CN109876727A - High mixture ratio mixing device and the preparation production system for using it - Google Patents
High mixture ratio mixing device and the preparation production system for using it Download PDFInfo
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- CN109876727A CN109876727A CN201910129189.7A CN201910129189A CN109876727A CN 109876727 A CN109876727 A CN 109876727A CN 201910129189 A CN201910129189 A CN 201910129189A CN 109876727 A CN109876727 A CN 109876727A
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- 238000002156 mixing Methods 0.000 title claims abstract description 116
- 239000000203 mixture Substances 0.000 title claims abstract description 101
- 238000002360 preparation method Methods 0.000 title claims description 50
- 238000004519 manufacturing process Methods 0.000 title claims description 33
- 239000007788 liquid Substances 0.000 claims abstract description 130
- 238000006243 chemical reaction Methods 0.000 claims abstract description 37
- 238000000889 atomisation Methods 0.000 claims abstract description 34
- 238000012545 processing Methods 0.000 claims abstract description 16
- 239000003795 chemical substances by application Substances 0.000 claims description 137
- 238000012544 monitoring process Methods 0.000 claims description 37
- 230000000087 stabilizing effect Effects 0.000 claims description 15
- 239000002552 dosage form Substances 0.000 claims description 11
- 238000009434 installation Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 10
- 238000009826 distribution Methods 0.000 claims description 9
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- 239000011850 water-based material Substances 0.000 claims 1
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Abstract
The present invention provides a kind of high mixture ratio mixing devices, have first and second feeding pipe, first and second first atomization/trickle agent amount control device and reaction chamber.First and second feeding pipe is configured in a manner of multilayer sleeve, first and second atomization/trickle agent amount control device is respectively arranged at the end of first and second feeding pipe, and reaction chamber is to accommodate first and second feeding pipe, first and second atomization/trickle agent amount control device.It is other that first and second feeding pipe receives first and second liquid agent respectively.The decentralized processing that first and second atomization/trickle agent amount control device is not atomized or is made fine to first and second liquid agent respectively, and the liquid agent that first and second liquid agent of atomization or imperceptibility is not sprayed at reaction chamber is not mixed into wall surface, it is other to mix first and second liquid agent.
Description
Technical field
The present invention is about a kind of high mixture ratio mixing device for producing preparation and using its preparation production system, especially
Refer to that a kind of reaction time is very fast, reaction efficiency is preferable and the high mixture ratio mixing device that can be miniaturized is produced with using its preparation
System.
Background technique
In manufacture of semiconductor, photoelectric process, medical processing procedure, chemical process, food processing procedure or other processing procedures, generally require
Reconciled using the preparation not mixed by different liquid agents product or auxiliary product manufacturing.In the mixing processing procedure of manufacture preparation,
It is (also that is, more in response to might have very big volume difference between in the difference in reaction time and harmonic proportion, different liquid agents are other
There is high mixture ratio) between a liquid agent is other.
In well-known technique, the mode for carrying out the other mixing of high mixture ratio liquid agent is control pan feeding ratio, with single injection hole
Or the mode of injection runner is mixed.It further says, well-known technique is Zhu Ru be not big by a small amount of liquid agents with one-point system
The liquid agent of amount not in, then be stirred, to reach mixing purpose.However, the above-mentioned practice and complete mixing effect can not be obtained
Fruit.Furthermore the case where for fast reaction is needed, may be mixed because of that can not be uniformly dispersed, and generate some lack
Point, such as: agglomeration, the mixing of acid-base neutralization fail or mix bad etc..Still further aspect, well-known technique are used for semiconductors manufacture
The mixing device majority of factory or photoelectricity manufactory is the equipment for the pipeline system that bulky tub combines long path, therefore,
The mixing device of well-known technique not only occupies huge space, or even not Easy Move, or is fixed facility, and can not remove
It moves.
Summary of the invention
Therefore, in order to overcome the shortcoming of well-known technique, the embodiment of the present invention provides a kind of for producing the height of preparation
Mixing device and the preparation production system using it are matched, at the dispersion that multiple and different liquid agents Wu Hua or be made fine
After reason, the liquid agent of atomization or imperceptibility is not sprayed at the liquid agent of reaction chamber and does not mix wall surface, with reach it is uniform, quickly with
The purpose of high efficiency mixing.Furthermore above-mentioned high mixture ratio mixing device and only need to be in the sky of limitation using its preparation production system
It is interior to complete the other mixing of different liquid agents, therefore can be it is not necessary that pre-treatment region is extraly arranged, to reach reduction
The quantity of unit setting, cost and required space, also that is, above-mentioned high mixture ratio mixing device and can using its preparation production system
With micromation, and it is easy to move away from or carry.
At least one person based on foregoing purpose, the embodiment of the present invention provide a kind of high mixture ratio mixing device, packet
Include first and second feeding pipe, first and second first atomization/trickle agent amount control device and reaction chamber.First and second
Feeding pipe is configured in a manner of multilayer sleeve, first and second atomization/trickle agent amount control device is respectively arranged at first and
The end of two feeding pipes, and reaction chamber to accommodate first and second feeding pipe, first and second be atomized/be made fine dosage control
Device.It is other that first and second feeding pipe receives first and second liquid agent respectively.First and second is atomized/is made fine dosage control
The decentralized processing that device is not atomized or is made fine to first and second liquid agent respectively, and respectively by atomization or imperceptibility
The liquid agent that first and second liquid agent is not sprayed at reaction chamber does not mix wall surface, other mixed to carry out first and second liquid agent
It closes.
Optionally, high mixture ratio mixing device further includes first and second health-monitoring installation.First health-monitoring installation is set
Be placed in another end of the first feeding pipe, it is other to receive the first liquid agent, and adjust the other feed dosage of the first liquid agent and
First liquid agent is not fed through the first feeding pipe by pressure.Second health-monitoring installation is set to the another of the second feeding pipe
End, it is other to receive the second liquid agent, and the other feed dosage of the second liquid agent and pressure are adjusted, the second liquid agent is other
It is fed through the second feeding pipe.
Optionally, high mixture ratio mixing device further includes end mixer.End mixer is set to an end of reaction chamber,
To mix from liquid agent not Hun He first and second liquid agent for flowing down of wall surface it is other.
Optionally, liquid agent not Hun He wall surface be shiny surface.
Optionally, liquid agent not Hun He wall surface have an at least sluice way pattern.
Optionally, first and second feeding pipe is in being that horizontal parallel is folded or horizontal parallel is interlocked on a horizontal distribution face.
Optionally, first and second atomization/trickle agent amount control device side is respectively configured with an at least microcellular structure.
Optionally, it is anticorrosive hydrophobic to be that an anticorrosive water repellent material or shiny surface are coated with or are coated with for shiny surface system
Property material.
One at least within based on foregoing purpose, the embodiment of the present invention provide a kind of preparation production system comprising preceding
State high mixture ratio mixing device, first and second pressure stabilizing feeding device and finished dosage form output device.High mixture ratio mixing device connects
Connect first and second pressure stabilizing feeding device and finished dosage form output device.
Optionally, preparation production system further includes the first, second monitoring verifying device and real time monitoring apparatus.First monitoring
Verifying device is set between the first pressure stabilizing feeding device and high mixture ratio mixing device, and the second monitoring verifying device is set to second
Between pressure stabilizing feeding device and high mixture ratio mixing device and real time monitoring apparatus is set to finished dosage form output device and matches with height
Than between mixing device.
In short, the high mixture ratio mixing device provided in an embodiment of the present invention for producing preparation and the preparation life using it
The technical effects such as there is high mixture ratio uniformly mix, quickly mix production system, low facility space and low cost.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to make one simply to introduce, it should be apparent that, the accompanying drawings in the following description is the present invention
Some embodiments for those of ordinary skill in the art without creative efforts, can also basis
These attached drawings obtain other attached drawings.
Fig. 1 is the function block schematic diagram of the preparation production system of the embodiment of the present invention.
Fig. 2 is the diagrammatic cross-sectional side elevation of the high mixture ratio mixing device of the embodiment of the present invention.
Fig. 3 A is the section schematic top view of the high mixture ratio mixing device of the embodiment of the present invention.
Fig. 3 B is the section schematic top view of the high mixture ratio mixing device of another embodiment of the present invention.
Fig. 3 C is the multiple micropores of atomization/trickle agent amount control device of the high mixture ratio mixing device of the embodiment of the present invention
The schematic side view of structure.
Fig. 4 A be the reaction chamber of the high mixture ratio mixing device of the embodiment of the present invention liquid agent not Hun He the side view of wall surface show
It is intended to.
Fig. 4 B is that the liquid agent of the reaction chamber of the high mixture ratio mixing device of another embodiment of the present invention Hun He not wall surface
Schematic side view.
Fig. 4 C is that the liquid agent of the reaction chamber of the high mixture ratio mixing device of another embodiment of the invention Hun He not wall surface
Schematic side view.
Fig. 4 D is that the liquid agent of the reaction chamber of the high mixture ratio mixing device of further embodiment of the present invention Hun He not wall surface
Diagrammatic cross-sectional side elevation.
Fig. 5 A is the diagrammatic cross-sectional side elevation of the end mixer of the high mixture ratio mixing device of the embodiment of the present invention.
Fig. 5 B is the diagrammatic cross-sectional side elevation of the end mixer of the high mixture ratio mixing device of another embodiment of the present invention.
Wherein, 1- preparation production system；First to fourth dose of 101~104- is not；111~114- pressure stabilizing feeding device；131
~134- monitoring verifying device；14,2- high mixture ratio mixing device；15- real time monitoring apparatus；16- finished dosage form output device；
201~203- health-monitoring installation；211~213- feeding pipe；221~223- atomization/trickle agent amount control device；2211,
2221,2231- microcellular structure；22311- micropore；23- reaction chamber；231- liquid agent does not mix wall surface；2311~2314- drainage
Road pattern；24- end mixer；241- fan leaf；242- moving component.
Specific embodiment
In order to make the object, technical scheme and advantages of the embodiment of the invention clearer, below in conjunction with the embodiment of the present invention
In attached drawing, the technical scheme in the embodiment of the invention is clearly and completely described, it is clear that described embodiment is
A part of the embodiment of the present invention, instead of all the embodiments.Based on the embodiments of the present invention, those of ordinary skill in the art
Every other embodiment obtained without making creative work, shall fall within the protection scope of the present invention.
Carry out the specific embodiment that the present invention will be described in detail below in conjunction with attached drawing.Identical symbology has identical or class
Like the component or device of function.It is electrically connected or electrical connection indicates directly or indirectly to be electrically connected.
The embodiment of the present invention provides a kind of high mixture ratio mixing device for producing preparation and the preparation production system using it
It unites, after the decentralized processing that multiple and different liquid agents is not atomized or is made fine, and the liquid that will be atomized or be made fine
The liquid agent that agent is not sprayed at reaction chamber does not mix wall surface, with the mixing in the face of progress and face, to realize that high mixture ratio uniformly mixes
With quickly mix etc. technical effects.Through the above-mentioned practice, mixing only needs in a confined space to complete, therefore,
Above-mentioned high mixture ratio mixing device and the preparation production system for using it have the technical effects such as low facility space and low cost, and
It is readily able to move the minimum distance at product processing procedure end by high mixture ratio mixing device and using its preparation production system, with section
Save factory service facility and operating cost.In addition, above-mentioned high mixture ratio mixing device can be 300 milliliters (or even 300 milliliters or less)
Miniaturized devices or up to a few tons of large-scale plant, and it is all non-to limit for the mixed other type of liquid agent and volume etc.
The present invention.
The high mixture ratio mixing device of the embodiment of the present invention and it can achieve high mixture ratio using its preparation production system and mix.
In response to the reaction time that liquid agent does not mix, certain liquid agents can not incorporate a large amount of liquid agent rapidly only with minor proportions
In not, to reach optimal dose of other hybrid reaction efficiency.For example, liquid agent other proportion can be up to 1:10 to 1:
500, but invention is not limited thereto system.Above-mentioned high mixture ratio mixing device and it can be used for using its preparation production system various
In field, such as: the allotment of chemical liquid (chemical) and lapping liquid (slurry) in semiconductor industry or opto-electronics, symbol
Close the allotment of the uniquenessization special medical medication of functional medicine framework, the allotment of general curative medication, the chemistry that need to be reacted in short term
The allotment of product (such as: KOH), the allotment of other chemical substances, the accurate allotment for being mixed into condiment or nutritional supplement of food reconciliation.
For generally, the high mixture ratio mixing device of the embodiment of the present invention is that one kind mostly goes out (multiple-input into one
And single-output) mixing device, can be under short distance mixing space requirement, to reach the accurate mixing of high mixture ratio
Purpose.High mixture ratio mixing device includes multiple feeding pipes, multiple atomizations/trickle agent amount control device and reaction chamber, wherein
Multiple pan feeding pipings are correspondingly connected with multiple atomizations/trickle agent amount control device, and reaction chamber accommodate multiple feeding pipes with it is multiple
Atomization/trickle agent amount control device.The multiple and different liquid agents of multiple feeding pipes receptions are other, and multiple atomizations/imperceptibility dosage
The decentralized processing that different liquid agents are not atomized or are made fine by control device, and the different liquid agents that will be atomized or be made fine
The liquid agent for not being sprayed at reaction chamber does not mix wall surface, so that different liquid agents are not mixed, wherein liquid agent does not mix wall
Face can be shiny surface or Non-smooth surface face.
Then, this case Fig. 1 is please referred to, Fig. 1 is the function block schematic diagram of the preparation production system of the embodiment of the present invention.System
Agent production system 1 includes pressure stabilizing feeding device 111~114, monitoring verifying device 131~134, high mixture ratio mixing device 14, reality
When monitoring device 15 and finished dosage form output device 16, wherein pressure stabilizing feeding device 111~114 is separately connected monitoring verifying device
131~134, monitoring verifying device 131~134 connects high mixture ratio mixing device 14, and high mixture ratio mixing device 14 connects real-time prison
It controls device 15 and real time monitoring apparatus 15 connects finished dosage form output device 16.
Pressure stabilizing feeding device 111~114 receives first to fourth dose other 101~104 of predominantly liquid respectively, wherein leading
Will for liquid first to fourth dose other 101~104 of type there is no any restrictions, be, for example, semiconductor grinding liquid, change
It learns liquid, mix granular pattern liquid (solid-contained liquid) or other liquid that need to be reconciled.Pressure stabilizing pan feeding
Device 111~114 can stablize the pressure in pipeline, and the pulse wave of buffering liquid, make first to fourth dose other 101~104 in
There is stable flow and flow velocity etc. in transmission process.
Monitoring verifying device 131~134 is to separately verify whether first to fourth dose other 101~104 of quality meets
Process requirements, to be confirmed whether to send respectively first to fourth dose other 101~104 into high mixture ratio mixing device 14.Monitoring
131~134 pairs first to fourth dose other 101~104 of device of detection product item of verifying may include pH value, concentration, distribution of particles,
At least one of granular size, specific gravity, temperature, density, electrical conductivity, pressure, flow and weight, and accordingly, monitoring verifying dress
Setting 131~134 includes pH meter, densimeter, distribution of particles meter, particle size meter, densimeter, thermometer, densitometer, conduction
Spend at least one of meter, pressure gauge, flowmeter and poidometer.
High mixture ratio mixing device 14 can carry out mixing preparation according to different proportion for first to fourth dose other 101~104,
The liquid agent that first to fourth dose other 101~104 is sprayed on its reaction chamber wall surface is not mixed into mainly by tiny water mist mode
To be mixed.Preferably, more end mixer can be additionally arranged in its reaction chamber end in high mixture ratio mixing device 14, with into
The secondary mixing of row.The details of high mixture ratio mixing device 14 will be described later, and not repeat first in this.
Real time monitoring apparatus 15 receives the preparation that the mixing of high mixture ratio mixing device 14 generates, and confirms whether preparation meets matter
Amount require, also that is, to preparation carry out characteristics of liquids verifying with detect to determine whether that preparation can be sent out.Real time monitoring apparatus
The detection product item of 15 pairs of preparations may include pH value, concentration, distribution of particles, granular size, specific gravity, temperature, density, electrical conductivity,
At least one of pressure, flow and weight, and accordingly, real time monitoring apparatus 15 includes pH meter, densimeter, distribution of particles
At least one of meter, particle size meter, densimeter, thermometer, densitometer, electrical conductivity meter, pressure gauge, flowmeter and poidometer.
Finished dosage form output device 16 receives the preparation that real time monitoring apparatus 15 exports, and can receive the supplied materials of user's end
It is required that instruction, to require the dosage required in instruction according to supplied materials, and considers that the pressure of pipeline transportation is stable and controls with pulse wave, come
The dosage of respective volume is provided to user terminal.
It, just can be by first after pressure stabilizing feeding device 111~114 can first stablize pressure in each pipeline in operation workflow
It is sent respectively to the 4th dose other 101~104 to monitoring and verifies device 131~134.If pressure is uneven, verifying assessment might have
Disabled status, and the proportion after influence when first to fourth dose other 101~104 mixing calculates and supply.In addition, having mixed
At preparation output before, real time monitoring apparatus 15 in addition to supervision preparation quality other than, moreover it is possible to control pressure stabilizing feeding device 111~
114, monitoring verifying device 131~134, high mixture ratio mixing device 14 and finished dosage form output device 16, such as to be carried out
The instruction such as data collection, operation scheduling, safe shutdown.In addition to this, preparation production system 1 is only that one of which of the invention is real
Example is applied, in the case where the quality of the pharmaceutical preparations less requires, monitoring verifying device 131~134 and real time monitoring apparatus 15 are possible to quilt
It removes, and it is not set in preparation production system 1.
Then, the embodiment of high mixture ratio mixing device 14 is further explained.Referring to figure 2., Fig. 2 is implementation of the present invention
The section of the high mixture ratio mixing device of example surveys view schematic diagram.2 system of high mixture ratio mixing device of Fig. 2 by input three agent it is other for into
Row explanation, 14 system of high mixture ratio mixing device of Fig. 1 input four agent not (first to fourth dose other 101~104), so match through height
Than the explanation of mixing device 2, the technical field of the invention has usually intellectual, can know that four agent of input are other high
How proportion mixing device 14 is realized.
In Fig. 2, high mixture ratio mixing device 2 include health-monitoring installation 201~203, feeding pipe 211~213, atomization/
Trickle agent amount control device 221~223, reaction chamber 23 and end mixer 24.201~203 system of health-monitoring installation difference
The first end and atomization/221~223 system of trickle agent amount control device for being connected to feeding pipe 211~213 are separately connected
Feeding pipe 211~213 second end.Feeding pipe 211~213 is that layered configuration (is with same for example, from the point of view of by top view
The vertical dislocation mode layered configuration outward of heart circle, it is other with the liquid agent being isolated in feeding pipe 211~213, referring to Fig. 3 A and figure
3B).The end of reaction chamber 23 is then arranged in end mixer 24.
201~203 system of health-monitoring installation is other to receive different liquid agents, and can adjust feed dosage and pressure
Its received liquid agent is not separately input into feeding pipe 211~213 by power.From Fig. 2, Fig. 3 A and Fig. 3 B, feeding pipe 211~
213 in be on vertical distribution face for it is multiple dislocation configuration pipelines.In addition, the position of the first end of feeding pipe 211~213 can
In the same side region of reaction chamber 23 or different side regions.Subsidiary one is mentioned that, embodiment in some cases, dosage control
Device 201~203 processed can be inessential component, merely be controlled by atomization/trickle agent amount control device 221~223
Feed.
As shown in Figure 3A, interlock in being on horizontal distribution face by horizontal parallel for feeding pipe 211~213, and feeding pipe 211~
It the position of the first end of 213 feeding pipe 211~213 can be in the same side region of reaction chamber 23.As shown in Figure 3B, pan feeding
Pipe 211~213 is in being that horizontal parallel is folded on horizontal distribution face, so that the of the feeding pipe 211~213 of feeding pipe 211~213
The position of one end can in the different side regions of reaction chamber 23, therefore, regardless of feeding pipe 211~213 consistency with
Minimum space configuration, to reach the configuration of the caliber less confined space of feeding pipe 211~213.Briefly, feeding pipe 211
~213 are tied up in confined space and are configured in a manner of multilayer sleeve to form the other runner of multiple liquid agents and create a control
Space, so as to be fed with certain pressure, wherein the arrow direction in Fig. 2 is expressed as the other pan feeding side of liquid agent
To.
The liquid agent that atomization/221~223 system of trickle agent amount control device receives feeding pipe 211~213 is other, and to entering
The decentralized processing (also that is, by liquid agent other water mist system smallization) that the liquid agent of expects pipe 211~213 is not atomized or is made fine,
And the liquid agent of atomization or imperceptibility is not sprayed at the liquid agent of reaction chamber 23 Hun He wall surface 231.In this embodiment,
Atomization/trickle agent amount control device 221~223 side system is configured with multiple microcellular structures 2211,2221,2231.Micropore
Structure 2211,2221,2231 and its multiple micropore, which can be, is positioned apart from that (such as Fig. 3 C, microcellular structure 2231 include multiple
Every the micropore of setting, and 2231 system interval of multiple microcellular structures is arranged) or non-gap be arranged, and the ruler diameter of micropore can be according to liquid
The other characteristic of state agent and change.In addition, in order to reach finer atomization feed effect, in addition to by microcellular structure 2211,
2221,2231 outer, atomization/trickle agent amount control device 221~223 is configured according to the other characteristic of liquid agent with its multiple micropore
Ultrasonic atomising device can also be collocated with.
Optionally, atomization/trickle agent amount control device 221~223 can be the feed dress of pneumatic continuous pressure control
It sets, is to pressurize through nitrogen or Pu is helped to mention incessantly by the feed-type that the liquid agent of atomization or imperceptibility does not spray away
For pressure, to be fed.In addition, the feed precision of this control mode can be by pneumatically helping Pu, program-controlled reaching jointly.
Optionally, atomization/trickle agent amount control device 221~223 can be the charging gear of quantitative batch feed,
It by the feed-type that the liquid agent of atomization or imperceptibility does not spray away is can be through confined space is created, with the side of extruding
Formula carries out batch continous way feed.The feed precision of this control mode can squeeze dress by the creation of confined space, machine power
It sets and reaches jointly.
To sum up, atomization/trickle agent amount control device 221~223 implementation is non-to limit the present invention, only
If can the device of decentralized processing that is not atomized or is made fine of the liquid agent to feeding pipe 211~213 or equipment be ok
For realizing the present invention.
The liquid agent of reaction chamber 23 not Hun He wall surface 231 as the liquid agent for being input to high mixture ratio mixing device 14 it is other just
Secondary mixed zone, wherein reaction chamber 23 can be the container of cylindrical container or other shapes, and invention is not limited thereto system.Each liquid
State agent is not sprayed on liquid agent equably in a manner of water mist Hun He not be on wall surface 231, and is mixed in a manner of face by face,
Therefore in high mixture ratio, each liquid agent still uniformly can not mixed and be reacted in the short time.Then, each liquid agent is other tiny
Water mist, set become larger droplet shape, and the wall surface that reaction chamber is followed after confluence flows into end mixer and carries out secondary mixing.
Liquid agent not Hun He wall surface 231 can be shiny surface, material can be thought as polytetrafluoroethylene (PTFE) (PTFE), other fluorine
Cellulosic material or other anticorrosive, high temperature with the material of good repellency, alternatively, liquid agent not Hun He wall surface 231 be coated with or
The material for being coated with polytetrafluoroethylene (PTFE) (PTFE), other fluorine element materials or other anticorrosive, high temperature and there is good repellency.By
In the relationship of repellency, each liquid agent be not sprayed onto liquid agent not Hun He wall surface 231 mix after, can in a manner of natural route,
The end mixer 24 for being rapidly drained to 23 end of reaction chamber and being connected.Shiny surface can be seamless shiny surface or seamed
Shiny surface, and seamed shiny surface more can have at least one sluice way pattern.
Optionally, when liquid agent not Hun He wall surface 231 be seamed shiny surface when, can have the drainage of different patterns
Road pattern 2311~2314 (as shown in Fig. 4 A to Fig. 4 D) so that each liquid agent not in liquid agent not Hun He wall surface 231 mix after,
Through the guidance of sluice way pattern 2311~2314, liquid agent is not drained to the end that 23 end of reaction chamber is connected rapidly
Mixer 24.In Fig. 4 A to Fig. 4 D, sluice way pattern 2311~2314 respectively forms through processing or positive quarter mode more
Angular (such as: triangle, quadrangle, pentagon or hexagon) salient point pattern, circle (such as: circular or ellipse) salient point
Pattern, strip convex pattern and undaform curved surface pattern, but invention is not limited thereto system.
Sluice way pattern 2311~2314 can uniformly or non-uniformly be arranged in liquid agent Hun He not wall surface 231.In addition,
Between sluice way pattern 2311~2314 can also each other any combination be arranged in liquid agent Hun He not be on wall surface 231, for example, will
Sluice way pattern 2311 and 2312 is alternately arranged on liquid agent and does not mix on wall surface 231.Subsidiary one is mentioned that, according to different liquid
The other type of state agent can design different sluice way patterns, to increase mixed effect and reduce the reaction time.
It should also be noted that liquid agent not Hun He wall surface 231 also can be with right and wrong shiny surface.According to the other class of different liquid agents
Type, liquid agent not Hun He wall surface 231 to can choose be shiny surface or Non-smooth surface face, to increase mixing efficiency.In addition to this, non-light
Sliding surface can be seamless Non-smooth surface face or seamed Non-smooth surface face, and seamed Non-smooth surface face more can have as previously described
At least one sluice way pattern.In short, liquid agent not Hun He the design method of wall surface 231 be not intended to limit the invention,
It is related with the requirement of mixing efficiency to the other type of liquid agent.Subsidiary one is mentioned that, other for most different liquid agents
Mixing, usually has preferable mixing efficiency with the design of seamed shiny surface.
24 system of end mixer is used to carry out secondary mixing, to promote mixed effect.After carrying out second mixing,
End mixer 24 can send mixed preparation to real time monitoring apparatus or finished dosage form output device.Subsidiary one is mentioned that,
In embodiment under some cases, end mixer 24 can be inessential component.It is solid that end mixer 24 can be non-powered
The mixer (such as Fig. 5 A) of sizing or the mixer (such as Fig. 5 B) of dynamic type.
In Fig. 5 A, end mixer 24 is static mixer (static mixer), does not have moving component, is to hand over
The fan leaf 241 of shift mixing forms, for liquid agent not by when formed and be vortexed, to carry out secondary mixing, wherein static
Blender is not necessarily to Power Component, therefore has lower cost.In Fig. 5 B, end mixer 24 is to include 241 (example of moving component
Such as, break bar component) power type mixer, moving component 241 can with axle center rotate or stir, can by liquid agent not in solid-state
Particle carries out liquid agitation mixing, to promote mixed effect, generates quality more preferably preparation.
In summary, the high mixture ratio provided in an embodiment of the present invention for producing preparation is mixed compared to well-known technique
The technical effect for expecting device and the preparation production system using it, is to be described as follows:
(1) well-known technique using by the other single-point of multiple and different liquid agents because mixing, therefore is unable to reach large dosage and low dose
The uniformity that does not mix of liquid agent, review the high mixture ratio mixing device provided in an embodiment of the present invention for producing preparation and make
It is that the liquid agent that multiple and different liquid agents of atomization or imperceptibility are not sprayed at reaction chamber Hun not with its preparation production system
Face of combining harmoniously carries out the mixing in face and face, therefore can reach the liquid agent uniformity that does not mix of the large dosage with low dose；
(2) well-known technique is not because before the other mixing of each liquid agent, carrying out good decentralized processing, therefore needs to stir for a long time
Mix, review it is provided in an embodiment of the present invention for produce preparation high mixture ratio mixing device and using its preparation production system in
Each liquid agent in mixing, does not carry out decentralized processing by the liquid agent that is atomized or is made fine otherwise, therefore can ensure that mixing
Uniformity, further optionally, the end of the reaction chamber of above-mentioned high mixture ratio mixing device is also provided with end mixer,
To carry out secondary mixing, to obtain preferable mixed effect in a short time；And
(3) well-known technique needs larger space to carry out mixing stirring, and because mixing efficiency is poor, therefore needs multiple units simultaneously
Running, even, well-known technique may need more units and pipeline because pre-treatment area and temporary storage must be arranged, and change
Yan Zhi, well-known technique have space requirement is big, build it is at high cost with move the problems such as being not easy (or can not move), review of the invention real
The high mixture ratio mixing device for being used to produce preparation of example offer is provided and uses its preparation production system can be in a confined space
The different other mixing of liquid agent are completed, and there is high mixing efficiency and high mixing velocity, therefore pre-treatment area need not be set, to subtract
Few unit setting quantity, setup cost and occupied space, and above-mentioned high mixture ratio mixing device and the preparation production system using it
It can be miniaturized, move or carry to achieve the purpose that be easy to.
Certainly, the present invention can also have other various embodiments, without deviating from the spirit and substance of the present invention, ripe
Various corresponding changes and modifications, but these corresponding changes and modifications can be made according to the present invention by knowing those skilled in the art
It all should belong to the protection scope of the claims in the present invention.
Claims (10)
1. a kind of high mixture ratio mixing device, which is characterized in that the high mixture ratio mixing device includes:
First feeding pipe, it is other to the first liquid agent of the receipts；
Second feeding pipe is to be configured in a manner of multilayer sleeve with first feeding pipe, other to receive the second liquid agent；
First atomization/trickle agent amount control device is set to the end of first feeding pipe, to first liquid
The decentralized processing that agent is not atomized or is made fine；
Second atomization/trickle agent amount control device is set to the end of second feeding pipe, to second liquid
The decentralized processing that agent is not atomized or is made fine；And
Reaction chamber, to accommodate first and second described feeding pipe, described first and second be atomized/be made fine dosage control dress
Set, there is liquid agent not mix wall surface, wherein described first with second atomization/trickle agent amount control device to by mist
Change or first and second described liquid agent of imperceptibility be not sprayed at the liquid agent and do not mix wall surface, with carry out described first with
The other mixing of second liquid agent.
2. high mixture ratio mixing device according to claim 1, which is characterized in that the high mixture ratio mixing device further includes:
First health-monitoring installation is set to another end of first feeding pipe, to receive first liquid agent
Not, and the other feed dosage of first liquid agent and pressure are adjusted, first liquid agent is not fed through described first
Feeding pipe；And
Second health-monitoring installation is set to another end of second feeding pipe, to receive second liquid agent
Not, and the other feed dosage of second liquid agent and pressure are adjusted, second liquid agent is not fed through described second
Feeding pipe.
3. high mixture ratio mixing device according to claim 1, which is characterized in that the high mixture ratio mixing device further includes:
End mixer is the end for being set to the reaction chamber, to mix from the liquid agent not Hun He wall surface flow down
First and second described liquid agent is other.
4. high mixture ratio mixing device according to claim 1, wherein the liquid agent not Hun He wall surface be shiny surface.
5. high mixture ratio mixing device according to claim 1, which is characterized in that wherein the liquid agent Hun He not wall surface tool
There is an at least sluice way pattern.
6. high mixture ratio mixing device according to claim 1, which is characterized in that wherein first and second described feeding pipe in
It is folded on horizontal distribution face for horizontal parallel or horizontal parallel is interlocked.
7. high mixture ratio mixing device according to claim 1, which is characterized in that first and second atomization described in wherein/thin
The side of macro health-monitoring installation is respectively configured with an at least microcellular structure.
8. high mixture ratio mixing device according to claim 1, which is characterized in that wherein the shiny surface is an anticorrosive reprimand
Water-based material or the shiny surface are coated with or are coated with the anticorrosive water repellent material.
9. a kind of preparation production system, which is characterized in that the preparation production system includes:
High mixture ratio mixing device as described in claim 1~8 one of them；
First pressure stabilizing feeding device connects the high mixture ratio mixing device；
Second pressure stabilizing feeding device connects the high mixture ratio mixing device；And
Finished dosage form output device connects the high mixture ratio mixing device.
10. preparation production system according to claim 9, which is characterized in that the preparation production system further includes:
First monitoring verifying device, is set between the first pressure stabilizing feeding device and the high mixture ratio mixing device；
Second monitoring verifying device, is set between the second pressure stabilizing feeding device and the high mixture ratio mixing device；And
Real time monitoring apparatus is set between the finished dosage form output device and the high mixture ratio mixing device.
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| CN201910129189.7A CN109876727B (en) | 2019-02-21 | 2019-02-21 | High ratio compounding device and use its preparation production system |
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