CN109768464B - Low-noise high-efficiency deep ultraviolet continuous laser - Google Patents
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- CN109768464B CN109768464B CN201910198919.9A CN201910198919A CN109768464B CN 109768464 B CN109768464 B CN 109768464B CN 201910198919 A CN201910198919 A CN 201910198919A CN 109768464 B CN109768464 B CN 109768464B
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Abstract
The invention provides a high output coupling efficiency continuous laser system, comprising: the device comprises a continuous laser generating device, an electro-optical modulator device, a mode matching device, a first input coupling mirror, a second high-reflectivity cavity mirror, a first concave mirror device, a frequency doubling crystal, a dichroic mirror and a second concave mirror. The high-coupling-efficiency intracavity frequency-doubling 167nm continuous laser is characterized by low intracavity loss, high intracavity fundamental frequency power enhancement multiple, high nonlinear conversion efficiency, high output coupling efficiency, simple structure and high reliability.
Description
Technical Field
The invention belongs to the technical field of continuous laser, relates to a deep ultraviolet continuous laser generation system, and particularly relates to a system for generating 167nm continuous laser by intracavity frequency doubling with high output coupling efficiency.
Background
Deep ultraviolet band lasers, especially deep ultraviolet lasers below 200nm, have important applications in lithography spectroscopy, semiconductor lithography, micromachining detection, high resolution photoemission spectroscopy, and the like. In particular, energy-resolved angular resolved photoelectron spectroscopy (ARPES) uses high-energy photons to strike a substance, electrons being generated by the photoelectric effect. By analyzing the energy and angular distribution of photons, electronic band structure information about the sample is obtained. The higher the photon energy, the larger the measurable brillouin zone, and therefore the shorter the wavelength of the deep ultraviolet light source, the more interesting. The continuous deep ultraviolet light source also has the advantage over the pulsed deep ultraviolet light source that parasitic charge carriers are avoided in the vicinity of the measurement point. In addition, deep ultraviolet light sources have important applications in precision measurement spectroscopy of optical clocks. A single frequency 167.079nm laser source can be used for induction 27 Al + In (a) and (b) 1 S 0 → 1 P 1 Transition to achieve direct laser Doppler cooling and direct laser Doppler coolingDetection of 27 Al + Is a quantum state ion of (a). Other important applications of deep ultraviolet lasers exist in the semiconductor metrology field. In an illumination system for a photomask, both the critical dimension and the depth of focus depend linearly on the excitation wavelength.
Excimer lasers are commonly used in these tasks, but excimer lasers are operated in a pulsed state, typically with a pulse duration of 10ns and a repetition rate of 100Hz. However, many deep ultraviolet operations are more prone to continuous solid state lasers or semiconductor diode lasers, which are expected to not only narrow linewidths to improve coherence, but also improve power density, and also to improve reliability and ease of use. However, the solid-state and semiconductor continuous light directly output hardly reaches the ultraviolet band, and the band of the light source is limited to 200nm or more for a long period of time due to lack of suitable nonlinear crystals by the nonlinear frequency conversion method. With the advent of potassium fluoroborate beryllium (KBBF), the laser of 150nm-200nm wave band became possible. Based on the KBBF crystal, a plurality of femto-second, pico-second and nanosecond deep ultraviolet light sources are reported at present, and the light sources are femto-second, pico-second and nanosecond laser single-pass KBBF frequency doubling crystals based on high energy and high peak power, however, the method is not suitable for frequency doubling of continuous laser. Because the focusing power density of fundamental frequency light is lower, the conversion efficiency of the nonlinear crystal in the deep ultraviolet band is lower, and the deep ultraviolet continuous frequency doubling laser is difficult to generate through direct frequency doubling.
The resonance enhancement cavity has extremely low intra-cavity loss, so that the fundamental frequency power in the cavity is enhanced by tens of times, and the conversion efficiency of the nonlinear crystal in the cavity is improved. However, for 167nm resonance enhancement cavity frequency doubling, the output mirror needs to reduce the loss of fundamental frequency light as much as possible, and meanwhile, the frequency-doubled 167nm laser is led out efficiently. At present, due to the limitations of a coating technology and a coating material, under the condition that the reflectivity of 335nm can be ensured to be higher than 99%, the transmissivity of 167nm is only less than 50%, and high-efficiency output cannot be realized.
Disclosure of Invention
It is therefore an object of the present invention to overcome the drawbacks of the prior art and to provide a continuous laser system and its use.
Before setting forth the present disclosure, the terms used herein are defined as follows:
the term "PDH" refers to: pound-Drever-Hall.
The term "KBBF crystal" means: potassium fluoborate crystal.
The term "RBBF crystal" refers to: rubidium fluoroborate beryllium acid crystal.
To achieve the above object, a first aspect of the present invention provides a continuous laser system comprising:
the continuous laser generating device is used for outputting continuous fundamental frequency laser;
an electro-optic modulator means for modulating the frequency and phase of the continuous fundamental light to produce modulation sidebands;
the mode matching device is used for adjusting the beam waist position and the beam waist size of the facula of the fundamental frequency laser;
a first input coupling mirror for coupling the fundamental frequency light into the frequency multiplication enhancement cavity, the reflectivity of which is preferably 80% -99.9999%; the second high-reflectivity cavity mirror is used for folding the cavity mirror and simultaneously used for loading piezoelectric ceramics so as to lock the cavity length;
the first concave reflector is used for focusing the fundamental frequency light onto the frequency doubling crystal;
the second concave reflector is used for collimating the fundamental frequency light;
the frequency doubling crystal is used for generating nonlinear effect and converting fundamental frequency light into frequency doubling light; and
the dichroic mirror is used for transmitting fundamental frequency light, reflecting frequency multiplication continuous laser and coupling out frequency multiplication laser with high efficiency;
preferably, the continuous laser system is a system that generates a continuous laser of 165-170 nm, more preferably 167-168 nm, most preferably 167.75nm, at intracavity frequency doubling.
The continuous laser system according to the first aspect of the present invention, wherein the continuous laser generating device outputs a narrow linewidth laser light, and the output laser light wavelength range is 334-336nm, preferably 335nm; the linewidth of the output laser is smaller than 1 MHz; the power of the output laser is more than 1 watt; and/or
The power of the continuous laser generating device is preferably 100-10W, and the continuous laser generating device is preferably a 1342nm solid-state high-power narrow-linewidth single-frequency continuous laser obtained after two-stage intracavity frequency doubling.
The continuous laser system according to the first aspect of the present invention, wherein the electro-optic modulator means comprises an electro-optic crystal and a high voltage driver for modulating the frequency and phase of the fundamental continuous light;
preferably, the electro-optic crystal is selected from one or more of the following: lithium niobate (LiNbO) 3 ) Crystals, potassium dihydrogen phosphate (KDP) crystals; preferably lithium niobate (LiNbO) 3 ) And (5) a crystal. The continuous laser system according to the first aspect of the present invention, wherein the pattern matching means includes one or more concave lenses and convex lenses for high-transmittance film plating for fundamental frequency light;
preferably, the mode matching device adjusts the beam waist radius of the spot of the fundamental laser to be 200 μm-4 mm, preferably 500 μm-2 mm, and most preferably 1.5mm. The continuous laser system according to the first aspect of the present invention, wherein the first input coupling mirror is a planar mirror coated with a high-reflectivity film system for a fundamental frequency optical band;
the second high-reflectivity cavity mirror is a plane mirror plated with a high-reflectivity film system aiming at a fundamental frequency light wave band;
the first concave reflector is a concave reflector for plating a high-reflectivity film system aiming at a fundamental frequency light wave band, and the curvature radius of the first concave reflector is preferably 50-300 mm; and/or
The second concave reflector is a concave reflector for plating a high-reflectivity film system aiming at a fundamental frequency light wave band, and the curvature radius of the second concave reflector is 50-300 mm;
preferably, the first input coupling mirror, the second high reflectivity cavity mirror, the first concave mirror, the frequency doubling crystal, the dichroic mirror, and the second concave mirror form a ring shaped resonant cavity.
The continuous laser system according to the first aspect of the present invention, wherein the dichroic mirror is a planar dichroic mirror coated with a film system having a high transmittance of more than 99%, preferably more than 99.5%, for the fundamental optical band, while the dichroic mirror is coated with a film system having a high reflectance of more than 85%, preferably more than 90%, for the frequency doubling optical band.
The continuous laser system according to the first aspect of the present invention, wherein the frequency doubling crystal is selected from one or more of the following: KBBF crystals, rubidium fluoroborate beryllium (RBBF) crystals; KBBF crystals are preferred.
The continuous laser system according to the first aspect of the present invention, wherein the frequency doubling crystal is of brewster angle design.
The continuous laser system according to the first aspect of the present invention, wherein the continuous laser system further comprises:
piezoelectric ceramics used as a brake to control the cavity length; and/or
The PDH locking circuit is used for acquiring an error signal and generating a feedback signal to lock the cavity length and the fundamental frequency optical wavelength.
The continuous laser system according to the first aspect of the present invention, wherein,
the continuous laser system according to the first aspect of the present invention, wherein,
the continuous laser system according to the first aspect of the present invention, wherein,
a second aspect of the invention provides a deep ultraviolet laser comprising a continuous laser system as described in the first aspect.
It is therefore an object of the present invention to overcome the above-mentioned drawbacks of the prior art and to provide a system for generating 167nm continuous laser by intracavity frequency doubling with high output coupling efficiency, comprising:
the high-power 335nm continuous laser generating device is used for outputting 335nm single-frequency continuous fundamental frequency laser with a narrow linewidth;
the electro-optic modulator device is used for modulating the frequency and the phase of 335nm continuous fundamental frequency light, generating modulation sidebands and facilitating the subsequent cavity length locking.
And the mode matching device is used for adjusting the beam waist position and the beam waist size of the facula of the fundamental frequency laser.
A first input coupling mirror for coupling fundamental frequency light into the frequency doubling enhancing cavity.
The second high-reflectivity cavity mirror is used for folding the cavity mirror and simultaneously used for loading piezoelectric ceramics so as to lock the cavity length;
the first concave reflector is used for focusing the fundamental frequency light onto the frequency doubling crystal;
the second concave reflector is used for collimating the fundamental frequency light;
and the frequency doubling crystal is used for generating nonlinear effect and converting 335nm fundamental frequency light into 167nm frequency doubling light.
The dichroic mirror is used for transmitting 335nm fundamental frequency light, simultaneously reflecting 167nm continuous laser with frequency doubling, and efficiently coupling 167nm frequency doubling laser out.
Piezoelectric ceramics are used as a brake to control the cavity length.
The PDH locking circuit is used for acquiring an error signal and generating a feedback signal to lock the cavity length and the fundamental frequency optical wavelength.
According to the high-output coupling efficiency intracavity frequency doubling continuous 167nm laser generating system, preferably, the high-power 335nm continuous laser generating device is a single-frequency continuous light laser with output power of 1W and wavelength of 335nm, and the linewidth of the single-frequency continuous light laser is smaller than 1 MHz.
The high-output coupling efficiency intracavity frequency doubling continuous 167nm laser generating system according to the invention preferably comprises an electro-optic modulator device, an electro-optic crystal and a high-voltage driving device.
The high output coupling efficiency intracavity frequency doubling continuous 167nm laser generating system according to the invention is preferably a pattern matching device for a series of concave and convex lens combinations coated with 335nm high transmission film.
In the high output coupling efficiency intracavity frequency doubling continuous 167nm laser generating system according to the present invention, preferably, the first input mirror is an input coupling mirror for 335nm coating.
According to the high-output coupling efficiency intracavity frequency doubling continuous 167nm laser generating system, preferably, the second high-reflectivity cavity mirror is a cavity mirror with a 335nm plating reflectivity higher than 99.5% high-reflectivity film.
In the high-output coupling efficiency intracavity frequency doubling continuous 167nm laser generating system, preferably, the first concave reflecting mirror is a concave reflecting mirror with a certain curvature for a 335nm plating reflection rate higher than 99.5% high reflecting film.
In the high-output coupling efficiency intracavity frequency doubling continuous 167nm laser generating system, preferably, the second concave reflecting mirror is a concave reflecting mirror with a certain curvature for a 335nm plating reflection rate higher than 99.5% high reflecting film.
According to the high-output coupling efficiency intracavity frequency doubling continuous 167nm laser generation system, preferably, the frequency doubling crystal is a non-linear crystal with Brewster angle design.
The high output coupling efficiency intracavity frequency doubling continuous 167nm laser generating system according to the invention preferably comprises a dichroic mirror for coating a high-transmittance film with a transmittance higher than 99.5% for 335nm and a reflecting film with a reflectance higher than 90% for 167nm, and is used for coupling 167nm high efficiency out of the cavity.
The high output coupling efficiency intracavity frequency doubling continuous 167nm laser generating system according to the present invention is preferably that the piezoelectric ceramics is used to change the cavity length under the feedback voltage, thereby locking the resonance wavelength.
According to the high-output coupling efficiency intracavity frequency doubling continuous 167nm laser generation system, preferably, the PDH locking circuit is used for acquiring the transmission light of the enhancement cavity, mixing and demodulating an error signal with a modulation signal of the electro-optical modulator, generating a feedback voltage, applying the feedback voltage to the piezoelectric ceramics, and locking the wavelength.
The continuous laser system of the present invention may have, but is not limited to, the following benefits:
compared with the prior art, the high-output coupling efficiency intracavity frequency doubling continuous 167nm laser generating system has the characteristics of simple structure, low loss and high conversion efficiency and output coupling efficiency.
Drawings
Embodiments of the present invention are described in detail below with reference to the attached drawing figures, wherein:
FIG. 1 shows a schematic diagram of a high output coupling efficiency intracavity frequency doubled continuous 167nm laser generation system in accordance with an embodiment of the present invention;
fig. 2 shows fundamental light after modulating the frequency with an electro-optic modulator and the resulting modulation sidebands according to an embodiment of the present invention.
FIG. 3 shows the theoretical calculation results of a frequency multiplication cavity with high output coupling efficiency of 335nm-167nm, mainly the change relation diagram of the cavity circulating power, the frequency multiplication light output power and the nonlinear frequency multiplication conversion efficiency along with the reflectivity of an input coupling mirror according to the embodiment of the invention.
Fig. 4 shows a schematic structural diagram of a 335.5nm high-power continuous-light single-frequency laser.
Fig. 5 shows a schematic diagram of the PDH locking technique.
Reference numerals illustrate:
1. a high power 335nm continuous laser generating device; 2. an electro-optic modulator device; 3. pattern matching means; 4. a first input coupling mirror; 5. a second high reflectivity cavity mirror; 6. a first concave mirror; 7. a frequency doubling crystal; 8. a dichroic mirror; 9. a second concave mirror; 10. piezoelectric ceramics; 11. PDH locking circuit.
Detailed Description
The invention is further illustrated by the following specific examples, which are, however, to be understood only for the purpose of more detailed description and are not to be construed as limiting the invention in any way.
This section generally describes the materials used in the test of the present invention and the test method. Although many materials and methods of operation are known in the art for accomplishing the objectives of the present invention, the present invention will be described in as much detail herein. It will be apparent to those skilled in the art that in this context, the materials and methods of operation used in the present invention are well known in the art, if not specifically described.
The instruments used in the following examples were as follows:
high voltage drive, model HVA200, available from cable Lei Boguang electric technologies (Shanghai).
Example 1
This embodiment is for explaining the structure of the continuous laser system of the present invention.
Fig. 1 is a schematic structural diagram of a high-output coupling-efficiency intracavity frequency-doubled continuous 167nm laser generating system according to an embodiment of the present invention, which includes a high-power 335nm continuous laser generating device 1, an electro-optical modulator device 2, a pattern matching device 3, a first input coupling mirror 4, a second high-reflectivity cavity mirror 5, a first concave mirror 6, a frequency-doubled crystal 7, a dichroic mirror 8, a second concave mirror 9, a piezoelectric ceramic 10, and a pdh locking circuit 11.
The high-power 335nm continuous laser generating device 1 is obtained by a 1342nm solid-state high-power narrow linewidth single-frequency continuous laser through two-stage intracavity frequency doubling, and comprises 1342nm solid-state annular laser resonant cavity laser gain medium doped yttrium vanadate (Nd: YVO) 4 ) The laser is characterized by comprising a crystal, a two-stage frequency multiplication enhancement cavity, a lithium triborate crystal (LBO) which is a nonlinear crystal in the cavity, a PDH locking circuit, a Fabry-Perot reference cavity and the like, wherein as shown in figure 4, the central wavelength of the final output continuous laser is 335.5nm, the linewidth is smaller than 1MHz, and the power exceeds 1 watt.
The electro-optic modulator device 2 comprises electro-optic crystal lithium niobate (LiNbO) 3 ) A crystal and a high voltage driver for modulating the phase of 335nm fundamental continuous light with the aim of generating 20MHz modulation frequencies (ω±Ω) on both sides of the laser field for the subsequent PDH locking cavity length.
The pattern matching device 3 comprises a plurality of concave lens sheets and convex lens sheets which are used for plating high-permeability films on 335nm fundamental frequency light, and is used for adjusting the spot diameter of the fundamental frequency light to 2mm, and the beam waist position of the fundamental frequency light is overlapped with the beam waist position in the frequency doubling cavity so as to perform pattern matching with the cavity mode waist position and the beam waist size of the frequency doubling cavity, so that higher nonlinear conversion efficiency is obtained.
The first input coupling mirror 4 is a plane mirror with a reflectivity r for 335nm plating high reflectivity film system 1 ，r 1 The value of (2) is determined in relation to the intra-cavity loss, and 1-r is required to be satisfied for impedance matching 1 Equal to the total loss in the cavity.
The second high-reflectivity cavity mirror 5 is a plane mirror with a high-reflectivity film system plated at 335nm, and has a reflectivity r 1 >99%, the higher the reflectivity, the smaller the intracavity loss, and the enhancement multiple of intracavity fundamental frequency lightThe higher. While the lens is mounted on a piezoelectric ceramic for controlling the locking cavity length and the resonant wavelength.
The first concave reflector 6 is a concave reflector for a 335nm high-reflectivity film system, and the curvature radius of the concave reflector is R=100 mm or 150mm, so that fundamental frequency light is focused on the frequency doubling crystal, higher power density is generated, and the nonlinear conversion efficiency of the frequency doubling crystal is improved.
The frequency doubling crystal 7 is a KBBF crystal and is used for generating a nonlinear frequency doubling effect, and frequency doubling light with the fundamental frequency of 335.5nm is doubled to 167.75nm by continuous laser, and the crystal is designed at the Brewster angle and is used for reducing the loss of the fundamental frequency light in the enhancement cavity.
The dichroic mirror 8 is a planar dichroic mirror for a film system with high transmittance of more than 99.5% at 335.5nm and a film system with high reflectance of more than 90% at 167.75nm, and is used for guiding out 167.75nm frequency doubling light with efficiency higher than 90% after being placed in an intracavity frequency doubling crystal, and reducing transmission loss of intracavity fundamental frequency light as low as possible.
The second concave mirror 9 is a concave mirror of a 335.5nm high-reflectivity film system, and has a radius of curvature r=100 mm or 150mm, and is used for collimating the scattered fundamental frequency light transmitted in the crystal, and turning back onto the input coupling mirror to form a ring-shaped resonant cavity.
The piezoelectric ceramic 10 is a stopper composed of a piezoelectric ceramic plate and an electric wire, and is used for receiving a feedback voltage signal and locking the cavity length.
The PDH locking circuit 11, as shown in fig. 5, is based on PDH frequency stabilization technology, and is used for locking the frequency and phase of the resonant wavelength and the fundamental frequency wavelength of the frequency multiplication enhancement cavity, the photodiode detects the transmission signal of the frequency multiplication enhancement cavity, the transmission signal is an optical frequency signal carrying modulation information of the electro-optical modulator, the frequency is mixed with the 20MHz original modulation frequency in the PDH locking circuit, an error signal is demodulated, and a winding feedback voltage signal is applied to the piezoelectric ceramics, so that the cavity length is controlled to realize the wavelength locking.
Fig. 2 shows fundamental light after modulating the frequency with an electro-optic modulator and the resulting modulation sidebands according to an embodiment of the present invention.
FIG. 3 shows the theoretical calculation results of a frequency multiplication cavity with high output coupling efficiency of 335nm-167nm, mainly the change relation diagram of the cavity circulating power, the frequency multiplication light output power and the nonlinear frequency multiplication conversion efficiency along with the reflectivity of an input coupling mirror according to the embodiment of the invention.
According to the high-output coupling efficiency intracavity frequency doubling continuous 167.75nm laser generating system, intracavity loss is small, intracavity fundamental frequency optical power enhancement multiple is high, nonlinear conversion efficiency of the frequency doubling crystal is high, 167.75nm fundamental frequency optical output with higher power is easier to generate, the nonlinear conversion efficiency is improved by tens of times compared with single-pass frequency doubling crystal, meanwhile, the dichroic mirror is adopted to efficiently couple 167.75nm fundamental frequency optical out of the cavity, and compared with a concave reflecting mirror, the intracavity loss is reduced, and meanwhile, the output coupling rate is improved to more than 90 percent from 50 percent.
Although the present invention has been described to a certain extent, it is apparent that appropriate changes may be made in the individual conditions without departing from the spirit and scope of the invention. It is to be understood that the invention is not to be limited to the described embodiments, but is to be given the full breadth of the claims, including equivalents of each of the elements described.
Claims (18)
1. The continuous laser system is characterized by sequentially comprising a continuous laser generating device, an electro-optical modulator device, a mode matching device, a first input coupling mirror, a second high-reflectivity cavity mirror, a first concave mirror, a frequency doubling crystal, a dichroic mirror and a second concave mirror along the light path direction, wherein:
the continuous laser generating device is used for outputting continuous fundamental frequency laser;
an electro-optic modulator means for modulating the frequency and phase of the continuous fundamental light to produce modulation sidebands;
the mode matching device is used for adjusting the beam waist position and the beam waist size of the facula of the fundamental frequency laser;
the first input coupling mirror is a plane reflecting mirror which is plated with a high-reflectivity film system aiming at a fundamental frequency light wave band and is used for coupling fundamental frequency light into the frequency multiplication enhancement cavity;
the second high-reflectivity cavity mirror is a plane mirror which is plated with a high-reflectivity film system aiming at a fundamental frequency light wave band and is used for folding the cavity mirror and loading piezoelectric ceramics so as to lock the cavity length;
the first concave reflector is a concave reflector coated with a high-reflectivity film system aiming at a fundamental frequency light band and is used for focusing fundamental frequency light on a frequency doubling crystal;
the second concave reflector is a concave reflector coated with a high-reflectivity film system aiming at the fundamental frequency light wave band and is used for collimating fundamental frequency light;
the frequency doubling crystal is used for generating nonlinear effect and converting fundamental frequency light into frequency doubling light;
the dichroic mirror is a planar dichroic mirror which is coated with a film system with high transmittance more than 99.5% for a fundamental frequency light band and a film system with high reflectance more than 90% for a frequency doubling light band, and is used for transmitting fundamental frequency light, reflecting frequency doubling continuous laser and coupling out frequency doubling laser with high efficiency;
the first input coupling mirror, the second high-reflectivity cavity mirror, the first concave reflecting mirror, the frequency doubling crystal, the bicolor mirror and the second concave reflecting mirror form an annular resonant cavity;
the continuous laser system is a system for generating 167.75nm continuous laser by intracavity frequency doubling.
2. The continuous laser system of claim 1, wherein the first input coupling mirror has a reflectivity of 80-99.9999%.
3. The continuous laser system according to claim 1 or 2, wherein the continuous laser generating device outputs a laser with a narrow linewidth, a laser center wavelength of 335.5nm, a linewidth of less than 1mhz, and a power of more than 1 watt.
4. The continuous laser system according to claim 3, wherein the continuous laser generating device is a 1342nm solid-state high-power narrow-linewidth single-frequency continuous laser obtained by two-stage intracavity frequency doubling.
5. The continuous laser system according to any one of claims 1 to 4, characterized in that the electro-optic modulator means comprises an electro-optic crystal and a high voltage driver for modulating the frequency and phase of the fundamental continuous light.
6. The continuous laser system of claim 5, wherein the electro-optic crystal is selected from one or more of the following: lithium niobate crystals and potassium dihydrogen phosphate crystals.
7. The continuous laser system of claim 6, wherein the electro-optic crystal is a lithium niobate crystal.
8. The continuous laser system according to any one of claims 1 to 7, characterized in that the pattern matching means comprises one or more concave and convex lenses for high-pass film plating for fundamental light.
9. The continuous laser system of claim 8, wherein the mode matching means adjusts the spot beam waist radius of the fundamental laser to be 200 μm to 4mm.
10. The continuous laser system of claim 9, wherein the mode matching means adjusts the spot beam waist radius of the fundamental laser to 500 μm to 2mm.
11. The continuous laser system of claim 10, wherein the mode matching means adjusts the spot beam waist radius of the fundamental laser to 1.5mm.
12. The continuous laser system of any one of claims 1 to 11, wherein the second concave mirror has a radius of curvature of 50mm to 300mm.
13. The continuous laser system of claim 12, wherein the first concave mirror has a radius of curvature of 50mm to 300mm.
14. The continuous laser system of any one of claims 1 to 13, wherein the frequency doubling crystal is selected from one or more of the following: KBBF crystals and RBBF crystals.
15. The continuous laser system of claim 14, wherein the frequency doubling crystal is a KBBF crystal.
16. The continuous laser system of any one of claims 1 to 15, wherein the frequency doubling crystal is brewster angle designed.
17. The continuous laser system of any one of claims 1 to 16, further comprising:
piezoelectric ceramics used as a brake to control the cavity length;
the PDH locking circuit is used for acquiring an error signal and generating a feedback signal to lock the cavity length and the fundamental frequency optical wavelength.
18. A deep ultraviolet laser, characterized in that it comprises a continuous laser system according to any one of claims 1 to 17.
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