CN109773330A - Laser output system and calculation method based on homogenizer - Google Patents
Laser output system and calculation method based on homogenizer Download PDFInfo
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- 238000000034 method Methods 0.000 claims description 16
- 238000012804 iterative process Methods 0.000 claims description 5
- 238000007493 shaping process Methods 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
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- 239000010453 quartz Substances 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
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Abstract
The present invention relates to technical field of laser processing, and in particular to a kind of laser output system and calculation method based on homogenizer.A kind of laser output system based on homogenizer, including laser, beam expanding lens, reflecting mirror and focus lamp, it further include optics microscope group and homogenizer, the laser beam that the laser issues is expanded through beam expanding lens, and enter optical frames group after the reflecting mirror reflection being arranged through 45 °, the laser beam is incident to homogenizer after optics microscope group is converted to bessel beam, the homogenizer carries out the bessel beam to homogenize processing, and export to focus lamp, the focus lamp forms processing laser output after being focused to light beam.Utilize energy density distribution uniform characteristic of the laser output system output laser on thickness of workpiece, it can guarantee identical by thermal stress on material through-thickness, phenomena such as being not in hard brittle material chipping, micro-crack, effectively reduces the yield and quality of product.
Description
Technical field
The present invention relates to technical field of laser processing, and in particular to it is a kind of by the laser output system of homogenizer and based on
Calculation method.
Background technique
With the development of industry, hard brittle material is more prevalent in the application of every field.Those hard brittle materials, such as
Silicon single crystal, quartz crystal, ceramics, jewel, glass, rareearth magnetic material, hard alloy etc., in the industry must when high volume applications
It must be processed into certain geometry, required precision is very high, while also wanting to high production efficiency.Relative to tradition machinery processing side
Method, laser processing reduce and damage due to contact stress to material bring without directly contacting；Laser focal beam spot is small, processing
Slit width is small, and heat affected area is small, can be realized high efficiency processing；In addition realization is also facilitated to be easy to the processing in three-dimensional irregular face.Cause
This is greatly developed using laser processing hard brittle material.
The local energy of laser beam after focusing is very high, carries out local heating to material, can carry out to material high
Speed processing.But since laser beam cannot keep on thickness of workpiece direction, energy is uniform, and heated on material through-thickness answers
Power is not identical, it is easy to phenomena such as causing hard brittle material to generate chipping, micro-crack, reduce the yield and quality of product.
Summary of the invention
In order to solve the above technical problems, the present invention provides one kind can guarantee laser beam energy density on thickness of workpiece
It is uniformly distributed, prevents the laser output system and calculation method based on homogenizer of hard brittle material chipping.
A kind of laser output system based on homogenizer of the present invention, technical solution are as follows: including laser, beam expanding lens,
Reflecting mirror and focus lamp further include optics microscope group and for making laser beam energy density on thickness of workpiece is equally distributed to homogenize
Device, the laser beam that the laser issues are expanded through beam expanding lens, and enter optical frames after the reflecting mirror reflection being arranged through 45 °
Group, the laser beam are incident to homogenizer after optics microscope group is converted to bessel beam, and the homogenizer is to the shellfish
Sai Er light beam carries out homogenizing processing, and exports to focus lamp, and the focus lamp is formed in thickness of workpiece after being focused to light beam
The upper equally distributed processing laser output of energy density.
More preferred, the optics microscope group is axicon microscope group or phase grating.
More preferred, the homogenizer is phase grating.
More preferred, the mirror surface material of the homogenizer is vitreous silica.
More preferred, when the wavelength of laser output laser is 1064nm, and thickness of processing piece is 1.5mm
When, the convex curvature of the homogenizer is 23.352mm.
The skill of the calculation method of homogenizer radius of curvature in a kind of laser output system based on homogenizer of the present invention
Art scheme is, comprising the following steps:
Step 1: the Gaussian beam issued according to laser is sought out by the light distribution I (r, z) after axicon microscope group
The relational expression of initial amplitude and light intensity
Step 2: the optical field distribution expression formula U after axicon microscope group is passed through to the Gaussian beam that laser issues0(x0,y0)
Fourier transform and inverse fourier transform are carried out, the output light field distribution on objective plane is obtainedWith input light field
It is distributed U0 (i+1)(x0,y0)；
Step 3: in objective plane range (zg, zg+ d) in arbitrarily select m plane as output light field plane, with I (r,
z1)=I (r, z2)=... I (r, zm)=(Aieda(x,y))2=IideaAs restrictive condition, to U0(x0,y0) be iterated, directly
To satisfactionThen iteration terminates；
Step 4: to the output light field matrix for completing to obtain after iteration It carries out
Fitting, obtains the radius of curvature expression formula of homogenizer
Step 5: according to expression formulaCalculate the radius of curvature of homogenizer, the song of the homogenizer
Rate radius is to meet the equally distributed homogenizer radius of curvature of laser beam energy density on thickness of workpiece；
Wherein, the r is distance of the space coordinate under three-dimensional cartesian coordinate system to optical axis；Z is laser in transmission direction
On coordinate value；x0And y0Respectively laser x under rectangular coordinate system, the initial value in the direction y；X and y is respectively laser at right angle
The value in the direction x under coordinate system, y；The k is equal toThe λ is optical maser wavelength；The i be the number of iterations, the i=0,1,
2 ..., n；The zgFor the coordinate value of workpiece to be processed upper surface in the transmit direction；The d is workpiece to be processed thickness；Institute
Stating m is the plane number chosen, the zmFor m-th of plane coordinate value in the transmit direction of selection；Aieda(x, y) is reason
Think amplitude；The IideaFor ideal light intensity；The ε is setting value, and the value range of the setting value is 10e-3~10e-6；It is describedFor amplitude；It is describedFor phase function；The N is multinomial serial number；AiThe coefficient acquired for iteration；Y
The normalized radial aperture coordinate asked for iteration.
It is more preferred, the iterative process the following steps are included:
Step a: it is distributed according to the output light field on objective planeExpression formula to U0(x0,y0) carry out Fu
Vertical leaf transformation, the output light field obtained on objective plane are distributed asUtilize I (r, z1)=I (r, z2)=... I (r,
zm)=(Aieda(x,y))2=IideaAs restrictive condition, obtain
Step b: according to input optical field distribution U0 (i+1)(x0,y0) expression formula pair
Inverse fourier transform is carried out, input optical field distribution is obtainedInitial amplitude A0 (x0, y0) is taken using amplitude to limit
Condition obtains
Step c: by step b'sIt brings into step a, and repeats step a and b, directly
To satisfactionThen iteration terminates.
It is more preferred, in the step 5, when N takes 6, R=-136.7Y2+484.5Y4-637.4Y6+361.2Y8-
69.1Y10+53.4Y12。
More preferred, in the step 3, m takes 3.
Beneficial effects of the present invention: axicon microscope group and homogenizer are added on laser output light path, and according to this hair
The method of bright offer calculates the radius of curvature of homogenizer, is matched with calculating resulting radius of curvature to homogenizer
It sets, quadratic distribution can be carried out to axicon microscope group bessel beam is passed through, so that the laser energy density on thickness of workpiece point
Cloth is uniform.Utilize energy density distribution uniform characteristic of the laser output system output laser on thickness of workpiece, Neng Goubao
Identical by thermal stress on material through-thickness, phenomena such as being not in hard brittle material chipping, micro-crack is demonstrate,proved, it is effective to improve
The yield and quality of product.
Detailed description of the invention
Fig. 1 is a kind of light path schematic diagram of the laser output system based on homogenizer of the present invention；
Fig. 2 is the transmission schematic diagram of laser beam when optics microscope group is axicon microscope group in the present invention；
Fig. 3 is that laser passes through the Energy distribution schematic diagram after axicon microscope group；
Fig. 4 is that laser passes through the Energy distribution schematic diagram after homogenizer；
Fig. 5 is that laser beam passes through the Energy distribution schematic diagram on the direction of propagation of apparatus for shaping forward position；
Fig. 6 is that laser beam passes through the Energy distribution schematic diagram after apparatus for shaping on the direction of propagation；
Fig. 7 is energy of the laser beam on thickness of workpiece with the schematic diagram of multifocal formal distribution；
Fig. 8 is the equally distributed schematic diagram of energy of the laser beam on thickness of workpiece；
Fig. 9, which is that the present invention is a kind of, meets the equally distributed homogenizer parameter meter of laser beam energy density on thickness of workpiece
The iteration schematic diagram of calculation method.
In figure: 1-laser, 2-laser beams, 3-beam expanding lens, 4-reflecting mirrors, 5-optics microscope groups, 51-axicons
Microscope group, 52-phase gratings, 6-homogenizers, 7-focus lamps, 8-workpiece, 9-XY motorized precision translation stages, 10-apparatus for shaping.
Specific embodiment
Below by way of specific embodiment, the present invention is described in further detail:
As shown in Figure 1, a kind of laser output system based on homogenizer of the present invention include laser 1, it is beam expanding lens 3, anti-
Penetrate mirror 4, optics microscope group 5, homogenizer 6 and focus lamp 7.Wherein, optics microscope group 5 includes axicon microscope group 51 and phase grating
52.The laser beam 2 that laser 1 issues is expanded through beam expanding lens 3, and enters optical frames group after the reflection of reflecting mirror 4 being arranged through 45 °
5, laser beam 2 is incident to homogenizer 6 after the axicon microscope group 51 of optics microscope group 5 is converted to bessel beam, homogenizes dress
It sets 6 pairs of bessel beams to carry out homogenizing processing, and exports to focus lamp 7, focus lamp 7 forms processing after being focused to light beam and swashs
Light output, workpiece 8 are placed on XY motorized precision translation stage 9, and the completion that linked in X, Y both direction by XY motorized precision translation stage 9 swashs
Light machining locus.
As it can be seen in figures 5 and 6, after carrying out preliminary transformation to the laser beam 2 of Gaussian Profile by apparatus for shaping 10, laser
The Energy distribution of light beam 2 in the propagation direction is no longer place's energy highest with a tight waist, and far from place with a tight waist, energy is gradually decreased, simultaneously
Energy distribution on laser facula cross section is uniform.When optics microscope group 5 is axicon microscope group 51, laser beam energy density point
Cloth is as shown in Figures 2 and 3.The range of its energy density that can be used to process is wider than Gaussian beam；Using homogenizer 6
After focus lamp 7, the energy density distribution acted on workpiece 8 is as shown in figure 4, it is evenly distributed on 8 thickness of workpiece.Light
Microscope group 5 is learned in addition to axicon microscope group 51 can be used, phase grating can also be used, there are some quarters on the surface of phase grating 52
The structure of erosion is the equally distributed requirement of energy density according to emergent light spot and is specially designed.It with reference to the accompanying drawings 7 and 8 can be with
Find out, energy density of the laser beam on thickness of workpiece is in periodical Energy distribution, according to actual processing demand, adjustment
Optics microscope group 5 and homogenizer 6, may be implemented Energy distribution of the laser beam on thickness of workpiece be multifocal form or uniformly
Distribution form.
Below to realize laser beam for the purpose of energy is uniformly distributed on thickness of workpiece, a kind of pair of homogenizer is provided
The optics microscope group of the method that parameter is calculated, this method is axicon microscope group, and homogenizer is phase grating.The step of this method
Suddenly are as follows:
Step 1: the light distribution I (r, z) after axicon microscope group is passed through according to the Gaussian beam that laser issues
Seek out the relational expression of initial amplitude and light intensityLight distributionf0(x0,y0) it is initial phase letter
Number, r are distance of the space coordinate under three-dimensional cartesian coordinate system to optical axis；Z is the coordinate value of laser in the transmit direction；x0With
y0Respectively laser x under rectangular coordinate system, the initial value in the direction y.
Step 2: the optical field distribution expression formula U after axicon microscope group is passed through to the Gaussian beam that laser issues0(x0,y0)
Fourier transform and inverse fourier transform are carried out, the output light field distribution on objective plane is obtainedWith input light field
It is distributed U0 (i+1)(x0,y0)；
Wherein,
λ is optical maser wavelength, is selected as λ=1064nm herein；
ω0For incident laser spot diameter, ω is selected herein0=5mm；
N is the refractive index of eyeglass, is selected as n=1.5 herein；
I0For incident laser light intensity, it is selected as I herein0=1W；
α is the angle of axicon cone angle, is selected as α=1 ° herein；
J0For zero Bessel function；
Wherein, x and y is respectively laser x under rectangular coordinate system, the value in the direction y；The k is equal toThe λ is laser wave
It is long；The i is the number of iterations, the i=0,1,2 ..., p；
Step 3: in objective plane range (zg, zg+ d) in arbitrarily select m plane as output light field plane, with I (r,
z1)=I (r, z2)=... I (r, zm)=(Aieda(x,y))2=IideaAs restrictive condition, to U0(x0,y0) be iterated, directly
To satisfactionThen iteration terminates.
Wherein, zgFor the coordinate value of workpiece to be processed upper surface in the transmit direction；The d is workpiece to be processed thickness；
The m is the plane number chosen, the zmFor m-th of plane coordinate value in the transmit direction of selection；Aieda(x, y) is
Ideal amplitude；The IideaFor ideal light intensity；The ε is setting value, and the value range of the setting value is 10e-3~10e-6.
Step 4: to the output light field matrix for completing to obtain after iteration It carries out
Fitting, obtains the radius of curvature expression formula of homogenizerWherein,For amplitude；It is describedFor phase function；The N is multinomial serial number；AiThe coefficient acquired for iteration；Y is the normalization that iteration is asked
Radial aperture coordinate.
Step 5: according to expression formulaCalculate the radius of curvature of homogenizer, the song of the homogenizer
Rate radius is to meet the equally distributed homogenizer radius of curvature of laser beam energy density on thickness of workpiece, wherein when N takes
When 6, R=-136.7Y2+484.5Y4-637.4Y6+361.2Y8-69.1Y10+53.4Y12。
When the wavelength of laser output laser is 1064nm, and thickness of processing piece is d=1.5mm, homogenizer
Convex curvature is 23.352mm.
Hereinafter, being illustrated with a specific embodiment to iterative process.Assuming that the location of workpiece is located at coordinate zgPlace, workpiece
Thickness is selected as d=1.5mm, and choosing objective plane is any plane within the scope of thickness of workpiece, and coordinate value range is (zg, zg
+1.5)；(the z within the scope of objective planeg, zg+ 1.5) several planes are arbitrarily selected as output light field plane to be iterated, this
Place selects 3 (i.e. m is 3) a planes, it is assumed that its z-axis coordinate value is respectively z1, z2, z3, the limitation item of the output face in iterative process
Part is I (r, z1)=I (r, z2)=I (r, z3)=Iidea=(Aieda(x,y))2。
Iterative process the following steps are included:
Step a: it is distributed according to the output light field on objective planeExpression formula to U0(x0,y0) carry out Fu
Vertical leaf transformation, the output light field obtained on objective plane are distributed asUtilize I (r, z1)=I (r, z2)=... I (r,
zm)=(Aieda(x,y))2=IideaAs restrictive condition, obtain
Step b: according to input optical field distribution U0 (i+1)(x0,y0) expression formula pair
Inverse fourier transform is carried out, input optical field distribution is obtainedInitial amplitude A is taken using amplitude0(x0,y0) it is to limit item
Part obtains
Step c: by step b'sIt brings into step a, and repeats step a and b, directly
To satisfactionThen iteration terminates.
Embodiment one
It is picosecond that 50W wavelength is 532nm using power in one embodiment in device disclosed herein and method
Laser, the sapphire substrate of processing 2mm thickness, process velocity 300mm/s, after processing is completed, and process for sapphire-based on piece, flawless
Chipping phenomenon, the roughness processed on section are 0.2um.
Embodiment two
In one embodiment in device disclosed herein and method, using power be 30W wavelength be 1064nm fly
Second laser processes the glass of 1mm thickness, and process velocity 1000mm/s, after processing is completed, quartz is without other defects, cutting face
On roughness are as follows: 1.2um.
The above description is merely a specific embodiment, it is noted that anyone skilled in the art exists
Disclosed herein technical scope in, any changes or substitutions that can be easily thought of, should all cover protection scope of the present invention it
It is interior.
Claims (10)
1. a kind of laser output system based on homogenizer, including laser, beam expanding lens, reflecting mirror and focus lamp its feature exists
In: it further include optics microscope group and for making the equally distributed homogenizer of laser beam energy density on thickness of workpiece, it is described to swash
The laser beam that light device issues is expanded through beam expanding lens, and enters optical frames group, the laser beam after the reflecting mirror reflection being arranged through 45 °
Homogenizer is incident to after optics microscope group is converted to bessel beam, the homogenizer carries out the bessel beam even
Change processing, and export to focus lamp, the focus lamp is formed in energy density on thickness of workpiece after being focused to light beam uniform
The processing laser of distribution exports.
2. the laser output system based on homogenizer as described in claim 1, it is characterised in that: the optics microscope group is axis rib
Axicon lens group or phase grating.
3. the laser output system based on homogenizer as described in claim 1, it is characterised in that: the homogenizer is position phase
Grating.
4. the laser output system based on homogenizer as described in claim 1, it is characterised in that: the mirror surface of the homogenizer
Material is vitreous silica.
5. the laser output system based on homogenizer as claimed in claim 3, it is characterised in that: when laser output swashs
The wavelength of light is 1064nm, and when thickness of processing piece is 1.5mm, the convex curvature of the homogenizer is 23.352mm.
6. the laser output system based on homogenizer as described in claim 1, it is characterised in that: the reflecting mirror and optical frames
Apparatus for shaping is additionally provided between group.
7. the calculation method of homogenizer radius of curvature in a kind of laser output system based on homogenizer, which is characterized in that
The following steps are included:
Step 1: the Gaussian beam issued according to laser is sought out initially by the light distribution I (r, z) after axicon microscope group
The relational expression of amplitude and light intensity
Step 2: the optical field distribution expression formula U after axicon microscope group is passed through to the Gaussian beam that laser issues0(x0,y0) carry out
Fourier transform and inverse fourier transform obtain the output light field distribution on objective planeWith input optical field distribution
U0 (i+1)(x0,y0)；
Step 3: in objective plane range (zg, zg+ d) in arbitrarily select m plane as output light field plane, with I (r, z1)=
I(r,z2)=... I (r, zm)=(Aieda(x,y))2=IideaAs restrictive condition, to U0(x0,y0) be iterated, Zhi Daoman
FootThen iteration terminates；
Step 4: to the output light field matrix for completing to obtain after iteration It is fitted,
Obtain the radius of curvature expression formula of homogenizer
Step 5: according to expression formulaCalculate the radius of curvature of homogenizer, the curvature half of the homogenizer
Diameter is to meet the equally distributed homogenizer radius of curvature of laser beam energy density on thickness of workpiece；
Wherein, the r is distance of the space coordinate under three-dimensional cartesian coordinate system to optical axis；Z be laser in the transmit direction
Coordinate value；x0And y0Respectively laser x under rectangular coordinate system, the initial value in the direction y；X and y is respectively laser in rectangular co-ordinate
It is lower x, the value in the direction y；The k is equal toThe λ is optical maser wavelength；The i be the number of iterations, the i=0,1,2 ...,
p；The zgFor the coordinate value of workpiece to be processed upper surface in the transmit direction；The d is workpiece to be processed thickness；The m is
The plane number of selection, the zmFor m-th of plane coordinate value in the transmit direction of selection；Aieda(x, y) is ideal vibration
Width；The IideaFor ideal light intensity；The ε is setting value, and the value range of the setting value is 10e-3~10e-6；It is describedFor amplitude；It is describedFor phase function；The N is multinomial serial number；AiThe coefficient acquired for iteration；
Y is the normalized radial aperture coordinate that iteration is asked.
8. the calculating side of homogenizer radius of curvature in a kind of laser output system based on homogenizer as claimed in claim 7
Method, which is characterized in that the iterative process the following steps are included:
Step a: it is distributed according to the output light field on objective planeExpression formula to U0(x0,y0) carry out Fourier
Transformation, the output light field obtained on objective plane are distributed asUtilize I (r, z1)=I (r, z2)=... I (r, zm)=
(Aieda(x,y))2=IideaAs restrictive condition, obtain
Step b: according to input optical field distribution U0 (i+1)(x0,y0) expression formula pairIt carries out
Inverse fourier transform obtains input optical field distributionTaking initial amplitude A0 (x0, y0) using amplitude is qualifications,
It obtains
Step c: by step b'sIt brings into step a, and repeats step a and b, until full
FootThen iteration terminates.
9. the calculating side of homogenizer radius of curvature in a kind of laser output system based on homogenizer as claimed in claim 7
Method, it is characterised in that: in the step 5, when N takes 6, R=-136.7Y2+484.5Y4-637.4Y6+361.2Y8-69.1Y10+
53.4Y12。
10. the calculating of homogenizer radius of curvature in a kind of laser output system based on homogenizer as claimed in claim 7
Method, it is characterised in that: in the step 3, m takes 3.
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| CN204975690U (en) * | 2015-07-15 | 2016-01-20 | 武汉华工激光工程有限责任公司 | Produce device of bezier laser beam |
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| CN105458529A (en) * | 2016-01-21 | 2016-04-06 | 北京理工大学 | Method for efficiently making large-depth-diameter-ratio micropore arrays |
| JP2017142402A (en) * | 2016-02-10 | 2017-08-17 | 国立研究開発法人理化学研究所 | Laser beam fairing device, removal machining device, and zonal belt phase element |
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