CN109796066A - A kind of plasma-activated water generating device of high power D BD - Google Patents
A kind of plasma-activated water generating device of high power D BD Download PDFInfo
- Publication number
- CN109796066A CN109796066A CN201910146290.3A CN201910146290A CN109796066A CN 109796066 A CN109796066 A CN 109796066A CN 201910146290 A CN201910146290 A CN 201910146290A CN 109796066 A CN109796066 A CN 109796066A
- Authority
- CN
- China
- Prior art keywords
- ground electrode
- plasma
- plate
- generating device
- dielectric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Plasma Technology (AREA)
Abstract
The present invention relates to plasma activation water generating device technical fields, and in particular to a kind of plasma-activated water generating device of high power D BD.It mainly include water chamber, gas chamber, high-field electrode, dielectric-slab, gas discharge channel, dielectric-slab fixed plate, ground electrode, ground electrode pressing plate, homogenizing plate, bottom；The water chamber is the cylindrical structure that quartz ampoule is formed, and quartz ampoule is fixed on ground electrode by ground electrode pressing plate, and ground electrode pressing plate is fixedly connected with ground electrode, and the ground electrode is fixed in dielectric-slab fixed plate by fixation hole.The form of DBD employed in the present invention avoids capillary in capillary bubbling discharging structure and is easily damaged, and electrode is easy to oxidize to cause device unstable.The stabilization that ensure that discharge channel using capillary is avoided in the device, high-field electrode uses metal bar and increases the robustness of high-field electrode, and then increases the service life of device.
Description
Technical field
The present invention relates to a kind of plasma-activated water generating devices of high power D BD, belong to plasma activation water and fill
Set technical field.
Background technique
With the development of plasma technology, the application of plasma technique is also more and more.Plasma water wait from
It is found in daughter water development process, and gradually warms up.The research of atmos low-temperature plasma activated water in recent years at
For the hot spot of plasma field, related low-temperature plasma activation water using more and more.Plasma water is widely applied
On cleaning, sterilizing, algae sewage treatment, preserving fruit and vegetable utilizing.
That there are preparation efficiencies is low for traditional atmospheric pressure plasma water generating device, generating device is unstable, easy to damage etc. asks
Topic, and the plasma water prepared in the unit time is limited.
Summary of the invention
In view of the problems of the existing technology, the present invention provides that a kind of preparation process is simple, at low cost, production method is simple
Single, powerful atmos low-temperature microplasma activates water generating device.
Technical scheme is as follows: a kind of plasma-activated water generating device of high power D BD, including water chamber, gas
Room, high-field electrode, dielectric-slab, gas discharge channel, dielectric-slab fixed plate, ground electrode, ground electrode pressing plate, homogenizing plate, bottom；
The water chamber is the cylindrical structure that quartz ampoule is formed, and quartz ampoule is fixed on ground electrode by ground electrode pressing plate, ground
Electrode pressing plate is fixedly connected with ground electrode, and the ground electrode is fixed in dielectric-slab fixed plate by fixation hole；
In the high-field electrode insertion medium tube, medium tube insertion high-field electrode fixation hole is fixed, and dielectric-slab passes through solid
Determine hole to be fixed among dielectric-slab fixed plate and gas chamber, discharge channel is set on dielectric-slab；
The gas chamber is mounted on bottom, and gas chamber is provided with homogenizing plate, opened up on the gas chamber side or bottom into
Stomata, the gas chamber are the cylindrical shell of upper and lower opening, are provided with high-field electrode fixation hole in the side of gas chamber.
Further, the air inlet is located above homogenizing plate.
Further, the air inlet is located at below homogenizing plate.
Further, the ground electrode is intermediate round-meshed annularly electrode.
Further, working gas flow is not less than 3L/min.
Further, the material of the gas chamber is quartz or ceramics or polytetrafluoroethylene (PTFE).
Further, the high-field electrode, ground electrode, ground electrode pressing plate material be steel or copper.
Further, dielectric-slab selects the preferable ceramic wafer of insulating capacity or quartz plate.
Further, in order to reduce discharge voltage, media plate thickness are preferably no more than 2mm.
Further, discharge channel diameter is less than or equal to 1mm；
Further, working gas is air or oxygen.
Further, the high-field electrode, ground electrode, ground electrode pressing plate use well conducting metal material, as steel plate,
Copper sheet or other metal or alloy materials etc..
Further, the gas chamber, water chamber are made of quartz or ceramics or polytetrafluoroethylene (PTFE).
Further, discharge type is dielectric barrier discharge.
The invention has the following advantages over the prior art: plasma water generating device of the present invention putting using DBD
Electric form, other opposite discharge types are more stable, and processing area is larger；The plasma water generating device is put using micro-
Electro-plasma discharge channel is less than or equal to 1mm, discharges than other forms more stable, and working gas ionizing efficiency is higher, into
And the generation efficiency of plasma-activated water.The form of DBD employed in the present invention avoids capillary and is bubbled discharging structure
Middle capillary is easily damaged, and electrode is easy to oxidize to cause device unstable.It avoids putting using capillary ensure that in the device
The stabilization of electric channel, high-field electrode uses metal bar and increases the robustness of high-field electrode, and then increases making for device
Use the service life.Meanwhile present apparatus production is simple, install convenient, easily disassembled maintenance improves work efficiency.
Detailed description of the invention
Fig. 1 is a kind of plasma-activated water generating device overall appearance figure of high power D BD；
Fig. 2 is a kind of plasma-activated water generating device A-A cross-sectional view of high power D BD；
Fig. 3 is the top view of Fig. 1；
Fig. 4 is the bottom view of Fig. 2；
Fig. 5 is the B-B cross-sectional view of gas chamber.
Wherein: 1, quartz ampoule, 2, ground electrode pressing plate, 3, ground electrode, 4, dielectric-slab fixed plate, 5, medium tube, 6, high-voltage electricity
Pole, 7, gas chamber, 8, bottom, 9, fixation hole, 10, homogenizing plate, 11, dielectric-slab, 12, discharge channel, 13, water chamber, 14, air inlet,
15, high-field electrode fixation hole.
Specific embodiment
Following further describes the present invention with reference to the drawings:
As Figure 1-Figure 5, a kind of plasma-activated water generating device of high power D BD, including water chamber 13, gas chamber 7, height
Piezoelectricity pole 6, dielectric-slab 11, gas discharge channel 12, dielectric-slab fixed plate 4, ground electrode 3, ground electrode pressing plate 2, homogenizing plate 10, under
Bottom 8；
The water chamber 13 is the cylindrical structure that quartz ampoule 1 is formed, and quartz ampoule 1 is fixed on ground electrode 3 by ground electrode pressing plate 2
On, ground electrode pressing plate 2 is fixedly connected with ground electrode 3, and the ground electrode 3 is fixed on dielectric-slab fixed plate 4 by fixation hole 9
On；
The high-field electrode 6 is inserted into medium tube 5, and medium tube 5 is inserted into high-field electrode fixation hole 15 and is fixed, dielectric-slab 11
It is fixed among dielectric-slab fixed plate 4 and gas chamber 7 by fixation hole 9, discharge channel 12 is set on dielectric-slab 11；
The gas chamber 7 is mounted on bottom 8, and gas chamber 7 is provided with homogenizing plate 10, opens up air inlet 14 on the bottom 8,
The gas chamber 7 is the cylindrical shell of upper and lower opening, is provided with high-field electrode fixation hole 15 in the side of gas chamber 7.
The invention mainly comprises water chamber 13, gas chamber 7, high-field electrode 6, dielectric-slab 11, gas discharge channel 12, dielectric-slab are solid
Fixed board 4, ground electrode 3, ground electrode pressing plate 2, homogenizing plate 10, bottom 8.Wherein, water chamber 13 is surrounded by quartz ampoule 1, with deal with,
Store plasma-activated water.Gas chamber 7 is the cylindrical shell of upper and lower opening, is provided in the lateral distance upper end appropriate location of gas chamber
High-field electrode fixation hole 15, high-field electrode 6 are inserted into medium tube 5, and high-field electrode 6 is fitted closely with medium tube 5, is inserted into height
Pressure electrode fixing holes 15 are fixed.Dielectric-slab 11 is equipped with gas discharge channel 12, and dielectric-slab fixed plate 4 squeezes dielectric-slab 11
It is pressed in dielectric-slab fixed plate 4 to be fixed among gas chamber 7 and by fixation hole 9 with screw, while being sealed using O circle.
Each discharge electric channel 12 on dielectric-slab 11 needs face high-field electrode 6, preferably to realize electric discharge.High-field electrode 6 is straight
It connects and is connect with high voltage power supply.Dielectric-slab 11 is above the intermediate cyclic annular ground electrode 3 for having round hole, and inner ring can directly contact
Water, ground electrode 3 are screwed in dielectric-slab fixed plate 4 by 9 benefit of fixation hole, and are sealed with O circle.Ground electrode pressing plate
2 are fixed on the quartz ampoule 1 of water chamber 13 on ground electrode 3 by squeezing O circle, and pass through fixation hole 9 for ground electrode pressing plate 2 with screw
It is fixed on ground electrode 3, while structure on the ground electrode 3 outside lead to device can be connect on the fixed screw and completely discharged knot
Structure.On gas chamber 7 be equipped with homogenizing plate 10, enable to be passed into the air-flow even inside device by discharge channel 12.Into
Stomata 14 can be opened in 7 10 or less side homogenizing plate of gas chamber or on bottom 8.Bottom 8 is consolidated bottom 8 with gas chamber 7 using screw
It is fixed, while being sealed using O circle.Gas is entered in gas chamber 7 by air inlet 14 passes through discharge channel after homogenizing plate 10
12, it is entered after being discharged in discharge channel 12 and carries out reacting raw plasma-activated water with water in water chamber 13.
In the use of the present invention, high-field electrode 6 is connected to power supply by high-voltage line, structure after high-field electrode 6 is connected to power supply
At high voltage supply part, high-field electrode 6 provides suitable frequency and discharge voltage, is passed through working gas by air inlet 14.Work
Make gas by entering discharge channel 12 after homogenizing plate 10, working gas enters after being ionized reacts life with water in water chamber 13
At plasma-activated water.
Above-described embodiment is only intended to citing and explanation of the invention, and is not intended to limit the invention to described
In scope of embodiments.Furthermore it will be appreciated by persons skilled in the art that the present invention is not limited to the above embodiment, according to this hair
Bright introduction can also make more kinds of variants and modifications, these variants and modifications all fall within present invention model claimed
In enclosing.
Claims (8)
1. a kind of plasma-activated water generating device of high power D BD, which is characterized in that including water chamber (13), gas chamber (7), height
Piezoelectricity pole (6), dielectric-slab (11), gas discharge channel (12), dielectric-slab fixed plate (4), ground electrode (3), ground electrode pressing plate
(2), homogenizing plate (10), bottom (8)；
The water chamber (13) is the cylindrical structure that quartz ampoule (1) is formed, and quartz ampoule (1) is fixed on ground by ground electrode pressing plate (2)
On electrode (3), ground electrode pressing plate (2) is fixedly connected with ground electrode (3), and the ground electrode (3) is fixed on by fixation hole (9)
In dielectric-slab fixed plate (4)；
In high-field electrode (6) insertion medium tube (5), medium tube (5) is inserted into high-field electrode fixation hole (15) and is fixed, medium
Plate (11) is fixed among dielectric-slab fixed plate (4) and gas chamber (7) by fixation hole (9), and setting electric discharge is logical on dielectric-slab (11)
Road (12)；
The gas chamber (7) is mounted on bottom (8), and gas chamber (7) is provided with homogenizing plate (10), the gas chamber (7) side or
It is opened up air inlet (14) on bottom (8), the gas chamber (7) is the cylindrical shell of upper and lower opening, is provided in the side of gas chamber (7)
High-field electrode fixation hole (15).
2. the plasma-activated water generating device of high power D BD as described in claim 1, which is characterized in that the air inlet
Hole (14) is located above homogenizing plate (10).
3. the plasma-activated water generating device of high power D BD as described in claim 1, which is characterized in that the air inlet
Hole (14) is located at below homogenizing plate (10).
4. the plasma-activated water generating device of high power D BD as described in claim 1, which is characterized in that the ground electricity
Pole (3) is intermediate round-meshed annularly electrode.
5. the plasma-activated water generating device of high power D BD as described in claim 1, which is characterized in that the medium
The material of plate (11) is ceramic wafer or quartz plate.
6. the plasma-activated water generating device of high power D BD as described in claim 1, which is characterized in that working gas stream
Amount is not less than 3L/min.
7. the plasma-activated water generating device of high power D BD as described in claim 1, which is characterized in that the gas chamber (7)
Material be quartz ceramics or polytetrafluoroethylene (PTFE).
8. the plasma-activated water generating device of high power D BD as described in claim 1, which is characterized in that the high-voltage electricity
Pole (6), ground electrode (3), ground electrode pressing plate (2) material are steel or copper.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910146290.3A CN109796066A (en) | 2019-02-27 | 2019-02-27 | A kind of plasma-activated water generating device of high power D BD |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910146290.3A CN109796066A (en) | 2019-02-27 | 2019-02-27 | A kind of plasma-activated water generating device of high power D BD |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109796066A true CN109796066A (en) | 2019-05-24 |
Family
ID=66561388
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910146290.3A Pending CN109796066A (en) | 2019-02-27 | 2019-02-27 | A kind of plasma-activated water generating device of high power D BD |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109796066A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111320227A (en) * | 2020-02-28 | 2020-06-23 | 大连理工大学 | Liquid electrode dielectric barrier discharge device |
| CN111511088A (en) * | 2020-04-29 | 2020-08-07 | 西安交通大学 | Preparation method, device and application of alkaline plasma activating solution |
| CN112358015A (en) * | 2020-12-22 | 2021-02-12 | 赣南师范大学 | Medium barrier discharge low-temperature plasma sewage treatment unit |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105491774A (en) * | 2016-01-18 | 2016-04-13 | 大连民族大学 | Array type microplasma generating device based on conductive coating |
| CN206051643U (en) * | 2016-08-11 | 2017-03-29 | 大连民族大学 | A kind of plasma producing apparatus to liquid activation |
| CN107750085A (en) * | 2017-08-30 | 2018-03-02 | 大连民族大学 | Atmos low-temperature microplasma activates water generating device |
| CN108408843A (en) * | 2018-03-14 | 2018-08-17 | 大连民族大学 | A kind of plasma-activated water generating device |
-
2019
- 2019-02-27 CN CN201910146290.3A patent/CN109796066A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105491774A (en) * | 2016-01-18 | 2016-04-13 | 大连民族大学 | Array type microplasma generating device based on conductive coating |
| CN206051643U (en) * | 2016-08-11 | 2017-03-29 | 大连民族大学 | A kind of plasma producing apparatus to liquid activation |
| CN107750085A (en) * | 2017-08-30 | 2018-03-02 | 大连民族大学 | Atmos low-temperature microplasma activates water generating device |
| CN108408843A (en) * | 2018-03-14 | 2018-08-17 | 大连民族大学 | A kind of plasma-activated water generating device |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111320227A (en) * | 2020-02-28 | 2020-06-23 | 大连理工大学 | Liquid electrode dielectric barrier discharge device |
| CN111511088A (en) * | 2020-04-29 | 2020-08-07 | 西安交通大学 | Preparation method, device and application of alkaline plasma activating solution |
| CN112358015A (en) * | 2020-12-22 | 2021-02-12 | 赣南师范大学 | Medium barrier discharge low-temperature plasma sewage treatment unit |
| CN112358015B (en) * | 2020-12-22 | 2023-08-01 | 赣南师范大学 | Dielectric barrier discharge low-temperature plasma sewage treatment unit |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN109796066A (en) | A kind of plasma-activated water generating device of high power D BD | |
| CN105060408B (en) | A kind of submerged cryogenic plasma method of wastewater treatment and device | |
| HK1068234A1 (en) | Method for producing ultrafine dispersion water ofnoble metal ultrafine particles | |
| CN107750085A (en) | Atmos low-temperature microplasma activates water generating device | |
| CN201528464U (en) | Novel atmospheric pressure jet flow cold plasma generator | |
| CN106028616A (en) | Gliding arc discharge plasma jet generation device and method thereof | |
| CN206692391U (en) | A kind of sewage-treatment plant using more needle plate gas-liquid discharge in water plasmas | |
| CN105858814A (en) | Array-type medium-preventing-discharge wastewater treatment device for high-density water | |
| CN108408843B (en) | Plasma activated water generating device | |
| CN104609509B (en) | A kind of plasma body cleaning device | |
| CN204508893U (en) | A kind of plasma body cleaning device | |
| CN205603215U (en) | Utilize plasma discharge preparation hydrogen peroxide's device | |
| CN103997841A (en) | Handheld portable generating device for sliding arc low-temperature plasma | |
| CN105744713A (en) | Array needle-board type liquid phase plasma jetting generation apparatus | |
| CN205812485U (en) | A kind of Gliding arc discharge plasma mjector | |
| CN101759154A (en) | Device and method for plasma to synthesize hydrogen peroxide | |
| CN107010603A (en) | A kind of ozone generating-device and method for water process | |
| CN110627171A (en) | Low-temperature plasma active water generating device and method | |
| CN211688408U (en) | Low-temperature plasma active water generating device and parallel low-temperature plasma active water generating device | |
| CN104310537B (en) | A kind of Absorbable organic halogens exports the device of silver ions | |
| CN203781900U (en) | Water treatment device and water treatment system adopting same | |
| CN210528681U (en) | Water treatment device adopting liquid injection technology | |
| CN113175721A (en) | Plasma humidifier | |
| CN217763742U (en) | Plasma humidifier | |
| CN209292484U (en) | A kind of planting body activation hydrophilic means |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190524 |
|
| RJ01 | Rejection of invention patent application after publication |