CN109682888B - Area array probe and manufacturing method thereof - Google Patents
Area array probe and manufacturing method thereof Download PDFInfo
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- CN109682888B CN109682888B CN201811503572.6A CN201811503572A CN109682888B CN 109682888 B CN109682888 B CN 109682888B CN 201811503572 A CN201811503572 A CN 201811503572A CN 109682888 B CN109682888 B CN 109682888B
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- positive electrode
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- block
- electrode layer
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- 239000000523 sample Substances 0.000 title claims abstract description 35
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 239000011810 insulating material Substances 0.000 claims abstract description 23
- 239000000463 material Substances 0.000 claims abstract description 17
- 238000000926 separation method Methods 0.000 claims abstract description 11
- 238000007747 plating Methods 0.000 claims description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 5
- 229910052709 silver Inorganic materials 0.000 claims description 5
- 239000004332 silver Substances 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 238000005520 cutting process Methods 0.000 claims description 3
- 238000009713 electroplating Methods 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 238000007772 electroless plating Methods 0.000 claims description 2
- 238000005530 etching Methods 0.000 claims description 2
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 2
- 238000003466 welding Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 claims 2
- 239000004593 Epoxy Substances 0.000 claims 1
- 230000010354 integration Effects 0.000 abstract description 4
- 230000035945 sensitivity Effects 0.000 abstract description 3
- 238000001514 detection method Methods 0.000 description 9
- 238000012360 testing method Methods 0.000 description 6
- 230000006978 adaptation Effects 0.000 description 3
- 230000008878 coupling Effects 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 230000003044 adaptive effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001802 infusion Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000009659 non-destructive testing Methods 0.000 description 1
- 230000010412 perfusion Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000008400 supply water Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/22—Details, e.g. general constructional or apparatus details
- G01N29/24—Probes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
- B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
- B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
- B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
- B06B1/06—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction
Abstract
The invention discloses an area array probe and a manufacturing method thereof, wherein the area array probe comprises a positive electrode lead, a negative electrode lead, an electrode array element, a positive electrode layer, a negative electrode layer, a matching layer and a backing material layer; the electrode array element comprises a plurality of positive electrode units, a plurality of negative electrode units and an insulating material layer, wherein the positive electrode units, the negative electrode units and the insulating material layer form a block-shaped space, the positive electrode layer is provided with a plurality of separation grooves on the upper surface of the block-shaped space, and the separation grooves divide the upper surface of the block-shaped space into a plurality of identical rectangular positive electrode layers; the positive electrode lead is connected to the positive electrode layer, and the negative electrode lead is connected to the negative electrode layer. The planar array probe has the advantages of convenient operation, high sensitivity, high integration and high resolution, and the manufacturing method of the planar array probe is simple and is suitable for popularization and application.
Description
Technical Field
The invention relates to the field of ultrasonic detection, in particular to an area array probe and a manufacturing method thereof.
Background
In the existing ultrasonic nondestructive testing technology, a narrow space which needs to be tested under some conditions can only be used for entering the test by a special small-spacing probe, however, the effective spacing of array elements of the small-spacing probe is small, the electrical impedance is high, the adaptive electrical impedance of the conventional general testing instrument is 50Ω, so that the problem of the non-adaptation with the instrument is often generated, and the common piezoelectric ceramic ultrasonic probe is small in energy and low in sensitivity, and can be transmitted only by using a coupling agent or a liquid medium as a medium, so that the outdoor test or the field test inconvenient to supply water can carry a large amount of coupling agent or liquid medium, and great inconvenience is brought to testing and testing personnel.
There is a need for an area array probe that is convenient to operate, highly integrated, highly sensitive, and highly resolved to address the above-mentioned issues.
Disclosure of Invention
In order to solve the problems, the invention provides an area array probe and a preparation method thereof, and the area array probe is convenient to operate, high in sensitivity, high in integration and high in resolution, and meanwhile, the manufacturing method of the area array probe is simple and is suitable for popularization and application.
The invention solves the technical problems through the following technical scheme:
one of the technical schemes of the invention is to provide an area array probe which comprises a positive electrode lead, a negative electrode lead, an electrode array element, a positive electrode layer, a negative electrode layer, a matching layer and a backing material layer; the electrode array element comprises a plurality of positive electrode units, a plurality of negative electrode units and insulating material layers, wherein the positive electrode units and the negative electrode units are arranged at equal intervals from top to bottom in a crossing manner, the insulating material layers are distributed in gaps between the positive electrode units and the negative electrode units, the positive electrode units, the negative electrode units and the insulating material layers form block-shaped spaces, the number of the positive electrode units and the number of the negative electrode units are the same, the positive electrode units are respectively contacted with and perpendicular to the left surface, the front surface and the rear surface of the block-shaped space, and the negative electrode units are respectively contacted with and perpendicular to the right surface, the front surface and the rear surface of the block-shaped space; the positive electrode layer covers the left surface and the upper surface of the block-shaped space, and the negative electrode layer covers the right surface and the lower surface of the block-shaped space; the matching layer covers the outer surface of the positive electrode layer, and the backing material layer covers the outer surface of the negative electrode layer; the positive electrode layer is provided with a plurality of separation grooves on the upper surface of the block-shaped space, and the separation grooves divide the upper surface of the block-shaped space into a plurality of equal rectangular positive electrode layers; the positive electrode lead is connected to the positive electrode layer, and the negative electrode lead is connected to the negative electrode layer.
In the present invention, the insulating material layer is made of an insulating material conventional in the art, and preferably, the insulating material layer is made of epoxy resin.
In the invention, the number of the positive electrode units and the negative electrode units can influence the final detection precision, and preferably, the number of the positive electrode units and the negative electrode units is 2-500; more preferably, the number of the positive electrode units and the negative electrode units is 50 to 200.
In the present invention, the materials of the positive electrode layer and the negative electrode layer are conventional in the art, and preferably, the materials of the positive electrode layer and the negative electrode layer are gold, silver, copper or nickel.
In the invention, the upper surface of the block-shaped space is divided into a plurality of equal rectangular positive electrode layers by the separation groove, and preferably, the center-to-center distance between two adjacent rectangular positive electrode layers is 45-55 mu m; more preferably, the center-to-center spacing of adjacent two rectangular positive electrode layers is 50 μm.
In the present invention, the positive electrode unit, the negative electrode unit, and the insulating material layer form a block-shaped space, and preferably, the block-shaped space is a cube.
The invention also provides a manufacturing method of the area array probe, which comprises the following steps:
s1, staggering positive electrode units and negative electrode units, and pouring insulating materials to form a block-shaped space;
s2, plating positive electrode layers on the upper surface and the left surface of the block space, and plating negative electrode layers on the lower surface and the right surface of the block space;
s3, dividing the part of the positive electrode layer on the upper surface of the block-shaped space into a plurality of equal rectangular positive electrode layers;
s4, connecting a positive electrode layer on the left surface of the block space with a positive electrode lead, and connecting a negative electrode layer on the right surface of the block space with a negative electrode lead;
and S5, combining the matching layer with the outer surface of the positive electrode layer, and combining the backing material layer with the outer surface of the negative electrode layer.
In the present invention, in S2, the positive electrode layer and the negative electrode layer are plated on the block-shaped space in a manner conventional in the art, preferably, electroplating, electroless plating or magnetron sputtering.
In the present invention, in S3, the manner of dividing the portion of the positive electrode layer on the upper surface of the block-shaped space into several equivalent rectangular positive electrode layers is conventional in the art, preferably cutting or etching.
In the present invention, in S4, the positive electrode lead and the negative electrode lead are connected by soldering a flexible circuit board or a silver tape.
In the invention, in S5, the combination mode of the matching layer and the positive electrode layer is bonding or pouring; the backing material layer and the negative electrode layer are bonded by bonding or pouring.
The invention has the advantages and beneficial effects that: in the area array probe, the number of the stacked layers of the positive electrode unit and the negative electrode unit is from 2 layers to n layers, even hundreds of layers, so that the area array probe can be highly integrated, the problem of electrical impedance adaptation of a detection instrument can be solved, the center frequency can be from 0.1MHz to 500MHz, the area array probe is small in size, high in integration, large in energy, high in resolution and free of coupling detection, and the detection accuracy and the operation convenience are greatly improved. The manufacturing method of the area array probe is simple and practical and is suitable for popularization.
Drawings
In order to more clearly illustrate the embodiments of the invention or the technical solutions of the prior art, the drawings which are used in the description of the embodiments or the prior art will be briefly described, it being obvious that the drawings in the description below are only some embodiments of the invention, and that other drawings can be obtained according to these drawings without inventive faculty for a person skilled in the art.
Description of the drawings:
fig. 1 is a schematic structural diagram of an area array probe according to embodiment 1 of the present invention.
Reference numerals illustrate:
1. an electrode array element;
11. a positive electrode unit;
12. a negative electrode unit;
13. an insulating material layer;
2. a positive electrode layer;
3. a negative electrode layer;
4. a matching layer;
5. a backing material layer;
6. a positive electrode lead;
7. a negative electrode lead;
8. a separation groove;
9. rectangular positive electrode layer.
Detailed Description
The following describes the embodiments of the present invention further with reference to the drawings and examples. The following examples are only for more clearly illustrating the technical aspects of the present invention, and are not intended to limit the scope of the present invention.
Example 1
As shown in fig. 1, the present embodiment provides an area array probe including a positive electrode lead 6, a negative electrode lead 7, an electrode array element 1, a positive electrode layer 2, a negative electrode layer 3, a matching layer 4, and a backing material layer 5; the electrode array element 1 comprises a plurality of positive electrode units 11, a plurality of negative electrode units 12 and insulating material layers 13, wherein the positive electrode units 11 and the negative electrode units 12 are arranged at equal intervals from top to bottom in a crossing manner, the insulating material layers 13 are distributed in gaps between the positive electrode units 11 and the negative electrode units 12, the positive electrode units 11, the negative electrode units 12 and the insulating material layers 13 form block-shaped spaces, the number of the positive electrode units 11 and the number of the negative electrode units 12 are the same, the positive electrode units 11 are respectively contacted with and perpendicular to the left surface, the front surface and the rear surface of the block-shaped spaces, and the negative electrode units 12 are respectively contacted with and perpendicular to the right surface, the front surface and the rear surface of the block-shaped spaces; the positive electrode layer 2 covers the left surface and the upper surface of the block space, and the negative electrode layer 3 covers the right surface and the lower surface of the block space; the matching layer 4 covers the outer surface of the positive electrode layer 2, and the backing material layer 5 covers the outer surface of the negative electrode layer 3; the positive electrode layer 2 is provided with a plurality of separation grooves 8 at the upper surface of the block space, and the separation grooves 8 divide the upper surface of the block space into a plurality of equivalent rectangular positive electrode layers 9; the positive electrode lead 6 is connected to the positive electrode layer 2, and the negative electrode lead 7 is connected to the negative electrode layer 3.
In this embodiment, the insulating material layer 13 is made of epoxy resin.
In the present embodiment, the number of positive electrode units 11 and negative electrode units 12 affects the final detection accuracy, wherein the number of positive electrode units 11 and negative electrode units 12 is 2.
In this embodiment, the material of the positive electrode layer 2 and the negative electrode layer 3 is gold, silver, copper or nickel.
In the present embodiment, the separation groove 8 separates the upper surface of the block space into 4 identical rectangular positive electrode layers 9, and the center-to-center spacing of adjacent two rectangular positive electrode layers 9 is 50 μm.
In the present embodiment, the positive electrode unit 11, the negative electrode unit 12, and the insulating material layer 13 form a cubic space.
The embodiment also provides a manufacturing method of the area array probe, which comprises the following steps:
s1, staggering positive electrode units and negative electrode units, and pouring insulating materials to form a block-shaped space;
s2, plating positive electrode layers on the upper surface and the left surface of the block space, and plating negative electrode layers on the lower surface and the right surface of the block space;
s3, dividing the part of the positive electrode layer on the upper surface of the block-shaped space into a plurality of equal rectangular positive electrode layers;
s4, connecting a positive electrode layer on the left surface of the block space with a positive electrode lead, and connecting a negative electrode layer on the right surface of the block space with a negative electrode lead;
and S5, combining the matching layer with the outer surface of the positive electrode layer, and combining the backing material layer with the outer surface of the negative electrode layer.
Wherein:
in S2, plating the positive electrode layer and the negative electrode layer on the block-shaped space in a manner of electroplating;
in S3, the positive electrode layer is divided into a plurality of identical rectangular positive electrode layers at the upper surface of the block-shaped space by cutting;
in S4, the connection mode of the positive electrode lead and the negative electrode lead is welding a flexible circuit board;
in S5, the combination mode of the matching layer and the positive electrode layer is perfusion; the backing material layer and the negative electrode layer are bonded by infusion.
The area array probe of the embodiment has the advantages that the positive electrode unit and the negative electrode unit are highly integrated, the problem of electrical impedance adaptation of a detection instrument can be solved, the center frequency can be from 0.1MHz to 500MHz, the volume is small, the integration is high, the energy is high, the resolution is high, the coupling detection can be avoided, and the detection accuracy and the operation convenience are greatly improved. Meanwhile, the manufacturing method of the area array probe is simple and practical and is suitable for popularization.
The foregoing description of the preferred embodiments of the invention is not intended to be limiting, but rather is intended to cover all modifications, equivalents, alternatives, and improvements that fall within the spirit and scope of the invention.
Claims (10)
1. The area array probe is characterized by comprising a positive electrode lead, a negative electrode lead, an electrode array element, a positive electrode layer, a negative electrode layer, a matching layer and a backing material layer; the electrode array element comprises a plurality of positive electrode units, a plurality of negative electrode units and insulating material layers, wherein the positive electrode units and the negative electrode units are arranged at equal intervals from top to bottom in a crossing manner, the insulating material layers are distributed in gaps between the positive electrode units and the negative electrode units, the positive electrode units, the negative electrode units and the insulating material layers form block-shaped spaces, the number of the positive electrode units and the number of the negative electrode units are the same, the positive electrode units are respectively contacted with and perpendicular to the left surface, the front surface and the rear surface of the block-shaped space, and the negative electrode units are respectively contacted with and perpendicular to the right surface, the front surface and the rear surface of the block-shaped space; the positive electrode layer covers the left surface and the upper surface of the block-shaped space, and the negative electrode layer covers the right surface and the lower surface of the block-shaped space; the matching layer covers the outer surface of the positive electrode layer, and the backing material layer covers the outer surface of the negative electrode layer; the positive electrode layer is provided with a plurality of separation grooves on the upper surface of the block-shaped space, and the separation grooves divide the upper surface of the block-shaped space into a plurality of equal rectangular positive electrode layers; the positive electrode lead is connected to the positive electrode layer, and the negative electrode lead is connected to the negative electrode layer.
2. The area array probe of claim 1, wherein the insulating material layer is epoxy.
3. The area array probe of claim 1, wherein the number of the positive electrode units and the negative electrode units is 2 to 500.
4. The area array probe of claim 1, wherein the positive electrode layer and the negative electrode layer are made of gold, silver, copper or nickel.
5. The area array probe of claim 1, wherein the center-to-center spacing between two adjacent rectangular positive electrode layers is 45-55 μm.
6. The area array probe of claim 1, wherein the positive electrode unit, the negative electrode unit, and the insulating material layer form a cubic space.
7. The method for manufacturing the area array probe according to any one of claims 1 to 6, comprising the steps of:
s1, staggering positive electrode units and negative electrode units, and pouring insulating materials to form a block-shaped space;
s2, plating positive electrode layers on the upper surface and the left surface of the block space, and plating negative electrode layers on the lower surface and the right surface of the block space;
s3, dividing the part of the positive electrode layer on the upper surface of the block-shaped space into a plurality of equal rectangular positive electrode layers;
s4, connecting a positive electrode layer on the left surface of the block space with a positive electrode lead, and connecting a negative electrode layer on the right surface of the block space with a negative electrode lead;
and S5, combining the matching layer with the outer surface of the positive electrode layer, and combining the backing material layer with the outer surface of the negative electrode layer.
8. The method of manufacturing an area array probe according to claim 7, wherein in S2, the positive electrode layer and the negative electrode layer are plated on the block space by electroplating, electroless plating or magnetron sputtering.
9. The method of manufacturing an area probe according to claim 7, wherein in S3, the positive electrode layer is divided into a plurality of rectangular positive electrode layers having equal widths on the upper surface of the block-shaped space by cutting or etching.
10. The method for manufacturing an area array probe according to claim 7, wherein in S4, the positive electrode lead and the negative electrode lead are connected by welding a flexible circuit board or a silver tape;
and/or, in S5, the bonding mode of the matching layer and the positive electrode layer is bonding or pouring;
and/or, in S5, the backing material layer and the negative electrode layer are bonded or impregnated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811503572.6A CN109682888B (en) | 2018-12-10 | 2018-12-10 | Area array probe and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811503572.6A CN109682888B (en) | 2018-12-10 | 2018-12-10 | Area array probe and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109682888A CN109682888A (en) | 2019-04-26 |
| CN109682888B true CN109682888B (en) | 2024-01-16 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811503572.6A Active CN109682888B (en) | 2018-12-10 | 2018-12-10 | Area array probe and manufacturing method thereof |
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| Country | Link |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008151599A (en) * | 2006-12-15 | 2008-07-03 | Hitachi Engineering & Services Co Ltd | Ultrasonic probe |
| CN103300889A (en) * | 2013-05-17 | 2013-09-18 | 深圳市理邦精密仪器股份有限公司 | Ultrasonic array probe signal acquisition component and preparation method thereof, and probe |
| CN105435379A (en) * | 2015-12-29 | 2016-03-30 | 深圳先进技术研究院 | Retina stimulation equipment based on two-dimensional array probes |
| CN107280704A (en) * | 2017-04-10 | 2017-10-24 | 深圳深超换能器有限公司 | Two-dimensional ultrasound corrugated battle array probe and preparation method thereof |
| CN209542523U (en) * | 2018-12-10 | 2019-10-25 | 曼图电子(上海)有限公司 | A kind of face battle array probe |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2332158C (en) * | 2000-03-07 | 2004-09-14 | Matsushita Electric Industrial Co., Ltd. | Ultrasonic probe |
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2018
- 2018-12-10 CN CN201811503572.6A patent/CN109682888B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008151599A (en) * | 2006-12-15 | 2008-07-03 | Hitachi Engineering & Services Co Ltd | Ultrasonic probe |
| CN103300889A (en) * | 2013-05-17 | 2013-09-18 | 深圳市理邦精密仪器股份有限公司 | Ultrasonic array probe signal acquisition component and preparation method thereof, and probe |
| CN105435379A (en) * | 2015-12-29 | 2016-03-30 | 深圳先进技术研究院 | Retina stimulation equipment based on two-dimensional array probes |
| CN107280704A (en) * | 2017-04-10 | 2017-10-24 | 深圳深超换能器有限公司 | Two-dimensional ultrasound corrugated battle array probe and preparation method thereof |
| CN209542523U (en) * | 2018-12-10 | 2019-10-25 | 曼图电子(上海)有限公司 | A kind of face battle array probe |
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| CN109682888A (en) | 2019-04-26 |
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