CN109570135A - A kind of cleaning method of atomic force microscope silicon nitrate probes - Google Patents
A kind of cleaning method of atomic force microscope silicon nitrate probes Download PDFInfo
- Publication number
- CN109570135A CN109570135A CN201811435091.6A CN201811435091A CN109570135A CN 109570135 A CN109570135 A CN 109570135A CN 201811435091 A CN201811435091 A CN 201811435091A CN 109570135 A CN109570135 A CN 109570135A
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- Prior art keywords
- atomic force
- force microscope
- silicon nitrate
- cleaning method
- cleaning
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
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- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Radiology & Medical Imaging (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Cleaning In General (AREA)
Abstract
A kind of cleaning method of atomic force microscope silicon nitrate probes, the present invention relates to a kind of cleaning methods of atomic force microscope silicon nitrate probes.The purpose of the present invention is to solve the surface contaminants of current atom force microscope silicon nitrate probes to be difficult to the problem of effectively removing, method are as follows: atomic force microscope silicon nitrate probes are sequentially placed into different solutions and are cleaned by ultrasonic, it is dried with nitrogen, it is further cleaned with air plasma washer to get clean lossless probe again.The present invention can effectively remove the particle and organic pollutant of detecting probe surface, reproducible, and process safety, pollution-free.The invention belongs to the cleaning fields of atomic force microscope probe.
Description
Technical field
The present invention relates to a kind of cleaning methods of atomic force microscope silicon nitrate probes.
Background technique
In atomic force microscope technology, the effect of probe is the corresponding surface letter that interacts and obtain with sample surfaces
Breath, signal quality declines after probe is contaminated, or even can not be imaged, it is therefore desirable to be cleaned the probe of pollution to recycle
It utilizes.The pollutant of detecting probe surface is mainly particle and organic matter.
Currently used probe cleaning method can be divided into dry method cleaning and wet-cleaning.Dry method cleaning mainly has plasma
Body ablution and UV/O3Ablution；Wet-cleaning mainly has the concentrated sulfuric acid/dioxygen water mixed liquid ablution.Dry and wet ablution all may be used
To effectively remove the organic matter of detecting probe surface, but it is not ideal enough to the removal effect of particulate pollutant.The spy that wet-dry change is cleaned
When needle is in liquid phase test environment, remaining particulate pollutant can be dissolved into liquid phase, and foul solution influences test result
Reliability.Therefore, the particulate pollutant on detecting probe surface need to have to be removed complete.Further, since there are micro-cantilever, institutes on probe
It to avoid damaging micro-cantilever when cleaning probe.
Summary of the invention
Be difficult to effectively remove the purpose of the present invention is to solve the surface contaminant of current atom force microscope probe and
The problem of being easily damaged the micro-cantilever of probe provides a kind of cleaning method of atomic force microscope silicon nitrate probes.
A kind of cleaning method of atomic force microscope silicon nitrate probes of the present invention carries out according to the following steps:
One, ultrasonic cleaning: successively by four equipped with alkaline cleaner solution, deionized water, dehydrated alcohol and deionized water
A beaker is placed in ultrasonic cleaning machine, and atomic force microscope silicon nitrate probes are then sequentially placed into alkaline cleaner solution, are gone
Below ionized water, dehydrated alcohol and deionized water liquid level at 0.5~1cm, ultrasound, ultrasonic power 60-150w, ultrasonic time is
1-5min, then be dried with nitrogen；
The cleaning of two, air plasmas: by treated in step 1, atomic force microscope silicon nitrate probes are placed in air
It is cleaned in plasma cleaner, that is, completes the cleaning method of atomic force microscope silicon nitrate probes.
Beneficial effects of the present invention are as follows:
The present invention can effectively remove the particle and organic pollutant and not on atomic force microscope silicon nitrate probes surface
The micro-cantilever of probe can be damaged
1. ultrasonic cleaning successfully to be introduced to the cleaning process of atomic force microscope probe in step 1, this method can have
Effect removal detecting probe surface particulate pollutant, by controlling the placement location of probe, water and ultrasonic power make in ultrasonic device
The micro-cantilever of probe and needle point is kept not to be damaged while removing particulate matter；
2. further being cleaned using air plasma ablution to the processed probe of step 1 in step 2, the step
The mainly organic pollutant of removal；
3. being cleaned by ultrasonic probe in deionized water in step 1 is to remove the cleaning that a upper cleaning step is taken out of
Agent and part residual contaminants；
4. dehydrated alcohol used in step 1 (99.7%) and nitrogen (99.999%) are that analysis is pure, new impurity is reduced
Introducing；
5. preventing experiment appliance from introducing Step 1: beaker and tweezers used in step 2 strictly clean before the use
Pollutant；
6. organic pollutant can be carried out effectively by cleaning power and time by control air plasma in step 2
Removal, and it is possible to prevente effectively from probe keeps the integrality of needle point and cantilever coating by plasma damage.
7. the present invention is by ultrasonic cleaning in conjunction with air plasma ablution, treated, and detecting probe surface is aobvious in optics
Micro mirror, which amplifies, to be existed under 100 times and 10000 times of field emission scanning electron microscope amplification without particle, under an atomic force microscope 10 μ m
Interior only a small amount of nanoscale particle exists；Carbon pollutant atomic concentration drops to 6.24% by 23.85%.
Detailed description of the invention
Detecting probe surface optical microscope (200 μm) of the Fig. 1 without cleaning treatment；
Detecting probe surface scanning electron microscope diagram (2 μm) of the Fig. 2 without cleaning treatment；
Detecting probe surface atomic force microscopy diagram (10 μm) of the Fig. 3 without cleaning treatment；
The cleaned detecting probe surface optical microscope (200 μm) of Fig. 4 present invention；
The cleaned detecting probe surface scanning electron microscope diagram (2 μm) of Fig. 5 present invention；
The cleaned detecting probe surface atomic force microscopy diagram (10 μm) of Fig. 6 present invention.
Specific embodiment
Specific embodiment 1: a kind of cleaning method of atomic force microscope silicon nitrate probes of present embodiment is by following
What step carried out:
One, ultrasonic cleaning: successively by four equipped with alkaline cleaner solution, deionized water, dehydrated alcohol and deionized water
A beaker is placed in ultrasonic cleaning machine, and atomic force microscope silicon nitrate probes are then sequentially placed into alkaline cleaner solution, are gone
Below ionized water, dehydrated alcohol and deionized water liquid level at 0.5~1cm, ultrasound, ultrasonic power 60-150w, ultrasonic time is
1-5min, then be dried with nitrogen；
The cleaning of two, air plasmas: by treated in step 1, atomic force microscope silicon nitrate probes are placed in air
It is cleaned in plasma cleaner, that is, completes the cleaning method of atomic force microscope silicon nitrate probes.
Present embodiment has the beneficial effect that:
Present embodiment can effectively remove the particle and organic pollutant on atomic force microscope silicon nitrate probes surface
And the micro-cantilever of probe will not be damaged
1. ultrasonic cleaning successfully to be introduced to the cleaning process of atomic force microscope probe in step 1, this method can have
Effect removal detecting probe surface particulate pollutant, by controlling the placement location of probe, water and ultrasonic power make in ultrasonic device
The micro-cantilever of probe and needle point is kept not to be damaged while removing particulate matter；
2. further being cleaned using air plasma ablution to the processed probe of step 1 in step 2, the step
The mainly organic pollutant of removal；
3. being cleaned by ultrasonic probe in deionized water in step 1 is to remove the cleaning that a upper cleaning step is taken out of
Agent and part residual contaminants；
4. dehydrated alcohol used in step 1 (99.7%) and nitrogen (99.999%) are that analysis is pure, new impurity is reduced
Introducing；
5. preventing experiment appliance from introducing Step 1: beaker and tweezers used in step 2 strictly clean before the use
Pollutant；
6. organic pollutant can be carried out effectively by cleaning power and time by control air plasma in step 2
Removal, and it is possible to prevente effectively from probe keeps the integrality of needle point and cantilever coating by plasma damage.
7. present embodiment is by ultrasonic cleaning in conjunction with air plasma ablution, treated detecting probe surface is in light
It learns and exists under 10000 times of 100 times of microscope amplification and field emission scanning electron microscope amplification without particle, 10 μm under an atomic force microscope
Only a small amount of nanoscale particle exists in range；Carbon pollutant atomic concentration drops to 6.24% by 23.85%.
Specific embodiment 2: the present embodiment is different from the first embodiment in that: it is clear equipped with alkalinity in step 1
Lotion solution, deionized water, dehydrated alcohol and deionized water four beakers in the volume of liquid be 1L.Other and specific reality
It is identical to apply mode one.
Specific embodiment 3: the present embodiment is different from the first and the second embodiment in that: ultrasound is clear in step 1
It is equal to wash the liquid level of liquid and the liquid level of four beakers in device.It is other the same as one or two specific embodiments.
Specific embodiment 4: unlike one of present embodiment and specific embodiment one to three: alkali in step 1
Property detergent solution is dissolved in 1L deionized water by 5mL alkalinity concentrated cleaner to be made.It is other with specific embodiment one to
One of three is identical.
Specific embodiment 5: unlike one of present embodiment and specific embodiment one to four: alkalinity concentration is clear
Lotion is deconex 15PF-x alkalinity concentrated liquid cleaning agent.It is other identical as one of specific embodiment one to four.
Specific embodiment 6: unlike one of present embodiment and specific embodiment one to five: being used in step 1
Tweezers clamp atomic force microscope silicon nitrate probes, be then sequentially placed into alkaline cleaner solution, deionized water, dehydrated alcohol and
Below deionized water liquid level at 0.5~1cm.It is other identical as one of specific embodiment one to five.
Specific embodiment 7: unlike one of present embodiment and specific embodiment one to six: step 2 is hollow
The power of gas plasma cleaner is 6.8w, scavenging period 5min.It is other identical as one of specific embodiment one to six.
Specific embodiment 8: unlike one of present embodiment and specific embodiment one to seven: step 2 is hollow
The power of gas plasma cleaner is 10.5w, scavenging period 3min.Other phases one of with specific embodiment one to seven
Together.
Specific embodiment 9: unlike one of present embodiment and specific embodiment one to eight: step 2 is hollow
The power of gas plasma cleaner is 18w, scavenging period 1min.It is other identical as one of specific embodiment one to eight.
Beneficial effects of the present invention are verified by following embodiment:
Embodiment one: a kind of cleaning method of atomic force microscope silicon nitrate probes of the present embodiment, through the following steps that
It realizes:
One, ultrasonic cleaning: successively by four equipped with alkaline cleaner solution, deionized water, dehydrated alcohol and deionized water
A beaker is placed in ultrasonic cleaning machine, and the water surface in ultrasonic cleaning machine is flushed with liquid level in beaker, clamps probe with tweezers, and will
Probe is sequentially placed into alkaline cleaner solution, deionized water, at 0.5~1cm below dehydrated alcohol and deionized water liquid level, every
Each ultrasonic 1~2min in a beaker, then with being dried with nitrogen；Ultrasonic power 150W ± 10%；
The cleaning of two, air plasmas: by treated in step 1, probe is placed in air plasma washer, function
Rate gear is selected as most high-grade (18W), scavenging period 1min.
Fig. 1, Fig. 2 and Fig. 3 are respectively the optical microscope (200 μm) of the detecting probe surface without cleaning treatment, scanning electricity
Mirror figure (2 μm) and atomic force microscopy diagram (10 μm), as can be seen from the figure the detecting probe surface without cleaning treatment exists a large amount of
Particulate pollutant.
Fig. 4, Fig. 5 and Fig. 6 are respectively the detecting probe surface obtained after ultrasound and the processing of air plasma ablution
Optical microscope (200 μm), scanning electron microscope (SEM) photograph (2 μm) and atomic force microscopy diagram (10 μm) from optical microscope and are swept
The presence that can't see particulate pollutant in electron microscope is retouched, there is only a small amount of nanoscale particles in atomic force microscopy diagram.It can
See that this method is largely effective to the removal of detecting probe surface particulate pollutant.
Ultrasonic cleaning is successfully introduced the cleaning process of atomic force microscope probe by present embodiment, and this method can have
Effect removal detecting probe surface particulate pollutant, by controlling the placement location of probe, water and ultrasonic power make in ultrasonic device
The micro-cantilever of probe and needle point is kept not to be damaged while removing particulate matter；By by ultrasonic cleaning and air plasma
Ablution combines, and treated, and detecting probe surface amplifies under 100 times and 10000 times of field emission scanning electron microscope amplification in optical microscopy
No particle exists, and only a small amount of nanoscale particle exists in 10 μ ms under an atomic force microscope；Carbon pollutant atom is dense
Degree drops to 6.24% by 23.85%.
Claims (9)
1. a kind of cleaning method of atomic force microscope silicon nitrate probes, it is characterised in that the cleaning method be according to the following steps into
Capable:
One, ultrasonic cleaning: successively by four burnings equipped with alkaline cleaner solution, deionized water, dehydrated alcohol and deionized water
Cup is placed in ultrasonic cleaning machine, and atomic force microscope silicon nitrate probes are then sequentially placed into alkaline cleaner solution, deionization
Below water, dehydrated alcohol and deionized water liquid level at 0.5~1cm, ultrasound, ultrasonic power 60-150w, ultrasonic time 1-
5min, then be dried with nitrogen；
The cleaning of two, air plasmas: by treated in step 1 atomic force microscope silicon nitrate probes are placed in air etc. from
It is cleaned in daughter washer, that is, completes the cleaning method of atomic force microscope silicon nitrate probes.
2. a kind of cleaning method of atomic force microscope silicon nitrate probes according to claim 1, it is characterised in that step
The volume of liquid is in four beakers equipped with alkaline cleaner solution, deionized water, dehydrated alcohol and deionized water in one
1L。
3. a kind of cleaning method of atomic force microscope silicon nitrate probes according to claim 1, it is characterised in that step
The liquid level of liquid and the liquid level of four beakers are equal in ultrasonic cleaning machine in one.
4. a kind of cleaning method of atomic force microscope silicon nitrate probes according to claim 1, it is characterised in that step
One neutral and alkali detergent solution is dissolved in 1L deionized water by 5mL alkalinity concentrated cleaner to be made.
5. a kind of cleaning method of atomic force microscope silicon nitrate probes according to claim 1 or 3, it is characterised in that alkali
Property concentrated cleaner be deconex 15PF-x alkalinity concentrated liquid cleaning agent.
6. a kind of cleaning method of atomic force microscope silicon nitrate probes according to claim 1, it is characterised in that step
Atomic force microscope silicon nitrate probes are clamped with tweezers in one, are then sequentially placed into alkaline cleaner solution, deionized water, anhydrous
Below ethyl alcohol and deionized water liquid level at 0.5~1cm.
7. a kind of cleaning method of atomic force microscope silicon nitrate probes according to claim 1, it is characterised in that step
The power of air plasma cleaner is 6.8w, scavenging period 5min in two.
8. a kind of cleaning method of atomic force microscope silicon nitrate probes according to claim 1, it is characterised in that step
The power of air plasma cleaner is 10.5w, scavenging period 3min in two.
9. a kind of cleaning method of atomic force microscope silicon nitrate probes according to claim 1, it is characterised in that step
The power of air plasma cleaner is 18w, scavenging period 1min in two.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811435091.6A CN109570135A (en) | 2018-11-28 | 2018-11-28 | A kind of cleaning method of atomic force microscope silicon nitrate probes |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811435091.6A CN109570135A (en) | 2018-11-28 | 2018-11-28 | A kind of cleaning method of atomic force microscope silicon nitrate probes |
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| Publication Number | Publication Date |
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| CN109570135A true CN109570135A (en) | 2019-04-05 |
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ID=65925231
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| Application Number | Title | Priority Date | Filing Date |
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| CN201811435091.6A Pending CN109570135A (en) | 2018-11-28 | 2018-11-28 | A kind of cleaning method of atomic force microscope silicon nitrate probes |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN110369383A (en) * | 2019-07-17 | 2019-10-25 | 海安光易通信设备有限公司 | A kind of dust cap cleaning method |
| CN114354978A (en) * | 2021-11-17 | 2022-04-15 | 中南林业科技大学 | Device for preventing surface of atomic force microscope probe from generating bubbles and using method |
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| US20050183739A1 (en) * | 2004-02-24 | 2005-08-25 | Mcdermott Wayne T. | Transmission of ultrasonic energy into pressurized fluids |
| CN1978073A (en) * | 2005-11-30 | 2007-06-13 | 中国科学院电工研究所 | Atomic-force microscope needle-tip washing method and apparatus |
| CN107799376A (en) * | 2016-09-02 | 2018-03-13 | 株式会社日立制作所 | Scan microscope |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110369383A (en) * | 2019-07-17 | 2019-10-25 | 海安光易通信设备有限公司 | A kind of dust cap cleaning method |
| CN114354978A (en) * | 2021-11-17 | 2022-04-15 | 中南林业科技大学 | Device for preventing surface of atomic force microscope probe from generating bubbles and using method |
| CN114354978B (en) * | 2021-11-17 | 2024-04-19 | 中南林业科技大学 | Device for avoiding bubble generation on surface of atomic force microscope probe and use method |
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Application publication date: 20190405 |
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