CN109817843A - The method and microlens array of microlens array are formed in OLED display - Google Patents
The method and microlens array of microlens array are formed in OLED display Download PDFInfo
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- CN109817843A CN109817843A CN201910090002.7A CN201910090002A CN109817843A CN 109817843 A CN109817843 A CN 109817843A CN 201910090002 A CN201910090002 A CN 201910090002A CN 109817843 A CN109817843 A CN 109817843A
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Abstract
The present invention provides a kind of method and microlens array that microlens array is formed in OLED display.It the described method comprises the following steps: oled panel is provided, the light-emitting surface of the oled panel has encapsulating structure；Patterned network is formed on the encapsulating structure, the grid cell in the network is square net or regular hexagonal cell；Dropping liquid is filled in the grid cell, the dropping liquid in adjacent mesh is isolated from each other；Solidify the dropping liquid, forms microlens array.The method that the present invention provides a kind of to form microlens array in OLED display can be used for forming special-shaped microlens array in OLED device.Compared with the prior art, the present invention can further promote the duty ratio of microlens array under the premise of save the cost, improve the device performance of OLED.
Description
Technical field
The present invention relates to field of electronic display more particularly to a kind of methods that microlens array is formed in OLED display
And microlens array.
Background technique
Microlens array is prepared in the light-emitting surface of OLED to reduce the total reflection of light-emitting surface, is to improve OLED display panel to go out
The effective means of light efficiency.In general, the diameter of microlens array is smaller, radius vector is than bigger, duty ratio is higher, light extraction
Efficiency is higher.Since lenticule generally has rounded bottom surface, duty ratio is limited by structure, and theoretical limit is about 91%.It will
Lenticule is fabricated to that bottom surface is square or the anisotropic aperture lenticule of regular hexagon can further promote accounting for for microlens array
Empty ratio, theoretical limit can reach 100%.
But special-shaped aperture lenticule preparation process is sufficiently complex, at present in research, mostly uses photoetching, wet etching, receives
Rice coining etc., needs very accurate mold to realize the preparation of special-shaped aperture lenticule, there are at high cost, complex procedures, difficulty
The disadvantages of accurately to control, be difficult to large area production.
Summary of the invention
The present invention provides a kind of method that microlens array is formed in OLED display, to solve special-shaped aperture lenticule
It is difficult to the technical issues of preparing.
To solve the above problems, the method that the present invention provides a kind of to form microlens array in OLED display,
The following steps are included:
Oled panel is provided, the light-emitting surface of the oled panel has encapsulating structure；
Patterned network is formed on the encapsulating structure, the grid cell in the network is square grid
Lattice or regular hexagonal cell；
Dropping liquid is filled in the grid cell, the dropping liquid in adjacent mesh is isolated from each other；
Solidify the dropping liquid, forms microlens array.
A specific embodiment according to the present invention, wherein the patterned network formed on the encapsulating structure
For micro-nano barrier grid, the micro-nano barrier grid is the micro-nano wall being deposited on encapsulating structure.
A specific embodiment according to the present invention, wherein the height of the micro-nano wall is less than or equal to described micro-
The thickness of lens unit in lens array, the thickness of the micro-nano wall are less than or equal to the lens list in the microlens array
/ 10th of the diameter of member, the side length of the grid are greater than or equal to 10 microns and are less than or equal to 200 microns.
A specific embodiment according to the present invention, wherein the production method of the micro-nano wall are as follows:
By Electrospun in the encapsulating structure printout surface Kynoar, the net of polyvinylidene fluoride composition is formed
Lattice structure.
A specific embodiment according to the present invention, wherein the patterned network formed on the encapsulating structure
For surface difference alienation grid, the surface difference alienation grid is that the inner surface and the outer surface of grid has the net of different contact angles
Lattice structure.
A specific embodiment according to the present invention, wherein the contact angle of the surfacing of the encapsulating structure is less than
90 °, the contact angle of the material on the grid lines surface of the differentiation grid is greater than 90 °；Wherein,
The height of the grid lines of the surface difference alienation grid is less than or equal to the lens unit in the microlens array
Thickness, the thickness of the grid lines is less than or equal to 1/10th of the diameter of the lens unit in the microlens array,
The side length of the grid is greater than or equal to 10 microns and is less than or equal to 200 microns.
A specific embodiment according to the present invention, wherein the production method of the surface difference alienation grid includes:
Mask plate combination is provided, the mask plate combination is including preparing the first mask plate of transverse grid and preparing longitudinal group
The second mask plate closed；
Polytetrafluoroethylene (PTFE) is deposited on the surface of the encapsulating structure using first mask plate, forms transverse grid；
Polytetrafluoroethylene (PTFE) is deposited on the surface of the encapsulating structure using second mask plate, forms longitudinal grid.
A specific embodiment according to the present invention, wherein the dropping liquid has mobility comprising uv-curing type liquid
Any one in body, thermohardening type liquid；Wherein, the light transmittance for the solid material that the dropping liquid is formed after solidifying is greater than or waits
In 90%, refractive index is greater than or equal to 1.4.
Correspondingly, the encapsulation the present invention also provides a kind of microlens array, on the outside of the light-emitting surface of oled panel
In structure；The microlens array includes patterned network and the lenticule for filling the network, wherein described
Grid cell in network is square net or regular hexagonal cell.
A specific embodiment according to the present invention, the patterned network be micro-nano barrier grid and/or
Surface difference alienation grid；Wherein, the micro-nano barrier grid is the micro-nano wall being deposited on encapsulating structure, and described is grid
The inner surface and the outer surface have different contact angles network.
The method that the present invention provides a kind of to form microlens array in OLED display, can be used in OLED device
Form special-shaped microlens array.The present invention is formed using electrohydrodynamic Printing techniques on OLED structure surface adjacent for separating
The grid of lenticule, likewise, the drop of curable solution is printed in the grid using electrohydrodynamic Printing techniques,
The drop is set to be formed by curing lenticule within a grid later.Electrohydrodynamic Printing techniques can be formed with arbitrary shape
Grid can form the microlens array of square or regular hexagon structure on OLED structure surface easily.Therefore, compared to
The prior art, the present invention can further promote the duty ratio of microlens array under the premise of save the cost, improve OLED's
Device performance.
Detailed description of the invention
Fig. 1 is the exterior view of the encapsulating structure of the OLED display in a specific embodiment of the invention；
Fig. 2 is the schematic diagram for the network that the encapsulating structure surface in Fig. 1 is formed；
Fig. 3 is the structural schematic diagram of the microlens array formed in the network in Fig. 2；
Fig. 4 is the signal for the network that the encapsulating structure surface in Fig. 1 in another embodiment of the present invention is formed
Figure；
Fig. 5 is to form the method schematic diagram of the network on the encapsulating structure surface by Electrospun；
Fig. 6 to Fig. 9 is the method schematic diagram that the network is formed by being vaporized on the encapsulating structure surface；
Figure 10 is the method schematic diagram for filling dropping liquid in one embodiment of the invention in the grid cell；
Figure 11 to Figure 14 is the partial cutaway of the OLED display screen with microlens array in different embodiments of the invention
Face figure.
Specific embodiment
The explanation of following embodiment is referred to the additional illustration, the particular implementation that can be used to implement to illustrate the present invention
Example.The direction term that the present invention is previously mentioned, such as [on], [under], [preceding], [rear], [left side], [right side], [interior], [outer], [side]
Deng being only the direction with reference to annexed drawings.Therefore, the direction term used be to illustrate and understand the present invention, rather than to
The limitation present invention.The similar unit of structure is with being given the same reference numerals in the figure.
The method that the present invention provides a kind of to form microlens array in OLED display comprising following steps:
Oled panel is provided, the light-emitting surface of the oled panel has encapsulating structure；
Patterned network is formed on the encapsulating structure, the grid cell in the network is square grid
Lattice or regular hexagonal cell；
Dropping liquid is filled in the grid cell, the dropping liquid in adjacent mesh is isolated from each other；
Solidify the dropping liquid, forms microlens array.
Above-mentioned steps are described in detail below in conjunction with the drawings and specific embodiments.
Firstly, Fig. 1 is the table of the encapsulating structure of the OLED display in a specific embodiment of the invention referring to Fig. 1
Face figure.In order to reduce the total reflection of OLED display screen light-emitting surface.The envelope of the OLED display screen is arranged in the microlens array
The outside of assembling structure.The encapsulating structure is thin-film packing structure and/or glass cover-plate encapsulating structure；Wherein, when the encapsulation
Structure is thin-film packing structure, and the thin-film packing structure includes at least one layer of organic packages film and at least one layer of inorganic encapsulated
Film.In the present embodiment, the encapsulating structure is the thin-film packing structure being stacked, it is preferred that the encapsulating structure is most
Outer layer is organic film.
Later, as shown in Fig. 2, forming patterned network on the encapsulating structure, in the network
Grid cell is square net or regular hexagonal cell.Square net and regular hexagonal cell can effectively improve lenticule battle array
The duty ratio of column, is close to 100%.Fig. 2 is the schematic diagram for the network that the encapsulating structure surface in Fig. 1 is formed,
In, the network is rectangular.Fig. 4 is that the encapsulating structure surface in Fig. 1 in another embodiment of the present invention is formed
The schematic diagram of network, wherein the network is regular hexagon.In other embodiments, the network can also
To be triangle, rectangle or other positive shape changeables.
In the present embodiment, the patterned network formed on the encapsulating structure is micro-nano barrier grid, institute
Stating micro-nano barrier grid is the micro-nano wall being deposited on encapsulating structure.Specifically, the height of the micro-nano wall be less than or
Equal to the thickness of the lens unit in the microlens array, the thickness of the micro-nano wall is less than or equal to the lenticule battle array
/ 10th of the diameter of lens unit in column, the side length of the grid are greater than or equal to 10 microns and are less than or equal to 200
Micron.
Referring to Fig. 5, in the present embodiment, the production method of the micro-nano wall are as follows:
By Electrospun in the encapsulating structure printout surface Kynoar, the net of polyvinylidene fluoride composition is formed
Lattice structure.
It is Kynoar high temperature resistant, resistance to oxidation, wear-resisting, while there is good flexibility and the anti-intensity that rises, it is using electricity
The preferred material of spining technology preparation network.
Electrospun is one kind of electrohydrodynamic Printing techniques.Electrohydrodynamic spray printing is most latent in printed electronics
A kind of process means of power.Different using the printing type of " crowded " from conventional ink-jet technique, electrofluid inkjet printing uses space
Electric field driven ejects the minimum drop of diameter from taylor cone top in a manner of " drawing ".This technology mode, which can be realized, to be beaten
The other drop of submicron order is printed off, is easy to spray and be not easy to plug, and its resolution ratio is not influenced by nozzle diameter.It includes electricity
Spinning, electron spray and EFI print three kinds of printing technology forms.Wherein, Electrospinning is that one kind can produce sub-micron even
One of technology of nanofiber, it have can print high viscosity solution, be easy to generate the advantages such as fiber.Electron spray is a kind of
Drop is atomized using space electric field to realize the technology of liquid deposition, electrospray techniques can generate the minimum drop of size
Liquid, and can be realized being uniformly distributed for dropping liquid.
Specifically, preparing micro-nano barrier net so that Electrospun prepares polyvinylidene fluoride square grids structures as an example
The technical process of lattice is as follows: the Kynoar solution that configuration Electrospun uses.Take Kynoar solid 3.6g, DMF and third
Each 8.2mL of ketone is used as solvent, after Kynoar is mixed with solvent, in 40 DEG C of agitating and heating 4h, obtains gathering inclined fluorine after mixing
Vinyl solution.
Later, OLED display screen 2 is fixed on plummer 1, special-shaped network is prepared using Electrospun on its surface
3.The electrospinning device includes power supply 7, EFI print taylor cone 4 and spray head 5.By taking square as an example, spray head 5 is 510 μm of outer diameter,
260 μm of internal diameter of metal flat mouth syringe needle.The height of Electrospun 6 is 8mm, and making alive 1500V at spray head passes through the fortune of plummer 1
The pattern of dynamic control Electrospun printing.In the present embodiment, the movement velocity of plummer 1 is 100~400mm/min, obtained spinning
Silk fiber diameter is 0.1 μm~2 μm, and fiber composition lattice is square, and side length is between 10 μm~200 μm.
Fibre diameter is controlled by controlling flow and the substrate speed of spinning, fibre diameter need to cooperate with side length of element,
Guarantee that lenticule has 95% or more duty ratio, if side length is at 20 μm, fibre diameter should be controlled at 0.5 μm or less.
In the present invention, it is preferred to, the network is formed using Electrospinning, and using electrospray techniques in institute
State printed droplets in network.
In another embodiment of the present invention, the patterned network formed on the encapsulating structure is surface difference
Alienation grid, the surface difference alienation grid are that the inner surface and the outer surface of grid has the network of different contact angles.
Specifically, the contact angle of the surfacing of the encapsulating structure is less than 90 °, the material on the grid lines surface of the differentiation grid
Contact angle be greater than 90 °；Wherein, the height of the grid lines of the surface difference alienation grid is less than or equal to the microlens array
In lens unit thickness, the thickness of the grid lines is less than or equal to the diameter of the lens unit in the microlens array
1/10th, the side length of the grid is greater than or equal to 10 microns and is less than or equal to 200 microns.
Specifically, Fig. 6 to Fig. 9 is to form the grid by being vaporized on the encapsulating structure surface referring to Fig. 6 to Fig. 9
The method schematic diagram of structure.In the present embodiment, the production method of the surface difference alienation grid includes:
Mask plate combination is provided, the mask plate combination is including preparing the first mask plate of transverse grid and preparing longitudinal group
The second mask plate closed；Later, as shown in fig. 6, being deposited poly- four on the surface of the encapsulating structure using first mask plate 8
Vinyl fluoride forms transverse grid 9, as shown in Figure 7；Later, as shown in figure 8, using second mask plate 10 in the encapsulation
Polytetrafluoroethylene (PTFE) is deposited in the surface of structure, forms longitudinal grid 11, as shown in Figure 9.
Later, dropping liquid is filled in the grid cell using electrospray techniques, the dropping liquid in adjacent mesh is isolated from each other；
The dropping liquid has mobility.The dropping liquid includes uv-curing type liquid, any one in thermohardening type liquid.This implementation
In example, it is preferred that in order to make the microlens array that there is good translucency and light-gathering, what the dropping liquid was formed after solidifying
The light transmittance of solid material is greater than or equal to 90%, and refractive index is greater than or equal to 1.4.
In the present embodiment, the dropping liquid is epoxy resin solution, which can be cured by ultraviolet, and solidification wavelength is
395nm, transparent rate reach 95%, refractive index about 1.5.Specifically, as shown in Figure 10, OLED display screen 12 is fixed on plummer
On 13, epoxy resin dropping liquid is formed in network 12.Specific print procedure is common technical means in the art, herein
It repeats no more.
Finally, forming microlens array as shown in figure 3, solidify the dropping liquid.
Correspondingly, the encapsulation the present invention also provides a kind of microlens array, on the outside of the light-emitting surface of oled panel
In structure.The encapsulating structure is thin-film packing structure and/or glass cover-plate encapsulating structure；Wherein, when the encapsulating structure is
Thin-film packing structure, the thin-film packing structure include at least one layer of organic packages film and at least one layer of inorganic encapsulated film.
In the present embodiment, the encapsulating structure is the thin-film packing structure being stacked, it is preferred that the outermost layer of the encapsulating structure is
Organic film.
In the present embodiment, the microlens array includes patterned network and fills the micro- of the network
Lens.Referring to fig. 2 and Fig. 4, the grid cell in the network is square net or regular hexagonal cell.Specifically, institute
Stating patterned network is micro-nano barrier grid and/or surface difference alienation grid；Wherein, the micro-nano barrier grid
To be deposited on the micro-nano wall on encapsulating structure, described the inner surface and the outer surface for grid has the grid of different contact angles
Structure.
It is aobvious for the OLED with microlens array in different embodiments of the invention referring to Figure 11 to 14, Figure 11 to Figure 14
The partial cutaway view of display screen.Wherein, Figure 11 is the partial cross-section of the lenticule truth formed using micro-nano barrier grid 15,
Figure 12 is the partial cross-section that the lenticule truth that differentiation grid 16 is formed is deposited.
In the present embodiment, on the inorganic thin film for the encapsulating structure that the microlens array can be located at OLED display screen
Side, as shown in figure 13, wherein 11 be OLED display screen, 21 be the first encapsulation inorganic layer, and microlens array is located at the first encapsulation nothing
On machine layer.Above the organic film for the encapsulating structure that the microlens array can also be located at OLED display screen, such as Figure 14 institute
Show, wherein 11 be OLED display screen, 21 be the first encapsulation inorganic layer, and 31 be the first encapsulation organic layer, and microlens array is located at the
On one encapsulation organic layer.
The method that the present invention provides a kind of to form microlens array in OLED display, can be used in OLED device
Form special-shaped microlens array.The present invention is formed using electrohydrodynamic Printing techniques on OLED structure surface adjacent for separating
The grid of lenticule, likewise, the drop of curable solution is printed in the grid using electrohydrodynamic Printing techniques,
The drop is set to be formed by curing lenticule within a grid later.Electrohydrodynamic Printing techniques can be formed with arbitrary shape
Grid can form the microlens array of square or regular hexagon structure on OLED structure surface easily.Therefore, compared to
The prior art, the present invention can further promote the duty ratio of microlens array under the premise of save the cost, improve OLED's
Device performance.
In conclusion although the present invention has been disclosed above in the preferred embodiment, but above preferred embodiment is not to limit
The system present invention, those skilled in the art can make various changes and profit without departing from the spirit and scope of the present invention
Decorations, therefore protection scope of the present invention subjects to the scope of the claims.
Claims (10)
1. a kind of method for forming microlens array in OLED display, which is characterized in that method includes the following steps:
Oled panel is provided, the light-emitting surface of the oled panel has encapsulating structure；
Patterned network is formed on the encapsulating structure, the grid cell in the network be square net or
Regular hexagonal cell；
Dropping liquid is filled in the grid cell, the dropping liquid in adjacent mesh is isolated from each other；
Solidify the dropping liquid, forms microlens array.
2. the method according to claim 1 for forming microlens array, which is characterized in that formed on the encapsulating structure
Patterned network be micro-nano barrier grid, the micro-nano barrier grid be deposited on it is micro-nano on encapsulating structure
Wall.
3. the method according to claim 2 for forming microlens array, which is characterized in that the height of the micro-nano wall is small
In or equal to lens unit in the microlens array thickness, the thickness of the micro-nano wall is less than or equal to described micro-
/ 10th of the diameter of lens unit in lens array, the side length of the grid are greater than or equal to 10 microns and are less than or equal to
200 microns.
4. the method according to claim 3 for forming microlens array, which is characterized in that the production side of the micro-nano wall
Method are as follows:
By Electrospun in the encapsulating structure printout surface Kynoar, the grid knot of polyvinylidene fluoride composition is formed
Structure.
5. the method according to claim 1 for forming microlens array, which is characterized in that formed on the encapsulating structure
Patterned network is surface difference alienation grid, and the surface difference alienation grid is that the inner surface and the outer surface of grid has
The network of different contact angles.
6. the method according to claim 5 for forming microlens array, which is characterized in that the surface material of the encapsulating structure
For the contact angle of material less than 90 °, the contact angle of the material on the grid lines surface of the differentiation grid is greater than 90 °；Wherein,
The height of the grid lines of the surface difference alienation grid is less than or equal to the thickness of the lens unit in the microlens array
Degree, the thickness of the grid lines is less than or equal to 1/10th of the diameter of the lens unit in the microlens array, described
The side length of grid is greater than or equal to 10 microns and is less than or equal to 200 microns.
7. the method according to claim 6 for forming microlens array, which is characterized in that the surface difference alienation grid
Production method includes:
Mask plate combination is provided, the mask plate combination includes the first mask plate of preparation transverse grid and prepares longitudinal combination
Second mask plate；
Polytetrafluoroethylene (PTFE) is deposited on the surface of the encapsulating structure using first mask plate, forms transverse grid；
Polytetrafluoroethylene (PTFE) is deposited on the surface of the encapsulating structure using second mask plate, forms longitudinal grid.
8. the method according to claim 1 for forming microlens array, which is characterized in that the dropping liquid has mobility,
It includes uv-curing type liquid, any one in thermohardening type liquid；Wherein,
The light transmittance for the solid material that the dropping liquid is formed after solidifying is greater than or equal to 90%, and refractive index is greater than or equal to 1.4.
9. a kind of microlens array, which is characterized in that the microlens array is located at the encapsulation on the outside of the light-emitting surface of oled panel
In structure；The microlens array includes patterned network and the lenticule for filling the network, wherein
Grid cell in the network is square net or regular hexagonal cell.
10. microlens array according to claim 9, which is characterized in that the patterned network is micro-nano
Obstruct grid and/or surface difference alienation grid；Wherein,
The micro-nano barrier grid is the micro-nano wall being deposited on encapsulating structure, described the inner surface and the outer surface for grid
Network with different contact angles.
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| CN201910090002.7A CN109817843B (en) | 2019-01-30 | 2019-01-30 | Method for forming microlens array in OLED display and microlens array |
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| CN201910090002.7A CN109817843B (en) | 2019-01-30 | 2019-01-30 | Method for forming microlens array in OLED display and microlens array |
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