CN109665723A - 一种特清中性色双银低辐射镀膜玻璃及制备方法 - Google Patents

一种特清中性色双银低辐射镀膜玻璃及制备方法 Download PDF

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CN109665723A
CN109665723A CN201910166168.2A CN201910166168A CN109665723A CN 109665723 A CN109665723 A CN 109665723A CN 201910166168 A CN201910166168 A CN 201910166168A CN 109665723 A CN109665723 A CN 109665723A
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熊建
宋宇
杨清华
江维
全强
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Xianning CSG Energy Saving Glass Co Ltd
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    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3626Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3644Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
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    • C03GLASS; MINERAL OR SLAG WOOL
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    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3649Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
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    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3657Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/15Deposition methods from the vapour phase
    • C03C2218/154Deposition methods from the vapour phase by sputtering
    • C03C2218/156Deposition methods from the vapour phase by sputtering by magnetron sputtering

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Abstract

本发明提供了一种特清中性色双银低辐射镀膜玻璃及制备方法,在双银膜层结构的基础上,通过膜层优化设计,提高了膜层的透过率及耐氧化性能及透过率;一种特清中性色双银低辐射镀膜玻璃,其特征在于,本镀膜玻璃包括玻璃基片层G和镀膜层,所述镀膜层自所述玻璃基片层向外依次复合有十个膜层,其中第一层为SiNx层,第二层为ZnAl层,第三层Ag层,第四层为Cu层,第五层为NiCr层,第六层为SiNx层,第七层为ZnAl层,第八层为Ag层,第九层为NiCr层,第十层为SiNx层。本发明玻璃具有透过率高、耐氧化等优点。

Description

一种特清中性色双银低辐射镀膜玻璃及制备方法
技术领域
本发明属于磁控溅射镀膜技术领域,具体涉及一种中透灰色可钢双银低辐射镀膜玻璃及制备方法。
背景技术
作为一种优良的建筑材料,玻璃由于其良好的通透性,具有透光防风雪的功能,被广泛应用于建筑上。随着现代科技水平的发展,玻璃被赋予各种新的内涵,其中low-E玻璃以其美观大方的颜色、较好的质感以及优良的节能特性,在建筑幕墙领域已受到广泛应用。Low-E玻璃又称低辐射玻璃,常使用磁控溅射法在玻璃基片表面沉积出纳米膜层,进而改变玻璃的光学、电学、机械和化学等方面的性能,达到装饰、节能、环保等目的。
作为节能建筑材料,low-E玻璃的节能特性与普通玻璃及热反射镀膜玻璃相比,Low-E玻璃对远红外辐射具有极高的反射率。在有效减少室内外的热传递的作用下,保持室内温度稳定,减少建筑加热或制冷的能耗,起到了非常优秀的节能降耗作用。其中可钢膜系由于适于大面积生产,具备目前最高效的生产流程,可以进行后续切、磨、钢夹、等工艺加工,因此广受关注,成为未来low-E玻璃发展的大趋势,其中可钢单银膜系技术较为成熟,可钢双银膜系仍有较大技术空白,成熟膜系较少且多集中在中低透领域。并且市场上出现膜系颜色多为蓝绿色,还并未出现灰色膜系。
现有技术的缺点:
1)现有高透双银低辐射镀膜玻璃透过率仍难以满足客户需求。
2)现有高透双银膜系普遍存在耐氧化性差,单片保存时间短的问题。
发明内容
本发明的目的是针对现有的技术存在的上述问题,提供一种特清中性色双银低辐射镀膜玻璃及制备方法,本发明所要解决的技术问题是在双银膜层结构的基础上,通过膜层优化设计,提高了膜层的透过率及耐氧化性能及透过率。
本发明的目的可通过下列技术方案来实现:一种特清中性色双银低辐射镀膜玻璃,其特征在于,本镀膜玻璃包括玻璃基片层和镀膜层,所述镀膜层自所述玻璃基片层向外依次复合有十个膜层,其中第一层为SiNx层,第二层为ZnAl层,第三层Ag层,第四层为Cu层,第五层为NiCr层,第六层为SiNx层,第七层为ZnAl层,第八层为Ag层,第九层为NiCr层,第十层为SiNx层。
一种中透灰色可钢双银低辐射镀膜玻璃,其特征在于,所述第一层和第二层为第一电介质组合层,所述第三层和第四层为低辐射功能层,所述第五层为第一阻挡保护层,所述第六层和第七层为第二电介质组合层,所述第八层为低辐射功能层,所述第九层为第二阻挡保护层,所述第十层为第三电介质层。
由于本专利技术产品膜层透过率较高,使用普通白玻原片生产时产品室外观察略带绿色,使用超白原片生产时产品外观为中性灰色。
一种特清中性色双银低辐射镀膜玻璃的制备方法,其特征在于,本方法包括如下步骤:
1)、磁控溅射镀膜层;
A、磁控溅射第一层:
靶材数量:交流旋转靶3~4个;靶材配置为硅铝(SiAl);工艺气体比例:氩气和氮气,氩气和氮气的比例为1:1.14,溅射气压为3~5×10-3mbar;镀膜厚度为18~20nm;
B、磁控溅射第二层:
靶材数量:交流旋转靶1~2个;靶材配置锌铝(ZnAl);工艺气体比例:氩气和氧气,氩气和氧气的比例为1:2,溅射气压为3~5×10-3mbar;镀膜厚度为15~16nm;
C、磁控溅射第三层:
靶材数量:直流平面靶1个;靶材配置为银(Ag);工艺气体比例:纯氩气,溅射气压为2~3×10-3mbar;镀膜厚度为7~7.5nm;
D、磁控溅射第四层:
靶材数量:交流旋转靶1个;靶材配置为铜(Cu);工艺气体:纯氩气,溅射气压为2~3×10-3mbar;镀膜厚度为0.1~0.5nm;
E、磁控溅射第五层:
靶材数量:交流旋转靶1个;靶材配置为硅铝(SiAl);工艺气体:纯氩,溅射气压为2~3×10-3mbar;镀膜厚度为0.2~0.4nm;
F、磁控溅射第六层:
靶材数量:交流旋转靶3~5个;靶材配置为硅铝(SiAl);工艺气体比例:氩气和氮气,氩气和氮气的比例为1:1.14,溅射气压为3~5×10-3mbar;镀膜厚度为42~44nm;
G、磁控溅射第七层:
靶材数量:交流旋转靶2~3个;靶材配置为锌铝(ZnAl);工艺气体比例:氩气和氧气,氩气和氮气的比例为1:2,溅射气压为3~5×10-3mbar;镀膜厚度为18~20nm;
H、磁控溅射第八层:
靶材数量:直流平面靶1个;靶材配置为银(Ag);工艺气体比例:纯氩,溅射气压为2~3×10-3mbar;镀膜厚度为7~7.5nm;
I、磁控溅射第九层:
靶材数量:交流旋转靶1个;靶材配置为镍铬(NiCr);工艺气体比例:纯氩气;溅射气压为2~3×10-3mbar;镀膜厚度为0.2~0.4nm;
J、磁控溅射第十层:
靶材数量:交流旋转靶4~6个;靶材配置为硅铝(SiAl);工艺气体比:氩气和氮气,氩气和氮气的比例为1:1.14,溅射气压为3~5×10-3mbar;镀膜厚度为42~43nm;
2)、总膜层厚度控制在149-158nm,一般溅射室传动走速控制在4.0-5.0m/min。
本发明优点:
1、本专利技术产品6mm单片透过率>80%。
2、本专利技术产品外观颜色为中性,其中透过色a*∈[+3,-2],b*∈[-0.5,0];膜面颜色a*∈[-11,-10],b*∈[12,13];玻面颜色a*∈[-0.7,-5],b*∈[-2,-1.5];玻面小角度颜色a*∈[-1.5,-1],b*∈[-3.5,-3]。
3、耐氧化性能好,车间放置实验,时间大于120小时(湿度≥70%,温度≥20℃)。
附图说明
图1是本特清中性色双银低辐射镀膜玻璃层状结构示意图。
图中,G、玻璃基片层;1、第一层;2、第二层;3、第三层;4、第四层;5、第五层;6、第六层;7、第七层;8、第八层;9、第九层;10、第十层。
具体实施方式
以下是本发明的具体实施例并结合附图,对本发明的技术方案作进一步的描述,但本发明并不限于这些实施例。
如图1所示,一种特清中性色双银低辐射镀膜玻璃,包括玻璃基片层G和镀膜层,镀膜层自玻璃基片层向外依次复合有十个膜层,其中第一层为SiNx层,第二层为ZnAl层,第三层Ag层,第四层为Cu层,第五层为NiCr层,第六层为SiNx层,第七层为ZnAl层,第八层为Ag层,第九层为NiCr层,第十层为SiNx层。第一层和第二层为第一电介质组合层,第三层和第四层为低辐射功能层,第五层为第一阻挡保护层,第六层和第七层为第二电介质组合层,第八层为低辐射功能层,第九层为第二阻挡保护层,第十层为第三电介质层。由于本专利技术产品膜层透过率较高,使用普通白玻原片生产时产品室外观察略带绿色,使用超白原片生产时产品外观为中性灰色。
一种特清中性色双银低辐射镀膜玻璃的制备方法,本方法包括如下步骤:
1)、磁控溅射镀膜层;
A、磁控溅射第一层:
靶材数量:交流旋转靶3~4个;靶材配置为硅铝(SiAl);工艺气体比例:氩气和氮气,氩气和氮气的比例为1:1.14,溅射气压为3~5×10-3mbar;镀膜厚度为18~20nm;
B、磁控溅射第二层:
靶材数量:交流旋转靶1~2个;靶材配置锌铝(ZnAl);工艺气体比例:氩气和氧气,氩气和氧气的比例为1:2,溅射气压为3~5×10-3mbar;镀膜厚度为15~16nm;
C、磁控溅射第三层:
靶材数量:直流平面靶1个;靶材配置为银(Ag);工艺气体比例:纯氩气,溅射气压为2~3×10-3mbar;镀膜厚度为7~7.5nm;
D、磁控溅射第四层:
靶材数量:交流旋转靶1个;靶材配置为铜(Cu);工艺气体:纯氩气,溅射气压为2~3×10-3mbar;镀膜厚度为0.1~0.5nm;
E、磁控溅射第五层:
靶材数量:交流旋转靶1个;靶材配置为硅铝(SiAl);工艺气体:纯氩,溅射气压为2~3×10-3mbar;镀膜厚度为0.2~0.4nm;
F、磁控溅射第六层:
靶材数量:交流旋转靶3~5个;靶材配置为硅铝(SiAl);工艺气体比例:氩气和氮气,氩气和氮气的比例为1:1.14,溅射气压为3~5×10-3mbar;镀膜厚度为42~44nm;
G、磁控溅射第七层:
靶材数量:交流旋转靶2~3个;靶材配置为锌铝(ZnAl);工艺气体比例:氩气和氧气,氩气和氮气的比例为1:2,溅射气压为3~5×10-3mbar;镀膜厚度为18~20nm;
H、磁控溅射第八层:
靶材数量:直流平面靶1个;靶材配置为银(Ag);工艺气体比例:纯氩,溅射气压为2~3×10-3mbar;镀膜厚度为7~7.5nm;
I、磁控溅射第九层:
靶材数量:交流旋转靶1个;靶材配置为镍铬(NiCr);工艺气体比例:纯氩气;溅射气压为2~3×10-3mbar;镀膜厚度为0.2~0.4nm;
J、磁控溅射第十层:
靶材数量:交流旋转靶4~6个;靶材配置为硅铝(SiAl);工艺气体比:氩气和氮气,氩气和氮气的比例为1:1.14,溅射气压为3~5×10-3mbar;镀膜厚度为42~43nm;
2)、总膜层厚度控制在149-158nm,一般溅射室传动走速控制在4.0-5.0m/min。
本文中所描述的具体实施例仅仅是对本发明精神作举例说明。本发明所属技术领域的技术人员可以对所描述的具体实施例做各种各样的修改或补充或采用类似的方式替代,但并不会偏离本发明的精神或者超越所附权利要求书所定义的范围。

Claims (2)

1.一种特清中性色双银低辐射镀膜玻璃,其特征在于,本镀膜玻璃包括玻璃基片层(G)和镀膜层,所述镀膜层自所述玻璃基片层(G)向外依次复合有十个膜层,其中第一层(1)为SiNx层,第二层(2)为ZnAl层,第三层(3)Ag层,第四层(4)为Cu层,第五层(5)为NiCr层,第六层(6)为SiNx层,第七层(7)为ZnAl层,第八层(8)为Ag层,第九层(9)为NiCr层,第十层(10)为SiNx层。所述第一层(1)和第二层(2)为第一电介质组合层,所述第三层(3)和第四层(4)为低辐射功能层,所述第五层(5)为第一阻挡保护层,所述第六层(6)和第七层(7)为第二电介质组合层,所述第八层(8)为低辐射功能层,所述第九层(9)为第二阻挡保护层,所述第十层(10)为第三电介质层。
2.一种特清中性色双银低辐射镀膜玻璃的制备方法,其特征在于,本方法包括如下步骤:
1)、磁控溅射镀膜层;
A、磁控溅射第一层(1):
靶材数量:交流旋转靶3~4个;靶材配置为硅铝(SiAl);工艺气体比例:氩气和氮气,氩气和氮气的比例为1:1.14,溅射气压为3~5×10-3mbar;镀膜厚度为18~20nm;
B、磁控溅射第二层(2):
靶材数量:交流旋转靶1~2个;靶材配置锌铝(ZnAl);工艺气体比例:氩气和氧气,氩气和氧气的比例为1:2,溅射气压为3~5×10-3mbar;镀膜厚度为15~16nm;
C、磁控溅射第三层(3):
靶材数量:直流平面靶1个;靶材配置为银(Ag);工艺气体比例:纯氩气,溅射气压为2~3×10-3mbar;镀膜厚度为7~7.5nm;
D、磁控溅射第四层(4):
靶材数量:交流旋转靶1个;靶材配置为铜(Cu);工艺气体:纯氩气,溅射气压为2~3×10-3mbar;镀膜厚度为0.1~0.5nm;
E、磁控溅射第五层(5):
靶材数量:交流旋转靶1个;靶材配置为硅铝(SiAl);工艺气体:纯氩,溅射气压为2~3×10-3mbar;镀膜厚度为0.2~0.4nm;
F、磁控溅射第六层(6):
靶材数量:交流旋转靶3~5个;靶材配置为硅铝(SiAl);工艺气体比例:氩气和氮气,氩气和氮气的比例为1:1.14,溅射气压为3~5×10-3mbar;镀膜厚度为42~44nm;
G、磁控溅射第七层(7):
靶材数量:交流旋转靶2~3个;靶材配置为锌铝(ZnAl);工艺气体比例:氩气和氧气,氩气和氮气的比例为1:2,溅射气压为3~5×10-3mbar;镀膜厚度为18~20nm;
H、磁控溅射第八层(8):
靶材数量:直流平面靶1个;靶材配置为银(Ag);工艺气体比例:纯氩,溅射气压为2~3×10-3mbar;镀膜厚度为7~7.5nm;
I、磁控溅射第九层(9):
靶材数量:交流旋转靶1个;靶材配置为镍铬(NiCr);工艺气体比例:纯氩气;溅射气压为2~3×10-3mbar;镀膜厚度为0.2~0.4nm;
J、磁控溅射第十层(10):
靶材数量:交流旋转靶4~6个;靶材配置为硅铝(SiAl);工艺气体比:氩气和氮气,氩气和氮气的比例为1:1.14,溅射气压为3~5×10-3mbar;镀膜厚度为42~43nm;
2)、总膜层厚度控制在149-158nm,一般溅射室传动走速控制在4.0-5.0m/min。
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