fourth doses 101-104 to the monitoring and verifying devices 131-134, respectively. If the pressure is not uniform, there may be a verification and evaluation failure condition that affects the ratio calculation and supply for the first to fourth recipes 101-104. In addition, before the mixed preparation is output, the real-time monitoring device 15 can control the pressure-stabilizing feeding devices 111-114, the monitoring and verifying devices 131-134, the high-proportion mixing device 14 and the preparation finished product output device 16 to carry out instructions such as data collection, operation scheduling, safe shutdown and the like besides monitoring the quality of the preparation. In addition, the system 1 is only one embodiment of the present invention, and in the case of less required quality of the preparation, the monitoring and verifying devices 131 to 134 and the real-time monitoring device 15 may be removed without being installed in the system 1.
Next, an embodiment of the high mix ratio kneading device 14 will be described. Referring to fig. 2, fig. 2 is a schematic cross-sectional view of a high mixture ratio mixing device according to an embodiment of the invention. The high-ratio mixing device 2 in fig. 2 is illustrated by taking three input agents as an example, the high-ratio mixing device 14 in fig. 1 is illustrated by inputting four input agents (the first to fourth input agents 101 to 104), and a person skilled in the art can know how to realize the high-ratio mixing device 14 inputting four input agents through the description of the high-ratio mixing device 2.
In FIG. 2, the high-ratio mixing device 2 includes dosage control devices 201 to 203, feeding pipes 211 to 213, atomization/fine dosage control devices 221 to 223, a reaction chamber 23, and a terminal mixer 24. The dose control devices 201-203 are connected to the first ends of the feeding tubes 211-213, respectively, and the atomizing/fine dose control devices 221-223 are connected to the second ends of the feeding tubes 211-213, respectively. The material feeding pipes 211-213 are layered (for example, from the top view, they are layered outward in a concentric vertically staggered manner to isolate the liquid agents in the material feeding pipes 211-213, see fig. 3A and 3B). An end mixer 24 is provided at the end of the reaction chamber 23.
The dosage control devices 201-203 are used to receive different liquid dosages and adjust the feeding dosage and pressure to input the received liquid dosages into the feeding pipes 211-213, respectively. Referring to fig. 2, 3A and 3B, the feeding pipes 211-213 are disposed in a staggered manner on the vertical cloth-dividing surface. In addition, the first ends of the feeding pipes 211 to 213 may be located in the same side region or different side regions of the reaction chamber 23. Incidentally, in some cases, the dose control devices 201 to 203 may be unnecessary components, and the feeding is controlled by the atomization/fine dose control devices 221 to 223.
As shown in FIG. 3A, the feeding tubes 211-213 are horizontally parallel and staggered on the horizontal surface, and the first ends of the feeding tubes 211-213 can be located at the same side region of the reaction chamber 23. As shown in FIG. 3B, the feeding tubes 211-213 are horizontally parallel and overlapped on the horizontal cloth surface, so that the first ends of the feeding tubes 211-213 can be located at different side areas of the reaction chamber 23, and therefore, the consistency and minimum space configuration of the feeding tubes 211-213 are not required to be considered, so as to achieve the configuration that the tube diameters of the feeding tubes 211-213 are not limited to the space. Briefly, the feeding pipes 211 to 213 are arranged in a multi-layer sleeve manner in a confined space to form a plurality of flow channels for liquid agents and create a control space, so that the feeding can be performed under a certain pressure, wherein the direction of the arrow in fig. 2 indicates the feeding direction of the liquid agents.
The atomization/refinement agent amount control devices 221-223 receive the liquid agents from the material receiving pipes 211-213, and perform atomization or refinement dispersion treatment (i.e., reduce the water mist of the liquid agents) on the liquid agents from the material receiving pipes 211-213, and spray the atomized or refined liquid agents on the liquid agent mixing wall 231 of the reaction chamber 23. In this embodiment, the atomizing/fine dose control devices 221-223 are configured with a plurality of micro-porous structures 2211, 2221, 2231 on the sides. The microporous structures 2211, 2221, 2231 and the plurality of micropores may be arranged at intervals (for example, in fig. 3C, the microporous structure 2231 includes a plurality of micropores arranged at intervals, and the microporous structures 2231 are arranged at intervals) or not, and the size of the micropores may vary according to the characteristics of the liquid agent. In addition, in order to achieve a more precise atomizing and feeding effect, the micro-porous structures 2211, 2221 and 2231 and the micro-pores thereof are configured according to the characteristics of the liquid agent, and the atomizing/micro-atomizing agent control devices 221 to 223 may be further configured with an ultrasonic atomizing device.
Alternatively, the atomizing/fine dosage control devices 221-223 may be pneumatic continuous pressure-controlled feeding devices, which spray the atomized or fine liquid dosage in a feeding manner by pressurizing with nitrogen gas or supplying pressure continuously by a pump. In addition, the feeding accuracy of the control method can be achieved by a pneumatic pump and program control.
Alternatively, the atomizing/fine dosing control devices 221-223 may be quantitative batch-feeding devices, and the feeding method of spraying the atomized or fine liquid doses may be a batch-continuous feeding method by creating a confined space and extruding the confined space. The feeding accuracy of the control mode can be achieved by the creation of a limited space and a mechanical power extrusion device.
In short, the implementation manner of the atomizing/fine dose control devices 221 to 223 is not limited to the present invention, and any device or equipment that can perform a dispersing process of atomizing or fine-sizing the liquid dose in the feeding pipes 211 to 213 can be used to implement the present invention.
The liquid agent mixing wall 231 of the reaction chamber 23 serves as a primary mixing area for the liquid agent input to the high ratio mixing device 14, wherein the reaction chamber 23 may be a cylindrical container or a container with other shape, and the invention is not limited thereto. The liquid agents are uniformly sprayed on the liquid agent mixing wall 231 in a water mist manner and are mixed in a surface-to-surface manner, so that the liquid agents can be uniformly mixed and reacted in a short time under the condition of high mixture ratio. Then, the fine water mist of each liquid agent is gathered into a larger water bead shape, and flows into the end mixer along the wall surface of the reaction chamber after confluence for secondary mixing.
The liquid agent mixing wall 231 may be a smooth surface, and may be made of Polytetrafluoroethylene (PTFE), other fluorine material, or other material that resists corrosion, high temperature, and has good water repellency, or the liquid agent mixing wall 231 may be coated or coated with PTFE, other fluorine material, or other material that resists corrosion, high temperature, and has good water repellency. Due to the water repellency, the liquid agents are sprayed on the liquid agent mixing wall 231 and mixed, and then are quickly guided to the end mixer 24 connected to the end of the reaction chamber 23 in a natural path. The glaze may be a seamless glaze or a seamed glaze, and the seamed glaze may further have at least one drainage channel pattern.
Alternatively, when the liquid agent mixing wall 231 is a smooth surface with slits, it may have different patterns of the drainage patterns 2311 to 2314 (as shown in fig. 4A to 4D), so that after the liquid agents are mixed with the liquid agent mixing wall 231, the liquid agents are quickly drained to the end mixer 24 connected to the end of the reaction chamber 23 through the guidance of the drainage patterns 2311 to 2314. In fig. 4A to 4D, the drainage duct patterns 2311 to 2314 are respectively polygonal (e.g., triangular, tetragonal, pentagonal or hexagonal) bump patterns, circular (e.g., regular circular or elliptical) bump patterns, strip convex patterns and wave-shaped curved patterns formed by machining or embossing, but the invention is not limited thereto.
The drainage patterns 2311-2314 may be uniformly or non-uniformly disposed on the liquid agent mixing wall 231. In addition, the drainage patterns 2311-2314 may be arranged on the liquid agent mixing wall 231 in any combination with each other, for example, the drainage patterns 2311 and 2312 are alternately arranged on the liquid agent mixing wall 231. Incidentally, different drainage channel patterns can be designed according to different types of liquid agents so as to increase the mixing effect and reduce the reaction time.
It should be noted that the liquid agent mixing wall 231 may also be non-smooth. Depending on the type of liquid agent, the liquid agent mixing wall 231 may be smooth or non-smooth to increase mixing efficiency. In addition, the non-smooth surface may be a seamless non-smooth surface or a seamed non-smooth surface, and the seamed non-smooth surface may further have at least one drainage channel pattern as previously described. In short, the design of the liquid agent mixing wall 231 is not intended to limit the present invention, and is related to the type of liquid agent and the mixing efficiency requirement. Incidentally, for the mixing of a plurality of different liquid agents, a slotted smooth surface design usually has a better mixing efficiency.
The end mixer 24 is used to perform a second mixing to enhance the mixing effect. After the second mixing, the end mixer 24 will send the mixed preparation to a real-time monitoring device or a finished preparation output device. Incidentally, in some cases, the end mixer 24 may be an unnecessary component in the embodiment. The terminal mixer 24 may be a non-dynamic fixed type mixer (e.g., fig. 5A) or a dynamic type mixer (e.g., fig. 5B).
In fig. 5A, the end mixer 24 is a static mixer (static mixer) without moving parts, which is composed of staggered mixing fan blades 241, which form a vortex for the liquid agent to pass through for the second mixing, wherein the static mixer does not need power components, so it has a low cost. In fig. 5B, the end mixer 24 is a dynamic mixer including a moving part 241 (e.g., a cutter wheel part), and the moving part 241 can rotate or stir along with the shaft center to stir and mix the liquid particles in the liquid agent, thereby improving the mixing effect and producing a better quality of the preparation.
In summary, compared with the prior art, the technical effects of the high-ratio mixing device for producing the preparation and the preparation production system using the same provided by the embodiment of the invention are described as follows:
(1) in the known technology, a plurality of different liquid agents are mixed at a single point, so that the uniformity of mixing the large-dose liquid agent and the small-dose liquid agent cannot be achieved, and the high-proportion mixing device for producing the preparation and the preparation production system using the high-proportion mixing device provided by the embodiment of the invention reversely observe that the atomized or refined plurality of different liquid agents are sprayed on the liquid agent mixing wall surface of the reaction chamber to mix the surface and the surface, so that the uniformity of mixing the large-dose liquid agent and the small-dose liquid agent can be achieved;
(2) in the prior art, because good dispersion treatment is not performed before each liquid agent is mixed, long-time stirring is required, and in contrast, the high-ratio mixing device for producing the preparation and the preparation production system using the high-ratio mixing device provided by the embodiment of the invention, when each liquid agent is mixed, the dispersion treatment is performed by atomizing or refining the liquid agent, so that the uniformity of mixing can be ensured, and in addition, optionally, a tail end mixer can be arranged at the tail end of a reaction chamber of the high-ratio mixing device for performing second mixing, so that a better mixing effect can be obtained in a short time; and
(3) in contrast to the prior art, the high-ratio mixing device and the preparation production system using the high-ratio mixing device provided by the embodiment of the invention can complete mixing of different liquid agents in a local limited space, and have high mixing efficiency and high mixing speed, so that the pre-treatment area is not required to be arranged, the arrangement quantity, the arrangement cost and the occupied space of the machine units are reduced, and the high-ratio mixing device and the preparation production system using the high-ratio mixing device can be miniaturized to achieve the purpose of easy moving or carrying.
The present invention is capable of other embodiments, and various changes and modifications may be made by one skilled in the art without departing from the spirit and scope of the invention as defined in the appended claims.
Claims (10)
1. The utility model provides a high ratio compounding device which characterized in that, high ratio compounding device includes:
the first feeding pipe is used for receiving a first liquid agent;
the second feeding pipe is configured with the first feeding pipe in a multi-layer sleeve mode and used for receiving a second liquid agent;
the first atomization/fine agent amount control device is arranged at the tail end of the first feeding pipe and is used for carrying out atomization or fine dispersion treatment on the first liquid agent;
the second atomization/fine chemical dosage control device is arranged at the tail end of the second feeding pipe and is used for carrying out atomization or fine dispersion treatment on the second liquid chemical; and
a reaction chamber for accommodating the first and second feeding pipes, the first and second atomization/micronization dose control devices, and having a liquid dose mixing wall, wherein the first and second atomization/micronization dose control devices are used for spraying the atomized or micronized first and second liquid doses on the liquid dose mixing wall to mix the first and second liquid doses.
2. The high mix ratio mixing device of claim 1, further comprising:
the first dosage control device is arranged at the other end of the first feeding pipe and used for receiving the first liquid dosage and adjusting the feeding dosage and pressure of the first liquid dosage so as to feed the first liquid dosage into the first feeding pipe; and
and the second dosage control device is arranged at the other tail end of the second feeding pipe and used for receiving the second liquid dosage and adjusting the feeding dosage and pressure of the second liquid dosage so as to feed the second liquid dosage into the second feeding pipe.
3. The high mix ratio mixing device of claim 1, further comprising:
and the tail end mixer is arranged at the tail end of the reaction chamber and is used for mixing the first liquid agent and the second liquid agent flowing down from the liquid agent mixing wall surface.
4. A high mix ratio compounding apparatus as claimed in claim 1, wherein said liquid agent mixing wall is smooth.
5. A high mix ratio mixing apparatus as defined in claim 1, wherein said liquid mix wall has at least one drainage pattern.
6. A high mix ratio mixing device as defined in claim 1, wherein said first and second feeding pipes are horizontally parallel overlapped or horizontally parallel staggered on the horizontal cloth surface.
7. A high mix compounding device as claimed in claim 1, wherein the first and second atomization/micronization dose control devices are each provided with at least one microporous structure on a side thereof.
8. A high mix mixing device as claimed in claim 4, wherein the smooth surface is an anti-corrosive, water repellent material, or the smooth surface is coated or painted with the anti-corrosive, water repellent material.
9. A system for producing a formulation, the system comprising:
the high mix ratio mixing device according to any one of claims 1 to 8;
the first pressure stabilizing feeding device is connected with the high-proportion mixing device;
the second pressure-stabilizing feeding device is connected with the high-proportion mixing device; and
and the preparation finished product output device is connected with the high-proportion mixing device.
10. The formulation production system of claim 9, further comprising:
the first monitoring and verifying device is arranged between the first pressure stabilizing and feeding device and the high-proportion mixing device;
the second monitoring and verifying device is arranged between the second pressure-stabilizing feeding device and the high-proportion mixing device; and
and the real-time monitoring device is arranged between the preparation finished product output device and the high-proportion mixing device.
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