CN109666954A - A kind of tin plating additive and preparation method thereof - Google Patents

A kind of tin plating additive and preparation method thereof Download PDF

Info

Publication number
CN109666954A
CN109666954A CN201910163700.5A CN201910163700A CN109666954A CN 109666954 A CN109666954 A CN 109666954A CN 201910163700 A CN201910163700 A CN 201910163700A CN 109666954 A CN109666954 A CN 109666954A
Authority
CN
China
Prior art keywords
tin
parts
deionized water
tin plating
sulfonic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201910163700.5A
Other languages
Chinese (zh)
Inventor
张之勇
李锦宝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huizhou Hongtaida Electronic Materials Co Ltd
Original Assignee
Huizhou Hongtaida Electronic Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Huizhou Hongtaida Electronic Materials Co Ltd filed Critical Huizhou Hongtaida Electronic Materials Co Ltd
Priority to CN201910163700.5A priority Critical patent/CN109666954A/en
Publication of CN109666954A publication Critical patent/CN109666954A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/30Electroplating: Baths therefor from solutions of tin
    • C25D3/32Electroplating: Baths therefor from solutions of tin characterised by the organic bath constituents used
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/12Process control or regulation
    • C25D21/14Controlled addition of electrolyte components

Abstract

The present invention discloses a kind of tin plating additive, component including following volumes part: 6~10 parts of tin methane sulfonate, 27~30 parts of methane sulfonic acid, 5~10 parts of plating activation agent, 0.2~0.6 part of leveling agent, 0.5~2 part of antioxidant, 50~65 parts of deionized water, wherein, the plating activation agent is made of polyethylene glycol, methane sulfonic acid, deionized water;The leveling agent is made of dye composition and glycols;The antioxidant is made of hydroquinone, methanol, deionized water.The present invention reduces Sn using tin methane sulfonate-methane sulfonic acid as buffer system2+Activity in the solution makes it be not easy hydrolyzed and aoxidize, introduces using benzenediol as the antioxidant of action component, further make Sn2+It is less susceptible to be oxidized in the solution;The leveling agent based on dye composition is introduced, the covering power of bath solution low current density areas is maintained, cooperates the plating activation agent based on polyethylene glycol, the surface of tin plating workpiece is made to be capable of forming the tin coating of fine uniform.

Description

A kind of tin plating additive and preparation method thereof
Technical field
The invention belongs to electroless plating techniques fields, and in particular to a kind of tin plating additive and preparation method thereof.
Background technique
Tin coating has been widely used in electronics industry due to its excellent corrosion stability and solderability as electronics member device The protectiveness and solderable coating of part, wire rod, printed wiring board and integrated circuit block.And tin coating mainly passes through electroless plating Mode completes the process in electroplating bath, and the electroplate liquid for chemical plating stannum is generally acid solution, and tin is in electroplate liquid with Sn2+'s Form exists, and can have part Sn in the plating process2+It is oxidized to Sn4+Or tin oxide, so that plating solution is unstable, formation Not bright, inadequate enough the dense uniform of tin coating, it is neck that the composition proportion for how regulating and controlling plating solution, which makes to form the tin coating of bright densification, The place that domain domestic demand constantly improves.
Summary of the invention
In order to solve the above technical problems, the present invention provides a kind of low stress, low foam, unleaded and good tin plating effect tin plating Additive and preparation method thereof.
The technical scheme adopted by the invention to achieve the purpose is as follows:
A kind of tin plating additive, the component including following volumes part:
6~10 parts of tin methane sulfonate, 27~30 parts of methane sulfonic acid, 5~10 parts of plating activation agent, leveling agent 0.2~0.6 Part, 0.5~2 part of antioxidant, 50~65 parts of deionized water.
Wherein, the plating activation agent is made of polyethylene glycol, methane sulfonic acid, deionized water;The leveling agent is by dyestuff Compound and glycols composition;The antioxidant is made of hydroquinone, methanol, deionized water;The tin methane sulfonate it is dense Degree is 300g/L, and the concentration of the methane sulfonic acid is 945g/L.
Specifically, the weight ratio of polyethylene glycol in the plating activation agent, methane sulfonic acid, deionized water is (1~5):
(0.5~1): (95~99).
Specifically, the weight ratio of dye composition and glycols is 1:99 in the leveling agent.
Specifically, the weight ratio of benzenediol in the antioxidant, methanol, deionized water is (3~5): (1~5):
(90~96).
Specifically, the dye composition is one of azophenlyene class dye composition and thiazin dyes compound.
Specifically, the glycols is ethylene glycol, one of propylene glycol, butanediol or compound.
A kind of preparation method of tin plating additive is implemented before the electroplating work procedure in electroplating technology, including following implementation step It is rapid:
(1) after electroplating bath cleans up, after the deionized water that electroplating bath is added 50%, circulating filtration is opened;
(2) opening temperature control device makes that 25-35 DEG C of tank liquid holding is electroplated;
(3) methane sulfonic acid needed for being added in electroplating bath by formula rate according to electroplating bath volume, temperature meeting after addition It increases, needs to cool down;
(4) 35 DEG C are down to hereinafter, required tin methane sulfonate is added by formula rate in electroplating bath to fluid temperature;
(5) required plating activation agent, leveling agent, antioxidant are sequentially added by formula rate in electroplating bath, finally With deionized water replenisher position to normal volume;
(6) it is put into false plating plate to be electrolysed, 2h is electrolysed with 20ASF, obtains tin plating additive.
Specifically, tin plating additive in electroplating bath can be used directly to start electroplating work procedure after the completion of the step (6).
Compared with prior art, the beneficial effects of the present invention are:
1. the present invention using tin methane sulfonate-methane sulfonic acid as buffer system, reduces Sn2+Activity in the solution makes it not Easily hydrolyzed and oxidation, introduces using benzenediol as the antioxidant of action component, further makes Sn2+It is less susceptible in the solution by oxygen Change;Introduce leveling agent based on dye composition, maintain the covering power of bath solution low current density areas, cooperation with Plating activation agent based on polyethylene glycol, makes the surface of tin plating workpiece be capable of forming the tin coating of fine uniform.
2. being electroplated by using the present invention, the low foam of electroplate liquid is unleaded, and the tin coating of formation is large scale (diameter 4- 5 microns) polygon crystalline texture, it is in the appearance of uniform satin shape dumb light, has the characteristics that low stress, scolding tin effect are good,
Specific embodiment
In order to further understand the content, features and effects of the present invention, hereby enumerating following embodiment explanation.
Embodiment 1
A kind of tin plating additive, each component are matched in the ratio of following volumes part:
It 8 parts of tin methane sulfonate, 28 parts of methane sulfonic acid, 6 parts of plating activation agent, 0.4 part of leveling agent, 1.2 parts of antioxidant, goes 56.4 parts of ionized water.
Wherein, polyethylene glycol in plating activation agent, methane sulfonic acid, deionized water weight ratio be 3:0.6:96.4.Antioxygen Benzenediol in agent, methanol, deionized water weight ratio be 4:3:93.
Above-mentioned tin plating additive the preparation method is as follows:
(1) after electroplating bath cleans up, after the deionized water that electroplating bath is added 50%, circulating filtration is opened;
(2) opening temperature control device makes that 25-35 DEG C of tank liquid holding is electroplated;
(3) methane sulfonic acid needed for being added in electroplating bath by formula rate according to electroplating bath volume, temperature meeting after addition It increases, needs to cool down;
(4) 35 DEG C are down to hereinafter, required tin methane sulfonate is added by formula rate in electroplating bath to fluid temperature;
(5) required plating activation agent, leveling agent, antioxidant are sequentially added by formula rate in electroplating bath, finally With deionized water replenisher position to normal volume;
(6) it is put into false plating plate to be electrolysed, 2h is electrolysed with 20ASF, obtains tin plating additive.
Embodiment 2
A kind of tin plating additive, each component are matched in the ratio of following volumes part:
It 8 parts of tin methane sulfonate, 28 parts of methane sulfonic acid, 6 parts of plating activation agent, 0.4 part of leveling agent, 1.2 parts of antioxidant, goes 56.4 parts of ionized water.
Wherein, polyethylene glycol in plating activation agent, methane sulfonic acid, deionized water weight ratio be 2:0.8:97.2.Antioxygen Benzenediol in agent, methanol, deionized water weight ratio be 3:2:95.
The preparation method of above-mentioned tin plating additive is same as Example 1.
Embodiment 3
A kind of tin plating additive, each component are matched in the ratio of following volumes part:
It 9 parts of tin methane sulfonate, 29 parts of methane sulfonic acid, 8 parts of plating activation agent, 0.6 part of leveling agent, 1.8 parts of antioxidant, goes 51.6 parts of ionized water.
Wherein, polyethylene glycol in plating activation agent, methane sulfonic acid, deionized water weight ratio be 4:0.8:95.2.Antioxygen Benzenediol in agent, methanol, deionized water weight ratio be 5:3:92.
The preparation method of above-mentioned tin plating additive is same as Example 1.
Embodiment 4
A kind of tin plating additive, each component are matched in the ratio of following volumes part:
10 parts of tin methane sulfonate, 28 parts of methane sulfonic acid, 9 parts of plating activation agent, 0.8 part of leveling agent, 1.8 parts of antioxidant, 50.4 parts of deionized water.
Wherein, polyethylene glycol in plating activation agent, methane sulfonic acid, deionized water weight ratio be 5:1:94.In antioxidant Benzenediol, methanol, deionized water weight ratio be 5:3:92.
The preparation method of above-mentioned tin plating additive is same as Example 1.
Tin plating additive application is when electronic component electrotinning process obtained by embodiment 1-4, in the equal energy of electronical elements surface Form the pure tin coating of depositing homogeneous, polygon big crystal grain.
The above is only the preferred embodiments of the present invention, and is not intended to limit the present invention in any form, Any simple modification made to the above embodiment according to the technical essence of the invention, equivalent variations and modification, belong to The range of technical solution of the present invention.

Claims (8)

1. a kind of tin plating additive, which is characterized in that the component including following volumes part:
6~10 parts of tin methane sulfonate, 27~30 parts of methane sulfonic acid, 5~10 parts of plating activation agent, 0.2~0.6 part of leveling agent, resist 0.5~2 part of oxidant, 50~65 parts of deionized water.
Wherein, the plating activation agent is made of polyethylene glycol, methane sulfonic acid, deionized water;The leveling agent is by dyestuff chemical combination Object and glycols composition;The antioxidant is made of hydroquinone, methanol, deionized water;The concentration of the tin methane sulfonate is 300g/L, the concentration of the methane sulfonic acid are 945g/L.
2. a kind of tin plating additive according to claim 1, it is characterised in that: polyethylene glycol in the plating activation agent, Methane sulfonic acid, deionized water weight ratio be (1~5): (0.5~1): (95~99).
3. a kind of tin plating additive according to claim 1, it is characterised in that: dye composition and two in the leveling agent The weight ratio of alcohols is 1:99.
4. a kind of tin plating additive according to claim 1, it is characterised in that: benzenediol in the antioxidant, is gone methanol The weight ratio of ionized water is (3~5): (1~5): (90~96).
5. a kind of tin plating additive according to claim 1 or 3, it is characterised in that: the dye composition is azophenlyene class One of dye composition and thiazin dyes compound.
6. a kind of tin plating additive according to claim 1 or 3, it is characterised in that: the glycols is ethylene glycol, the third two One of alcohol, butanediol or compound.
7. a kind of preparation method of tin plating additive as claimed in any one of claims 1 to 6, it is characterised in that: in electroplating technology In electroplating work procedure before implement, including following implementation steps:
(1) after electroplating bath cleans up, after the deionized water that electroplating bath is added 50%, circulating filtration is opened;
(2) opening temperature control device makes that 25-35 DEG C of tank liquid holding is electroplated;
(3) methane sulfonic acid needed for being added in electroplating bath by formula rate according to electroplating bath volume, temperature can increase after addition, It needs to cool down;
(4) 35 DEG C are down to hereinafter, required tin methane sulfonate is added by formula rate in electroplating bath to fluid temperature;
(5) required plating activation agent, leveling agent, antioxidant are sequentially added by formula rate in electroplating bath, finally spent Ionized water supplements liquid level to normal volume;
(6) it is put into false plating plate to be electrolysed, 2h is electrolysed with 20ASF, obtains tin plating additive.
8. a kind of preparation method of tin plating additive according to claim 7, it is characterised in that: complete in the step (6) Tin plating additive in electroplating bath can be used directly to start electroplating work procedure at rear.
CN201910163700.5A 2019-03-05 2019-03-05 A kind of tin plating additive and preparation method thereof Pending CN109666954A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910163700.5A CN109666954A (en) 2019-03-05 2019-03-05 A kind of tin plating additive and preparation method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910163700.5A CN109666954A (en) 2019-03-05 2019-03-05 A kind of tin plating additive and preparation method thereof

Publications (1)

Publication Number Publication Date
CN109666954A true CN109666954A (en) 2019-04-23

Family

ID=66151498

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201910163700.5A Pending CN109666954A (en) 2019-03-05 2019-03-05 A kind of tin plating additive and preparation method thereof

Country Status (1)

Country Link
CN (1) CN109666954A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108977856A (en) * 2018-09-11 2018-12-11 中国科学院金属研究所 A kind of method that through-hole electro-deposition prepares stannum nanowire
CN111647917A (en) * 2020-05-22 2020-09-11 成都宏明双新科技股份有限公司 Process for preventing tin-plated product from discoloring in high-temperature test
CN112111763A (en) * 2020-09-30 2020-12-22 首钢集团有限公司 Preparation method of tin plate with high tin plating amount and product thereof
CN114517313A (en) * 2022-03-04 2022-05-20 东莞市斯坦得电子材料有限公司 Tin methane sulfonate tinning additive for printed circuit board and preparation method thereof

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030070934A1 (en) * 2001-10-02 2003-04-17 Shipley Company, L.L.C. Plating bath and method for depositing a metal layer on a substrate
JP2008266757A (en) * 2007-04-24 2008-11-06 Rohm & Haas Electronic Materials Llc Tin or tin-alloy electroplating solution
CN101922026A (en) * 2010-08-18 2010-12-22 济南德锡科技有限公司 Methanesulfonic acid-based matte pure tin electroplating solution and additive thereof
CN101952487A (en) * 2007-08-07 2011-01-19 摩西湖工业公司 Electroplating aqueous solution and preparation thereof and using method
KR101012815B1 (en) * 2010-07-21 2011-02-08 주식회사 에이엔씨코리아 Tin plating solution for using in chip plating process
CN103422130A (en) * 2012-05-14 2013-12-04 中国科学院金属研究所 Plating solution and method for electroplating bright tin plating layer
CN104630843A (en) * 2013-11-08 2015-05-20 无锡市雪江环境工程设备有限公司 Plating solution for acid copper plating by phenazine dye system and electroplating method thereof
CN105200465A (en) * 2014-05-27 2015-12-30 无锡韩光电器有限公司 Thiazine dye system acidic copper electroplating solution and electroplating method
CN105734620A (en) * 2016-03-11 2016-07-06 深圳市松柏实业发展有限公司 Tin stripping and tin plating liquid, preparing method of tin stripping and tin plating liquid and cyclic regeneration method for adopting tin stripping and tin plating liquid for recycling metal tin
JP2017031447A (en) * 2015-07-29 2017-02-09 石原ケミカル株式会社 Tin and tin alloy electroplating bath, method for forming electrodeposition using plating bath, and electronic component produced by the method
CN106609385A (en) * 2017-03-13 2017-05-03 广州睿邦新材料科技有限公司 High-filling acidic copper copper-plated brightener for electrocoppering
CN106757194A (en) * 2016-11-29 2017-05-31 陕西环珂生物科技有限公司 A kind of method that PCB blind holes are filled out in utilization electro-coppering

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030070934A1 (en) * 2001-10-02 2003-04-17 Shipley Company, L.L.C. Plating bath and method for depositing a metal layer on a substrate
JP2008266757A (en) * 2007-04-24 2008-11-06 Rohm & Haas Electronic Materials Llc Tin or tin-alloy electroplating solution
CN101952487A (en) * 2007-08-07 2011-01-19 摩西湖工业公司 Electroplating aqueous solution and preparation thereof and using method
KR101012815B1 (en) * 2010-07-21 2011-02-08 주식회사 에이엔씨코리아 Tin plating solution for using in chip plating process
CN101922026A (en) * 2010-08-18 2010-12-22 济南德锡科技有限公司 Methanesulfonic acid-based matte pure tin electroplating solution and additive thereof
CN103422130A (en) * 2012-05-14 2013-12-04 中国科学院金属研究所 Plating solution and method for electroplating bright tin plating layer
CN104630843A (en) * 2013-11-08 2015-05-20 无锡市雪江环境工程设备有限公司 Plating solution for acid copper plating by phenazine dye system and electroplating method thereof
CN105200465A (en) * 2014-05-27 2015-12-30 无锡韩光电器有限公司 Thiazine dye system acidic copper electroplating solution and electroplating method
JP2017031447A (en) * 2015-07-29 2017-02-09 石原ケミカル株式会社 Tin and tin alloy electroplating bath, method for forming electrodeposition using plating bath, and electronic component produced by the method
CN105734620A (en) * 2016-03-11 2016-07-06 深圳市松柏实业发展有限公司 Tin stripping and tin plating liquid, preparing method of tin stripping and tin plating liquid and cyclic regeneration method for adopting tin stripping and tin plating liquid for recycling metal tin
CN106757194A (en) * 2016-11-29 2017-05-31 陕西环珂生物科技有限公司 A kind of method that PCB blind holes are filled out in utilization electro-coppering
CN106609385A (en) * 2017-03-13 2017-05-03 广州睿邦新材料科技有限公司 High-filling acidic copper copper-plated brightener for electrocoppering

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108977856A (en) * 2018-09-11 2018-12-11 中国科学院金属研究所 A kind of method that through-hole electro-deposition prepares stannum nanowire
CN111647917A (en) * 2020-05-22 2020-09-11 成都宏明双新科技股份有限公司 Process for preventing tin-plated product from discoloring in high-temperature test
CN112111763A (en) * 2020-09-30 2020-12-22 首钢集团有限公司 Preparation method of tin plate with high tin plating amount and product thereof
CN114517313A (en) * 2022-03-04 2022-05-20 东莞市斯坦得电子材料有限公司 Tin methane sulfonate tinning additive for printed circuit board and preparation method thereof

Similar Documents

Publication Publication Date Title
CN109666954A (en) A kind of tin plating additive and preparation method thereof
CN102162110B (en) Methyl sulfonate tinning electrolyte and tinning method of steel strip or steel plate
CN110106535B (en) Neutral tin plating additive
CN102758228B (en) A kind of sulfonic acid type semi-bright Pure Tin Plating Process liquid
CN103572335A (en) Copper plating solution for PCB (printed circuit board) through holes, and preparation method and plating method thereof
CN108251869B (en) Tin plating electrolyte and the preparation method and application thereof
CN112064069A (en) Environment-friendly bright tin plating treatment process method
CN110205659B (en) Electrotinning additive and preparation method thereof
CN107299366A (en) Non-cyanide plating solution for copper-plating used
CN107299367A (en) Non-cyanide bright plate silver plating solution
CN109055921A (en) A kind of electroless plated tin liquor and preparation method thereof
CN113802158B (en) Electroplating solution and application thereof, copper plating process and plated part
CN111321435A (en) Acidic tin electroplating solution and preparation method and application thereof
CA2296900A1 (en) Electroplating solution for electroplating lead and lead/tin alloys
CN108570696A (en) A kind of acidic zinc nickel plating solution of resistance to high current density and its application
CN108411287A (en) A kind of solution of low temperature acid Electroless Plating of Ni-P Alloy
CN109609979B (en) Multi-layer nickel electroplating additive for improving stability
CN108950614B (en) VCP high-efficiency copper plating brightener
CN105821452A (en) Plating solution formula for electroplating pure tin on copper wire and electroplating method
CN115787007A (en) Acidic sulfate electronic copper electroplating additive composition and application thereof
CN110846693B (en) High-dispersity alkaline cyanide-free zinc plating brightener and preparation method and application thereof
CN115029742B (en) Electroplating additive for PSA electrotinning insoluble anode system
CN111621819B (en) Cyanide-free silver plating brightener and preparation method thereof
JPS5841357B2 (en) Acidic zinc plating solutions and plating methods using ethoxylated/propoxylated polyhydric alcohols
CN114525555B (en) Acidic zinc-nickel alloy electroplating additive and electroplating solution

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination