CN109848827B

CN109848827B - Wafer edge polishing mechanism and wafer edge polishing device

Info

Publication number: CN109848827B
Application number: CN201910161398.XA
Authority: CN
Inventors: 潘雪明; 李鑫; 苏静洪
Original assignee: Tiantong Rijin Precision Technology Co ltd
Current assignee: Tiantong Rijin Precision Technology Co ltd
Priority date: 2019-03-04
Filing date: 2019-03-04
Publication date: 2024-04-30
Anticipated expiration: 2039-03-04
Also published as: CN109848827A

Abstract

The application discloses a wafer edge polishing mechanism and a wafer edge polishing device, wherein the wafer edge polishing mechanism comprises a polishing turntable and an edge polishing assembly, the polishing assembly further comprises a turning main body, and edge polishing pieces and sheets which are respectively arranged at two opposite ends of the turning main body, the edge polishing assembly can be driven to turn over relative to the polishing turntable by a preset amplitude by driving the polishing turntable to enable the edge polishing pieces on the edge polishing assembly to conduct edge polishing on a wafer to be polished, a special driving part of the edge polishing pieces can be omitted, and the wafer edge polishing mechanism has the advantages of being simple in structure, easy to operate and the like.

Description

Wafer edge polishing mechanism and wafer edge polishing device

Technical Field

The application relates to the technical field of wafer processing, in particular to a wafer edge polishing mechanism and a wafer edge polishing device.

Background

Generally, after silicon is crystallized into a large cylindrical body over most of its length, this columnar crystalline material is cut into thin wafers, which are silicon wafers, which may also be referred to as wafers (Wafer) because of their circular shape. Various circuit element structures can be further processed on the wafer to become an integrated circuit product with specific electrical functions.

As semiconductor technology advances toward larger-sized wafers, more stringent requirements are placed on the surface granularity, geometric parameters, edges, and surface roughness of the wafer. For example, in the slicing process, the edge of the wafer obtained by slicing is rough, and has roughness, sharp corners and the like, so that the wafer can be subjected to external force in various subsequent processing processes, and the problems of wafer cracks, wafer fragments and the like can be caused when the external force exceeds the maximum load of the wafer or the stress is excessively concentrated, so that the yield of the wafer process is seriously affected.

Taking edge polishing of a wafer as an example, in the related art, taking chinese patent publication (publication No. CN1312747, title of the invention: method and apparatus for polishing an edge of a wafer) as an example, there is disclosed an apparatus for polishing an edge of a wafer, in which the wafer is fixed to a vacuum chuck, the wafer is rotated around a center line by the vacuum chuck, a polishing wheel made of synthetic plastic is used to contact the edge of the wafer, grooves are provided around a polishing surface of the polishing wheel, a cross section of the grooves is complementary to a contour of the edge of the wafer, and polishing of the edge of the wafer is achieved by a relative movement between the polishing wheel and the edge of the wafer. However, in the above wafer edge polishing apparatus, the polishing wheel is provided at the side of the vacuum chuck, which certainly increases the overall space of the apparatus. In addition, the above-mentioned wafer edge polishing apparatus is limited to only single wafer edge polishing, and polishing of the positioning structure in the wafer cannot be completed for the wafer with the positioning structure (the positioning structure may be, for example, notch, flat edge, etc.).

In practice, taking the example that the wafer has a positioning structure, the edge polishing of the wafer may include polishing of the positioning structure and polishing of edges other than the positioning structure, and each polishing process may further include rough polishing and finish polishing, and these refined polishing processes generally need to be configured with separate polishing devices, so that problems of layout, wafer transfer and the like between the polishing devices exist, the operation is complex, the efficiency is low, and the risk of wafer damage is increased in the wafer transfer process.

Disclosure of Invention

In view of the above-mentioned drawbacks of the related art, an object of the present application is to disclose a wafer edge polishing mechanism and a wafer edge polishing apparatus, which are used for solving the problems of complex structure, complicated operation, low efficiency, etc. in the related art.

To achieve the above and other objects, a first aspect of the present application discloses a wafer edge polishing mechanism of a wafer edge polishing apparatus, comprising:

polishing a turntable;

an edge polishing assembly comprising: the overturning main body is connected with the edge of the polishing turntable in a shaft way; the edge polishing piece is arranged at the bottom of the overturning main body; and the page piece is arranged at the top of the overturning main body.

A turntable rotation motor for driving the polishing turntable to rotate;

When the polishing turntable rotates, the sheet generates air flow, and the air flow drives the edge polishing assembly to turn over relative to the polishing turntable by a preset amplitude so as to enable an edge polishing piece on the edge polishing assembly to perform edge polishing on a wafer to be polished; the flipping includes feeding of the edge polishing assembly toward the center of the polishing turntable or withdrawing of the edge polishing assembly away from the center of the rough polishing turntable.

In certain embodiments of the first aspect of the present application, the wafer edge polishing mechanism further comprises a turntable displacement mechanism for driving the polishing turntable to displace to an edge polishing position.

In certain embodiments of the first aspect of the present application, a plurality of the edge polishing assemblies are uniformly disposed on the edge of the polishing turntable.

In certain embodiments of the first aspect of the present application, the edge polishing assembly comprises any one of the group consisting of an outer circular edge polishing assembly, an upper port edge polishing assembly, and a lower port edge polishing assembly.

In certain embodiments of the first aspect of the present application, the edge polishing assembly comprises an outer circular edge polishing assembly, an upper port edge polishing assembly, or a lower port edge polishing assembly.

In certain embodiments of the first aspect of the present application, the edge polishing assembly comprises: the upper opening edge polishing assembly and the outer circle edge polishing assembly are sequentially arranged at intervals; or a combination of an outer circular edge polishing assembly and a lower port edge polishing assembly, wherein the outer circular edge polishing assembly and the lower port edge polishing assembly are sequentially arranged at intervals.

In certain embodiments of the first aspect of the present application, the edge polishing assembly comprises an outer circular edge polishing assembly, an upper port edge polishing assembly, and a lower port edge polishing assembly, which are sequentially spaced apart.

In certain embodiments of the first aspect of the present application, the outer circular edge polishing assembly comprises: the overturning main body is connected with the edge of the polishing turntable in a shaft way; the outer circle edge polishing piece is arranged at the bottom of the overturning main body; the outer circle edge polishing piece is provided with a flat polishing part or a convex polishing part for contacting the outer circle edge of the wafer; and the page piece is arranged at the top of the overturning main body.

In certain embodiments of the first aspect of the present application, the upper port edge polishing assembly comprises: the overturning main body is connected with the edge of the polishing turntable in a shaft way; the upper opening edge polishing piece is arranged at the bottom of the overturning main body; the upper opening edge polishing piece is provided with an upper wedge polishing part for contacting the upper opening edge of the wafer; and the page piece is arranged at the top of the overturning main body.

In certain embodiments of the first aspect of the present application, the lower port edge polishing assembly comprises: the overturning main body is connected with the edge of the polishing turntable in a shaft way; the lower opening edge polishing piece is arranged at the bottom of the overturning main body; the lower port edge polishing piece is provided with a lower wedge-shaped polishing part for contacting the lower port edge of the wafer; and the page piece is arranged at the top of the overturning main body.

In certain embodiments of the first aspect of the present application, the edge polishing members in the edge polishing assembly are a first type of edge polishing member having a first roughness.

In certain embodiments of the first aspect of the present application, the edge polishing members in the edge polishing assembly are a second type of edge polishing member having a second roughness.

In certain embodiments of the first aspect of the present application, in the edge polishing assembly, the edge polishing member is removable from the turning body.

In certain embodiments of the first aspect of the present application, the sheet is fixedly disposed on the top of the turning body, and forms a guiding inclination angle with a tangent line where the turning body is located.

In certain embodiments of the first aspect of the present application, the sheet is an adjustable sheet disposed on top of the turning body.

In certain embodiments of the first aspect of the present application, the adjustable blade has a plurality of adjustable gears.

In certain embodiments of the first aspect of the present application, the adjustable blade is further coupled to a blade adjustment motor.

A second aspect of the application discloses a wafer edge polishing apparatus configured with the wafer edge polishing mechanism as described above.

The wafer edge polishing mechanism comprises a polishing turntable and an edge polishing assembly, wherein the polishing assembly further comprises a turning main body, and edge polishing pieces and sheets which are respectively arranged at the opposite ends of the turning main body, the edge polishing assembly can be driven to turn over by a preset amplitude relative to the polishing turntable by driving the polishing turntable to enable the edge polishing pieces on the edge polishing assembly to conduct edge polishing on a wafer to be polished, a special driving part of the edge polishing pieces can be omitted, and the wafer edge polishing mechanism has the advantages of being simple in structure, easy to operate and the like.

Drawings

FIG. 1 is a schematic diagram of a multi-station edge polishing apparatus for wafers according to one embodiment of the present application.

Fig. 2 is a top view of the wafer multi-station edge polishing apparatus shown in fig. 1.

Fig. 3 is a schematic view showing a state in which a transfer robot is located at a previous operation location in the multi-station edge polishing apparatus for wafers shown in fig. 1.

Fig. 4 is a schematic view illustrating a state in which a transfer robot is transferred to a subsequent operation location in the multi-station edge polishing apparatus for wafers shown in fig. 1.

Fig. 5 is a schematic view of the structure of a wafer notch polishing apparatus in an exemplary embodiment.

Fig. 6 is a schematic view of the structure of a wafer notch polishing apparatus in another exemplary embodiment.

Fig. 7 is a schematic structural view of the wafer edge rough polishing mechanism of fig. 1.

Fig. 8 is a top view of the wafer edge rough polishing mechanism shown in fig. 6.

Fig. 9 is a partial enlarged view of the V portion in fig. 8.

Fig. 10 is a cross-sectional view taken along line A-A of fig. 8.

Fig. 11 is a partial enlarged view of the L portion in fig. 10.

Fig. 12 is a cross-sectional view taken along line B-B of fig. 8.

Fig. 13 is a partial enlarged view of the M portion in fig. 12.

Fig. 14 is a cross-sectional view taken along line C-C of fig. 8.

Fig. 15 is a partial enlarged view of the portion N in fig. 14.

Fig. 16 is a schematic view of a structure of a wafer edge polishing apparatus in an exemplary embodiment.

Fig. 17 is a schematic view of a structure of a wafer edge polishing apparatus in another exemplary embodiment.

Detailed Description

Further advantages and effects of the present application will become apparent to those skilled in the art from the disclosure of the present application, which is described by the following specific examples.

In the following description, reference is made to the accompanying drawings which describe several embodiments of the application. It is to be understood that other embodiments may be utilized and that mechanical, structural, electrical, and operational changes may be made without departing from the spirit and scope of the present application. The following detailed description is not to be taken in a limiting sense, and the scope of embodiments of the present application is defined only by the claims of the issued patent. The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. Spatially relative terms, such as "upper," "lower," "left," "right," "lower," "upper," and the like, may be used herein to facilitate a description of one element or feature as illustrated in the figures as being related to another element or feature.

Although the terms first, second, etc. may be used herein to describe various elements in some examples, these elements should not be limited by these terms. These terms are only used to distinguish one element from another element. For example, the first steering oscillation may be referred to as a second steering oscillation, and similarly, the second steering oscillation may be referred to as a first steering oscillation, without departing from the scope of the various described embodiments.

In the edge polishing operation of the related wafer, in some cases, the edge polishing apparatus is complicated in structure and occupies a large space. Or in some cases, each polishing process of the wafer with the positioning structure, including the polishing of the positioning structure and the polishing of the edge, needs to be correspondingly configured with independent polishing equipment, so that the problems of layout, wafer transfer and the like among the polishing equipment exist, and the polishing operation efficiency and the polishing quality are affected. Therefore, it is necessary for those skilled in the art to modify the existing wafer edge polishing equipment so as to improve the working efficiency and quality of wafer edge polishing.

Referring to fig. 1 and 2, wherein the structure of the multi-station edge polishing apparatus for wafers of fig. 1 according to an embodiment of the present application is schematically shown, fig. 2 is a top view of the multi-station edge polishing apparatus for wafers of fig. 1. In an embodiment, the multi-station edge polishing apparatus for wafers is used for polishing an edge line of a Wafer, wherein the Wafer is a Wafer-shaped silicon Wafer formed after slicing operation, and typically, the edge of the Wafer is provided with a positioning structure, and the positioning structure may be a flat edge or a notch, for example. In practical application, before slicing a columnar silicon rod, trimming (flat) or grooving (notch) is performed on the edge of the columnar silicon rod along the axial direction of the columnar silicon rod, and then slicing the columnar silicon rod to form a sheet-shaped wafer. In general, trimming (flat) is often used for small-sized columnar silicon rods (the diameter of the columnar silicon rods is, for example, 200mm (about 8 inches) or less or 150mm (about 6 inches) or less), and notching (notch) is used for large-sized silicon ingots (the diameter of the columnar silicon rods is, for example, 200mm (about 8 inches) or more), so that the waste of wafers can be reduced as much as possible while ensuring positioning. Whether wafers with flat edges or notch, the upper edge surface (the section that meets the previous wafer in the slicing process) or the lower edge surface (the section that meets the next wafer in the slicing process) or the front edge (the component part of the circumferential surface of the columnar ingot) of the wafer is rough, and sharp columnar bodies exist, and the whole wafer is fragile, and in this case, the wafer can be broken under the condition of touching and extrusion. Therefore, it is necessary to polish the edge of the wafer so that the edge of the wafer is smoother and polished. In the following description, the wafer multi-station edge polishing apparatus of the embodiment is described with reference to a wafer with notch, but is not intended to limit the scope of the application.

Referring to fig. 1 and 2, the wafer multi-station edge polishing apparatus of the present application includes: a frame 1, a wafer handling device 2, a wafer inspection device 3, a first wafer notch polishing device 4, a second wafer notch polishing device 5, a first wafer edge polishing device 6, a second wafer edge polishing device 7, a wafer cleaning device 8, and a wafer transfer device 9.

The wafer multi-station edge polishing apparatus of the present application will be described in detail.

The machine base 1 is used as a main body part of the wafer multi-station edge polishing equipment, and is provided with a wafer operation platform, wherein the wafer operation platform can be divided into a plurality of operation areas according to the specific operation content of wafer processing operation. In some embodiments, the work-area locations are disposed around the perimeter of the wafer work-table. Specifically, in an embodiment, the wafer working platform at least includes a pretreatment zone 1115 and a post-treatment zone 16, wherein the pretreatment zone 11 is correspondingly provided with a wafer inspection device 3, the first notch polishing zone 12 is correspondingly provided with a first wafer notch polishing device 4, the second notch polishing zone 13 is correspondingly provided with a second wafer notch polishing device 5, the first edge polishing zone 14 is correspondingly provided with a first wafer edge polishing device 6, the second edge polishing zone 15 is correspondingly provided with a second wafer edge polishing device 7, and the post-treatment zone 16 is correspondingly provided with a wafer cleaning device 8. Therefore, the wafer multi-station edge polishing equipment can realize assembly line operation on the wafer, so that the wafer can sequentially finish a plurality of working procedures such as a first notch polishing operation, a second notch polishing operation, a first edge polishing operation, a second edge polishing operation and the like in the same equipment, and the working efficiency of the edge polishing of the wafer is practically improved.

The wafer handling device 2 is adjacent to the pretreatment location 11 and the post-treatment location 16, and is used for loading the wafer to be polished to the pretreatment location 11 of the wafer operation platform and unloading the wafer after polishing operation from the post-treatment location 16 of the wafer operation platform.

As shown in fig. 1 and 2, the wafer handling platform on the base 1 also extends outwardly to form a wafer handling location 17. A cassette loading station is provided in the wafer handling location 17, on which at least one wafer cassette 10 can be loaded, as shown in fig. 1 and 2, and on which three wafer cassettes 10 can be loaded.

In some embodiments, the wafer magazine 10 may include a hollow box body, where two opposite sidewalls of the box body are respectively provided with a plurality of layers of partition boards, and two partition boards belonging to a layer are parallel to each other and a receiving slot for receiving wafers is formed between the two partition boards, so that a plurality of receiving slots are formed on the box body for receiving a plurality of wafers. Since the wafer cassette is a known common device, the description thereof is omitted.

In some embodiments, the wafer cassette 10 may also be provided with orientation features (not shown in the figures) corresponding to flat or notch on the wafer. Taking a wafer with a notch as an example, the notch of each wafer 100 accommodated in each accommodation groove of the wafer cassette 10 can be positioned in the same direction by the orientation structure.

In some embodiments, a buffer structure (not shown) may be further disposed in the wafer cassette 10 to prevent the wafers from colliding with the cassette during the handling process.

The wafer handling device 2 is disposed on the wafer handling platform and between the wafer handling location 17 and the pretreatment location 11 and the post-treatment location 16, and is used for taking out and loading the wafer 100 to be polished from the wafer material box 10 to the pretreatment location 11 of the wafer handling platform and unloading and placing the wafer 100 after polishing from the post-treatment location 16 of the wafer handling platform into the wafer material box 10.

In an embodiment, the wafer handling device 2 may be, for example, a handling robot. In particular, the handling robot may comprise a robot arm and an arm drive for driving the robot arm in motion.

In some embodiments, the free end of the robot arm has a support portion for supporting the wafer, and the support portion may be, for example, a tray or at least two support arms (for example, two support arms form an X-shaped or Y-shaped support fork), and the tray or at least two support arms may have a support surface formed thereon that corresponds to the wafer to be supported. Of course, the supporting portion may further include an adsorption unit, and the supporting portion supports the back of the wafer 100 and maintains a certain space with the back of the wafer to generate negative pressure in communication with the atmosphere, so that the wafer 100 can be stably supported by using the supporting portion when the wafer 100 is taken and sent.

In some embodiments, the free end of the robot arm carries a chuck adapted to hold the top surface of the wafer 100.

In some embodiments, the free end of the robot arm is provided with at least two clamping arms disposed opposite to each other, and a clamping space is formed between the at least two clamping arms, which is adapted to clamp the edge of the wafer 100. Generally, two clamping arms are taken as an example, and the two clamping arms are symmetrically arranged, and in the clamping state, the center of a clamping space formed by the two clamping arms is coincident with the center of the circle of the wafer 100. Therefore, when the wafer 100 is clamped by the clamping arms, the two clamping arms are folded (i.e., the two clamping arms move toward each other), the clamping surfaces of the clamping arms are abutted against the edge of the wafer 100, and the wafer 100 is pushed by the two clamping arms at both sides and moves toward the central area of the clamping space during the process of folding and clamping the wafer 100 by the clamping arms until the wafer 100 is clamped by the two clamping arms, and at this time, the center of the wafer 100 can be located at the center of the clamping space formed by the two clamping arms. In particular, in order to enable the two clamping arms to clamp the wafer 100 smoothly and firmly, the clamping arms further include a clamping arm driving mechanism for driving at least two clamping arms to perform an opening and closing motion. In certain embodiments, the clamp arm driving mechanism may be, for example, a locking cylinder. In some embodiments, the handling robot may also include a pressure sensor to detect the clamping force applied to the wafer 100 to avoid possible damage to the wafer 100 when excessive clamping force is applied by the clamping arms. In some embodiments, a buffer structure may be further disposed on an inner wall of the two clamping arms that contacts the wafer 100.

In some embodiments, the arm transmission mechanism may include a driving motor, a rotation shaft, and a rotation arm connected to the rotation shaft, wherein the driving motor is connected to the rotation shaft, one end of the rotation arm is coaxially fixed to the rotation shaft, and the other end of the rotation shaft is coaxially connected to the mechanical arm. In addition, the arm transmission mechanism may further include a reduction gearbox (not shown in the drawings), the driving motor is mounted at an input end of the reduction gearbox, the rotating shaft is mounted at an output end of the reduction gearbox, and the reduction gearbox may be fixed on the base 1 through a support plate. In practical applications, in some embodiments, the aforementioned rotating arm may be omitted, i.e., the arm transmission mechanism may include a driving motor and a rotating shaft, where the driving motor is connected to the rotating shaft, and the rotating shaft is directly coaxially fixed to the mechanical arm.

When the loading and unloading manipulator in the embodiment is used for transferring the wafer 100, the driving motor drives the rotating shaft to drive the rotating arm and the manipulator arm connected with the rotating arm to rotate around the rotating shaft, so that the bearing part or the clamp arm on the manipulator arm is moved from an initial position (or a default position) to the position of the wafer material box 10 where the wafer to be extracted is positioned; the supporting part on the operation mechanical arm supports the back of the wafer 100 or the clamping arm on the operation mechanical arm clamps the edge of the wafer 100; the method comprises the steps that a driving motor drives a rotating shaft to drive a rotating arm and a mechanical arm connected with the rotating arm to rotate around the rotating shaft, a bearing part or a clamping arm on the mechanical arm is moved to a target position where a wafer to be extracted at present is stored, and the bearing part or the clamping arm on the mechanical arm is operated to store the wafer to be extracted at present to the target position; the driving motor drives the rotating shaft to drive the rotating arm and the mechanical arm connected with the rotating arm to rotate around the rotating shaft, so that the bearing part or the clamping arm on the mechanical arm is moved to an initial position (or a default position).

The wafer transfer device 9 is disposed in a central area of the wafer stage, and is configured to sequentially transfer the wafer 100 loaded by the wafer loading/unloading device 2 among the pretreatment area 11, the first notch polishing area 12, the second notch polishing area 13, the first edge polishing area 14, the second edge polishing area 15, and the post-treatment area 16 on the wafer stage.

In an embodiment, the wafer transferring apparatus 9 includes a turntable 91 located in a central area of the wafer handling platform and a plurality of transferring robots 93 disposed on the turntable 91, where each transferring robot 93 corresponds to a certain operation location on the wafer handling platform and is configured to transfer a wafer from a previous operation location to an adjacent next operation location under the driving of the turntable.

As described above, the wafer processing platform includes the pretreatment location 11, the first notch polishing location 12, the second notch polishing location 13, the first edge polishing location 14, the second edge polishing location 15, and the post-processing location 16, and in the embodiment, as shown in fig. 1 and 2, these processing locations are disposed on the wafer processing platform in a ring-shaped manner according to the processing procedure, specifically, the pretreatment location 11, the first notch polishing location 12, the second notch polishing location 13, the first edge polishing location 14, the second edge polishing location 15, and the post-processing location 16 may be disposed in a clockwise manner, and of course, each of these processing locations may also be disposed in a counter-clockwise manner. To facilitate the sequential transfer of the wafer 100 between the various process locations, the process locations are uniformly disposed at equal angles, i.e., the angle between two adjacent process locations is θ=360°/6=60°.

Correspondingly, a plurality of transfer manipulators 93 arranged on the turntable 91 on the wafer transfer device 9 can be arranged correspondingly, the transfer manipulators 93 are uniformly arranged, and the included angle between two adjacent transfer manipulators 93 is equal to the included angle between two corresponding adjacent operation areas. Since the wafer after being cleaned by the wafer cleaning device 8 on the post-processing region 16 is unloaded from the post-processing region 16 by the wafer handling device 2 instead of being transferred to the pre-processing region, that is, the wafer handling device 2 is located between the pre-processing region 11 and the post-processing region 16, the handling robot of the wafer handling device 2 can load the wafer 100 to be polished into the pre-processing region 11 and unload the wafer 100 after finishing the polishing operation from the post-processing region 16, there is no need to provide a transfer robot between the post-processing region 16 and the pre-processing region 11. As such, in the embodiment, the number of transfer robots 93 provided on the turntable 91 on the wafer transfer device 9 is five, and the five transfer robots 93 are uniformly arranged at equal angles, that is, the angle between two adjacent transfer robots 93 is 60 °. Specifically, the first transfer robot is used for transferring the wafer 100 on the pre-processing area 11 to the first notch polishing area 12, the second transfer robot is disposed 60 ° apart from the first transfer robot for transferring the wafer 100 on the first notch polishing area 12 to the second notch polishing area 13, the third transfer robot is disposed 60 ° apart from the second transfer robot for transferring the wafer 100 on the second notch polishing area 13 to the first edge polishing area 14, the fourth transfer robot is disposed 60 ° apart from the third transfer robot for transferring the wafer 100 on the first edge polishing area 14 to the second edge polishing area 15, and the fifth transfer robot is disposed 60 ° apart from the fourth transfer robot for transferring the wafer 100 on the second edge polishing area 15 to the post-processing area 16. In practical applications, a turntable driving motor may be disposed on the turntable 91 for driving the turntable 91 to rotate. In practical application, the turntable driving motor can realize forward and reverse steering rotation. By driving the turntable 91 to rotate, for example, by 60 °, all the wafers 100 extracted by each hand can be transferred from the corresponding previous work position to the next work position by the transfer robot 93 in a single rotation, so that each wafer 100 on the plurality of work positions can be transferred quickly and stably.

There are different implementations for the transfer robot 93 in the wafer transfer device 9.

In some embodiments, the transfer robot 93 may include a support portion for supporting the wafer and a support arm for connecting the support portion to the turntable 91, wherein the support portion may be, for example, a tray or at least two support arms (e.g., two support arms form an X-or Y-shaped support fork), which may form a support surface corresponding to the wafer to be supported. Of course, the supporting portion may further include an adsorption unit, and the supporting portion supports the back of the wafer 100 and maintains a certain space with the back of the wafer to generate negative pressure in communication with the atmosphere, so that the wafer 100 can be stably and supported by the supporting portion when the wafer 100 is taken and sent. When transferring the wafer 100, the wafer 100 on the corresponding previous operation position is supported by the supporting part of the transferring manipulator 93, and then the turntable 91 is driven to rotate by a preset angle, so that the transferring manipulator 93 and the wafer 100 supported by the transferring manipulator are driven to transfer from the previous operation position to the next operation position.

In some embodiments, one end of the robot arm carries a chuck adapted to hold the top surface of the wafer 100. When transferring the wafer 100, the chuck of the transfer robot 93 first sucks the wafer 100 on the corresponding previous operation location, and then drives the turntable 91 to rotate by a preset angle, so as to drive the transfer robot 93 and the wafer 100 sucked by the transfer robot to transfer from the previous operation location to the next operation location.

In some embodiments, the transfer robot 93 may include at least two clamping arms disposed opposite to each other with a clamping space formed therebetween, and adapted to clamp the edge of the wafer 100. Taking two clamping arms as an example, when transferring the wafer 100, the two clamping arms of the transfer manipulator 93 clamp the edge of the wafer 100, and then drive the turntable 91 to rotate by a preset angle, so as to drive the transfer manipulator 93 and the wafer 100 clamped by the transfer manipulator to transfer from the previous operation location to the next operation location. In general, the center of the clamping space formed by the two clamping arms is coincident with the center of the wafer 100 in the clamped state. Therefore, when the wafer 100 is clamped by the clamping arms, the two clamping arms are folded, the clamping surfaces in the clamping arms are abutted against the edge of the wafer 100, and during the process of folding and clamping the wafer 100 by the clamping arms, the wafer 100 is pushed by the two clamping arms at two sides and moves towards the central area of the clamping space until the wafer 100 is clamped by the two clamping arms, and at this time, the center of the wafer 100 can be located at the center of the clamping space formed by the two clamping arms. In particular, in order to enable the two clamping arms to clamp the wafer 100 smoothly and firmly, the clamping arms further include a clamping arm driving mechanism for driving at least two clamping arms to perform an opening and closing motion. In certain embodiments, the clamp arm driving mechanism may be, for example, a locking cylinder. Of course, the handling robot may also include a pressure sensor for detecting the clamping force applied to the wafer 100, so as to avoid possible damage to the wafer 100 when the clamping force applied by the clamping arm is too large. In addition, a buffer structure may be further disposed on an inner wall of the two clamping arms, which contacts the wafer 100.

Generally, each transfer robot 93 in the wafer transfer device 9 is a region between two adjacent work areas without using the wafer transfer device 9 to transfer the wafer 100, i.e., the wafer transfer device 9 is in a non-working state (may also be referred to as an initial state). For convenience of description, in the following description, we will refer to the position of the wafer transfer device 9 in the non-operating state as the initial position. We can set the following: the included angle between the initial position of the wafer transfer device and the previous operation area is a first angle, the included angle between the previous operation area and the next operation area is a second angle, and the included angle between the initial position and the next operation area is a third included angle, wherein the sum of the first included angle and the third included angle is equal to the second included angle. In practical application, when the wafer 100 is transferred by the transfer robot 93 in the wafer transfer device 9, the turntable 91 is driven to rotate at a first angle in a first direction, so that the transfer robot 93 is transferred from the initial position to the corresponding previous operation position (the position of the transfer robot 93 at the previous operation position may be referred to as the pick-up position); controlling a transfer manipulator 93, and extracting the wafer 100 on the previous operation position at the extraction position by the transfer manipulator 93; the turntable 91 is driven to rotate by a second angle with a second rotation direction, so as to drive the transfer manipulator 93 and the wafer 100 extracted by the transfer manipulator to transfer from a previous operation position to an adjacent next operation position (the position of the transfer manipulator 93 at the next operation position can be called as a placement position); controlling a transfer manipulator 93, and placing the wafer on the latter operation area by the transfer manipulator 93 at the placement position; the turntable 91 is driven to rotate at a third angle in the first direction, so that the transfer robot 93 returns to the initial position from the placement position.

In some embodiments, the initial position of the transfer robot in the wafer transfer device 9 is the middle position of two adjacent work areas, i.e., each transfer robot 93 in the wafer transfer device 9 is centered between the two adjacent work areas in the non-working state. As described above, in the embodiment shown in fig. 1 and 2, the angle between the adjacent two work sites is 60 °, and thus the angle between the transfer robot 93 and the adjacent two work sites on the left and right sides is 30 °, that is, the first angle is 30 °, the second angle is 60 °, and the third angle is 30 °. Therefore, under the above-mentioned angle design, when the wafer 100 is transferred by the transfer robot 93 in the wafer transfer device 9, the turntable 91 is driven to rotate by 30 ° in the first direction, and the transfer robot 93 is driven to rotate from the initial position to the extraction position of the previous operation area; controlling a transfer manipulator 93, and extracting the wafer 100 on the previous operation position at the extraction position by the transfer manipulator 93; the turntable 91 is driven to rotate by 60 degrees in a second rotation direction, so that the transfer manipulator 93 and the wafer 100 extracted by the transfer manipulator are driven to be transferred from the former operation area to the adjacent position of the latter operation area; controlling a transfer manipulator 93, and placing the wafer on the latter operation area by the transfer manipulator 93 at the placement position; the turntable 91 is driven to rotate by 30 ° in the first direction, and the transfer robot 93 is driven to return to the initial position from the placement position. Of course, the above-mentioned included angle between two adjacent operation locations and the setting of the included angle between the transfer robot 93 and the operation location are only illustrative, and are not intended to limit the scope of the present application, and in essence, the above-mentioned angles may still be changed differently according to the overall layout or control system of the multi-station edge polishing apparatus.

In order to avoid interference of adjacent other operation positions and ensure independence and safety when corresponding operation is executed on each operation position, the protection device is arranged on each operation position in the wafer multi-station edge polishing equipment. In an embodiment, the protection device may be, for example, protection plates, so that one protection plate may be respectively disposed on two opposite sides of each operation location, that is, two protection plates are disposed on two opposite sides of the pretreatment location 11, two protection plates are disposed on two opposite sides of the first notch polishing location 12, two protection plates are disposed on two opposite sides of the second notch polishing location 13, two protection plates are disposed on two opposite sides of the first edge polishing location 14, two protection plates are disposed on two opposite sides of the second edge polishing location 15, and two protection plates are disposed on two opposite sides of the post-treatment location 16. Thus, when the corresponding operation is executed in each operation area, the operation areas are independent and do not interfere with each other. For example, polishing solutions that may be used in performing related polishing operations in the first notch polishing locations 12, the second notch polishing locations 13, the first edge polishing locations 14, and the second edge polishing locations 15 may not escape, and cleaning solutions that may be used in performing wafer cleaning operations in the post-processing locations 16 may not escape.

However, since the pretreatment area is only a pretreatment operation for the wafer on the pretreatment area, the pretreatment area may not be provided with a shield plate on the side adjacent to the wafer loading/unloading device 2. Thus, taking the example that the protection plate is not mounted on the side of the pretreatment area adjacent to the wafer handling device 2, the protection plate PA is disposed on the rear side of the pretreatment area 11, the protection plate PB is disposed on the front side of the first notch polishing area, the first transfer robot is disposed between the protection plate PA of the pretreatment area 11 and the protection plate PB of the first notch polishing area 12, the protection plate PA is disposed on the rear side of the first notch polishing area 12, the protection plate PB is disposed on the front side of the second notch polishing area 13, the second transfer robot is disposed between the protection plate PA of the first notch polishing area 12 and the protection plate PB of the second notch polishing area 13, the protection plate PA is disposed on the rear side of the second notch polishing area 13, the protection plate PB is disposed on the front side of the third transfer robot is disposed between the protection plate PA of the second notch polishing area 13 and the protection plate PB of the first edge polishing area 14, the PB is disposed on the rear side of the second edge polishing area 14, the protection plate PB is disposed on the front side of the second edge polishing area 15, the fourth transfer robot is disposed between the protection plate PA is disposed on the rear side of the second edge polishing area 14 and the rear side of the second edge area 16, and the protection plate PA is disposed on the rear side of the second transfer robot is disposed on the rear side of the second edge area 15. In general, each transfer robot 93 in the wafer transfer apparatus 9 is centered at an initial position between two adjacent work areas in a non-working state, and the transfer robot 93 waits for an instruction at the initial position, and at this time, the protection plates PA and PB located at opposite sides of the transfer robot 93 are both in a closed state.

In some embodiments, the guard plate may be of an open-close design. For example, the protection plate may be composed of two movable plates that open and close in the left-right direction, or the protection plate may be composed of two movable plates that open and close in the up-down direction. When the corresponding operation is performed as the work area, the two movable plates are closed, and when the wafer 100 needs to be transferred, the two movable plates are opened.

In some embodiments, an opening may be formed in the middle position of the protection plate, and a retractable door may be disposed on the opening. When the corresponding operation is performed at the work place, the movable door on the guard plate is closed, and when the wafer 100 needs to be transferred, the movable door on the guard plate is opened.

Taking the example of opening the movable door on the protection plate, when the transfer robot 93 is required to transfer the wafer 100 from the previous operation area to the next operation area, the protection plate PA at the rear side of the previous operation area is opened (i.e., the movable door on the protection plate PA is opened to expose the opening), the wafer 100 is extracted from the previous operation area by the transfer robot 93 located between the previous operation area and the next operation area by rotating 30 ° from the initial position in the first direction and penetrating the opening of the protection plate PA (as shown in fig. 3), the protection plate PB at the front side of the next operation area is opened (i.e., the movable door on the protection plate PB is opened to expose the opening), the transfer robot 93 rotates 60 ° in the second direction and penetrates the opening of the protection plate PA to exit the previous operation area and penetrates the opening of the protection plate PB to enter the next operation area, and the wafer 100 is transferred into the next operation area (as shown in fig. 4), at this time, the rear side of the previous operation area PB can be closed (i.e., the movable door on the protection plate PB on the back side of the protection plate PA is closed by rotating 30 ° in the first direction and penetrating the opening of the next operation area PB is closed).

The following describes each operation location and the corresponding operation device in the multi-station edge polishing apparatus for wafers according to the present application in detail.

As described above, the wafer work platform may be divided into a pretreatment area 11, a first notch polishing area 12, a second notch polishing area 13, a first edge polishing area 14, a second edge polishing area 15, and a post-treatment area 16 according to the specific work content of the wafer processing work, wherein the pretreatment area 11 is correspondingly provided with a wafer inspection device 3, the first notch polishing area 12 is correspondingly provided with a first wafer notch polishing device 4, the second notch polishing area 13 is correspondingly provided with a second wafer notch polishing device 5, the first edge polishing area 14 is correspondingly provided with a first wafer edge polishing device 6, the second edge polishing area 15 is correspondingly provided with a second wafer edge polishing device 7, and the post-treatment area 16 is correspondingly provided with a wafer cleaning device 8. In an embodiment, the wafer processed by the wafer multi-station edge polishing apparatus of the present application has a notch, so the first wafer notch polishing device 4 and the second wafer notch polishing device 5 are used for notch polishing the notch of the wafer, but not limited thereto, for example, in other embodiments, if the wafer processed by the wafer with a flat edge is processed, the first wafer notch polishing device 4 and the second wafer notch polishing device 5 may be replaced by a first wafer flat edge polishing device and a second wafer flat edge polishing device, respectively, for polishing the flat edge.

After the wafer 100 to be polished is loaded into the pretreatment area 11 of the wafer stage by the wafer handling apparatus 2, the wafer 100 is inspected by the wafer inspection apparatus 3. In an embodiment, the inspection operation includes, but is not limited to, wafer notch inspection, wafer flatness inspection, wafer edge inspection, and the like.

A rotating carrier is provided at the center of the pretreatment location 11 for supporting the wafer 100. Of course, the top of the rotating carrier may also include an adsorption unit, and the rotating carrier holds the back of the wafer 100 and keeps a certain space with the back of the wafer to generate negative pressure in communication with the atmosphere, so that the wafer 100 is not damaged while the wafer 100 is stably held. The rotating stage may be a circular table adapted to the wafer 100, but is not limited thereto, and may be a rectangular table, a triangular table, or other similar structures. When the wafer 100 is held by the rotating carrier, the wafer 100 is in a horizontal state. In an embodiment, the spin stand may be configured to perform a spin motion, for example, the spin stand may have a rotation axis with respect to the wafer stage to perform a spin motion, so that the spin stand may rotate the wafer 100 thereon after the spin stand holds the wafer 100.

The wafer inspection device 3 is disposed beside the rotating carrier for performing inspection operation on the wafer 100.

In some embodiments, the inspection operation includes wafer notch inspection for inspecting wafer notches. Taking wafer notch inspection as an example, the wafer notch inspection device as the wafer inspection device 3 may be, for example, a visual inspection device including at least a high-pixel-resolution camera and image recognition software, so that the position of notch can be accurately and rapidly detected. Of course, the visual inspection device may also include a light source (e.g., an LED light source) to minimize the impact of the ambient environment on the image. During inspection, the vision inspection device is driven to approach the edge of the wafer, for example, the camera is moved to a position right above the edge of the wafer and a preset distance from the wafer 100, and the rotating carrier is driven to rotate the wafer 100 thereon at a preset rotation speed, so that the notch of the wafer 100 can be detected and determined by the vision inspection device. After the latches of the wafer 100 are determined through the detection, the rotary carrier is driven to rotate the latches of the wafer 100 thereon to a designated position.

In some embodiments, the inspection operation may include wafer flatness inspection, wafer edge inspection, etc., and then the wafer inspection device 3 may be, for example, a wafer flatness inspection device, a wafer edge inspection device, etc.

In addition, other pretreatment devices, such as a wafer centering device, may be provided in the pretreatment area 11 in addition to the wafer inspection device 3. The wafer centering device is used for centering the wafer. In some embodiments, the wafer centering device includes at least two clamping members for clamping the edge of the wafer to facilitate centering the wafer.

A clamping space is formed between at least two clamping pieces in the wafer centering device, and is suitable for clamping the edge of a wafer. Generally, the at least two clamping members are symmetrically arranged, and the center of a clamping space formed by the clamping members in the clamping state is coincident with the center of a circle of the wafer. Therefore, when the at least two clamping members are utilized to clamp the wafer, the at least two clamping members are folded (i.e., the at least two clamping members move toward each other), the clamping surfaces of the at least two clamping members are abutted against the edge of the wafer, and during the process of folding and clamping the wafer by the at least two clamping members, the wafer is pushed by the at least two clamping members and moves toward the central area of the clamping space until the wafer is clamped by the at least two clamping members, at this time, the center of the wafer can be positioned at the center of the clamping space formed by the at least two clamping members, thereby completing the centering and positioning of the wafer.

The first wafer notch polishing apparatus 4 is provided on the first notch polishing section 12 of the wafer work platform for performing a first notch polishing operation on the notch of the wafer 100. In an embodiment, the first wafer notch polishing device 4 may be, for example, a wafer notch rough polishing device for performing notch rough polishing operation on a notch of a wafer.

The wafer notch rough polishing device comprises: wafer plummer and wafer notch rough polishing mechanism.

The wafer carrier is disposed at a central location of the first notch polishing zone 12 for holding the wafer 100. Of course, the top of the wafer carrier may further include an adsorption unit, and the wafer carrier supports the back of the wafer 100 and maintains a certain space with the wafer carrier to communicate with the atmosphere to generate negative pressure, so that the wafer 100 is not damaged while the wafer 100 is stably supported. The wafer carrier may be a circular table adapted to the wafer 100, but is not limited thereto, and may be a rectangular table, a triangular table, or other similar structures. When the wafer 100 is held by the wafer carrier, the wafer 100 is in a horizontal state. In addition, in order to make the wafer carrier support the wafer 100 and keep the wafer 100 stable, in an embodiment, a wafer stabilizing structure may be further disposed on the wafer carrier, and in some embodiments, the wafer stabilizing structure may be, for example, a plurality of stoppers or stop strips disposed on the periphery of the wafer carrier. In some embodiments, the wafer carrier may be configured to be capable of rotation, for example, the wafer carrier may have a rotation axis relative to the wafer stage to perform rotation, such that the wafer carrier is driven to rotate the wafer 100 thereon after the wafer carrier supports the wafer 100.

Generally, since the wafer is subjected to pretreatment such as wafer notch detection by the wafer detecting device and centering by the wafer centering device on the pretreatment location 11, the wafer 100 is not required to be subjected to notch detection, centering, and the like when the wafer 100 is transferred from the pretreatment location 11 to the wafer stage of the first notch polishing location 12 by the transfer robot 93 in the wafer transfer device 9. However, in some embodiments, a wafer inspection device or wafer centering device, etc., may be provided on, for example, the first notch polishing location 12 or other similar location thereafter, if desired.

The wafer notch rough polishing mechanism is disposed beside the wafer carrier and is used for performing notch rough polishing operation on the wafer 100 carried by the wafer carrier.

In an embodiment, the wafer notch rough polishing mechanism may comprise: rough polishing gyro wheel, gyro wheel rotating electrical machines, gyro wheel shift mechanism.

The rough polishing roller is rotatably connected to a mounting arm through a rotation shaft for being rotated by a roller rotation motor and performing rough polishing of the recess by contacting the recess of the wafer 100. In an embodiment, the rough polishing roller has a first roughness. As described above, the wafer carrier horizontally holds the wafer 100, and thus, the rough polishing rollers in the wafer notch rough polishing mechanism are vertically disposed.

The roller shifting mechanism is used for driving the rough polishing roller to shift. In some embodiments, the roller displacement mechanism may be, for example, an advance and retreat mechanism that may drive the rough polishing roller to advance and retreat toward or away from the wafer 100. In practical application, the driving and reversing mechanism can adopt a combination of a sliding block and a sliding rail combined with a ball screw and a servo motor, a combination of a rotating gear and a rack, and the like. In certain embodiments, the roller displacement mechanism is, for example, a three-dimensional displacement mechanism, which may include: an advance and retreat shifting mechanism, a swing shifting mechanism and a lifting shifting mechanism. In practical application, the three-dimensional shifting mechanism can adopt a combination of a sliding block and a sliding rail, a combination of a rotating gear and a rack, and the like.

When the wafer 100 is subjected to notch rough polishing by using the wafer notch rough polishing device, the wafer 100 is placed on a wafer carrying table, and the wafer 100 is carried by the wafer carrying table and kept fixed; enabling the roller rotating motor to drive the rough polishing roller to rotate; the roller shifting mechanism is caused to drive the rough polishing roller to shift to the notch polishing position according to the notch position of the wafer 100, and rough polishing of the notch is performed by the rough polishing roller gradually approaching until the notch of the wafer 100 is contacted. And, in the course of rough polishing the notch, the roller shifting mechanism can still be made to drive the rough polishing roller to shift so as to adjust the notch polishing position. Taking a three-dimensional shifting mechanism as an example, the roller shifting mechanism drives the rough polishing roller to advance and retreat to adjust advance and retreat in the depth of the relative notch, and the roller shifting mechanism drives the rough polishing roller to swing to adjust swing in the width of the relative notch, so that the rough polishing wheel can cover all areas to be polished of the notch of the wafer 100, and complete rough polishing of the notch is ensured.

To ensure coordination of the roller rotating motor and the roller displacement mechanism, in some embodiments, the roller rotating motor and the roller displacement mechanism may be coupled together with a controller, which coordinates control of the roller rotating motor and the roller displacement mechanism. Specifically, the controller is connected with the rough polishing roller and the roller shifting mechanism, and is used for controlling the roller shifting mechanism to drive the rough polishing roller to shift and controlling the rough polishing roller to rotate, and the rough polishing roller is used for performing rough polishing of the notch by contacting the notch of the wafer 100. As described above, in some embodiments, the roller displacement mechanism is an advancing and retreating mechanism, and thus, the controller is connected to the advancing and retreating displacement mechanism for transmitting a corresponding displacement control instruction to the advancing and retreating displacement mechanism to drive the rough polishing roller to a predetermined rough polishing position by advancing and retreating displacement and to contact the notch of the wafer 100 at the rough polishing position. In some embodiments, the roller displacement mechanism is a three-dimensional displacement mechanism including an advancing and retreating displacement mechanism, a swinging displacement mechanism, and a lifting displacement mechanism, and therefore, the controller is connected to the advancing and retreating displacement mechanism, the swinging displacement mechanism, and the lifting displacement mechanism for respectively transmitting corresponding displacement control instructions to the advancing and retreating displacement mechanism, the swinging displacement mechanism, and the lifting displacement mechanism to drive the rough polishing roller to reach a predetermined rough polishing position through three-dimensional displacement and to be able to contact the notch of the wafer 100 at the rough polishing position. In addition, the controller is connected with a roller rotating motor of the rough polishing roller and is used for sending corresponding rotation control instructions to the roller rotating motor so as to control the rotation direction and the rotation speed of the rough polishing roller.

The second wafer notch polishing apparatus 5 is provided on the second notch polishing section 13 of the wafer work platform for performing a second notch polishing work on the notch of the wafer 100. In an embodiment, the second wafer notch polishing apparatus 5 may be, for example, a wafer notch polishing apparatus for performing notch polishing work on a notch of a wafer.

The wafer notch finish polishing device comprises: wafer plummer and wafer notch finish polishing mechanism.

The wafer carrier is disposed at a center position of the second notch polishing location 13 for supporting the wafer 100. Of course, the top of the wafer carrier may further include an adsorption unit, and the wafer carrier supports the back of the wafer 100 and maintains a certain space with the wafer carrier to communicate with the atmosphere to generate negative pressure, so that the wafer 100 is not damaged while the wafer 100 is stably supported. The wafer carrier may be a circular table adapted to the wafer 100, but is not limited thereto, and may be a rectangular table, a triangular table, or other similar structures. When the wafer 100 is held by the wafer carrier, the wafer 100 is in a horizontal state. In addition, in order to make the wafer carrier support the wafer 100 and keep the wafer 100 stable, in an embodiment, a wafer stabilizing structure may be further disposed on the wafer carrier, and in some embodiments, the wafer stabilizing structure may be, for example, a plurality of stoppers or stop strips disposed on the periphery of the wafer carrier. In some embodiments, the wafer carrier may be configured to be capable of rotation, for example, the wafer carrier may have a rotation axis relative to the wafer stage to perform rotation, such that the wafer carrier is driven to rotate the wafer 100 thereon after the wafer carrier supports the wafer 100.

Generally, since the wafer is subjected to pretreatment such as wafer notch detection by the wafer detecting device and centering by the wafer centering device on the pretreatment location 11, the wafer 100 is transferred from the pretreatment location 11 to the wafer stage of the second notch polishing location 13 by the transfer robot 93 in the wafer transfer device 9, and thus, notch detection and centering of the wafer 100 are unnecessary. However, in some embodiments, a wafer inspection device or wafer centering device, etc., may be provided on, for example, the second notch polishing location 13 or other similar location, if desired.

The wafer notch fine polishing mechanism is disposed beside the wafer carrier and is used for performing notch fine polishing operation on the wafer 100 carried by the wafer carrier.

In an embodiment, the wafer notch finish polishing mechanism may comprise: finish polishing gyro wheel, gyro wheel rotating electrical machines, gyro wheel shift mechanism.

The polishing roller is rotatably connected to a mounting arm by a rotation shaft for being rotated by a rotation motor and performing polishing of the recess by contacting the recess of the wafer 100. In an embodiment, the finishing roller has a second roughness, wherein the second roughness of the finishing roller is less than the second roughness of the rough polishing roller. As described above, the wafer carrier horizontally holds the wafer 100, and therefore, the polishing rollers in the wafer notch polishing mechanism are vertically arranged.

The roller shifting mechanism is used for driving the finish polishing roller to shift. In some embodiments, the roller displacement mechanism may be, for example, an advance and retreat mechanism that may drive the finishing roller to advance and retreat toward or away from the wafer 100. In practical application, the driving and reversing mechanism can adopt a combination of a sliding block and a sliding rail combined with a ball screw and a servo motor, a combination of a rotating gear and a rack, and the like. In certain embodiments, the roller displacement mechanism is, for example, a three-dimensional displacement mechanism, which may include: an advance and retreat shifting mechanism, a swing shifting mechanism and a lifting shifting mechanism. In practical application, the three-dimensional shifting mechanism can adopt a combination of a sliding block and a sliding rail, a combination of a rotating gear and a rack, and the like.

When the wafer 100 is subjected to notch finish polishing by the wafer notch finish polishing device, the wafer 100 is placed on a wafer carrying table, and the wafer 100 is carried by the wafer carrying table and kept fixed; enabling the roller rotating motor to drive the finish polishing roller to rotate; according to the notch position of the wafer 100, the roller shifting mechanism drives the fine polishing roller to shift to the notch polishing position, and the fine polishing roller gradually approaches until the notch of the wafer 100 is contacted to finish polishing the notch. And, in the process of carrying out the finish polishing to the notch, the roller shifting mechanism can still be made to drive the finish polishing roller to shift so as to adjust the notch polishing position. Taking a three-dimensional shifting mechanism as an example, the roller shifting mechanism drives the fine polishing roller to advance and retreat to adjust advance and retreat in the depth of the relative notch, and the roller shifting mechanism drives the fine polishing roller to swing to adjust swing in the width of the relative notch, so that the fine polishing wheel can cover all areas to be polished of the notch of the wafer 100, and complete fine polishing of the notch is ensured.

To ensure coordination of the roller rotating motor and the roller displacement mechanism, in some embodiments, the roller rotating motor and the roller displacement mechanism may be coupled together with a controller, which coordinates control of the roller rotating motor and the roller displacement mechanism. Specifically, the controller is connected with the finish polishing roller and the roller shifting mechanism, and is used for controlling the roller shifting mechanism to drive the finish polishing roller to shift and controlling the finish polishing roller to rotate, and the finish polishing roller is used for implementing the finish polishing of the notch by contacting the notch of the wafer 100. As previously described, in some embodiments, the roller displacement mechanism is an advancing and retreating mechanism, and therefore, the controller is connected to the advancing and retreating displacement mechanism for transmitting a corresponding displacement control instruction to the advancing and retreating displacement mechanism to drive the finishing roller to a predetermined finishing position by advancing and retreating displacement and to contact the notch of the wafer 100 at the finishing position. In some embodiments, the roller displacement mechanism is a three-dimensional displacement mechanism including an advancing and retreating displacement mechanism, a swinging displacement mechanism, and a lifting displacement mechanism, and therefore, the controller is connected to the advancing and retreating displacement mechanism, the swinging displacement mechanism, and the lifting displacement mechanism for respectively transmitting corresponding displacement control instructions to the advancing and retreating displacement mechanism, the swinging displacement mechanism, and the lifting displacement mechanism to drive the finishing polishing roller to a predetermined finishing polishing position through three-dimensional displacement and to be able to contact the notch of the wafer 100 at the finishing polishing position. In addition, the controller is connected with a roller rotating motor of the finish polishing roller and is used for sending corresponding rotation control instructions to the roller rotating motor so as to control the steering and the rotating speed of the finish polishing roller.

In the foregoing description, it is understood that the first wafer notch polishing device 4 may be, for example, a wafer notch rough polishing device for performing notch rough polishing on a notch of a wafer, the second wafer notch polishing device 5 may be, for example, a wafer notch finish polishing device for performing notch finish polishing on a notch of a wafer, but not limited thereto, and in other embodiments, the first wafer notch polishing device 4 and the second wafer notch polishing device 5 may be changed. For example, in an embodiment, the first wafer notch polishing device 4 and the second wafer notch polishing device 5 have the same structure, wherein the first wafer notch polishing device 4 is used for performing notch edge polishing and notch upper edge polishing on a notch of a wafer, the second wafer notch polishing device 5 is used for performing notch edge polishing and notch lower edge polishing on a notch of a wafer, or the first wafer notch polishing device 4 is used for performing notch edge polishing and notch lower edge polishing on a notch of a wafer, the second wafer notch polishing device 5 is used for performing notch edge polishing and notch upper edge polishing on a notch of a wafer, and notch polishing operations on a notch of a wafer can be completed through the first wafer notch polishing device 4 and the second wafer notch polishing device 5, and on the other hand, a part of the workload of the whole notch polishing operation can be performed by a single wafer notch polishing device, so that the work efficiency of the notch polishing operations can be improved.

In practical applications, the present application further discloses a wafer notch polishing apparatus, comprising: the wafer plummer is used for bearing the wafer, and the wafer notch polishing mechanism further comprises: polishing rollers; the roller rotating motor is used for driving the polishing roller to rotate; and the roller shifting mechanism is used for driving the polishing roller to shift to the notch corresponding to the wafer carried by the wafer carrying table so as to enable the polishing roller to carry out notch polishing on the notch of the wafer.

In an exemplary embodiment, a wafer notch polishing mechanism may be provided in the wafer notch polishing apparatus, see fig. 5. For example, in one embodiment, the wafer notch polishing apparatus includes a wafer carrier and a wafer notch polishing mechanism, or in one embodiment, the wafer notch polishing apparatus includes a wafer carrier and a wafer notch rough polishing mechanism, or in another embodiment, the wafer notch polishing apparatus includes a wafer carrier and a wafer notch finish polishing mechanism.

In an exemplary embodiment, in the wafer notch polishing apparatus, two wafer notch polishing mechanisms may be provided, see fig. 6. For example, in one embodiment, the wafer notch polishing apparatus includes two wafer carriers, where one wafer carrier is configured with one wafer notch rough polishing mechanism and the other wafer carrier is configured with one wafer notch finish polishing mechanism. Or in a specific implementation manner, the wafer notch polishing device comprises two wafer carrying tables, wherein one wafer carrying table is correspondingly provided with a first wafer notch polishing mechanism, and the other wafer carrying table is correspondingly provided with a second wafer notch polishing mechanism.

Of course, as for the structures of the wafer carrier, the wafer notch rough polishing mechanism, and the wafer notch finish polishing mechanism configured in the wafer notch polishing apparatus of each exemplary embodiment and the working principle of the wafer notch polishing apparatus may be referred to the foregoing description, and will not be repeated herein.

The first wafer edge polishing apparatus 6 is disposed on the first edge polishing zone 14 of the wafer work platform for performing a first edge polishing operation on the edge (except for the notch) of the wafer 100. In an embodiment, the first wafer edge polishing apparatus 6 may be, for example, a wafer edge rough polishing apparatus for performing an edge rough polishing operation on an edge (excluding a notch) of the wafer 100.

The wafer edge rough polishing device comprises a wafer bearing table and a wafer edge rough polishing mechanism.

The wafer carrier is disposed at a central location of the first edge polishing zone 14 for supporting the wafer 100. Of course, the top of the wafer carrier may further include an adsorption unit, and the wafer carrier supports the back of the wafer 100 and maintains a certain space with the wafer carrier to communicate with the atmosphere to generate negative pressure, so that the wafer 100 is not damaged while the wafer 100 is stably supported. The wafer carrier may be a circular table adapted to the wafer 100, but is not limited thereto, and may be a rectangular table, a triangular table, or other similar structures. When the wafer 100 is held by the wafer carrier, the wafer 100 is in a horizontal state. In an embodiment, the wafer carrier may be configured to be capable of rotation, for example, the wafer carrier is movably disposed on the wafer working platform through a rotating shaft, and the rotating shaft is connected to a carrier rotating motor to implement the rotation. Thus, after the wafer carrier supports the wafer 100, the wafer carrier can drive the wafer 100 thereon to rotate under the control of the carrier rotating motor. In practical application, the rotating motor of the bearing table can send corresponding rotation control instructions to the wafer bearing table so as to control the rotation direction and the rotation speed of the wafer bearing table.

Generally, since the wafer is subjected to pretreatment such as wafer notch detection by the wafer detecting device and centering by the wafer centering device on the pretreatment location 11, notch detection and centering of the wafer 100 are unnecessary when the wafer 100 is transferred onto the wafer stage of the first edge polishing location 14 by the transfer robot 93 in the wafer transfer device 9. However, in some embodiments, if desired, a wafer inspection device or wafer centering device may be provided on, for example, the first edge polishing location 14 or other similar location thereafter.

The wafer edge rough polishing mechanism is used for performing edge rough polishing operation on the wafer 100 carried by the wafer carrying table. In an embodiment, the wafer edge rough polishing mechanism is disposed above the wafer carrier, and the wafer edge rough polishing mechanism may include: rough polishing turntable 61, edge rough polishing assembly, turntable rotating motor, and rough polishing turntable displacement mechanism.

The rough polishing turntable 61 is connected to the turntable rotating motor via a rotation shaft and is controlled to rotate by the turntable rotating motor. Please refer to fig. 7, which is a schematic diagram of a rough polishing mechanism for wafer edge. As shown in fig. 1 and 7, the rough polishing turntable 61 may be disposed on a cover structure of the wafer multi-station edge polishing apparatus through a rotation shaft and located right above the wafer carrier. In practical applications, the turntable rotating motor may send corresponding rotation control instructions to the rough polishing turntable 61 to control the rotation direction and the rotation speed of the rough polishing turntable 61.

A plurality of edge rough polishing components are uniformly arranged on the edge of the rough polishing turntable 61, wherein each edge rough polishing component comprises a turning body, an edge rough polishing piece and a sheet, the turning body is connected with the edge of the rough polishing turntable 61 in a shaft mode, the edge rough polishing piece is arranged at the bottom of the turning body, the sheet is arranged at the top of the turning body, and the edge rough polishing piece has first roughness.

Since the edge of the wafer 100 needs to be rounded after the edge rough polishing operation is performed on the edge of the wafer 100, the edge rough polishing assembly may further include: an outer circular edge rough polishing assembly 62, an upper port edge rough polishing assembly 64, and a lower port edge rough polishing assembly 66, the outer circular edge rough polishing assembly 62, the upper port edge rough polishing assembly 64, and the lower port edge rough polishing assembly 66 being sequentially spaced apart.

Referring to fig. 8, a top view of the wafer edge rough polishing mechanism of fig. 7 is shown. As shown in fig. 7 and 8, twelve edge rough polishing members are uniformly provided on the periphery of the rough polishing turntable 61, wherein four outer circumferential edge rough polishing members 62, four upper port edge rough polishing members 64, and four lower port edge rough polishing members 66 are arranged at intervals in order, that is, the outer circumferential edge rough polishing members 62, the upper port edge rough polishing members 64, the lower port edge rough polishing members 66, … …, the outer circumferential edge rough polishing members 62, the upper port edge rough polishing members 64, the lower port edge rough polishing members 66.

The outer circumferential edge rough polishing assembly 62 is used to rough polish the outer circumferential edge of the wafer 100 (i.e., the outer circumferential surface of the wafer 100). Referring to fig. 10, a cross-sectional view of fig. 8 is shown along line A-A. Referring to fig. 7 and 10, the outer circumferential edge rough polishing assembly 62 includes a turning body 621 pivotally coupled to an edge of the rough polishing turntable 61, an outer circumferential edge rough polishing member 623 provided at a bottom of the turning body 621, and a sheet 625 provided at a top of the turning body 621.

Please refer to fig. 11, which is a partially enlarged view of the portion L in fig. 10. As shown in fig. 11, the outer circumferential edge rough polishing member 623 in the outer circumferential edge rough polishing assembly 62 has a flat polishing portion or a convex polishing portion for contacting the outer circumferential edge of the wafer.

The upper port edge rough polishing assembly 64 is used to rough polish the upper port edge of the wafer 100 (i.e., the outer edge of the wafer 100). Please refer to fig. 12, which is a cross-sectional view taken along line B-B in fig. 8. Referring to fig. 7 and 12, the upper port edge rough polishing module 64 includes a turning body 641 pivotally coupled to an edge of the rough polishing turntable 61, an upper port edge rough polishing member 643 provided at a bottom of the turning body 641, and a sheet 645 provided at a top of the turning body 641.

Please refer to fig. 13, which is a partially enlarged view of the portion M in fig. 12. As shown in fig. 13, the upper port edge rough polish 643 in the upper port edge rough polish assembly 64 has an upper wedge polish for contacting the upper port edge of the wafer.

The lower port edge rough polishing assembly 66 is used to rough polish the lower port edge of the wafer 100 (i.e., the outer edge lower edge of the wafer 100). Referring to FIG. 14, a cross-sectional view of the device of FIG. 8 is shown along line C-C. Referring to fig. 7 and 14, the lower edge rough polishing assembly 66 includes a turning body 661 coupled to an edge of the rough polishing turntable 61, a lower edge rough polishing member 663 provided at a bottom of the turning body 661, and a sheet 665 provided at a top of the turning body 661.

Please refer to fig. 15, which is a partial enlarged view of the portion N in fig. 14. As shown in fig. 15, the lower port edge rough polishing member 663 in the lower port edge rough polishing assembly 66 has a lower wedge-shaped polishing portion for contacting the lower port edge of the wafer.

In some embodiments, in the edge rough polishing assembly, the edge rough polishing member and the turning body can be detachably designed. Specifically to different types of edge rough polishing assemblies: for the outer circumferential edge rough polishing component 62, the outer circumferential edge rough polishing piece 623 and the turning body 621 are detachably connected. For the upper port edge rough polishing assembly 64, the upper port edge rough polishing piece 643 is detachably connected to the turning body 641. For the lower port edge rough polishing assembly 66, the lower port edge rough polishing member 663 is detachably connected to the overturning body 661. Such a design ensures that the edge rough polishing elements can be updated, for example, when the outer circumferential edge rough polishing elements in one of the outer circumferential edge rough polishing assemblies 62 deteriorate in polishing performance due to continued use, the old outer circumferential edge rough polishing elements can be replaced with new outer circumferential edge rough polishing elements. On the other hand, the type of replacement of the edge rough polishing member may be made, for example, the outer circumferential edge rough polishing member in the outer circumferential edge rough polishing assembly, the upper circumferential edge rough polishing member in the upper circumferential edge rough polishing assembly, and the lower circumferential edge rough polishing member in the lower circumferential edge rough polishing assembly on the rough polishing turntable 61 may be replaced with any one of the outer circumferential edge rough polishing member, the upper circumferential edge rough polishing member, and the lower circumferential edge rough polishing member.

As described above, the turning body may be pivotally connected to the rough polishing turntable 61 by a rotation shaft. Under certain conditions, the turning bodies can be turned relative to the rough polishing turntable 61 by the rotating shaft, so that the relative position between the edge rough polishing piece and the edge of the wafer 100 can be adjusted. In an embodiment, a blade may be disposed on the turning body in the edge rough polishing assembly, where the blade forms a draft angle with a tangent line of the turning body. Specifically, a leaf 625 is provided on top of the turning body 621 of the outer peripheral edge rough polishing assembly 62, a leaf 645 is provided on top of the turning body 641 of the upper peripheral edge rough polishing assembly 64, and a leaf 665 is provided on top of the turning body 661 of the lower peripheral edge polishing assembly 66. In practical application, the blades and the turning body form a guiding inclination angle, and in the process of rotating the rough polishing turntable 61, the blades generate air flow, and the generated air flow drives the blades and the turning body below the blades to turn over by a preset amplitude relative to the rough polishing turntable 61 through the rotating shaft, wherein the turning over can comprise feeding towards the center of the rough polishing turntable 61 or withdrawing away from the center of the rough polishing turntable 61, so that the feeding quantity is adjusted. Specifically, during the rotation of the rough polishing turntable 61, the sheet 625 on the outer circumferential edge rough polishing component 62 drives the turning body 621 and the outer circumferential edge rough polishing piece 623 below it to turn over by a predetermined magnitude with respect to the rough polishing turntable 61 under the turbulent air flow, see fig. 10. During the rotation of the rough polishing turntable 61, the sheet 645 of the upper edge rough polishing component 64 drives the turning body 641 and the upper edge rough polishing pieces 643 thereunder to turn over a predetermined width with respect to the rough polishing turntable 61 under the turbulent air flow, see fig. 12. During the rotation of the rough polishing turntable 61, the sheet 665 on the bottom edge rough polishing assembly 66 drives the turning body 661 and the bottom edge rough polishing member 663 below to turn over a predetermined magnitude with respect to the rough polishing turntable 61 under the turbulent air flow, see fig. 14.

In the embodiment shown in fig. 7 and 8, the sheets in each of the edge coarse polishing assemblies are of a substantially flat sheet-like configuration with the sheets being at an oblique angle to the edge polishing member to effect a predetermined degree of flipping of the edge polishing member relative to one another during rotation of the coarse polishing turntable 61.

In practice, the shape of the blades and the angle of incidence of the blades with the turning body may vary from one setting to another. Taking the shape of a sheet as an example, in some embodiments, the sheet may employ a corner structure connected by at least two flaps at an angle. In some embodiments, the sheet may be in an arcuate or streamlined configuration. In addition, the rough polishing turntable 61 may be used alone or in combination with the shape of the sheet and the inclination angle of the sheet and the edge polishing member, and the rotation direction and rotation speed of the rough polishing turntable 61 may be varied in different designs.

Taking the guiding inclination angle of the blade and the turning body as an example, in some embodiments, the blade is an adjustable blade arranged on the top of the turning body, and before the wafer 100 is subjected to the edge rough polishing, the adjustable blade can be operated in advance, and the guiding inclination angle of the adjustable blade and the turning body can be adjusted by a technician. In some applications, the adjustable blade has a plurality of adjustable gears, providing for adjustment of a plurality of draft angles. In some applications, the adjustable blade may be connected to a blade adjustment motor, and the blade adjustment motor is used to drive the adjustable blade to adjust the tilt angle of the flow, where the adjustment of the tilt angle of the flow may be performed not only during the edge rough polishing operation of the wafer by the edge rough polishing assembly, but also in a non-operating state of the edge rough polishing assembly.

The rough polishing turntable displacement mechanism is used to drive the rough polishing turntable 61 and the edge rough polishing components to displace. In an embodiment, the rough polishing turntable 61 is located directly above the wafer carrier, so the displacement mechanism may be, for example, a lift mechanism that may drive the rough polishing turntable and edge rough polishing components up and down, toward or away from the wafer carrier and the wafer 100 carried thereby. In practice, the lifting mechanism may include a lifting column and a lifting motor, with which the rough polishing turntable 61 may be driven to rise or fall along the lifting column.

To ensure coordination of rotation and displacement of the rough polishing turntable 61, in some embodiments, the turntable rotation motor and the rough polishing turntable displacement mechanism may be coupled together with a controller, which coordinates control of the turntable rotation motor and the rough polishing turntable displacement mechanism. As previously described, in some embodiments, the displacement mechanism is a lift mechanism, and thus, the controller is coupled to the lift mechanism for sending a corresponding lift control command to the lift mechanism to drive the rough polishing turntable 61 to a predetermined edge rough polishing position by a lift displacement and may correspond to an edge of the wafer 100 at the edge rough polishing position. Further, the controller is connected to a turntable rotating motor of the rough polishing turntable 61 for transmitting a corresponding rotation control instruction to the rough polishing turntable 61 to control the rotation direction and the rotation speed of the rough polishing turntable 61. The controller may also be connected to a susceptor rotating motor of the wafer susceptor, if necessary, for sending corresponding rotation control instructions to the wafer susceptor to control the rotation direction and speed of the wafer susceptor.

Please refer to fig. 9, which is a partially enlarged view of the V portion in fig. 8. In an embodiment, for any one of the edge rough polishing elements, the sheet is at an oblique angle to the edge polishing element, essentially the angle of the sheet to the direction of rotation (which coincides with the tangent of the edge rough polishing element on the rough polishing turntable 61). As shown in fig. 9, for example, the upper port edge rough polishing assembly 64 has an angle α and an angle β between the sheet 645 and the edge polishing member, wherein the angle α between the sheet 645 and the clockwise rotation direction and the angle β between the sheet 645 and the counterclockwise rotation direction. Other outer circular edge rough polishing assemblies 62 and lower port edge rough polishing assemblies 66 may refer to upper port edge rough polishing assemblies 64. However, it should be noted that, for the same type of rough polishing assembly (the outer circular edge rough polishing assembly 62, the upper opening edge rough polishing assembly 64, or the lower opening edge rough polishing assembly 66), the inclination angles of the sheets to which they belong are the same, but different types of rough polishing assemblies may be flexibly changed, that is, the inclination angles of the sheets in the outer circular edge rough polishing assembly 62, the inclination angles of the sheets in the upper opening edge rough polishing assembly 64, or the inclination angles of the sheets in the lower opening edge rough polishing assembly 66 may be different.

Taking the edge rough polishing assembly in fig. 7 and 8 as an example, when the rough polishing turntable 61 is driven to rotate clockwise, an included angle α between a sheet on any one of the edge rough polishing assemblies and a rotation direction of the rough polishing turntable 61 is an acute angle, the sheet generates an air flow in a clockwise rotation process of the rough polishing turntable 61, and the generated air flow drives a turning body below the sheet and an edge rough polishing member to turn towards a center of the rough polishing turntable 61 through a rotating shaft to realize feeding, and the edge rough polishing member is used for performing edge rough polishing operation on the wafer 100. Specifically to different types of edge rough polishing assemblies: for the outer circular edge rough polishing component 62, during the rotation of the rough polishing turntable 61, the blades 625 generate air flows during the clockwise rotation of the rough polishing turntable 61, and the air flows can cause the blades 625 in the outer circular edge rough polishing component 62 to drive the turning body 621 and the outer circular edge rough polishing piece 623 below the turning body to turn towards the center of the rough polishing turntable 61 through the rotating shaft so as to realize feeding, and the outer circular edge rough polishing piece 623 is used for rough polishing the outer circular edge of the wafer 100. For the upper edge rough polishing component 64, during the rotation of the rough polishing turntable 61, the blades 645 generate air flows during the clockwise rotation of the rough polishing turntable 61, and these air flows can cause the blades 645 in the upper edge rough polishing component 64 to drive the turning body 641 and the upper edge rough polishing pieces 643 below to turn towards the center of the rough polishing turntable 61 through the rotating shaft to realize feeding, and the upper edge rough polishing pieces 643 are utilized to perform rough polishing operation on the upper edge of the wafer 100. For the lower edge rough polishing assembly 66, during the rotation of the rough polishing turntable 61, the blades 665 generate air flows during the clockwise rotation of the rough polishing turntable 61, and the air flows can cause the blades 665 in the lower edge rough polishing assembly 66 to drive the turning body 661 and the lower edge rough polishing piece 663 below the turning body to turn towards the center of the rough polishing turntable 61 through the rotating shaft so as to realize feeding, and the lower edge rough polishing piece 663 is utilized to perform rough polishing operation on the lower edge of the wafer 100. It is noted that the outer circumferential edge of the wafer 100 is rough polished by the outer circumferential edge rough polishing member 623, and in order to make the outer circumferential edge of the wafer smooth, when the rough polishing turntable 61 rotates clockwise, the sheet 625 drives the turning body 621 and the outer circumferential edge rough polishing member 623 thereunder to turn over toward the center of the rough polishing turntable 61 through the rotation shaft, the outer circumferential edge rough polishing member 623 is maintained in a vertical state, i.e., a polished portion of the outer circumferential edge rough polishing member 623 contacting the outer circumferential edge of the wafer 100 is made in a vertical state.

Taking the edge rough polishing assembly in fig. 7 and 8 as an example, when the rough polishing turntable 61 is driven to rotate anticlockwise, an included angle β between a sheet on any one edge rough polishing assembly and a rotation direction of the rough polishing turntable 61 is an obtuse angle, the sheet generates air flow in the anticlockwise rotation process of the rough polishing turntable 61, and the generated air flow drives the turning body below the sheet and the edge rough polishing member to turn back to the center of the rough polishing turntable 61 through the rotating shaft so as to exit. Specifically to different types of edge rough polishing assemblies: for the outer circular edge rough polishing component 62, in the process of rotating the rough polishing turntable 61, the blades 625 generate air flows in the process of rotating the rough polishing turntable 61 anticlockwise, and the air flows can cause the blades 625 in the outer circular edge rough polishing component 62 to drive the turning body 621 and the outer circular edge rough polishing piece 623 below the turning body to turn back to the center of the rough polishing turntable 61 through the rotating shaft so as to exit. For the upper edge rough polishing component 64, during the rotation of the rough polishing turntable 61, the blades 645 generate air flows during the counterclockwise rotation of the rough polishing turntable 61, and the air flows can cause the blades 645 in the upper edge rough polishing component 64 to drive the turning body 641 and the upper edge rough polishing piece 643 below the turning body to turn back to the center of the rough polishing turntable 61 through the rotating shaft so as to withdraw. For the lower edge rough polishing assembly 66, during the rotation of the rough polishing turntable 61, the blades 665 generate air flows during the counterclockwise rotation of the rough polishing turntable 61, and the air flows can cause the blades 665 in the lower edge rough polishing assembly 66 to drive the turning body 661 and the lower edge rough polishing member 663 below to be turned back to the center of the rough polishing turntable 61 through the rotating shaft so as to withdraw.

As described above, the rough polishing turntable 61 is rotated by the turntable rotating motor, so that the wafer carrier and the wafer 100 thereon can be rotated by the carrier rotating motor while the rough polishing turntable 61 is driven to rotate clockwise or counterclockwise and the edge rough polishing process is performed on the wafer 100 by the edge rough polishing components (including the outer edge rough polishing member 62, the upper edge rough polishing member 64, and the lower edge rough polishing member 66). In some embodiments, the rough polishing turntable 61 and the wafer carrier may be rotated in a counter-current manner, i.e., when the rough polishing turntable 61 is rotated clockwise, the wafer carrier and the wafer 100 thereon are rotated counterclockwise; when the rough polishing turntable 61 rotates counterclockwise, the wafer carrier and the wafer 100 thereon rotate clockwise. This manner of operation increases the efficiency of rough polishing of the edge of the wafer 100. However, the present invention is not limited thereto, and in other embodiments, the rough polishing turntable 61 and the wafer carrier may be rotated in the same direction, i.e., when the rough polishing turntable 61 rotates clockwise, the wafer carrier and the wafer 100 thereon rotate clockwise; when the rough polishing turntable 61 rotates counterclockwise, the wafer carrier and the wafer 100 thereon rotate counterclockwise. However, in the co-rotating mode of operation, the wafer carrier is rotated at a lower rotational speed than the rough polishing turntable 61. In the above embodiment, the rotation speed of the wafer carrier may be adjusted and controlled by the carrier rotating motor, and the rotation speed of the rough polishing turntable 61 may be adjusted and controlled by the turntable rotating motor, both for the wafer carrier and the rough polishing turntable 61.

When the wafer edge rough polishing device is used for performing edge rough polishing operation on the wafer 100, the rotary motor of the turntable sends a corresponding rotation control instruction to the rough polishing turntable 61, and the rough polishing turntable 61 is driven to rotate in a first rotation direction, so that the turning bodies and the edge rough polishing pieces in the plurality of edge polishing assemblies on the rough polishing turntable 61 are turned outwards relative to the rough polishing turntable 61 under the driving of the sheets; in a state where the rough polishing turntable is kept rotating in the first direction, the lifting mechanism is caused to send a corresponding lifting control instruction to drive the rough polishing turntable 61 to a predetermined edge rough polishing position by lifting and shifting, so that each edge rough polishing component (including the outer circular edge rough polishing component 62, the upper opening edge rough polishing component 64, and the lower opening edge rough polishing component 66) of the periphery of the rough polishing turntable 61 corresponds to the edge of the wafer 100 at the edge rough polishing position, so that the wafer 100 falls into the polishing space surrounded by the plurality of edge rough polishing components. The rotary motor of the rotary table sends a corresponding rotation control instruction to the rough polishing rotary table 61, and drives the rough polishing rotary table 61 to rotate in a second rotation direction, so that the turning main body and the edge rough polishing pieces in the plurality of edge rough polishing assemblies on the rough polishing rotary table 61 are turned inwards relative to the rough polishing rotary table 61 under the driving of the sheet, and edge rough polishing operations (including an outer circular edge rough polishing operation, an upper opening edge rough polishing operation and a lower opening edge rough polishing operation) are performed on the wafer 100 by the edge rough polishing pieces in the plurality of edge rough polishing assemblies (including an outer circular edge rough polishing assembly 62, an upper opening edge rough polishing assembly 64 and a lower opening edge rough polishing assembly 66). In practical applications, when the wafer carrier is provided with a carrier rotating motor, then the carrier rotating motor may be caused to drive the wafer carrier to rotate in the second direction when the rough polishing turntable 61 is driven to rotate in the first direction by the turntable rotating motor.

The second wafer edge polishing apparatus 7 is disposed on the second edge polishing location 15 of the wafer work platform for performing a second edge polishing operation on the edge (except for the notch) of the wafer 100. In an embodiment, the second wafer edge polishing device 7 may be, for example, a wafer edge polishing device for performing an edge polishing operation on the edge (except for the notch) of the wafer 100.

The wafer edge finish polishing device comprises a wafer bearing table and a wafer edge finish polishing mechanism.

The wafer carrier is disposed at a center position of the second edge polishing zone 15 for supporting the wafer 100. Of course, the top of the wafer carrier may further include an adsorption unit, and the wafer carrier supports the back of the wafer 100 and maintains a certain space with the wafer carrier to communicate with the atmosphere to generate negative pressure, so that the wafer 100 is not damaged while the wafer 100 is stably supported. The wafer carrier may be a circular table adapted to the wafer 100, but is not limited thereto, and may be a rectangular table, a triangular table, or other similar structures. When the wafer 100 is held by the wafer carrier, the wafer 100 is in a horizontal state. In an embodiment, the wafer carrier may be configured to be capable of rotation, for example, the wafer carrier is movably disposed on the wafer working platform through a rotating shaft, and the rotating shaft is connected to a carrier rotating motor to implement the rotation. Thus, after the wafer carrier supports the wafer 100, the wafer carrier can drive the wafer 100 thereon to rotate under the control of the carrier rotating motor. In practical application, the rotating motor of the bearing table can send corresponding rotation control instructions to the wafer bearing table so as to control the rotation direction and the rotation speed of the wafer bearing table.

Generally, since the wafer is subjected to pretreatment such as notch detection by the wafer detecting device and centering by the wafer centering device on the pretreatment location 11, notch detection and centering of the wafer 100 are unnecessary when the wafer 100 is transferred onto the wafer stage of the second edge polishing location 15 by the transfer robot 93 in the wafer transfer device 9. However, in some embodiments, if desired, a wafer inspection device or wafer centering device may be provided on, for example, the second edge polishing location 15 or other similar location thereafter.

In general, the structural composition and operation principle of the wafer edge polishing apparatus and the wafer edge rough polishing apparatus are substantially the same, and thus, reference is made to fig. 7 to 15 in the following description of the wafer edge polishing apparatus and its respective constituent parts.

The wafer edge polishing mechanism is used for performing edge polishing operation on the wafer 100 carried by the wafer carrying table. In an embodiment, a wafer edge finish polishing mechanism is disposed above a wafer carrier, the wafer edge finish polishing mechanism may comprise: finish polishing carousel, edge finish polishing subassembly, carousel rotating electrical machines, finish polishing carousel shift mechanism.

The finish polishing turntable is connected with the turntable rotating motor through a rotating shaft and can be controlled to rotate by the turntable rotating motor. The finish polishing turntable can be arranged on the cover body structure of the wafer multi-station edge polishing equipment through a rotating shaft and is positioned right above the wafer bearing table. In practical application, the rotary motor of the turntable can send corresponding rotation control instructions to the finish polishing turntable so as to control the rotation direction and the rotation speed of the finish polishing turntable.

The edge of the finish polishing rotary table is uniformly provided with a plurality of edge finish polishing components, wherein each edge finish polishing component comprises a turning main body, an edge finish polishing piece and a sheet, the turning main body is connected with the edge of the finish polishing rotary table in a shaft mode, the edge finish polishing piece is arranged at the bottom of the turning main body, the sheet is arranged at the top of the turning main body, the edge finish polishing piece has second roughness, and the second roughness of the edge finish polishing piece is smaller than the first roughness of the edge rough polishing piece.

Since the edge of the wafer 100 needs to be rounded after performing the edge finishing operation on the edge of the wafer 100, the edge finishing assembly may further include: the outer circle edge polishing device comprises an outer circle edge polishing device, an upper opening edge polishing device and a lower opening edge polishing device, wherein the outer circle edge polishing device, the upper opening edge polishing device and the lower opening edge polishing device are sequentially arranged at intervals. For example, in an exemplary embodiment, twelve edge finishing assemblies may be uniformly disposed on the circumference of the finishing turntable, wherein four outer edge finishing assemblies, four upper edge finishing assemblies, and four lower edge finishing assemblies are sequentially spaced apart, i.e., outer edge finishing assemblies, upper edge finishing assemblies, lower edge finishing assemblies, … …, outer edge finishing assemblies, upper edge finishing assemblies, lower edge finishing assemblies.

The outer circumferential edge finishing assembly is used for finishing the outer circumferential edge of the wafer 100 (i.e., the outer circumferential surface of the wafer 100). In an embodiment, the outer circular edge finishing polishing assembly comprises a turning main body, an outer circular edge finishing polishing piece and a sheet, wherein the turning main body is connected with the edge of the finishing polishing turntable in a shaft mode, the outer circular edge finishing polishing piece is arranged at the bottom of the turning main body, and the sheet is arranged at the top of the turning main body. In an exemplary embodiment, the outer edge finishing member in the outer edge finishing assembly has a flat or convex polishing portion for contacting an outer edge of a wafer.

The upper port edge finishing assembly is used to finish the upper port edge of the wafer 100 (i.e., the outer edge of the wafer 100). In an embodiment, the upper edge finish polishing assembly comprises a turning body, an upper edge finish polishing piece and a sheet, wherein the turning body is connected with the edge of the finish polishing turntable in a shaft mode, the upper edge finish polishing piece is arranged at the bottom of the turning body, and the sheet is arranged at the top of the turning body. In an exemplary embodiment, the upper port edge finishing member in the upper port edge finishing assembly has an upper wedge-shaped polishing part for contacting the upper port edge of the wafer.

The lower port edge finishing assembly is used to finish the lower port edge of the wafer 100 (i.e., the outer edge lower edge of the wafer 100). In an embodiment, the lower mouth edge finish polishing assembly comprises a turning body, a lower mouth edge finish polishing piece and a sheet, wherein the turning body is connected with the edge of the finish polishing turntable in a shaft mode, the lower mouth edge finish polishing piece is arranged at the bottom of the turning body, and the sheet is arranged at the top of the turning body. In an exemplary embodiment, the lower port edge finishing member in the lower port edge finishing assembly has a lower wedge-type polishing portion for contacting a lower port edge of a wafer.

In some embodiments, the edge finishing assembly may include an edge finishing member and a turning body that are removably designed. In particular to different types of edge finishing assemblies: aiming at the outer circle edge finish polishing component, the outer circle edge finish polishing piece is detachably connected with the overturning main body. For the upper port edge finish polishing component, an upper port edge finish polishing piece is detachably connected with the overturning main body. The lower port edge finish polishing piece is detachably connected with the overturning main body. Such a design ensures that the edge finishing member can be updated, for example, when the outer edge finishing member in a certain outer edge finishing assembly is deteriorated in polishing performance due to continuous use, the old outer edge finishing member can be replaced with a new outer edge finishing member. The edge finishing polishing member may be replaced by another type, for example, an outer edge finishing polishing member in an outer edge finishing polishing member on a finishing polishing turntable, an upper edge finishing polishing member in an upper edge finishing polishing member, and a lower edge finishing polishing member in a lower edge finishing polishing member may be replaced by one and the same of any of the outer edge finishing polishing member, the upper edge finishing polishing member, and the lower edge finishing polishing member.

As mentioned above, the turning body may be pivotally connected to the finish polishing turntable by a rotating shaft. Under certain conditions, the overturning bodies can overturn relative to the fine polishing turntable through the rotating shaft, so that the relative position between the edge fine polishing piece and the edge of the wafer 100 can be adjusted. In an embodiment, a blade may be disposed on the turning body in the edge finishing assembly, where the blade forms a draft angle with a tangent line of the turning body. Specifically, a leaf is arranged at the top of the turning main body of the outer circle edge finish polishing component, a leaf is arranged at the top of the turning main body of the upper opening edge finish polishing component, and a leaf is arranged at the top of the turning main body of the lower opening edge polishing component. In practical application, the blades and the overturning main body form a flow guiding inclination angle, in the rotating process of the finish polishing turntable, the blades can generate air flow, the generated air flow can drive the blades and the overturning main body below the blades to overturn by a preset amplitude relative to the finish polishing turntable through the rotating shaft, and the overturning can comprise feeding towards the center of the finish polishing turntable or withdrawing away from the center of the finish polishing turntable, so that the effect of adjusting the feeding amount is achieved. Specifically, in the process of rotating the finish polishing turntable, the sheet on the outer circle edge finish polishing assembly can drive the overturning main body and the outer circle edge finish polishing piece below the overturning main body to overturn by a preset amplitude relative to the finish polishing turntable under the turbulent airflow. In the rotating process of the finish polishing rotary table, the page piece on the upper opening edge finish polishing component can drive the overturning main body and the upper opening edge finish polishing piece below the overturning main body to overturn by a preset amplitude relative to the finish polishing rotary table under the turbulent airflow. In the rotating process of the finish polishing rotary table, the page piece on the lower opening edge finish polishing component can drive the overturning main body and the lower opening edge finish polishing piece below the overturning main body to overturn by a preset amplitude relative to the finish polishing rotary table under the turbulent airflow.

For the sheet, the sheet in each edge finish polishing assembly is basically in a straight sheet structure, and the sheet and the edge polishing piece form a certain inclination angle, so that the edge polishing piece can turn over relatively by a preset amplitude in the process of rotating the finish polishing turntable.

In practice, the shape of the blades and the angle of incidence of the blades with the turning body may vary from one setting to another. Taking the shape of a sheet as an example, in some embodiments, the sheet may employ a corner structure connected by at least two flaps at an angle. In some embodiments, the sheet may be in an arcuate or streamlined configuration. In addition, the finish polishing rotary table can be independently or combined with the shape of the sheet and the inclination angle of the sheet and the edge polishing piece, and the rotation direction and the rotation speed of the finish polishing rotary table can be changed in different designs.

Taking the guiding inclination angle of the blade and the turning body as an example, in some embodiments, the blade is an adjustable blade arranged on the top of the turning body, and before the edge finish polishing of the wafer 100 is performed, the adjustable blade can be operated in advance, and the guiding inclination angle of the adjustable blade and the turning body can be adjusted by a technician. In some applications, the adjustable blade has a plurality of adjustable gears, providing for adjustment of a plurality of draft angles. In some applications, the adjustable blade may be connected to a blade adjustment motor, the blade adjustment motor is used to drive the adjustable blade to adjust the guiding tilt angle, and the operation of adjusting the guiding tilt angle may be performed not only during the process of performing the edge polishing operation on the wafer by the edge polishing assembly, but also in the non-working state of the edge polishing assembly.

The fine polishing turntable shifting mechanism is used for driving the fine polishing turntable and the edge fine polishing assembly to shift. In an embodiment, the finish polishing turntable is located directly above the wafer carrier, so the displacement mechanism may be, for example, a lifting mechanism that may drive the finish polishing turntable and edge finish polishing assembly up and down, toward or away from the wafer carrier and the wafer 100 carried thereby. In practical applications, the lifting mechanism may include a lifting column and a lifting motor, and the lifting motor may be used to drive the finish polishing turntable to ascend or descend along the lifting column.

To ensure coordination of the rotation and displacement of the finish polishing turntable, in some embodiments, the turntable rotating motor and the finish polishing turntable displacement mechanism may be coupled together with a controller, which coordinates the control of the turntable rotating motor and the finish polishing turntable displacement mechanism. As previously described, in some embodiments, the displacement mechanism is a lift mechanism, and thus, the controller is coupled to the lift mechanism for sending a corresponding lift control command to the lift mechanism to drive the finish polishing turntable to a predetermined edge finish polishing position by a lift displacement and may correspond to an edge of the wafer 100 at the edge finish polishing position. In addition, the controller is connected with a turntable rotating motor of the finish polishing turntable and is used for sending corresponding rotation control instructions to the finish polishing turntable so as to control the steering and rotating speed of the finish polishing turntable. The controller may also be connected to a susceptor rotating motor of the wafer susceptor, if necessary, for sending corresponding rotation control instructions to the wafer susceptor to control the rotation direction and speed of the wafer susceptor.

In an embodiment, for any edge finishing assembly, the sheet is at an oblique angle to the edge finishing member, essentially the oblique angle being the angle between the sheet and the direction of rotation (which coincides with the tangent of the edge finishing assembly on the finishing turntable). Taking the edge finishing assembly of the upper opening as an example, the included angles of the sheet and the edge finishing piece are alpha and beta, wherein the included angle of the sheet and the clockwise rotation direction is alpha, and the included angle of the sheet and the anticlockwise rotation direction is beta. Other outer circular edge finishing assemblies and lower port edge finishing assemblies may refer to upper port edge finishing assemblies. However, it should be noted that, for the same type of finishing assembly (such as the outer peripheral edge finishing assembly, the upper peripheral edge finishing assembly, or the lower peripheral edge finishing assembly), the inclination angles of the sheets to which they belong are the same, but the inclination angles of the sheets in the outer peripheral edge finishing assembly, the inclination angles of the sheets in the upper peripheral edge finishing assembly, or the inclination angles of the sheets in the lower peripheral edge finishing assembly may be different, which may be flexibly changed.

Taking the edge polishing assembly as an example, when the edge polishing turntable is driven to rotate clockwise, an included angle alpha between a leaf on any edge polishing assembly and the rotating direction of the polishing turntable is an acute angle, the leaf generates air flow in the clockwise rotating process of the polishing turntable, the generated air flow drives a turning main body below the leaf and an edge polishing piece to turn towards the center of the polishing turntable through a rotating shaft to realize feeding, and the edge polishing piece is utilized to carry out edge polishing operation on the wafer 100. In particular to different types of edge finishing assemblies: for the outer circle edge finish polishing assembly, in the process of rotating the finish polishing turntable, the blades can generate air flows in the process of rotating the finish polishing turntable clockwise, the air flows can cause the blades in the outer circle edge finish polishing assembly to drive the overturning main body and the outer circle edge finish polishing piece below the overturning main body to overturn towards the center of the finish polishing turntable through the rotating shaft so as to realize feeding, and the outer circle edge finish polishing piece is utilized to finish polishing the outer circle edge of the wafer 100. For the upper port edge finish polishing assembly, in the process of rotating the finish polishing turntable, the blades can generate air flows in the process of rotating the finish polishing turntable clockwise, the air flows can drive the blades in the upper port edge finish polishing assembly to drive the overturning main body and the upper port edge finish polishing piece below the overturning main body to overturn towards the center of the finish polishing turntable through the rotating shaft so as to realize feeding, and the upper port edge finish polishing piece is utilized to finish polishing the upper port edge of the wafer 100. To the finish polishing subassembly of lower mouth edge, at the rotatory in-process of finish polishing carousel, the leaf can produce the air current at the clockwise in-process of finish polishing carousel, and these air currents can impel the leaf in the finish polishing subassembly of lower mouth edge to drive upset main part and lower mouth edge finish polishing spare down through the pivot towards finish polishing carousel center upset realization feeding, utilize the finish polishing of lower mouth edge spare to carry out finish polishing operation to the lower mouth edge of wafer 100. It is noted that, the outer peripheral edge polishing member is utilized to perform the polishing operation on the outer peripheral edge of the wafer 100, so that the polishing portion of the outer peripheral edge polishing member contacting with the outer peripheral edge of the wafer 100 is in a vertical state when the turning body and the outer peripheral edge polishing member thereunder are turned over toward the center of the polishing turntable by the rotating shaft when the polishing turntable rotates clockwise, i.e., the polishing portion of the outer peripheral edge polishing member contacting with the outer peripheral edge of the wafer 100 is in a vertical state.

Taking the edge finish polishing assembly as an example, when the finish polishing turntable is driven to rotate anticlockwise, an included angle beta between a leaf on any edge finish polishing assembly and the rotating direction of the finish polishing turntable is an obtuse angle, the leaf can generate air flow in the anticlockwise rotating process of the finish polishing turntable, and the generated air flow can drive a turnover main body below the leaf and an edge finish polishing piece to turn back to the center of the finish polishing turntable through a rotating shaft so as to realize withdrawal. In particular to different types of edge finishing assemblies: for the outer circle edge finish polishing component, in the process of rotating the finish polishing turntable, the blades can generate air flows in the process of rotating the finish polishing turntable anticlockwise, and the air flows can cause the blades in the outer circle edge finish polishing component to drive the overturning main body and the outer circle edge finish polishing piece below the overturning main body to overturn back to the center of the finish polishing turntable through the rotating shaft so as to realize withdrawal. For the upper port edge finish polishing component, in the process of rotating the finish polishing turntable, the blades can generate air flows in the process of rotating the finish polishing turntable anticlockwise, and the air flows can drive the blades in the upper port edge finish polishing component to drive the overturning main body and the upper port edge finish polishing piece below the overturning main body to overturn back to the center of the finish polishing turntable through the rotating shaft so as to realize withdrawal. To the finish polishing subassembly of lower mouth edge, at finish polishing carousel pivoted in-process, the leaf can produce the air current at finish polishing carousel anticlockwise pivoted in-process, and these air currents can impel the leaf in the finish polishing subassembly of lower mouth edge to drive the upset main part and the finish polishing piece of lower mouth edge under with through the pivot back finish polishing carousel center upset realization to withdraw from.

As described above, the polishing turntable is controlled to rotate by the turntable rotating motor, so that the wafer carrier and the wafer 100 thereon can be rotated by the carrier rotating motor when the polishing turntable is driven to rotate clockwise or counterclockwise and the edge polishing assembly (including the outer edge polishing member, the upper edge polishing member, and the lower edge polishing member) performs the edge polishing operation on the wafer 100. In some embodiments, the finish polishing turntable and the wafer carrier may be rotated in a counter-current manner, i.e., when the finish polishing turntable rotates clockwise, the wafer carrier and the wafer 100 thereon rotate counterclockwise; when the finish polishing turntable rotates counterclockwise, the wafer carrier and the wafer 100 thereon rotate clockwise. This manner of operation increases the efficiency of the finish polishing of the edge of the wafer 100. However, the present invention is not limited thereto, and in other embodiments, the polishing turntable and the wafer carrier may be rotated in the same direction, i.e., when the polishing turntable rotates clockwise, the wafer carrier and the wafer 100 thereon rotate clockwise; when the finish polishing turntable rotates counterclockwise, the wafer carrier and the wafer 100 thereon rotate counterclockwise. However, in the co-rotating mode of operation, the wafer carrier is rotated at a lower rotational speed than the finish polishing turntable. In the above embodiment, the rotation speed of the wafer carrier may be adjusted and controlled by the carrier rotating motor, and the rotation speed of the finish polishing turntable may be adjusted and controlled by the turntable rotating motor, both for the wafer carrier and the finish polishing turntable.

When the wafer edge finish polishing device is used for performing edge finish polishing operation on the wafer 100, the rotary motor of the turntable sends a corresponding rotation control instruction to the finish polishing turntable, and the finish polishing turntable is driven to rotate in a first rotation direction, so that the turning main bodies and the edge finish polishing pieces in a plurality of edge polishing assemblies on the finish polishing turntable are turned outwards relative to the finish polishing turntable under the drive of the sheets; in a state that the finish polishing turntable is kept to rotate in a first direction, the lifting mechanism sends a corresponding lifting control instruction to drive the finish polishing turntable to reach a preset edge finish polishing position through lifting displacement, so that each edge finish polishing component (comprising an outer circle edge finish polishing component, an upper opening edge finish polishing component and a lower opening edge finish polishing component) on the periphery of the finish polishing turntable corresponds to the edge of the wafer 100 at the edge finish polishing position, and the wafer 100 falls into a polishing space surrounded by a plurality of edge finish polishing components. The rotary motor of the rotary table sends a corresponding rotation control instruction to the finish polishing rotary table, the finish polishing rotary table is driven to rotate in a second steering mode, a turning main body and an edge finish polishing piece in a plurality of edge finish polishing assemblies on the finish polishing rotary table are driven by a sheet to turn inwards relative to the finish polishing rotary table, and edge finish polishing operations (including an outer circle edge finish polishing operation, an upper opening edge finish polishing operation and a lower opening edge finish polishing operation) are carried out on the wafer 100 by the edge finish polishing piece in the plurality of edge finish polishing assemblies (including the outer circle edge finish polishing assembly, the upper opening edge finish polishing assembly and the lower opening edge finish polishing assembly). In practical applications, when the wafer carrier is provided with a carrier rotating motor, the carrier rotating motor may be caused to drive the wafer carrier to rotate in a second direction when the turntable rotating motor drives the finish polishing turntable to rotate in the first direction.

In the foregoing, it is known that the first wafer edge polishing device 6 may be, for example, a wafer edge rough polishing device, for performing an edge rough polishing operation on an edge of a wafer, and the second wafer edge polishing device 7 may be, for example, a wafer edge finish polishing device, for performing an edge finish polishing operation on an edge of a wafer, but not limited thereto, and in other embodiments, the first wafer edge polishing device 6 and the second wafer edge polishing device 7 may be changed, for example, the edge polishing components in the first wafer edge polishing device 6 or the second wafer edge polishing device 7 may be different combinations.

Generally, the edge polishing components in the first wafer edge polishing apparatus 6 or the second wafer edge polishing apparatus 7 include any one of the group consisting of an outer circular edge polishing component, an upper port edge polishing component, and a lower port edge polishing component.

In an exemplary embodiment, the edge polishing assembly of the first wafer edge polishing apparatus 6 may include a combination of an upper mouth edge polishing assembly and an outer mouth edge polishing assembly, which are sequentially spaced apart, and the edge polishing assembly of the second wafer edge polishing apparatus 7 may include a combination of an outer mouth edge polishing assembly and a lower mouth edge polishing assembly, which are sequentially spaced apart. For example, consider the case where twelve edge polishing members are uniformly disposed on the periphery of the polishing turntable: in the first wafer edge polishing apparatus 6, six upper opening edge polishing members and six outer circumferential edge polishing members are included, which are arranged at intervals in sequence. In the second wafer edge polishing apparatus 7, six outer circumferential edge polishing members and six lower port edge polishing members are included, which are arranged at intervals in order. In this way, the first wafer edge polishing device 6 can be used for performing the upper opening edge polishing operation and the outer circular edge polishing operation on the edge of the wafer, and the second wafer edge polishing device 7 can be used for performing the outer circular edge polishing operation and the lower opening edge polishing operation on the edge of the wafer. By the first wafer edge polishing device 6 and the second wafer edge polishing device 7, on the one hand, edge polishing work on the edge of the wafer can be completed, and on the other hand, a single wafer edge polishing device performs a part of the work load of the entire edge polishing work, and the work efficiency of the edge polishing work can be improved.

In practical application, the application further discloses a wafer edge polishing device, which comprises: wafer plummer and wafer edge polishing mechanism, wherein, wafer plummer is used for bearing the wafer, and wafer edge polishing mechanism includes: polishing a turntable; each edge polishing assembly comprises a turnover main body, an edge polishing piece and a page piece, wherein the turnover main body is connected with the edge of the polishing turntable in a shaft way, the edge polishing piece is arranged at the bottom of the turnover main body, and the page piece is arranged at the top of the turnover main body; a turntable rotation motor for driving the polishing turntable to rotate; and the turntable shifting mechanism is used for driving the polishing turntable to shift to an edge polishing position corresponding to the wafer bearing table. When the wafer edge polishing device is used for edge polishing of a wafer, when the polishing turntable is driven by the turntable rotating motor to rotate in a first direction, the page sheet drives the overturning main body and the edge polishing piece to outwards overturn relative to the polishing turntable; when the polishing turntable is driven by the turntable rotating motor to rotate in a second steering mode, the page sheet drives the overturning main body and the edge polishing piece to inwards overturn relative to the polishing turntable so that the edge polishing piece performs edge polishing on a wafer.

In an exemplary embodiment, a wafer edge polishing mechanism may be provided in the wafer edge polishing apparatus, as shown in fig. 16. The edge polishing assembly in the wafer edge polishing mechanism comprises any one of an outer circle edge polishing assembly, an upper port edge polishing assembly and a lower port edge polishing assembly. For example, in a specific implementation, the wafer edge polishing apparatus includes a wafer carrier and a wafer edge polishing mechanism, where in the wafer edge polishing mechanism, an outer circular edge polishing component, an upper opening edge polishing component, and a lower opening edge polishing component may be uniformly disposed on an edge of a polishing turntable, or an outer circular edge polishing component, an upper opening edge polishing component, or a lower opening edge polishing component may be uniformly disposed on an edge of the polishing turntable, or a combination of an outer circular edge polishing component and an upper opening edge polishing component, or a combination of an outer circular edge polishing component and a lower opening edge polishing component may be uniformly disposed on an edge of the polishing turntable. In a specific implementation, the wafer edge polishing device comprises a wafer carrying table and a wafer edge rough polishing mechanism, wherein the edge rough polishing component comprises any one of an outer circle edge rough polishing component, an upper port edge rough polishing component and a lower port edge rough polishing component. For example, an outer circumferential edge rough polishing member, an upper port edge rough polishing member, and a lower port edge rough polishing member may be uniformly provided on the edge of the polishing turntable. In a specific implementation, the wafer edge polishing device comprises a wafer carrying table and a wafer edge polishing mechanism, wherein the edge polishing assembly comprises any one of the group consisting of an outer circle edge polishing assembly, an upper port edge polishing assembly and a lower port edge polishing assembly. For example, in the wafer edge finishing mechanism, an outer circular edge finishing assembly, an upper port edge finishing assembly, and a lower port edge finishing assembly may be uniformly disposed on the edge of the polishing turntable.

In an exemplary embodiment, in the wafer edge polishing apparatus, two wafer edge polishing mechanisms may be provided, see fig. 17. For example, in a specific implementation manner, the wafer edge polishing device includes two wafer carrying tables, wherein one wafer carrying table is correspondingly provided with one wafer edge rough polishing mechanism and the other wafer carrying table is correspondingly provided with one wafer edge finish polishing mechanism, in the wafer edge rough polishing mechanism, an outer circle edge rough polishing component, an upper port edge rough polishing component and a lower port edge rough polishing component can be uniformly arranged on the edge of the polishing turntable, and in the wafer edge finish polishing mechanism, an outer circle edge finish polishing component, an upper port edge finish polishing component and a lower port edge finish polishing component can be uniformly arranged on the edge of the polishing turntable. As for the structure of the wafer carrier, the wafer edge rough polishing mechanism, and the wafer edge finish polishing mechanism configured in the wafer edge polishing apparatus according to various exemplary embodiments and the working principle of the wafer edge polishing apparatus, reference is made to the foregoing description, and the description is omitted herein. In a specific implementation manner, the wafer edge polishing device comprises two wafer bearing tables and two wafer edge polishing mechanisms, wherein in one wafer edge polishing mechanism, an upper opening edge polishing assembly and an outer opening edge polishing assembly can be uniformly arranged on the edge of a polishing turntable, and in the other wafer edge polishing mechanism, an outer opening edge polishing assembly and a lower opening edge polishing assembly can be uniformly arranged on the edge of the polishing turntable. As for the wafer carrier, the wafer edge polishing mechanism, and the working principle of the wafer edge polishing apparatus configured in the wafer edge polishing apparatus according to the various exemplary embodiments may be referred to the foregoing description, and will not be described herein again.

In an exemplary embodiment, the wafer edge polishing apparatus may include three wafer carriers and three wafer edge polishing mechanisms, wherein in a first wafer edge polishing mechanism, an outer circular edge polishing member may be uniformly disposed on an edge of a polishing turntable, in a second wafer edge polishing mechanism, an upper opening edge polishing member may be uniformly disposed on an edge of the polishing turntable, and in a third wafer edge polishing mechanism, a lower opening edge polishing member may be uniformly disposed on an edge of the polishing turntable. As for the wafer carrier, the wafer edge polishing mechanism, and the working principle of the wafer edge polishing apparatus configured in the wafer edge polishing apparatus according to the various exemplary embodiments may be referred to the foregoing description, and will not be described herein again.

The wafer cleaning apparatus 8 is disposed on the post-processing region 16 of the wafer work platform for cleaning the wafer 100.

In an embodiment, the wafer cleaning apparatus 8 includes: wafer carrier and cleaning spray mechanism.

The wafer cleaning device 8 is disposed beside or above the rotating carrier for cleaning the wafer 100.

In general, with respect to a wafer cleaning apparatus, a wafer 100 is polished after a plurality of polishing processes, and polishing debris generated during the polishing processes is attached to the surface of the wafer 100, so that the wafer 100 needs to be cleaned as necessary. Generally, the wafer cleaning apparatus includes a cleaning brush head and a cleaning liquid spray head cooperating with the cleaning brush head, and during cleaning, the cleaning liquid spray head sprays cleaning liquid (e.g., pure water) against the wafer 100, and at the same time, the cleaning brush head (e.g., a rotary brush head) is driven by a motor to act on the wafer 100 to complete the cleaning operation. In some embodiments, when the wafer cleaning device 8 is used to clean the wafer 100, the wafer cleaning device 8 may be driven to move so that the nozzle on the wafer cleaning device 8 corresponds to the edge of the wafer 100, and then the nozzle on the wafer cleaning device 8 is controlled to spray the cleaning agent towards the edge of the wafer 100 for cleaning. In some embodiments, when the wafer cleaning device 8 is used to clean the wafer 100, the wafer cleaning device 8 may be driven to move so that the nozzle on the wafer cleaning device 8 corresponds to the edge of the wafer 100, and then the wafer carrier and the wafer 100 thereon are driven to rotate and the nozzle on the wafer cleaning device 8 is controlled to spray the cleaning agent toward the edge of the wafer 100 for cleaning.

The wafer multi-station edge polishing equipment disclosed by the application integrates at least the wafer notch polishing device and the wafer edge polishing device, and can be used for rapidly, stably and atraumatically transferring the wafer between the operation devices, so that the wafer can sequentially finish the wafer notch polishing operation and the wafer edge polishing operation in the same equipment, the wafer notch polishing device and the wafer edge polishing device can simultaneously perform corresponding operation on the corresponding wafer, and the production efficiency and the operation quality of wafer edge polishing are improved.

The application also discloses a wafer polishing method for performing edge polishing operation on the wafer. The wafer polishing method is applied to wafer multi-station edge polishing equipment, and the wafer multi-station edge polishing equipment comprises a machine base, a wafer loading and unloading device, a wafer detection device, a wafer notch rough polishing device, a wafer notch fine polishing device, a wafer edge rough polishing device, a wafer edge fine polishing device, a wafer cleaning device and a wafer transfer device.

In an embodiment, the multi-station edge polishing apparatus for wafers is used for polishing an edge line of a Wafer, wherein the Wafer is a Wafer-shaped silicon Wafer formed after slicing operation, and typically, the edge of the Wafer is provided with a positioning structure, and the positioning structure may be a flat edge or a notch, for example. In practical application, before slicing a columnar silicon rod, trimming (flat) or grooving (notch) is performed on the edge of the columnar silicon rod along the axial direction of the columnar silicon rod, and then slicing the columnar silicon rod to form a sheet-shaped wafer. In general, trimming (flat) is often used for small-sized columnar silicon rods (the diameter of the columnar silicon rods is, for example, 200mm (about 8 inches) or less or 150mm (about 6 inches) or less), and notching (notch) is used for large-sized silicon ingots (the diameter of the columnar silicon rods is, for example, 200mm (about 8 inches) or more), so that the waste of wafers can be reduced as much as possible while ensuring positioning. Whether wafers with flat edges or notch, the upper edge surface (the section that meets the previous wafer in the slicing process) or the lower edge surface (the section that meets the next wafer in the slicing process) or the front edge (the component part of the circumferential surface of the columnar ingot) of the wafer is rough, and sharp columnar bodies exist, and the whole wafer is fragile, and in this case, the wafer can be broken under the condition of touching and extrusion. Therefore, it is necessary to polish the edge of the wafer so that the edge of the wafer is smoother and polished. In the following description, the wafer multi-station edge polishing apparatus of the present embodiment is described with reference to a wafer with notch, but is not intended to limit the scope of the present application.

The wafer polishing method comprises the following steps:

in step S101, a wafer to be polished is loaded into the pretreatment location.

In an embodiment, the wafer multi-station edge polishing apparatus of the present application includes a wafer handling device, and the specific structure of the wafer carrying device and the wafer transferring device may be referred to in the foregoing description, and will not be described herein. The wafer is loaded into the pretreatment area by the wafer loading and unloading device.

In step S101, the step of loading the wafer to the pretreatment location by the wafer handling device may specifically include: driving a mechanical arm of the wafer loading and unloading device to move from an initial position to a wafer loading and unloading zone; controlling a mechanical arm to extract a first wafer from a wafer material box on a wafer loading and unloading zone; driving the mechanical arm to move from the wafer loading and unloading zone to the pretreatment zone, and placing the first wafer on a rotary bearing table of the pretreatment zone; the mechanical arm is driven to return to the initial position.

Step S103, performing detection operation on the wafer at the pretreatment area. In an embodiment, a wafer inspection device is correspondingly disposed on the pretreatment location, and is used for inspecting the wafer on the pretreatment location.

In step S103, the wafer is inspected by the wafer inspection apparatus including, but not limited to, wafer notch inspection. Taking wafer notch positioning as an example, when notch positioning detection is performed, the rotary bearing table on the pretreatment area is driven to drive the first wafer on the rotary bearing table to rotate, meanwhile, the wafer notch detection device detects the first wafer and determines the notch of the first wafer, and after the notch of the first wafer is detected and determined, the rotary bearing table is driven to drive the notch of the first wafer on the rotary bearing table to rotate to a designated position.

Of course, in step S103, the wafer centering device may also be used to perform the centering operation on the wafer.

Step S105, transferring the wafer from the pre-treatment zone to the first notch polishing zone. In an embodiment, the wafer multi-station edge polishing device comprises a wafer transfer device, wherein the wafer transfer device comprises a turntable positioned in the middle area of a wafer operation platform and a plurality of transfer manipulators arranged on the turntable, any one transfer manipulator is positioned between a front operation area and a rear operation area, and the wafer is transferred from the front operation area to the next operation area through movement between the front operation area and the rear operation area.

In the embodiment, assuming that the included angle between two adjacent operation areas is 60 °, the transfer manipulator is located at the middle position of the two adjacent operation areas, and corresponding protection plates are disposed on two opposite sides of each operation area, which can be seen in fig. 1 in detail. In step S105, the step of transferring the wafer from the pretreatment location to the first notch polishing location using the wafer transfer device may specifically include: opening the protection plate PA at the rear side of the pretreatment area, driving the turntable in the wafer transfer device to rotate, rotating the transfer robot between the pretreatment area and the first notch polishing area by 30 ° from the initial position in a first direction (e.g., counterclockwise) and passing through the opening of the protection plate PA to enter the pretreatment area, extracting the first wafer from the rotating carrying table of the pretreatment area, opening the protection plate PB at the front side of the first notch polishing area, driving the turntable to rotate, rotating the transfer robot by 60 ° in a second direction (e.g., clockwise) and passing through the opening of the protection plate PA to exit the pretreatment area and passing through the opening of the protection plate PB to enter the first notch polishing area, transferring the first wafer into the first notch polishing area and placing the first wafer on the wafer carrying table in the first notch polishing area, at this time, rotating the protection plate PB by 30 ° in the first direction and passing through the opening of the protection plate PB to exit the first notch polishing area by the transfer robot to return to the initial position, and closing the protection plate PB at the front side of the first notch polishing area.

In essence, in step S105, in addition to transferring the first wafer from the pretreatment location to the first notch polishing location, a second wafer is loaded into the pretreatment location using the wafer handling device. In step S105, the operation of loading the second wafer to the pretreatment location by the wafer handling device is referred to as step S101, and will not be described herein.

Step S107, performing notch rough polishing operation on the wafer at the first notch polishing location.

As previously described, in an embodiment, the notch rough polishing apparatus may include a wafer carrier and a wafer notch rough polishing mechanism, wherein the wafer notch rough polishing mechanism may include a rough polishing roller, a roller rotating motor, and a roller shifting mechanism. Therefore, in step S107, the step of performing notch rough polishing work on the first wafer using the notch rough polishing apparatus specifically includes: carrying and fixing a first wafer by a wafer carrying table, and driving the rough polishing roller to rotate by the roller rotating motor; according to the notch position of the first wafer, the roller shifting mechanism drives the rough polishing roller to shift to the notch polishing position, and the rough polishing roller gradually approaches to the notch of the first wafer until the rough polishing roller contacts the notch of the first wafer to perform rough polishing operation of the notch.

In fact, in step S107, in addition to performing notch rough polishing operation on the first wafer, the wafer notch detection and centering operation on the second wafer at the pretreatment location as described in step S103 are also included, which will not be described herein.

Step S109, transferring the wafer from the first notch polishing location to the second notch polishing location.

In step S109, the step of transferring the wafer from the first notch polishing location to the second notch polishing location using the wafer transfer apparatus may specifically include: opening the wafer from the protection plate PA at the rear side of the first notch polishing zone, driving the turntable in the wafer transfer apparatus to rotate, rotating by 30 ° from the initial position by the transfer robot located between the first notch polishing zone and the second notch polishing zone and entering the first notch polishing zone through the opening of the protection plate PA, picking up the first wafer from the wafer carrier at the first notch polishing zone, opening the protection plate PB at the front side of the second notch polishing zone, driving the turntable to rotate, rotating by 60 ° by the transfer robot in the second rotation (e.g., clockwise) and passing through the opening of the protection plate PA to exit the first notch polishing zone and passing through the opening of the protection plate PB to enter the second notch polishing zone, transferring the first wafer into the second notch polishing zone and placing the first wafer on the wafer carrier at the second notch polishing zone, at this time, rotating by 30 ° by the transfer robot in the first rotation and exiting the polishing zone through the opening of the protection plate PB to exit the second notch polishing zone to the initial position, and returning to the front side of the second notch polishing zone.

In fact, in step S109, after the first wafer is transferred from the first notch polishing location to the second notch polishing location by the wafer transfer apparatus, the second wafer is transferred from the pre-processing location to the first notch polishing location by the wafer transfer apparatus, which is described in detail in step S105. In addition, at the same time, a third wafer is loaded into the pretreatment area by the wafer loading/unloading device, see step S101.

And step S111, performing notch finish polishing operation on the wafer at the second notch polishing area.

As previously described, in embodiments, the notch polishing apparatus may include a wafer carrier and a wafer notch polishing mechanism, wherein the wafer notch polishing mechanism may include a polishing roller, a roller rotating motor, and a roller shifting mechanism. Therefore, in step S111, the step of performing notch polishing operation on the first wafer by using the notch polishing apparatus specifically includes: carrying and fixing a first wafer by a wafer carrying table, and driving the fine polishing roller to rotate by the roller rotating motor; according to the notch position of the first wafer, the roller shifting mechanism drives the fine polishing roller to shift to the notch polishing position, and the fine polishing roller gradually approaches to the notch of the first wafer until the fine polishing roller contacts the notch to finish the notch.

In fact, in step S111, in addition to performing notch polishing operation on the first wafer by using the wafer notch polishing device, the notch rough polishing operation on the second wafer by using the wafer notch rough polishing device, and the wafer notch inspection and centering operation on the third wafer at the pre-processing location are also included, which will not be described herein.

Step S113, transferring the wafer from the second notch polishing location to the first edge polishing location.

In step S113, the step of transferring the wafer from the second notch polishing location to the first edge polishing location using the wafer transfer apparatus may specifically include: opening the wafer from the guard plate PA at the rear side of the second notch polishing zone, driving the turntable in the wafer transfer apparatus to rotate, rotating 30 ° from the initial position by the transfer robot located between the second notch polishing zone and the first edge polishing zone and entering the second notch polishing zone through the opening of the guard plate PA, picking up the first wafer from the wafer carrier at the rear side of the second notch polishing zone, opening the guard plate PB at the front side of the first edge polishing zone, driving the turntable to rotate, rotating 60 ° from the transfer robot in the second direction (e.g., clockwise) and passing through the opening of the guard plate PA to exit the second notch polishing zone and passing through the opening of the guard plate PB to enter the first edge polishing zone, transferring the first wafer into the first edge polishing zone and placing the first wafer on the wafer carrier at the first edge polishing zone, at this time, rotating 30 ° from the first rotation by the transfer robot and exiting the first edge polishing zone through the opening of the guard plate PB to exit the initial position, and returning to the front side of the first edge polishing zone.

In fact, in step S113, after the first wafer is transferred from the second notch polishing location to the first edge polishing location by the wafer transfer apparatus, the method further includes: transferring the second wafer from the first notch polishing location to the second notch polishing location using the wafer transfer device, transferring the third wafer from the pre-processing location to the first notch polishing location using the wafer transfer device, and loading the fourth wafer to the pre-processing location using the wafer handling device.

In step S115, an edge rough polishing operation is performed on the wafer at the first edge polishing location.

As previously described, in embodiments, the wafer edge rough polishing apparatus may include a wafer carrier and a wafer edge rough polishing mechanism, wherein the wafer edge rough polishing mechanism may include a rough polishing turntable, an edge rough polishing assembly, a turntable rotating motor, and a rough polishing turntable displacement mechanism. Therefore, in step S115, the step of performing the edge rough polishing operation on the first wafer by using the round edge rough polishing apparatus specifically includes: the rotary motor of the rotary table drives the rough polishing rotary table to rotate in a first rotation direction, so that a turning main body and an edge rough polishing piece in the edge polishing assemblies are turned outwards relative to the rough polishing rotary table under the drive of the sheet; in a state of keeping the rough polishing turntable to rotate in a first direction, enabling the lifting mechanism to drive the rough polishing turntable to reach a preset edge rough polishing position through lifting displacement, so that each edge rough polishing component on the periphery of the rough polishing turntable corresponds to the edge of a first wafer at the edge rough polishing position, and the first wafer falls into a polishing space surrounded by a plurality of edge rough polishing components; the rotary motor of the rotary table drives the rough polishing rotary table to rotate in a second steering mode, so that the overturning main bodies and the edge rough polishing pieces in the plurality of edge rough polishing assemblies are driven by the sheets to inwards overturn relative to the rough polishing rotary table, and edge rough polishing operation is carried out on the first wafer by the edge rough polishing pieces in the plurality of edge rough polishing assemblies.

In fact, in step S115, in addition to performing the edge rough polishing operation on the first wafer by the wafer edge rough polishing apparatus, the method further includes: the wafer notch polishing device is used for performing notch polishing operation on the second wafer, the wafer notch rough polishing device is used for performing notch rough polishing operation on the third wafer, and performing wafer notch detection and centering operation on the fourth wafer at the pretreatment location, and the like, and therefore details are omitted.

Step S117, transferring the wafer from the first edge polishing location to the second edge polishing location.

In step S117, the step of transferring the wafer from the first edge polishing location to the second edge polishing location using the wafer transfer apparatus may specifically include: opening the wafer from the guard plate PA at the rear side of the first edge polishing zone, driving the turntable in the wafer transfer apparatus to rotate, rotating by 30 ° from the initial position by the transfer robot located between the first edge polishing zone and the second edge polishing zone and entering the first edge polishing zone through the opening of the guard plate PA, picking up the first wafer from the wafer carrier at the first edge polishing zone, opening the guard plate PB at the front side of the second edge polishing zone, driving the turntable to rotate, rotating by 60 ° by the transfer robot in the second direction (e.g., clockwise) and passing through the opening of the guard plate PA to exit the first edge polishing zone and passing through the opening of the guard plate PB to enter the second edge polishing zone, transferring the first wafer into the second edge polishing zone and placing the first wafer on the wafer carrier at the second edge polishing zone, at this time, rotating by 30 ° by the transfer robot in the first direction and passing through the opening of the guard plate PB to exit the second edge polishing zone to exit the initial position, and returning to the front side of the second edge polishing zone.

In fact, in step S117, after the first wafer is transferred from the first edge polishing location to the second edge polishing location by the wafer transfer device, the method further includes: transferring the second wafer from the second notch polishing location to the first edge polishing location using the wafer transfer device, transferring the third wafer from the first notch polishing location to the second notch polishing location using the wafer transfer device, transferring the fourth wafer from the pre-processing location to the first notch polishing location using the wafer transfer device, and loading the fifth wafer to the pre-processing location using the wafer handling device.

And step S119, performing edge finish polishing operation on the wafer at the second edge polishing area.

As previously described, in embodiments, the wafer edge finishing apparatus may include a wafer carrier and a wafer edge finishing mechanism, wherein the wafer edge finishing mechanism may include a finishing turntable, an edge finishing assembly, a turntable rotating motor, and a finishing turntable displacement mechanism. Therefore, in step S119, the step of performing the edge finishing operation on the first wafer by using the wafer edge finishing apparatus specifically includes: the rotary motor of the rotary table drives the finish polishing rotary table to rotate in a first rotation direction, so that the turning main bodies and the edge finish polishing pieces in the edge polishing assemblies are turned outwards relative to the finish polishing rotary table under the drive of the sheets; under the condition that the finish polishing turntable is kept to rotate in a first turning direction, the lifting mechanism drives the finish polishing turntable to reach a preset edge finish polishing position through lifting displacement, so that each edge finish polishing component on the periphery of the finish polishing turntable corresponds to the edge of a first wafer at the edge finish polishing position, and the first wafer falls into a polishing space surrounded by a plurality of edge finish polishing components; the rotary table rotating motor drives the fine polishing rotary table to rotate in a second steering mode, so that the overturning main bodies and the edge fine polishing pieces in the edge fine polishing assemblies are driven by the sheets to inwards overturn relative to the fine polishing rotary table, and edge fine polishing operation is carried out on the first wafer by the edge fine polishing pieces in the edge fine polishing assemblies.

In fact, in step S119, in addition to performing the edge finishing operation on the first wafer by the wafer edge finishing apparatus, the method further includes: the wafer edge rough polishing device is utilized to carry out edge rough polishing operation on the second wafer, the wafer notch fine polishing device is utilized to carry out notch fine polishing operation on the third wafer, the wafer notch rough polishing device is utilized to carry out notch rough polishing operation on the fourth wafer, and wafer notch detection and centering operation and the like are carried out on the fifth wafer on the pretreatment area, and are not repeated here.

Step S121, transferring the wafer from the second edge polishing location to the post-processing location.

In step S121, the step of transferring the wafer from the second edge polishing location to the post-processing location by using the wafer transfer device may specifically include: opening the wafer from the protection plate PA at the rear side of the second edge polishing zone, driving the turntable in the wafer transfer apparatus to rotate, rotating 30 ° from the initial position by the transfer robot 93 located between the second edge polishing zone and the post-processing zone and entering the second edge polishing zone through the opening of the protection plate PA, extracting the first wafer from the wafer carrier at the front side of the post-processing zone, opening the protection plate PB at the front side of the post-processing zone, driving the turntable to rotate, rotating 60 ° by the transfer robot 93 in the second direction (e.g., clockwise) and passing through the opening of the protection plate PA to exit the second edge polishing zone and passing through the opening of the protection plate PB to enter the post-processing zone, transferring the first wafer into the post-processing zone and placing the first wafer on the wafer carrier in the post-processing zone, at this time, closing the protection plate PA at the rear side of the second edge polishing zone, rotating 30 ° by the transfer robot PB in the first direction and passing through the opening of the protection plate PB to exit the post-processing zone to the initial position, closing the front side of the protection plate PB.

In fact, in step S121, while the first wafer is transferred from the second edge polishing location to the post-processing location by the wafer transfer device, the method further includes: transferring the second wafer from the first edge polishing location to the second edge polishing location using the wafer transfer device, transferring the third wafer from the second notch polishing location to the first edge polishing location using the wafer transfer device, transferring the fourth wafer from the first notch polishing location to the second notch polishing location using the wafer transfer device, transferring the fifth wafer from the pre-processing location to the first notch polishing location using the wafer transfer device, and loading the sixth wafer to the pre-processing location using the wafer handling device.

Step S123, cleaning the wafer at the post-processing area.

In step S123, the step of cleaning the first wafer by the wafer cleaning device specifically includes: the wafer cleaning device is driven to move firstly, so that the spray head on the wafer cleaning device corresponds to the edge of the first wafer, and then the spray head on the wafer cleaning device is controlled to spray cleaning agent towards the edge of the wafer for cleaning.

In fact, in step S123, in addition to performing the cleaning operation on the first wafer by the wafer cleaning apparatus, the method further includes: the wafer edge polishing device is utilized to carry out edge polishing operation on the second wafer, the wafer edge rough polishing device is utilized to carry out edge rough polishing operation on the third wafer, the wafer notch polishing device is utilized to carry out notch polishing operation on the fourth wafer, the wafer notch rough polishing device is utilized to carry out notch rough polishing operation on the fifth wafer, wafer notch detection and centering operation on the sixth wafer on the pretreatment area and the like, and the description is omitted.

Step S121, unloading the polished wafer from the post-processing area of the wafer work platform.

In step S121, the step of unloading the wafer from the post-processing region by the wafer handling device may specifically include: driving a mechanical arm of the wafer loading and unloading device to move from an initial position to a post-treatment area; controlling a mechanical arm to extract a first wafer from a wafer bearing table on a post-treatment zone; driving the mechanical arm to move from the post-treatment area to the wafer loading and unloading area, and placing the first wafer into a wafer material box on the wafer loading and unloading area; the mechanical arm is driven to return to the initial position.

In fact, in step S121, in addition to unloading the first wafer from the post-processing region by the wafer handling device, the method further includes: transferring the second wafer from the second edge polishing location to the post-processing location using the wafer transfer device, transferring the third wafer from the first edge polishing location to the second edge polishing location using the wafer transfer device, transferring the fourth wafer from the second notch polishing location to the first edge polishing location using the wafer transfer device, transferring the fifth wafer from the first notch polishing location to the second notch polishing location using the wafer transfer device, transferring the sixth wafer from the pre-processing location to the first notch polishing location using the wafer transfer device, and loading the seventh wafer to the pre-processing location using the wafer loading and unloading device.

The wafer multi-station edge polishing method disclosed by the application can be used for rapidly, stably and atraumatically transferring the wafer to be polished among all operation areas, so that the wafer can sequentially finish wafer notch polishing operation and wafer edge polishing operation in the same equipment, and also can simultaneously carry out corresponding polishing operation on a plurality of wafers, thereby improving the production efficiency and the operation quality of wafer edge polishing.

The above embodiments are merely illustrative of the principles of the present application and its effectiveness, and are not intended to limit the application. Modifications and variations may be made to the above-described embodiments by those skilled in the art without departing from the spirit and scope of the application. Accordingly, it is intended that all equivalent modifications and variations of the application be covered by the claims, which are within the ordinary skill of the art, be within the spirit and scope of the present disclosure.

Claims

1. Wafer edge polishing mechanism of wafer edge polishing device, its characterized in that, wafer edge polishing mechanism includes:

polishing a turntable;

The edge polishing assemblies are uniformly distributed on the edge of the polishing turntable; the edge polishing assembly includes: the overturning main body is connected with the edge of the polishing turntable in a shaft way; the edge polishing piece is arranged at the bottom of the overturning main body; the page piece is arranged at the top of the overturning main body; the plurality of edge polishing assemblies comprises an outer circular edge polishing assembly or an upper port edge polishing assembly or a lower port edge polishing assembly or any one of the group thereof;

a turntable rotation motor for driving the polishing turntable to rotate;

When the polishing turntable rotates, the sheet generates air flow, and the air flow drives the edge polishing assembly to turn over relative to the polishing turntable by a preset amplitude so as to enable an edge polishing piece on the edge polishing assembly to perform edge polishing on a wafer to be polished; the flipping includes feeding of the edge polishing assembly toward the center of the polishing turntable or withdrawing of the edge polishing assembly away from the center of the polishing turntable.

2. The wafer edge polishing mechanism of claim 1, further comprising a turntable displacement mechanism for driving the polishing turntable to displace to an edge polishing position.

3. The wafer edge polishing mechanism of claim 1, wherein the plurality of edge polishing assemblies are outer circular edge polishing assemblies or upper port edge polishing assemblies or lower port edge polishing assemblies.

4. The wafer edge polishing mechanism of claim 1, wherein the plurality of edge polishing assemblies comprises:

the upper opening edge polishing assembly and the outer circle edge polishing assembly are sequentially arranged at intervals; or alternatively

And the outer circle edge polishing assembly and the lower port edge polishing assembly are sequentially arranged at intervals.

5. The wafer edge polishing mechanism of claim 1, wherein the plurality of edge polishing assemblies comprises an outer circular edge polishing assembly, an upper port edge polishing assembly, and a lower port edge polishing assembly, the outer circular edge polishing assembly, the upper port edge polishing assembly, and the lower port edge polishing assembly being sequentially spaced apart.

6. The wafer edge polishing mechanism of claim 1, wherein the outer circular edge polishing assembly comprises:

the overturning main body is connected with the edge of the polishing turntable in a shaft way;

the outer circle edge polishing piece is arranged at the bottom of the overturning main body; the outer circle edge polishing piece is provided with a flat polishing part or a convex polishing part for contacting the outer circle edge of the wafer;

and the page piece is arranged at the top of the overturning main body.

7. The wafer edge polishing mechanism of claim 1, wherein the upper port edge polishing assembly comprises:

the upper opening edge polishing piece is arranged at the bottom of the overturning main body; the upper opening edge polishing piece is provided with an upper wedge polishing part for contacting the upper opening edge of the wafer;

and the page piece is arranged at the top of the overturning main body.

8. The wafer edge polishing mechanism of claim 1, wherein the lower port edge polishing assembly comprises:

The lower opening edge polishing piece is arranged at the bottom of the overturning main body; the lower port edge polishing piece is provided with a lower wedge-shaped polishing part for contacting the lower port edge of the wafer;

and the page piece is arranged at the top of the overturning main body.

9. The wafer edge polishing mechanism of claim 1, wherein the edge polishing member in the edge polishing assembly is a first type of edge polishing member having a first roughness.

10. The wafer edge polishing mechanism of claim 1, wherein the edge polishing member in the edge polishing assembly is a second type of edge polishing member having a second roughness.

11. The wafer edge polishing mechanism of claim 1, wherein in the edge polishing assembly, the edge polishing member and the turning body are removable.

12. The wafer edge polishing mechanism of claim 1, wherein the sheet is fixedly disposed on top of the turning body, and a tangent line of the sheet and the turning body forms a guiding tilt angle.

13. The wafer edge polishing mechanism of claim 1, wherein the blade is an adjustable blade disposed on top of the flip body.

14. The wafer edge polishing mechanism of claim 13, wherein the adjustable blade has a plurality of adjustable gears.

15. The wafer edge polishing mechanism of claim 13, wherein the adjustable blade is further coupled to a blade adjustment motor.

16. A wafer edge polishing apparatus, comprising: the wafer edge polishing mechanism of any one of claims 1 to 15.