CN109627484B - 使用回收料制备多孔含氟聚合物的方法 - Google Patents
使用回收料制备多孔含氟聚合物的方法 Download PDFInfo
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- CN109627484B CN109627484B CN201811552920.9A CN201811552920A CN109627484B CN 109627484 B CN109627484 B CN 109627484B CN 201811552920 A CN201811552920 A CN 201811552920A CN 109627484 B CN109627484 B CN 109627484B
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/26—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by elimination of a solid phase from a macromolecular composition or article, e.g. leaching out
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2201/00—Foams characterised by the foaming process
- C08J2201/04—Foams characterised by the foaming process characterised by the elimination of a liquid or solid component, e.g. precipitation, leaching out, evaporation
- C08J2201/042—Elimination of an organic solid phase
- C08J2201/0424—Elimination of an organic solid phase containing halogen, nitrogen, sulphur or phosphorus atoms
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2201/00—Foams characterised by the foaming process
- C08J2201/04—Foams characterised by the foaming process characterised by the elimination of a liquid or solid component, e.g. precipitation, leaching out, evaporation
- C08J2201/044—Elimination of an inorganic solid phase
- C08J2201/0444—Salts
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2327/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
- C08J2327/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
- C08J2327/12—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
- C08J2327/16—Homopolymers or copolymers of vinylidene fluoride
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2433/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2433/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
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Claims (17)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201811552920.9A CN109627484B (zh) | 2018-12-18 | 2018-12-18 | 使用回收料制备多孔含氟聚合物的方法 |
Applications Claiming Priority (1)
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CN201811552920.9A CN109627484B (zh) | 2018-12-18 | 2018-12-18 | 使用回收料制备多孔含氟聚合物的方法 |
Publications (2)
Publication Number | Publication Date |
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CN109627484A CN109627484A (zh) | 2019-04-16 |
CN109627484B true CN109627484B (zh) | 2021-07-23 |
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CN201811552920.9A Active CN109627484B (zh) | 2018-12-18 | 2018-12-18 | 使用回收料制备多孔含氟聚合物的方法 |
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CN (1) | CN109627484B (zh) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN105131327A (zh) * | 2015-09-07 | 2015-12-09 | 广东工业大学 | 一种可控孔径的多孔薄膜的制造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
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US20140272301A1 (en) * | 2013-03-15 | 2014-09-18 | Hrl Laboratories, Llc | Structural coatings with dewetting and anti-icing properties, and processes for fabricating these coatings |
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2018
- 2018-12-18 CN CN201811552920.9A patent/CN109627484B/zh active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105131327A (zh) * | 2015-09-07 | 2015-12-09 | 广东工业大学 | 一种可控孔径的多孔薄膜的制造方法 |
Non-Patent Citations (1)
Title |
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一种PVDF电池隔膜边料的回收处理方法;张明敏等;《科技创新与应用》;20140308(第7期);第20页 * |
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Address after: Room 801, 560 Xujiahui Road, Huangpu District, Shanghai 200025 Applicant after: Shanghai Huayi sanaifu New Material Co., Ltd Applicant after: CHANGSHU 3F FLUOROCHEMICAL INDUSTRY Co.,Ltd. Address before: 200025 Xujiahui Road, Shanghai, room 560, No. 1301, room Applicant before: SHANGHAI 3F NEW MATERIAL TECHNOLOGY Co.,Ltd. Applicant before: CHANGSHU 3F FLUOROCHEMICAL INDUSTRY Co.,Ltd. |
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Effective date of registration: 20210322 Address after: Room 801, 560 Xujiahui Road, Huangpu District, Shanghai 200025 Applicant after: Shanghai Huayi sanaifu New Material Co., Ltd Applicant after: CHANGSHU 3F FLUOROCHEMICAL INDUSTRY Co.,Ltd. Applicant after: INNER MONGOLIA 3F WANHAO FLUORO CHEMICAL Co.,Ltd. Address before: Room 801, 560 Xujiahui Road, Huangpu District, Shanghai 200025 Applicant before: Shanghai Huayi sanaifu New Material Co., Ltd Applicant before: CHANGSHU 3F FLUOROCHEMICAL INDUSTRY Co.,Ltd. |
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