CN109841661A - Display and preparation method thereof - Google Patents
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- CN109841661A CN109841661A CN201910126372.1A CN201910126372A CN109841661A CN 109841661 A CN109841661 A CN 109841661A CN 201910126372 A CN201910126372 A CN 201910126372A CN 109841661 A CN109841661 A CN 109841661A
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Abstract
The present invention provides a kind of display and preparation method thereof, the display includes array substrate, including multiple thin film transistor (TFT)s (thin-film transistor, TFT)；Black matrix" (BM) layer, is configured in the array substrate, and black matrix" (BM) layer has multiple openings；Multiple electroluminescent devices (EL), are configured at the multiple opening of the black matrix" (BM) layer；First encapsulated layer is configured on the black matrix" (BM) layer and the multiple electroluminescent device (EL)；Multiple coloured silk films, are covered in first encapsulated layer of the corresponding electroluminescent device；And second encapsulated layer, it is configured at the multiple color film (CF) and not by first encapsulated layer of the multiple color film covering.
Description
Technical field
The present invention relates to a kind of display and preparation method thereof more particularly to a kind of built-in displays for replacing polaroid of color film
Device.
Background technique
Polaroid (POL) can be effectively reduced the reflectivity of strong light lower panel, but have lost the light out close to 58%.This
For OLED, its service life burden is substantially increased.Referring to Figure 1A, Figure 1A system uses showing for the display of traditional polaroid
Be intended to, the display 100 using traditional polaroid sequentially the array substrate (Array substrate) 11 including stacking,
Electroluminescent device (EL) 12, thin-film encapsulation layer (TFE) 13 and polaroid (POL) 14, wherein traditional polaroid thickness it is larger,
Material is crisp, is unfavorable for the exploitation that dynamic bends product.Product is bent in order to develop the dynamic based on OLED display technology, it is necessary to be led
Enter new material, new technology and new process substitution polaroid.Referring to Figure 1B, Figure 1B system is substituted using color film (Color Filter)
The schematic diagram of the existing display of polaroid (POL), the existing display 200 sequentially include the array substrate of stacking
(Array substrate) 21, electroluminescent device (EL) 22, thin-film encapsulation layer (TFE) 23 and color film (CF) 25.In Figure 1B
In shown existing display, POL-less skill is attributed to using color film (Color Filter) substitution polaroid (POL)
The thickness of functional layer can not only be reduced to 5 μm of < from~100 μm by art, POL-less technology；And can by light emission rate from
42% improves to 60%.POL-less technology based on color film be considered as realize dynamic bending product development key technology it
One.However, the surface reflectivity of color membrane technology is higher relative to polaroid, the contrast under strong light is lower, is unfavorable for outdoor aobvious
Show.
In order to solve the light leakage and reflection problems of display, and the thickness of display is reduced, needing one kind can be by color film
Functional layer is built among panel completely, while using black matrix" (BM) as pixel defining layer (PDL), to realize ultra-thin display
Show the method for device.
Summary of the invention
In view of this, the present invention provide it is a kind of by be mixed into the ink-jet printing inks (IJP) that use in a package with
The color blocking that R/G/B matches accurately is covered in the R/G/B pixel of organic light emitting apparatus (OLED), then solid by illumination
Change the functional layer for having obtained that there is R G B coloured silk film inside encapsulated layer (TFE).Meanwhile pixel is made using black matrix" (BM)
Definition layer (PDL) has obtained being built in the color film functional layer among panel completely, realizes the chip technology that depolarizes of " zero " film thickness,
Obtain a ultrathin display.
Accordingly, an embodiment according to the present invention, the present invention provides a kind of displays, including；Array substrate, including it is more
A thin film transistor (TFT)；Black-matrix layer is configured in the array substrate, and the black-matrix layer has multiple openings；It is multiple
Electroluminescent device is configured in the opening of the black-matrix layer；First encapsulated layer is configured at the black-matrix layer
And on the electroluminescent device；Multiple coloured silk films, first encapsulated layer of the corresponding electroluminescent device of covering, described the
A part of one encapsulated layer is not covered by the color film；And second encapsulated layer, it is configured at the color film and not described
On the part of first encapsulated layer of color film covering.
Another embodiment according to the present invention, the present invention also provides a kind of preparation methods of display, including following step
Rapid: S10 provides array substrate, and the array substrate includes multiple thin film transistor (TFT)s；S20 forms black-matrix layer in the array
On substrate, the black-matrix layer has multiple openings；S30 is deposited multiple electroluminescent in the opening of the black-matrix layer
Luminescent device；S40 is in being deposited the first encapsulated layer in the black-matrix layer and the electroluminescent device；S50 is described in the correspondence
Multiple color films are formed on first encapsulated layer of electroluminescent device, a part of first encapsulated layer is not by the coloured silk
Film covering；And S60 forms the second encapsulated layer in the color film (and first encapsulated layer not covered by the color film
On.
In one embodiment of this invention, the step S50 of the display preparation method includes: the printing of S51 hybrid ink jet
Ink material and color blocking material are to obtain color film ink material；S52 prints on the color film ink material corresponding described electroluminescent
On first encapsulated layer of luminescent device；S53 solidifies the color film ink by coloured silk film ink material described in ultraviolet light
Water material, in obtaining the color film on first encapsulated layer of the correspondence electroluminescent device
In one embodiment of this invention, the step S60 of the display preparation method includes: that S61 is coated with the ink-jet
On first encapsulated layer that printing ink material is covered in the color film and not by the color film；S62 passes through ultraviolet lighting
It penetrates the ink-jet printing inks material and the ink-jet printing inks material is solidified with row, to obtain organic layer, wherein the ink-jet
Printing ink material is photopolymerizable material；And S63 vapor deposition silicon nitride inorganic layer is on the organic layer.
In one embodiment of this invention, the multiple color film respectively corresponds the multiple opening.
In one embodiment of this invention, the surface topography of the multiple color film include: the surface of arc, evagination, indent,
Or combinations thereof.
In one embodiment of this invention, the multiple color membrane part overflows the opening, covers described parameatal
The surface of the part black-matrix layer.
In one embodiment of this invention, each color film includes ink-jet printing inks material and color blocking material, and institute
Stating color film includes multiple red color films, multiple green tint films and multiple blue color films, wherein the multiple red color film, described
The color of multiple green tint films and the multiple blue color film respectively corresponds the color of multiple sub-pixels.
In one embodiment of this invention, first encapsulated layer includes silicon nitride inorganic layer.
In one embodiment of this invention, second encapsulated layer includes the organic layer of sequentially stacking and nitridation from the bottom to top
Silicon inorganic layer.
In one embodiment of this invention, the ink-jet printing inks material is photopolymerizable material.
Detailed description of the invention
It, below will be to embodiment or the prior art in order to illustrate more clearly of embodiment or technical solution in the prior art
Attached drawing needed in description is briefly described, it should be apparent that, the accompanying drawings in the following description is only some of invention
Embodiment for those of ordinary skill in the art without creative efforts, can also be attached according to these
Figure obtains other attached drawings.
Figure 1A system uses the schematic diagram of the display of traditional polaroid.
Figure 1B system substitutes the schematic diagram of the existing display of polaroid (POL) using color film (Color Filter).
Fig. 2A is the flow chart of the manufacturing method of the display of an embodiment according to the present invention.
Fig. 2 B is the flow chart of step S50 in the manufacturing method of the display of an embodiment according to the present invention.
Fig. 2 C is the flow chart of step S60 in the manufacturing method of the display of an embodiment according to the present invention.
Fig. 3 A to 3D is the manufacturing method of the display of an embodiment according to the present invention, the knot of display in each step
Structure schematic diagram.
Specific embodiment
For above content of the invention can be clearer and more comprehensible, preferred embodiment is cited below particularly, and institute's accompanying drawings is cooperated to make
It is described in detail.
The explanation of following embodiment is referred to the additional illustration, the particular implementation that can be used to implement to illustrate the present invention
Example.The direction term that the present invention is previously mentioned, for example, [longitudinal direction], [transverse direction], [on], [under], [preceding], [rear], [left side], [right side],
[interior], [outer], [side] etc. are only the directions with reference to annexed drawings.Therefore, the direction term used is to illustrate and understand
The present invention, rather than to limit the present invention.The similar unit of structure is with being given the same reference numerals in the figure.
Tradition is based in the chip technology that depolarizes of color film, it is necessary to tetra- step manufacturing process of R/G/B/BM is used, so that based on coloured silk
Not only time-consuming for the manufacture of film oled panel, costly, yield is low, but also longevity of the rear baking of color film easily to OLED functional layer
Life decaying causes great risk.Pass through the ink-jet printing inks (ink jet printing, IJP) used in encapsulating
In be mixed into the color blocking to match with R/G/B, be accurately covered in the R/G/B pixel of OLED, then obtained by illumination curing
With the functional layer of R G B coloured silk film inside TFE.In addition by black matrix" (black matrix, BM) substitute array
(Array) pixel defining layer in processing procedure (pixel definition layer, PDL), so constitutes and is built in face completely
The chip technology that depolarizes of plate preparation.
This technical though completely will be in all funtion parts " transfer " to panel of color film (color filter, CF)
Portion realizes the chip technology that depolarizes of " zero " film thickness, new thinking is provided for flexible display technologies.
Accordingly, an embodiment according to the present invention, the present invention provides a kind of displays, referring to Fig. 3 D.Fig. 3 D is foundation
The structural schematic diagram of display in the completion step of the manufacturing method of the display of one embodiment of the invention.As shown in Figure 3D,
Specifically, the display 300 of embodiment includes one of according to the present invention；Array basal plate 31, including multiple thin film transistor (TFT)s
(thin-film transistor,TFT)310；One black matrix" (black matrix, BM) layer 32, is configured at the array
On substrate 31,32 layers of the black matrix" (BM) have 320 (being illustrated in Fig. 3 A) of multiple openings；Multiple electroluminescent devices
(electroluminescent element, EL) 311 is configured at the multiple opening of the black matrix" (BM) layer 32
320；One first encapsulated layer 33, be configured at the black matrix" (BM) layer 32 and the multiple electroluminescent device (EL) 311 it
On；Multiple coloured silk films (color filter, CF) 34 are covered in first encapsulated layer of the corresponding electroluminescent device 311
33；And one second encapsulated layer 35, it is configured at the multiple color film (CF) 34 and is not covered by the multiple color film 34 described
On first encapsulated layer 33.
Another embodiment according to the present invention, the present invention also provides a kind of preparation methods of display, together referring to figure
2A-2C and Fig. 3 A-3D.Fig. 2 is the flow chart of the manufacturing method of the display of an embodiment according to the present invention；Fig. 2 B is foundation
The flow chart of step S50 in the manufacturing method of the display of one embodiment of the invention；Fig. 2 C is an implementation according to the present invention
The flow chart of step S60 in the manufacturing method of the display of example；And Fig. 3 A to 3D is aobvious for an embodiment according to the present invention
The manufacturing method for showing device, the structural schematic diagram of display in each step.As shown in Fig. 2A -2B and Fig. 3 A-3D, according to the present invention
One of the display 300 of embodiment preparation method, comprising the following steps: S10 provides array basal plate 31, including multiple films
Transistor (thin-film transistor, TFT) 310；S20 forms a black matrix" (BM) layer 32 in the array substrate
On, black matrix" (BM) layer 32 has multiple openings 320；Multiple electroluminescent devices (EL) 311 are deposited in described black in S30
The multiple opening 320 of colour moment battle array (BM) layer 32；S40 be deposited one first encapsulated layer 33 in the black matrix" (BM) layer 32 and
On the multiple electroluminescent device (EL) 311；S50 more color films 34 are configured at the corresponding electroluminescent device 311
On first encapsulated layer 33, wherein step S50 includes: that S51 mixes an ink-jet printing inks material and a color blocking material to obtain
To a color film ink material；The color film ink material is printed on described the first of the corresponding electroluminescent device 311 by S52
On encapsulated layer 33；S53 is solidified using coloured silk film ink material described in ultraviolet light, is configured at pair with obtaining multiple color films 34
It answers on first encapsulated layer 33 of the electroluminescent device 311, wherein the multiple corresponding the multiple opening of coloured silk film 34
320；And S60 forms the institute that one second encapsulated layer 35 is not covered in the multiple color film (CF) 34 and by the multiple color film 34
It states on the first encapsulated layer 33.C and Fig. 3 D referring to fig. 2, specifically, in one embodiment of this invention, the display preparation
The step S60 of method includes: that S61 is coated with an ink-jet printing inks material in the multiple color film (CF) 34 and not the multiple
On first encapsulated layer 33 of color 34 covering of film；S62 is solidified using ink-jet printing inks material described in ultraviolet light,
To obtain an organic layer 350, wherein the ink-jet printing inks material is a photopolymerizable material；And one nitridation of S63 vapor deposition
Silicon inorganic layer 351 is on the organic layer 350.In this way, display 300 as shown in Figure 3D can be obtained, wherein described
Second encapsulated layer 35 includes sequentially one of stacking organic layer 350 and a silicon nitride inorganic layer 351 from the bottom to top.
Referring to Fig. 3 B and 3C, in one embodiment of this invention, the multiple coloured silk film 34 respectively corresponds the multiple opening
320。
In one embodiment of this invention, the surface topography of the multiple color film can include: the surface of arc, evagination, interior
Recessed, or combinations thereof.
In one embodiment of this invention, the multiple color film can partially overflow the opening, cover around the opening
The part black-matrix layer surface.
Consolidate in technique using ink-jet printing inks (IJP) light, color film with arc, evagination, indent surface topography, can
It assigns color film preferable optical property, and makes color film that there is better bend resistance effect, and then bend and lead in the dynamic of display
There is preferable application in domain.
Referring to Fig. 3 B, in one embodiment of this invention, it is the multiple coloured silk film respectively include an ink-jet printing inks material and
One color blocking material, and the multiple color film includes multiple red (red, R) color film, multiple green (green, G) color film, Yi Jiduo
A color film of blue (blue, B), wherein the multiple red color film R, the multiple green tint film G and the multiple blue color
The color of film B respectively corresponds the color of multiple sub-pixels 312.
In one embodiment of this invention, first encapsulated layer can be a silicon nitride inorganic layer.
In one embodiment of this invention, the ink-jet printing inks material may include a photopolymerizable material.
According to previous embodiment it is found that the present invention provides a kind of ink-jet printing inks by using in a package
(IJP) it is mixed into the color blocking to match with R/G/B in, is accurately covered in the R/G/B pixel of organic light emitting apparatus (OLED), so
Obtain that there is R, G, B coloured silk film inside encapsulated layer (thin film encapsulation, TFE) by illumination curing afterwards
Functional layer.Meanwhile pixel defining layer (PDL) is made using black matrix" (BM), it has obtained being built in the coloured silk among panel completely
Film functional layer realizes the chip technology that depolarizes of " zero " film thickness, obtains a ultrathin display.
The present invention provide at least it is following the utility model has the advantages that
1) color film is embedded in IJP, has effectively simplified traditional color film, for example, in R, G, B coloured silk film processing procedure must use arrive
Three light shields, simplify and manufactured process, save manufacturing cost；
2) since IJP coloured silk film only needs light-induced polymerization, the processing procedure for significantly reducing traditional color film (R/G/B) is (aobvious
Shadow, baking etc.) destruction to OLED functional layer；
3) black PI replaces traditional black matrix" that the excellent mechanical performance of PI is utilized, and panel is made to have better bending resistance
Folding endurance energy is conducive to the exploitation that dynamic bends product.
In conclusion although the present invention has been disclosed above in the preferred embodiment, but above preferred embodiment is not to limit
The system present invention, those skilled in the art can make various changes and profit without departing from the spirit and scope of the present invention
Decorations, therefore protection scope of the present invention subjects to the scope of the claims.
Claims (15)
1. a kind of display, which is characterized in that including；
Array substrate, including multiple thin film transistor (TFT)s；
Black-matrix layer is configured in the array substrate, and the black-matrix layer has multiple openings；
Multiple electroluminescent devices are configured in the opening of the black-matrix layer；
First encapsulated layer is configured on the black-matrix layer and the electroluminescent device；
Multiple coloured silk films, first encapsulated layer of the corresponding electroluminescent device of covering, a part of first encapsulated layer
Do not covered by the color film；And
Second encapsulated layer is configured at the part of the color film and first encapsulated layer not covered by the color film
On.
2. display according to claim 1, which is characterized in that the multiple coloured silk film respectively corresponds the multiple opening.
3. display according to claim 1, which is characterized in that the surface topography of the multiple coloured silk film includes: arc
Surface, evagination, indent, or combinations thereof.
4. display according to claim 1, which is characterized in that the multiple coloured silk membrane part overflows the opening, covering
The surface of the parameatal part black-matrix layer.
5. display according to claim 1, which is characterized in that each color film include ink-jet printing inks material and
Color blocking material, and the color film includes multiple red color films, multiple green tint films and multiple blue color films, wherein the multiple
The color of red color film, the multiple green tint film and the multiple blue color film respectively corresponds the color of multiple sub-pixels.
6. display according to claim 1, which is characterized in that first encapsulated layer includes silicon nitride inorganic layer.
7. display according to claim 1, which is characterized in that second encapsulated layer includes sequentially stacking from the bottom to top
Organic layer and silicon nitride inorganic layer.
8. display according to claim 3, which is characterized in that the ink-jet printing inks material is photopolymerizable material
Material.
9. a kind of preparation method of display, which is characterized in that include the following steps；
S10 provides array substrate, and the array substrate includes multiple thin film transistor (TFT)s；
S20 forms black-matrix layer in the array substrate, and the black-matrix layer has multiple openings；
Multiple electroluminescent devices are deposited in the opening of the black-matrix layer in S30；
S40 is in being deposited the first encapsulated layer in the black-matrix layer and the electroluminescent device；
S50 in forming multiple color films on first encapsulated layer of the correspondence electroluminescent device, first encapsulated layer
A part is not covered by the color film；And
S60 forms the second encapsulated layer in the color film (and on first encapsulated layer not covered by the color film.
10. display preparation method according to claim 9, wherein step S50 includes:
S51 hybrid ink jet printing ink material and color blocking material are to obtain color film ink material；
S52 prints on the color film ink material on first encapsulated layer of the corresponding electroluminescent device；And
S53 solidifies the color film ink material by coloured silk film ink material described in ultraviolet light, with described electroluminescent in correspondence
The color film is obtained on first encapsulated layer of luminescent device.
11. display preparation method according to claim 9, wherein first encapsulated layer includes silicon nitride inorganic layer.
12. display preparation method according to claim 10, wherein step S60 includes:
S61 is coated with first encapsulated layer that the ink-jet printing inks material is covered in the color film and not by the color film
On；
S62 is gone by ink-jet printing inks material described in ultraviolet light solidifies the ink-jet printing inks material, to obtain
Organic layer, wherein the ink-jet printing inks material is photopolymerizable material；And
Silicon nitride inorganic layer is deposited on the organic layer in S63.
13. display according to claim 9, which is characterized in that the multiple coloured silk film respectively corresponds the multiple opening.
14. display according to claim 9, which is characterized in that the surface topography of the multiple coloured silk film includes: arc
Surface, evagination, indent, or combinations thereof.
15. display according to claim 9, which is characterized in that the multiple coloured silk membrane part overflows the opening, covering
The surface of the parameatal part black-matrix layer.
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| CN201910126372.1A CN109841661A (en) | 2019-02-20 | 2019-02-20 | Display and preparation method thereof |
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ID=66884603
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| CN110610978A (en) * | 2019-09-29 | 2019-12-24 | 京东方科技集团股份有限公司 | Display substrate, preparation method thereof and display device |
| CN111668284A (en) * | 2020-07-06 | 2020-09-15 | 武汉华星光电半导体显示技术有限公司 | OLED display device and preparation method |
| CN111725271A (en) * | 2020-06-09 | 2020-09-29 | 武汉华星光电半导体显示技术有限公司 | OLED display panel |
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Application publication date: 20190604 |