CN109856923A - A kind of image quality compensation device and method and a kind of optical system - Google Patents
A kind of image quality compensation device and method and a kind of optical system Download PDFInfo
- Publication number
- CN109856923A CN109856923A CN201711267165.5A CN201711267165A CN109856923A CN 109856923 A CN109856923 A CN 109856923A CN 201711267165 A CN201711267165 A CN 201711267165A CN 109856923 A CN109856923 A CN 109856923A
- Authority
- CN
- China
- Prior art keywords
- image quality
- compensation device
- quality compensation
- lens barrel
- force application
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Abstract
The present invention provides a kind of image quality compensation device, including lens barrel, force application mechanism and rotating mechanism, the force application mechanism applies pressure to the lens barrel, the eyeglass in the lens barrel is set to generate deformation, the lens barrel is located on the rotating mechanism, it is rotated with the rotation of rotating mechanism, image quality compensation device and method and optical system provided by the present invention, the rotation and deformation of eyeglass can be passed through, realize the compensation of image quality, and it can compensate for a variety of image qualities, reduce the difficulty of image quality compensation, while also reducing cost.
Description
Technical field
The present invention relates to semiconductor integrated circuit manufacturing technology field more particularly to a kind of image quality compensation device and method and
A kind of optical system.
Background technique
In current technical field of semiconductor encapsulation, the lithographic objective for manufacturing IC chip usually has high score
The preparation of resolution, big depth of focus to realize highly integrated chip.Meanwhile the image quality of exposure area meets when to meet chip preparation
It is required that the optical imaging system of projection exposure is then needed to have good image quality compensation ability.To meet in product technology more
High requirement then needs the characteristic size for constantly reducing chip, thus also proposed more to the image quality of optical system
Harsh requirement.Therefore, the imaging image quality quality for improving optical imaging system becomes the key of the preparation good chip of comprehensive performance
Factor.
During photoetching projection objective lens actual exposure, due to the rigging error of eyeglass, environment unstability, lighting system
Heat is introduced, eyeglass face type will receive the influence of ambient enviroment in exposure process, and can occur a certain amount of irreversible
Variation, these factors will cause final image quality and reduce, and influence the quality of the characteristic size of chip.
In the prior art, in photoetching projection objective lens exposure process, the compensation of image quality is realized by changing eyeglass face type
Scheme, but the program can only compensate single image quality.Or by rotation thermal compensation group and flat sheet combination angle generate it is different
Face type compensates fuel factor, but the processing of special lens face type and the detection difficulty height of thermal compensation group, and the cost is higher.
Summary of the invention
The purpose of the present invention is to provide a germplasm compensation devices, there is compensation list to solve existing image quality compensation scheme
One, the problem of difficulty is larger, higher cost.
The present invention provides a kind of image quality compensation device, including lens barrel, force application mechanism and rotating mechanism, the force application mechanism pair
The lens barrel applies pressure, so that the eyeglass in the lens barrel is generated deformation, the lens barrel is located on the rotating mechanism, with rotation
The rotation of mechanism and rotate.
Optionally, the force application mechanism is located on the rotating mechanism, rotates with the rotation of the rotating mechanism.
Optionally, the image quality compensation device further includes microscope base, and the microscope base is located at the surrounding of the lens barrel.
Optionally, the rotating mechanism includes bearing, rotary shaft, driving gear and motor, and the motor connects the rotation
Gear is driven described in shaft, the rotation axis connection, the driving gear connects the microscope base, and the bearing connects the mirror
Seat.
Optionally, the force application mechanism is laterally embedded into the microscope base, and the force application mechanism applies the lens barrel horizontal
To active force.
Optionally, the motor driven rotary shaft rotation, the rotary shaft drive the driving gear rotation, the driving
Gear drives the microscope base, lens barrel and force application mechanism to rotate together.
Optionally, the force application mechanism is longitudinally embedded in the microscope base, and the force application mechanism applies the lens barrel vertical
To active force.
Optionally, the force application mechanism is the force application mechanism with Hooks coupling universal coupling.
Optionally, the image quality compensation device includes flexible block, and the flexible block is located at the lower section of the lens barrel, undertakes mirror
The gravity of piece.
Optionally, the motor driven rotary shaft rotation, the rotary shaft drive the driving gear rotation, the driving
Gear drives the microscope base and force application mechanism to rotate together.
The present invention also provides a kind of optical system, including the image quality compensation device adjusts an aberration item group and realizes picture
Matter compensation, the aberration item group are two kinds of aberration items with certain rotation angular relationship.
Optionally, the image quality compensation device is several, several described image quality compensation devices adjust multiple pictures
Poor item group.
Also a kind of method for compensating photoetching projection objective lens image quality of the present invention, comprising: the lens barrel is applied by force application mechanism
Plus-pressure makes the eyeglass in the lens barrel generate deformation, the compensation for realizing image quality is rotated by rotating mechanism.
Image quality compensation device and method provided by the present invention and the optical system comprising the image quality compensation device, can be with
By the rotation and deformation of eyeglass, the compensation of image quality is realized, and can compensate for a variety of image qualities, reduce the difficulty of image quality compensation
Degree, while also reducing cost.
Detailed description of the invention
Fig. 1 is the structure chart of image quality compensation device provided by the embodiment of the present invention 1；
Fig. 2 is the sectional view of image quality compensation device provided by the embodiment of the present invention 1；
Fig. 3 is zernike polynomial arrangement figure；
Fig. 4 is the fitting face type distribution map of Z6；
Fig. 5 is the fitting face type distribution map of Z6；
Fig. 6 is the structure chart of photoetching projection objective lens；
Fig. 7 is the structure chart of image quality compensation device provided by the embodiment of the present invention 2；
Fig. 8 is the sectional view of image quality compensation device provided by the embodiment of the present invention 2；
Fig. 9 is the schematic diagram of optical system provided by the present invention implements 3；
Figure 10 is the fitting face type distribution map of Z12；
Figure 11 is the fitting face type distribution map of Z13
Figure label:
The first eyeglass of 1-；The second eyeglass of 2-；3- third eyeglass；The 4th eyeglass of 4-；The 5th eyeglass of 5-；6- movable lens；8-
Lens barrel；9- rotating mechanism；10- force application mechanism；11- bearing；12- rotary shaft；13- drives gear；14- motor；15- microscope base；16-
Flexible block；20- light source；21- mask plate；22- optical system；23- silicon chip surface；24- the first image quality compensation device；25- second
Image quality compensation device.
Specific embodiment
Image quality compensation device proposed by the present invention is described in further detail below in conjunction with the drawings and specific embodiments.Root
According to following explanation and claims, advantages and features of the invention will be become apparent from.It should be noted that attached drawing be all made of it is very simple
The form of change and use non-accurate ratio, only for the purpose of facilitating and clarifying the purpose of the embodiments of the invention.
Existing image quality compensation scheme has that compensation is single, difficulty is larger, higher cost, present inventor
By long-term experiment and research, a kind of novel image quality compensation device is invented, has solved the above problem.
The present invention provides a kind of image quality compensation device, including lens barrel, force application mechanism and rotating mechanism, and the lens barrel is located at institute
It states on rotating mechanism, is rotated with the rotation of rotating mechanism, the force application mechanism is located on the rotating mechanism, with rotating mechanism
Rotation and rotate, the force application mechanism applies pressure to the lens barrel, and eyeglass in the lens barrel is made to generate deformation.
Embodiment one
As shown in Figure 1, the image quality compensation device includes lens barrel 8, rotating mechanism 9 and force application mechanism 10, in the lens barrel
Containing eyeglass 7, the eyeglass 7 is movable lens, and shown lens barrel 8 is located on the rotating mechanism 9, with the rotating mechanism 9
Rotation and rotate, the force application mechanism 10 is located on rotating mechanism 9, the rotation of rotating mechanism 9 described in keyed and rotate, it is described
Force application mechanism 10 applies pressure to the lens barrel 8, deforms the lens barrel 8, and the lens barrel further transfers the pressure to eyeglass 7
On, so that 7 upper and lower surface of eyeglass is generated deformation.
Fig. 2 is the sectional view of the image quality compensation device, referring to FIG. 2, the image quality compensation device further include microscope base 15,
The microscope base 15 is located at the surrounding of the eyeglass 7.The rotating mechanism 9 includes bearing 11, rotary shaft 12, driving gear 13 and electricity
Machine 14, rotating mechanism described in this implementation are bearing class rotating mechanism.The bearing 11 is connected with microscope base 15, the motor 14
It is connect with rotary shaft 12, the rotary shaft 12 is connected with the driving gear 13.The force application mechanism 10 is laterally embedded into mirror
In seat 15, it is connected with the lens barrel 8, the force application mechanism 10 applies lateral pressure (in figure shown in arrow just to lens barrel 8
To), so that eyeglass 7 is generated deformation, at the same time, the motor 14 drives rotary shaft 12 to rotate, and the rotary shaft 12 drives driving
Gear 13 rotates, and then rotates microscope base 15, lens barrel 8 and force application mechanism 10 together, to meet the change of eyeglass stress surface type
Rotation is realized simultaneously.
The principle of the device of image quality compensation proposed by the invention is realized based on the correlation between image quality,
Zernike (Ze Nike) multinomial can be used to be fitted the surface face type of optical element, mainly utilize and exist between two kinds of aberrations
The fixed relationship in angle is rotated, the change of eyeglass face type and the rotation of eyeglass are carried out.Zernike polynomial is an infinite number
The multinomial complete set of amount, there are two variable R and θ for tool, and wherein R indicates that radius, θ indicate phase angle, and Fig. 3 lists a part
Zernike polynomial, it is subsequent in order to indicate convenient, the formula of the first row is represented with Z1, Z2 represents the formula of the second row, with such
It pushes away, Z16 indicates the formula of the 16th row.Since zernike polynomial is the common knowledge of optical field, so about Ze Nikeduo
The meaning of each formula of Xiang Shizhong is not also explaining more here, and since zernike polynomial is inexhaustible number, here
It can not enumerate completely, Fig. 3 is only using this 16 multinomials as representative, it will be appreciated by persons skilled in the art that other do not arrange
The part of act is also in protection scope of the present invention.Explanation is also needed, Ze Nike's cited by the present invention is polynomial
Put in order to be currently widely used and put in order, but be not excluded for it is some other put in order, those skilled in the art
It is understood that other zernike polynomials to put in order are also in protection scope of the present invention.
Fig. 4 and Fig. 5 are please referred to, Fig. 4 is the fitting face type distribution map of Z5, and Fig. 5 is the area image distribution map of Z6, passes through figure
The comparison of 4 and Fig. 5 is it is found that Z5 and Z6 differs 45 degree of rotation angles.If the face type of eyeglass is Z5 when design, but when practical application
Be Z6 effect it is more significant, at this moment can realize the compensation of Z6 by the rotation and deformation of eyeglass.
Table 1 lists the angular relationship between some zernike terms, and Fig. 6 shows a part of photoetching projection objective lens,
During practical lithography projection exposure, the first eyeglass 1, the second eyeglass 2, third eyeglass 3, the 4th eyeglass 4, the 5th eyeglass 5 are all
It is fixed lens, eyeglass 7 is movable lens, and the face type of the eyeglass 7 can change, to realize compensation image quality.This implementation
Example only lists one of actual production process situation, it will be appreciated by persons skilled in the art that can be according to practical need
It asks and carrys out flexible choice eyeglass to compensate image quality.
Angular relationship between 1 zernike term of table
| Zernike term | Difference angle |
| Z5 and Z6 | 45° |
| Z7 and Z8 | 90° |
| Z10 and Z11 | 30° |
| Z12 and Z13 | 45° |
| … | … |
Embodiment two
Referring to FIG. 7, the image quality compensation device includes lens barrel 8, rotating mechanism 9 and force application mechanism 10, in the lens barrel
Containing eyeglass 7, shown lens barrel 8 is located on the rotating mechanism 9, rotates, the force with the rotation of the rotating mechanism 9
Mechanism 10 is located on rotating mechanism 9, the rotation of rotating mechanism 9 described in keyed and rotate, the force application mechanism 10 is to the lens barrel 8
Apply pressure, deform the lens barrel 8, the lens barrel further transfers the pressure on eyeglass 7, produces 7 upper and lower surface of eyeglass
Raw deformation.
With continued reference to Fig. 8, the image quality compensation device further includes that microscope base 15, the microscope base 15 are located at the four of the eyeglass 7
Week.There is flexibility fast 16, the flexible block 16 can undertake the gravity of eyeglass 7 below the lens barrel 8.The rotating mechanism 9 wraps
Bearing 11, rotary shaft 12, driving gear 13 and motor 14 are included, rotating mechanism described in this implementation is bearing class rotating mechanism.
The bearing 11 is connected with microscope base 15, and the motor 14 connect with rotary shaft 12, the rotary shaft 12 and the driving gear 13
It is connected.The force application mechanism 10 is longitudinal to be embedded in the microscope base 15, is connected with the lens barrel 8, described in this example
Force application mechanism is preferably the force application mechanism for having Hooks coupling universal coupling, and the force application mechanism 10 applies longitudinal pressure to lens barrel 8
(method shown in arrow in figure) is stretched or is squeezed to the lens barrel 8, so that making to generate makes eyeglass 7 generate deformation, and
The flexible block can undertake the gravity of eyeglass 7, be fixed on eyeglass on certain position.At the same time, the driving of motor 14 rotation
Shaft 12 rotates, and the rotary shaft 12 drives driving gear 13 to rotate, and then rotates microscope base 15, force application mechanism 10 together, from
And the eyeglass that rotation stress generates special deformation is generated, it is final to realize compensation image quality.
The identical principle that the present embodiment and embodiment 1 use, no longer does extra elaboration here.
Embodiment three
Correspondingly, the optical system includes image quality compensation device, the image quality the present invention also provides a kind of optical system
Compensation device adjusts an aberration item group and realizes image quality compensation, and the aberration item group is two kinds with certain rotation angular relationship
Aberration item or a variety of aberration items, the present embodiment using two kinds of aberration items as an aberration item group for be illustrated.The image quality
Compensation device is image quality compensation device provided by any one of above-described embodiment.The difference Xiang Weiwei zernike polynomial
In any one, such as Z5, Z6 or Z7 etc..The difference Xiang Zuwei has two kinds of difference items of certain angular relationship, such as
Z5 and Z6, Z12 and Z13 etc..The working principle of the optical system will be specifically illustrated below.
The optical system includes several described image quality compensation devices, several adjustable described aberration item groups are asked
With reference to Fig. 9, the optical system 22 includes the first image quality compensation device 24 and the second image quality compensation 25, the first image quality compensation
Device 24 and the second image quality compensation device 25 are staggered relatively.The light that the light source 20 issues enters the light after mask plate 21
System 22 can be combined in the same direction or relative rotation using first compensation device 24 and the second compensation device 25
Formula compensates image quality, realizes while compensating four kinds of image qualities.
In zernike polynomial, difference item Z5, Z6, Z12 and Z13 are astigmatism items, wherein Z5, Z6 are low order aberration.
From Fig. 3 Z1-Z16 formula and meaning: Z5 and Z12 be it is symmetrical on 0 ° or 90 ° of directions, Z6 and Z13 are at ± 45 °
It is symmetrical on direction.When by making eyeglass face type generate Z5 eyeglass applied force, certain magnitude equally can be also generated
Z12.It is as shown in Table 2 emulation data, the eyeglass face type deformation quantity obtained when the driving force being distributed to generation Z5 is 100N,
When generating the Z5 of 1.0393nm, the Z12 of 0.0777nm can be generated.When the magnitude for compensating Z5 is larger, need to consider the shadow of Z12
It rings, is at this time compensation mechanism if any two panels eyeglass, then can cancel out each other, while image quality compensation device can be compensated by rotation
Z6 and Z13, it can realize that two image quality compensation devices compensate four kinds of image qualities, difference item Z5 and Z6 constitute difference item group, difference
Item Z12 and Z13 constitutes difference item group, has adjusted two difference group items using two image quality compensation devices in the present embodiment and realizes pictures
Matter compensation.Figure 10 is the map distribution map of Z12, and Figure 11 is the map distribution map of Z13, and the two can rotate 45 ° mutually by eyeglass
Conversion.
Table 2 emulates data
| Front surface (nm) | Rear surface (nm) | |
| Z5 | 1.0393 | 1.0407 |
| Z6 | 0.0191 | 0.0192 |
| Z7 | -0.0001 | -0.0002 |
| Z8 | 0.0001 | 0.0001 |
| Z9 | 0 | 0 |
| Z10 | -0.0048 | -0.0048 |
| Z11 | 0.0083 | 0.0084 |
| Z12 | 0.0777 | 0.0775 |
| Z13 | 0.0016 | 0.0016 |
Above-described embodiment is by taking two image quality compensation devices as an example, it will be appreciated by persons skilled in the art that comprising other
The optical system of the image quality compensation device of quantity is also within protection scope of the present invention.And for other it is different have it is certain
The optical system of the image quality compensation device of the lens set pair of angle corresponding relationship is rotated also within protection scope of the present invention.
Correspondingly, the present invention also provides a kind of methods for compensating photoetching projection objective lens image quality, comprising: pass through force application mechanism pair
The lens barrel applies pressure, so that the eyeglass in the lens barrel is generated deformation, then rotate the compensation for realizing image quality by rotating mechanism.
The force application mechanism, lens barrel, eyeglass and rotating mechanism be force application mechanism described in any one of above-described embodiment, lens barrel,
Eyeglass and rotating mechanism.
The method of the compensation image quality uses zernike polynomial, and the zernike polynomial is fitted the face of the eyeglass
Type.The method for being specifically described image quality compensation below with reference to embodiment 1.
Referring to FIG. 2, the rotating mechanism 9 includes bearing 11, rotary shaft 12, driving gear 13 and motor 14, this implementation
Described in rotating mechanism be bearing class rotating mechanism.The bearing 11 is connected with microscope base 15, the motor 14 and rotary shaft 12
Connection, the rotary shaft 12 are connected with the driving gear 13.The force application mechanism 10 is laterally embedded into microscope base 15, with institute
It states lens barrel 8 to be connected, the force application mechanism 10 applies lateral pressure (direction shown in arrow in figure) to lens barrel 8, produces eyeglass 7
Raw deformation, at the same time, the motor 14 drives rotary shaft 12 to rotate, and the rotary shaft 12 drives driving gear 13 to rotate, into
And rotate microscope base 15, lens barrel 8 and force application mechanism 10 together, rotation is realized while eyeglass stress surface type changes to meet,
It is finally reached compensation image quality purpose.
The principle of the method for image quality compensation proposed by the invention is realized based on the correlation between image quality,
Zernike (Ze Nike) multinomial can be used to be fitted the surface face type of optical element, mainly utilize and exist between two kinds of aberrations
The fixed relationship in angle is rotated, the change of eyeglass face type and the rotation of eyeglass are carried out.Zernike polynomial is an infinite number
The multinomial complete set of amount, there are two variable R and θ for tool, and wherein R indicates that radius, θ indicate phase angle, and Fig. 3 lists a part
Zernike polynomial, it is subsequent in order to indicate convenient, the formula of the first row is represented with Z1, Z2 represents the formula of the second row, with such
It pushes away, Z16 indicates the formula of the 16th row.Since zernike polynomial is the common knowledge of optical field, so about Ze Nikeduo
The meaning of each formula of Xiang Shizhong is not also explaining more here, and since zernike polynomial is inexhaustible number, here
It can not enumerate completely, Fig. 3 is only using this 16 multinomials as representative, it will be appreciated by persons skilled in the art that other do not arrange
The part of act is also in protection scope of the present invention.Explanation is also needed, Ze Nike's cited by the present invention is polynomial
Put in order to be currently widely used and put in order, but be not excluded for it is some other put in order, those skilled in the art
It is understood that other zernike polynomials to put in order are also in protection scope of the present invention.
Fig. 4 and Fig. 5 are please referred to, Fig. 4 is the fitting face type distribution map of Z5, and Fig. 5 is the area image distribution map of Z6, passes through figure
The comparison of 4 and Fig. 5 is it is found that Z5 and Z6 differs 45 degree of rotation angles.If the face type of eyeglass is Z5 when design, but when practical application
Be Z6 effect it is more significant, at this moment can realize the compensation of Z6 by the rotation and deformation of eyeglass.
In conclusion image quality compensation device provided by the present invention and method and the optics comprising the image quality compensation device
System can realize the compensation of image quality, and can compensate for a variety of image qualities, reduce image quality by the rotation and deformation of eyeglass
The difficulty of compensation, while also reducing cost.
Above-mentioned is only the description to present pre-ferred embodiments, not to any restriction of the scope of the invention, present invention neck
Any change, the modification that the those of ordinary skill in domain does according to the disclosure above content, belong to the protection scope of claims.
Claims (13)
1. a kind of image quality compensation device, which is characterized in that including lens barrel, force application mechanism and rotating mechanism, the force application mechanism pair
The lens barrel applies pressure, so that the eyeglass in the lens barrel is generated deformation, the lens barrel is located on the rotating mechanism, with rotation
The rotation of mechanism and rotate.
2. image quality compensation device as described in claim 1, which is characterized in that the force application mechanism is located at the rotating mechanism
On, it is rotated with the rotation of the rotating mechanism.
3. image quality compensation device as described in claim 1, which is characterized in that the image quality compensation device further includes microscope base, institute
State the surrounding that microscope base is located at the lens barrel.
4. image quality compensation device as claimed in claim 3, which is characterized in that the rotating mechanism includes bearing, rotary shaft, drive
Moving gear and motor, the motor, which connects, drives gear described in the rotary shaft, the rotation axis connection, the driving gear connects
The microscope base is connect, the bearing connects the microscope base.
5. image quality compensation device as claimed in claim 4, which is characterized in that the force application mechanism is laterally embedded into the microscope base
In, the force application mechanism applies lateral active force to the lens barrel.
6. image quality compensation device as claimed in claim 5, which is characterized in that the motor driven rotary shaft rotation, the rotation
Shaft drives the driving gear rotation, and the driving gear band moves the microscope base, lens barrel and force application mechanism and rotates together.
7. image quality compensation device as claimed in claim 4, which is characterized in that the force application mechanism is longitudinally embedded in the microscope base
In, the force application mechanism applies longitudinal active force to the lens barrel.
8. image quality compensation device as claimed in claim 7, which is characterized in that the force application mechanism is with Hooks coupling universal coupling
Force application mechanism.
9. image quality compensation device as claimed in claim 8, which is characterized in that the image quality compensation device includes flexible block, institute
The lower section that flexible block is located at the lens barrel is stated, the gravity of eyeglass is undertaken.
10. image quality compensation device as claimed in claim 9, which is characterized in that the motor driven rotary shaft rotation, the rotation
Shaft drives the driving gear rotation, and the driving gear band moves the microscope base and force application mechanism rotates together.
11. a kind of optical system, which is characterized in that including the image quality compensation device as described in claim 1-10 any one,
The image quality compensation device adjusts an aberration item group and realizes image quality compensation, and the aberration item group is to close with certain rotation angle
Two kinds of aberration items of system.
12. optical system as claimed in claim 11, which is characterized in that the image quality compensation device is several, if described
Dry image quality compensation device adjusts multiple aberration item groups.
13. a kind of compensate photoetching projection objective lens image quality using image quality compensation device described in any one of claim 1-10
Method characterized by comprising pressure is applied to the lens barrel by force application mechanism, the eyeglass in the lens barrel is made to generate shape
Become, the compensation for realizing image quality is rotated by rotating mechanism.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711267165.5A CN109856923B (en) | 2017-11-30 | 2017-11-30 | Image quality compensation device and method and optical system |
| PCT/CN2018/118387 WO2019105443A1 (en) | 2017-11-30 | 2018-11-30 | Image quality compensation device and method, and optical system |
| TW107143166A TWI733066B (en) | 2017-11-30 | 2018-11-30 | Image quality compensation device and method and optical system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711267165.5A CN109856923B (en) | 2017-11-30 | 2017-11-30 | Image quality compensation device and method and optical system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109856923A true CN109856923A (en) | 2019-06-07 |
| CN109856923B CN109856923B (en) | 2021-03-09 |
Family
ID=66664732
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711267165.5A Active CN109856923B (en) | 2017-11-30 | 2017-11-30 | Image quality compensation device and method and optical system |
Country Status (3)
| Country | Link |
|---|---|
| CN (1) | CN109856923B (en) |
| TW (1) | TWI733066B (en) |
| WO (1) | WO2019105443A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113050382A (en) * | 2019-12-27 | 2021-06-29 | 上海微电子装备（集团）股份有限公司 | Image quality compensation device and method and optical imaging system |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6388823B1 (en) * | 1998-06-20 | 2002-05-14 | Carl-Zeiss-Stiftung Trading As Carl Zeiss | Optical system, especially a projection light facility for microlithography |
| CN104977710A (en) * | 2014-04-09 | 2015-10-14 | 上海微电子装备有限公司 | Optical system image quality compensating apparatus |
| CN105372949A (en) * | 2015-11-25 | 2016-03-02 | 中国科学院长春光学精密机械与物理研究所 | Gravity deformation compensation device for optical element |
| CN106104360A (en) * | 2014-03-10 | 2016-11-09 | 业纳光学系统有限公司 | For compensating the adjustable deformable mirror of the scrambling of beam |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11281865A (en) * | 1998-01-29 | 1999-10-15 | Nikon Corp | Optical device and its manufacture, and semiconductor aligner |
| JP2006113414A (en) * | 2004-10-18 | 2006-04-27 | Canon Inc | Optical element holding apparatus, lens barrel, exposure apparatus, and method for manufacturing micro device |
| JP2008244395A (en) * | 2007-03-29 | 2008-10-09 | Canon Inc | Exposure device |
| CN102012549A (en) * | 2010-11-03 | 2011-04-13 | 中国科学院长春光学精密机械与物理研究所 | Compensating device of gravity deformation of optical element |
| CN104049332A (en) * | 2014-07-01 | 2014-09-17 | 中国科学院长春光学精密机械与物理研究所 | Planar flexible micro-moving adjustment device for optical elements |
-
2017
- 2017-11-30 CN CN201711267165.5A patent/CN109856923B/en active Active
-
2018
- 2018-11-30 TW TW107143166A patent/TWI733066B/en active
- 2018-11-30 WO PCT/CN2018/118387 patent/WO2019105443A1/en active Application Filing
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6388823B1 (en) * | 1998-06-20 | 2002-05-14 | Carl-Zeiss-Stiftung Trading As Carl Zeiss | Optical system, especially a projection light facility for microlithography |
| CN106104360A (en) * | 2014-03-10 | 2016-11-09 | 业纳光学系统有限公司 | For compensating the adjustable deformable mirror of the scrambling of beam |
| CN104977710A (en) * | 2014-04-09 | 2015-10-14 | 上海微电子装备有限公司 | Optical system image quality compensating apparatus |
| CN105372949A (en) * | 2015-11-25 | 2016-03-02 | 中国科学院长春光学精密机械与物理研究所 | Gravity deformation compensation device for optical element |
Non-Patent Citations (1)
| Title |
|---|
| 刘晓林: "浸没式ArF光刻物镜的光学设计及像差控制", 《中国博士学位论文全文数据库信息科技辑》 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113050382A (en) * | 2019-12-27 | 2021-06-29 | 上海微电子装备（集团）股份有限公司 | Image quality compensation device and method and optical imaging system |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201939168A (en) | 2019-10-01 |
| CN109856923B (en) | 2021-03-09 |
| TWI733066B (en) | 2021-07-11 |
| WO2019105443A1 (en) | 2019-06-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104111527B (en) | mirror unit and exposure apparatus | |
| TW200813591A (en) | Light filter/modulator and array of filters/modulators | |
| CN107908053A (en) | Display panel and display device | |
| CN109478024A (en) | Equipment for writing direct maskless lithography | |
| CN109856923A (en) | A kind of image quality compensation device and method and a kind of optical system | |
| CN101625455B (en) | Projection optical system, exposure device as well as method for producing the device | |
| CN110161676A (en) | A kind of optical focal distance setting system surpassing surface based on two-layered medium | |
| CN101369055B (en) | Projection equipment and its aperture regulating method and light source | |
| CN102262360A (en) | Exposure apparatus | |
| CN104977710B (en) | A kind of optical system picture element compensation device | |
| CN103809267B (en) | Projection lens, projection apparatus using the same, and light-driven microparticle device | |
| CN105372942A (en) | Active deformation apparatus for mirror surface unit | |
| CN104914643A (en) | Optical zoom structure | |
| CN200962160Y (en) | Imaging device based on active optical phase conjugation | |
| CN209542964U (en) | Head-up display device | |
| CN106610542B (en) | Liquid crystal microlens array imaging device and imaging method | |
| US20090109513A1 (en) | Head mounted display having electrowetting optical reflecting surface | |
| EP4110532A1 (en) | Nanoscale thin film deposition systems | |
| CN106292188B (en) | Exposure device | |
| CN107797218A (en) | Objective lens aberration corrective lens (eye protection) and aberration correcting method and optical system, litho machine | |
| CN104459986B (en) | Micro deformation aberration correction device | |
| US9001310B2 (en) | Lithographic systems and processes of making and using same | |
| CN109375480A (en) | A kind of photoetching projection objective lens and litho machine | |
| JP7417735B2 (en) | Ultra-high resolution optics based on miniature lenses for virtual and mixed reality | |
| CN208872930U (en) | A kind of projection lens system of dynamic compensation focal power |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |